JPH10224036A - Build-up printed wiring board and its manufacturing method - Google Patents

Build-up printed wiring board and its manufacturing method

Info

Publication number
JPH10224036A
JPH10224036A JP4008397A JP4008397A JPH10224036A JP H10224036 A JPH10224036 A JP H10224036A JP 4008397 A JP4008397 A JP 4008397A JP 4008397 A JP4008397 A JP 4008397A JP H10224036 A JPH10224036 A JP H10224036A
Authority
JP
Japan
Prior art keywords
copper
insulating layer
build
wiring board
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4008397A
Other languages
Japanese (ja)
Inventor
Yoshihiko Tozawa
仁彦 戸澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Avionics Co Ltd
Original Assignee
Nippon Avionics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Avionics Co Ltd filed Critical Nippon Avionics Co Ltd
Priority to JP4008397A priority Critical patent/JPH10224036A/en
Publication of JPH10224036A publication Critical patent/JPH10224036A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent the surface of an insulation layer from directly contacting a strong alkali plating liquid on electroless copper plating treatment by forming a metal plating film on the roughening surface of the insulation layer by oxidation electroless metal plating treatment. SOLUTION: In a copper-clad lamination plate 10, a copper foil 12 is laminated on both surfaces of an insulation substrate, thus forming a first circuit pattern. An alkali development type photosensitive insulation resin is applied to the inner surface of the copper-clad lamination plate 10 and is dried and cured properly, thus forming an insulation layer 30. Then, after the surface roughening, oxidation electroless nickel plating treatment is performed, thus forming a nickel plating film 50. The thickness of the nickel plating film 50 is determined by considering that the roughening surface of the insulation layer 30 does not directly contact a strong alkali plating liquid on later-process electroless copper plating treatment.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ビルドアッププリ
ント配線板に係り、特にアルカリ現像型の感光性絶縁樹
脂でなる絶縁層と導体回路との密着性を向上させる技術
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a build-up printed wiring board, and more particularly to a technique for improving the adhesion between an insulating layer made of an alkali developing type photosensitive insulating resin and a conductive circuit.

【0002】[0002]

【従来の技術】多層プリント配線板の製造方法におい
て、絶縁基板の少なくとも一方の面に回路パターンと絶
縁層とを順次積み上げてゆくビルドアップ法が公知であ
る。このビルドアップ法では、絶縁樹脂でなる絶縁層と
導体回路との密着性を向上させるためにこの絶縁層の表
面を化学研磨して粗化している。
2. Description of the Related Art In a method of manufacturing a multilayer printed wiring board, there is known a build-up method in which a circuit pattern and an insulating layer are sequentially stacked on at least one surface of an insulating substrate. In this build-up method, the surface of the insulating layer is chemically polished and roughened in order to improve the adhesion between the insulating layer made of insulating resin and the conductor circuit.

【0003】図2は、このビルドアップ法による多層プ
リント配線板の製造工程を示す図である。図2におい
て、10は銅張り積層板であり、紙やガラス繊維などの
補強基材に樹脂を含浸させたシート(プリプレグ)を重
ね、加圧加熱処理して得た絶縁板(積層板)の両面また
は片面に銅箔12を張り付けたものである。ここではガ
ラス布にエポキシ樹脂を含浸させたもの、例えばNEM
A規格FR−4の両面銅張り積層板を用いる。この銅箔
12、12には公知のフォトエッチング法によって適宜
の第1回路パターンが形成される。そして銅張り積層板
10の両面に感光性絶縁樹脂、例えばエポキシアクリレ
ート系の樹脂を塗布し、絶縁層30を形成する。こうし
て得られた積層体32を低温の恒温槽に入れ、樹脂の溶
媒中に含まれる揮発性有機溶剤を除いて乾燥させ、膜質
を適当に硬化させる(図2の(A))。
FIG. 2 is a view showing a process of manufacturing a multilayer printed wiring board by this build-up method. In FIG. 2, reference numeral 10 denotes a copper-clad laminate, which is an insulating plate (laminate) obtained by stacking a sheet (prepreg) impregnated with a resin on a reinforcing substrate such as paper or glass fiber, and subjecting the sheet to pressure and heat treatment. The copper foil 12 is attached to both sides or one side. Here, a glass cloth impregnated with an epoxy resin, for example, NEM
A standard FR-4 double-sided copper-clad laminate is used. An appropriate first circuit pattern is formed on the copper foils 12 by a known photoetching method. Then, a photosensitive insulating resin, for example, an epoxy acrylate resin is applied to both surfaces of the copper-clad laminate 10 to form an insulating layer 30. The laminate 32 thus obtained is placed in a low-temperature constant-temperature bath, dried except for the volatile organic solvent contained in the solvent of the resin, and the film quality is appropriately cured (FIG. 2A).

【0004】次に、この積層体32の表面にビアホール
のパターンを焼付けたフォトマスク34を密着させ、あ
るいは僅かに離して位置合わせを行い、適切な波長の光
(通常紫外線(UV)の光線を用いる)を照射して露光
する(図2の(B))。この結果ビアホールのパターン
の下の絶縁層30は硬化せず、ビアホールのパターン以
外の部分の絶縁層30が硬化する。
Next, a photomask 34 having a via hole pattern printed thereon is closely attached to the surface of the laminated body 32, or is positioned slightly away from the photomask 34 to perform alignment to obtain light of an appropriate wavelength (usually, ultraviolet (UV) light). (FIG. 2B). As a result, the insulating layer 30 under the via hole pattern is not cured, and the insulating layer 30 other than the via hole pattern is cured.

【0005】そしてアルカリ性溶剤の現像液で現像して
未硬化部分(可溶部分)を取り去れば、フォトマスク3
4に焼付けられたビアホールのパターンに一致する小孔
36、すなわちビアホール用の小孔36が形成される
(図2の(C))。
[0005] Then, by developing with a developer of an alkaline solvent to remove the uncured portion (soluble portion), the photomask 3
Small holes 36 corresponding to the pattern of the via holes baked on No. 4, that is, small holes 36 for via holes are formed (FIG. 2C).

【0006】次に、絶縁層30の表面に形成する第2導
体層と絶縁層30との密着性を向上させるために、絶縁
層30の表面に化学研磨を施し、絶縁層30の表面を粗
化する。(図2の(D))。次に、絶縁層30の粗化表
面に無電解銅めっき処理を施し、第1銅めっき層38を
形成する。この第1銅めっき層38と樹脂層30の密着
性を向上させるためにベーキング処理を施す。(図2の
(E))。次に、第1銅めっき層38の表面に電解銅め
っき処理を施し、第2銅めっき層42を形成する。(図
2の(F))。こうして、絶縁層30の上に第1銅めっ
き層38、第2銅めっき層42からなる第2導体層44
が形成され、ビアホール40が形成される。
Next, in order to improve the adhesion between the second conductor layer formed on the surface of the insulating layer 30 and the insulating layer 30, the surface of the insulating layer 30 is chemically polished to roughen the surface of the insulating layer 30. Become ((D) of FIG. 2). Next, an electroless copper plating process is performed on the roughened surface of the insulating layer 30 to form a first copper plated layer 38. A baking process is performed to improve the adhesion between the first copper plating layer 38 and the resin layer 30. ((E) of FIG. 2). Next, electrolytic copper plating is performed on the surface of the first copper plating layer 38 to form the second copper plating layer 42. ((F) of FIG. 2). Thus, the second conductor layer 44 including the first copper plating layer 38 and the second copper plating layer 42 on the insulating layer 30
Is formed, and a via hole 40 is formed.

【0007】なお表面の第2導体層44にはフォトエッ
チング法などにより適宜の第2回路パターンを形成する
ことができる。また同様の手順を繰り返して積層数を増
やすことができる。
An appropriate second circuit pattern can be formed on the second conductor layer 44 on the surface by a photoetching method or the like. The same procedure can be repeated to increase the number of layers.

【0008】[0008]

【発明が解決しようとする課題】上記のように絶縁層の
表面を粗化することで絶縁層と第2導体層との密着性を
向上させたビルドアッププリント配線板の製造が可能と
なる。しかしながら、この方法で製造されたビルドアッ
ププリント配線板の絶縁層と第2導体層との密着強度は
0.8kg/cm以下で、密着信頼性が十分でないとい
う問題点があった。本発明は、上記課題を解決するため
になされたもので、絶縁層の粗化表面に酸性無電解金属
めっき処理を施すことにより形成された金属めっき膜を
備えるビルドアッププリント配線板を提供することを第
1の目的とし、その製造方法を提供することを第2の目
的とする。
By roughening the surface of the insulating layer as described above, it is possible to manufacture a build-up printed wiring board with improved adhesion between the insulating layer and the second conductor layer. However, there is a problem that the adhesion strength between the insulating layer and the second conductor layer of the build-up printed wiring board manufactured by this method is 0.8 kg / cm or less, and the adhesion reliability is not sufficient. The present invention has been made to solve the above problems, and provides a build-up printed wiring board including a metal plating film formed by performing an acidic electroless metal plating process on a roughened surface of an insulating layer. Is a first object, and a second object is to provide a manufacturing method thereof.

【0009】[0009]

【課題を解決するための手段】本発明は、絶縁層30の
表面を化学研磨して粗化した後、無電解銅めっき処理を
施すこと、および絶縁層30がアルカリ現像型であるこ
とに着目してなされたものである。即ち、無電解銅めっ
き処理はPH12〜13の強アルカリ性めっき液中でな
されるので、めっき析出と同時に絶縁層30の粗化表面
が強アルカリ性めっき液で浸食され、この粗化表面に表
面凹凸ダレが生じ、このため密着強度が低下するもので
あるという推定に基づくものである。そこで、絶縁層3
0の粗化表面に酸性の無電解金属めっき処理を施し、金
属めっき膜を形成することとした。この金属めっき膜を
保護膜として前記粗化表面が直接無電解銅めっき処理時
の強アルカリ性めっき液に接触しないようにするためで
ある。
The present invention focuses on performing electroless copper plating after roughening the surface of the insulating layer 30 by chemical polishing, and on the fact that the insulating layer 30 is of an alkali developing type. It was done. That is, since the electroless copper plating treatment is performed in a strongly alkaline plating solution of PH12 to PH13, the roughened surface of the insulating layer 30 is eroded by the strongly alkaline plating solution at the same time as the deposition of the plating, and the roughened surface is roughened. Is generated, and the adhesion strength is reduced. Therefore, the insulating layer 3
The roughened surface of No. 0 was subjected to an acidic electroless metal plating treatment to form a metal plating film. This metal plating film is used as a protective film to prevent the roughened surface from directly contacting the strongly alkaline plating solution during the electroless copper plating treatment.

【0010】本発明によれば、第1の目的は、ビルドア
ッププリント配線板において、少なくとも一方の面に第
1回路パターンが形成された絶縁基板と、この第1回路
パターンの上に積層された絶縁層と、この絶縁層の上に
酸性無電解金属めっき処理を施すことにより形成された
金属めっき膜と、この金属めっき膜の上に形成された第
2回路パターンとを有することを特徴とするビルドアッ
ププリント配線板、により達成される。
According to the present invention, a first object is to provide an insulated substrate having a first circuit pattern formed on at least one surface thereof in a build-up printed wiring board, and to be laminated on the first circuit pattern. An insulating layer, a metal plating film formed by performing an acidic electroless metal plating process on the insulating layer, and a second circuit pattern formed on the metal plating film. This is achieved by a build-up printed wiring board.

【0011】また、第2の目的はビルドアッププリント
配線板の製造方法において、 a.第1回路パターンを形成した銅張り積層板にアルカ
リ現像型の感光性絶縁樹脂を積層して絶縁層を形成し、 b.この絶縁層の表面を粗化し、 c.この絶縁層の粗化表面に酸性無電解金属めっきを施
して金属めっき膜を形成し、 d.この金属めっき膜の上に銅めっきを施して銅めっき
層を形成する、ことを特徴とするビルドアッププリント
配線板の製造方法、により達成される。
A second object of the present invention is to provide a method of manufacturing a build-up printed wiring board, comprising: a. Forming an insulating layer by laminating an alkali-developing photosensitive insulating resin on the copper-clad laminate on which the first circuit pattern is formed; b. Roughening the surface of the insulating layer; c. Subjecting the roughened surface of the insulating layer to acidic electroless metal plating to form a metal plating film; d. This is achieved by a method of manufacturing a build-up printed wiring board, characterized in that a copper plating layer is formed by performing copper plating on the metal plating film.

【0012】[0012]

【発明の実施の形態】図1は本発明によるビルドアップ
プリント配線板の製造法の1実施形態を示す図である。
この実施形態では絶縁層の粗化表面を保護するために酸
性無電解ニッケルめっき処理を施すことによりニッケル
めっき膜を形成している。
FIG. 1 is a diagram showing one embodiment of a method of manufacturing a build-up printed wiring board according to the present invention.
In this embodiment, a nickel plating film is formed by performing an acidic electroless nickel plating process to protect the roughened surface of the insulating layer.

【0013】まず前記図2で用いたものと同様な銅張り
積層板10を用意する。これは絶縁基板の両面に銅箔1
2を張り付け、第1回路パターンを形成したものであ
る。この銅張り積層板10の両面にはアルカリ現像型の
感光性絶縁樹脂、例えばエポキシアクリレート系の樹脂
を塗布し、乾燥させて適度に硬化させることにより絶縁
層30を形成する(図1の(A))。この工程(A)か
ら(D)までは、前記図2に示した工程と同じであるか
ら、同一部分に同一符号を付し、その説明は繰り返さな
い。
First, a copper-clad laminate 10 similar to that used in FIG. 2 is prepared. This is a copper foil 1 on both sides of the insulating substrate
2 to form a first circuit pattern. An insulating layer 30 is formed on both surfaces of the copper-clad laminate 10 by applying an alkali-developable photosensitive insulating resin, for example, an epoxy acrylate-based resin, and drying and appropriately curing the resin (FIG. 1A). )). Steps (A) to (D) are the same as the steps shown in FIG. 2, and thus the same portions are denoted by the same reference characters and description thereof will not be repeated.

【0014】図2の工程と異なるのは、工程(D)にお
ける表面粗化の後、酸性無電解ニッケルめっき処理を施
し、ニッケルめっき膜50を形成する点である(図1の
(E))。このニッケルめっき膜50の膜厚は、絶縁層
30の粗化表面が後工程の無電解銅めっき処理時に強ア
ルカリ性めっき液に直接接触しないようにすることが目
的であること、また後工程の第2回路パターンを形成す
る上でのフォトエッチング時に十分エッチング可能であ
ることを考慮して決定される。この酸性無電解ニッケル
めっき処理のめっき液としては、例えば、PH4〜5
で、塩化ニッケルを30g/リットル、次亜リン酸ナト
リウム10g/リットル、クエン酸ナトリウム10g/
リットルを含んでいるめっき液が用いられる。
The difference from the step of FIG. 2 is that, after the surface roughening in the step (D), an acidic electroless nickel plating treatment is performed to form a nickel plating film 50 (FIG. 1 (E)). . The thickness of the nickel plating film 50 is intended to prevent the roughened surface of the insulating layer 30 from coming into direct contact with the strong alkaline plating solution during electroless copper plating in the subsequent step. It is determined in consideration of the fact that etching can be sufficiently performed at the time of photoetching for forming a two-circuit pattern. As a plating solution for this acidic electroless nickel plating treatment, for example, PH4-5
With nickel chloride, 30 g / l, sodium hypophosphite 10 g / l, sodium citrate 10 g / l
A plating solution containing liters is used.

【0015】続いて、図2の(E)、(F)と同様に、
ニッケルめっき膜50の表面に無電解銅めっき処理を施
し、次に第1銅めっき層38を形成した後ベーキング処
理を施し(図1の(F))、第1銅めっき38層の表面
に電解銅めっき処理を施し、第2銅めっき層42を形成
する(図1の(G))。こうして、第1銅めっき層3
8、第2銅めっき層42からなる第2導体層44を形成
し、ビアホール40を形成する。なお表面の第2導体層
44にはフォトエッチング法などにより適宜の第2回路
パターンを形成することができる。また同様の手順を繰
り返して積層数を増やすことができる。
Subsequently, similarly to FIGS. 2E and 2F,
An electroless copper plating process is performed on the surface of the nickel plating film 50, and then a baking process is performed after forming the first copper plating layer 38 ((F) in FIG. 1), and the surface of the first copper plating layer 38 is electrolytically processed. A copper plating process is performed to form a second copper plating layer 42 (FIG. 1G). Thus, the first copper plating layer 3
8. A second conductor layer 44 composed of the second copper plating layer 42 is formed, and a via hole 40 is formed. Note that an appropriate second circuit pattern can be formed on the second conductor layer 44 on the surface by a photoetching method or the like. The same procedure can be repeated to increase the number of layers.

【0016】このようにして得られたビルドアッププリ
ント配線板では絶縁層と導体層との密着強度は1.2k
g/cm以上となり、多層プリント配線板として十分な
密着性が確保できた。なお、絶縁層の表面粗化後の酸性
無電解金属めっきはニッケルに限るものでなく、ニッケ
ル合金(Ni−Co−P)、クロムなどでも良い。
In the build-up printed wiring board thus obtained, the adhesion strength between the insulating layer and the conductor layer is 1.2 k.
g / cm or more, and sufficient adhesion as a multilayer printed wiring board could be secured. The acidic electroless metal plating after the surface roughening of the insulating layer is not limited to nickel, but may be nickel alloy (Ni-Co-P), chromium, or the like.

【0017】[0017]

【発明の効果】請求項1の発明によれば、以上説明した
ように、絶縁層の粗化表面に酸性無電解金属めっき処理
で金属めっき膜を形成することにしたので、無電解銅め
っき処理時に絶縁層の表面が直接強アルカリ性めっき液
に接触しなくなる。このため粗化表面はアルカリ性めっ
き液で浸食されなくなるので、表面凹凸ダレが発生しな
いから、絶縁層と導体層の密着性が向上し、密着強度と
して1.2kg/cm以上の優れた信頼性をもったビル
ドアッププリント配線板を提供できる。また、請求項2
の発明によれば、このビルドアッププリント配線板の製
造方法を提供できる。
According to the first aspect of the present invention, as described above, a metal plating film is formed on a roughened surface of an insulating layer by an acidic electroless metal plating process. Sometimes, the surface of the insulating layer does not come into direct contact with the strong alkaline plating solution. For this reason, the roughened surface is not eroded by the alkaline plating solution, so that the unevenness of the surface does not occur. Therefore, the adhesion between the insulating layer and the conductor layer is improved, and the excellent reliability of the adhesion strength of 1.2 kg / cm or more is obtained. It is possible to provide a built-up printed wiring board having a predetermined length. Claim 2
According to the invention, a method of manufacturing the build-up printed wiring board can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明によるビルドアッププリント配線板の製
造法の1実施形態を示す図である。
FIG. 1 is a diagram showing one embodiment of a method for manufacturing a build-up printed wiring board according to the present invention.

【図2】従来のビルドアップ法による多層プリント配線
板の製造工程を示す図である。
FIG. 2 is a view showing a manufacturing process of a multilayer printed wiring board by a conventional build-up method.

【符号の説明】[Explanation of symbols]

10 銅張り積層板 12 銅箔 30 絶縁層 34 マスクフィルム 36 フォトビアホール用小孔 38 第1銅めっき層 40 ビアホール 42 第2銅めっき層 50 ニッケルめっき膜 DESCRIPTION OF SYMBOLS 10 Copper-clad laminated board 12 Copper foil 30 Insulating layer 34 Mask film 36 Photo via hole small hole 38 1st copper plating layer 40 Via hole 42 2nd copper plating layer 50 Nickel plating film

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ビルドアッププリント配線板において、 少なくとも一方の面に第1回路パターンが形成された絶
縁基板と、 この第1回路パターンの上に積層された絶縁層と、 この絶縁層の上に酸性無電解金属めっき処理を施すこと
により形成された金属めっき膜と、 この金属めっき膜の上に形成された第2回路パターンと
を有することを特徴とするビルドアッププリント配線
板。
1. A build-up printed wiring board, comprising: an insulating substrate having a first circuit pattern formed on at least one surface; an insulating layer laminated on the first circuit pattern; A build-up printed wiring board comprising: a metal plating film formed by performing an acidic electroless metal plating process; and a second circuit pattern formed on the metal plating film.
【請求項2】 ビルドアッププリント配線板の製造方法
において、 a.第1回路パターンを形成した銅張り積層板にアルカ
リ現像型の感光性絶縁樹脂を積層して絶縁層を形成し、 b.この絶縁層の表面を粗化し、 c.この絶縁層の粗化表面に酸性無電解金属めっき処理
を施して金属めっき膜を形成し、 d.この金属めっき膜の上に銅めっき処理を施して第2
導体層を形成する、ことを特徴とするビルドアッププリ
ント配線板の製造方法。
2. A method for manufacturing a build-up printed wiring board, comprising: a. Forming an insulating layer by laminating an alkali-developing photosensitive insulating resin on the copper-clad laminate on which the first circuit pattern is formed; b. Roughening the surface of the insulating layer; c. Subjecting the roughened surface of the insulating layer to an acidic electroless metal plating treatment to form a metal plating film; d. A copper plating process is performed on this metal plating film to form a second
A method for manufacturing a build-up printed wiring board, comprising forming a conductor layer.
JP4008397A 1997-02-07 1997-02-07 Build-up printed wiring board and its manufacturing method Pending JPH10224036A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4008397A JPH10224036A (en) 1997-02-07 1997-02-07 Build-up printed wiring board and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4008397A JPH10224036A (en) 1997-02-07 1997-02-07 Build-up printed wiring board and its manufacturing method

Publications (1)

Publication Number Publication Date
JPH10224036A true JPH10224036A (en) 1998-08-21

Family

ID=12571015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4008397A Pending JPH10224036A (en) 1997-02-07 1997-02-07 Build-up printed wiring board and its manufacturing method

Country Status (1)

Country Link
JP (1) JPH10224036A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100819855B1 (en) 2007-06-12 2008-04-08 주식회사 심텍 Method for manufacturing of printed circuit bord
JP2008306201A (en) * 2008-07-22 2008-12-18 Ibiden Co Ltd Multilayer printed wiring board and manufacturing method therefor
US7504719B2 (en) 1998-09-28 2009-03-17 Ibiden Co., Ltd. Printed wiring board having a roughened surface formed on a metal layer, and method for producing the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7504719B2 (en) 1998-09-28 2009-03-17 Ibiden Co., Ltd. Printed wiring board having a roughened surface formed on a metal layer, and method for producing the same
US7535095B1 (en) 1998-09-28 2009-05-19 Ibiden Co., Ltd. Printed wiring board and method for producing the same
US8533943B2 (en) 1998-09-28 2013-09-17 Ibiden Co., Ltd. Printed wiring board and method for producing the same
KR100819855B1 (en) 2007-06-12 2008-04-08 주식회사 심텍 Method for manufacturing of printed circuit bord
JP2008306201A (en) * 2008-07-22 2008-12-18 Ibiden Co Ltd Multilayer printed wiring board and manufacturing method therefor
JP4553402B2 (en) * 2008-07-22 2010-09-29 イビデン株式会社 Manufacturing method of multilayer printed wiring board

Similar Documents

Publication Publication Date Title
US5258094A (en) Method for producing multilayer printed wiring boards
US4354895A (en) Method for making laminated multilayer circuit boards
US6772515B2 (en) Method of producing multilayer printed wiring board
KR100797698B1 (en) Manufacturing method of high density printed circuit board
JPH1075069A (en) Manufacture of build-up multi-layer printed circuit board using yag laser
JP2002525882A (en) Manufacturing method of multilayer circuit
JP3001485B2 (en) Manufacturing method of multilayer printed wiring board
JP3407172B2 (en) Manufacturing method of printed wiring board
JPH1187865A (en) Printed circuit board and its manufacture
JP2003124637A (en) Multilayer wiring board
JPH10224036A (en) Build-up printed wiring board and its manufacturing method
JPH07273458A (en) Manufacturing method of multilayer-wiring board
JPH098458A (en) Printed-wiring board and manufacture thereof
JP2002176259A (en) Multilayer printed wiring board and method of manufacturing the same
KR100704917B1 (en) Printed circuit board and the manufacturing method thereof
JP2000049440A (en) Manufacture of printed wiring multilayer board
JP2002271026A (en) Multi-layer printed wiring board and manufacturing method therefor
WO2003032701A1 (en) Method for manufacturing multilayer wiring board, and multilayer wiring board manufactured by the same
JP3713726B2 (en) Multilayer printed wiring board
JPS5921095A (en) Method of producing multilayer printed circuit board
JPH10190183A (en) Manufacture of printed circuit board having plated resistor
JP3681189B2 (en) Manufacturing method of multilayer printed wiring board
JP4337408B2 (en) Method for manufacturing printed wiring board
JPH02119298A (en) Manufacture of multilayer printed wiring board for mounting semiconductor element
JPH1168321A (en) Circuit board