JPH10231133A - Apparatus for producing oxide glass membrane - Google Patents

Abstract

PROBLEM TO BE SOLVED: To produce an oxide glass membrane homogeneous in the distributions of the thickness of membrane and refractive index by supplying glass fine particles formed through flame hydrolysis of a silicon compound in a hydrogen- oxygen flame burner onto a substrate placed on a turn table having slots to accumulate them on it and heating the resultant glass fine particle layer to make it transparent. SOLUTION: A substrate 2 made of silicon, etc., is placed on a turn table 1 made of quartz, etc., having slots 3 optionally in plural. On the other hand, a silicon compound such as SiCl4 is hydrolyzed in flame of a hydrogen-oxygen flame burner 4, which performs relative motion to the substrate 2 in the X and the Y directions through axes. Fine glass particles formed in this process are supplied onto and accumulated on the substrate 2. During this process, warpage of the substrate 2 generated on heating by the burner is eliminated following the passage of the burner, and the atmospheric gas accumulated on the backside is discharged from the slots 3 to prevent the sliding of the substrate 2. Subsequently, glass fine particle layer formed by the accumulation is heated and sintered to make the layer transparent. Thus, the objective homogeneous oxide glass membrane is obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for producing an oxide glass film, in particular, glass fine particles generated by flame hydrolysis of a silicon compound in an oxyhydrogen flame burner are deposited on a substrate and heated to make it transparent. The present invention relates to an improvement in an apparatus for manufacturing an oxide glass film.

[0002]

2. Description of the Related Art For the production of oxide glass films, SiCl
₄ and TiCl ₄ or SiCl ₄ and GeCl ₄ are supplied to the oxyhydrogen flame burner, and the glass is generated by flame hydrolysis of the raw material gas in the burner, and the oxyhydrogen flame burner and / or the substrate is moved. It is known that glass fine particles are deposited on a substrate to form a porous glass film, which is sintered in an electric furnace at a temperature of 1,200 to 1,400 ° C to form a transparent glass film. (M. Kawachi, Optical and Qu
antum Electronics, 22 , 391-416.1990, JP-A-58-105
No. 11).

In a known oxide glass film manufacturing apparatus, as shown in FIG. 4, a plurality of substrates 12 made of silicon, quartz, or the like are formed on a turntable 11 in order to form a porous vitreous material over the entire surface of a predetermined substrate 12. Put the oxyhydrogen flame burner 13 on the shaft 14 while turning the turntable 11
To reciprocate in the radial direction of the table. In addition, it has been proposed to fix the substrate and scan the exhaust pipe 15 for exhausting the exhaust gas from the burner and excess glass particles in the X direction and the Y direction to obtain a uniform film (actual 7- No. 10323).

[0004]

However, in any of the known devices, since the oxyhydrogen flame passes over the substrate 12,
In the area 12, the area in contact with the oxyhydrogen flame is locally heated.
Before the oxyhydrogen flame burner is used as shown in FIG. 5A, the substrate 12 is set at a predetermined position on the turntable 11, but when the oxyhydrogen flame passes over the substrate 12,
Since the substrate 12 is locally heated, the substrate 12 is warped 16 as shown in FIG. However, when the burner moves, the heating area of the substrate also moves, and the heating is stopped, so that the warpage 16 of the substrate is also eliminated. At this time, as shown in FIG. The substrate 12 slides because there is no outlet for the deposition atmosphere gas (air, nitrogen, inert gas, etc.) that has entered the empty space.
The thickness and refractive index of the formed glass film vary, and a uniform glass film cannot be obtained with good reproducibility.

[0005]

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems. The present invention solves the above problem by using glass particles generated by flame hydrolysis of a silicon compound in an oxyhydrogen flame burner to convert a glass particle on a turntable into a substrate. An oxide glass film manufacturing apparatus for heating a glass fine particle layer by depositing on a glass fine particle layer and making the layer transparent is characterized in that a groove is provided on a turntable on which a substrate is mounted.

[0006]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An oxide glass film manufacturing apparatus according to the present invention has a groove 3 provided in a turntable 1 as shown in FIGS. 1 and 2, and FIGS. 1 (a) and 2 (a). Is a longitudinal sectional view, FIG.
(b) and FIG. 2 (b) are plan views thereof.

As shown in FIG. 1, the apparatus for manufacturing an oxide glass film according to the present invention comprises a turntable 1 made of quartz or carbon and a substrate 2 made of silicon or quartz. This is because the grooves 3 are provided in the turntable, and when glass particles produced in an oxyhydrogen flame burner are deposited on the substrate 2, the substrate 2 is warped by the heating of the burner. Accordingly, when the warpage of the substrate 2 is eliminated, the deposition atmospheric gas that has entered between the turntable 1 and the warp of the substrate 2
Since the gas is exhausted to the outside through the passage, the effect of eliminating the slide of the substrate 2 accompanying the exhaust of the gas is obtained.

In FIG. 2, a plurality of grooves 3 are provided, and according to this, the sliding of the substrate 2 when the warpage of the substrate 2 is eliminated after passing through the oxyhydrogen flame burner is completely eliminated. The length of the groove 3 provided in the turntable 1 according to the present invention is set so that the deposition atmosphere gas that has entered the space between the turntable 1 and the substrate 2 generated by the warpage of the substrate 2 is completely exhausted to the outside. It is necessary that the diameter and width of the groove 3 are larger than the diameter of the substrate 2. However, when the substrate 2 is heated from below the turntable, the in-plane temperature distribution on the substrate surface is not increased. , Width and depth are preferably in the range of about 1 mm to 5 mm.

According to the apparatus for manufacturing an oxide glass film of the present invention, the synthetic quartz glass produced therefrom has a thickness variation of 3% or less and a refractive index variation of 0.0001 or less. Therefore, it can be used as a cladding layer or a core layer of an optical waveguide.

[0010]

Next, examples of the present invention and comparative examples will be described. EXAMPLE An apparatus for manufacturing an oxide glass film shown in FIG. 3 was used, which was a quartz turntable 1 having a diameter of 800 mm and a thickness of 1 mm.
And 9 silicon substrates 2 each having a diameter of 10 mm and a thickness of 0.5 mm are provided. An oxyhydrogen flame is directed from an oxyhydrogen flame burner 4 having a movable shaft 5 to the substrate 2, and the oxyhydrogen flame burner 4 is turned on. Glass fine particles generated by the flame hydrolysis of the supplied silicon compound were deposited on the substrate 2, and excess glass fine particles were exhausted by the exhaust pipe 6.
Four grooves 3 having a depth of 2 mm and a depth of 2 mm are provided.

At this time, SiCl _{4 is applied} to the oxyhydrogen flame burner _4.
The 120 cc / min, the BBr ₃ 50 cc / min, the POCl ₃ 20 cc / min, H ₂ gas 2.0L / min, the O ₂ gas 4.0 L / min, respectively supplied with Ar gas at 1.6 L / min, the burner 4 was moved at a speed of 20 mm / sec in the X direction and the Y direction orthogonal thereto, and the glass fine particles were deposited on the substrate 2 for 30 minutes so that the stroke length was 16 mm in each of the X direction and the Y direction. No slide occurred on the substrate 2 due to the presence of 3.

Next, the glass fine particles deposited on the substrate are sintered by heating in an electric furnace at 1,250 ° C. for 2 hours in an atmosphere of He gas 1.0 L / min and O ₂ gas 1.0 L / min. As a result, a synthetic quartz glass having a thickness of ± 0.1 μm and a refractive index of 0.0001 with a thickness of 20 μm in the substrate and a uniform refractive index was obtained.

Comparative Example When a glass film was manufactured in the same manner as in the example using an oxide glass film manufacturing apparatus having no groove in the turntable, the substrate was slid on the turntable to reduce the thickness of the glass fine particles. When it was made non-uniform and made transparent by the same method as in the example, the obtained synthetic quartz glass had a dispersion of ± 3 μm with respect to a film thickness of 20 μm, and a non-uniform refractive index.
Transparent areas and translucent areas were mixed.

[0014]

According to the present invention, the sliding of the substrate due to the warpage of the substrate generated by the heat of the oxyhydrogen flame is eliminated.
Variations in the thickness and the refractive index of the glass film deposited on the substrate can be suppressed to a low level, so that synthetic quartz glass obtained by making this transparent can be used as the cladding layer or the core layer of the optical waveguide.

[Brief description of the drawings]

FIG. 1 is a view showing the relationship between a turntable and a substrate of an oxide glass film manufacturing apparatus according to the present invention, wherein (a) is a longitudinal sectional view and (b) is a plan view thereof. .

FIGS. 2A and 2B are diagrams showing another relationship between the turntable and the substrate of the apparatus for manufacturing an oxide glass film of the present invention, wherein FIG. 2A is a longitudinal sectional view and FIG. It is.

FIG. 3 is a perspective view of an apparatus for manufacturing an oxide glass film used in an example of the present invention.

FIG. 4 is a perspective view of a conventionally known apparatus for manufacturing an oxide glass film.

FIGS. 5A and 5B are diagrams showing the relationship between a turntable and a substrate in a conventionally known oxide glass film manufacturing apparatus, wherein FIG. 5A shows a state before a glass film is formed, and FIG. (C) shows a longitudinal sectional view of the sliding state of the substrate after passing through the oxyhydrogen flame burner.

[Explanation of symbols]

 1, 11: turntable 2, 12, substrate 3: groove 4, 13: oxyhydrogen flame burner 5, 14, axis 6, 15, exhaust pipe 16: substrate warpage

Claims (1)

[Claims] 1. A method in which glass fine particles generated by flame hydrolysis of a silicon compound in an oxyhydrogen flame burner are deposited on a substrate on a turntable, and the glass fine particle layer is heated.
An apparatus for manufacturing an oxide glass film, wherein a turntable on which a substrate is mounted is provided with a groove.