JPH10214420A - Slurry for texturing of magnetic disk substrate - Google Patents
Slurry for texturing of magnetic disk substrateInfo
- Publication number
- JPH10214420A JPH10214420A JP1607097A JP1607097A JPH10214420A JP H10214420 A JPH10214420 A JP H10214420A JP 1607097 A JP1607097 A JP 1607097A JP 1607097 A JP1607097 A JP 1607097A JP H10214420 A JPH10214420 A JP H10214420A
- Authority
- JP
- Japan
- Prior art keywords
- abrasive grains
- slurry
- magnetic disk
- texturing
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は固定磁気ディスク記
憶装置に使用される磁気ディスク基板のテクスチャ加工
に用いられるスラリに関する。The present invention relates to a slurry used for texturing a magnetic disk substrate used in a fixed magnetic disk storage device.
【0002】[0002]
【従来の技術】磁気ディスク装置は、コンピュータの高
性能化に合わせて高記憶密度化が進んでいる。記憶密度
の向上面のみからは、磁気ヘッドとディスク間の距離を
出来るだけ小さくすることが必要で、両者の表面は出来
るだけ鏡面であることが理想である。ところが磁気ディ
スク装置は、CSS(コンタクトスタートストップ)方
式といって、磁気ディスクの停止時には磁気ヘッドとデ
ィスクが接触しており、稼動時だけ磁気ヘッドが僅かに
浮上し、読み取りおよび書き込みを行う様になってる。
ディスク表面が全くの鏡面では、摩擦係数が大きくて停
止時に磁気ヘッドと吸着してしまったり、始動時の摺動
によって摩耗して磁性層が破壊されたりしてしまうの
で、ディスク表面に微細な凹凸を形成して接触面積を小
さくし、摩擦係数を下げることが行われる。2. Description of the Related Art The storage density of magnetic disk devices has been increasing with the performance of computers. Only from the aspect of improving the storage density, it is necessary to make the distance between the magnetic head and the disk as small as possible, and it is ideal that the surfaces of both are as mirror as possible. However, the magnetic disk device is called a CSS (contact start / stop) system. When the magnetic disk stops, the magnetic head and the disk are in contact with each other. It is.
If the disk surface is completely a mirror surface, the coefficient of friction will be large and it will stick to the magnetic head when stopped, or it will be worn due to sliding at start-up and the magnetic layer will be destroyed. Is formed to reduce the contact area and reduce the friction coefficient.
【0003】この凹凸形成は、一般に金属薄膜磁気ディ
スクに対しては、磁気ディスクの基板表面をテープやス
ラリを含ませたバフ等で同心円状に摺動させ、テープや
スラリに保持される砥粒によって凹凸の条痕を形成する
テクスチャ加工によって行われる。図1はテクスチャ加
工装置の要部を示す斜視図である。1は基板、2は植毛
バフテープ、3はゴムローラーおよび4はスラリであ
り、基板1は回転している。このような砥粒による加工
は、砥粒が被加工物表面を転がることによってなされる
が、いびつな形状(平均粒径より大きいか、平均形状よ
り異方性が大きい)の砥粒は転がり抵抗が大きく、被加
工物表面に鋭く切れ込んで深い谷を形成してしまう。こ
の谷の部分は、磁気ヘッドとのクリアランスが大き過
ぎ、必要な読み取り出力が得られず、エラーとなってし
まう。また、谷の両側は急峻な山(バリ)となり、磁気
ヘッドと衝突し、浮上特性を悪化させることがある。[0003] Generally, in the case of a metal thin-film magnetic disk, the concavo-convex formation is performed by concentrically sliding the substrate surface of the magnetic disk with a buff or the like containing a tape or a slurry, and the abrasive grains held by the tape or the slurry. This is performed by texture processing to form uneven streaks. FIG. 1 is a perspective view showing a main part of the texture processing device. 1 is a substrate, 2 is a flocking buff tape, 3 is a rubber roller, and 4 is a slurry, and the substrate 1 is rotating. The processing with such abrasive grains is performed by the abrasive grains rolling on the surface of the workpiece, but the abrasive grains having a distorted shape (greater than the average grain size or larger in anisotropy than the average shape) have a low rolling resistance. And sharply cut into the surface of the workpiece to form a deep valley. In the valley portion, the clearance between the magnetic head and the magnetic head is too large, and a necessary read output cannot be obtained, resulting in an error. Further, both sides of the valley become steep peaks (burrs), which may collide with the magnetic head and degrade the flying characteristics.
【0004】[0004]
【発明が解決しようとする課題】磁気記録の高密度化に
対応しては、さらに浮上量の小さい磁気ディスクが求め
られ、より均一度の高いテクスチャ加工が必要である。
しかし、原石を破砕、分級して製造される砥粒において
は、従来の分級技術によっては、問題となるいびつな形
状の砥粒を除くことや転がり抵抗を低減することができ
ず、均一なテクスチャ加工が実現できないでいた。In response to the increase in the density of magnetic recording, a magnetic disk with a smaller flying height is required, and a texture processing with higher uniformity is required.
However, in the case of abrasive grains produced by crushing and classifying rough stones, conventional classification techniques cannot remove irregularly shaped abrasive grains and reduce rolling resistance, resulting in uniform texture. Processing could not be realized.
【0005】本発明の目的は、磁気ディスク基板に深い
谷の生じない均一度の高いテクスチャ加工ができるテク
スチャ加工用スラリを提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a textured slurry capable of performing highly uniform textured processing without forming a deep valley on a magnetic disk substrate.
【0006】[0006]
【課題を解決するための手段】上記の目的を達成するた
めに、分散媒に砥粒が分散されてなる磁気ディスク用基
板のテクスチャ加工用スラリにおいて、前記砥粒の粒径
より小さい粒径の第2の砥粒が添加されたこととする。
前記砥粒はダイヤモンド、アルミナまたは炭化ケイ素で
あり、前記第2の砥粒は超微粒ダイヤモンドであると良
い。In order to achieve the above object, in a slurry for texturing a magnetic disk substrate in which abrasive grains are dispersed in a dispersion medium, a slurry having a particle diameter smaller than that of the abrasive grains is provided. It is assumed that the second abrasive has been added.
The abrasive is preferably diamond, alumina or silicon carbide, and the second abrasive is preferably ultrafine diamond.
【0007】前記超微粒ダイヤモンド粒径は1ないし1
0nmであると良い。前記超微粒ダイヤモンドの添加量は
前記砥粒の10ないし80wt% であると良い。前記分散
媒はジエチレングリコールモノブチルエーテルの水溶液
であると良い。The diameter of the ultrafine diamond is 1 to 1.
It is good to be 0 nm. The added amount of the ultrafine diamond is preferably 10 to 80% by weight of the abrasive. The dispersion medium is preferably an aqueous solution of diethylene glycol monobutyl ether.
【0008】[0008]
【発明の実施の形態】従来の砥粒(以下、主砥粒とい
う)を用いて、転がり抵抗の低減実験の中で、添加成分
として超微粒ダイヤモンドを添加するとテクスチャの均
一性が大幅に向上することを見出したことに基づいてい
る。本発明のテクスチャ加工用スラリにおいて、第2の
砥粒が主砥粒と同じまたは主砥粒と余り変わらない硬度
(主砥粒より高めが好ましい)の材料からなっていて、
かつ主砥粒より粒径が小さければ、第2の砥粒は主砥粒
と被加工物表面の間に介在して、主砥粒の転がり摩擦を
低減し、全体にテクスチャを構成する谷は浅く、谷の幅
は狭くなると推定される。第2の砥粒の硬度が主砥粒の
それより余り小さいと、第2の砥粒は主砥粒によって破
砕され、主砥粒を支えられなくなり、添加の効果はでな
い。DESCRIPTION OF THE PREFERRED EMBODIMENTS In an experiment for reducing rolling resistance using conventional abrasive grains (hereinafter referred to as main abrasive grains), the addition of ultrafine diamond as an additional component significantly improves the uniformity of texture. It is based on the finding. In the slurry for texturing of the present invention, the second abrasive grains are made of a material having the same hardness as the main abrasive grains or hardly different from the main abrasive grains (preferably higher than the main abrasive grains),
And if the grain size is smaller than the main abrasive grains, the second abrasive grains are interposed between the main abrasive grains and the surface of the workpiece, reduce the rolling friction of the main abrasive grains, and the valleys that constitute the texture as a whole are It is estimated to be shallow and the width of the valley narrow. If the hardness of the second abrasive grains is much smaller than that of the main abrasive grains, the second abrasive grains will be crushed by the main abrasive grains and will not be able to support the main abrasive grains, and the effect of addition will not be obtained.
【0009】特に、超微粒ダイヤは粒径が小さく、揃っ
ており、なおかつ球形に近いため、上記の作用が顕著と
なる。また、第2の砥粒の添加量は50w%程度がよい
が、添加量が少な過ぎれば(数w%以下)テクスチャの谷
は大き過ぎ(従来と同じ)、添加量が多すぎれば主砥粒
が被加工物表面に当たらなくなり、加工の効率が低下す
る。In particular, since the ultrafine diamond has a small particle size, is uniform, and is close to a spherical shape, the above-mentioned effects are remarkable. The addition amount of the second abrasive is preferably about 50 w%, but if the addition amount is too small (several w% or less), the valley of the texture is too large (the same as in the conventional case). The grains do not hit the surface of the workpiece, and the processing efficiency is reduced.
【0010】また、ジエチレングリコールモノブチルエ
ーテルの水溶液は第2の砥粒を凝集させることなく、摩
擦低減作用を維持できる。従って、本発明に係るテクス
チャ加工用スラリを用いてテクスチャを形成された磁気
ディスクにおいては、浮上量が小さく密度記録の向上が
期待できる。なお、主砥粒の平均粒径は必要とする表面
粗さに応じて決定するが、通常1ないし3μm である。 実施例1 粒度#6000のアルミナ砥粒18g と平均粒子径≒1nmの
超微粒ダイヤ(日本油脂 (株) 製)2gを、ジエチレン
グリコールモノブチルエーテル20wt% 溶液1l に分散
させ、テクスチャ加工用スラリを調合した。Further, the aqueous solution of diethylene glycol monobutyl ether can maintain the friction reducing effect without agglomerating the second abrasive grains. Therefore, in the magnetic disk on which the texture is formed by using the texture processing slurry according to the present invention, the flying height is small, and improvement in density recording can be expected. The average grain size of the main abrasive grains is determined according to the required surface roughness, and is usually 1 to 3 μm. Example 1 18 g of alumina abrasive grains having a particle size of # 6000 and 2 g of ultrafine diamond having an average particle diameter of about 1 nm (manufactured by NOF Corporation) were dispersed in 1 liter of a 20 wt% solution of diethylene glycol monobutyl ether to prepare a slurry for texture processing. .
【0011】テクスチャ加工は、回転する基板にテクス
チャ加工用スラリを滴下しながら植毛バフテープを押し
付ける装置(図1)を用いて行った。磁気ディスクの基
板として、NiP メッキしたAl合金基板を用いた。基板の
表面粗さは Rmin ≦3nm、Rmax≦50nmとした。テクス
チャ加工条件は、回転数=100RPM 、加工時間30se
c 、滴下量=3.0ml/minとした。テクスチャ加工を行
ったあと、粉等が残らないように精密洗浄を行って乾燥
した。その後スパッタによりCr下地層、Co-Cr-Ta磁性
層、DLC(ダイヤモンドァイクカーボン) 保護層を形成
し、さらにディップコートによって潤滑層を形成して、
磁気ディスクとした。 実施例2 平均粒径2μm (粒度#6000に相当)の炭化ケイ素砥粒
4g と平均粒子径≒1nmの超微粒ダイヤ(日本油脂
(株) 製)16gを、ジエチレングリコールモノブチル
エーテル20wt% 溶液1l に分散させ、テクスチャ加工
用スラリを調合した。The texture processing was performed using an apparatus (FIG. 1) for pressing a flocking buff tape while dropping a slurry for texturing on a rotating substrate. A NiP-plated Al alloy substrate was used as the substrate of the magnetic disk. The surface roughness of the substrate was Rmin ≦ 3 nm and Rmax ≦ 50 nm. Texture processing conditions are: rotation speed = 100 RPM, processing time 30 se
c, the amount of drop was 3.0 ml / min. After the texturing, precision cleaning was performed so that powder and the like did not remain, followed by drying. After that, a Cr underlayer, Co-Cr-Ta magnetic layer, DLC (diamond-like carbon) protective layer were formed by sputtering, and a lubricating layer was formed by dip coating.
It was a magnetic disk. Example 2 4 g of silicon carbide abrasive grains having an average particle size of 2 μm (corresponding to a particle size of # 6000) and ultrafine diamond particles having an average particle size of ≒ 1 nm (Nippon Oil & Fat)
(Manufactured by Co., Ltd.) was dispersed in 1 liter of a 20% by weight solution of diethylene glycol monobutyl ether to prepare a slurry for texture processing.
【0012】テクスチャ加工は実施例1と同じ基板、加
工条件で行い、また同様に磁性層および潤滑層を形成し
て、磁気ディスクとした。 実施例3 平均粒径2μm (粒度#6000に相当)の単結晶ダイヤモ
ンド砥粒4g と平均粒子径≒1nmの超微粒ダイヤ(日本
油脂 (株) 製)1gを、ジエチレングリコールモノブチ
ルエーテル20wt% 溶液1l に分散させ、テクスチャ加
工用スラリを調合した。Texture processing was performed under the same substrate and processing conditions as in Example 1, and a magnetic layer and a lubricating layer were similarly formed to obtain a magnetic disk. Example 3 4 g of single crystal diamond abrasive grains having an average particle size of 2 μm (corresponding to a particle size of # 6000) and 1 g of ultrafine diamond (manufactured by Nippon Oil & Fats Co., Ltd.) having an average particle size of ≒ 1 nm were added to 1 liter of a 20 wt% solution of diethylene glycol monobutyl ether. Dispersed and prepared a slurry for texturing.
【0013】テクスチャ加工は実施例1と同じ基板、加
工条件で行い、また同様に磁性層および潤滑層を形成し
て、磁気ディスクとした。 比較例1 粒度#6000のアルミナ砥粒20g のみを、ジエチレング
リコールモノブチルエーテル20wt% 溶液1l に分散さ
せたテクスチャ加工用スラリを調合した。Texture processing was performed under the same substrate and processing conditions as in Example 1, and a magnetic layer and a lubricating layer were similarly formed to obtain a magnetic disk. Comparative Example 1 A slurry for texturing was prepared by dispersing only 20 g of alumina abrasive grains having a particle size of # 6000 in 1 liter of a 20 wt% solution of diethylene glycol monobutyl ether.
【0014】テクスチャ加工は実施例1と同じ基板、加
工条件で行い、また同様に磁性層および潤滑層を形成し
て、磁気ディスクとした。 比較例2 平均粒径2μm (粒度#6000に相当)の単結晶ダイヤモ
ンド砥粒4g のみを、ジエチレングリコールモノブチル
エーテル20wt% 溶液1l に分散させ、テクスチャ加工
用スラリを調合した。Texture processing was performed under the same substrate and processing conditions as in Example 1, and a magnetic layer and a lubricating layer were similarly formed to obtain a magnetic disk. Comparative Example 2 Only 4 g of single-crystal diamond abrasive grains having an average particle size of 2 μm (corresponding to a particle size of # 6000) were dispersed in 1 liter of a 20 wt% solution of diethylene glycol monobutyl ether to prepare a slurry for texture processing.
【0015】テクスチャ加工は実施例1と同じ基板、加
工条件で行い、また同様に磁性層および潤滑層を形成し
て、磁気ディスクとした。上記の実施例および比較例で
作製した磁気ディスクについて、表面粗さ、最低磁気ヘ
ッド浮上量、読み取りエラー特性を評価した。谷の深さ
(谷の中心線から谷底までの距離)は表面粗さ計(小坂
研究所 (株) 製、サーフコーダーET-30K)を用い、スタ
イラス径=0.5μm 、測定長=0.25mmとし、磁気
ディスク当たり24点測定した。The texture processing was performed under the same substrate and processing conditions as in Example 1, and a magnetic layer and a lubricating layer were similarly formed to obtain a magnetic disk. With respect to the magnetic disks manufactured in the above Examples and Comparative Examples, the surface roughness, the minimum magnetic head flying height, and the read error characteristics were evaluated. The depth of the valley (the distance from the center line of the valley to the bottom of the valley) was measured with a surface roughness meter (Surfcoder ET-30K, manufactured by Kosaka Laboratory Co., Ltd.), stylus diameter = 0.5 μm, measurement length = 0. The measurement was performed at 24 points per magnetic disk.
【0016】表1は作製した磁気ディスクについての表
面粗さ,最低磁気ヘッド浮上量(GH)、読み取りエラー特
性である。良否判定は、磁気ディスクの1面当たりの読
み取りエラー個数で行い、0個を◎、1ないし5個をを
〇、6個以上を×(不良)とした。Table 1 shows the surface roughness, minimum magnetic head flying height (GH), and read error characteristics of the manufactured magnetic disk. The pass / fail judgment was made based on the number of read errors per surface of the magnetic disk. 0 was evaluated as ◎, 1 to 5 was evaluated as Δ, and 6 or more was evaluated as x (defective).
【0017】[0017]
【表1】 表1から、実施例で作製した磁気ディスクは、それぞれ
比較例に比べて谷の深さが小さく、相対的に浅い谷が形
成されており、また磁気ディスクの特性比較でも、実施
例の方が磁気ヘッド浮上量が小さく読み取りエラー個数
も少ないことが判る。[Table 1] From Table 1, it can be seen that the magnetic disks manufactured in the examples have a smaller valley depth and a relatively shallower valley than the comparative example. It can be seen that the flying height of the magnetic head is small and the number of reading errors is small.
【0018】[0018]
【発明の効果】本発明によれば、分散媒に砥粒が分散さ
れてなるテクスチャ加工用スラリにおいて、前記砥粒の
粒径の第2の砥粒を添加したため、第2の砥粒は主砥粒
と被加工物表面の間に介在して、主砥粒の転がり摩擦を
低減し、テクスチャを構成する谷は浅く、谷の幅は狭く
なる。従って、磁気ヘッドの浮上量は小さくなり、高密
度の磁気記録が実現できる。According to the present invention, in a slurry for texture processing in which abrasive grains are dispersed in a dispersion medium, the second abrasive grains having the particle diameter of the abrasive grains are added. Interposed between the abrasive grains and the surface of the workpiece, the rolling friction of the main abrasive grains is reduced, and the valleys constituting the texture are shallow and the widths of the valleys are narrow. Therefore, the flying height of the magnetic head is reduced, and high-density magnetic recording can be realized.
【0019】また、第2の砥粒の添加は容易であり、従
来の分散媒をそのまま用いることができ、コスト高は来
さない。The addition of the second abrasive grains is easy, the conventional dispersion medium can be used as it is, and the cost does not increase.
【図1】テクスチャ加工装置の要部を示す斜視図FIG. 1 is a perspective view showing a main part of a texture processing device.
1 磁気ディスク 2 植毛バフテープ 3 ゴムローラー 4 テクスチャ加工用スラリ Reference Signs List 1 magnetic disk 2 flocking buff tape 3 rubber roller 4 texture processing slurry
Claims (5)
ク用基板のテクスチャ加工用スラリにおいて、前記砥粒
の粒径より小さい粒径の第2の砥粒が添加されたことを
特徴とする磁気ディスク用基板のテクスチャ加工用スラ
リ。1. A textured slurry for a magnetic disk substrate in which abrasive grains are dispersed in a dispersion medium, wherein a second abrasive grain having a particle diameter smaller than that of the abrasive grains is added. For texture processing of magnetic disk substrates.
炭化ケイ素であり、前記第2の砥粒は超微粒ダイヤモン
ドであることを特徴とする請求項1に記載の磁気ディス
ク用基板のテクスチャ加工用スラリ。2. A slurry for texturing a magnetic disk substrate according to claim 1, wherein said abrasive grains are diamond, alumina or silicon carbide, and said second abrasive grains are ultrafine diamond. .
0nmであることを特徴とする請求項1または2に記載の
磁気ディスク用基板のテクスチャ加工用スラリ。3. The ultrafine diamond particle size is 1 to 1
3. The slurry for texturing a magnetic disk substrate according to claim 1, wherein the slurry has a thickness of 0 nm.
粒の10ないし80wt% であることを特徴とする請求項
1ないし3のいずれかに記載の磁気ディスク用基板のテ
クスチャ加工用スラリ。4. The slurry for texturing a substrate for a magnetic disk according to claim 1, wherein the amount of said ultrafine diamond is 10 to 80% by weight of said abrasive grains.
チルエーテルの水溶液であることを特徴とする請求項1
ないし4のいずれかに記載の磁気ディスク用基板のテク
スチャ加工用スラリ。5. The method according to claim 1, wherein the dispersion medium is an aqueous solution of diethylene glycol monobutyl ether.
A slurry for texturing a substrate for a magnetic disk according to any one of claims 1 to 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1607097A JPH10214420A (en) | 1997-01-30 | 1997-01-30 | Slurry for texturing of magnetic disk substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1607097A JPH10214420A (en) | 1997-01-30 | 1997-01-30 | Slurry for texturing of magnetic disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10214420A true JPH10214420A (en) | 1998-08-11 |
Family
ID=11906318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1607097A Pending JPH10214420A (en) | 1997-01-30 | 1997-01-30 | Slurry for texturing of magnetic disk substrate |
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Country | Link |
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JP (1) | JPH10214420A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000032712A1 (en) * | 1998-11-27 | 2000-06-08 | Kao Corporation | Abrasive fluid compositions |
SG121834A1 (en) * | 2002-11-26 | 2006-05-26 | Nippon Micro Coating Kk | Polishing slurry for and method of texturing |
-
1997
- 1997-01-30 JP JP1607097A patent/JPH10214420A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000032712A1 (en) * | 1998-11-27 | 2000-06-08 | Kao Corporation | Abrasive fluid compositions |
US6569216B1 (en) | 1998-11-27 | 2003-05-27 | Kao Corporation | Abrasive fluid compositions |
SG121834A1 (en) * | 2002-11-26 | 2006-05-26 | Nippon Micro Coating Kk | Polishing slurry for and method of texturing |
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