JPH10259471A - Jig for vapor deposition and method for recovering noble metal from the jig for vapor deposition - Google Patents

Jig for vapor deposition and method for recovering noble metal from the jig for vapor deposition

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Publication number
JPH10259471A
JPH10259471A JP6604197A JP6604197A JPH10259471A JP H10259471 A JPH10259471 A JP H10259471A JP 6604197 A JP6604197 A JP 6604197A JP 6604197 A JP6604197 A JP 6604197A JP H10259471 A JPH10259471 A JP H10259471A
Authority
JP
Japan
Prior art keywords
jig
vapor deposition
coating layer
alloy
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6604197A
Other languages
Japanese (ja)
Inventor
Minoru Ogiso
稔 小木曽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Priority to JP6604197A priority Critical patent/JPH10259471A/en
Publication of JPH10259471A publication Critical patent/JPH10259471A/en
Pending legal-status Critical Current

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  • Other Surface Treatments For Metallic Materials (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PROBLEM TO BE SOLVED: To dissolve a Zn coating layer with a medicinal liquid and to easily recover the noble metals sticking to the surface of a jig for vapor deposition for which Cu or Cu alloy having a good heat radiating effect is used by successively providing the surface of the jig for vapor deposition with an Ni coating layer hardly soluble in the medicinal liquid and the Zn coating layer easily soluble therein. SOLUTION: At the time of forming a vacuum thin-film on a plastic base material, the Cu or Cu alloy is used as the jig 5 for vapor deposition for holding the base material to accelerate the heat radiation and to prevent the deformation, change of properties, etc., of the base material. The jig 5 for vapor deposition is obtd. by fixing, for example, a lower piece 1 made of Cu having mounting screws 4 and an annular upper piece 3 having an L type of sectional area made of Cu by means of these screws 4. Further, the substrate of the jig 5 is provided with the Ni coating layer 7 and the Zn coating layer 6 on the surface by plating, etc., to a thickness 1 to 30 μm and if necessary, the upper part of the Zn coating layer 6 is provided with Cu or Au strikes. After the noble metals, such as Au, Ag and Pd, are deposited by evaporation thereon, the Zn is dissolved by the medicinal liquid, as hydrochloric acid and sulfuric acid, by which the sticking noble metals are recovered in the form of foil. The surface of the remaining Ni coating layer is thereafter, coated with Zn to regenerate the jig.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、スパッタリング、イオ
ンプレーティングなどに用いる蒸着用治具に係り、特に
放熱効果を狙ったCu又はCu合金よりなる蒸着用治具
の改良及びその蒸着用治具からの貴金属回収方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor deposition jig used for sputtering, ion plating and the like, and more particularly to an improvement of a vapor deposition jig made of Cu or Cu alloy aiming at a heat radiation effect and a vapor deposition jig thereof. For recovering precious metals from wastewater.

【0002】[0002]

【従来の技術】スパッタリング、イオンプレーティン
グ、真空蒸着などに代表される真空薄膜形成技術は、半
導体産業を中心として広く普及している。基材上に真空
薄膜を形成する際には、ホルダーと呼ばれる蒸着用治具
に基材を装着し、基材上に薄膜を形成するのが一般的で
ある。蒸着用治具にはその使用につれて蒸着物である薄
膜形成成分が付着するので、使用に耐えられない付着量
になると、交換することになる。蒸着用治具に付着した
蒸着物は、サンドブラスト法や硝酸などの薬液により処
理して蒸着物を剥して再び蒸着用治具として使用する。
蒸着用治具の材質としては、ステンレスやチタニウムを
使用するのが一般的である。しかし、光ディスク等のプ
ラスチック基材に薄膜を形成する際には、放熱を良くし
て基材の変形や変質を防止する為に、CuやCu合金よ
りなる蒸着用治具が用いられている。
2. Description of the Related Art Vacuum thin film forming techniques typified by sputtering, ion plating, vacuum deposition and the like are widely used mainly in the semiconductor industry. When forming a vacuum thin film on a base material, it is common to mount the base material on a deposition jig called a holder and form a thin film on the base material. Since the thin film forming component, which is a vapor deposition substance, adheres to the vapor deposition jig as it is used, if the amount of the vapor deposition jig becomes unbearable for use, it will be replaced. The deposit adhered to the deposition jig is treated with a chemical solution such as a sand blast method or nitric acid to peel off the deposit, and is used again as a deposition jig.
Generally, stainless steel or titanium is used as the material of the deposition jig. However, when a thin film is formed on a plastic substrate such as an optical disk, a vapor deposition jig made of Cu or a Cu alloy is used in order to improve heat radiation and prevent deformation and deterioration of the substrate.

【0003】CuやCu合金の蒸着用治具に蒸着した蒸
着物を剥すことは、サンドブラスト法により行われてい
る。Au、Ag等の貴金属又はその合金(以下、貴金属
合金を含めて貴金属と総称する)がCu又はCu合金の
蒸着用治具に付着した場合も同様にサンドブラスト法に
より剥離を行うと、おおむね80%前後は大きく剥れた貴
金属として回収することができる。しかし、残りの約20
%はエメリー内に混入してしまう。エメリー内に混入し
た貴金属を回収すれば、回収率を高めることができる
が、多くの手間がかかる。
[0003] Stripping of a deposited material deposited on a jig for deposition of Cu or Cu alloy is performed by a sand blast method. When a noble metal such as Au or Ag or an alloy thereof (hereinafter, collectively referred to as a noble metal including a noble metal alloy) adheres to a deposition tool for Cu or a Cu alloy, if the same is peeled off by the sandblasting method, about 80% is obtained. The front and rear can be recovered as precious metal that has largely peeled off. But the remaining about 20
% Will be mixed into the emery. If the noble metal mixed into the emery is recovered, the recovery rate can be increased, but it takes much time and effort.

【0004】すべての貴金属を回収するには、王水や硝
酸、シアン等の薬液で処理すれば、貴金属を簡単に回収
することができる。しかし、CuやCu合金製の蒸着用
治具は、これらの薬品に対して耐蝕性が無いので台材も
溶解してしまい、蒸着用治具を再利用することができな
くなる。貴金属も高価な材料であるが蒸着用治具も高額
であるので通常は、蒸着用治具の再生が可能な前者の方
法が採られていた。近年、上記の2方法に変わる回収方
法として、Cu又はCu合金よりなるホルダーの表面
に、耐蝕性金属からなる保護層を設けた治具を使用し、
蒸着に使用後、表面に付着したAu、Ag、Pdのみを
薬液により溶解して、Au、Ag又はPdを回収すると
共に蒸着用治具を再生する方式が種々提案されている。
治具保護層としては、Pt、Ni、Cr、Al、Ti、
Ta、Nb、Rh、Ir、W、Mo等の金属及びこれら
の合金が知られている。しかしながら、これら保護層に
傷やピンホール等の微細な欠陥が有った場合、溶解に用
いる薬液がCu又はCu合金の下地部分にまで浸透し、
該下地を侵食してしまうという問題が生じたり、保護層
とAu、Ag、Pdとの密着が不十分なために蒸着工程
中に剥離してCDに付着するといった問題もおきてい
る。
[0004] In order to recover all precious metals, treatment with chemicals such as aqua regia, nitric acid, and cyanide allows precious metals to be easily recovered. However, a vapor deposition jig made of Cu or a Cu alloy has no corrosion resistance to these chemicals, so that the base material also dissolves, making it impossible to reuse the vapor deposition jig. The noble metal is also an expensive material, but the vapor deposition jig is expensive, so that the former method capable of regenerating the vapor deposition jig is usually employed. In recent years, as a recovery method instead of the above two methods, using a jig provided with a protective layer made of a corrosion-resistant metal on the surface of a holder made of Cu or Cu alloy,
Various methods have been proposed in which, after use for vapor deposition, only Au, Ag, and Pd adhering to the surface are dissolved by a chemical solution to recover Au, Ag, or Pd and recycle the vapor deposition jig.
As the jig protection layer, Pt, Ni, Cr, Al, Ti,
Metals such as Ta, Nb, Rh, Ir, W, and Mo and alloys thereof are known. However, when these protective layers have fine defects such as scratches and pinholes, the chemical solution used for dissolution penetrates to the underlying portion of Cu or Cu alloy,
There are also problems such as a problem of erosion of the underlayer and a problem that the protective layer is peeled off during the deposition process and adheres to the CD due to insufficient adhesion between Au, Ag and Pd.

【0005】[0005]

【発明が解決しようとする課題】そこで本発明は、従来
のCu又はCu合金の蒸着用治具の問題を解消し、ステ
ンレスやチタニウム製の蒸着用治具と同様に薬液処理に
より貴金属の回収を可能できるようにした蒸着用治具及
び該蒸着用治具からの貴金属回収方法を提供しようとす
るものである。
Therefore, the present invention solves the problem of the conventional jig for vapor deposition of Cu or Cu alloy, and recovers the noble metal by chemical solution treatment similarly to the jig for vapor deposition of stainless steel or titanium. An object of the present invention is to provide a vapor deposition jig and a method of recovering a noble metal from the vapor deposition jig.

【0006】[0006]

【課題を解決するための手段】上記の課題を解決するた
めの本発明の蒸着用治具は、Cu又はCu合金よりなる
ホルダーの表面に、Ni被覆層とZn被覆層を順に設け
たことを特徴とするものである。特に熱変形しやすいプ
ラスチック基材への真空薄膜形成用として好適である。
また、本発明の蒸着用治具からの貴金属回収方法は上記
本発明の蒸着用治具の使用後、Znを塩酸等の薬液によ
り溶解して、治具表面に付着したAu、Ag、Pdを金
属箔の形で回収することを特徴とするものである。
According to a first aspect of the present invention, there is provided a vapor deposition jig comprising: a holder made of Cu or a Cu alloy; and a Ni coating layer and a Zn coating layer sequentially provided on the surface of the holder. It is a feature. Particularly, it is suitable for forming a vacuum thin film on a plastic substrate which is easily deformed by heat.
In addition, the method for recovering noble metals from the jig for vapor deposition of the present invention is such that after using the jig for vapor deposition of the present invention, Zn is dissolved with a chemical solution such as hydrochloric acid to remove Au, Ag, and Pd adhering to the jig surface. It is characterized by being recovered in the form of metal foil.

【0007】上記のように本発明の蒸着用治具は、ベー
スが熱伝導性に優れたCu又はCu合金よりなるので、
プラスチック基材への蒸着に際して、良好な放熱がなさ
れ、基材の変形や変質が防止される。また、本発明の蒸
着用治具は、Cu又はCu合金の表面にNi被覆層とZ
n被覆層が順に設けられているので、使用後の本発明の
貴金属回収方法に於いて、Znを薬液により溶解して、
Au、Ag又はPdを回収する際、難溶解性のNi被覆
層によりCu又はCu合金の蒸着用治具が薬液に侵され
ず、腐食が防止される結果、回収処理後、Ni被覆され
た蒸着用治具が得られる。この治具を再度Zn被覆する
ことにより、本発明の蒸着用治具が再生される。
As described above, since the base of the vapor deposition jig of the present invention is made of Cu or Cu alloy having excellent heat conductivity,
Upon vapor deposition on the plastic substrate, good heat radiation is performed, and deformation and deterioration of the substrate are prevented. Further, the jig for vapor deposition of the present invention comprises a Ni coating layer and a Z
Since the n coating layer is provided in order, in the noble metal recovery method of the present invention after use, Zn is dissolved by a chemical solution,
When recovering Au, Ag, or Pd, the insoluble jig coating layer prevents the jig for vapor deposition of Cu or Cu alloy from being attacked by the chemical solution, thereby preventing corrosion. As a result, after the recovery processing, the Ni-coated vapor deposition is performed. Tool is obtained. By coating this jig again with Zn, the jig for vapor deposition of the present invention is regenerated.

【0008】[0008]

【発明の実施の形態】Zn被覆層及びNi被覆層の形成
方法としては、電気メッキのような湿式メッキあるいは
真空蒸着、スパッタリングのような乾式メッキの他、ペ
ースト塗布方式、金属箔貼付け方式等も使用できるが、
複雑な形状の治具に適用できる生産性及び下地との密着
性・熱伝導性を考慮すれば電気メッキ方式が最もふさわ
しい。尚、本発明の蒸着用治具に於けるZn被覆層及び
Ni被覆層の厚みは、1μm以上あるのが好ましく、傷
が付いたりした場合のトラブルを含めると5μm以上あ
るのが有効である。厚すぎても問題はないが、コストの
面から30μmを上限とする。
DESCRIPTION OF THE PREFERRED EMBODIMENTS As a method for forming a Zn coating layer and a Ni coating layer, there are a wet coating such as electroplating, a dry plating such as vacuum evaporation and sputtering, a paste coating method, a metal foil sticking method, and the like. Can be used,
The electroplating method is most suitable in consideration of productivity applicable to a jig having a complicated shape, adhesion to a base, and thermal conductivity. The thickness of the Zn coating layer and the Ni coating layer in the jig for vapor deposition of the present invention is preferably 1 μm or more, and it is effective that the thickness is 5 μm or more when troubles such as scratches are included. There is no problem if it is too thick, but the upper limit is 30 μm in terms of cost.

【0009】蒸着される貴金属との密着性を高めるため
に、Zn被覆層上にさらにCuストライク及び/又はA
uストライクを設けてもよい。その場合、ストライクの
厚みは0.01μm〜 1.0μmとすればよい。
In order to enhance the adhesion to the noble metal to be deposited, a Cu strike and / or A
A u strike may be provided. In that case, the strike may have a thickness of 0.01 μm to 1.0 μm.

【0010】また、Znの溶解に使用する薬液としては
硫酸又は、濃度1−35%の塩酸が使用出来るが、硝酸、
王水や塩酸と塩素ガス等の溶解液は、Niを溶かし、台
材を侵すので使用できない。
As a chemical solution used for dissolving Zn, sulfuric acid or hydrochloric acid having a concentration of 1 to 35% can be used.
A solution such as aqua regia or hydrochloric acid and chlorine gas cannot be used because it dissolves Ni and attacks the base material.

【0011】[0011]

【実施例1】本発明の蒸着用治具及び該蒸着用治具を用
いた回収方法の実施例について説明する。具体的な実施
例に先立って、材料試験について説明すると、長さ40m
m、幅20mm、厚さ 0.5mmのCu製試料片を作り、これに
Niメッキを25μm施した後Znメッキを2μm施した
ものを用意した。上記各試料片を、10%塩酸に2分間浸
漬して溶解液をICP分析した所、液中のNi、Cuは
ともに 0.1mg以下であり、基材のCuもNi被覆も溶解
していないことがわかった。なお、試料片の重量減から
Znは、完全に溶解していることがわかった。
[Embodiment 1] An embodiment of a vapor deposition jig and a recovery method using the vapor deposition jig of the present invention will be described. Prior to the specific examples, the material test will be described.
A sample piece made of Cu having a thickness of 20 mm, a width of 20 mm, and a thickness of 0.5 mm was prepared. Each of the sample pieces was immersed in 10% hydrochloric acid for 2 minutes, and the solution was subjected to ICP analysis. Ni and Cu in the solution were both 0.1 mg or less, and neither the base material Cu nor the Ni coating was dissolved. I understood. In addition, it turned out that Zn melt | dissolved completely from the weight reduction of a sample piece.

【0012】[0012]

【実施例2】実施例1と同様の試料片を10%塩酸に室温
にて1時間後浸漬して溶解テストを行った。溶解液をI
CP分析した所、液中のNi、Cuはそれぞれ5.3mg 、
1.6mgであった。この溶解量を厚みに換算すると、Ni
が0.07μm、Cuは0.03μmの膜厚減少に相当するが、
蒸着用治具の寸法から見て、全く問題が起きない程度の
減膜量であることがわかった。
Example 2 The same test piece as in Example 1 was immersed in 10% hydrochloric acid for 1 hour at room temperature to conduct a dissolution test. Dissolve the solution
After CP analysis, Ni and Cu in the solution were 5.3 mg each,
1.6 mg. When this amount of dissolution is converted into thickness, Ni
Is 0.07 μm and Cu corresponds to a decrease in thickness of 0.03 μm.
It was found from the dimensions of the deposition jig that the amount of film reduction was such that no problem occurred.

【0013】[0013]

【実施例3】次に具体的な実施例と従来例について説明
すると、図1に示すように直径 140mm、厚さ12mmの円形
のCu製下片1の下面に複数の取付用のねじピン2が固
設され、上面外周部に断面逆L形の上部内径 115mm、下
部内径 120mm、外径 140mm、高さ8mmの環状のCu製上
片3が下側から止めねじ4にて固定されて、Cu製蒸着
用治具5が構成される。このCu製蒸着用治具5の表面
に実施例としてNiメッキの被覆層7を5μm施した
後、Znメッキの被覆層6を5μm施し、さらにCuス
トライク及びAuストライクを行った。従来例としてC
u製蒸着用治具5の表面にスパッタリングによってAl
の被覆層を1μm施した。
Embodiment 3 Next, a specific embodiment and a conventional example will be described. As shown in FIG. 1, a plurality of mounting screw pins 2 are mounted on the lower surface of a circular Cu lower piece 1 having a diameter of 140 mm and a thickness of 12 mm. Is fixed to the outer periphery of the upper surface, and an annular upper Cu piece 3 having an inverted L-shaped cross section having an upper inner diameter of 115 mm, a lower inner diameter of 120 mm, an outer diameter of 140 mm, and a height of 8 mm is fixed from below with a set screw 4, A Cu deposition jig 5 is formed. As a working example, a coating layer 7 of Ni plating was applied to the surface of the jig 5 made of Cu at 5 μm, and then a coating layer 6 of Zn plating was applied at 5 μm, and further, a Cu strike and an Au strike were performed. As a conventional example, C
Al is formed on the surface of the u deposition jig 5 by sputtering.
1 μm was applied.

【0014】この両蒸着用治具に、図2に示すように中
央部に内径15mmの円形の穴8を有するドーナツ形の基板
9を図3に示すように装着し、スパッタリングにより基
板8にAuを約1μm付着させた。その結果、実施例の
蒸着用治具には、基板装着後に露出している外周面、上
片3の上面及び内周面、下片1の上面中央部に図4に示
すようにAu10が付着したが、従来例の蒸着用治具に
は、Auが約 0.5μm付着した時点ではがれが生じ、A
uの付着がうまく行かなくなったのでスパッタリングを
中止した。
A donut-shaped substrate 9 having a circular hole 8 having an inner diameter of 15 mm at the center as shown in FIG. 2 is mounted on the two jigs for vapor deposition as shown in FIG. Was deposited at about 1 μm. As a result, as shown in FIG. 4, Au10 adheres to the outer peripheral surface, the upper surface and the inner peripheral surface of the upper piece 3, and the center of the upper surface of the lower piece 1 which are exposed after the substrate is mounted. However, in the conventional vapor deposition jig, when Au adhered to about 0.5 μm, peeling occurred, and A
Sputtering was stopped because the adhesion of u did not work well.

【0015】このAuの付着した実施例の蒸着用治具
を、前記と同じ塩酸溶解液に室温にて浸漬し、溶解処理
したところ、箔状のAuと治具にきれいに分離された。
The jig for vapor deposition of the embodiment to which Au was adhered was immersed in the same hydrochloric acid solution as above at room temperature and subjected to a dissolution treatment, whereby the foil-like Au and the jig were separated cleanly.

【0016】[0016]

【発明の効果】以上の通り本発明の蒸着用治具は、表面
にNi被覆層とZn被覆層の設けられたCu又はCu合
金よりなるので、特にプラスチック基板への蒸着に於い
て、良好に放熱され、プラスチック基板の変形が防止さ
れる。又、密着性に優れるため、生産性の向上が充分に
見込める。さらに、本発明の蒸着用治具の再生方法は、
表面にNi被覆層とZn被覆層が設けられたCu又はC
u合金よりなる蒸着用治具の使用後、Zn被覆層を薬液
により溶解することにより、Au、Ag又はPdを金属
箔の形で回収できると共にNi被覆層によりCu又はC
u合金の蒸着用治具が溶解液に浸されず、腐食が防止さ
れるので、蒸着用治具が容易に再生できて、半永久的に
繰り返し使用が可能である。
As described above, the vapor deposition jig of the present invention is made of Cu or a Cu alloy having a Ni coating layer and a Zn coating layer on its surface. Heat is dissipated and deformation of the plastic substrate is prevented. Further, since the adhesiveness is excellent, an improvement in productivity can be sufficiently expected. Furthermore, the method for regenerating the jig for vapor deposition of the present invention,
Cu or C with Ni coating layer and Zn coating layer on the surface
After the use of the vapor deposition jig made of a u-alloy, Au, Ag or Pd can be recovered in the form of a metal foil by dissolving the Zn coating layer with a chemical solution, and the Cu or C
Since the u-alloy jig for vapor deposition is not immersed in the solution and corrosion is prevented, the jig for vapor deposition can be easily regenerated and can be used semipermanently repeatedly.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の蒸着用治具を示す図である。FIG. 1 is a view showing a deposition jig of the present invention.

【図2】Auを蒸着するドーナツ形の基板を示す図であ
る。
FIG. 2 is a view showing a donut-shaped substrate on which Au is deposited.

【図3】図1の蒸着用治具に図2の基板を装着した状態
を示す図である。
FIG. 3 is a view showing a state where the substrate of FIG. 2 is mounted on the vapor deposition jig of FIG. 1;

【図4】図3の蒸着用治具に装着した基板にAuを蒸着
した際に、蒸着用治具にAuが付着した状態を示す図で
ある。
FIG. 4 is a view showing a state in which Au adheres to the vapor deposition jig when Au is vapor-deposited on a substrate mounted on the vapor deposition jig of FIG. 3;

【符号の説明】[Explanation of symbols]

5 蒸着用治具 6 Zn被覆層 7 Ni被覆層 5 Deposition jig 6 Zn coating layer 7 Ni coating layer

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 Cu又はCu合金よりなる蒸着用治具の
表面に、Ni被覆層とZn被覆層が順に設けられている
ことを特徴とする蒸着用治具。
1. A vapor deposition jig comprising: a vapor deposition jig made of Cu or a Cu alloy; and a Ni coating layer and a Zn coating layer sequentially provided on a surface of the vapor deposition jig.
【請求項2】 上記蒸着用治具がプラスチック基材への
真空薄膜形成用である請求項1記載の蒸着用治具。
2. The deposition jig according to claim 1, wherein said deposition jig is for forming a vacuum thin film on a plastic substrate.
【請求項3】 Ni被覆層及びZn被覆層の厚みが1μ
m乃至30μmである請求項1又は請求項2記載の蒸着用
治具。
3. The thickness of the Ni coating layer and the Zn coating layer is 1 μm.
The vapor deposition jig according to claim 1 or 2, wherein the thickness is from 30 to 30 µm.
【請求項4】 Zn被覆層の上部にCuストライク及び
/又はAuストライクが設けられていることを特徴とす
る請求項1乃至3記載の蒸着用治具。
4. The vapor deposition jig according to claim 1, wherein a Cu strike and / or an Au strike are provided on the Zn coating layer.
【請求項5】 請求項1乃至4記載の蒸着用治具の使用
後、Znを薬液により溶解して、Au、Ag、Pd等の
貴金属又はこれらの合金の少なくとも1種を回収するこ
とを特徴とする蒸着用治具からの貴金属回収方法。
5. The method according to claim 1, wherein after using the vapor deposition jig, Zn is dissolved with a chemical solution to recover at least one of noble metals such as Au, Ag, and Pd or alloys thereof. Noble metal recovery method from jig for vapor deposition.
【請求項6】 上記薬液が塩酸又は硫酸である請求項5
記載の蒸着用治具からの貴金属回収方法。
6. The method according to claim 5, wherein the chemical is hydrochloric acid or sulfuric acid.
A method for recovering precious metals from the above described jig for vapor deposition.
JP6604197A 1997-03-19 1997-03-19 Jig for vapor deposition and method for recovering noble metal from the jig for vapor deposition Pending JPH10259471A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6604197A JPH10259471A (en) 1997-03-19 1997-03-19 Jig for vapor deposition and method for recovering noble metal from the jig for vapor deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6604197A JPH10259471A (en) 1997-03-19 1997-03-19 Jig for vapor deposition and method for recovering noble metal from the jig for vapor deposition

Publications (1)

Publication Number Publication Date
JPH10259471A true JPH10259471A (en) 1998-09-29

Family

ID=13304406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6604197A Pending JPH10259471A (en) 1997-03-19 1997-03-19 Jig for vapor deposition and method for recovering noble metal from the jig for vapor deposition

Country Status (1)

Country Link
JP (1) JPH10259471A (en)

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