JPH10226019A - Adhesive-applied copper foil for paper base material phenol resin copper-clad laminated sheet - Google Patents

Adhesive-applied copper foil for paper base material phenol resin copper-clad laminated sheet

Info

Publication number
JPH10226019A
JPH10226019A JP2936597A JP2936597A JPH10226019A JP H10226019 A JPH10226019 A JP H10226019A JP 2936597 A JP2936597 A JP 2936597A JP 2936597 A JP2936597 A JP 2936597A JP H10226019 A JPH10226019 A JP H10226019A
Authority
JP
Japan
Prior art keywords
copper foil
adhesive
copper
adhesive layer
laminated sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2936597A
Other languages
Japanese (ja)
Inventor
Takuya Iida
拓也 飯田
Ryoichi Narishima
良一 成島
Kazuyoshi Aso
和義 阿曽
Ataru Yokono
中 横野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Denkai Co Ltd
Original Assignee
Nippon Denkai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Denkai Co Ltd filed Critical Nippon Denkai Co Ltd
Priority to JP2936597A priority Critical patent/JPH10226019A/en
Publication of JPH10226019A publication Critical patent/JPH10226019A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Landscapes

  • Laminated Bodies (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide adhesive-applied copper foil for a paper base material phenol resin copper-clad laminated sheet obtained by using non-roughened copper foil not subjected to roughening treatment, not leaving copper particles in a phenol resin after etching when a paper base material phenol resin copper-clad laminated sheet is produced, easy in the formation of a circuit, having peeling strength equal to that obtained when roughened copper foil is used and excellent in solder heat resistance. SOLUTION: In an adhesive-applied copper foil for a paper base material phenol resin copper-clad laminated sheet obtained by providing an adhesive layer to non-roughened copper foil to which coupling agent treatment is applied, the adhesive layer consists of an adhesive layer wherein 1-49 pts.wt. of an epoxy resin is added to 100 pts.wt. of a polyvinyl acetal resin provided on the surface of copper foil and an adhesive layer wherein 50-200 pts.wt. of an epoxy resin is added to 100 pts.wt. of a polyvinyl acetal resin provided on the surface of the laminated sheet.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プリント配線板の
製造に用いられる紙基材フェノール樹脂銅張積層板用接
着剤付銅箔に関する。
The present invention relates to a copper foil with an adhesive for a paper-based phenolic resin-clad laminate used in the manufacture of printed wiring boards.

【0002】[0002]

【従来の技術】民生用電子機器の電子回路には紙基材フ
ェノール樹脂銅張積層板が多用されている。この積層板
はフェノール樹脂を含浸した所定量のクラフト紙と電解
銅箔とを加熱、一体化することにより製造されるのが一
般である。電解銅箔は光沢面及びマット面の二種類の面
を有し、表面の凹凸が大きく接着に適するマット面にポ
リビニルアセタール系接着剤を塗布して用いられてい
る。電解銅箔は硫酸銅を電気分解して製造されるが、電
気分解時に形成される凹凸だけでは十分な接着力が得ら
れないので、粗化処理により微細な銅粒子をその表面に
形成して用いられる。粗化処理は限界電流密度以上の高
電流密度で電気分解を行うため制御が難しく、製造上の
障害となっている。また、粗化処理により形成された銅
粒子は積層板表面のフェノール樹脂中に埋没するため、
回路形成する際、エッチング後に残銅として樹脂中に残
りやすく、絶縁特性を損なうことがある。そこで粗化処
理を行わない無粗化銅箔を紙基材フェノール樹脂銅張積
層板の製造に用いることが望まれていた。
2. Description of the Related Art A paper-based phenol resin copper-clad laminate is frequently used in electronic circuits of consumer electronic devices. This laminate is generally manufactured by heating and integrating a predetermined amount of kraft paper impregnated with a phenol resin and an electrolytic copper foil. Electrodeposited copper foil has two types of surfaces, a glossy surface and a matte surface, and is used by applying a polyvinyl acetal-based adhesive to a matt surface having large irregularities and suitable for bonding. Electrodeposited copper foil is produced by electrolysis of copper sulfate.However, sufficient adhesion is not obtained only by the irregularities formed during electrolysis, so fine copper particles are formed on the surface by roughening treatment. Used. Roughening treatment is difficult to control because electrolysis is performed at a high current density equal to or higher than the limit current density, which is an obstacle to manufacturing. Also, the copper particles formed by the roughening process are buried in the phenolic resin on the surface of the laminate,
When a circuit is formed, copper is likely to remain in the resin as residual copper after etching, which may impair the insulating properties. Therefore, it has been desired to use a non-roughened copper foil which is not subjected to a roughening treatment for the production of a paper-based phenolic resin-clad laminate.

【0003】そこで、接着剤として比較的柔らかい接着
剤、例えばポリビニルブチラールフェノールにヘキサメ
チレンジイソシアネート化合物と過酸化物とを添加した
接着剤を用い、銅箔としてシランカップリング剤による
表面処理を施した無粗化銅箔を用いることにより、現行
の粗化銅箔を用いた場合と同等の銅箔と樹脂基板間の引
きはがし強さが得られることが知られている。しかし、
紙基材フェノール樹脂銅張積層板においてはフェノー
ル樹脂の硬化過程で発生する水が積層板内に多量に存在
するため、半田浴浸漬時に発泡するという問題点があ
り、上述の樹脂系では高温での引きはがし強さが十分で
ないため、半田浴浸漬時にその発泡を抑制することがで
きないという問題点があった。
[0003] Therefore, a relatively soft adhesive, for example, an adhesive obtained by adding a hexamethylene diisocyanate compound and a peroxide to polyvinyl butyral phenol, and a copper foil subjected to a surface treatment with a silane coupling agent are used. It is known that by using a roughened copper foil, the same peeling strength between a copper foil and a resin substrate as that obtained by using a current roughened copper foil can be obtained. But,
In paper-based phenolic copper-clad laminates, there is a problem that foam generated during immersion in a solder bath because a large amount of water generated during the curing process of the phenolic resin is present in the laminates. There is a problem that the foaming cannot be suppressed at the time of immersion in a solder bath because the peeling strength is not sufficient.

【0004】[0004]

【発明が解決しようとする課題】本発明の目的は、粗化
処理を行わない無粗化の銅箔を用いた接着剤付銅箔であ
って、紙基材フェノール樹脂銅張積層板としたときに、
エッチング後にフェノール樹脂中に銅粒子が残らず、回
路形成が容易で、かつ粗化銅箔を用いたと同様の引きは
がし強さを有するとともに、半田耐熱性にも優れる紙基
材フェノール樹脂銅張積層板用接着剤付銅箔を提供する
ことにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a copper foil with an adhesive using a non-roughened copper foil which is not subjected to a roughening treatment. sometimes,
No copper particles remain in the phenolic resin after etching, easy circuit formation, the same peeling strength as when using roughened copper foil, and excellent heat resistance to soldering. An object of the present invention is to provide a copper foil with a plate adhesive.

【0005】[0005]

【課題を解決するための手段】本発明者らは、上記課題
を解決するために鋭意検討を重ねた結果、カップリング
剤処理を施した無粗化銅箔に、組成の異なる特定の二種
類の接着剤を二層以上に塗布することにより、従前の粗
化処理を施した銅箔を用いた接着剤付銅箔と同等の接着
力を有する紙基材フェノール樹脂銅張積層板に適した接
着剤付銅箔が得られることを見出し、この知見に基づい
て本発明を完成するに至った。
Means for Solving the Problems The inventors of the present invention have conducted intensive studies in order to solve the above-mentioned problems, and as a result, two types of specific non-roughened copper foils having different compositions have been obtained. Suitable for paper-based phenolic copper-clad laminates with the same adhesive strength as copper foil with adhesive using a conventional roughened copper foil by applying two or more layers of adhesive The present inventors have found that a copper foil with an adhesive can be obtained, and have completed the present invention based on this finding.

【0006】すなわち、本発明は、カップリング剤処理
を施した無粗化銅箔に接着剤層を設けてなる紙基材フェ
ノール樹脂銅張積層板用接着剤付銅箔において、接着剤
層が銅箔面側に設けたポリビニルアセタール樹脂100
重量部にエポキシ樹脂を1〜49重量部含有させた接着
剤層(1)と積層板面側に設けたポリビニルアセタール
樹脂100重量部にエポキシ樹脂を50〜200重量部
含有させた接着剤層(2)からなることを特徴とする紙
基材フェノール樹脂銅張積層板用接着剤付銅箔を提供す
るものである。
That is, the present invention provides an adhesive copper foil for a paper-based phenolic copper-clad laminate obtained by providing an adhesive layer on a non-roughened copper foil subjected to a coupling agent treatment, wherein the adhesive layer is Polyvinyl acetal resin 100 provided on the copper foil side
An adhesive layer (1) containing 1 to 49 parts by weight of an epoxy resin in a weight part and an adhesive layer containing 50 to 200 parts by weight of an epoxy resin in 100 parts by weight of a polyvinyl acetal resin provided on the surface of the laminate ( The present invention provides a copper foil with an adhesive for a paper-based phenolic resin copper-clad laminate characterized by comprising 2).

【0007】[0007]

【発明の実施の形態】本発明に用いる無粗化銅箔として
は、電解銅箔、圧延銅箔が用いられるが、銅箔の表面に
二次的な粗面形成手段、例えば電解粗化、化学エッチン
グ、機械的研摩などが施されていないものが用いられ
る。無粗化銅箔としては、厚さが好ましくは12μmか
ら105μmの銅箔、特に厚さ18μmから70μmの
電解銅箔が好適に用いられる。銅箔面の酸化を防止する
こととカップリング剤への親和性を増大させることか
ら、銅箔の表面にはクロメート処理や亜鉛化合物を含む
クロメート処理が施されていることが好ましい。また、
クロメート処理の下地処理としてニッケルやコバルト、
亜鉛、モリブデンなどによる合金メッキを施してもよ
い。これらの合金メッキにより耐熱性や耐薬品性などの
特性を向上させることができる。
BEST MODE FOR CARRYING OUT THE INVENTION As a non-roughened copper foil used in the present invention, an electrolytic copper foil or a rolled copper foil is used, and a secondary rough surface forming means such as electrolytic roughening, Those that have not been subjected to chemical etching, mechanical polishing, etc. are used. As the non-roughened copper foil, a copper foil preferably having a thickness of 12 μm to 105 μm, particularly an electrolytic copper foil having a thickness of 18 μm to 70 μm is suitably used. From the viewpoint of preventing oxidation of the copper foil surface and increasing the affinity for the coupling agent, it is preferable that the surface of the copper foil be subjected to a chromate treatment or a chromate treatment containing a zinc compound. Also,
Nickel or cobalt,
Alloy plating with zinc, molybdenum, or the like may be performed. By such alloy plating, characteristics such as heat resistance and chemical resistance can be improved.

【0008】本発明で用いられる無粗化銅箔には、カッ
プリング剤処理がなされている。カップリング剤処理に
は、一般に市販されている各種のシランカップリング剤
やチタネート系カップリング剤など、分子内に無機化合
物に対して親和性を示す部分と有機化合物に対して親和
性を示す部分の両方を有する化合物を使用することがで
きる。シランカップリング剤としては、例えば、γ−ア
ミノプロピルトリメトキシシラン、γ−グリシドキシプ
ロピルトリメトキシシラン、γ−メルカプトプロピルト
リメトキシシラン、γ−アミノプロピルトリエトキシシ
ラン、γ−グリシドキシプロピルトリエトキシシラン、
γ−メルカプトプロピルトリエトキシシラン、γ−アミ
ノプロピルメチルジメトキシシラン、γ−グリシドキシ
プロピルメチルジメトキシシラン、γ−メルカプトプロ
ピルメチルジメトキシシランなどがある。また、信越化
学工業株式会社製のX−12−413などのシランカッ
プリング剤プライマーとして市販されているものを用い
ることもできる。これらのカップリング剤は単独で用い
てもよいし、二種以上を混合して用いてもよい。また、
水ガラスやポリメチルシロキサン、テトラエトキシシラ
ン、トリエトキシメチルシランなどのけい素を含む化合
物とともに用いてもよい。これらの化合物は一般に0.
01重量部から5.0重量部を水100重量部に溶解し
た水溶液として浸漬やシャワーなどの方法により銅箔表
面にその薄い液膜を形成し、乾燥することにより処理を
行うことができる。
[0008] The roughened copper foil used in the present invention has been subjected to a coupling agent treatment. For the coupling agent treatment, a part showing affinity for an inorganic compound and a part showing affinity for an organic compound in a molecule, such as various commercially available silane coupling agents and titanate-based coupling agents, are used. Can be used. Examples of the silane coupling agent include γ-aminopropyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane. Ethoxysilane,
γ-mercaptopropyltriethoxysilane, γ-aminopropylmethyldimethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-mercaptopropylmethyldimethoxysilane and the like. Further, a commercially available silane coupling agent primer such as X-12-413 manufactured by Shin-Etsu Chemical Co., Ltd. can also be used. These coupling agents may be used alone or in combination of two or more. Also,
It may be used together with a compound containing silicon such as water glass, polymethylsiloxane, tetraethoxysilane, and triethoxymethylsilane. These compounds are generally present at 0.1.
The treatment can be performed by forming a thin liquid film on the surface of the copper foil by dipping or showering as an aqueous solution in which 01 to 5.0 parts by weight is dissolved in 100 parts by weight of water, and drying it.

【0009】接着剤層の接着剤として用いる二種類の接
着剤のうち、銅箔面側に設けられる一層目の接着剤層の
接着剤として用いる接着剤は伸びが大きくかつカップリ
ング剤との親和性がよいものが用いられる。このような
接着剤としてはポリビニルアセタール樹脂100重量部
にエポキシ樹脂を1〜49重量部配合した接着剤が用い
られる。
[0009] Among the two types of adhesives used as the adhesive for the adhesive layer, the adhesive used as the adhesive for the first adhesive layer provided on the copper foil side has a large elongation and an affinity with the coupling agent. Those with good properties are used. As such an adhesive, an adhesive obtained by mixing 1 to 49 parts by weight of an epoxy resin with 100 parts by weight of a polyvinyl acetal resin is used.

【0010】ポリビニルアセタール樹脂としては、平均
重合度が2000〜3500のものが好ましく、アセタ
ール化に用いるアルデヒドの種類やアセタール化の程度
は限定されないが、溶解性と機械特性のバランスから選
定される。また、カルボン酸変性品を用いてもよい。
The polyvinyl acetal resin preferably has an average degree of polymerization of 2000 to 3500. The type of aldehyde used for acetalization and the degree of acetalization are not limited, but are selected from the balance between solubility and mechanical properties. Further, a carboxylic acid-modified product may be used.

【0011】エポキシ樹脂としては、ビスフェノールA
型やクレゾールノボラック型などの汎用に用いられるエ
ポキシ樹脂が好適に用いられるが、溶解性と機械特性と
からクレゾールノボラック型エポキシ樹脂が好適に用い
られる。アミノ樹脂を加えることもできる。アミノ樹脂
についても特に限定されるものではないが、各種のメラ
ミン樹脂やベンゾグアナミン樹脂、CTU−グアナミン
樹脂が好適に用いられる。
As the epoxy resin, bisphenol A
A commonly used epoxy resin such as a mold and a cresol novolak type is preferably used, and a cresol novolak type epoxy resin is preferably used in view of solubility and mechanical properties. Amino resins can also be added. The amino resin is not particularly limited, but various melamine resins, benzoguanamine resins, and CTU-guanamine resins are suitably used.

【0012】また、この接着剤にヘキサメチレンジイソ
シアネート及びそのブロックイソシアネートなどのイソ
シアネート化合物を添加してもよい。イソシアネート化
合物の添加によりポリビニルアセタール樹脂とカップリ
ング剤との間に強固な化学結合の生成が期待できる。
Further, an isocyanate compound such as hexamethylene diisocyanate and its blocked isocyanate may be added to the adhesive. By the addition of the isocyanate compound, the formation of a strong chemical bond between the polyvinyl acetal resin and the coupling agent can be expected.

【0013】接着剤には溶剤を用いることができる。溶
剤としてはアルコール類、ケトン類、芳香族化合物から
なる適当な溶解性と揮発性を有する混合物を用いること
が好ましい。
A solvent can be used for the adhesive. As the solvent, it is preferable to use a mixture having an appropriate solubility and volatility composed of alcohols, ketones and aromatic compounds.

【0014】この一層目の接着剤層の厚みは1〜20μ
mとすることが好ましい。更に好ましくは3〜10μm
とする。
The thickness of the first adhesive layer is 1 to 20 μm.
m is preferable. More preferably, 3 to 10 μm
And

【0015】一方、積層板面側に設けられる二層目の接
着剤層の接着剤として用いられる接着剤は、一層目の接
着剤層及び積層板のそれぞれの面に対して適切な接着力
を有することが必要である。また、この接着剤には半田
浸漬時の高温においても一定の強度を保持し、積層板内
部に残存する水の気化を抑制するに十分な強度が必要で
ある。このような特性を有する接着剤として、ポリビニ
ルアセタール樹脂100重量部にエポキシ樹脂を50〜
200重量部配合した接着剤が用いられる。アミノ樹脂
を加えることもできる。ポリビニルアセタール樹脂、エ
ポキシ樹脂、アミノ樹脂は前記と同様のものが用いられ
る。
On the other hand, the adhesive used as an adhesive for the second adhesive layer provided on the laminate surface side has an appropriate adhesive strength to the first adhesive layer and the respective surfaces of the laminate. It is necessary to have. In addition, the adhesive needs to have a sufficient strength to maintain a certain strength even at a high temperature during solder immersion and to suppress the evaporation of water remaining inside the laminate. As an adhesive having such properties, an epoxy resin is added in an amount of 50 to 100 parts by weight of a polyvinyl acetal resin.
An adhesive mixed with 200 parts by weight is used. Amino resins can also be added. The same polyvinyl acetal resin, epoxy resin and amino resin as described above are used.

【0016】この二層目の接着剤層の厚みは10〜50
μmとすることが好ましい。更に好ましくは15〜40
μmとする。
The thickness of the second adhesive layer is 10 to 50.
It is preferably set to μm. More preferably, 15 to 40
μm.

【0017】また、必要に応じて一層目の接着剤層と二
層目の接着剤層の間に、一層目の接着剤層と二層目の接
着剤層の中間の特性を有する接着剤層を設けてもよい。
If necessary, an adhesive layer having properties intermediate between the first adhesive layer and the second adhesive layer may be provided between the first adhesive layer and the second adhesive layer. May be provided.

【0018】本発明においては上記した二種類の接着剤
層を設けることにより、無粗化銅箔を用いて、粗化銅箔
を用いたと同等の引きはがし強さを有するとともに、半
田耐熱性にも優れる紙基材フェノール樹脂銅張積層板用
接着剤付銅箔を得ることができる。
In the present invention, by providing the two types of adhesive layers described above, it is possible to use a non-roughened copper foil to have the same peeling strength as using a roughened copper foil, and to improve the solder heat resistance. A copper foil with an adhesive for a paper-based phenolic resin-clad clad laminate, which is also excellent, can be obtained.

【0019】[0019]

【実施例】以下、本発明を実施例及び比較例によって更
に具体的に説明するが、本発明はこれらの実施例に限定
されるものではない。
EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples, but the present invention is not limited to these examples.

【0020】製造例1 ポリビニルブチラール樹脂(電気化学工業株式会社製品
番6000C)100重量部とクレゾールノボラック型
エポキシ樹脂(三井石油化学工業株式会社製品番N−6
73)25重量部、アミノ樹脂(富士化成工業株式会社
製商品名デラミンCTU−100)20重量部を、トル
エン、メチルエチルケトン、メタノールからなる混合溶
剤に溶解し、次いでイミダゾール化合物(四国化成工業
株式会社製品番2E4MZCN)4重量部とヘキサメチ
レンジイソシアネート1重量部と添加して接着剤溶液A
を得た。なお、ワニス中の固形分は17重量%とした。
Production Example 1 100 parts by weight of polyvinyl butyral resin (Denki Chemical Industry Co., Ltd., product number 6000C) and cresol novolak type epoxy resin (Mitsui Petrochemical Industry Co., Ltd., product number N-6)
73) 25 parts by weight and 20 parts by weight of an amino resin (trade name: Delamine CTU-100 manufactured by Fuji Kasei Kogyo Co., Ltd.) are dissolved in a mixed solvent consisting of toluene, methyl ethyl ketone and methanol, and then an imidazole compound (a product of Shikoku Chemicals Co., Ltd.) No. 2E4MZCN) and 4 parts by weight of hexamethylene diisocyanate and 1 part by weight of adhesive solution A
I got The varnish had a solid content of 17% by weight.

【0021】製造例2 ポリビニルブチラール樹脂(電気化学工業株式会社製品
番6000C)100重量部とクレゾールノボラック型
エポキシ樹脂(三井石油化学工業株式会社製品番N−6
73)75重量部、アミノ樹脂(富士化成工業株式会社
製商品名デラミンCTU−100)25重量部を、トル
エン、メチルエチルケトン、メタノールからなる混合溶
剤に溶解し、次いでイミダゾール化合物(四国化成工業
株式会社製品番2E4MZCN)5重量部を添加して接
着剤溶液Bを得た。なお、ワニス中の固形分は19重量
%とした。
Production Example 2 100 parts by weight of polyvinyl butyral resin (Denki Chemical Industry Co., Ltd., product number 6000C) and cresol novolak type epoxy resin (Mitsui Petrochemical Industry Co., Ltd., product number N-6)
73) 75 parts by weight and 25 parts by weight of an amino resin (trade name: Delamine CTU-100 manufactured by Fuji Kasei Kogyo Co., Ltd.) are dissolved in a mixed solvent consisting of toluene, methyl ethyl ketone and methanol, and then an imidazole compound (a product of Shikoku Chemicals Co., Ltd.) No. 2E4MZCN) was added to obtain an adhesive solution B. The varnish had a solid content of 19% by weight.

【0022】製造例3 硫酸銅水溶液を電気分解して厚さ35μm、表面粗さ
(Ra)1.4μmの無粗化銅箔を調製した。次いで重
クロム酸ナトリウム2.2gを純水1リットルに溶解し
た処理液中で0.15A/dm2の電流密度でこの銅箔
のマット面にクロメート処理を行った。
Production Example 3 An aqueous copper sulfate solution was electrolyzed to prepare a non-roughened copper foil having a thickness of 35 μm and a surface roughness (Ra) of 1.4 μm. Subsequently, the matte surface of the copper foil was subjected to chromate treatment at a current density of 0.15 A / dm 2 in a treatment solution in which 2.2 g of sodium bichromate was dissolved in 1 liter of pure water.

【0023】水洗後直ちに、γ−グリシドキシプロピル
トリメトキシシラン(チッソ石油化学製商品名S−51
0)1gと水ガラス0.5gを純水1リットルに溶解し
た処理液に10秒間浸漬し、80℃の熱風で1分間乾燥
して無粗化銅箔を得た。
Immediately after washing with water, γ-glycidoxypropyltrimethoxysilane (trade name: S-51, manufactured by Chisso Petrochemical)
0) 1 g of water glass and 0.5 g of water glass were dissolved in 1 liter of pure water for 10 seconds, and immersed in hot water at 80 ° C. for 1 minute to obtain a roughened copper foil.

【0024】製造例4 製造例3の銅箔にクロメート処理を行う前に、硫酸銅水
溶液中で高電流密度で微細な銅粒子をマット面に析出さ
せることにより、粗化処理を行った。さらに製造例3と
同様にクロメート処理とシランカップリング剤処理とを
行い、粗化銅箔を得た。なおこの銅箔の表面粗さはRa
で1.7μmであった。
Production Example 4 Prior to performing the chromate treatment on the copper foil of Production Example 3, a roughening treatment was performed by depositing fine copper particles with a high current density on a mat surface in an aqueous solution of copper sulfate. Further, a chromate treatment and a silane coupling agent treatment were performed in the same manner as in Production Example 3 to obtain a roughened copper foil. The surface roughness of this copper foil is Ra
Was 1.7 μm.

【0025】実施例1 製造例3の無粗化銅箔に製造例1の接着剤溶液Aを40
μmギャップのバーコーターで塗工し、室温で10分間
放置した後、60℃で5分、次いで120℃で5分間乾
燥を行った。塗工前後の厚さをマイクロメーターで測定
して求めた塗膜の厚さは5μmであった。次いで180
μmギャップのバーコーターで製造例2の接着剤溶液B
を塗工し、同様に乾燥した。次いで160℃で2分間乾
燥し、接着剤付銅箔とした。塗工前後の厚さをマイクロ
メーターで測定して求めた塗膜の厚さは25μmであ
り、接着剤Aと接着剤Bを合計した厚さは30μmであ
った。
Example 1 The adhesive solution A of Production Example 1 was added to the non-roughened copper foil of Production Example 3 for 40 minutes.
After coating with a bar coater having a μm gap and leaving at room temperature for 10 minutes, drying was performed at 60 ° C. for 5 minutes and then at 120 ° C. for 5 minutes. The thickness of the coating film measured by a micrometer before and after coating was 5 μm. Then 180
Adhesive solution B of Production Example 2 using a bar coater with a μm gap
And dried in the same manner. Next, it was dried at 160 ° C. for 2 minutes to obtain a copper foil with an adhesive. The thickness of the coating film determined by measuring the thickness before and after coating with a micrometer was 25 μm, and the total thickness of the adhesive A and the adhesive B was 30 μm.

【0026】この接着剤付銅箔を厚さ0.2mmの紙基
材フェノール樹脂基材(住友ベークライト工業株式会社
製品番PI−N5)8枚とともに、温度170℃、圧力
140kgf/cm2で60分間加熱硬化し、銅張積層
板とした。
[0026] with the paper substrate phenolic resin substrate (Sumitomo Bakelite Industry Co., Ltd. Product No. PI-N5) 8 sheets of this adhesive thickness 0.2mm the coated copper foil agent, temperature 170 ° C., at a pressure 140 kgf / cm 2 60 The resin was cured by heating for minutes, to give a copper-clad laminate.

【0027】比較例1 製造例3の無粗化銅箔に製造例1の接着剤溶液Aを25
0μmギャップのバーコーターで塗工し、室温で10分
間放置した後、60℃で5分、次いで120℃で5分
間、次いで120℃で5分間、次いで160℃で2分間
乾燥し、接着剤付銅箔とした。塗工前後の厚さをマイク
ロメーターで測定して求めた塗膜の厚さは31μmであ
った。
Comparative Example 1 The adhesive solution A of Production Example 1 was added to the non-roughened copper foil of Production Example 3 for 25 times.
After coating with a bar coater having a gap of 0 μm and leaving it at room temperature for 10 minutes, it is dried at 60 ° C. for 5 minutes, then at 120 ° C. for 5 minutes, then at 120 ° C. for 5 minutes, and then at 160 ° C. for 2 minutes, and then attached with an adhesive. Copper foil was used. The thickness of the coating film determined by measuring the thickness before and after coating with a micrometer was 31 μm.

【0028】この接着剤付銅箔を実施例1と同様にして
銅張積層板とした。
This copper foil with adhesive was made into a copper-clad laminate in the same manner as in Example 1.

【0029】比較例2 比較例1の接着剤溶液Aの代わりに接着剤溶液Bを用
い、200μmギャップのバーコーターで塗工した他は
比較例1と同様にして銅張積層板とした。なお、接着剤
付銅箔の接着剤塗膜の厚さは29μmであった。
Comparative Example 2 A copper-clad laminate was prepared in the same manner as in Comparative Example 1 except that adhesive solution B was used in place of adhesive solution A in Comparative Example 1, and the coating was performed with a bar coater having a gap of 200 μm. In addition, the thickness of the adhesive coating film of the copper foil with an adhesive was 29 μm.

【0030】比較例3 比較例1の接着剤溶液Aの代わりに市販接着剤(日立化
成工業株式会社製品番VP−71:ポリビニルアセター
ル樹脂系接着剤)を用い、210μmギャップのバーコ
ーターで塗工した他は比較例1と同様にして銅張積層板
とした。なお、接着剤付銅箔の接着剤塗膜の厚さは30
μmであった。
Comparative Example 3 A commercial adhesive (product number VP-71: polyvinyl acetal resin-based adhesive) was used in place of the adhesive solution A of Comparative Example 1 and coated with a 210 μm gap bar coater. A copper-clad laminate was produced in the same manner as in Comparative Example 1 except for the above. The thickness of the adhesive coating film of the copper foil with the adhesive is 30.
μm.

【0031】比較例4 比較例3の無粗化銅箔の代わりに製造例4の粗化銅箔を
用いた他は比較例1と同様にして銅張積層板とした。な
お、接着剤付銅箔の接着剤塗膜の厚さは31μmであっ
た。
Comparative Example 4 A copper-clad laminate was produced in the same manner as in Comparative Example 1 except that the roughened copper foil of Production Example 4 was used instead of the non-roughened copper foil of Comparative Example 3. In addition, the thickness of the adhesive coating film of the copper foil with an adhesive was 31 μm.

【0032】以上の実施例1、比較例1〜4の銅張積層
板についてJIS C 6481に準拠して評価した結
果を表1に示す。但し、引きはがし強さの測定は線幅1
mmで行った。
Table 1 shows the results of evaluating the copper-clad laminates of Example 1 and Comparative Examples 1 to 4 in accordance with JIS C6481. However, the peeling strength was measured with a line width of 1
mm.

【0033】[0033]

【表1】 表1の結果より、実施例1の無粗化銅箔を用いた接着剤
付銅箔は引きはがし強さと半田耐熱性とに優れ、粗化銅
箔を用いた従来の接着剤付銅箔に匹敵する特性を有する
ことが明らかである。
[Table 1] From the results in Table 1, the copper foil with adhesive using the non-roughened copper foil of Example 1 is excellent in the peeling strength and the solder heat resistance, and compared to the conventional copper foil with adhesive using the roughened copper foil. It is clear that they have comparable properties.

【0034】[0034]

【発明の効果】本発明のカップリング剤処理を施した無
粗化銅箔に組成の異なる特定の接着剤を二層以上に塗布
してなる紙基材フェノール樹脂銅張積層板用接着剤付銅
箔は粗化銅箔を用いた従来の接着剤付銅箔に匹敵する特
性を有し、銅箔の製造工程上問題の多い粗化処理を行わ
ずに済むので生産性に優れ、また、基材のフェノール樹
脂中に埋め込まれたエッチングの障害となる粗化粒子が
存在しないのでプリント配線板としての品質信頼性に優
れる。
According to the present invention, a paper-based phenolic resin-based copper-clad laminate adhesive is obtained by applying a specific adhesive having a different composition to two or more layers on a roughened copper foil treated with a coupling agent according to the present invention. Copper foil has properties comparable to conventional adhesive-coated copper foil using roughened copper foil, and is excellent in productivity because there is no need to perform roughening treatment which has many problems in the manufacturing process of copper foil, Since there are no roughened particles embedded in the phenol resin of the base material that hinder the etching, the printed wiring board has excellent quality reliability.

フロントページの続き (72)発明者 横野 中 茨城県下館市下江連1226番地 日本電解株 式会社下館工場内Continuation of front page (72) Inventor Naka Yokono 1226 Shimoedashiri, Shimodate-shi, Ibaraki Pref.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 カップリング剤処理を施した無粗化銅箔
に接着剤層を設けてなる紙基材フェノール樹脂銅張積層
板用接着剤付銅箔において、接着剤層が銅箔面側に設け
たポリビニルアセタール樹脂100重量部にエポキシ樹
脂を1〜49重量部含有させた接着剤層と積層板面側に
設けたポリビニルアセタール樹脂100重量部にエポキ
シ樹脂を50〜200重量部含有させた接着剤層からな
ることを特徴とする紙基材フェノール樹脂銅張積層板用
接着剤付銅箔。
1. A copper foil with an adhesive for a paper-based phenolic copper-clad laminate obtained by providing an adhesive layer on a non-roughened copper foil that has been subjected to a coupling agent treatment, wherein the adhesive layer is on the copper foil side. An adhesive layer containing 1 to 49 parts by weight of an epoxy resin in 100 parts by weight of a polyvinyl acetal resin provided in Example 1 and 50 to 200 parts by weight of an epoxy resin were contained in 100 parts by weight of a polyvinyl acetal resin provided on the laminate surface side. A copper foil with an adhesive for a paper-based phenolic copper-clad laminate, comprising an adhesive layer.
JP2936597A 1997-02-13 1997-02-13 Adhesive-applied copper foil for paper base material phenol resin copper-clad laminated sheet Pending JPH10226019A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2936597A JPH10226019A (en) 1997-02-13 1997-02-13 Adhesive-applied copper foil for paper base material phenol resin copper-clad laminated sheet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2936597A JPH10226019A (en) 1997-02-13 1997-02-13 Adhesive-applied copper foil for paper base material phenol resin copper-clad laminated sheet

Publications (1)

Publication Number Publication Date
JPH10226019A true JPH10226019A (en) 1998-08-25

Family

ID=12274155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2936597A Pending JPH10226019A (en) 1997-02-13 1997-02-13 Adhesive-applied copper foil for paper base material phenol resin copper-clad laminated sheet

Country Status (1)

Country Link
JP (1) JPH10226019A (en)

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