JPH10247614A - Treatment apparatus - Google Patents

Treatment apparatus

Info

Publication number
JPH10247614A
JPH10247614A JP4919197A JP4919197A JPH10247614A JP H10247614 A JPH10247614 A JP H10247614A JP 4919197 A JP4919197 A JP 4919197A JP 4919197 A JP4919197 A JP 4919197A JP H10247614 A JPH10247614 A JP H10247614A
Authority
JP
Japan
Prior art keywords
pressure
processing liquid
filter
pump
supply pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4919197A
Other languages
Japanese (ja)
Inventor
Takahiro Ishizaki
恭弘 石崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4919197A priority Critical patent/JPH10247614A/en
Publication of JPH10247614A publication Critical patent/JPH10247614A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To lessen the affection to the preciseness of detection of pump pressure, etc., and to detect the clogging of a filter by a pressure gauge. SOLUTION: In this treatment apparatus in which a pump 1, which feeds a treatment solution by pressure, a filter 3 and a flow rate control valve 4 are provided on a treatment solution feeding pipeline in the above-mentioned order, and a pressure gauge 2 is provided between the pump 1 and the filter 3. The degree of clogging of the filter 3 is detected form the amount of decrease of the pressure gauge 2 immediately after the finish of pressure feeding. Also, a plurality of filters 3 are connected in parallel through a pipeline switching circuit with which a filter can be selected. A clogged filter 3 is separated from the treatment solution feeding pipeline 8, and a flow passage is changed to the other filter 3. As a result, a filter can be changed without stopping the device, and the throughput of the device can be improved.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体ウエーハ等の
被処理体にレジスト等の処理液を供給して,レジスト塗
布等の処理をする処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing apparatus for supplying a processing liquid such as a resist to an object to be processed such as a semiconductor wafer and performing processing such as resist coating.

【0002】被処理体に処理液を供給して処理する装
置,例えば半導体ウエーハのレジスト塗布装置では,処
理液中の異物を除去するため,処理液供給管路の途中に
フィルターを介設する。しかし,フィルターは使用中に
容易に目詰りを起こし,その後に処理した被処理体が不
良品となる事故を招来し易い。このため,フィルターの
目詰りを検出し,フィルターを交換する必要がある。そ
こで,フィルターの目詰りを確実にかつ簡易に検出し,
さらにフィルターの交換のための処理装置の運転停止時
間を短時間とすることができる処理装置が要望されてい
る。
2. Description of the Related Art In an apparatus for supplying a processing liquid to a processing target and processing the same, for example, a resist coating apparatus for a semiconductor wafer, a filter is interposed in a processing liquid supply pipe in order to remove foreign matter in the processing liquid. However, the filter is easily clogged during use, and it is likely to cause an accident that a processed object afterwards becomes a defective product. Therefore, it is necessary to detect clogging of the filter and replace the filter. Therefore, filter clogging is reliably and easily detected,
Further, there is a demand for a processing apparatus capable of shortening the operation stop time of the processing apparatus for replacing the filter.

【0003】[0003]

【従来の技術】従来の処理装置では,フィルターの前後
の処理液圧力を測定して,その圧力差からフィルターの
目詰りを検出している。以下,レジスト塗布装置を例
に,従来の処理装置を説明する。
2. Description of the Related Art In a conventional processing apparatus, the pressure of a processing liquid before and after a filter is measured, and clogging of the filter is detected from the pressure difference. Hereinafter, a conventional processing apparatus will be described using a resist coating apparatus as an example.

【0004】図7は従来例処理装置構成図であり,レジ
スト塗布装置の主要な構成を表している。図7を参照し
て,被処理体7であるウエーハは,回転機構12により
垂直軸回りに回転駆動される回転台11上に水平に載置
される。この被処理体7の直上に吐出口6が設けられ,
吐出口6から間欠的に吐出される処理液9たるレジスト
が回転する被処理体7上に供給されて塗布される。な
お,吐出後のレジストの漏れを防止するため,吐出口6
近くにサックバック5が設けられる。
FIG. 7 is a configuration diagram of a conventional processing apparatus, and shows a main configuration of a resist coating apparatus. Referring to FIG. 7, a wafer to be processed 7 is horizontally mounted on a rotating table 11 driven to rotate about a vertical axis by a rotating mechanism 12. A discharge port 6 is provided directly above the object 7 to be processed.
A resist, which is a processing liquid 9 intermittently discharged from the discharge port 6, is supplied onto the rotating processing target 7 and applied. In order to prevent the resist from leaking after the discharge, the discharge port 6
A suckback 5 is provided nearby.

【0005】処理液保存容器13内に保存された処理液
9は,処理液保存容器13と吐出口6とを接続する処理
液供給管路8を通り,処理液供給管路8に介設されたポ
ンプ1により圧送されて吐出口6まで輸送され被処理体
上に供給される。また,ポンプ1と吐出口との間に流量
制御弁4が設けられる。通常,ポンプ1と流量制御弁4
とは同期して作動し,ポンプ1が作動する吐出期間は流
量制御弁4が開放され,ポンプ1停止期間は流量制御弁
4が閉鎖される。
The processing liquid 9 stored in the processing liquid storage container 13 passes through the processing liquid supply line 8 connecting the processing liquid storage container 13 and the discharge port 6 and is interposed in the processing liquid supply line 8. Pumped by the pump 1, transported to the discharge port 6, and supplied onto the workpiece. Further, a flow control valve 4 is provided between the pump 1 and the discharge port. Normally, pump 1 and flow control valve 4
The flow control valve 4 is opened during the discharge period in which the pump 1 operates, and the flow control valve 4 is closed during the pump 1 stop period.

【0006】フィルター3は,ポンプ1と流量制御弁4
の間の処理液供給管路8に介設される。また,フィルタ
ー3の出入口に処理液供給管路8内の処理液圧力を測定
する2つの圧力計2a,2bが設けられる。2つの圧力
計2a,2bの出力は,差圧検出器10aにより比較さ
れ,フィルター3の出入口間の差圧が求められる。
The filter 3 comprises a pump 1 and a flow control valve 4
The processing liquid supply pipe 8 is provided between the two. Further, two pressure gauges 2 a and 2 b for measuring the processing liquid pressure in the processing liquid supply pipe 8 are provided at the entrance and exit of the filter 3. The outputs of the two pressure gauges 2a and 2b are compared by the differential pressure detector 10a, and the differential pressure between the inlet and the outlet of the filter 3 is obtained.

【0007】図8は,処理液供給管路内圧力の変化を表
す図であり,吐出期間前後においてフィルター3の出入
口に設けられた圧力計が示す処理液圧力を表している。
図8を参照して,図中ハで示す圧送制御信号が吐出期間
24(図中,Hレベルの期間として表されている。)に
ある間,ポンプ1が作動しかつ流量制御弁4が開放さ
れ,フィルター3に処理液9が流れるため,フィルター
3の入口側の圧力計2aが示す圧力(図中イで示し
た。)とフィルター3の出口側の圧力計2bが示す圧力
(図中ロで示した。)との間にフィルター3の目詰りの
程度に応じた大きさの差圧Pが生ずる。従来の処理装置
は,この吐出期間24の差圧を測定することで,フィル
ター3の目詰りを検出していた。
FIG. 8 is a diagram showing a change in the pressure in the processing liquid supply pipe line, and shows the processing liquid pressure indicated by a pressure gauge provided at the entrance and exit of the filter 3 before and after the discharge period.
Referring to FIG. 8, while the pumping control signal indicated by C in the drawing is in the discharge period 24 (represented as a period of H level in the drawing), the pump 1 is operated and the flow control valve 4 is opened. Since the processing liquid 9 flows through the filter 3, the pressure indicated by the pressure gauge 2a on the inlet side of the filter 3 (shown by a in the figure) and the pressure indicated by the pressure gauge 2b on the outlet side of the filter 3 (b shown in the figure) ), A pressure difference P having a magnitude corresponding to the degree of clogging of the filter 3 is generated. The conventional processing apparatus detects the clogging of the filter 3 by measuring the differential pressure during the discharge period 24.

【0008】しかし,2個の圧力計2a,2bを用いる
ことから,2個の圧力計の調整を確実にする必要があり
手間がかかる。この調整が不十分では精密な差圧を測定
することができないからである。また,圧力計の設置の
費用が2個分かかりコスト高になる。
However, since the two pressure gauges 2a and 2b are used, it is necessary to ensure the adjustment of the two pressure gauges, which is troublesome. This is because if this adjustment is insufficient, a precise differential pressure cannot be measured. In addition, the installation cost of the pressure gauge is increased by two and the cost is increased.

【0009】かかる欠点を解決すべく,1個の圧力計を
用いてフィルターの目詰りを検出する方法が考案され
た。この方法では,一個の圧力計で吐出期間におけるポ
ンプ内の圧力又はフィルターの入口の圧力を測定し,測
定された圧力が予め測定され記憶されているフィルター
が目詰りをおこしたときの圧力を超えたことで目詰りを
検出する。従って,一個の圧力計で目詰りを検出するこ
とができる。しかし,ポンプ内ないしフィルター入口の
圧力は,ポンプの動作速度等により変動する。このた
め,ポンプの調整毎にフィルターが目詰りをおこしたと
きの圧力を再度測定し記憶させねばならず,多大の時間
と手間を要する。
In order to solve such a drawback, a method has been devised for detecting clogging of a filter using a single pressure gauge. In this method, one pressure gauge measures the pressure in the pump or the pressure at the inlet of the filter during the discharge period, and the measured pressure exceeds the pre-measured and stored pressure when the filter becomes clogged. Clogging is detected. Therefore, clogging can be detected with one pressure gauge. However, the pressure inside the pump or at the filter inlet fluctuates depending on the operating speed of the pump. For this reason, every time the pump is adjusted, the pressure when the filter is clogged must be measured and stored again, which requires a great deal of time and labor.

【0010】さらに,上述した従来の処理装置では,目
詰りを起こしたフィルターを交換するため処理装置を停
止しなければならず,処理装置のスループット低下を招
来している。
Further, in the above-mentioned conventional processing apparatus, the processing apparatus must be stopped in order to replace the clogged filter, which causes a decrease in the throughput of the processing apparatus.

【0011】[0011]

【発明が解決しようとする課題】上述したように従来の
処理装置では,吐出期間におけるフィルターの入口と出
口との圧力を2個の圧力計を用いて測定し,その差圧か
らフィルターの目詰りを検出するため,2個の圧力計間
の調整に手間と時間を要しかつ装置が高価になるという
問題があった。
As described above, in the conventional processing apparatus, the pressure at the inlet and the outlet of the filter during the discharge period is measured using two pressure gauges, and the filter is clogged from the pressure difference. However, there is a problem that it takes time and effort to adjust between the two pressure gauges, and the apparatus becomes expensive.

【0012】また,ポンプ内又はフィルター入口の圧力
を一個の圧力計により測定してフィルターの目詰りを検
出する方法は,ポンプの調整毎に目詰り状態の圧力を再
度測定しなければならず,多大の手間と時間を必要とす
るという問題がある。
In the method of detecting clogging of the filter by measuring the pressure in the pump or the inlet of the filter with a single pressure gauge, the pressure in the clogged state must be measured again each time the pump is adjusted. There is a problem that it requires a lot of labor and time.

【0013】さらに,従来の処理装置では,目詰りをお
こしたフィルターの交換のため処理装置を停止しなけれ
ばならず,処理装置のスループットが低下するという問
題がある。
Further, in the conventional processing apparatus, the processing apparatus must be stopped to replace the clogged filter, which causes a problem that the throughput of the processing apparatus is reduced.

【0014】本発明は,フィルター入口の圧力の吐出期
間終了直後の変化量からフィルターの目詰りを検出する
ことにより,ポンプ調整時の再測定が不要な一個の圧力
計を用いたフィルターの目詰りを検出する処理装置を提
供することを目的とし,さらにフィルター交換時の装置
停止期間を短縮した処理装置を提供することを目的とし
ている。
According to the present invention, filter clogging is detected using a single pressure gauge which does not require re-measurement at the time of pump adjustment by detecting filter clogging from the amount of change in pressure at the filter inlet immediately after the end of the discharge period. It is an object of the present invention to provide a processing device for detecting a filter, and further to provide a processing device in which a device stoppage period during filter replacement is reduced.

【0015】[0015]

【課題を解決するための手段】図1は本発明の第一実施
形態例構成図,図5は本発明の第二実施形態例構成図で
あり,処理装置の処理液供給手段の主要な構成を表して
いる。
FIG. 1 is a block diagram of a first embodiment of the present invention, and FIG. 5 is a block diagram of a second embodiment of the present invention. Is represented.

【0016】上記課題を解決するために,本発明の第一
の構成は,図1を参照して,被処理体7に処理液9を供
給する吐出口6と,処理液保存容器13から該吐出口6
へ該処理液9を輸送する処理液供給管路8と,該処理液
供給管路8に介設されて該処理液供給管路8の該吐出口
6方向に該処理液9を圧送するポンプ1と,該ポンプ1
と該吐出口6との間の該処理液供給管路8に介設された
フィルター3と,該フィルター3と該吐出口6との間の
該処理液供給管路8に介設された流量制御弁4とを備え
た処理装置において,該ポンプ1と該フィルター3との
間の該処理液供給管路8に設けられ,該処理液供給管路
8内の該処理液9の圧力を測定する圧力計2と,該処理
液9の圧送終了信号21bを受けて,該ポンプ1を停止
させる停止信号22b及び該流量制御弁4を閉鎖させる
閉鎖信号23bをそれぞれ該ポンプ1及び該流量制御弁
4に送信するコントローラ15と,該圧力計2の出力を
観測して,該圧送終了信号21bの受信直後に発生する
該圧力の低下量が,予め設定された設定圧力を超えたと
きにフィルター3の目詰り警報20を発生する圧力計測
部10とを有することを特徴として構成し,第二の構成
は,第一の構成の処理装置において,並列に接続された
複数の該フィルター3のなかから任意に選択された一つ
の該フィルター3a,3bに,該処理液9の流路を切り
換える管路切り換え回路16を備え,該目詰り警報20
を受けて,該管路切り換え回路16を切り換えることを
特徴として構成する。
In order to solve the above-mentioned problems, a first configuration of the present invention, as shown in FIG. 1, comprises a discharge port 6 for supplying a processing liquid 9 to an object to be processed 7 and a processing liquid storage container Discharge port 6
A processing liquid supply pipe 8 for transporting the processing liquid 9 to the processing liquid, and a pump interposed in the processing liquid supply pipe 8 for pressure-feeding the processing liquid 9 toward the discharge port 6 of the processing liquid supply pipe 8. 1 and the pump 1
A filter 3 provided between the filter 3 and the discharge port 6, and a flow rate provided between the filter 3 and the discharge port 6. In a processing apparatus having a control valve 4, a pressure of the processing liquid 9 in the processing liquid supply pipe 8 is provided in the processing liquid supply pipe 8 between the pump 1 and the filter 3. In response to the pressure gauge 2 and the signal 21b for terminating the pressure of the processing liquid 9, the stop signal 22b for stopping the pump 1 and the closing signal 23b for closing the flow control valve 4 are sent to the pump 1 and the flow control valve, respectively. 4 and the output of the pressure gauge 2 are observed, and when the amount of decrease in the pressure, which occurs immediately after the reception of the pumping end signal 21b, exceeds a preset pressure, the filter 3 is used. Pressure measuring unit 10 for generating a clogging alarm 20 The second configuration is characterized in that, in the processing device of the first configuration, the filters 3a and 3b arbitrarily selected from the plurality of filters 3 connected in parallel are provided with the filters 3a and 3b. A line switching circuit 16 for switching the flow path of the processing liquid 9 is provided.
In response to this, the pipeline switching circuit 16 is switched.

【0017】本発明の発明者は,フィルター入口の処理
液供給管路内圧力が,処理液の吐出期間経過直後に低下
する現象を見いだし,この圧力の低下量がフィルターの
目詰りの程度に対応することを確認した。なお,この圧
力低下は,吐出期間経過後の短時間,例えば吐出期間終
了時から0.2〜0.8秒以内に生ずるもので,フィル
ターの目詰りが無いときに吐出期間終了時から数秒間続
く緩やかな圧力低下とは明確に識別される。本発明はか
かる事実に基づき考案された。
The inventor of the present invention has found a phenomenon that the pressure in the processing liquid supply pipe at the filter inlet decreases immediately after the discharge period of the processing liquid, and the amount of the decrease corresponds to the degree of clogging of the filter. Make sure you do. Note that this pressure drop occurs for a short time after the discharge period elapses, for example, within 0.2 to 0.8 seconds after the end of the discharge period, and when there is no clogging of the filter, several seconds after the end of the discharge period. Subsequent gradual pressure drops are clearly distinguished. The present invention has been devised based on this fact.

【0018】本発明の第一の構成では,図1を参照し
て,処理液保存容器13と吐出口6とを接続する処理液
供給管路8に,ポンプ1,圧力計2,フィルター3及び
流量制御弁4がこの順に設けられる。さらに,吐出期間
の終了を伝える圧送終了信号21bを受けたコントロー
ラ15は,ポンプ1に停止信号22bを,流量制御弁4
に閉鎖信号23bを送信して,ポンプ1を停止しかつ流
量制御弁4を閉じ,処理液9の吐出動作を終了させる。
なお,圧送終了信号21bはコントローラ15の内部で
発生させてもよく,また外部の制御機器から送信するこ
ともできる。
In the first configuration of the present invention, referring to FIG. 1, a pump 1, a pressure gauge 2, a filter 3 and a pump 3 are connected to a processing liquid supply pipe 8 connecting the processing liquid storage container 13 and the discharge port 6. The flow control valves 4 are provided in this order. Further, the controller 15 having received the pressure feed end signal 21b notifying the end of the discharge period sends the stop signal 22b to the pump 1
, The pump 1 is stopped, the flow control valve 4 is closed, and the discharge operation of the processing liquid 9 is terminated.
The pumping end signal 21b may be generated inside the controller 15, or may be transmitted from an external control device.

【0019】他方,圧送終了信号21bは圧力計測部1
0にも送信される。圧力計測部10は,圧力計2の出力
を観測し,圧送終了信号21bの受信直後の所定期間内
に生ずる圧力低下を測定する。この所定期間は,既述し
たフィルターの目詰りに起因する圧力低下が十分に観測
できる程度に長く,他方フィルターの目詰りが無いとき
に吐出期間終了時から数秒間続く緩やかな圧力低下と区
別できる程度に短くなくてはならない。通常この所定期
間は実験的に定めることができ,吐出機構又は処理液に
依存するが,例えばレジスト塗布装置では0.2〜1秒
程度である。
On the other hand, the pressure sending end signal 21b is
Also transmitted to 0. The pressure measuring unit 10 observes the output of the pressure gauge 2 and measures a pressure drop that occurs within a predetermined period immediately after receiving the pumping end signal 21b. This predetermined period is long enough that the pressure drop due to the filter clogging described above can be sufficiently observed, and can be distinguished from a gradual pressure drop that lasts several seconds from the end of the discharge period when the filter is not clogged. Must be as short as possible. Usually, this predetermined period can be determined experimentally and depends on the discharge mechanism or the processing liquid, but is, for example, about 0.2 to 1 second in a resist coating apparatus.

【0020】さらに,圧力計測部10は,圧送終了信号
21bの受信直後の圧力低下量が予め与えられている設
定圧力を超えたときにフィルター3の目詰りが検知され
たと認識し,目詰り警報20を発生する。この目詰り警
報20に基づいて,必要な操作,例えばフィルターの交
換,被処理体の搬送ががなされる。ここで,予め与えら
れている設定圧力は,フィルター3の交換が必要な程度
に目詰りを起こした場合に観測される吐出期間経過直後
に低下する圧力とし,実験的に求めることができる。
Further, the pressure measuring unit 10 recognizes that clogging of the filter 3 has been detected when the amount of pressure drop immediately after receiving the pressure-feeding end signal 21b exceeds a predetermined pressure, and issues a clogging alarm. Generate 20. On the basis of the clogging alarm 20, necessary operations, for example, replacement of a filter and conveyance of an object to be processed are performed. Here, the preset pressure given in advance is a pressure that decreases immediately after the discharge period, which is observed when the filter 3 is clogged to a necessary degree, and can be experimentally obtained.

【0021】本構成では,フィルターの目詰りを検出す
るために,吐出期間経過後の短期間の圧力変化を観測す
れば足りる。従って,ポンプの調整等により吐出期間の
圧力が変動しても,圧力変化を圧力の絶対値で規格化
し,この規格化した圧力変化を設定圧力と比較すること
でフィルターの目詰りの程度を正確に評価することがで
きる。従って,圧力の絶対値を測定する必要はなく,圧
力計の精密な調整を必要としない。さらに,圧力が変動
しても規格化された設定圧力はあまり変化しないから,
初めに設定圧力を求めた後はポンプの調整ごとに設定圧
力を再度実験的に求める必要がない。また,本構成では
一個の圧力計を設置することで足り,複数の圧力計間の
調整も不要であり,かつ処理装置が安価に製造できる。
In this configuration, in order to detect clogging of the filter, it is sufficient to observe a short-term pressure change after the elapse of the discharge period. Therefore, even if the pressure during the discharge period fluctuates due to adjustment of the pump, the pressure change is normalized by the absolute value of the pressure, and the normalized pressure change is compared with the set pressure to accurately determine the degree of filter clogging. Can be evaluated. Therefore, there is no need to measure the absolute value of the pressure, and no precise adjustment of the pressure gauge is required. Furthermore, even if the pressure fluctuates, the standardized set pressure does not change much.
After the initial set pressure is determined, it is not necessary to experimentally determine the set pressure again each time the pump is adjusted. Further, in this configuration, it is sufficient to install one pressure gauge, and adjustment between a plurality of pressure gauges is not required, and the processing apparatus can be manufactured at low cost.

【0022】本発明の第二の構成では,図5を参照し
て,複数のフィルター3a,3bが切り換え回路16を
介して並列に接続される。切り換え回路16は,複数の
フィルター3a,3bの中から選択された一つのフィル
ター3aに処理液9を送出する。そして,目詰り警報2
0を受信すると切り換え回路は切り換わり,それまで使
用していない他のフィルター3bに処理液9を送出す
る。
In the second configuration of the present invention, referring to FIG. 5, a plurality of filters 3a and 3b are connected in parallel via a switching circuit 16. The switching circuit 16 sends out the processing liquid 9 to one filter 3a selected from the plurality of filters 3a and 3b. And clogging alarm 2
When 0 is received, the switching circuit is switched to send the processing liquid 9 to another filter 3b that has not been used.

【0023】本構成では,フィルターが目詰りを起こす
と自動的に他のフィルターに切り換わるため,処理装置
を停止する必要がない。また,目詰りを生じたフィルタ
ーは切り換え回路により処理液が圧送されている処理液
供給管路から切り離されるため,処理装置を運転した状
態で交換することができる。
In this configuration, when the filter is clogged, the filter is automatically switched to another filter, so that there is no need to stop the processing device. Further, the clogged filter is separated from the processing liquid supply pipe to which the processing liquid is being fed under pressure by the switching circuit, so that the filter can be replaced while the processing apparatus is operating.

【0024】[0024]

【発明の実施の形態】本発明の第一実施形態例は,半導
体ウエーハを被処理体とし,レジストを処理液とする処
理装置,即ちレジスト塗布装置に関する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The first embodiment of the present invention relates to a processing apparatus using a semiconductor wafer as an object to be processed and a resist as a processing liquid, that is, a resist coating apparatus.

【0025】図1を参照して,被処理体7たるウエーハ
は,回転機構12により垂直軸回りに回転駆動される回
転台11上に水平に載置される。被処理体7の直上に吐
出口6が設けられ,吐出口6近くにサックバック5が設
けられる。処理液保存容器13と吐出口6とは処理液供
給管路8により接続され,処理液保存容器13内の処理
液9は処理液供給管路8に介設されたポンプ1により吐
出口6まで圧送される。処理液保存容器13内圧力はガ
ス供給管14を通して一定圧に保持される。流量制御弁
4がポンプ1と吐出口との間に設けられる。以上の構成
は既述の従来例と同様である。
Referring to FIG. 1, a wafer serving as an object to be processed 7 is placed horizontally on a turntable 11 driven to rotate about a vertical axis by a rotation mechanism 12. The discharge port 6 is provided directly above the workpiece 7, and the suck back 5 is provided near the discharge port 6. The processing liquid storage container 13 and the discharge port 6 are connected by a processing liquid supply pipe 8, and the processing liquid 9 in the processing liquid storage container 13 is discharged to the discharge port 6 by the pump 1 provided in the processing liquid supply pipe 8. Pumped. The pressure inside the processing liquid storage container 13 is maintained at a constant pressure through a gas supply pipe 14. A flow control valve 4 is provided between the pump 1 and the discharge port. The above configuration is the same as the above-described conventional example.

【0026】図4は本発明の第一実施形態例ポンプ概念
図であり,本発明の第一及び第二実施形態例の処理装置
に使用したポンプを表している。図4を参照して,ポン
プ1はベローズ26とエアーアクチュエータ27とを主
要部として構成される。ベローズ26はエアーアクチュ
エータ27のピストン27aにより伸縮され,処理液9
を入口26aから吸引し,出口26bから圧送する。な
お,入口26a及び出口26bは処理液供給管路8に接
続されている。エアーアクチュエータ27は,コントロ
ーラ15から送信されるコントロール信号27cにより
制御される弁を通してエア入口から供給されるエアによ
り作動する。
FIG. 4 is a conceptual view of a pump according to the first embodiment of the present invention, showing a pump used in the processing apparatus according to the first and second embodiments of the present invention. Referring to FIG. 4, pump 1 is mainly configured by bellows 26 and air actuator 27. The bellows 26 is expanded and contracted by a piston 27a of an air actuator 27,
Is sucked from the inlet 26a and is pressure-fed from the outlet 26b. The inlet 26a and the outlet 26b are connected to the processing liquid supply pipe 8. The air actuator 27 is operated by air supplied from an air inlet through a valve controlled by a control signal 27c transmitted from the controller 15.

【0027】フィルター3は,図1を参照して,ポンプ
1と流量制御弁4との間に介設される。フィルター3と
ポンプ1との間の圧力,即ちフィルター3の入口側の処
理液供給管路8内の圧力を測定する圧力計2が設けられ
る。圧力計測部10は,圧力計2が指示する処理液供給
管路8内圧力と圧力計測部10の内部に予め記憶されて
いる設定圧力とを比較する。
Referring to FIG. 1, the filter 3 is provided between the pump 1 and the flow control valve 4. A pressure gauge 2 is provided for measuring the pressure between the filter 3 and the pump 1, that is, the pressure in the processing liquid supply pipe 8 on the inlet side of the filter 3. The pressure measurement unit 10 compares the pressure in the processing liquid supply pipe 8 indicated by the pressure gauge 2 with a preset pressure stored in the pressure measurement unit 10 in advance.

【0028】コントローラ15は,処理装置全体のシー
ケンスを制御する電子回路を主要部とし,マイクロプロ
セッサ,記憶装置及び入出力回路の他,ポンプ1等の機
器制御に必要な周辺回路を含み構成される。このコント
ローラ15は,その内部でシーケンスプログラムに従い
処理液吐出期間を画定する圧送制御信号21を作成す
る。圧送制御信号21は,吐出期間を表す信号,例えば
吐出期間継続する高レベルの電気信号と,吐出期間以外
の期間は処理液の吐出停止期間を表す信号,例えば低レ
ベルの電気信号とからなり,吐出停止期間を表す信号か
ら吐出期間を表す信号への移行を圧送開始信号21aと
し,吐出期間を表す信号から吐出停止期間を表す信号へ
の移行を圧送終了信号21bとして構成される。処理装
置の各部はこれらの信号に基づいてコントローラ15に
より制御される。
The controller 15 mainly includes an electronic circuit for controlling the sequence of the entire processing apparatus, and includes a microprocessor, a storage device, an input / output circuit, and peripheral circuits necessary for controlling equipment such as the pump 1. . The controller 15 generates a pressure feed control signal 21 for defining a processing liquid discharge period according to a sequence program therein. The pumping control signal 21 is composed of a signal indicating a discharge period, for example, a high-level electric signal that continues during the discharge period, and a period other than the discharge period, a signal indicating a discharge stop period of the processing liquid, for example, a low-level electric signal. The transition from the signal indicating the ejection stop period to the signal indicating the ejection period is configured as a pumping start signal 21a, and the transition from the signal indicating the ejection period to the signal indicating the ejection stop period is configured as the pumping end signal 21b. Each part of the processing device is controlled by the controller 15 based on these signals.

【0029】以下,本第一実施形態例に係るレジスト塗
布装置の動作を説明する。図1を参照して,先ず,被処
理体7を回転台11上に載置されたことを確認した後,
コントローラは圧送開始信号21aを生成し,この圧送
開始信号21aをトリガとして作動信号22a及び開放
信号23aを生成する。なお,圧送開始信号21a生成
後の圧送制御信号21は吐出期間を表示する。作動信号
22aはポンプ制御信号22としてポンプ1に送信さ
れ,これを受信したポンプ1は圧送動作を開始する。開
放信号23aは弁制御信号23として流量制御弁4に送
信され,これを受信した流量制御弁4は処理液供給管路
8を開く。その結果,処理液9は処理液供給管路8内を
圧送され,吐出口から被処理体7上に供給される。
Hereinafter, the operation of the resist coating apparatus according to the first embodiment will be described. Referring to FIG. 1, first, after confirming that the object 7 is placed on the turntable 11,
The controller generates a pumping start signal 21a, and uses the pumping start signal 21a as a trigger to generate an activation signal 22a and an opening signal 23a. Note that the pumping control signal 21 after the pumping start signal 21a is generated indicates the ejection period. The operation signal 22a is transmitted to the pump 1 as the pump control signal 22, and the pump 1 receiving this starts the pumping operation. The release signal 23a is transmitted to the flow control valve 4 as the valve control signal 23, and the flow control valve 4 which has received the signal opens the processing liquid supply pipe 8. As a result, the processing liquid 9 is pressure-fed in the processing liquid supply pipe 8 and is supplied onto the processing target 7 from the discharge port.

【0030】圧送開始信号21a発生時から吐出期間を
経過すると,圧送制御信号21は吐出停止期間を表示す
る信号に移行し,圧送終了信号21bが発生する。コン
トローラ15は,圧送終了信号21bをトリガとして閉
鎖信号23b及び停止信号22bを発生し,それぞれ弁
制御信号23として流量制御弁4及びポンプ制御信号と
してポンプ1に送信する。閉鎖信号23bを受信した流
量制御弁4は,処理液供給管路8を閉じ処理液9の被処
理体7への供給を停止する。停止信号22bを受信した
ポンプ1は停止し,処理液9の圧送を停止する。さらに
コントローラ15は圧送終了信号21bを圧力計測部1
0に送信し,これを受信した圧力計測部10は吐出期間
終了後の圧力低下量の測定を開始する。次に圧力計測部
10の動作を説明する。
When the ejection period has elapsed since the generation of the pumping start signal 21a, the pumping control signal 21 shifts to a signal indicating the ejection stop period, and the pumping end signal 21b is generated. The controller 15 generates the closing signal 23b and the stop signal 22b by using the pumping end signal 21b as a trigger, and transmits the closing signal 23b and the stop signal 22b to the pump 1 as the valve control signal 23 and the pump control signal as the pump control signal, respectively. Upon receiving the closing signal 23b, the flow control valve 4 closes the processing liquid supply pipe 8 and stops the supply of the processing liquid 9 to the processing target 7. Upon receiving the stop signal 22b, the pump 1 stops, and the pumping of the processing liquid 9 stops. Further, the controller 15 sends the pressure sending end signal 21b to the pressure measuring unit 1
The pressure measurement unit 10 transmits the value to 0, and starts measuring the pressure drop after the end of the ejection period. Next, the operation of the pressure measuring unit 10 will be described.

【0031】図6は本発明の第一実施形態例圧力変動を
表す図であり,圧力計により観測されたフィルター入口
側の処理液供給管路内圧力の吐出期間経過時前後の変動
を表している。図6(a)はフィルター3の目詰りがな
い場合の圧力変動を,図6(c)はフィルター3の交換
を必要とする程度の目詰りが発生している場合の圧力変
動を,及び図(b)はフィルター3の目詰りの程度が図
6(a)と(b)との中間の場合の圧力変動を表してい
る。
FIG. 6 is a graph showing pressure fluctuations in the first embodiment of the present invention, and shows fluctuations in the pressure in the processing liquid supply line on the filter inlet side before and after the discharge period, which is observed by a pressure gauge. I have. FIG. 6A shows the pressure fluctuation when the filter 3 is not clogged, and FIG. 6C shows the pressure fluctuation when the filter 3 is clogged to the extent that the filter 3 needs to be replaced. 6B shows the pressure fluctuation when the degree of clogging of the filter 3 is intermediate between FIGS. 6A and 6B.

【0032】図6を参照して,圧力計測部10は,圧送
制御信号21の吐出期間24表示から吐出停止期間25
表示への変化を圧送終了信号21bとして受信し,圧送
終了信号21b受信時t1 から予め長さが定められた測
定期間が経過する時t2 までの間一定の時間間隔で圧力
計2の出力のサンプリングを開始する。この測定期間t
1 〜t2 の長さt2 −t1 は,例えば0.2秒〜1.0
秒とする。図6(a)を参照して,フィルターの目詰り
に起因しない圧力の低下は通常は数秒〜十数秒間を要す
るから,かかる短い測定期間の間に生ずる圧力低下ΔP
は極めて小さく,通常は無視できる。これに対してフィ
ルターの目詰りがある場合の圧力低下は,図6(b)及
び(c)を参照して,この測定期間内にほぼ終了する。
従って,この程度の測定期間とすることで,フィルター
の目詰りに起因する圧力低下のみを分離して測定するこ
とができる。
Referring to FIG. 6, the pressure measuring unit 10 changes the display of the discharge period 24 of the pressure feed control signal 21 from the discharge stop period 25
Receiving a change to the display as a pumping end signal 21b, pumping end signal 21b received at t regular time intervals the pressure gauge 2 outputs between 1 and t 2 when the advance length has passed the measurement period determined Start sampling. This measurement period t
1 length t 2 -t 1 of ~t 2, for example 0.2 seconds to 1.0
Seconds. Referring to FIG. 6 (a), since the pressure drop not caused by the filter clogging usually requires several seconds to several tens of seconds, the pressure drop ΔP occurring during such a short measurement period.
Is extremely small and can usually be ignored. On the other hand, the pressure drop when the filter is clogged almost ends within this measurement period with reference to FIGS. 6 (b) and 6 (c).
Therefore, by setting the measurement period to this extent, it is possible to separately measure only the pressure drop caused by the filter clogging.

【0033】圧力低下量の測定は,測定期間t1 〜t2
内に測定された圧力の最大値と最小値との差として求め
られる。この差を求めるには,圧力変動量を求める方法
として一般的に使用される方法を適用することができ
る。例えば,圧送終了信号21bにより開始された圧力
の最初のサンプリング値を記憶し,その記憶値を順次そ
の後のサンプリング値と比較し,記憶値を大きい値に置
き換えることで圧力の最大値が求まる。また,最初のサ
ンプリング値を他の記憶装置に記憶し,その記憶値を小
さい値に置き換えることで圧力の最小値が求まる。
The measurement of the pressure drop is performed during the measurement period t 1 to t 2
Is determined as the difference between the maximum and minimum values of the pressure measured within. In order to obtain this difference, a method generally used as a method for obtaining the amount of pressure fluctuation can be applied. For example, the maximum value of the pressure is obtained by storing the first sampling value of the pressure started by the pumping end signal 21b, sequentially comparing the stored value with the subsequent sampling value, and replacing the stored value with a larger value. Further, the minimum value of the pressure is obtained by storing the first sampling value in another storage device and replacing the stored value with a smaller value.

【0034】測定期間の終了後,圧力の最大値と圧力の
最小値の差を圧力の最大値で正規化した圧力低下量〔Δ
P〕を求め,この〔ΔP〕が予め記憶されている設定圧
力を超えたとき目詰りが検出されたとして目詰り警報2
0を出力する。なお,設定圧力はフィルターの交換が必
要となる目詰り状態にあるときの圧力低下量を実験的に
求め,上記と同様に正規化した値を用いる。
After the end of the measurement period, the difference between the maximum value of the pressure and the minimum value of the pressure is normalized by the maximum value of the pressure, and the pressure drop amount [Δ
P] is obtained, and when this [ΔP] exceeds a preset pressure stored in advance, it is determined that clogging has been detected.
Outputs 0. The set pressure is obtained by experimentally obtaining the amount of pressure drop when the filter is in a clogged state in which the filter needs to be replaced, and uses a value normalized as described above.

【0035】目詰り警報を受けたコントローラは,図1
を参照して,回転機構12の作動を中止すると共に被処
理体7を所定の位置に収容する。同時に,警報ランプを
点灯し操作員にフィルター3交換の必要を知らせる。そ
の後,シーケンスを停止し,待機状態に入る。通常,フ
ィルター3交換後にコントローラは再起動され,その後
の処理が続行される。
The controller receiving the clogging alarm is shown in FIG.
, The operation of the rotation mechanism 12 is stopped, and the object 7 is accommodated in a predetermined position. At the same time, the alarm lamp is turned on to notify the operator that the filter 3 needs to be replaced. After that, the sequence is stopped and the apparatus enters a standby state. Normally, the controller is restarted after the filter 3 is replaced, and the subsequent processing is continued.

【0036】図2は本発明の第一実施形態例ウエーハ搬
送図,図3は本発明の第一実施形態例他のウエーハ搬送
図であり,ウエーハの収容位置及び収容されたウエーハ
の方位を平面図により表している。図2を参照して,被
処理体7であるウエーハはカセットに収容され,セッテ
ング部31に装着される。次に,一枚の被処理体7が塗
布部32の回転台11上に搬送され,レジスト(処理液
9)を上面に供給された後,目詰り警報が出力されない
ときはスピン塗布される。次に,この目詰り警報が出力
されず正常処理された被処理体7aは,乾燥部33で乾
燥され,さらに収容部34のカセットに収容される。レ
ジスト(処理液9)を上面に供給された後,目詰り警報
が出力されたときはスピン塗布が中止され,この目詰り
警報が出力されたときの被処理体7bは,異常処理被処
理体7b(図2及び図3中に破線で表示している。)と
して異常時収納部35に収容される。図3の処理装置で
は,図2の装置の異常時収納部35を設けず,収容部3
4に正常に処理された被処理体7aと異常処理被処理体
7bとを収容する。このとき,異常処理被処理体7bは
180度回転して収容されるので,収容部34に収納さ
れた異常処理被処理体7bのオリエンテーション・ファ
セットの位置は正常処理された被処理体7aとは逆にな
り,両者を容易に識別できる。
FIG. 2 is a wafer transfer diagram of the first embodiment of the present invention, and FIG. 3 is a wafer transfer diagram of another wafer of the first embodiment of the present invention. The wafer storage position and the orientation of the stored wafer are shown in a plan view. This is shown in the figure. Referring to FIG. 2, the wafer as the object to be processed 7 is accommodated in a cassette and mounted on the setting section 31. Next, one object to be processed 7 is conveyed onto the turntable 11 of the application unit 32, and after the resist (the processing liquid 9) is supplied to the upper surface, when no clogging alarm is output, spin coating is performed. Next, the processed object 7a that has been normally processed without outputting the clogging alarm is dried in the drying unit 33 and further stored in the cassette of the storage unit 34. When the clogging alarm is output after the resist (processing liquid 9) is supplied to the upper surface, the spin coating is stopped, and the processing target 7b when the clogging warning is output is an abnormally processed target. 7b (shown by a broken line in FIGS. 2 and 3) is stored in the abnormal-time storage section 35. In the processing apparatus shown in FIG. 3, the storage unit 35 of the apparatus shown in FIG.
4 accommodates the processed object 7a and the abnormally processed object 7b that have been processed normally. At this time, since the abnormally processed object 7b is accommodated by being rotated by 180 degrees, the position of the orientation facet of the abnormally processed object 7b accommodated in the accommodating portion 34 is different from that of the normally treated object 7a. On the contrary, both can be easily identified.

【0037】本発明の第二実施形態例は,フィルター3
を除いて第一実施例と同様の構成である。図5を参照し
て,本実施形態例では2個のフィルター3a,3bが並
列に設けられる。各フィルター3a,3bの出入口には
管路切り換え回路16が挿入され,この管路切り換え回
路16により選択された一方のフィルター3aにのみ処
理液が圧送される。他方のフィルター3bは処理液供給
管路8から切り離されている。従って,目詰り警報20
が出力されないときは,処理液9はこの一方のフィルタ
ー3aにより濾過される。
In the second embodiment of the present invention, the filter 3
The configuration is the same as that of the first embodiment except for. Referring to FIG. 5, in this embodiment, two filters 3a and 3b are provided in parallel. A pipeline switching circuit 16 is inserted into the entrance of each of the filters 3a and 3b, and the processing liquid is pumped only to one of the filters 3a selected by the pipeline switching circuit 16. The other filter 3 b is separated from the processing liquid supply pipe 8. Therefore, the clogging alarm 20
Is not output, the processing liquid 9 is filtered by the one filter 3a.

【0038】管路切り換え回路16は,目詰り警報20
を受信すると目詰りを起こした一方のフィルター3aへ
の処理液流路を遮断し,同時に残りの他のフィルター3
bに処理液流路を切り換える。このとき,異常処理され
た被処理体の処置は第一実施形態例と同様になされる。
その後コントローラは自動的に再起動し,異常処理され
た被処理体に続く次の被処理体は,正常に処理される。
目詰りを起こしたフィルター3aは処理液供給管路8か
ら切り離されているから,処理装置を運転した状態で新
品と交換することができる。従って,この実施形態例で
は,フィルター交換のために処理装置を停止する必要が
なく,スループットを高くすることができる。
The line switching circuit 16 includes a clogging alarm 20.
Received, the processing solution flow path to one of the filters 3a, which has clogged, is shut off, and
The processing liquid flow path is switched to b. At this time, the treatment of the object to be processed abnormally is performed in the same manner as in the first embodiment.
Thereafter, the controller is automatically restarted, and the next object following the abnormally processed object is processed normally.
Since the clogged filter 3a is separated from the processing liquid supply line 8, it can be replaced with a new one while the processing apparatus is operating. Therefore, in this embodiment, it is not necessary to stop the processing device for replacing the filter, and the throughput can be increased.

【0039】[0039]

【発明の効果】上述したように本発明によれば,フィル
ターの目詰りを処理液吐出期間経過直後の圧力低下を測
定することで検出するので,一つの圧力計を用いてポン
プ送出圧等の変動の影響を受けることなくフィルターの
目詰りを検出することができ,検出精度が高くかつ安価
な処理装置を提供することができる。また,目詰り発生
時及びフィルター交換時に装置の運転停止を必要としな
いので,スループットの高い処理装置を提供することが
できる。
As described above, according to the present invention, the clogging of the filter is detected by measuring the pressure drop immediately after the elapse of the treatment liquid discharge period. It is possible to detect clogging of the filter without being affected by fluctuations, and to provide a processing device with high detection accuracy and low cost. Further, since it is not necessary to stop the operation of the apparatus when clogging occurs and when replacing the filter, it is possible to provide a processing apparatus having a high throughput.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の第一実施形態例構成図FIG. 1 is a configuration diagram of a first embodiment of the present invention.

【図2】 本発明の第一実施形態例ウエーハ搬送図FIG. 2 is a wafer transfer diagram of the first embodiment of the present invention.

【図3】 本発明の第一実施形態例他のウエーハ搬送図FIG. 3 is another wafer transfer diagram of the first embodiment of the present invention.

【図4】 本発明の第一実施形態例ポンプ概念図FIG. 4 is a conceptual diagram of a pump according to a first embodiment of the present invention.

【図5】 本発明の第二実施形態例構成図FIG. 5 is a configuration diagram of a second embodiment of the present invention.

【図6】 本発明の第一実施例圧力変動を表す図FIG. 6 is a diagram showing pressure fluctuations in the first embodiment of the present invention.

【図7】 従来例処理装置概念図FIG. 7 is a conceptual diagram of a conventional processing apparatus.

【図8】 処理液供給管路内圧力の変化を表す図FIG. 8 is a diagram showing a change in pressure in a processing liquid supply pipe.

【符号の説明】[Explanation of symbols]

1 ポンプ 2,2a,2b 圧力計 3,3a,3b フィルター 4 流量制御弁 5 サックバック 6 吐出口 7,7a,7b 被処理体 8 処理液供給管路 9 処理液 10 圧力計測部 10a 差圧検出器 11 回転台 12 回転機構 13 処理液保存容器 14 ガス供給管 15 コントローラ 16 管路切り換え回路 20 目詰り警報 21 圧送制御信号 21a 圧送開始信号 21b 圧送終了信号 22 ポンプ制御信号 22a 作動信号 22b 停止信号 23 弁制御信号 23a 開放信号 23b 閉鎖信号 24 吐出期間 25 吐出停止期間 26 ベローズ 27 エアーアクチュエータ 31 セッテング部 32 塗布部 33 乾燥部 34 収容部 35 異常時収納部 DESCRIPTION OF SYMBOLS 1 Pump 2, 2a, 2b Pressure gauge 3, 3a, 3b Filter 4 Flow control valve 5 Suck back 6 Discharge port 7, 7, a, 7b Workpiece 8 Processing liquid supply line 9 Processing liquid 10 Pressure measuring unit 10a Differential pressure detection Apparatus 11 Turntable 12 Rotary mechanism 13 Processing liquid storage container 14 Gas supply pipe 15 Controller 16 Pipeline switching circuit 20 Clogging alarm 21 Pumping control signal 21a Pumping start signal 21b Pumping ending signal 22 Pump control signal 22a Operating signal 22b Stop signal 23 Valve control signal 23a Open signal 23b Close signal 24 Discharge period 25 Discharge stop period 26 Bellows 27 Air actuator 31 Setting part 32 Coating part 33 Drying part 34 Storage part 35 Abnormal storage part

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 被処理体に処理液を供給する吐出口と,
処理液保存容器から該吐出口へ該処理液を輸送する処理
液供給管路と,該処理液供給管路に介設されて該処理液
供給管路の該吐出口方向に該処理液を圧送するポンプ
と,該ポンプと該吐出口との間の該処理液供給管路に介
設されたフィルターと,該フィルターと該吐出口との間
の該処理液供給管路に介設された流量制御弁とを備えた
処理装置において,該ポンプと該フィルターとの間の該
処理液供給管路に設けられ,該処理液供給管路内の該処
理液の圧力を測定する圧力計と,該処理液の圧送終了信
号を受けて,該ポンプを停止させる停止信号及び該流量
制御弁を閉鎖させる閉鎖信号をそれぞれ該ポンプ及び該
流量制御弁に送信するコントローラと,該圧力計の出力
を観測して,該圧送終了信号の受信直後に発生する該圧
力の低下量が,予め設定された設定圧力を超えたときに
フィルターの目詰り警報を発生する圧力計測部とを有す
ることを特徴とする処理装置。
A discharge port for supplying a processing liquid to an object to be processed;
A processing liquid supply pipe for transporting the processing liquid from the processing liquid storage container to the discharge port, and a pressure supply of the processing liquid toward the discharge port of the processing liquid supply pipe interposed between the processing liquid supply pipe and the processing liquid supply pipe. Pump, a filter provided in the processing liquid supply pipe between the pump and the discharge port, and a flow rate provided in the processing liquid supply pipe between the filter and the discharge port. A processing device provided with a control valve, a pressure gauge provided in the processing liquid supply pipe between the pump and the filter, for measuring a pressure of the processing liquid in the processing liquid supply pipe; In response to the processing solution pressure stop signal, the controller sends a stop signal for stopping the pump and a closing signal for closing the flow control valve to the pump and the flow control valve, respectively, and observes the output of the pressure gauge. Therefore, the amount of the pressure drop that occurs immediately after the reception of the pumping end signal is determined in advance. Processing apparatus characterized by comprising a pressure measurement unit for generating a clogging alarm filter when exceeding a constant has been set pressure.
【請求項2】 請求項1記載の処理装置において,並列
に接続された複数の該フィルターのなかから任意に選択
された一つの該フィルターに,該処理液の流路を切り換
える管路切り換え回路を備え,該目詰り警報を受けて,
該管路切り換え回路を切り換えることを特徴とする処理
装置。
2. The processing apparatus according to claim 1, wherein a line switching circuit for switching a flow path of the processing liquid is provided to one of the plurality of filters connected in parallel, which is arbitrarily selected. Preparing, receiving the clogging alarm,
A processing device for switching the pipeline switching circuit.
JP4919197A 1997-03-04 1997-03-04 Treatment apparatus Withdrawn JPH10247614A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4919197A JPH10247614A (en) 1997-03-04 1997-03-04 Treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4919197A JPH10247614A (en) 1997-03-04 1997-03-04 Treatment apparatus

Publications (1)

Publication Number Publication Date
JPH10247614A true JPH10247614A (en) 1998-09-14

Family

ID=12824136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4919197A Withdrawn JPH10247614A (en) 1997-03-04 1997-03-04 Treatment apparatus

Country Status (1)

Country Link
JP (1) JPH10247614A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016063205A (en) * 2014-09-22 2016-04-25 株式会社Screenホールディングス Coating applicator
KR20190024722A (en) * 2017-08-28 2019-03-08 도쿄엘렉트론가부시키가이샤 Liquid processing apparatus and liquid processing method
WO2019146255A1 (en) * 2018-01-25 2019-08-01 株式会社Screenホールディングス Substrate treatment device and substrate treatment method
KR102119793B1 (en) * 2020-01-14 2020-06-05 주식회사 신한산기 Filtering apparatus for heat exchange water applied to district heating system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016063205A (en) * 2014-09-22 2016-04-25 株式会社Screenホールディングス Coating applicator
US10600647B2 (en) 2014-09-22 2020-03-24 SCREEN Holdings Co., Ltd. Coating apparatus
KR20190024722A (en) * 2017-08-28 2019-03-08 도쿄엘렉트론가부시키가이샤 Liquid processing apparatus and liquid processing method
WO2019146255A1 (en) * 2018-01-25 2019-08-01 株式会社Screenホールディングス Substrate treatment device and substrate treatment method
KR102119793B1 (en) * 2020-01-14 2020-06-05 주식회사 신한산기 Filtering apparatus for heat exchange water applied to district heating system

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