JPH10216500A - Vacuum vessel and film forming device using same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent deterioration of a vessel body and to attain sufficient cooling effect by equipping a cylindrical vessel body having unwelded structure inside and having a gas introducing port and a gas discharge port at the outer peripheral wall thereof with a cooling channel having a cooling water inlet and a cooling water outlet and formed by selectively cutting the outer peripheral wall thereof. SOLUTION: By using a cylindrical vessel body 11 made of stainless steel inside which there is no welded part, even if highly corrosive gas such as silane, arsine, or chlorine is present in the vessel body 11, the deterioration in the vessel body 11 with secular change is eliminated and no leakage to the outside occurs. The outer peripheral wall of the vessel body 11 is subjected to working with a lot of steps by cutting it to constitute a cooling water channel 13 by the vessel body 11 and a pressing plate 12 made of stainless steel. Then, the area of the channel 13 in contact with the vessel body 11 is sufficiently provided and cooling water uniformly flows in the channel to obtain sufficient cooling effect. As a result, the deterioration of the vessel body 11 is prevented and sufficient cooling effect is obtained by the cooling channel.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum container having an improved container body and a film forming apparatus using the same.

[0002]

2. Description of the Related Art Conventionally, for example, when vapor deposition is performed on an object to be processed such as a wafer, a vacuum vessel 1 as shown in FIG. 1 is used. Here, the vacuum vessel 1 was attached to a stainless steel pipe 2, a cooling stainless steel pipe 3 provided to be wound around the outer peripheral wall of the pipe 2, and an upper end and a lower end of the pipe 2. And an annular flange 4. Here, the pipe 3 is fixed to the outer peripheral wall of the pipe 2 by welding (welded portion 5), and the flange 4
Is also fixed by welding (welded portion 6) circumferentially along the inside of the pipe 2.

In the case of the vacuum vessel shown in FIG. 1, the inside of the chamber 1 is welded to the flange 4 by a weld 6. Therefore, when processing a wafer or the like using such a chamber 1, a material gas flows into the vacuum vessel 1. Therefore, if the material gas is a highly corrosive gas, the welded portion 6 may be deteriorated with aging. . The vacuum vessel of FIG. 1 has a configuration in which a pipe 3 for cooling is wound around the outer peripheral wall of the pipe 2 and the pipe 2 is cooled by flowing cooling water through the pipe 3. The pipes 2 cannot be cooled sufficiently because they only touch each other.

Conventionally, a vacuum vessel 7 as shown in FIG.
It has been known. The vacuum vessel 7 is characterized in that the pipe 8 has a double wall structure in order to enhance the cooling effect, and the cooling water is stored in the hollow portion 9 thereof. The fixing of the flange 4 to the pipe 8 is performed by welding as in the case of FIG. However, also in the case of the vacuum vessel of FIG. 2, there is a possibility that the welded portion is deteriorated as in the case of the vacuum vessel of FIG. In addition, in the cooling system of the cooling unit, the cooling water does not give an even flow to the pipe 8 and the cooling of the pipe 8 is insufficient, and the cooling water may leak into the vacuum vessel 7.

Further, when the vacuum vessel shown in FIG. 1 or FIG. 2 is also used as one component of a vapor phase growth film forming apparatus, the gas introduced into the vessel has a relatively low temperature due to insufficient cooling of the pipe. Particles are generated by reacting on the high pipe inner wall,
This may adversely affect the object to be processed.

[0006]

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances. First, by using a cylindrical container body having a non-welded structure on the inside, deterioration of the container body is prevented. By providing a cooling water channel formed by selectively shaving the outer peripheral wall on the outer peripheral wall of the container body, and supplying cooling water through the water channel, to provide a vacuum container having a sufficient cooling effect. With the goal. Second, by using such a vacuum vessel, it is an object to provide a vapor deposition apparatus capable of processing an object to be processed in a favorable environment without adverse effects of particles.

[0007]

According to a first aspect of the present invention, there is provided a cylindrical container body having a non-welded structure inside, in which an object to be treated is disposed, and the outer peripheral wall provided on the outer peripheral wall of the container body. A cooling water channel formed by selective shaving, a water channel inlet pipe and a water channel outlet pipe for introducing and discharging cooling water into the water channel, and a gas inlet and a gas outlet provided in the container body. It is a vacuum container characterized by comprising.

According to a second aspect of the present invention, there is provided a vacuum vessel according to the first aspect, a holder disposed in the vessel body for mounting the object to be processed, and a drive system for driving the holder. Which is a vapor deposition film forming apparatus.

In the present invention, when a container body having no welding portion inside is used, even if a highly corrosive gas is present in the container body, the gas is not deteriorated with time and the inside of the container body is deteriorated. There is no leakage to the outside. Also,
By providing a cooling water channel formed by selectively shaving the outer peripheral wall on the outer peripheral wall of the container body, introducing cooling water into the water channel from the water channel inlet pipe and discharging it from the water channel outlet pipe,
The area of the channel in contact with the container body is sufficient compared with the conventional case (FIG. 1), and the cooling water flows evenly through the channel to have a sufficient cooling effect.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a vapor phase growth apparatus according to one embodiment of the present invention will be described with reference to FIG. Reference numeral 11 in the drawing denotes a stainless steel cylindrical container body having no welded portion inside. At the upper end and the lower end of the container body 11, annular flanges 11a and 11b are attached integrally with the container body 11. The outer peripheral wall of the container body 11 is cut out from, for example, a stainless steel ingot and subjected to a number of steps, and the container body 11 and the stainless steel pressing plate 12 are used for spiral cooling. Waterway
13 are configured. The holding plate 12 is welded to the container body 11 at a welding portion 14 outside the water channel 13. A water channel inlet pipe 15 and a water channel outlet pipe 16 are connected to the water channels 13 located at the lowermost stage and the uppermost stage of the container body 11, respectively. Here, the water channel inlet pipe 15 and the water channel outlet pipe 16 are welded to the container main body 11 at the welding portion 17 outside the water channel 13. In other words, when processing a wafer, cooling water is introduced from the water channel inlet pipe 15 and sent to the water channel 13 on the lowermost side of the container body 11, and gradually upward while rotating along the water channel 13 on the outer periphery of the container body 11. And discharged from the water channel outlet pipe 16.

On an arbitrary side wall of the container body 11, a wafer entrance 20 for taking a wafer 19 in and out of a holder 18 in the container body 11 is provided. A heater 21 is disposed inside the holder 18, and a drive system 22 for rotating the holder 18 is connected to a lower portion of the holder 18. The flange 11
a is a gas inlet 23 for introducing a reaction gas into the container body 11;
And an upper cover 25 made of stainless steel is provided on the flange 11a via an O-ring 24. Also, the container body
The 11 flange 11b is provided with a stainless steel lower lid 28 having an exhaust port 27 formed through an O-ring 26.

According to the vapor phase growth film forming apparatus of the above embodiment, since the stainless steel cylindrical container body 11 having no welding portion inside is used, a highly corrosive gas such as silane, arsine, or the like is used. Even if chlorine or the like is present in the container main body 11, the container main body 11 is not degraded with time.
There is no fear of leaking outside. In addition, the outer peripheral wall of the container body 11 is subjected to a number of steps by shaving the outer peripheral wall, and a cooling water channel 13 is configured by the container body 11 and the stainless steel holding plate 12. , The area of the water channel 13 that comes into contact with the container body 11 is sufficient compared to the conventional (FIG. 1),
In addition, since the cooling water flows evenly in the water channel 13 as compared with the related art (FIG. 2), the cooling water has a sufficient cooling effect. Further, by performing vapor phase growth using the vacuum container having the above configuration, the container body 11
Can be sufficiently cooled, so that the particles do not stay on the inner wall of the container body 11 due to the introduced gas as in the related art, thereby avoiding adverse effects on the wafer.
Uniform film deposition can be performed on the wafer.

In the above embodiment, the case where the outer peripheral wall of the container body is cut out of, for example, a stainless steel ingot and subjected to a number of steps to form a water channel for cooling with the cylindrical pressing plate is described. However, the stepping process may use other means. Further, the holding plate is not limited to a cylindrical shape, and a number of ring-shaped holding plates 41 as shown in FIG.
As shown in (2), it may be provided by welding so as to cover the stepped portion on the outer peripheral portion of the container body 11.

[0014]

As described above in detail, according to the present invention, firstly, the use of a cylindrical container body having a non-welded structure inside prevents the deterioration of the container body and the outer periphery of the container body. An object of the present invention is to provide a vacuum vessel having a sufficient cooling effect by providing a cooling water channel formed by selectively shaving the outer peripheral wall on a wall and flowing cooling water through the water channel. Secondly, by using such a vacuum vessel, a vapor phase deposition apparatus capable of processing an object to be processed in a favorable environment without adverse effects of particles can be provided.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of a conventional vacuum vessel.

FIG. 2 is a sectional view of another conventional vacuum vessel.

FIG. 3 is a cross-sectional view of a vapor deposition apparatus according to an embodiment of the present invention.

FIG. 4 is a perspective view of another holding plate different from the holding plate used in the vapor deposition apparatus of FIG. 3;

FIG. 5 is an explanatory view of a main part of a vapor phase growth apparatus using the holding plate of FIG. 4;

[Explanation of symbols]

 11 ... container body, 11a, 11b ... flange, 12, 41 ... holding plate, 13 ... cooling water passage, 15 ... water passage inlet tube, 16 ... water passage outlet tube, 18 ... holder, 19 ... wafer, 20 ... wafer entrance, 22: drive system, 23: gas inlet, 25: upper lid, 27: gas outlet, 28: lower lid.

Claims (2)

[Claims] 1. A cylindrical container body having a non-welded structure inside, on which an object to be treated is disposed, and a cooling member formed by selectively shaving the outer peripheral wall on the outer peripheral wall of the container body. A water channel, a water channel inlet pipe and a water channel outlet pipe for introducing and discharging cooling water into and from the water channel, and a gas inlet and a gas outlet provided in the container body. 2. A vacuum container according to claim 1, further comprising: a holder disposed in the container main body for mounting the object to be processed.
And a drive system for driving the holder.