JPH10221843A - Photosensitive composition for color filter and manufacture of color filter by using same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide the photosensitive composition capable of forming the color filter superior in heat resistance and intimate contact and resistance to chemicals and the method manufacturing the color filter by using this composition by incorporating a photopolymerizable compound, a photopolymerization initiator, a pigment, a cross-linking agent, and an acid generator. SOLUTION: The photosensitive composition contains (a) the photopolymerizable compound, (b) the photopolymerization initiator, (c) the pigment, (d) the cross-linking agent, and (e) the acid generator. It is preferred that the (a) compound is a compound represented by the formula in which each of R1 and R2 is an H or halogen atom of a 1-5C alkyl group; R3 is an H atom or a methyl group; X is a 1-5C alkylene group optionally having a 1-3C alkyl group, a -CO- or -O- group or the like of X may be absent; Y is acid anhydride residue, such as the one of maleic acid, succinic acid, or itaconic acid; and (n) is an integer of 1-20. The (a) component can be contained in the range of 20-50weight% of the sum of (a)-(c) components in the photosensitive composition.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel photosensitive composition for a color filter, and more particularly to a low power consumption liquid crystal display such as a TFT type liquid crystal panel, an STN type liquid crystal panel and a reflective type TFT type liquid crystal panel. The present invention relates to a photosensitive composition for a color filter which can suitably form a black matrix and a color filter, and has excellent heat resistance, adhesion and chemical resistance, and a method for producing a color filter using the same.

[0002]

2. Description of the Related Art Conventionally, a liquid crystal display (LCD) has
A portable word processor that can be made thinner and lighter,
It is widely used as a display for a portable personal computer, an in-vehicle TV, a camera-integrated VTR, and the like, and is expected to be applied to a PDA (personal portable information terminal) in the future.

As a structure of the above-mentioned liquid crystal display, for example, in a TFT type liquid crystal display, a polarizing plate is provided on a glass substrate, a transparent conductive circuit layer of ITO or the like and a thin film transistor (TFT) layer are arbitrarily formed, and an interlayer is formed thereon. On the other hand, in the same manner as described above, a polarizing plate is provided on a glass plate, and a black matrix layer containing a black pigment or a color in which a color pattern such as red, blue, and green is formed is formed on the back plate by coating with an insulating layer. A filter layer is formed, a transparent conductive circuit layer and an interlayer insulating layer are sequentially laminated to form a top plate, and the top plate and the back plate are arranged to face each other with a spacer interposed therebetween, and a liquid crystal is provided between the two plates. Is enclosed.

[0004]

However, the color filters and black matrices provided in conventional liquid crystal displays, especially the adhesion of black matrices,
Low heat resistance, low chemical resistance, when bonding the back plate and the top plate, the sealing material is provided directly on the black matrix, and its reliability is inferior to the known chromium film black matrix Was something. In addition, since the retention of the pigment used to form the color filter and the black matrix is low, the interlayer film has to be thickened, and the aperture ratio and contrast are reduced, and high brightness and contrast are emphasized. There is a drawback that the manufacture of the display is extremely difficult. Therefore, a liquid crystal panel having a glass-on-array structure in which a color filter and a black matrix are directly provided on a substrate to improve the aperture ratio and the contrast has been proposed. (Deterioration prevention) was low, and it could not be used for a long time with high reliability.

In view of this situation, the present inventors have conducted intensive studies and have found that a photosensitive composition containing a photopolymerizable compound, a photopolymerization initiator and a pigment further contains a crosslinking agent and an acid generator. Thereby, a photosensitive composition for a color filter having excellent heat resistance, adhesion, and chemical resistance can be obtained, and a color filter with high luminance and enhanced contrast can be produced by using the photosensitive composition. The present invention has been completed by finding out what can be done. That is,

An object of the present invention is to provide a photosensitive composition for a color filter having excellent heat resistance, adhesion and chemical resistance.

Another object of the present invention is to provide a method of manufacturing a color filter having high luminance and excellent contrast.

[0008]

The present invention for achieving the above object comprises (a) a photopolymerizable compound, (b) a photopolymerization initiator,
(C) a pigment, (d) a cross-linking agent, and (e) a photosensitive composition for a color filter, which comprises (e) an acid generator; and a negative mask after applying and drying the photosensitive composition on a substrate. Through exposure and development, and then heating and cross-linking and curing.

Hereinafter, the present invention will be described in detail. The photopolymerization initiator (hereinafter, referred to as component (a)) used in the present invention is an ethylenic non-polymerizable such that when the photosensitive composition is irradiated with an active energy ray, the photopolymerization initiator causes addition polymerization and curing. A compound having one or more saturated double bonds, for example, a monomer having an ethylenically unsaturated double bond or a polymer having an ethylenically unsaturated double bond in a side chain or a main chain. . The “monomer” includes not only monomers in a narrow sense but also dimers, trimers and oligomers.

Examples of the monomer having an ethylenically unsaturated double bond include unsaturated carboxylic acids; esters of aliphatic (poly) hydroxy compounds and unsaturated carboxylic acids; and aromatic (poly) hydroxy compounds. Esters of saturated carboxylic acids; esters of unsaturated carboxylic acids with polyvalent carboxylic acids and the above-mentioned aliphatic (poly) hydroxy compounds, polyvalent hydroxy compounds such as aromatic (poly) hydroxy compounds; unsaturated carboxylic acid amides; And unsaturated carboxylic acid nitriles. Specifically, acrylic acid,
Methacrylic acid, fumaric acid, maleic acid; methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, isobutyl acrylate, isobutyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, ethylene glycol monomethyl ether acrylate, ethylene glycol monomethyl ether methacrylate , Ethylene glycol monoethyl ether acrylate, ethylene glycol monoethyl ether methacrylate, glycerol acrylate, glycerol methacrylate,
-Ethylhexyl acrylate, 2-ethylhexyl methacrylate, benzyl acrylate, benzyl methacrylate, ethylene glycol diacrylate, ethylene glycol dimethacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, Butylene glycol dimethacrylate, propylene glycol diacrylate, propylene glycol dimethacrylate, trimethylolethane triacrylate, trimethylolethane trimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, ethylene oxide-modified trimethylolpropane triacrylate Ethylene oxide-modified trimethylolpropane trimethacrylate, tetramethylolpropane tetraacrylate, tetramethylolpropane tetramethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipenta Erythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, 1,6-hexanediol diacrylate, 1,6
-Hexanediol dimethacrylate; the acrylates and methacrylates of the above compounds were replaced with fumarate, maleate, crotonate, and itaconate; fumaric acid esters, maleic acid esters, crotonic acid esters, itaconic acid esters; acrylic acid, methacrylic acid, fumaric acid, Maleic acid, crotonic acid, itaconic acid, hydroquinone monoacrylate, hydroquinone monomethacrylate, hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate, pyrogallol diacrylate, pyrogallol triacrylate; acrylic acid with phthalic acid and diethylene glycol Condensates, Condensates of acrylic acid with maleic acid and diethylene glycol, methacrylic acid and terephthalic acid Condensates of pentaerythritol and condensates of acrylic acid and adipic acid and butanediol and glycerin, ethylene bisacrylamide,
Ethylene bis methacrylamide, allyl ester of diallyl phthalate, divinyl phthalate;

[0011]

Embedded image [Wherein R ₁ and R ₂ are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogen atom;
₃ is a hydrogen atom or a methyl group, and X has 1 carbon atom in the side chain.
To 3 alkyl alkylene group having 1 to 5 carbon atoms which may have a, -CO -, - O -, - CH 2 -, - C (CH 3)
-, -SO ₂ -or

[0012]

Embedded image Represents a residue or non-existent, Y is maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl endmethylene tetrahydrophthalic anhydride, It represents an acid anhydride residue such as chlorendic acid or methyltetrahydrophthalic anhydride, and n represents an integer of 1 to 20. ]. In the compound represented by the general formula 3, specific examples in which X is -CO- include bis (4-hydroxyphenyl) ketone, bis (4-hydroxy-3,5-dimethylphenyl) ketone, bis (4-
(Hydroxy-3,5-dichlorophenyl) ketone, etc.
Specific examples where X is —CH ₂ — include bis (4-hydroxyphenyl) methane, bis (4-hydroxy-3,5
-Dichlorophenyl) methane, bis (4-hydroxy-
3,5-dibromophenyl) methane and the like, wherein X is -C (C
H ₃₎ - Examples are 2,2-bis (4-hydroxyphenyl) propane, 2,2-bis (4-hydroxy-3,5-dimethylphenyl) propane, 2,2
Bis (4-hydroxy-3,5-dichlorophenyl) propane, 2,2-bis (4-hydroxy-3-methylphenyl) propane, 2,2-bis (4-hydroxy-3
- chlorophenyl) propane is, X is bis (4-hydroxyphenyl) ether Specific examples is -O-, and bis (4-hydroxy-3,5-dichlorophenyl ether, X is -SO ₂ - is a Specific examples include bis (4-hydroxy-3,5-dimethylphenyl) sulfone, bis (4-hydroxy-3,5-dimethylphenyl) sulfone, bis (4-hydroxy-3,5-dichlorophenyl) sulfone, and the like. And X is
Specific examples of the residue represented by are fluorene, 9,
9-bisfluorene, 9,9-bis (4-hydroxyphenyl) fluorene, 9,9-bis (4-hydroxy-
3-methylphenyl) fluorene, 9,9-bis (4-
(Hydroxy-3-chlorophenyl) fluorene, 9,9
-Bis (4-hydroxy-3-bromophenyl) fluorene, 9,9-bis (4-hydroxy-3-fluorophenyl) fluorene, 9,9-bis (4-hydroxy-
3-methoxyphenyl) fluorene, 9,9-bis (4
-Hydroxy-3,5-dimethylphenyl) fluorene, 9,9-bis (4-hydroxy-3,5-dichlorophenyl) fluorene, 9,9-bis (4-hydroxy-3,5-dibromophenyl) fluorene, etc. No.

The compound represented by the above general formula (3) can be used, for example, as described in JP-A-5-339356.
General formula 5

[0014]

Embedded image After reacting the epoxy compound represented by the formula with (meth) acrylic acid, the mixture is heated in a cellosolve solvent and reacted with an acid anhydride.

Examples of the polymer having an ethylenically unsaturated double bond in a side chain or a main chain include a polyester obtained by a polycondensation reaction between an unsaturated dicarboxylic acid and a dihydroxy compound, and an unsaturated dicarboxylic acid and a diamine. Polyester obtained by a polycondensation reaction with a polycondensation reaction with a polyester, itaconic acid, propylidene succinic acid, a polyester obtained by a polycondensation reaction of an ethylidene malonic acid and a dihydroxy compound, itaconic acid, propylidene succinic acid, a polymer obtained by the polycondensation Polyamide obtained by condensation reaction, phenol novolak type epoxy acrylate, phenol novolak type epoxy methacrylate,
Cresol novolak type epoxy acrylate, cresol novolak type epoxy methacrylate, bisphenol A type epoxy acrylate, bisphenol S type epoxy acrylate, urethane acrylate oligomer, urethane methacrylate oligomer, and the like. Those obtained by further reacting a polybasic acid anhydride with the epoxy (meth) acrylate resin can also be used. Others
A polymer having a functional group having a reactive activity such as a hydroxy group or a halogenated alkyl group on a side chain, for example, polyvinyl alcohol, poly (2-hydroxyethyl methacrylate), polyepichlorohydrin, etc., and acrylic acid, methacrylic acid, fumaric acid, A polymer obtained by a polymer reaction with an unsaturated carboxylic acid such as maleic acid, crotonic acid, and itaconic acid can also be used.

The photosensitive composition for a color filter containing the compound represented by the general formula (3) among the above exemplified photopolymerizable compounds is preferable because it can form a film having excellent heat resistance, transparency, adhesion and the like. , Especially cardo epoxy diacrylate,
Cardo epoxy dimethacrylate and bisphenol A type epoxy acrylate are preferable because a pattern having a high polymerization density can be obtained. Among them, cardo epoxy diacrylate is preferable because a significant improvement in sensitivity at the time of exposure is observed.

The above component (a) is used in the photosensitive composition.
20 to 5 based on 100 parts by weight of the total of components (a) to (e)
It can be contained in the range of 0 parts by weight. If the amount of the component (a) is less than 20 parts by weight, the abrasion resistance and chemical resistance of the coating after exposure and curing are unfavorably deteriorated. In the formation of a color filter, the transmittance in regions other than the transmission region may increase, which is not preferable.

The photopolymerization initiator (hereinafter referred to as "component (b)") used in the present invention is not particularly limited. For example, 1-hydroxycyclohexylphenyl ketone, 2,2-dimethoxy-1,2-diphenyl Ethane
1-one, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane- 1-one, 2-hydroxy-2-
Methyl-1-phenylpropan-1-one, 2,4,6
-Trimethylbenzoyldiphenylphosphine oxide, 1- [4- (2-hydroxyethoxy) phenyl]
-2-hydroxy-2-methyl-1-propan-1-one, 2,4-diethylthioxanthone, 2-chlorothioquinton, 2,4-dimethylthioxanthone, 3,3-
Dimethyl-4-methoxybenzophenone, benzophenone, 1-chloro-4-propoxythioxanthone, 1-
(4-Isopropylphenyl) -2-hydroxy-2-
Methylpropan-1-one, 1- (4-dodecylphenyl) -2-hydroxy-2-methylpropan-1-one, 4-benzoyl-4′-methyldimethylsulfide, 4-dimethylaminobenzoic acid, 4-dimethyl Methyl aminobenzoate, ethyl 4-dimethylaminobenzoate,
Butyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-isoamyl 4-dimethylaminobenzoate, 2,2-diethoxyacetophenone, benzyldimethylketal, benzyl-β-
Methoxyethyl acetal, 1-phenyl-1,2-propanedione-2- (o-ethoxycarbonyl) oxime, methyl o-benzoylbenzoate, bis (4-dimethylaminophenyl) ketone, 4,4′-bisdiethylaminobenzophenone 4,4'-dichlorobenzophenone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether, benzoin butyl ether,
p-dimethylaminoacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, 2- (o-chlorophenyl)
-4,5-diphenylimidazolyl dimer, thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, dibenzosuberone, α, α-dichloro-
4-phenoxyacetophenone, pentyl-4-dimethylaminobenzoate, 9-phenylacridine, 1,
7-bis- (9-acridinyl) heptane, 1,5-bis- (9-acridinyl) pentane, 1,3-bis-
(9-acridinyl) propane and the like. Among them, 2- (o-chlorophenyl) -4,5-diphenylimidazolyl dimer and 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one or 2-benzyl-2-one Dimethylamino-1- (4-
Those using a combination of (morpholinophenyl) -butan-1-one have high sensitivity and can be preferably used.

The component (b) can be contained in the range of 0.5 to 30 parts by weight based on 100 parts by weight of the total of the components (a) to (e). If the amount of the component (b) is less than 0.5 part by weight, poor exposure and curing may occur. Undesirably, the transmittance of visible light outside the region may increase.

The pigment (hereinafter referred to as the component (c)) used in the present invention includes yellow,
1 selected from pigments such as orange, red, purple, blue, green and brown
Species or two or more species are used. For black matrix formation, carbon black, resin-coated carbon black, or a pseudo black pigment obtained by blending a colored organic pigment is used. As the carbon black, known carbon blacks such as channel black, furnace black, thermal black and lamp black can be used. In particular, channel black can be suitably used because of its excellent light-shielding properties. Further, as the resin-coated carbon black, a resin-coated carbon obtained by mixing carbon black and a resin having a reactivity with a carboxyl group, a hydroxyl group, and a carbonyl group present on the surface of the carbon black and heating the mixture at 50 to 380 ° C. Black, or a resin-coated carbon black obtained by dispersing an ethylenic monomer in a water-organic solvent mixed system or a water-surfactant mixed system, and performing radical polymerization or radical copolymerization in the presence of a polymerization initiator. Can be Since the resin-coated carbon black has a lower conductivity than carbon black without a resin coating, current leakage is small when a liquid crystal display is formed, and a highly reliable display with low power consumption can be formed.

A pigment used for forming the color filter,
Or a color index number as a pigment used for preparing a pseudo black pigment. I. PigmentYe
llow 20, C.I. I. Pigment Yellow
w24, C.I. I. Pigment Yellow 8
3, C.I. I. Pigment Yellow 86, C.I.
I. Pigment Yellow 93, C.I. I.
Pigment Yellow 109, C.I. I. Pi
gmentYellow 110, C.I. I. Pigme
nt Yellow 117, C.I. I. Pigment
Yellow 125, C.I. I. PigmentYe
low 137, C.I. I. Pigment Yellow
ow 138, C.I. I. Pigment Yellow
139, C.I. I. Pigment Yellow 14
7, C.I. I. Pigment Yellow 148,
C. I. Pigment Yellow 153, C.I.
I. Pigment Yellow 154, C.I. I. P
pigment yellow 166, C.I. I. Pig
Ment Yellow 168, C.I. I. Pigme
nt Orange 36, C.I. I. Pigment O
range 43, C.I. I. Pigment Orange
ge 51, C.I. I. PigmentOrange 5
5, C.I. I. Pigment Orange 59,
C. I. Pigment Orange 61, C.I.
I. Pigment Red 9, C.I. I. Pigmen
t Red 97, C.I. I. PigmentRed12
2, C.I. I. Pigment Red 123, C.I.
I. Pigment Red 149, C.I. I. Pig
Ment Red 168, C.I. I. Pigment
Red 177, C.I. I. Pigment Red18
0, C.I. I. Pigment Red 192, C.I.
I. Pigment Red 215, C.I. I. Pigm
ent Red 216, C.I. I. Pigment R
ed 217, C.I. I. Pigment Red 22
0, C.I. I. Pigment Red 223, C.I.
I. Pigment Red 224, C.I. I. Pigm
ent Red 226, C.I. I. PigmentRe
d 227, C.I. I. Pigment Red 22
8, C.I. I. Pigment Red 240, C.I.
I. Pigment Violet 19, C.I. I. Pi
gment Violet 23, C.I. I. Pigme
ntViolet 29, C.I. I. Pigment Vi
olet 30, C.I. I. Pigment Violet
t37, C.I. I. Pigment Violet4
0, C.I. I. Pigment Violet 50,
C. I. Pigment Blue 15, C.I. I. Pi
gment Blue 15-6, C.I. I. Pigme
nt Blue 22, C.I. I. Pigment Bl
ue 60, C.I. I. Pigment Blue 6
4, C.I. I. Pigment Green 7, C.I. I.
Pigment Green 36, C.I. I. Pigm
ent Brown 23, C.I. I. Pigment
Brown 25, C.I. I. Pigment Brown
26 and the like.

The amount of the component (c) is from (a) to
The range of 10 to 70 parts by weight is selected based on 100 parts by weight of the total of the component (e). If the amount of the component (c) is less than 10 parts by weight, the formed black matrix may have poor light-shielding performance, or the formed color filter may have an increased transmittance of visible light outside the transmission region. Also,
If the amount of the component (c) exceeds 70 parts by weight, curing failure may occur during exposure, which is not preferable.

As the crosslinking agent (hereinafter referred to as the component (d)) used in the present invention, an amino compound is used. In particular, an alkoxymethylated amino resin such as an alkoxymethylated melamine resin or an alkoxymethylated urea resin is used. It can be suitably used. The alkoxymethylated amino resin,
For example, a condensate obtained by reacting melamine or urea with formalin in a boiling aqueous solution is etherified with lower alcohols such as methyl alcohol, ethyl alcohol, propyl alcohol, butyl alcohol, and isopropyl alcohol, and then the reaction solution is cooled. It can be manufactured by precipitation. As the alkoxymethylated amino resin, specifically, methoxymethylated melamine resin, ethoxymethylated melamine resin, propoxymethylated melamine resin, butoxymethylated melamine resin, methoxymethylated urea resin, ethoxymethylated urea resin, propoxymethyl Urea resin, butoxymethylated urea resin and the like. The alkoxymethylated amino resin may be used alone or in combination of two or more. In particular, an alkoxymethylated melamine resin is preferable because a dimensional change amount of the resist pattern with respect to a change in irradiation amount of radiation is small and a stable resist pattern can be formed. Among them, methoxymethylated melamine resin, ethoxymethylated melamine resin,
Propoxymethylated melamine resins and butoxymethylated melamine resins are preferred.

The component (d) can be contained in an amount of 1 to 30 parts by weight based on 100 parts by weight of the total of the components (a) and (b). If the amount of the component (d) is less than 1 part by weight, the heat resistance, chemical resistance, weather resistance, and adhesion of the obtained color filter may decrease, which is not preferable.
If the amount is more than 0 parts by weight, a development defect may occur during development, which is not preferable.

The acid generator used in the present invention (hereinafter referred to as (e)
The component is not particularly limited as long as it is a compound that directly or indirectly generates an acid by heat or light, and specifically, a diphenyliodonium salt, a triphenylsulfonium salt, a phenyldiazonium salt, a benzyltosylate, Nitrobenzyl tosylate, dinitrobenzyl tosylate, benzyl sulfonate, nitrobenzyl sulfonate, benzyl carbonate, nitrobenzyl carbonate, dinitrobenzyl carbonate,
2,4-bis (trichloromethyl) -6- [2- (2-
Furyl) ethenyl] -s-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methyl-2-
Furyl) ethenyl] -s-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-ethyl-2-
Furyl) ethenyl] -s-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-propyl-2
-Furyl) ethenyl] -s-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,5-dimethoxyphenyl) ethenyl] -s-triazine, 2,4-bis (trichloromethyl)- 6- [2- (3,5-diethoxyphenyl) ethenyl] -s-triazine, 2,4-
Bis (trichloromethyl) -6- [2- (3,5-dipropoxyphenyl) ethenyl] -s-triazine;
4-bis (trichloromethyl) -6- [2- (3-methoxy-5-ethoxyphenyl) ethenyl] -s-triazine, 2,4-bis (trichloromethyl) -6- [2-
(3-methoxy-5-propoxyphenyl) ethenyl]
-S-triazine, 2,4-bis (trichloromethyl)
-6- [2- (3,4-methylenedioxyphenyl) ethenyl] -s-triazine, 2,4-bis (trichloromethyl) -6- (3,4-methylenedioxyphenyl)
-S-triazine, 2,4-bis-trichloromethyl-
6- (3-bromo-4methoxy) phenyl-s-triazine, 2,4-bis-trichloromethyl-6- (2-bromo-4methoxy) phenyl-s-triazine, 2,4
Such as -bis-trichloromethyl-6- (2-bromo-4methoxy) styrylphenyl-s-triazine and 2,4-bis-trichloromethyl-6- (3-bromo-4methoxy) styrylphenyl-s-triazine. Triazine compound, α- (p-toluenesulfonyloxyimino)
-Phenylacetonitrile, α- (benzenesulfonyloxyimino) -2,4-dichlorophenylacetonitrile, α- (benzenesulfonyloxyimino) -2,
Oxime sulfonate compounds such as 6-dichlorophenylacetonitrile, α- (2-chlorobenzenesulfonyloxyimino) -4-methoxyphenylacetonitrile, α- (ethylsulfonyloxyimino) -1-cyclopentenylacetonitrile, and the like. In particular, a triazine compound can be preferably used because it has high performance as an acid generator by light or heat, has performance as a photopolymerization initiator, and has good solubility even when a solvent is used. Among them, 2,4-bis-trichloromethyl-6- (3-bromo-4methoxy) phenyl-s-triazine, 2,4-bis-trichloromethyl-6- (3-bromo-4-methoxy) styryl-s -Triazines are preferably used.

The component (e) can be contained in an amount of 0.1 to 15 parts by weight based on 100 parts by weight of the total of the components (a) to (e). When the amount of the component (e) is less than 0.1 part by weight, crosslinking and curing by heat and light are not sufficiently performed, and the heat resistance, chemical resistance, weather resistance, and adhesion of the color filter may be reduced. Exceeding the range may cause poor development or scum at the time of development, and also deteriorates the light-shielding properties of the color filter, which is not preferable.

In addition to the above components, the photosensitive composition for a color filter of the present invention may contain a polymer binder in order to adjust coating properties on a substrate at the time of application. Examples of the polymer binder include a copolymer of at least one of acrylic acid and methacrylic acid with at least one of acrylic ester and methacrylic ester. As the acrylic acid ester and methacrylic acid ester, specifically, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, propyl acrylate, propyl methacrylate, isopropyl acrylate, isopropyl methacrylate, N-butyl acrylate, N-butyl methacrylate, tert-butyl acrylate, tert
-Butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, benzyl acrylate, benzyl methacrylate, phenoxy acrylate, phenoxy methacrylate, isobornyl acrylate, isobornyl methacrylate Glycidyl methacrylate, styrene, acrylamide, methacrylamide, acrylonitrile, methacrylonitrile and the like. The copolymer of at least one of acrylic acid and methacrylic acid and at least one of acrylate and methacrylate is produced by a conventional method. Also,
Modified acidic cellulose having a carboxyl group in the side chain,
Polyethylene oxide, polyvinylpyrrolidone, polyvinyl acetate, copolymer of acrylonitrile and styrene,
A copolymer of acrylonitrile with styrene and butadiene, polyvinyl alkyl ether, polyvinyl alkyl ketone, polystyrene, polyamide, polyurethane, polyethylene terephthalate isophthalate, acetyl cellulose, polyvinyl butyral, and the like can also be contained. The polymer binder has a weight average molecular weight of 5,0.
Polymers in the range of 100 to 100,000 are preferred, and polymers in the range of 7,000 to 80,000 are more preferred. If the weight average molecular weight is too low, the film forming ability is poor,
When the film thickness is reduced during development, and when the weight average molecular weight is too high, the development time is prolonged, which may adversely affect the substrate.

The above-mentioned polymer binders include (a) to (e)
It can be contained in a range not exceeding 100 parts by weight based on 100 parts by weight of the total of the components.

Further, the photosensitive composition for a color filter of the present invention can be appropriately blended with an organic solvent for adjusting the viscosity. As the organic solvent, specifically, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, propylene glycol monomethyl Ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monophenyl ether, diethylene Recol dimethyl ether, diethylene glycol diethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate , Diethylene glycol monopropyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monophenyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, Propylene glycol monopropyl ether acetate, 2-methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 2-methyl-3-
Methoxy butyl acetate, 3-methyl-3-methoxy butyl acetate, 3-ethyl-3-methoxy butyl acetate, 2-ethoxy butyl acetate, 4-ethoxy butyl acetate, 4-propoxy butyl acetate, 2-methoxy pentyl acetate, 3-methoxy butyl acetate Methoxypentyl acetate, 4-methoxypentyl acetate,
2-methyl-3-methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate, 3-methyl-
4-methoxypentyl acetate, 4-methyl-4-methoxypentyl acetate, acetone, methyl ethyl ketone, diethyl ketone, methyl peroxobutyl ketone, ethyl isobutyl ketone, tetrahydrofuran, cyclohexanone, methyl propionate, ethyl propionate, propyl propionate, propionic acid Isopropyl, 2-
Methyl hydroxypropionate, ethyl 2-hydroxypropionate, 2-hydroxy-2-methyl, methyl-
3-methoxypropionate, ethyl-3-methoxypropionate, ethyl-3-ethoxypropionate,
Ethyl-3-propoxypropionate, propyl-3
-Methoxypropionate, isopropyl-3-methoxypropionate, ethyl ethoxyacetate, ethyl oxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isoamyl acetate , Methyl carbonate, ethyl carbonate, propyl carbonate, butyl carbonate, methyl pyruvate,
Ethyl pyruvate, propyl pyruvate, butyl pyruvate, methyl acetoacetate, ethyl acetoacetate, benzyl methyl ether, benzyl ethyl ether, dihexyl ether, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, Benzene, toluene, xylene, cyclohexanone, methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol,
Examples thereof include diethylene glycol and glycerin.

The above organic solvent can be blended in an amount of 2,000 parts by weight or less, preferably 1,000 parts by weight or less, based on 100 parts by weight of the total of the components (a) to (e).

If necessary, a plasticizer, a surfactant, an antifoaming agent and other additives can be added. As the plasticizer, dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate,
Examples include dioctyl adipate, dibutyl sebacate, and triacetylglycerin. Examples of the surfactant include various anionic, cationic, and nonionic surfactants. Examples of the defoaming agent include various silicone-based and fluorine-based defoaming agents.

The method for producing a color pattern according to the present invention will be described below with reference to FIG. In FIG. 1, 1 is a substrate, 2 is a photosensitive composition layer for a color filter, 3 is a mask pattern,
Is a color filter pattern, and 5 is a color filter.

(I) Preparation of photosensitive composition for color filter First, components (a) to (e), and if necessary, a polymer binder having a film forming ability, a thermal polymerization inhibitor, an antifoaming agent, and a surfactant Roll mill, ball mill,
A photosensitive composition for a color filter is prepared by stirring well with a sand mill or the like.

(Ii) Formation of Color Filter Pattern The photosensitive composition for a color filter prepared as described above is a contact transfer type coating apparatus such as a roll coater, a reverse coater or a bar coater or a non-contact type coating apparatus such as a spinner or a curtain flow coater. To form a color filter photosensitive composition layer 2 (FIG. 1A).
Next, after selectively exposing the photosensitive composition layer 2 for a color filter through a predetermined mask pattern 3 (FIG. 1).
(B)) The substrate 1 is immersed in a developing solution to selectively dissolve and remove unexposed portions (FIG. 1 (c)). As the substrate, for example, a polarizing plate is used in the production of a liquid crystal panel,
In addition, a glass substrate provided with a black matrix layer and a color filter layer as necessary and a transparent conductive circuit layer provided thereon is also usefully used. In the exposure, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a chemical lamp, an excimer laser generator, or the like is used to irradiate a sufficient amount of energy rays to form a negative image. In the development treatment, an immersion method, a spray method, or the like is used. As a developer used, hydroxides, carbonates, bicarbonates, phosphates, pyrophosphates of alkali metals such as lithium, sodium, and potassium; benzyl; Primary amines such as amine and butylamine; secondary amines such as dimethylamine, dibenzylamine and diethanolamine; tertiary amines such as trimethylamine, triethylamine and triethanolamine
Cyclic amines such as morpholine, piperazine and pyridine; polyamines such as ethylenediamine and hexamethylenediamine; ammonium hydroxides such as tetraethylammonium hydroxide, trimethylbenzylammonium hydroxide and trimethylphenylbenzylammonium hydroxide; trimethylsulfonium hydroxide And sulfonium hydroxides such as diethylmethylsulfonium hydroxide and dimethylbenzylsulfonium hydroxide;
To 10% by weight aqueous solution.

(Iii) Manufacture of Color Filter The color filter pattern 4 formed by the above development process is heated on a hot plate or the like and crosslinked and cured. The heating temperature and time may be any temperature and time sufficient to cure the color filter pattern 4, and are not particularly limited. Usually, 125 to 250 ° C, particularly 160 to 195 ° C for about 1 to 60 minutes is employed. Is done. By the heating, the cross-linking agent and the acid generator react and cross-link and cure, and have excellent adhesion,
The tough color filter 5 is manufactured (FIG. 1D).

[0036]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail based on embodiments, but the present invention is not limited thereto.

Example 1 Structural Formula 6

[0038]

Embedded image 100 parts by weight of compound represented by the formula: 20 parts by weight of trimethylolpropane triacrylate 20 parts by weight of 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one (IRGACURE 369 manufactured by Ciba Geigy) 30 parts by weight Parts: 2- (o-chlorophenyl) -4,5-diphenylimidazolyl dimer 15 parts by weightResin-coated carbon black (EX-1455-90, manufactured by Mikuni Dyestuffs Co., Ltd .; carbon black: coated resin weight ratio = 10: 1.1) 100 parts by weight ・ Methoxymethylated melamine resin 25 parts by weight ・ 2,4-bis-trichloromethyl-6- (3-bromo-4-methoxy) phenyl-s-triazine 5 parts by weight ・ 3-methoxybutyl 300 parts by weight of acetate was dispersed and kneaded for 2 hours using a ball mill, A photosensitive composition was prepared.

Using a reverse coater (“Round Coater” manufactured by Dainippon Screen Co., Ltd.), the obtained photosensitive composition was coated on a glass substrate having a clean surface having a thickness of 1.1 mm to a dry film thickness of 1 μm. It was applied and dried at 80 ° C. for 1 minute. Then, 1200mJ / c by ultra high pressure mercury lamp
Exposure was performed by irradiating the entire surface with ultraviolet rays of m ² and heated on a hot plate at 200 ° C. for 15 minutes. The OD value (optical density) of the substrate was measured with a measuring device “PDA-65” (manufactured by Konica Corporation) and found to be 2.8. Thereafter, a protective film "Optomer" (acrylic-epoxy resin, manufactured by Nippon Synthetic Rubber Co., Ltd.) was formed on the substrate using a spinner to a dry film thickness of 2 μm.
, And then heated on a hot plate at 200 ° C. for 15 minutes. 95% humidity
After keeping in a constant temperature room at 80 ° C for 100 hours, JISD
According to the test method of No. 0202, cross cuts are made in a grid pattern to make 100 cells, and then a peeling test is performed three times using cellophane tape, and the peeling state of the cells is observed using a magnifying glass. 1 according to
The number of peeled cells out of the 00 cells was checked and evaluated. Table 1 shows the results.

Further, the obtained photosensitive composition for a color filter is coated on the above glass substrate by using a reverse coater so as to have a dry film thickness of 1 μm, and dried, and then a negative mask capable of reproducing a 60 μm line / 60 μm space. And exposed to 800 mJ / cm ² of ultraviolet light, and then exposed to 90 ° C. at 25 ° C. and 0.5% sodium carbonate aqueous solution.
The film was spray-developed for seconds, irradiated with an ultraviolet ray of 500 mJ / cm ^{2 on} the entire surface, and heated on a hot plate at 200 ° C. for 15 minutes. Three obtained substrates were prepared, immersed in an aqueous solution of N-methylvirolidone, γ-butyrolactone, and 4% NaOH for 1 hour at 40 ° C. for 1 hour, and observed for chipping and peeling of the pattern. Table 1 shows the results.

Example 2 100 parts by weight of methacrylic acid / methyl methacrylate copolymer (25/75% by weight, weight average molecular weight: about 20,000) Structural formula 7

[0042]

Embedded image 20 parts by weight of trimethylolpropane triacrylate 20 parts by weight of 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one (IRGACURE 369 manufactured by Ciba Geigy) 18 parts by weight Part-2- (o-chlorophenyl) -4,5-diphenylimidazolyl dimer 5 parts by weight-C.I. I. Pigment Red 177 80 parts by weight C.I. I. Pigment Yellow 83 20 parts by weight ・ Ethoxymethylated melamine resin 50 parts by weight ・ 2,4-bis-trichloromethyl-6- [3-bromo-4-di- (ethoxycarbonylmethyl) amino] phenyl-s-triazine 25 parts by weight Part-300 parts by weight of 3-methoxybutyl acetate was dispersed and kneaded for 2 hours using a ball mill to prepare a photosensitive composition for a red filter.

The obtained photosensitive composition was applied on a glass substrate to a dry film thickness of 1 μm in the same manner as in Example 1, dried at 80 ° C. for 1 minute, and 800 m thick with an ultrahigh pressure mercury lamp.
Exposure was performed by irradiating the entire surface with ultraviolet rays of J / cm ² and heated on a hot plate at 200 ° C. for 15 minutes. Thereafter, a protective film "Optomer" (acryl-epoxy resin, manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied on the substrate using a spinner so that the dry film thickness becomes 2 [mu] m, and dried. Heated at 150C for 15 minutes. The transmittance of the obtained red filter was measured with a measuring device “MCPD-1000” (manufactured by Otsuka Electronics Co., Ltd.) and found to be 90.8% at a wavelength of 620 nm. This substrate is humidified at 95% and 80 ° C.
After keeping in a constant temperature room for 100 hours, JIS D020
According to the test method 2, 100 cross-cuts are made in a grid pattern to make 100 cells, and then a peeling test is performed three times using cellophane tape, and the peeled state of the cells is observed using a magnifying glass. 100 according to
The number of peeled cells in the cells was examined and evaluated. Table 1 shows the results.

The photosensitive composition for a color filter prepared as described above is coated on a glass substrate using a reverse coater so as to have a dry film thickness of 1 μm, and dried, and then a negative mask capable of reproducing a 60 μm line / 60 μm space. And exposed to ultraviolet light of 500 mJ / cm ² through the substrate.
After the exposure, the substrate is spray-developed with a 0.5% aqueous solution of sodium carbonate at 25 ° C. for 90 seconds, and 500 mJ / c.
200 on a hot plate to the entire surface irradiated with ultraviolet rays of m ²
Heated at 150C for 15 minutes. Three obtained substrates were prepared, and N
-Methylvirolidone, γ-butyrolactone, and 4%
Each was immersed in an aqueous NaOH solution at 40 ° C. for 1 hour, and the pattern was observed for chipping and peeling. Table 1 shows the results.

Example 3 100 parts by weight of methacrylic acid / methyl methacrylate copolymer (25/75% by weight ratio, weight-average molecular weight: about 20,000) Structural formula 8

[0046]

Embedded image 20 parts by weight of trimethylolpropane triacrylate 20 parts by weight of 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one (IRGACURE 369 manufactured by Ciba Geigy) 18 parts by weight Part-2- (o-chlorophenyl) -4,5-diphenylimidazolyl dimer 5 parts by weight-C.I. I. Pigment Green 36 135 parts by weight ・ Methoxymethylated melamine resin 10 parts by weight ・ 2,4-bis-trichloromethyl-6- (4-methoxy) phenyl-s-triazine 1 part by weight ・ 3-methoxybutyl acetate 300 parts by weight The mixture was dispersed and kneaded for 2 hours using a ball mill to prepare a photosensitive composition for a green filter.

The obtained photosensitive composition was applied on a glass substrate to a dry film thickness of 1 μm in the same manner as in Example 1 and dried at 80 ° C. for 1 minute.
Exposure was performed by irradiating the entire surface with ultraviolet rays of J / cm ² and heated on a hot plate at 200 ° C. for 15 minutes. Thereafter, a protective film "Optomer" (acryl-epoxy resin, manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied on the substrate using a spinner so that the dry film thickness becomes 2 [mu] m, and dried. Heated at 150C for 15 minutes. When the transmittance of the obtained green filter was measured with a measuring device “MCPD-1000” (manufactured by Otsuka Electronics Co., Ltd.), it was 83.5% at a wavelength of 530 nm. This substrate is humidified at 95% and 80 ° C.
After keeping in a constant temperature room for 100 hours, JIS D020
According to the test method 2, 100 cross-cuts are made in a grid pattern to make 100 cells, and then a peeling test is performed three times using cellophane tape, and the peeled state of the cells is observed using a magnifying glass. 100 according to
The number of peeled cells in the cells was examined and evaluated. Table 1 shows the results.

The above-prepared photosensitive composition for a color filter was coated on a glass substrate using a reverse coater to a dry film thickness of 1 μm and dried. Then 60 μm
Exposure was performed by irradiating 500 mJ / cm ² of ultraviolet light through a negative mask capable of reproducing lines / 60 μm space, and then exposing to 90 ° C. using a 0.5% aqueous solution of sodium carbonate at 25 ° C.
After spray development for 2 seconds, the whole surface was irradiated with ultraviolet rays of 500 mJ / cm 2 and heated on a hot plate at 200 ° C. for 15 minutes. Three substrates were prepared, immersed in N-methyl virolidone, γ-butyrolactone, and a 4% aqueous NaOH solution at 40 ° C. for 1 hour, respectively, and observed for chipping and peeling of the pattern. Table 1 shows the results.

Example 4 100 parts by weight of methacrylic acid / methyl methacrylate copolymer (25/75% by weight, weight average molecular weight: about 20,000) Structural formula 9

[0050]

Embedded image 25 parts by weight of trimethylolpropane triacrylate 18 parts by weight of 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one (manufactured by Ciba Geigy: IRGACURE 369) Part-2- (o-chlorophenyl) -4,5-diphenylimidazolyl dimer 5 parts by weight-C.I. I. Pigment Blue 15-6 50 parts by weight ・ Methoxymethylated melamine resin 25 parts by weight ・ 2,4-bis-trichloromethyl-6- (3-bromo-4-methoxy) styryl-s-triazine 5 parts by weight ・ 3-methoxy 300 parts by weight of butyl acetate was dispersed and kneaded for 2 hours using a ball mill to prepare a photosensitive composition for a blue filter.

The prepared photosensitive composition was applied on a glass substrate to a dry film thickness of 1 μm in the same manner as in Example 1, dried at 80 ° C. for 1 minute, and 800 m
The entire surface was exposed to ultraviolet light of J / cm 2, and exposed, and heated on a hot plate at 200 ° C. for 15 minutes. Thereafter, a protective film “OPTMER” (acrylic-epoxy resin, manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied on the substrate using a spinner so that the dry film thickness becomes 2 μm, dried, and further heated to 200 ° C. on a hot plate. And heated for 15 minutes. When the transmittance of the obtained blue filter was measured by a measuring device “MCPD-1000” (manufactured by Otsuka Electronics Co., Ltd.), it was 88.7% at a wavelength of 460 nm. This substrate is humidified at 95% and 80 ° C.
After keeping in a constant temperature room for 100 hours, JIS D020
According to the test method 2, 100 cross-cuts are made in a grid pattern to make 100 cells, and then a peeling test is performed three times using cellophane tape, and the peeled state of the cells is observed using a magnifying glass. 100 according to
The number of peeled cells in the cells was examined and evaluated. Table 1 shows the results.

The above-prepared photosensitive composition for a color filter was dried on a glass substrate using a reverse coater to a dry film thickness of 1 μm.
m, and then dried, and then 60 μm line / 6
Through a negative mask capable of reproducing a 0 μm space, 500
Exposure is performed by irradiating ultraviolet rays of mJ / cm ² ,
The mixture was spray-developed with a 0.5% aqueous solution of sodium carbonate at 90 ° C. for 90 seconds, irradiated with ultraviolet rays of 500 mJ / cm ^{2 on} the entire surface, and heated on a hot plate at 200 ° C. for 15 minutes. Three substrates obtained were prepared, and 4 substrates were respectively added to N-methyl virolidone, γ-butyrolactone, and 4% NaOH aqueous solution.
It was immersed at 0 ° C. for 1 hour and observed for chipping and peeling of the pattern. Table 1 shows the results.

Comparative Example 1 In Example 1, methoxymethylated melamine resin 25 was used.
Parts by weight and 2,4-bis-trichloromethyl-6-
A photosensitive composition for black matrix was prepared by dispersing and kneading for 2 hours using a ball mill in the same manner as in Example 1 except that 5 parts by weight of (4-methoxy) phenyl-s-triazine was not added.

Using a reverse coater (“Round Coater” manufactured by Dainippon Screen Co., Ltd.), the obtained photosensitive composition was dried on a glass substrate having a clean surface with a thickness of 1.1 mm to a dry film thickness of 1 μm. It was applied and dried at 80 ° C. for 1 minute. Then, 1200mJ / c by ultra high pressure mercury lamp
Exposure was performed by irradiating the entire surface with ultraviolet rays of m ² and heated on a hot plate at 200 ° C. for 15 minutes. The OD value (optical density) of the obtained substrate was measured using a measuring device “PDA-65” (manufactured by Konica Corporation).
It was 2.8 when measured using. Thereafter, a protective film "Optomer" (acrylic-epoxy resin, manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied on the substrate using a spinner so as to have a dry film thickness of 2 μm, and dried. Heated at 150C for 15 minutes. After keeping the substrate in a constant temperature room at a humidity of 95% and a temperature of 80 ° C. for 100 hours, 100 cross-cuts are formed in a grid pattern according to the test method of JIS D0202, and then a peeling test is performed using cellophane tape. The test was performed three times, and the peeled state of the cells was observed using a magnifying glass.
According to 2, the number of peeled cells in 100 cells was checked and evaluated. Table 1 shows the results.

The above-prepared photosensitive composition for a color filter was coated on the above glass substrate using a reverse coater so as to have a dry film thickness of 1 μm, and dried.
Exposure was performed by irradiating with 800 mJ / cm ² ultraviolet light through a negative mask capable of reproducing lines / 60 μm space, and then exposed to a 90% aqueous solution of 0.5% sodium carbonate at 25 ° C.
The film was spray-developed for seconds, irradiated with an ultraviolet ray of 500 mJ / cm ^{2 on} the entire surface, and heated on a hot plate at 200 ° C. for 15 minutes. Three obtained substrates were prepared and immersed in an aqueous solution of N-methylvirolidone, γ-butyrolactone, and 4% NaOH at 40 ° C. for 1 hour, respectively, and observed for chipping and peeling of the pattern. Table 1 shows the results.

Comparative Example 2 In Example 2, methoxymethylated melamine resin 25 was used.
Instead of parts by weight, o-cresol novolak type epoxy resin (“N-673” manufactured by Dainippon Ink and Chemicals, Inc.) 2
5 parts by weight, and 2,4-bis-trichloromethyl-6
Dispersing and kneading with a ball mill for 2 hours in the same manner as in Example 2 except that 5 parts by weight of a triphenylsulfonium salt was added instead of 5 parts by weight of-(4-methoxy) phenyl-s-triazine, and the mixture was kneaded red. A photosensitive composition for a filter was prepared.

The obtained photosensitive composition was coated on a glass substrate to a dry film thickness of 1 μm in the same manner as in Example 2, dried at 80 ° C. for 1 minute, and 800 m thick with an ultrahigh pressure mercury lamp.
Exposure was performed by irradiating the entire surface with ultraviolet rays of J / cm ² and heated on a hot plate at 200 ° C. for 15 minutes. Thereafter, a protective film "Optomer" (acrylic-epoxy resin, manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied on the substrate using a spinner so as to have a dry film thickness of 2 μm, and dried. Heated at 150C for 15 minutes. The transmittance of the obtained red filter was measured with a measuring device “MCPD-1000” (manufactured by Otsuka Electronics Co., Ltd.) and found to be 78.1% at a wavelength of 620 nm. This substrate was conditioned at a humidity of 95% and 80%.
After keeping in a constant temperature room at 100 ° C for 100 hours, JISD02
In accordance with the test method of No. 02, cross cuts were made in a grid pattern to make 100 cells, and then a peeling test was performed three times using cellophane tape, and the peeling state of the cells was observed using a magnifying glass. 10 according to
The number of peeled cells in 0 cells was examined and evaluated. Table 1 shows the results.

Further, the photosensitive composition for a color filter prepared as described above is applied on a glass substrate using a reverse coater so as to have a dry film thickness of 1 μm, and then dried. Then, a negative mask capable of reproducing 60 μm line / 60 μm space is used. Through
Exposure was performed by irradiating with 500 mJ / cm ² ultraviolet ray, spray-developed with a 0.5% aqueous solution of sodium carbonate at 25 ° C. for 90 seconds, and entirely irradiated with 500 mJ / cm ² ultraviolet ray at 200 ° C., 15 ° C. on a hot plate. Heated for minutes.
Three obtained substrates were prepared, and N-methyl vilolidone, γ
-Butyrolactone and 4% NaOH aqueous solution were each immersed in a 40 ° C. aqueous solution for 1 hour to observe chipping and peeling of the pattern. Table 1 shows the results.

[0059]

[Table 1]

[0060]

The photosensitive resin composition for a color filter of the present invention is a photosensitive resin composition for a color filter which is excellent in heat resistance, adhesion and chemical resistance. The filter has high brightness and excellent contrast and is useful as a filter for a TFT liquid crystal panel or an STN liquid crystal panel.

[Brief description of the drawings]

FIG. 1 is a schematic view of a method for manufacturing a color filter of the present invention.

[Explanation of symbols]

 Reference Signs List 1 substrate 2 photosensitive composition layer 3 mask pattern 4 color pattern 5 color filter

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁶ Identification symbol FI // C08F 299/02 C08F 299/02 (72) Inventor Hiroshi Komano 150 Nakamaruko Nakahara-ku Kawasaki-shi, Kanagawa Prefecture Inside

Claims (9)

[Claims] 1. A color filter photosensitive composition comprising (a) a photopolymerizable compound, (b) a photopolymerization initiator, (c) a pigment, (d) a crosslinking agent, and (e) an acid generator. Composition. 2. The component (a) has the general formula 1 [Wherein R ₁ and R ₂ are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogen atom;
₃ is a hydrogen atom or a methyl group, and X has 1 carbon atom in the side chain.
To 3 alkyl alkylene group having 1 to 5 carbon atoms which may have a, -CO -, - O -, - CH 2 -, - C (CH 3)
—, —SO ₂ — or the following chemical formula ₂ Represents a residue or non-existent, Y is maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl endmethylene tetrahydrophthalic anhydride, It represents an acid anhydride residue such as chlorendic acid or methyltetrahydrophthalic anhydride, and n represents an integer of 1 to 20. At least one selected from compounds represented by the formula:
The photosensitive composition for a color filter according to claim 1, which is a seed. 3. The photosensitive composition for a color filter according to claim 1, wherein the component (c) is a resin-coated carbon black. 4. The method according to claim 1, wherein the component (c) is at least one selected from a yellow organic pigment, an orange organic pigment, a red organic pigment, a violet organic pigment, a blue organic pigment, a green organic pigment and a brown organic pigment. The photosensitive composition for a color filter according to claim 1. 5. The photosensitive composition for a color filter according to claim 5, wherein the component (d) is an alkoxymethylated amino resin. 6. The alkoxymethylated amino resin is at least one selected from methoxymethylated melamine resin, ethoxymethylated melamine resin, propoxymethylated melamine resin and butoxymethylated melamine resin. The photosensitive composition for a color filter according to the above. 7. The photosensitive composition for a color filter according to claim 1, wherein the component (e) is a triazine compound. 8. The method of claim 1, wherein the triazine compound is 2,4-bis (trichloromethyl) -6- (3-bromo-4-methoxy) phenyl-s-triazine and 2,4-bis (trichloromethyl) -6- (3- The photosensitive composition for a color filter according to claim 5, wherein the photosensitive composition is at least one selected from bromo-4-methoxy) styryl-s-triazine. 9. A photosensitive composition for a color filter according to claim 1, applied to a substrate, dried, exposed and developed through a negative mask, and then heated and crosslinked and cured. A method for manufacturing a color filter, comprising: