JP2006099813A - Method for manufacturing magnetic recording medium substrate, and method for manufacturing magnetic recording medium using the same - Google Patents

Method for manufacturing magnetic recording medium substrate, and method for manufacturing magnetic recording medium using the same Download PDF

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JP2006099813A
JP2006099813A JP2004280965A JP2004280965A JP2006099813A JP 2006099813 A JP2006099813 A JP 2006099813A JP 2004280965 A JP2004280965 A JP 2004280965A JP 2004280965 A JP2004280965 A JP 2004280965A JP 2006099813 A JP2006099813 A JP 2006099813A
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substrate
magnetic recording
recording medium
slurry
improving liquid
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Kazuhiro Kusakawa
和大 草川
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Fuji Electric Co Ltd
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Fuji Electric Holdings Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To uniformly processing a substrate surface and to suppress the formation of abnormal projections by improving slurry wetting on the surface of a substrate to be subjected to texture processing, and uniformly spreading a slurry to be supplied to the surface of the substrate during the texture processing to the surface of the substrate. <P>SOLUTION: The method includes the wetting improving liquid application step 40 of applying a wetting improving liquid for improving the wetting of a slurry containing abrasive grains on the surface of a substrate to be subjected to texture processing before the texture processing is executed, and the texture processing step 50 of executing the texture processing by rotating the substrate wet by the wetting improving liquid to supply a slurry to the surface. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、磁気記録媒体用基板の製造方法及びその製造方法を用いた磁気記録媒体の製造方法に関し、特に、ハードディスク装置(HDD)に搭載する磁気記録媒体に用いて好適なものである。   The present invention relates to a method for manufacturing a substrate for a magnetic recording medium and a method for manufacturing a magnetic recording medium using the manufacturing method, and is particularly suitable for a magnetic recording medium mounted on a hard disk drive (HDD).

近年、パソコンやデジタル家電などの記憶装置としてハードディスク装置(HDD)が多く用いられている。
このHDDに搭載される磁気記録媒体としての磁気ディスク(HD)は、一般に、ディスク状の非磁性基体、例えばアルミニウム合金やガラスからなる基体の表面に無電解めっき法でNi−P膜からなる非磁性金属膜を形成し、その表面にテクスチャー加工を施してなる基板を作製し、その基板上に、Cr膜などからなる非磁性金属下地層、Co合金磁性膜などからなる磁気記録層、アモルファスカーボン膜などからなる保護層をスパッタ法などで順次成膜し、その上に液体潤滑剤を塗布することにより潤滑層を成膜してなるものとして構成される。
上述のテクスチャー加工は、磁気記録層に磁気異方性を与えて磁気特性を向上し、また、磁気ヘッドとの摩擦・吸着特性(CSS特性)を向上するために、基板の表面に同心円状の条痕を形成する加工技術であり、回転する基板の表面にスラリーを供給しながら研磨テープを押し付けることでなされるが、磁気ディスクの記録容量を増大させるためには、磁気ヘッドと磁気ディスクの表面との間の距離(磁気ヘッドの浮上量)を小さくする必要があるので、テクスチャー加工においては、その加工液のスラリーに含有する砥粒の粒径を縮小して微細化する必要がある。
In recent years, hard disk drives (HDDs) are often used as storage devices for personal computers and digital home appliances.
A magnetic disk (HD) as a magnetic recording medium mounted on the HDD is generally a non-magnetic substrate made of a Ni-P film by electroless plating on the surface of a disk-like nonmagnetic substrate, for example, a substrate made of aluminum alloy or glass. A magnetic metal film is formed and a surface is textured to produce a substrate. On the substrate, a nonmagnetic metal underlayer made of a Cr film, a magnetic recording layer made of a Co alloy magnetic film, amorphous carbon, etc. A protective layer made of a film or the like is sequentially formed by sputtering or the like, and a lubricating layer is formed by applying a liquid lubricant thereon.
The texture processing described above gives magnetic anisotropy to the magnetic recording layer to improve the magnetic characteristics, and concentric circles on the surface of the substrate in order to improve the friction / adsorption characteristics (CSS characteristics) with the magnetic head. This is a processing technology for forming streak, which is done by pressing the polishing tape while supplying slurry to the surface of the rotating substrate. To increase the recording capacity of the magnetic disk, the surface of the magnetic head and magnetic disk Therefore, in the texturing process, it is necessary to reduce the grain size of the abrasive grains contained in the slurry of the processing liquid to make it finer.

その際、テクスチャー加工を施した基板の表面に異常突起があると、その表面上に磁気記録層などを成膜してなる磁気ディスクの表面にそのまま突起として現れるので、異常突起をなくし、またはその高さをできるだけ低くするためのテクスチャー加工技術が望まれている。
スラリーに含有する砥粒の粒径を縮小する際の課題解決を示すものとしては、例えば、特許文献1には、基板の表面の親水性を高めることにより、砥粒の粒径を縮小しても短時間で十分かつ均一なテクスチャーを形成できることが記載されている。
特開2003−30821号公報 特開2001−341058号公報 特開平10−188273号公報
At that time, if there are abnormal protrusions on the surface of the textured substrate, they will appear as protrusions as they are on the surface of the magnetic disk formed with a magnetic recording layer on the surface. A texture processing technique for reducing the height as much as possible is desired.
As an example of solving the problem when reducing the particle size of the abrasive grains contained in the slurry, Patent Document 1, for example, reduces the particle size of the abrasive grains by increasing the hydrophilicity of the surface of the substrate. Furthermore, it is described that a sufficient and uniform texture can be formed in a short time.
Japanese Patent Laid-Open No. 2003-30821 Japanese Patent Laid-Open No. 2001-341058 JP-A-10-188273

近年、デジタル家電などの普及に伴って磁気ディスクの記録容量のさらなる増大、従って磁気ヘッド浮上量のさらなる低下が求められている情況にあり、最近では0.25マイクロインチという低浮上量での磁気ヘッドの安定浮上走行が要求されている。
このように磁気ヘッドの浮上量が著しく低いため、磁気ディスクの表面に異常突起があるとヘッドクラッシュを招き、磁気ディスクの表面を傷つけることがある。また、ヘッドクラッシュに至らないような微小な突起でも情報の読み書きの際に種々のエラーの原因となり易い。
このため、テクスチャー加工において、基板表面の異常突起の形成をなくし、またはその高さをできるだけ低くすることが必要であるが、テクスチャー加工時に基板の表面に供給するスラリーが基板の表面に短時間で均一に広がらないと、スラリー中に浮遊しているダイヤモンドなどの砥粒の基板上での分散量が異なる(分散状態が均一でない)ことにより、基板表面の均一な加工ができずに異常突起が形成され易くなる恐れがある。
In recent years, with the spread of digital home appliances and the like, there has been a demand for further increase in the recording capacity of the magnetic disk, and hence further reduction in the flying height of the magnetic head. There is a demand for stable flying of the head.
As described above, since the flying height of the magnetic head is extremely low, an abnormal protrusion on the surface of the magnetic disk may cause a head crash and damage the surface of the magnetic disk. Even a small protrusion that does not lead to a head crash is likely to cause various errors when reading and writing information.
For this reason, in texture processing, it is necessary to eliminate the formation of abnormal protrusions on the substrate surface or to reduce the height thereof as much as possible, but the slurry supplied to the substrate surface during texture processing is applied to the substrate surface in a short time. If it does not spread uniformly, the amount of dispersion of diamond or other abrasive particles suspended in the slurry will be different on the substrate (the dispersion state is not uniform), so that the substrate surface cannot be processed uniformly and abnormal projections will occur. There is a risk of being easily formed.

本発明は、上述の点に鑑み、テクスチャー加工を施すべき基板の表面のスラリーの濡れ性を改善し、テクスチャー加工時に基板の表面に供給するスラリーが基板の表面に均一に広がるようにすることにより、基板表面の均一な加工を可能とし、異常突起形成の抑制が可能な磁気記録媒体用基板の製造方法及びその製造方法を用いた磁気記録媒体の製造方法を提供することを目的とする。   In view of the above-mentioned points, the present invention improves the wettability of the slurry on the surface of the substrate to be textured, so that the slurry supplied to the surface of the substrate during texturing spreads uniformly on the surface of the substrate. Another object of the present invention is to provide a method for manufacturing a substrate for a magnetic recording medium that enables uniform processing of the substrate surface and can suppress the formation of abnormal protrusions, and a method for manufacturing a magnetic recording medium using the manufacturing method.

上述の目的を達成するため、本発明の磁気記録媒体用基板の製造方法は、テクスチャー加工を施すべき基板の表面に砥粒を含むスラリーの濡れ性を改善するための濡れ性改善液をテクスチャー加工を施す前に塗布する濡れ性改善液塗布工程と、該濡れ性改善液で濡れた状態の基板を回転してその表面に前記スラリーを供給しながらテクスチャー加工を施すテクスチャー加工工程とを備えることを特徴とする。
ここで、濡れ性改善液は、テクスチャー加工を施すべき基板の表面への接触角が前記スラリーのそれよりも小さい液体からなり、また、スラリーから砥粒を除いた成分の液体からなることが好ましく、濡れ性改善液の塗布は、ディプコート法又はスピンコート法により行うことができる。
また、本発明の磁気記録媒体の製造方法は、本発明の磁気記録媒体用基板の製造方法により製造された磁気記録媒体用基板上に、少なくともCo合金磁性膜などからなる磁気記録層を成膜する成膜工程を備えることを特徴とする。
In order to achieve the above-described object, the method for manufacturing a magnetic recording medium substrate according to the present invention comprises subjecting a wettability improving liquid to improve the wettability of a slurry containing abrasive grains on the surface of the substrate to be textured. A wettability improving liquid coating step to be applied before applying the coating, and a texture processing step of rotating the substrate wet with the wettability improving liquid and applying texture processing to the surface while supplying the slurry. Features.
Here, the wettability improving liquid is preferably composed of a liquid whose contact angle to the surface of the substrate to be textured is smaller than that of the slurry, and is composed of a liquid of components obtained by removing abrasive grains from the slurry. The wettability improving liquid can be applied by a dip coating method or a spin coating method.
The method for producing a magnetic recording medium of the present invention comprises forming a magnetic recording layer comprising at least a Co alloy magnetic film on the magnetic recording medium substrate produced by the method for producing a magnetic recording medium substrate of the present invention. It is characterized by including a film forming step.

本発明においては、スラリーの濡れ性を改善するための濡れ性改善液をテクスチャー加工を施す前に基板の表面に塗布することにより基板表面のスラリーの濡れ性を改善しているので、その濡れ性改善液で濡れた状態で回転する基板の表面に供給されるスラリーは、基板の回転により短時間で均一に基板の表面に広げられることとなる。   In the present invention, the wettability improving liquid for improving the wettability of the slurry is applied to the surface of the substrate before texturing, so that the wettability of the slurry on the substrate surface is improved. The slurry supplied to the surface of the rotating substrate while wetted with the improvement liquid is spread uniformly on the surface of the substrate in a short time by the rotation of the substrate.

本発明によれば、スラリーの濡れ性を改善するための濡れ性改善液をテクスチャー加工を施す前に基板の表面に塗布することにより、テクスチャー加工時に供給されるスラリーが基板の表面に均一に広がるようにしたので、砥粒の分散状態に分布のない均一な加工が可能となり、異常突起の形成を抑制することができる。従って、異常突起の高さを低くして低浮上量での磁気ヘッドの安定浮上走行を可能とし、以って記録容量の増大を図ることができる。   According to the present invention, the wettability improving liquid for improving the wettability of the slurry is applied to the surface of the substrate before the texturing, so that the slurry supplied at the time of texturing spreads uniformly on the surface of the substrate. Since it did in this way, the uniform process without distribution in the dispersion state of an abrasive grain is attained, and formation of an abnormal protrusion can be suppressed. Therefore, the height of the abnormal protrusion can be reduced to enable stable flying of the magnetic head with a low flying height, thereby increasing the recording capacity.

以下、本発明の好ましい実施形態について説明する。図1は、本発明により製造する磁気記録媒体の実施形態を示す断面模式図である。
図1に示すように、本発明により製造する実施形態の磁気記録媒体100は、本発明により製造する実施形態の磁気記録媒体用基板10上に、非磁性金属下地層11、磁気記録層12、保護層13及び潤滑層14が順次積層されてなる。
その磁気記録媒体用基板10は、ディスク状の非磁性基体1上に非磁性金属膜2を備えてなることが好ましい。非磁性基体1としてガラス基板などを用いる場合には、非磁性基体1自体を基板10として非磁性金属膜2を不要とすることもできる。
図示はしてないが、非磁性金属膜2、非磁性金属下地層11、磁気記録層12、保護層13及び潤滑層14は、非磁性基体1の他面側にも同様に設けることができる。
Hereinafter, preferred embodiments of the present invention will be described. FIG. 1 is a schematic cross-sectional view showing an embodiment of a magnetic recording medium manufactured according to the present invention.
As shown in FIG. 1, a magnetic recording medium 100 according to an embodiment manufactured according to the present invention has a nonmagnetic metal underlayer 11, a magnetic recording layer 12, and a magnetic recording medium substrate 10 according to an embodiment manufactured according to the present invention. A protective layer 13 and a lubricating layer 14 are sequentially laminated.
The magnetic recording medium substrate 10 is preferably provided with a nonmagnetic metal film 2 on a disk-shaped nonmagnetic substrate 1. When a glass substrate or the like is used as the nonmagnetic substrate 1, the nonmagnetic metal film 2 can be eliminated using the nonmagnetic substrate 1 itself as the substrate 10.
Although not shown, the nonmagnetic metal film 2, the nonmagnetic metal underlayer 11, the magnetic recording layer 12, the protective layer 13, and the lubricating layer 14 can be similarly provided on the other surface side of the nonmagnetic substrate 1. .

この実施形態の磁気記録媒体100の製造方法は、図2に示すように、ディスク状の非磁性基体1上に非磁性金属膜2を無電解めっきするめっき工程20と、このめっきされた非磁性金属膜2の表面を研磨する研磨工程30と、この研磨された非磁性金属膜2の表面に砥粒を含むスラリーの濡れ性を改善するための濡れ性改善液を塗布する濡れ性改善液塗布工程40と、この濡れ性改善液で濡れた状態の基板10を回転してその表面にスラリーを供給しながらテクスチャー加工を施すテクスチャー加工工程50とからなる基板製造工程200と、この基板製造工程200により製造された磁気記録媒体用基板10上に、非磁性金属下地層11、磁気記録層12、保護層13及び潤滑層14を順次成膜する成膜工程60とを備える。
〔基板製造工程200の説明〕
めっき工程20では、公称直径2.5インチ、3インチ、3.3インチ、3.5インチ、5インチなどのアルミニウム合金基板又はガラス基板などをディスク状の非磁性基体1として用い、その両面に、無電解めっき法でNi−P膜などを非磁性金属膜2として形成して基板10することが好ましい。
As shown in FIG. 2, the manufacturing method of the magnetic recording medium 100 of this embodiment includes a plating step 20 for electroless plating a nonmagnetic metal film 2 on a disk-shaped nonmagnetic substrate 1, and the plated nonmagnetic material. Polishing step 30 for polishing the surface of the metal film 2 and application of a wettability improving liquid for applying a wettability improving liquid for improving the wettability of the slurry containing abrasive grains to the surface of the polished nonmagnetic metal film 2 A substrate manufacturing process 200 including a process 40 and a texture processing process 50 for rotating the substrate 10 in a state wetted with the wettability improving liquid and supplying a slurry to the surface thereof, and the substrate manufacturing process 200. A film forming step 60 for sequentially forming the nonmagnetic metal underlayer 11, the magnetic recording layer 12, the protective layer 13 and the lubricating layer 14 on the magnetic recording medium substrate 10 manufactured by the above method.
[Description of Substrate Manufacturing Process 200]
In the plating step 20, an aluminum alloy substrate or glass substrate having a nominal diameter of 2.5 inches, 3 inches, 3.3 inches, 3.5 inches, 5 inches, etc. is used as the disk-shaped nonmagnetic substrate 1 on both sides. The substrate 10 is preferably formed by forming a Ni—P film or the like as the nonmagnetic metal film 2 by electroless plating.

なお、ガラス基板などからなる非磁性基体1そのものを基板10とする場合には、このめっき工程20は不要である。
研磨工程30としては、周知の両面研磨装置を用いて基板10の両面を同時に鏡面研磨することが好ましい。研磨した基板10は洗浄・乾燥してテクスチャー加工に備える。
濡れ性改善液塗布工程40では、テクスチャー加工に用いるスラリーから砥粒を除いた成分の液体を濡れ性改善液として基板10の表面に均一に塗布することが好ましく、ディプコート法又はスピンコート法により基板10の両面に塗布することができる。
この塗布は、濡れ性改善液をディプコートするためのディップ槽及びそのディップ槽内への基板10の上下機構やスピンコートするための濡れ性改善液の塗布ノズルをテクスチャー加工装置に付加して行うことができる。濡れ性改善液の塗布ノズルを付加する場合には、テクスチャー加工装置の基板回転機構を利用して濡れ性改善液をスピンコートすることができるので好適である。
In addition, when the nonmagnetic base | substrate 1 itself which consists of glass substrates etc. is used as the board | substrate 10, this plating process 20 is unnecessary.
As the polishing step 30, it is preferable that both surfaces of the substrate 10 are mirror-polished simultaneously using a well-known double-side polishing apparatus. The polished substrate 10 is cleaned and dried to prepare for texture processing.
In the wettability improving liquid application step 40, it is preferable to apply uniformly the liquid of the component excluding the abrasive grains from the slurry used for texture processing as the wettability improving liquid on the surface of the substrate 10 by dip coating or spin coating. 10 on both sides.
This coating is performed by adding a dip tank for dip coating the wettability improving liquid, a vertical mechanism of the substrate 10 into the dip tank, and a coating nozzle for the wettability improving liquid for spin coating to the texture processing apparatus. Can do. In the case of adding a wettability improving liquid application nozzle, it is preferable because the wettability improving liquid can be spin-coated using the substrate rotation mechanism of the texture processing apparatus.

テクスチャー加工工程50としては、周知のテクスチャー加工装置を用い、基板10を回転してその表面に研磨布(好ましくは研磨テープ)を接触させ、その接触部にダイヤモンドなどの研磨砥粒を分散浮遊させたスラリーをスラリー供給ノズルから滴下することにより行うことができる。
このテクスチャー加工に用いるスラリーから砥粒を除いた成分の液体を濡れ性改善液として濡れ性改善液塗布工程40で均一に塗布しておくことにより、スラリーの基板10上での親和性が良くなるため、テクスチャー加工時にスラリーが短時間で均一に広がることができ、スラリー中に浮遊しているダイヤモンドなどの砥粒の基板に対する分散状態が均一になる。そのため、基板にテクスチャームラのない均一な加工ができ、異常突起の形成が抑制される。
〔成膜工程60の説明〕
成膜工程60は、テクスチャー加工工程50でテクスチャー加工を施した後、洗浄・乾燥した基板10上に、非磁性金属下地層11、磁気記録層12、保護層13及び潤滑層14を順次成膜する各成膜工程からなる。
As the texture processing step 50, using a known texture processing apparatus, the substrate 10 is rotated to bring a polishing cloth (preferably a polishing tape) into contact therewith, and abrasive grains such as diamond are dispersed and suspended at the contact portion. The slurry can be dropped by dropping from the slurry supply nozzle.
By uniformly applying the liquid of the component excluding the abrasive grains from the slurry used for texturing in the wettability improving liquid application step 40 as the wettability improving liquid, the affinity of the slurry on the substrate 10 is improved. Therefore, the slurry can be spread uniformly in a short time during texturing, and the dispersed state of the abrasive grains such as diamond suspended in the slurry with respect to the substrate becomes uniform. Therefore, the substrate can be uniformly processed without texture irregularity, and the formation of abnormal protrusions is suppressed.
[Description of Film Formation Step 60]
In the film forming step 60, after the texture processing in the texture processing step 50, the nonmagnetic metal underlayer 11, the magnetic recording layer 12, the protective layer 13, and the lubricating layer 14 are sequentially formed on the cleaned and dried substrate 10. Each film forming step.

非磁性金属下地層11としては、スパッタ法により成膜することが好ましく、また、組成は慣用のものでよく特に限定されないが、例えば、Cr、Cr−W、Cr−V、Cr−Mo、Cr−Si、Ni−Al、Co−Cr、Mo、W、Ptなどからなり、多層構造のものであってもよい。膜厚は20nm以下であり、好ましくは10〜20nmである。
磁気記録層12としては、スパッタ法により成膜することが好ましく、記録層として使用できる強磁性金属を含み、例えば、CoCrTaPt、CoCrTaPt-Cr2O3、CoCrTaPt-SiO2、CoCrTaPt-ZrO2、CoCrTaPt-TiO2、CoCrTaPt-Al2O3などを成分とするCo合金磁性膜などからなり、多層構造のものであってもよい。膜厚は20nm以下であり、好ましくは10〜20nmである。
保護層13としては、スパッタ法又はプラズマCVD法により成膜することが好ましく、磁気記録層12を磁気ヘッドの衝撃、外界の腐食性物質などの腐食から保護する機能を有するもので、水素添加アモルファスカーボンや窒素添加アモルファスカーボンなどからなるカーボン保護膜が好ましい。膜厚は5.0nm以下であり、好ましくは2.0〜4.0nmである。
The nonmagnetic metal underlayer 11 is preferably formed by sputtering, and the composition may be conventional and is not particularly limited. For example, Cr, Cr—W, Cr—V, Cr—Mo, Cr It is made of -Si, Ni-Al, Co-Cr, Mo, W, Pt, etc., and may have a multilayer structure. The film thickness is 20 nm or less, preferably 10 to 20 nm.
The magnetic recording layer 12 is preferably formed by a sputtering method, comprising the ferromagnetic metal can be used as a recording layer, for example, CoCrTaPt, CoCrTaPt-Cr 2 O 3, CoCrTaPt-SiO 2, CoCrTaPt-ZrO 2, CoCrTaPt It is made of a Co alloy magnetic film containing -TiO 2 , CoCrTaPt-Al 2 O 3 or the like as a component, and may have a multilayer structure. The film thickness is 20 nm or less, preferably 10 to 20 nm.
The protective layer 13 is preferably formed by sputtering or plasma CVD, and has a function of protecting the magnetic recording layer 12 from the impact of the magnetic head and corrosion of corrosive substances in the outside world. A carbon protective film made of carbon, nitrogen-added amorphous carbon, or the like is preferable. The film thickness is 5.0 nm or less, preferably 2.0 to 4.0 nm.

潤滑層14としては、液体潤滑剤を塗布することにより成膜することが好ましく、その液体潤滑剤は、パーフルオロ-ポリエーテルが好ましく、Z-dol、Z-tetraol、Z-dol TX、AM(アウジモント社商品名)など、いずれの液体潤滑剤でもよい。膜厚は2.0nm以下であり、好ましくは1.0〜1.5nmである。
以上のようにして作製した磁気記録媒体について、磁気ヘッドの安定飛行を保証できる浮上量を測定すると、濡れ性改善液塗布工程40を設けたことにより、濡れ性改善液塗布工程40のない従来のものと比較して、砥粒の分散状態に分布のない均一な加工がなされて異常突起の形成が抑制され、異常突起の高さを低くすることができるので、磁気ヘッドは低浮上量でも安定飛行することができる。
The lubricating layer 14 is preferably formed by applying a liquid lubricant, and the liquid lubricant is preferably a perfluoro-polyether, such as Z-dol, Z-tetraol, Z-dol TX, AM ( Any liquid lubricant such as a trade name of Augmont) may be used. The film thickness is 2.0 nm or less, preferably 1.0 to 1.5 nm.
When the flying height that can guarantee the stable flight of the magnetic head is measured for the magnetic recording medium manufactured as described above, the conventional wettability improving liquid coating process 40 is not provided by providing the wettability improving liquid coating process 40. Compared to that, uniform processing with no distribution of abrasive grains is performed to suppress the formation of abnormal projections, and the height of abnormal projections can be reduced, so the magnetic head is stable even at low flying height Can fly.

本発明により製造する磁気記録媒体の実施形態の構成を示す断面模式図である。It is a cross-sectional schematic diagram which shows the structure of embodiment of the magnetic recording medium manufactured by this invention. 本発明に係る磁気記録媒体用基板の製造方法を用いた磁気記録媒体の製造方法の実施形態の構成を示す工程図である。It is process drawing which shows the structure of embodiment of the manufacturing method of the magnetic recording medium using the manufacturing method of the board | substrate for magnetic recording media which concerns on this invention.

符号の説明Explanation of symbols

1 非磁性基体
2 非磁性金属膜
10 磁気記録媒体用基板
11 非磁性金属下地層
12 磁気記録層
13 保護層
14 潤滑層
100 磁気記録媒体
200 基板製造工程
1 Nonmagnetic Base 2 Nonmagnetic Metal Film 10 Magnetic Recording Medium Substrate 11 Nonmagnetic Metal Underlayer 12 Magnetic Recording Layer 13 Protective Layer 14 Lubricating Layer 100 Magnetic Recording Medium 200 Substrate Manufacturing Process

Claims (5)

テクスチャー加工を施すべき基板の表面に砥粒を含むスラリーの濡れ性を改善するための濡れ性改善液をテクスチャー加工を施す前に塗布する濡れ性改善液塗布工程と、
該濡れ性改善液で濡れた状態の基板を回転してその表面に前記スラリーを供給しながらテクスチャー加工を施すテクスチャー加工工程とを備えることを特徴とする磁気記録媒体用基板の製造方法。
A wettability improving liquid application step for applying a wettability improving liquid for improving the wettability of the slurry containing abrasive grains on the surface of the substrate to be textured before applying the texture process;
A method of manufacturing a substrate for a magnetic recording medium, comprising: a texture processing step of rotating a substrate wetted with the wettability improving liquid and performing texture processing while supplying the slurry to the surface of the substrate.
前記濡れ性改善液は、テクスチャー加工を施すべき基板の表面への接触角が前記スラリーのそれよりも小さい液体からなることを特徴とする請求項1に記載の磁気記録媒体用基板の製造方法。   2. The method of manufacturing a substrate for a magnetic recording medium according to claim 1, wherein the wettability improving liquid comprises a liquid having a contact angle to the surface of the substrate to be textured smaller than that of the slurry. 前記濡れ性改善液は、前記スラリーから砥粒を除いた成分の液体からなることを特徴とする請求項1又は2に記載の磁気記録媒体用基板の製造方法。   The method for manufacturing a substrate for a magnetic recording medium according to claim 1, wherein the wettability improving liquid comprises a liquid having a component obtained by removing abrasive grains from the slurry. 前記濡れ性改善液塗布工程における濡れ性改善液の塗布は、ディプコート法又はスピンコート法により行うことを特徴とする請求項1〜3のいずれかに記載の磁気記録媒体用基板の製造方法。   4. The method of manufacturing a magnetic recording medium substrate according to claim 1, wherein the wettability improving liquid is applied in the wettability improving liquid application step by a dip coating method or a spin coating method. 請求項1〜4のいずれかにより製造された磁気記録媒体用基板上に、少なくとも磁気記録層を成膜する成膜工程を備えることを特徴とする磁気記録媒体の製造方法。   A method of manufacturing a magnetic recording medium, comprising: a film forming step of forming at least a magnetic recording layer on the magnetic recording medium substrate manufactured according to claim 1.
JP2004280965A 2004-09-28 2004-09-28 Method for manufacturing magnetic recording medium substrate, and method for manufacturing magnetic recording medium using the same Withdrawn JP2006099813A (en)

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JP2008302489A (en) * 2007-06-11 2008-12-18 Kao Corp Manufacturing method for hard disk substrate
WO2010041537A1 (en) * 2008-10-08 2010-04-15 コニカミノルタオプト株式会社 Process for producing glass substrate, and process for producing magnetic recording medium
WO2010041536A1 (en) * 2008-10-07 2010-04-15 コニカミノルタオプト株式会社 Process for producing glass substrate, and process for producing magnetic recording medium
WO2010044325A1 (en) * 2008-10-17 2010-04-22 コニカミノルタオプト株式会社 Process for producing glass substrate, and process for producing magnetic recording medium

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008302489A (en) * 2007-06-11 2008-12-18 Kao Corp Manufacturing method for hard disk substrate
WO2010041536A1 (en) * 2008-10-07 2010-04-15 コニカミノルタオプト株式会社 Process for producing glass substrate, and process for producing magnetic recording medium
WO2010041537A1 (en) * 2008-10-08 2010-04-15 コニカミノルタオプト株式会社 Process for producing glass substrate, and process for producing magnetic recording medium
JPWO2010041537A1 (en) * 2008-10-08 2012-03-08 コニカミノルタオプト株式会社 Manufacturing method of glass substrate and manufacturing method of magnetic recording medium
WO2010044325A1 (en) * 2008-10-17 2010-04-22 コニカミノルタオプト株式会社 Process for producing glass substrate, and process for producing magnetic recording medium
JP5321594B2 (en) * 2008-10-17 2013-10-23 コニカミノルタ株式会社 Manufacturing method of glass substrate and manufacturing method of magnetic recording medium
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