JPH10239834A - Material and method for forming image - Google Patents

Abstract

PROBLEM TO BE SOLVED: To form an image by exposure to infrared rays by incorporating a compound to be allowed to generate an acid by irradiation with activated rays and a compound having a bond capable of cross-linking in the presence of an acid and a specified cyanine dye. SOLUTION: The image forming material has a photosensitive layer containing the compound to be allowed to generate an acid by irradiation with activated rays and the compound having the bond capable of cross-linking in the presence of an acid and one of the cyanine dyes represented by formulae I and II in which each of Z1 -Z2 is a sulfur or oxygen or selenium atom; each of X1 and X2 is a nonmetallic atomic group necessary to form an optionally substituted benzo- or naphtho-condensed ring; L is a 5-13C conjugated bond chain; each of R1 -R4 is a 1-5C alkyl or such alkoxy group or the like; and each of R5 -R8 is a 1-3C alkyl group or an H or halogen atom.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a negative-working compound containing a compound capable of forming an image upon exposure to actinic light, capable of forming an image by exposure to infrared rays, a compound capable of crosslinking in the presence of an acid, and an infrared absorber. The present invention relates to an image forming material having a photosensitive layer and an image forming method using the same.

[0002]

2. Description of the Related Art As an image forming material having an infrared-sensitive negative photosensitive layer, US Pat. No. 5,340,699 discloses an acid generator, a resole resin (crosslinking agent), a novolak resin and an infrared ray. Having a photosensitive layer containing an absorbent,
There is disclosed a technique in which a heat treatment is performed after image exposure and before a development treatment to be used as a negative image forming material, and if the heat treatment is not performed, it is used as a positive image forming material. However, the image forming method has a problem that the sensitivity to infrared rays is not sufficient, and it takes time for image exposure (drawing) with a semiconductor laser or the like. In addition, there is also a problem with the developability that a dye remains on the support and background stains occur during printing. Further, there is a problem that stable development is difficult when the running process is continued because the latitude of development is narrow.

[0003]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a negative type image forming material and an image forming method capable of forming an image by exposure to infrared rays.

Another object of the present invention is to provide an image forming material having a photosensitive layer containing an acid generator and a compound capable of crosslinking in the presence of an acid, wherein the image forming material is capable of forming an image by exposure to infrared rays. An object of the present invention is to provide an image forming method using the same.

Another object of the present invention is to provide a positive type image forming material having high sensitivity to infrared rays and good developability and storage properties, and an image forming method using the same.

[0006]

The constitution of the present invention which achieves the object of the present invention is as follows (1) and (2).

(1) A compound capable of generating an acid upon irradiation with an actinic ray on a support, a compound having at least one bond capable of crosslinking in the presence of an acid, and a compound represented by the following general formula (1) or (2) An image-forming material comprising a photosensitive layer containing a cyanine dye represented by the formula:

[0008]

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[In the formula, Z ₁ and Z ₂ each represent a sulfur atom, an oxygen atom or a selenium atom, and X ₁ and X ₂ each form a benzo-fused ring or a naphtho-fused ring which may have a substituent. Represents a group of non-metallic atoms necessary to perform
Represents a conjugated bond chain of ₁ to 13; R ₁ and R ₂ each represent an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms,-｛(CH ₂ ) _n -O-｝ _k- (CH ₂ ) _m OR ₉ group (n and m each represent an integer of 1 to 3, k represents 0 or 1, R ₉ represents an alkyl group having 1 to 5 carbon atoms), —R ₁₀ -SO ₃ M (R ₁₀ represents an alkylene group or alkyleneoxy group having 1 to 5 carbon atoms, M represents a hydrogen atom or an alkali metal atom.) or -R ₁₀ -CO
OM (R ₁₀ represents an alkylene group or an alkyleneoxy group having 1 to 5 carbon atoms, M represents a hydrogen atom, an alkali metal atom or a cationic atom group), and R ₁ and R ₂
Either one represents an anionic dissociable group. R ₃ and R ₄ are each an alkoxy group having 1 to 5 carbon atoms,-｛(C
H ₂ ) _n —O—｝ _k — (CH ₂ ) _m OR ₉ group (n and m each represent an integer of 1 to 3, k represents 0 or 1, and R ₉ has 1 to 5 carbon atoms. Represents an alkyl group), —R ₁₀ —SO ₃
M (R ₁₀ represents an alkylene group or an alkyleneoxy group having 1 to 5 carbon atoms, M represents a hydrogen atom or an alkali metal atom) or -R ₁₀ -COOM (R ₁₀ represents 1 to 5 carbon atoms. Represents an alkylene group or an alkyleneoxy group,
M represents a hydrogen atom, an alkali metal atom or a cationic atom group. One of R ₃ and R ₄ represents an anionic dissociable group, and R ₅ , R ₆ , R ₇ and R ₈ are each an alkyl group having 1 to 3 carbon atoms, a hydrogen atom or a halogen atom. Represents (2) An image forming method comprising the step of drawing an image on the photosensitive layer of the image forming material according to the above (1) using infrared rays, and then removing an unexposed portion with an alkaline developer. Method.

Hereinafter, the present invention will be described in detail.

As the compound capable of generating an acid upon irradiation with actinic rays (hereinafter referred to as "photoacid generator") used in the present invention, known compounds and mixtures can be used. For example, BF ₄ ⁻ , PF ₆ ⁻ , Sb of diazonium, phosphonium, sulfonium, and iodonium, respectively.
Salts such as F ₆ ⁻ , SiF ₆ ²⁻ , and ClO ₄ ⁻ , organic halogen compounds, orthoquinone-diazidosulfonyl chloride, and organometallic / organohalogen compounds also form an active ray that forms or separates an acid upon irradiation with an active ray. It is a photosensitive component and can be used as a photoacid generator in the present invention. In principle, all organic halogen compounds which are known as free-radical-forming photoinitiators are compounds which form hydrohalic acid and can be used as photoacid generators in the image-forming materials according to the invention.

Examples of the compounds forming the above-mentioned hydrohalic acid include US Pat. No. 3,515,552.
No. 3,536,489 and No. 3,779,7
No. 78 and German Offenlegungsschrift No. 2,243,62.
Compounds described in No. 1 can be used, and compounds capable of generating an acid by photolysis described in, for example, West German Patent Publication No. 2,610,842 can also be used.

Further, o-naphthoquinonediazide-4-sulfonic acid halogenide described in JP-A-50-36209 can be used.

In the present invention, as the photoacid generator, an organic halogen compound is preferable from the viewpoints of sensitivity in image formation by infrared exposure and storage stability of the image forming material. As the organic halogen compound, a triazine having a halogen-substituted alkyl group and an oxadiazole having a halogen-substituted alkyl group are preferable, and an s-triazine having a halogen-substituted alkyl group is particularly preferable.

Specific examples of oxadiazoles having a halogen-substituted alkyl group are described in JP-A-54-74728.
JP-A-55-24113, JP-A-55-7774
No. 2, JP-A-60-3626 and JP-A-60-138
No. 539, 2-halomethyl-1,3,4-
Oxadiazole-based compounds are exemplified. Preferred examples of the 2-halomethyl-1,3,4-oxadiazole-based photoacid generator are shown below.

[0016]

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S- having a halogen-substituted alkyl group
As the triazine, a compound represented by the following general formula (3) is preferable.

[0018]

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In the general formula (3), R represents an alkyl group,
A halogen-substituted alkyl group, a phenylvinylene group or an aryl group (for example, a phenyl group, a naphthyl group or the like) which may be substituted with an alkoxy group, or a substituted product thereof;
X represents a halogen atom.

The following are examples of compounds of the s-triazine photoacid generator represented by the general formula (3).

[0021]

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[0022]

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In the present invention, the content of the photoacid generator is
It can be varied widely depending on its chemical properties and the composition or physical properties of the photosensitive layer of the image forming material of the present invention, but it is about 0.1 to about 20 with respect to the total weight of the solid content of the photosensitive layer.
% Is suitable, preferably in the range of 0.2 to 10% by weight.

The compound having at least one bond crosslinkable in the presence of an acid contained in the photosensitive layer of the present invention (hereinafter referred to as "acid crosslinkable compound") includes an alkoxymethyl group, a methylol group, an acetoxymethyl group as a functional group. Amino compounds having at least two groups such as melamine derivatives [hexamethoxymethylated melamine (Cymel 300 series (1) manufactured by Mitsui Cyanamid Co., Ltd.)
Benzoguanamine derivatives [methyl / ethyl mixed alkylated benzoguanamine resin (Cymel 1100 series (2) manufactured by Mitsui Cyanamid Co., Ltd.)), glycoluril derivatives [tetramethylol glycoluril (Mitsui Cyanamid Co., Ltd., Cymel 1100 series) (3)) and the like, and at least a disubstituted aromatic compound having an alkoxymethyl group, a methylol group, an acetoxymethyl group or the like as a functional group, for example, 1,3,5-
Triacetoxymethylbenzene, 1,2,4,5-tetraacetoxymethylbenzene and the like are mentioned.
olym. Master. Sci. Eng. , 64 , 2
41 (1991).

[0025] In addition to the above, resole resins and furan resins can also be used as the acid crosslinking compound. Further, an acrylic resin synthesized from monomers including the following monomers can be used.

N-methylol acrylamide, N-methylol methacrylamide, N, N-dimethylol acrylamide, N, N-dimethylol methacrylamide, N
-(2-hydroxyethyl) acrylamide, N- (2
-Hydroxyethyl) methacrylamide, N, N-di (2-hydroxyethyl) acrylamide, N, N-di (2-hydroxyethyl) methacrylamide, N-hydroxymethyl-N- (2-hydroxyethyl) acrylamide, N -Hydroxymethyl-N- (2-hydroxyethyl) methacrylamide, hydroxyethyl vinyl ether, vinylbenzyl alcohol, α-methylvinylbenzyl alcohol, vinylbenzyl acetate, α-
An embodiment in which any one of methylvinylbenzyl acetate, vinylphenethyl alcohol, α-methylvinylphenethyl alcohol, vinylphenethyl acetate, and α-methylvinylphenethyl acetate is copolymerized in an amount of 1 to 50 mol%, preferably 5 to 30 mol%. .

In the present invention, as the acid crosslinking compound, JP-A-3-185449, JP-A-5-210239, and JP-A-7-210239.
No. 146556, No. 7-104473, No. 7-361
No. 87, No. 6-282072, No. 6-266105
No. 6-214391, No. 6-214392, No. 6-123968, No. 5-249662, No. 6-1
No. 94838, No. 5-232707, No. 6-1386
Compounds described in JP-A No. 60 can be used.

Further, a material in which the surface of the solid fine particles contained in the photosensitive layer of the present invention is modified with a crosslinking group contained in the above-mentioned acid crosslinking compound can be used.

The content of the acid crosslinking compound of the present invention is preferably from 5 to 60% by weight, particularly preferably from 20 to 45% by weight, based on the total solid content of the composition for forming the photosensitive layer. One kind of the acid crosslinking compound may be used alone, or two or more kinds may be used as a mixture.

The cyanine dye represented by the general formula (1) or (2) contained in the photosensitive layer of the present invention is formed by forming a cation with the cyanine dye represented by the general formula (1) or (2). , And those having a counter anion. In this case, as the counter anion, Cl ⁻ , Br ⁻ , ClO ₄ ⁻ , B
F ₄ ⁻ , t-butyltriphenylboron, tetraphenylboron and the like.

In the general formula (1) or (2), the number of carbon atoms (n) in the conjugated bond chain represented by L is determined by using a laser emitting an infrared ray as a light source for image exposure. It is preferable to select an effective value according to the transmission wavelength of the light. For example, when a semiconductor laser having an emission wavelength of 830 nm is used, n is preferably 5 to 9, and when a YAG laser having an emission wavelength of 1060 nm is used, n is preferably 9 to 13. The conjugate bond may have an arbitrary substituent, and the conjugate bond may form a ring with a plurality of substituents.

In the general formulas (1) and (2), the ring represented by X ₁ and the ring represented by X ₂ can have any substituent. Halogen atom as the substituent, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, -SO ₃ M and -COOM (M represents a hydrogen atom, an alkali metal atom or a cationic group of atoms) from Preferred groups are preferred. R ₁ and R ₂ are, from the viewpoint of sensitivity and developability,
R ₁ and R one of the ₂ -R-SO ₃ ^- or -R-COO ^-,
Preferably the other is -R-SO ₃ M or -R-COOM, R ₉ and R _10, in terms of sensitivity and developability,
R ₉ and one is -R-SO ₃ of R ₁₀ ^- or -R-COO ^-,
It is preferred other is -R-SO ₃ M or -R-COOM. The cyanine dye represented by the general formula (1) or (2) shows an absorption peak at 750 to 900 nm when using a semiconductor laser as a light source for image exposure, and at 900 to 1200 nm when using a YAG laser, Those having a molar absorption coefficient of ε> 1 × 10 ⁵ are preferred.

Formula (1) preferably used in the present invention
Alternatively, typical examples of the anine dye represented by (2) are shown below, but the invention is not limited thereto.

[0034]

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[0035]

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[0036]

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[0037]

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[0038]

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[0039]

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[0040]

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The cyanine dye represented by the general formula (1) or (2) can be synthesized by a known method.

The amount of the cyanine dye represented by the general formula (1) or (2) is preferably in the range of 0.5 to 5 wt% based on the photosensitive layer.

A binder can be used in the photosensitive layer of the image forming material of the present invention. As the binder, for example, a high molecular weight binder can be used. Examples of the high molecular weight binder include a novolak resin, a polymer having a hydroxystyrene unit, a polymer having a structural unit represented by the following general formula (4), and other known acrylic resins.

Examples of the novolak resin include phenol-formaldehyde resin, cresol-formaldehyde resin, phenol-cresol-formaldehyde copolycondensate resin described in JP-A-55-57841, and And a copolycondensate resin of p-substituted phenol and phenol or cresol and formaldehyde as described in JP-A-127553.

Examples of the polymer having a hydroxystyrene unit include polyhydroxystyrene and hydroxystyrene copolymer described in JP-B-52-41050.

The polymer having the structural unit represented by the general formula (4) may be a homopolymer having a repeating structure composed of only the structural unit or an unsaturated dimer of the structural unit and another vinyl monomer. It is a copolymer in which one or more structural units having a structure in which a heavy bond is cleaved are combined.

[0047]

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In the general formula (4), each of R ₁ and R ₂ represents a hydrogen atom, an alkyl group such as a methyl group or an ethyl group, or a carboxyl group, and is preferably a hydrogen atom.
R ₃ represents a hydrogen atom, a halogen atom such as a chlorine atom or a bromine atom, or an alkyl group such as a methyl group or an ethyl group, and is preferably a hydrogen atom or a methyl group. R ₄ represents a hydrogen atom, an alkyl group such as a methyl group or an ethyl group, a phenyl group or a naphthyl group.

Y represents a phenylene group or a naphthylene group including those having a substituent; examples of the substituent include an alkyl group such as a methyl group and an ethyl group; a halogen atom such as a chlorine atom and a bromine atom; a carboxyl group; Examples thereof include an alkoxy group such as an ethoxy group, a hydroxyl group, a sulfo group, a cyano group, a nitro group, an acyl group, and the like, and preferably have no substituent or are substituted with a methyl group.

X is a divalent organic group linking a nitrogen atom and an aromatic carbon atom, and n represents an integer of 0 to 5, preferably n is 0.

The polymer having the structural unit represented by the general formula (4) is more specifically exemplified by, for example, the following (a) to (f)
Can be represented by

[0052]

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In (a) to (f), R _{1 to} R ₅ each represent a hydrogen atom, an alkyl group or a halogen atom;
Represents an alkyl group or a halogen atom. Also, m, n,
1, k and s represent mol% of each structural unit.

A novolak resin, a polymer having a hydroxystyrene unit, a polymer having a structural unit represented by the general formula (4), and an acrylic resin can also be used in combination.

A preferred embodiment of the present invention is an embodiment in which the photosensitive layer contains a novolak resin and a nonionic surfactant. Nonionic surfactants include polyoxyethylene alkyl ether, polyoxyethylene alkyl allyl ether, polyoxyethylene derivative, oxyethylene / oxypropylene block copolymer, sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene sorbitol fatty acid ester Glycerin fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkylamine, alkyl alkanolamide, polyethylene glycol and the like. The novolak resin is preferably contained in the range of 20 to 80% by weight based on the photosensitive layer,
The nonionic surfactant is preferably contained in the photosensitive layer in the range of 0.01 to 10% by weight.

Further, a lipophilic resin can be added to the photosensitive layer of the present invention in order to improve the oil sensitivity of the photosensitive layer.

The lipophilic resin includes, for example, those described in JP-A-50-125806.
Condensates of phenols and aldehydes substituted with an alkyl group having 3 to 15 carbon atoms, such as t-butylphenol formaldehyde resin, can be used.

The photosensitive layer of the image forming material of the present invention may further contain other dyes, pigments, sensitizers and the like, if necessary.

The image forming material of the present invention can be produced by dissolving the components for forming the photosensitive layer in a solvent, coating the solution on a suitable support surface, and drying to provide a sensitive layer.

Examples of the solvent include propylene glycol monomethyl ether, propylene glycol monoethyl ether, methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve, ethyl cellosolve acetate, dimethylformamide, dimethyl sulfoxide, dioxane, acetone, cyclohexanone, trichloroethylene, methyl ethyl ketone and the like. No. These solvents are used alone or in combination of two or more.

As a coating method, conventionally known methods, for example, spin coating, wire bar coating, dip coating, air knife coating, roll coating, blade coating, curtain coating and the like are possible. The amount of application varies depending on the application, for example,
Speaking of photosensitive lithographic printing plates, 0.5 to 0.5
5.0 g / m ² is preferred.

As the support on which the photosensitive layer of the present invention is provided,
Metal plates such as aluminum, zinc, steel, copper, etc., and metal plates, paper, plastic films and glass plates plated or deposited with chromium, zinc, copper, nickel, aluminum, iron, etc., paper coated with resin, aluminum And the like, and a plastic film subjected to a hydrophilic treatment.

When the present invention is applied to a photosensitive lithographic printing plate, an aluminum plate which has been subjected to surface treatment such as graining treatment, anodic oxidation treatment and, if necessary, sealing treatment, may be used as a support. preferable. A known method can be applied to these processes.

Examples of the graining method include a mechanical method and an electrolytic etching method.
Examples of the mechanical method include a ball polishing method, a brush polishing method, a polishing method using liquid honing, and a buff polishing method. The various methods described above can be used alone or in combination depending on the composition of the aluminum material and the like.

For etching by electrolysis, phosphoric acid,
It is carried out using a bath in which inorganic acids such as sulfuric acid, hydrochloric acid and nitric acid are used alone or in combination of two or more. After the graining treatment, if necessary, a desmut treatment is performed with an aqueous solution of an alkali or an acid to neutralize and wash with water.

The anodic oxidation treatment is carried out by using a solution containing one or more of sulfuric acid, chromic acid, oxalic acid, phosphoric acid, malonic acid and the like as an electrolytic solution, and using an aluminum plate as an anode for electrolysis. The amount of anodic oxide film formed is 1 to 50 m
g / dm ² is suitable, and preferably 10 to 40 mg / g.
dm ² , particularly preferably 25 to 40 mg / dm ² . The amount of the anodic oxide film is determined, for example, by immersing the aluminum plate in a chromic phosphate bath solution (prepared by dissolving 35 g of phosphoric acid 85% solution and 20 g of chromium (IV) oxide in 1 liter of water) to dissolve the oxide film. It is determined from the weight change measurement before and after dissolution of the coating on the plate.

Examples of the sealing treatment include boiling water treatment, steam treatment, sodium silicate treatment, and dichromate aqueous solution treatment. In addition, the aluminum plate support may be subjected to an undercoating treatment with an aqueous solution of a water-soluble polymer compound or a metal salt such as fluorinated zirconic acid.

The image forming material of the present invention has a wavelength of 700 nm.
Image exposure is performed using the above light sources. Examples of the light source include a semiconductor laser, a He-Ne laser, a YAG laser, a carbon dioxide laser, and the like. The output is suitably 50 mW or more, preferably 100 mW or more.

As the developer used for developing the image forming material of the present invention, an aqueous alkali developer is suitable. As the aqueous alkaline developer, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate,
Aqueous solutions of alkali metal salts such as sodium metasilicate, potassium metasilicate, dibasic sodium phosphate, and tribasic sodium phosphate are included. The concentration of the alkali metal salt is 0.1.
It is suitable to use in the range of 05 to 20% by weight, more preferably 0.1 to 10% by weight.

In the image forming method of the present invention, an anionic surfactant, an amphoteric surfactant or an organic solvent such as alcohol can be added to the developer as required.

As the organic solvent, propylene glycol, ethylene glycol monophenyl ether, benzene alcohol, n-propyl alcohol and the like are useful.

[0072]

Next, the present invention will be described more specifically with reference to examples. In the following examples and comparative examples, “parts” means “parts by weight”.

Example 1 Preparation of Support A 0.24 mm thick aluminum plate (material: 1050, tempered H16) was degreased in a 5% aqueous sodium hydroxide solution at 60 ° C. for 1 minute, and then 0.5 mol / l. Temperature, 25 ° C., current density; 60 A / dm ² , treatment time;
The electrolytic etching was performed under the condition of 30 seconds. Then
After a desmut treatment at 60 ° C. for 10 seconds in a 5% aqueous sodium hydroxide solution, the temperature is increased to 20 ° C. in a 20% sulfuric acid solution.
Anodizing was performed under the conditions of a current density of 3 A / dm ² and a processing time of 1 minute. Further, hot water sealing treatment was performed with hot water at 30 ° C. for 20 seconds to prepare an aluminum plate as a support for a lithographic printing plate material.

A coating solution for a photosensitive layer having the following composition was applied on a support of the aluminum plate using a spin coater so that the film thickness after drying was 2 g / m ² , and dried at 90 ° C. for 2 minutes. A forming material was obtained.

Composition of Photosensitive Layer Coating Solution Binder A 10 parts

[0076]

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Binder B (co-condensation compound of phenol and m-, p-mixed cresol and formaldehyde (Mn = 500, Mw = 2500, phenol: m-cresol: p-cresol molar ratio is 20:48:32) )) 40 parts Resole resin (Shownol CKP918 manufactured by Showa Polymer Co., Ltd.) 45 parts Photoacid-decomposable compound (Compound Example (8)) 3 parts Cyanine dye (Exemplified Compound 1-4) 2 parts Propylene glycol monomethyl ether 1000 Part This image forming material is applied to a semiconductor laser (wavelength 830n).
m, output 500 mW). The laser beam diameter was 13 μm at 1 / e ² of the intensity at the peak. The resolution is 2000 in both the scanning direction and the sub-scanning direction.
dpi. After image exposure, Konica PS plate developer SD
R-1 (manufactured by Konica Corporation) was immersed in a developer at 27 ° C. diluted with water at a volume ratio of 6 times at 27 ° C. for 30 seconds for development to remove non-image areas (non-exposed areas). A plate was manufactured.

Under the above conditions, the sensitivity was evaluated based on the exposure energy (mJ / cm ² ) required for developing the exposed area, the developability was evaluated based on the background smear during printing, and the development latitude was determined using the above developer in water. Was evaluated in terms of the sensitivity and developability of the non-image area when diluted by a factor of 1.5.

Examples 2 to 20 and Comparative Examples 1 to 6 The types of cyanine dyes in the composition of the photosensitive layer coating solution are shown in Table 1 below.
The same experiment as in Example 1 was performed except for changing as described above.

Examples 21 and 22 and Comparative Examples 7 and 8 Same as Example 1 except that the type of cyanine dye and the acid crosslinking compound (resole resin) in the composition of the photosensitive layer coating solution were changed as shown in Table 1 below. Was conducted.

Synthesis of Resin 1 in Table 1 A mixed solvent of 125 ml of acetone and 125 ml of methanol was placed in a 500 ml four-necked flask equipped with a thermometer, a reflux condenser, a stirrer, a heater, and a nitrogen gas inlet tube.
9.0 g of ethyl acrylate (0.09
mol), 34.2 g (0.30) of ethyl netacrylate.
mol) acrylonitrile 15.9 g (0.30 mo
l), 0.86 g (0.01 mol) of methacrylic acid, 35.2 g (0.2 mol) of vinylbenzyl acetate,
And 4-hydroxyphenyl methacrylamide 51.6
g (0.30 mol) was dissolved. Further, 3.28 g (0.02 m) of azobisisobutyronitrile is used as a polymerization initiator.
ol) and heated under vigorous stirring under a nitrogen stream,
Reflux at about 60 ° C. for 6 hours. After the reaction was completed, the reaction solution was cooled to room temperature, and then poured into water to precipitate a polymer compound. This was collected by filtration and dried under vacuum at 50 ° C. for 24 hours. As a result, an alkali-soluble acrylic copolymer (resin 1)
Was obtained in an amount of 100 g. The yield based on the total amount of monomers is 90.
%Met.

The weight average molecular weight of the obtained alkali-soluble acrylic copolymer (resin 1) was determined by gel permeation chromatography (GPC) using pullulan standard,
It was 50,000 when measured with N, N-dimethylformamide (DMF) solvent.

Example 23 The same experiment as in Example 1 was conducted except that the binder A in the composition of the photosensitive layer coating solution was omitted.

The results are shown in Table 1 below.

[0085]

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[0086]

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[0087]

[Table 1]

In Table 1, the meanings of the symbols in the background soil column are as follows.

：: None at all △: Slightly stained X: Unusable level of stains generated

[0090]

According to the present invention, there is provided an image forming material having a photosensitive layer containing an acid generator and an acid-decomposable compound, which is capable of forming an image by exposure to infrared light. The present invention provides an image-forming material capable of forming an image by exposure to light, a positive-type image-forming material having high sensitivity to infrared rays, and having good developability and storage properties, and an image-forming method using the same.

Claims (2)

[Claims] 1. A compound capable of generating an acid upon irradiation with actinic light, a compound having at least one bond capable of crosslinking in the presence of an acid, and a compound represented by the following general formula (1) or (2) on a support. An image forming material comprising a photosensitive layer containing a cyanine dye to be used. Embedded image [In the formula, Z ₁ and Z ₂ each represent a sulfur atom, an oxygen atom or a selenium atom, and X ₁ and X ₂ each form a benzo-fused ring or a naphtho-fused ring which may have a substituent. Represents a necessary nonmetallic atom group, L represents a chain of conjugated bonds having 5 to 13 carbon atoms, and R ₁ and R ₂ each represent 1 to 5 carbon atoms.
An alkyl group, an alkoxy group having 1 to 5 carbon atoms,-
｛(CH ₂ ) _n -O-｝ _k- (CH ₂ ) _m OR ₉ groups (n and m
Each represent an integer of 1 to 3 is, k represents 0 or 1, R ₉
Represents an alkyl group having 1 to 5 carbon atoms. ), -R _10-
SO ₃ M (R ₁₀ represents an alkylene group or an alkyleneoxy group having 1 to 5 carbon atoms, M represents a hydrogen atom or an alkali metal atom) or —R ₁₀ —COOM (R ₁₀ represents 1 to 5 carbon atoms) 5 represents an alkylene group or an alkyleneoxy group, M represents a hydrogen atom, an alkali metal atom or a cationic atom group.), And _one of R ₁ and R ₂ represents an anionic dissociative group. R ₃ and R ₄ are each an alkoxy group having 1 to 5 carbon _{atoms, - {(CH 2) n} -O-} k -
(CH ₂ ) _m OR ₉ group (n and m each represent an integer of 1 to 3, k represents 0 or 1, R ₉ represents an alkyl group having 1 to 5 carbon atoms), —R ₁₀ —SO ₃ M (R ₁₀ represents an alkylene group or an alkyleneoxy group having 1 to 5 carbon atoms, M represents a hydrogen atom or an alkali metal atom) or —R ₁₀ —COOM (R ₁₀ represents 1 carbon atom) Represents an alkylene group or an alkyleneoxy group of 1 to 5, M represents a hydrogen atom, an alkali metal atom or a cationic atom group), and one of R ₃ and R ₄ represents an anionic dissociative group; R ₅ , R ₆ , R ₇ and R ₈ each represent an alkyl group having 1 to 3 carbon atoms, a hydrogen atom or a halogen atom. ] 2. An image forming method comprising the steps of: drawing an image on a photosensitive layer of the image forming material according to claim 1 using infrared rays; and removing an unexposed portion with an alkaline developer. .