JPH10220699A - Gas supply system - Google Patents

Gas supply system

Info

Publication number
JPH10220699A
JPH10220699A JP2883497A JP2883497A JPH10220699A JP H10220699 A JPH10220699 A JP H10220699A JP 2883497 A JP2883497 A JP 2883497A JP 2883497 A JP2883497 A JP 2883497A JP H10220699 A JPH10220699 A JP H10220699A
Authority
JP
Japan
Prior art keywords
gas
gas supply
flow
supply system
pipes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2883497A
Other languages
Japanese (ja)
Inventor
Naoto Tashiro
直登 田代
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP2883497A priority Critical patent/JPH10220699A/en
Publication of JPH10220699A publication Critical patent/JPH10220699A/en
Pending legal-status Critical Current

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  • Pipeline Systems (AREA)

Abstract

PROBLEM TO BE SOLVED: To stably supply gas of specified pressure to treating facilities in a gas supply system for supplying the same gas to the treating facilities arranged into two lines. SOLUTION: The gas supply stop caused by the malfunction of a solenoid closing valve is eliminated and even if the gas supply from a gas cylinder is insufficient, another gas cylinder makes up for the insufficient gas supply by eliminating a solenoid closing for cutting off gas supply, integrating two system gas supply pipes into one system gas supply pipes 7 and 7a by connecting the two system gas supply pipes through a connection pipe 3, providing gas cylinders 4 and 4a at both ends of this one system gas supply pipes and supplying gas by making the gas flow from the two gas cylinders 4 and 4a equal to each other by the flow control equipment 1 and 1a provided at both ends of the gas supply pipes 7 and 7a.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置の製造
における複数の処理設備にガスを供給する二系統をもつ
ガス供給システムに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas supply system having two systems for supplying gas to a plurality of processing facilities in the manufacture of semiconductor devices.

【0002】[0002]

【従来の技術】一般に、半導体装置の製造工程には、拡
散、エッチング、洗浄および薄膜形成などの種々の処理
設備が設けらており、これら処理設備には処理に必要な
種々のガスが供給されていた。そして、これら供給すべ
きガスは、それぞれの処理設備に使用される同一ガスは
一つのガス供給系統から供給されていた。
2. Description of the Related Art Generally, in a manufacturing process of a semiconductor device, various processing equipment such as diffusion, etching, cleaning and thin film formation are provided, and these processing equipment are supplied with various gases required for processing. I was These gases to be supplied have been supplied from one gas supply system with the same gas used for each processing facility.

【0003】図2は従来の一例におけるガス供給システ
ムを説明するための配管系統図である。この種の液化ガ
ス供給システムは、例えば、図2に示すように、同種類
のガスを必要とする二列に配置された処理設備9,9a
のそれぞれに分岐管8,8aを介してガスを供給するA
およびBのガス供給系統の二本のガス供給配管7,7a
と、キャビネット6に収納され液化ガスを蓄えるガスボ
ンベ4,4aと、ガスボンベ4,4aから供給されるガ
スの圧力を調整する圧力調整器5,5aと、ガス供給配
管7を開閉する電磁開閉弁10,10aとで構成されて
いる。
FIG. 2 is a piping diagram for explaining a gas supply system according to a conventional example. This type of liquefied gas supply system is, for example, as shown in FIG. 2, processing equipment 9, 9a arranged in two rows requiring the same type of gas.
A, which supplies gas to each of the above through branch pipes 8, 8a
Gas supply pipes 7 and 7a of the gas supply system of B and B
And gas cylinders 4 and 4a stored in the cabinet 6 for storing liquefied gas, pressure regulators 5 and 5a for adjusting the pressure of gas supplied from the gas cylinders 4 and 4a, and an electromagnetic on-off valve 10 for opening and closing the gas supply pipe 7. , 10a.

【0004】また、A系統およびB系統のガス供給配管
7,7aによってガスが供給されるこれらの処理設備
9,9aのガス消費量はそれぞれ違い、使用する毎に電
磁開閉弁10,10aを開き処理設備9,9aが備える
流量計と流量調節弁を操作することによってガスの流量
を設定していた。そして、ガス消費量の演算や電磁開閉
弁10,10aの開閉動作などコンピュータソフトによ
り制御されていた。
[0004] The gas consumption of the processing equipment 9, 9a to which gas is supplied by the gas supply pipes 7, 7a of the A system and the B system, respectively, is different, and the electromagnetic on-off valves 10, 10a are opened each time they are used. The gas flow rate is set by operating the flow meters and the flow control valves provided in the processing facilities 9 and 9a. The calculation of the gas consumption and the opening / closing operation of the solenoid valves 10 and 10a are controlled by computer software.

【0005】[0005]

【発明が解決しようとする課題】上述した従来のガス供
給システムでは、シーケンス動作もコンピュータ制御で
行なっているので、コンピュータからの指令により電磁
開閉弁の電磁コイルに通電しているにもかかわらず、機
械的に弁体が動作せずガス供給配管の開口が閉じないま
でも完全に開けることができず所定圧力のガスが供給で
きなくなったり、ノイズのために電磁コイルに供給すべ
き電流が遮断され弁体が閉じガスが供給できなくなるな
どがしばしば起きていた。このように処理中に突然ガス
供給の停止や圧力の低下など起きると、処理中の仕掛品
が不良になるという問題がある。
In the conventional gas supply system described above, the sequence operation is also controlled by the computer, so that the electromagnetic coil of the solenoid on-off valve is energized in accordance with a command from the computer. Even if the valve body does not operate mechanically and the opening of the gas supply pipe does not close, it can not be completely opened and gas at a predetermined pressure can not be supplied, or the current to be supplied to the electromagnetic coil due to noise is cut off Often, the valve body closed and gas could not be supplied. As described above, if the gas supply is suddenly stopped or the pressure is reduced during processing, there is a problem that the work-in-process during processing becomes defective.

【0006】また、この二系統のガス供給システムで
は、AとBの系統の処理設備のガスの消費量が違いによ
り、ガスボンベの交換による処理設備の停止回数に差が
生じ、前後の工程とこの処理工程が円滑に連係できない
という欠点がある。
In addition, in this two-system gas supply system, the difference in the gas consumption of the processing equipment of the A and B systems causes a difference in the number of times the processing equipment is stopped due to the replacement of the gas cylinder. There is a disadvantage that the processing steps cannot be coordinated smoothly.

【0007】従って、本発明の目的は、処理設備に安定
して所定の圧力のガスを供給できるガス供給システムを
提供することである。
Accordingly, it is an object of the present invention to provide a gas supply system capable of stably supplying a gas at a predetermined pressure to a processing facility.

【0008】[0008]

【課題を解決するための手段】本発明の特徴は、液化ガ
スを蓄えるガスボンベと、二つの前記ガスボンべを両端
に接続するとともに派生する複数の分岐管を介して複数
の処理設備に気化ガスを供給するガス供給配管と、前記
ガスボンベと前記ガス供給配管との間のそれぞれに設け
られる流量調整器と、前記ガス供給配管の両端から供給
される前記気化ガスの流量を同じになるように前記流量
調整器を制御する流量制御部とを備えるガス供給システ
ムである。また、前記ガスボンベに並列に予備のガスボ
ンベを備えることが望ましい。
SUMMARY OF THE INVENTION A feature of the present invention is that a gas cylinder for storing a liquefied gas and a plurality of processing equipment are connected to both ends of the gas cylinder and a plurality of branch pipes derived from the gas cylinder are supplied to a plurality of processing facilities. A gas supply pipe to be supplied, a flow rate regulator provided between the gas cylinder and the gas supply pipe, and the flow rate so that the flow rate of the vaporized gas supplied from both ends of the gas supply pipe becomes the same. And a flow control unit for controlling the regulator. Further, it is desirable to provide a spare gas cylinder in parallel with the gas cylinder.

【0009】[0009]

【発明の実施の形態】次に、本発明について図面を参照
して説明する。
Next, the present invention will be described with reference to the drawings.

【0010】図1は本発明の一実施の形態におけるガス
供給システムを説明するための配管系統図である。この
ガス供給システムは、図1に示すように、液化ガスを蓄
えるガスボンベ4,4aと、二つのガスボンべ4,4a
を連結管3を介して両端に接続するとともに派生する複
数の分岐管8を介して複数の処理設備9,9aに気化ガ
スを供給するガス供給配管7,7aと、ガスボンベ4,
4aとガス供給配管7,7aとの間のそれぞれに設けら
れる流量調整器1,1aと、ガス供給配管の両端から供
給される気化ガスの流量を同じになるように流量調整器
1,1aを制御する流量制御部2とを備えている。
FIG. 1 is a piping system diagram for explaining a gas supply system according to one embodiment of the present invention. As shown in FIG. 1, the gas supply system includes a gas cylinder 4, 4a for storing liquefied gas and two gas cylinders 4, 4a.
And gas supply pipes 7, 7a for supplying vaporized gas to a plurality of processing equipments 9, 9a via a plurality of branch pipes 8 derived therefrom and connected to both ends via a connecting pipe 3, and a gas cylinder 4,
The flow controllers 1 and 1a provided between the gas supply pipes 4a and the gas supply pipes 7 and 7a, respectively, and the flow regulators 1 and 1a so that the flow rates of the vaporized gas supplied from both ends of the gas supply pipe become the same. And a flow control unit 2 for controlling.

【0011】このガス供給システムは、従来の信頼性の
ない電磁開閉弁を廃止し、ガス供給遮断はガスボンベ
4,4aにある機械式手動開閉弁で行なうようにしたこ
とである。また、この二つガスのAおよびB系統のガス
供給配管7,7aにあるガス圧を設定する圧力調整器
5,5a以外にガス流量を設定する流量調整器1を設け
たことである。この流量調整器1,1aは、例えば、1
〜200slm程度に流量設定を精密に行なえるマスフ
ローコントローラを使用することが望ましい。さらに、
ガスボンベ4,4aと並列に圧力調整器5の前段に配管
を介してガスボンべ4b,4cを接続することが望まし
い。
In this gas supply system, the conventional unreliable electromagnetic on-off valve is eliminated, and the gas supply is cut off by a mechanical manual on-off valve in the gas cylinders 4, 4a. Further, a flow regulator 1 for setting a gas flow rate is provided in addition to the pressure regulators 5 and 5a for setting gas pressures in the gas supply pipes 7 and 7a for the two gases A and B. The flow controllers 1, 1a are, for example, 1
It is desirable to use a mass flow controller that can precisely set the flow rate to about 200 slm. further,
It is desirable to connect the gas cylinders 4b and 4c via piping in front of the pressure regulator 5 in parallel with the gas cylinders 4 and 4a.

【0012】次に、このガス供給システムの運転につい
て説明する。まず、処理設備9,9aの全てが稼働して
いないことを確認し、ガスボンベ4,4aの手動弁を開
き圧力調整器5,5aによりガスの圧力を調整する。次
に、ガスを空流ししながら流量調整器1と1aによりガ
スの流量が同じになるように流量制御部2を制御する。
そして、空流し用(図示せず)を閉じ準備を完了する。
Next, the operation of the gas supply system will be described. First, it is confirmed that all of the processing equipments 9 and 9a are not operating, and the manual valves of the gas cylinders 4 and 4a are opened to adjust the gas pressure by the pressure regulators 5 and 5a. Next, the flow rate controller 2 and the flow rate controller 1a control the flow rate controller 2 so that the flow rate of the gas becomes the same while the gas is being flown.
Then, the air flow (not shown) is closed to complete the preparation.

【0013】このように準備が完了すると、長時間運転
しても処理設備9,9aは常に一定の流量のガスが供給
され、片方のガスボンベ4,4aの供給量が減じても他
のガスボンベ4,4aが補完し処理設備9,9aの稼働
が安定して行なえる。
When the preparation is completed as described above, the processing equipment 9, 9a is always supplied with a constant flow rate of gas even when it is operated for a long time, and the other gas cylinder 4, even if the supply amount of one of the gas cylinders 4, 4a is reduced. , 4a complement each other, and the operation of the processing equipment 9, 9a can be stably performed.

【0014】また、処理設備9,9aの稼働積算時間が
進むにつれて、流量調整器1,1aによるガスの流量が
許容値より低下したら、流量制御部2から警報を発す
る。このとき、予備のガスボンベ4b,4cのいずれか
の手動弁を開き、今迄使用していたガスボンベ4,4a
の手動弁を閉してから新しいガスボンベに交換する。
Further, when the flow rate of the gas by the flow regulators 1 and 1a falls below an allowable value as the integrated operation time of the processing equipments 9 and 9a advances, an alarm is issued from the flow control unit 2. At this time, one of the manual valves of the spare gas cylinders 4b and 4c is opened, and the gas cylinders 4 and 4a used so far are opened.
Close the manual valve and replace with a new gas cylinder.

【0015】[0015]

【発明の効果】以上説明したように本発明は、従来備え
ていた信頼性の低い電磁開閉弁を廃止するとともに二系
統のガス供給配管を連結管で繋ぎ一系統のガス供給配管
とし、この一系統のガス供給配管の両端にガスボンベを
設け、かつガス供給配管の両端に設けれる流量調整器に
よって二つのガスボンベからガスの流量を同じにしてガ
スを供給することによって、電磁開閉弁の動作不良によ
るガス供給停止がなくなるとともに片方のガスボンベか
らのガス供給が不足してももう一つのガスボンベが補完
し、常に一定流量のガスの供給が行なわれので、従来、
起きていたガス供給不足あるいは停止による仕掛品の不
良を無くすことができるという効果がある。
As described above, according to the present invention, the conventional low reliability electromagnetic on-off valve is eliminated, and two gas supply pipes are connected by a connecting pipe to form one gas supply pipe. By providing gas cylinders at both ends of the gas supply pipe of the system, and supplying the gas at the same gas flow rate from the two gas cylinders by the flow regulator provided at both ends of the gas supply pipe, the malfunction of the electromagnetic on-off valve Even if there is no gas supply stoppage and the gas supply from one gas cylinder is insufficient, the other gas cylinder will supplement and supply a constant flow of gas at all times.
This has the effect of eliminating defects in work-in-progress due to insufficient gas supply or stoppage.

【0016】また、バックアップのガスボンベを設ける
ことによって、処理設備を停止せず長期間処理設備の稼
働を行なうことができ、処理設備の稼働率を向上させる
という効果もある。
Further, by providing a backup gas cylinder, the processing equipment can be operated for a long period of time without stopping the processing equipment, and there is an effect that the operation rate of the processing equipment is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施の形態におけるガス供給システ
ムを説明するための配管系統図である。
FIG. 1 is a piping system diagram for explaining a gas supply system according to an embodiment of the present invention.

【図2】従来の一例におけるガス供給システムを説明す
るための配管系統図である。
FIG. 2 is a piping diagram for explaining a gas supply system according to a conventional example.

【符号の説明】[Explanation of symbols]

1,1a 流量調整器 2 流量制御部 3 連結管 4,4a,4b,4c ガスボンベ 5,5a 圧力調整器 6,6a キャビネット 7,7a ガス供給管 8,8a 分岐管 9,9a 処理設備 10,10a 電磁開閉弁 1, 1a Flow regulator 2 Flow controller 3 Connecting pipe 4, 4a, 4b, 4c Gas cylinder 5, 5a Pressure regulator 6, 6a Cabinet 7, 7a Gas supply pipe 8, 8a Branch pipe 9, 9a Processing equipment 10, 10a Solenoid on-off valve

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 液化ガスを蓄えるガスボンベと、二つの
前記ガスボンべを両端に接続するとともに派生する複数
の分岐管を介して複数の処理設備に気化ガスを供給する
ガス供給配管と、前記ガスボンベと前記ガス供給配管と
の間のそれぞれに設けられる流量調整器と、前記ガス供
給配管の両端から供給される前記気化ガスの流量を同じ
になるように前記流量調整器を制御する流量制御部とを
備えることを特徴とするガス供給システム。
1. A gas cylinder for storing liquefied gas, a gas supply pipe for connecting two gas cylinders to both ends and supplying a vaporized gas to a plurality of processing facilities via a plurality of branch pipes derived therefrom, and the gas cylinder. A flow controller provided between each of the gas supply pipes, and a flow control unit that controls the flow controller so that the flow rate of the vaporized gas supplied from both ends of the gas supply pipes is the same. A gas supply system comprising:
【請求項2】 前記ガスボンベに並列に予備のガスボン
ベを備えることを特徴とする請求項1記載のガス供給シ
ステム。
2. The gas supply system according to claim 1, wherein a spare gas cylinder is provided in parallel with said gas cylinder.
JP2883497A 1997-02-13 1997-02-13 Gas supply system Pending JPH10220699A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2883497A JPH10220699A (en) 1997-02-13 1997-02-13 Gas supply system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2883497A JPH10220699A (en) 1997-02-13 1997-02-13 Gas supply system

Publications (1)

Publication Number Publication Date
JPH10220699A true JPH10220699A (en) 1998-08-21

Family

ID=12259417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2883497A Pending JPH10220699A (en) 1997-02-13 1997-02-13 Gas supply system

Country Status (1)

Country Link
JP (1) JPH10220699A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000323464A (en) * 1999-04-22 2000-11-24 Tokyo Electron Ltd Apparatus and method for supplying gas for semiconductor manufacturing apparatus
JP4666856B2 (en) * 1999-07-16 2011-04-06 アドバンスド テクノロジー マテリアルズ,インコーポレイテッド Automatic switching decompression gas delivery system and automatic switching decompression gas delivery method
CN106195638A (en) * 2016-08-22 2016-12-07 日照北科新金属材料有限公司 Shop air supercharging voltage-stabilizing system
CN109340575A (en) * 2018-11-02 2019-02-15 中国石油天然气集团公司 A kind of online regulator and its online pressure regulation method of gas pipeline

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000323464A (en) * 1999-04-22 2000-11-24 Tokyo Electron Ltd Apparatus and method for supplying gas for semiconductor manufacturing apparatus
JP4666856B2 (en) * 1999-07-16 2011-04-06 アドバンスド テクノロジー マテリアルズ,インコーポレイテッド Automatic switching decompression gas delivery system and automatic switching decompression gas delivery method
CN106195638A (en) * 2016-08-22 2016-12-07 日照北科新金属材料有限公司 Shop air supercharging voltage-stabilizing system
CN109340575A (en) * 2018-11-02 2019-02-15 中国石油天然气集团公司 A kind of online regulator and its online pressure regulation method of gas pipeline

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Effective date: 19990615