JPH10213898A - Resist composition for color filter, resist composition for forming light shielding film and color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide the color filter for light shielding film capable of stably forming a black resin matrix superior in light shielding performance and high in precision, and capable of forming a color resist enlargeable in a color reproducible range, and to provide the color filter for liquid crystal display and the like in high quality at low cost and inductrially advantageously. SOLUTION: This resist composition for the color filter containing the pigments and a dispersant and a solvent and this dispersant is obtained by reaction of a polyisocyanate compound and a compound having one or two hydroxyl groups in one molecule and a number average molecular weight of 300-10,000 and a compound having activated hydrogens and a tertiary amino group.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive resin composition used for producing a color filter or forming a light-shielding film used in combination with a liquid crystal display device or a solid-state image pickup device. "The photosensitive resin composition" is referred to as "resist composition"). In particular, the present invention relates to a composition suitable for a black resist for forming a black pattern to be a black matrix.

[0002]

2. Description of the Related Art A color filter is formed on a glass substrate by a dyeing method, a printing method, an electrodeposition method, a pigment dispersion method, or the like.
Etc. are formed. These known methods have the following features and problems. A color filter by a dyeing method is manufactured by forming an image with a photosensitive resin obtained by mixing a dichromate as a photosensitive agent with gelatin, polyvinyl alcohol, or the like, and then dyeing. In order to form multiple colors on the same substrate, an anti-staining process is indispensable, and there is a problem that the process becomes complicated. In addition, light resistance is poor because a dye is used. Bichromic acid used as a photosensitive agent is also a problem from the viewpoint of preventing pollution.

A color filter formed by a printing method transfers a thermosetting or photocuring ink to a glass substrate by a method such as screen printing or flexographic printing. Although the process is simple because image formation and dyeing are unnecessary, a high-definition image cannot be obtained and there is a problem in ink smoothness. A color filter by an electrodeposition method is a method in which a glass substrate provided with electrodes is immersed in a bath containing a pigment or a dye, and a color is attached by electrophoresis. Although excellent in smoothness, it is difficult to form a complicated pattern because an electrode is required on the glass substrate in advance.

In the pigment dispersion method, an image is formed by using a colored resist in which a pigment is dispersed in a photocurable resin. It has advantages such as high heat resistance and no need for dyeing, and enables high-precision image formation. The pigment dispersion method is superior to the above-mentioned production methods in terms of quality and production cost, and is currently the mainstream of color filter production. Further, a grid-like black pattern called a black matrix is generally arranged between the red, blue, and green colored images for the purpose of improving the contrast. Conventionally, black matrix has been a method of depositing chromium on the entire glass substrate and forming a pattern by etching.However, since chromium is used, the cost is high, the reflectance is high, and there is also a problem with waste liquid treatment. doing. For this reason, studies for forming a resin black matrix formed of a photosensitive resin have been earnestly made.

[0005]

The resin black matrix is formed of an image by a black pigment such as carbon black or a photosensitive composition in which a black pigment is dispersed by mixing several kinds of pigments. In order to obtain high light-shielding properties, it is necessary to incorporate a large amount of pigment.However, as the pigment blending ratio increases, pigment dispersion becomes more difficult, and developability, resolution, adhesion, and stability decrease. However, a resin black matrix having a sufficient light-shielding property has not been realized. Also, red,
Also in the formation of blue and green colored pixels, problems may occur in the developability, resolution, adhesion, and stability of the resist due to the dispersibility of the pigment.

An object of the present invention is to provide a developing property, a resolution property, an adhesion property,
It is an object of the present invention to provide a resist composition for a color filter having excellent stability, and in particular, to provide a resist composition suitable for forming a black matrix having a sufficient light-shielding property without impairing these properties. An object of the present invention is to realize a color filter excellent in quality, low cost, and safety.

[0007]

Means for Solving the Problems As a result of diligent studies, the present inventors have found that such a purpose can be solved by using a specific dispersant. That is, the present invention relates to a resist composition for a color filter comprising a pigment, a dispersant and a solvent, wherein the dispersant is a polyisocyanate compound and a compound having one or more hydroxyl groups in the same molecule and having a number average molecular weight of 300 to 10,000. And a dispersing resin obtained by reacting a compound having an active hydrogen and a tertiary amino group in the same molecule. Another gist is that it contains carbon black, a dispersant, and a solvent, the dispersant is a polyisocyanate compound, and the number average molecular weight of one or two hydroxyl groups in the same molecule is 300 to 10,000.
A resist composition for forming a light-shielding film, characterized in that the resin composition is a dispersion resin obtained by reacting a compound having a tertiary amino group with an active hydrogen in the same molecule. Furthermore, the present invention resides in a color filter having a colored pixel and / or a black matrix formed by the above composition on a transparent substrate.

[0008]

BEST MODE FOR CARRYING OUT THE INVENTION The composition of the present invention is most characterized in that it contains the above-mentioned specific dispersant. The resist composition itself is used as a resist composition for a color filter or a light-shielding film. Known ones may be used, but preferably contain a binder resin, a monomer which is cured by the action of a photopolymerization initiator, and a photopolymerization initiator, and these may be selected from a wide range generally used for this type of resist. it can. The binder resin is not particularly limited as long as it is a polymer compound having a film forming ability, and specific examples include the following compounds.

1) Polyolefin-based polymer Polyethylene, polypropylene, polyisobutylene, etc. 2) Diene-based polymer Polybutadiene, polyisoprene, etc. 3) Polymer having a conjugated polyene structure Polyacetylene-based polymer, polyphenylene-based polymer, etc. 4) Vinyl polymer polyvinyl chloride, polystyrene , Vinyl acetate, polyvinyl alcohol, polyacrylic acid, polyacrylic acid ester, polyacrylamide, polyacrylonitrile, polyvinyl phenol, etc. 5) polyether polyphenylene ether, polyoxirane, polyoxetane, polytetrahydrofuran, polyether ketone,
6) Phenol resin novolak resin, resol resin, etc. 7) Polyester polyethylene terephthalate, polyphenolphthalein terephthalate, polycarbonate, alkyd resin, unsaturated polyester resin, etc. 8) Polyamide nylon-6, nylon 66, water-soluble Nylon, polyphenyleneamide, etc. 9) Polypeptide gelatin, casein, etc. 10) Epoxy resin and its modified products Novolak epoxy resin, bisphenol epoxy resin, resin modified with novolak epoxy acrylate and acid anhydride, etc. 11) Other polyurethane, polyimide, melamine resin, Urea resin,
Polyimidazole, polyoxazole, polypyrrole,
Polyaniline, polysulfide, polysulfone, celluloses, etc.

Among these resins, a color filter resist composition containing a resin having a carboxyl group or a phenolic hydroxyl group in the resin side chain or main chain can be alkali-developed, and is therefore preferable from the viewpoint of preventing pollution. In particular, a resin having a carboxyl group, for example, an acrylic acid (co) polymer, a styrene / maleic anhydride resin, an acid anhydride-modified resin of novolak epoxy acrylate, and the like are preferable because of high alkali developability. Further, acrylic resins are preferable because of their excellent developability, and various copolymers can be obtained by selecting various monomers.
It is more preferable from the viewpoint of performance and production control.

More specifically, acrylic resins containing a carboxyl group include, for example, (meth) acrylic acid, (anhydride) maleic acid, crotonic acid, itaconic acid, fumaric acid,
Monomer having a carboxyl group such as styrene, α-
Methyl styrene, methyl (meth) acrylate, (meth)
Ethyl acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, vinyl acetate, acrylonitrile, (meth) acrylamide, glycidyl (meth) acrylate, allyl glycidyl ether, glycidyl ethyl acrylate, Crotonic acid glycidyl ether, (meth) acrylic acid chloride, benzyl (meth) acrylate, hydroxyethyl (meth) acrylate, N-methylolacrylamide, N, N-dimethylacrylamide, N-methacryloylmorpholine, N, N-dimethylaminoethyl ( Examples thereof include polymers obtained by copolymerizing comonomers such as (meth) acrylate and N, N-dimethylaminoethylacrylamide. Among them, preferred is an acrylic resin containing at least (meth) acrylic acid or (meth) acrylic acid alkyl ether as a constituent monomer, and more preferred is an acrylic resin containing (meth) acrylic acid and styrene.

These resins can also have an ethylenic double bond added to the side chain. By giving a double bond to the resin side chain, photocurability is increased, so that resolution,
This is preferable because the adhesion can be further improved. As a synthetic means for introducing an ethylenic double bond, for example, the methods described in JP-B-50-34443, JP-B-50-34444 and the like can be mentioned. Specific examples include a method in which a compound having a glycidyl group, an epoxycyclohexyl group, and a (meth) acryloyl group in combination with a carboxyl group or a hydroxyl group, an acrylic acid chloride, or the like is used. For example, glycidyl (meth) acrylate, allyl glycidyl ether, glycidyl α-ethyl acrylate, crotonyl glycidyl ether, glycidyl ether (iso) crotonate, (3,4-epoxycyclohexyl) methyl (meth) acrylate, (meth) By using a compound such as acrylic acid chloride or (meth) allyl chloride and reacting it with a resin having a carboxyl group or a hydroxyl group, a resin having a polymer group in the side chain can be obtained. Particularly, a resin obtained by reacting an alicyclic epoxy compound having a (meth) acryloyl group such as (3,4-epoxycyclohexyl) methyl (meth) acrylate is preferable.

In this specification, "(meth) acryl-", "(meth) acrylate" and the like mean "acryl- or methacryl-", -acrylate and methacrylate, and the like. “Meth) acrylic acid” means “acrylic acid or methacrylic acid”. The preferable range of the weight average molecular weight of these acrylic resins in terms of polystyrene measured by GPC is 1,000 to 100,000. If the weight average molecular weight is less than 1,000, it is difficult to obtain a uniform coating film,
If it exceeds 100,000, developability tends to decrease. The preferred content range of the carboxyl group is 5 to 200 in terms of acid value. If the acid value is less than 5, it becomes insoluble in an alkali developer, and if it exceeds 200, the sensitivity may be reduced.

Examples of the monomer which is cured by the action of the photopolymerization initiator include a monomer which undergoes radical polymerization by the action of a radical generated by the photopolymerization initiator and a monomer which undergoes addition condensation by the action of an acid generated from the photopolymerization initiator. Either one can be used. Representative examples of the former include monomers having an ethylenic double bond, and more specifically, isobutyl acrylate, t-butyl acrylate, lauryl acrylate, cetyl acrylate, stearyl acrylate, cyclohexyl acrylate, isobonyl acrylate, Benzyl acrylate, 2-methoxyethyl acrylate, 3-methoxybutyl acrylate, ethyl carbitol acrylate, phenoxyethyl acrylate, tetrahydrofuryl acrylate, phenoxy polyethylene glycol acrylate,
Methoxypropylene glycol acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-acryloyloxyethyl hydrogen phthalate, 2-acryloyloxypropyl hydrogen phthalate, 2-acryloyloxypropyl tetrahydrohydrogen phthalate, morpholinoethyl methacrylate, trifluoroethyl acrylate , Trifluoroethyl methacrylate, tetrafluoropropyl (meth) acrylate, hexafluoropropyl (meth) acrylate, octafluoropentyl (meth) acrylate, heptadecafluorododecyl acrylate, trimethylsiloxyethyl methacrylate,
1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, 1,9-nonanediol diacrylate, neopentyl glycol diacrylate, tetraethylene glycol diacrylate, tripropylene glycol diacrylate, propylene glycol diacrylate, Glycerin methacrylate acrylate, bisphenol A, ethylene oxide adduct diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane ethylene oxide added triacrylate, glycerin propylene oxide added triacrylate, trisacryloyloxyethylene Phosphate, Dipentaerythritol Hexaacrylate, modified acrylic acid of novolak epoxy, modified acrylic acid and anhydride of novolak epoxy, N-vinylpyrrolidone, N-vinylcaprolactam, acrylated isocyanurate, dipentaerythritol monohydroxypentaacrylate, urethane acrylate, And unsaturated polyester acrylate. Among these monomers, acrylic monomers, particularly acrylic monomers having three or more ethylenic double bonds are preferred. These monomers are used alone or in combination.

On the other hand, as the monomer which undergoes addition condensation by the action of an acid generated from a photopolymerization initiator, a compound obtained by reacting melamine, benzoguanamine, glycoluril or urea with formaldehyde or an alkyl-modified compound thereof, an epoxy compound and a resole compound And other compounds having a cross-linking action. Specifically, Cymel (registered trademark) 300, 301 of Mitsui Cyanamid Co., Ltd.
303, 350, 736, 738, 370, 771, 3
25, 327, 703, 701, 266, 267, 28
5,232,235,238,1141,272,25
4, 202, 1156, 1158 are examples of a compound obtained by reacting melamine with formaldehyde or an alkyl-modified product thereof. Cymel (registered trademark) 1123, 112
5, 1128 are examples of a compound obtained by reacting formaldehyde with benzoguanamine or an alkyl-modified product thereof. Cymel (registered trademark) 1170, 1171, 117
No. 4,1172 is an example of a compound obtained by reacting glycoluril with formaldehyde or an alkyl-modified product thereof. Examples of a compound obtained by reacting urea with formaldehyde or an alkyl-modified product thereof include U.S.A.
FR (registered trademark) 65, 300 can be mentioned.

Examples of epoxy compounds include triglycidyl trishydroxyethyl isocyanurate, allyl glycidyl ether, ethylhexyl glycidyl ether, phenyl glycidyl ether, phenol glycidyl ether, lauryl alcohol glycidyl ether,
Glycidyl adipate, glycidyl phthalate, dibromophenyl glycidyl ether, dibromoneopentyl glycol diglycidyl ether, glycidyl phthalimide, (poly) ethylene glycol glycidyl ether, polypropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, glycerin polyglycidyl Examples thereof include ether, trimethylolpropane polyglycidyl ether, and butyl glycidyl ether.

Among them, a compound having a —N (CH ₂ OR) ₂ group in the molecule (wherein R
Represents a hydrogen atom or an alkyl group). Specifically, a compound obtained by reacting urea or melamine with formaldehyde or an alkyl-modified product thereof is particularly preferred. Examples of resole compounds include PP- manufactured by Gunei Chemical Co., Ltd.
3000s, PP-3000A, RP-2978, SP
-1974, SP-1975, SP-1976, SP-
1977, RP-3993 and the like. Among these binder resins and monomers, the combination of the above-mentioned acrylic resin containing a carboxyl group and an acrylic monomer is most preferable in that the resist composition for a color filter can be alkali-developed.

As the photopolymerization initiator, any known photopolymerization initiator can be used, and examples thereof include a compound capable of generating a radical for polymerizing an ethylenically unsaturated group by ultraviolet rays and a compound capable of generating an acid by ultraviolet rays. . Specifically, 2- (4-methoxyphenyl) -4,6
-Bis (trichloromethyl) -s-triazine, 2-
(4-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxy) Carbonylnaphthyl) -4,
Halomethylated triazine derivatives such as 6-bis (trichloromethyl) -s-triazine, halomethylated oxadiazole derivatives, 2- (2'-chlorophenyl) -4,
5-diphenylimidazole dimer, 2- (2'-chlorophenyl) -4,5-bis (3'-methoxyphenyl) imidazole dimer, 2- (2'-fluorophenyl) -4,5-diphenylimidazole Dimer, 2-
(2'-methoxyphenyl) -4,5-diphenylimidazole dimer, (4'-methoxyphenyl) -4,5
-Imidazole derivatives such as diphenylimidazole dimer, benzoin such as benzoin methyl ether, benzoin phenyl ether, benzoin isobutyl ether and benzoin isopropyl ether, benzoin alkyl ethers, 2-methylanthraquinone, 2-ethylanthraquinone and 2-t-butyl Anthraquinone, 1-
Benzophenone derivatives such as anthraquinone derivatives such as chloroanthraquinone, benzanthrone derivatives, benzophenone, Michler's ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone and 2-carboxybenzophenone; , 2-Dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexylphenyl ketone, α-hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-
Isopropylphenyl) ketone, 1-hydroxy-1-
(P-dodecylphenyl) ketone, 2-methyl- (4 '
Acetophenone derivatives such as-(methylthio) phenyl) -2-morpholino-1-propanone, 1,1,1-trichloromethyl- (p-butylphenyl) ketone, thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2- Chlorothioxanthone, 2,4
Thioxanthone derivatives such as -dimethylthioxanthone, 2,4-diethylthioxanthone and 2,4-diisopropylthioxanthone; benzoic acid ester derivatives such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate; 9-phenylacridine; Acridine derivatives such as (p-methoxyphenyl) acridine,
Phenazine derivatives such as 9,10-dimethylbenzphenazine, di-cyclopentadienyl-Ti-di-chloride, di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis-2 , 3,
4,5,6-pentafluorophenyl-1-yl, di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophenyl-1-yl, di-cyclopentadienyl-Ti- Bis-2,4,6-trifluorophenyl
1-yl, di-cyclopentadienyl-Ti-2,6-
Di-fluorophenyl-1-yl, di-cyclopentadienyl-Ti-2,4-di-fluorophenyl-1-yl,
Di-methylcyclopentadienyl-Ti-bis-2,
3,4,5,6-pentafluorophenyl-1-yl, di-methylcyclopentadienyl-Ti-bis-2,6-
Di-fluorophenyl-1-yl, di-cyclopentadienyl-Ti-2,6-di-fluoro-3- (pyr-1-
And titanocene derivatives such as yl) -phenyl-1-yl. These photopolymerization initiators are used alone or in combination. For example, Japanese Patent Publication No. 53-1280
2, JP-A-1-279903, JP-A-2-48664,
Combinations of the initiators described in JP-A-4-164902, JP-A-6-75373 and the like can be mentioned. Among these photopolymerization initiators, halomethylated triazine derivatives, halomethylated oxadiazole derivatives, biimidazole derivatives, and titanocene derivatives are particularly preferred because of their high sensitivity, high stability, and high solubility.

The pigment used in the present invention is not particularly limited. Pigments of red, green, blue and the like can be used well, but black pigments are particularly good. red,
Green and blue pigments include anthraquinone pigments, perylene pigments, azo pigments, phthalocyanine pigments, isoindolinone pigments, dioxazine pigments, quinacridone pigments, perinone pigments, triphenylmethane pigments, and thioindigo pigments. Organic pigments such as pigments and graphite, cadmium yellow, cadmium red, yellow iron oxide, chrome vermillion, cobalt green, cobalt violet, cobalt blue, vermilion, zinc chromate, stronzyme yellow, emerald green, cerulean blue, viridian, bengala And inorganic pigments such as Mars violet, manganese violet and chromium oxide. From the viewpoints of heat resistance, color reproducibility, dispersion stability and the like, anthraquinone pigments, perylene pigments, azo pigments, phthalocyanine pigments, isoindolinone pigments, and dioxazine pigments are particularly preferred. These pigments can be used alone or in combination.

From the viewpoint of widening the color reproduction region, adjusting the white balance, etc., red is preferably a mixture of an anthraquinone pigment and an azo pigment or a combination of an anthraquinone pigment and an isoindolinone pigment. Green is preferably a mixture of a phthalocyanine pigment and an azo pigment or a combination of a phthalocyanine pigment and an isoindolinone pigment. Blue is preferably a phthalocyanine pigment alone or a combination of a thalocyanine pigment and a dioxazine pigment. The black pigment may be black by mixing a plurality of the above organic pigments or inorganic pigments, but it is preferable to use carbon black, graphite, or titanium black which has a strong light shielding effect. Among them, carbon black is preferred.

Specifically, carbon blacks # 2400, # 2350, # 2300, # 2200, manufactured by Mitsubishi Chemical Corporation
# 1000, # 980, # 970, # 960, # 95
0, # 900, # 850, MCF88, # 650, MA
600, MA7, MA8, MA11, MA100, MA
220, IL30B, IL31B, IL7B, IL11
B, IL52B, # 4000, # 4010, # 55, #
52, # 50, # 47, # 45, # 44, # 40, # 3
3, # 32, # 30, # 20, # 10, # 5, CF9,
# 3050, # 3150, # 3250, # 3750, #
3950, Diamond Black A, Diamond Black N220
M, Diamond Black N234, Diamond Black I, Diamond Black LI, Diamond Black II, Diamond Black N339, Diamond Black SH, Diamond Black SH
A, Diamond Black LH, Diamond Black H, Diamond Black HA, Diamond Black SF, Diamond Black N5
50M, Diamond Black E, Diamond Black G, Diamond Black R, Diamond Black N760M, Diamond Black LR. Carbon black Thermax N990, N991, N907, N908, N99 manufactured by Cancurb
0, N991, N908. Asahi Carbon Co., Ltd. carbon black Asahi # 80, Asahi # 70, Asahi # 70L, Asahi F-20
0, Asahi # 66, Asahi # 66HN, Asahi # 60H, Asahi # 60
U, Asahi # 60, Asahi # 55, Asahi # 50H, Asahi # 51, Asahi #
50U, Asahi # 50, Asahi # 35, Asahi # 15, Asahi Thermal. Degussa Carbon Black ColorBlac
k Fw200, ColorBlack Fw2, Co
lorBlack Fw2V, ColorBlack
Fw1, ColorBlack Fw18, Color
Black S170, ColorBlack S16
0, SpecialBlack6, SpecialBl
ack5, SpecialBlack4, Specia
1Black4A, SpecialBlack250,
SpecialBlack350, PrintexU,
PrintexV, Printex140U, Prin
tex140V (all are trade names).

Particularly preferred among these carbon blacks
Good thing has a specific surface area of 110m^Two/ G or less and pH
Has physical property values of 2 to 9. Specific surface area is 11
0m ^Two / G, polymer dispersion required for dispersion stabilization
Large amounts of dispersants are required, but polymer dispersants are insoluble in developer
, The resolution and the developability tend to be reduced. Ma
When the pH value exceeds 9, the polymer dispersant is adsorbed.
It is difficult to stabilize dispersion. pH less than 2 carbon
Black is extremely difficult and impractical to manufacture industrially
No.

The dispersant used in the present invention is a polyisocyanate compound, a compound having one or more hydroxyl groups in the molecule (having a number average molecular weight of 300 to 10,000), and active hydrogen and a tertiary amino group in the same molecule. Is a dispersion resin obtained by reacting with a compound having the following formula (I), and its weight average molecular weight is preferably 1,000 to 200,000.

Examples of the above polyisocyanate compounds include paraphenylene diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, naphthalene-1,5-diisocyanate and tolidine diisocyanate. Aromatic diisocyanate, hexamethylene diisocyanate, lysine methyl ester diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, aliphatic diisocyanate such as dimer acid diisocyanate, isophorone diisocyanate, 4, etc.
Alicyclic diisocyanate such as 4'-methylenebis (cyclohexyl isocyanate), ω, ω'-diisocyanate dimethylcyclohexane, aromatic ring such as xylylene diisocyanate, α, α, α ', α'-tetramethyl xylylene diisocyanate; Aliphatic diisocyanate, lysine ester triisocyanate,
11-undecane triisocyanate, 1,8-diisocyanate-4-isocyanatomethyloctane, 1,
3,6-hexamethylene triisocyanate, bicycloheptane triisocyanate, tris (isocyanate phenylmethane), tris (isocyanate phenyl)
Examples include triisocyanates such as thiophosphate, and trimers, water adducts, and polyol adducts thereof. Preferred as the polyisocyanate are trimers of organic diisocyanate, and most preferred are trimers of tolylene diisocyanate and trimers of isophorone diisocyanate. These may be used alone or in combination.

As a method for producing the trimer of isocyanate, the above-mentioned polyisocyanate is converted into a suitable trimerization catalyst such as tertiary amines, phosphines, alkoxides, and the like.
After partially trimerizing the isocyanate group using metal oxides, carboxylate salts, etc., and terminating the trimerization by adding a catalyst poison, unreacted polyisocyanate is removed by solvent extraction and thin-film distillation. A method for obtaining a desired isocyanurate group-containing polyisocyanate is exemplified.

As the compound having one or more hydroxyl groups in the same molecule (having a number average molecular weight of 300 to 10,000), a compound having one or two hydroxyl groups is preferable. In particular, polyether glycol, polyester glycol, polycarbonate glycol, Polyolefin glycol and the like, and a hydroxyl group at one end of these compounds has 1 to 1 carbon atoms.
Examples include those alkoxylated with 25 alkyl groups and mixtures of two or more of these.

Examples of the polyether glycol include polyether diol, polyether ester diol, and a mixture of two or more thereof. As the polyether diol, those obtained by homo- or copolymerizing an alkylene oxide, for example, polyethylene glycol, polypropylene glycol, polyethylene-propylene glycol, polyoxytetramethylene glycol, polyoxyhexamethylene glycol, polyoxyoctamethylene glycol and the like And mixtures of two or more of the above. Polyetherester diols include those obtained by reacting a mixture of ether-containing diols or other glycols with dicarboxylic acids or their anhydrides, or by reacting polyester glycols with alkylene oxides, such as poly (poly (Oxytetramethylene) adipate and the like. The most preferable polyether glycol is polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol or a compound in which a hydroxyl group at one end of these compounds is alkoxylated with an alkyl group having 1 to 25 carbon atoms.

Examples of the polyester glycol include dicarboxylic acids (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, phthalic acid, etc.) or their anhydrides and glycols (ethylene glycol, diethylene glycol, triethylene glycol, propylene). Glycol, dipropylene glycol, tripropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 3-methyl-1,5-pentanediol, neo Pentyl glycol, 2-methyl-1,3-propanediol, 2-methyl-2-propyl-1,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,5-pentane Diol, 1,6-hexanediol, 2-methyl 2,4-pentanediol,
2,2,4-trimethyl-1,3-pentanediol,
2-ethyl-1,3-hexanediol, 2,5-dimethyl-2,5-hexanediol, 1,8-octamethylene glycol, 2-methyl-1,8-octamethylene glycol, 1,9-nonanediol With aliphatic glycols such as bishydroxymethylcyclohexane, aromatic glycols such as xylylene glycol and bishydroxyethoxybenzene, and N-alkyl dialkanolamines such as N-methyldiethanolamine. Such as polyethylene adipate, polybutylene adipate, polyhexamethylene adipate, polyethylene / propylene adipate, etc .;
Examples thereof include polylactone diol or polylactone monool obtained by using a polyhydric alcohol as an initiator, for example, polycaprolactone glycol, polymethylvalerolactone, and a mixture of two or more thereof. The most preferred polyester glycol is polycaprolactone glycol or polycaprolactone with an alcohol having 1 to 25 carbon atoms as an initiator.

Polycarbonate glycols include poly (1,6-hexylene) carbonate and poly (3-methyl-1,5-pentylene) carbonate, and polyolefin glycols include polybutadiene glycol, hydrogenated polybutadiene glycol, and hydrogenated polyisoprene. Glycol and the like. The compound having one or two hydroxyl groups in the same molecule has a number average molecular weight of 30.
It is 0 to 10,000, preferably 500 to 6,000, and more preferably 1,000 to 4,000.

The compound having an active hydrogen and a tertiary amino group in the same molecule used in the present invention will be described. Active hydrogen,
That is, examples of the hydrogen atom directly bonded to an oxygen atom, a nitrogen atom or a sulfur atom include a hydrogen atom in a functional group such as a hydroxyl group, an amino group, and a thiol group. Among them, an amino group, particularly a primary amino group Is preferred. The tertiary amino group is not particularly limited. Examples of the tertiary amino group include an amino group having an alkyl group having 1 to 4 carbon atoms, or a heterocyclic structure, more specifically, an imidazole ring or a triazole ring.

Examples of such a compound having an active hydrogen and a tertiary amino group in the same molecule include N, N-dimethyl-1,3-propanediamine, N, N-diethyl-
1,3-propanediamine, N, N-dipropyl-1,
3-propanediamine, N, N-dibutyl-1,3-propanediamine, N, N-dimethylethylenediamine,
N, N-diethylethylenediamine, N, N-dipropylethylenediamine, N, N-dibutylethylenediamine, N, N-dimethyl-1,4-butanediamine,
N-diethyl-1,4-butanediamine, N, N-dipropyl-1,4-butanediamine, N, N-dibutyl-
1,4-butanediamine and the like.

Further, when the tertiary amino group is an N-containing hetero ring, a pyrazole ring, imidazole ring, triazole ring, tetrazole ring, indole ring, carbazole ring, indazole ring, benzimidazole ring, benzotriazole ring, benzoxazole Ring, benzothiazole ring, N-containing 5-membered ring such as benzothiadiazole ring, pyridine ring, pyridazine ring, pyrimidine ring, triazine ring, quinoline ring, acridine ring, isoquinoline ring,
And N-containing hetero 6-membered rings. Preferred as these N-containing hetero rings are an imidazole ring and a triazole ring.

Specific examples of these compounds having an imidazole ring and an NH ₂ group include 1- (3-aminopropyl) imidazole, histidine, 2-aminoimidazole, 1- (2-aminoethyl) imidazole and the like. Is mentioned. Further, when a compound having a triazole ring and an NH ₂ group is specifically exemplified, 3-amino-1,
2,4-triazole, 5- (2-amino-5-chlorophenyl) -3-phenyl-1H-1,2,4-triazole, 4-amino-4H-1,2,4-triazole-3,5- Diol, 3-amino-5-phenyl-1H
-1,3,4-triazole, 5-amino-1,4-diphenyl-1,2,3-triazole, 3-amino-1
-Benzyl-1H-2,4-triazole and the like.

Among them, N, N-dimethyl-1,3-propanediamine, N, N-diethyl-1,3-propanediamine, 1- (3-aminopropyl) imidazole,
3-Amino-1,2,4-triazole is preferred. A preferred compounding ratio of the dispersed resin material is 10 to 200 parts by weight, preferably 20 to 200 parts by weight, of a compound having a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the same molecule per 100 parts by weight of the polyisocyanate compound. 190 parts by weight, more preferably 30 to 180 parts by weight, the compound having an active hydrogen and a tertiary amino group in the same molecule is 0.2 to 0.2 parts by weight.
25 parts by weight, preferably 0.3 to 24 parts by weight.

The weight average molecular weight of the dispersion resin is from 1,000 to 200,000 in terms of polystyrene measured by GPC.
0, preferably 2,000 to 100,000, more preferably 3,000 to 50,000. If the molecular weight is less than 1,000, dispersibility and dispersion stability are poor, and 2
If it exceeds 000, the solubility is lowered and the dispersibility is deteriorated, and at the same time, the gelation easily occurs and the control of the reaction becomes difficult.

The dispersion resin is produced according to a known method for producing a polyurethane resin. As a solvent for the production, usually, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone,
Ketones such as isophorone, esters such as ethyl acetate, butyl acetate, and cellosolve acetate, hydrocarbons such as benzene, toluene, xylene, and hexane, and some alcohols such as diacetone alcohol, isopropanol, secondary butanol, and tert-butanol Examples thereof include chlorides such as methylene chloride and chloroform, ethers such as tetrahydrofuran and diethyl ether, and aprotic polar solvents such as dimethylformamide, N-methylpyrrolidone and dimethylsulfoxide.

As a catalyst for the production, an ordinary urethanization reaction catalyst is used. For example, tin compounds such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin dioctoate, and stannas octoate; iron compounds such as iron acetylacetonate and ferric chloride; and tertiary amine compounds such as triethylamine and triethylenediamine. Can be

The amount of the compound having an active hydrogen and a tertiary amino group in the same molecule is 1 in terms of the amine value of the dispersed resin after the reaction.
It is preferable to control within the range of １００100 mgKOH / g. More preferably, it is in the range of 5-95 mgKOH / g. When the amine value is below the above range, the dispersing ability tends to decrease, and when the amine value exceeds the above range, the developability tends to decrease. In addition, when the isocyanate group remains in the dispersion resin by the above reaction, it is preferable to further crush the isocyanate group with an alcohol or an amino compound because the stability with time of the dispersion resin increases.

The dispersion resin and the pigment are subjected to a dispersion treatment before being blended into the resist solution. Dispersion is performed by adding a pigment, a dispersing resin and a solvent, and in some cases, a binder resin to form a mill base, which is processed by a method such as a ball mill, a sand mill, a bead mill, a three-roll, a paint shaker, an ultrasonic wave, and a bubble homogenizer. Two or more of these processing methods can be combined. The preferred particle size of the pigment obtained by the dispersion treatment is, for example, in the case of carbon black, in the range of 0.005 to 0.7 µ, more preferably 0.01 to 0.5 µ. The carbon black particle size is measured by a laser Doppler type particle size measuring device. If the particle size exceeds the upper limit of the above range, developability, resolution, and stability will decrease. In addition, in order to make the pigment particle smaller than the primary particle of carbon black or more in order to make the particle size less than the lower limit,
It is extremely difficult to manufacture.

Examples of the solvent used in the present invention include diisopropyl ether, mineral spirit, n
-Pentane, amyl ether, ethyl caprylate, n
Hexane, diethyl ether, isoprene, ethyl isobutyl ether, butyl stearate, n-octane, valsol # 2, Apco # 18 solvent, diisobutylene, amyl acetate, butyl butyrate, apco thinner, butyl ether, diisobutyl ketone, methylcyclohexene, Methyl nonyl ketone, propyl ether, dodecane, Socal solvent No.
1 and No. 2, amyl formate, dihexyl ether, diisopropyl ketone, Solvesso # 150, butyl acetate (n, sec, t), hexene, shell TS
28 Solvent, butyl chloride, ethyl amyl ketone, ethyl benzoate, amyl chloride, ethylene glycol diethyl ether, ethyl orthoformate, methoxymethyl pentanone, methyl butyl ketone,
Methylhexyl ketone, methyl isobutyrate, benzonitrile, ethyl propionate, methyl cellosolve acetate, methyl isoamyl ketone, methyl isobutyl ketone, propyl acetate, amyl acetate, amyl formate, bicyclohexyl, diethylene glycol monoethyl ether acetate, dipentene, Methoxy methyl pentanol, methyl amyl ketone, methyl isopropyl ketone, propyl propionate, propylene glycol-t-butyl ether, methyl ethyl ketone, methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, carbitol, cyclohexanone,
Ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether, propylene glycol monoethyl ether acetate, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, propylene glycol monoethyl ether acetate, Dipropylene glycol monomethyl ether acetate,
3-methoxypropionic acid, 3-ethoxypropionic acid, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate,
Propyl 3-methoxypropionate, butyl 3-methoxypropionate, diglyme, dipropylene glycol monomethyl ether, ethylene glycol acetate,
Ethyl carbitol, butyl carbitol, ethylene glycol monobutyl ether, propylene glycol
t-butyl ether, 3-methyl-3-methoxybutanol, tripropylene glycol methyl ether, 3-
Organic solvents such as methyl-3-methoxybutyl acetate are exemplified. It is preferable to select a solvent having a boiling point in the range of 100 to 200 ° C. More preferably 120-1
It has a boiling point of 70 ° C. These solvents are used alone or as a mixture. The composition of the present invention comprises 20 to 470 parts by weight of the pigment, 0.005 to 47 parts by weight of the dispersing resin, and 90 to 9500 parts by weight of the solvent, based on 100 parts by weight of the solid component of the resist composition excluding the pigment and the resist material. Department.

In a preferred embodiment of the composition of the present invention, (b) the monomer is used in an amount of 5 to 100 parts by weight, preferably 10 to 95 parts by weight, based on 100 parts by weight of the binder resin.
More preferably, 15 to 90 parts by weight, and (c) the amount of the initiator is 0.1 to 90 parts by weight.
01 to 30 parts by weight, preferably 0.05 to 28 parts by weight,
More preferably, 0.1 to 25 parts by weight, and (d) the pigment is 50 parts by weight.
To 500 parts by weight, preferably 60 to 490 parts by weight, more preferably 70 to 480 parts by weight.
01 to 50 parts by weight, preferably 0.05 to 49 parts by weight,
More preferably, 0.1 to 48 parts by weight, and (f) the solvent is 20 parts by weight.
0 to 10,000 parts by weight, preferably 250 to 9500
Parts by weight, more preferably 300 to 9000 parts by weight.

(B) If the amount of the monomer is less than the above range, the cross-linking density of the image-exposed image area is not sufficient to obtain a good image, and if the amount exceeds the above range, the resist film after drying becomes sticky. And the workability becomes inferior. (C) If the amount of the photopolymerization initiator is less than the above range, sufficient sensitivity cannot be obtained, and if it exceeds the above range, the initiator sometimes precipitates from the photosensitive solution.
(D) If the amount of the pigment is less than the above range, it is difficult to obtain a sufficient color density and the light-shielding power is inferior. On the other hand, if it exceeds the above range, the pigment dispersion stability, developability, resolution, and adhesion will decrease. (F) If the amount of the solvent is less than the above range, coating unevenness tends to occur and lacks uniformity of the film. If the amount exceeds the above range, a sufficient film thickness cannot be obtained. Defects are more likely to occur. The pigment concentration in the total solid content is preferably 25 to 70%. The present invention, these,
In addition to the essential components, sensitizers, coatability improvers, polymerization inhibitors, plasticizers, flame retardants, and the like can be suitably added. These can be used alone or in combination of several kinds.

The resist composition for a color filter of the present invention is particularly useful as a resist composition for a black matrix whose pigment is carbon black as described above. In this case, the content of carbon black is preferably 25 to 70%, more preferably 35 to 70%, and still more preferably 45 to 70% based on the total solid content of the resist composition.
%. By using the dispersant of the present invention, it is possible to produce a black resist composition containing carbon black at a high concentration and having good dispersibility, and when a black matrix is produced using such a black resist composition, carbon black is produced. Despite having a high concentration, it is possible to produce a black matrix having no coating unevenness, high resolution, good adhesion, good storage stability, and high light-shielding properties.

The composition of the present invention is applied to a transparent substrate by a known method such as spin coater, roll coater, curtain coater, screen printing and the like. In addition to glass, plastic such as PET, acrylic, and polycarbonate can be used as the transparent substrate. The coating film thickness is 0.2-10μ
m is preferred. More preferably, it is 0.3 to 5 μm.
A convection oven or hot plate is used to dry the coating. Drying temperature is 50-15
The drying time at 0 ° C. is preferably 30 seconds to 60 minutes. A light source that emits ultraviolet light such as a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a xenon lamp, and a carbon arc lamp can be used for exposure, and a latent image is formed on a resist film by exposing through a mask. Thereafter, an image is formed by developing with a solvent that dissolves the unexposed portion. Organic solvents such as acetone, toluene and MEK can be used as the developing solution, but an alkali developing solution is preferable from the viewpoint of environmental problems. For example, aqueous sodium hydroxide, aqueous potassium hydroxide,
Aqueous sodium carbonate, potassium carbonate, aqueous ammonia,
Tetramethylammonium hydroxide aqueous solution,
Are used. A surfactant, an antifoaming agent and the like may be added to the alkali developer. The developing method is not particularly limited, and can be performed by a known method such as a paddle method, a dipping method, and a spray method. Further, a pre-wet may be employed. Post-baking, after-light curing, or the like may be employed for the purpose of drying the developer after image formation and increasing the curing of the resist film. As described above, the resist composition for a color filter has been mainly described, but the composition of the present invention containing carbon black is particularly effective as a composition for forming a light-shielding film as well as a color filter depending on the structure of a liquid crystal display device. .

[0045]

EXAMPLES Next, the present invention will be described specifically with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist.

Synthesis Example-1 Tolylene diisocyanate trimer (32 g of Mitec GP750A manufactured by Mitsubishi Chemical Corporation, resin solid content 50 wt%, butyl acetate solution) and 0.02 g of dibutyltin dilaurate as a catalyst were added to PGMEA (propylene glycol). Monomethyl ether acetate) was diluted and dissolved with 47 g.
Under stirring, one end has a methoxy group and a molecular weight of 1,0.
14.4 g of polyethylene glycol (manufactured by NOF Corporation, UNIOX M-1000) having a molecular weight of 1,00
0 polypropylene glycol (Sanyo Chemical Industry Co., Ltd.)
9.6 g of Sannics PP-1000) and a mixture were added dropwise, and the mixture was further reacted at 70 ° C. for 3 hours. next,
N, N-dimethylamino-1,3-propanediamine 1
g was added and reacted at 40 ° C. for another hour. The amine value of the solution containing the dispersion resin thus obtained was determined by neutralization titration to be 14 mgKOH / g. In addition, the resin content was reduced by a dry-up method (30 minutes at 150 ° C).
The solvent content was 4 minutes after removing the solvent on a hot plate and calculating the resin concentration based on the weight change.
It was 0 wt%. )

Synthesis Examples 2 to 11 Synthesis examples 1 except that the compounds shown in Table 1 were used.
Was synthesized in the same manner as described above.

Examples 1 to 15 and Comparative Examples 1 to 4 Production of Carbon Black Dispersions The solid content concentration was 50 parts by weight of the carbon black and 5 parts by weight of the dispersed resin (in terms of solid content) shown in Table-3. 50w
PGMEA was added to reach t%. The weight of the dispersion was 50 g. This was well stirred by a stirrer to perform premixing. Next, 2 with a paint shaker
The dispersion treatment was performed at a temperature of 5 to 45 ° C. for 8 hours. As the beads, zirconia beads having a diameter of 0.5 mm were used, and the same weight as the dispersion was added. After the dispersion, the beads and the dispersion were separated by a filter.

Measurement of Gloss of Carbon Black Dispersion Gloss was measured by the following method in order to judge the quality of the dispersion of the above dispersion. As the dispersion state becomes better, the particle size of the carbon black becomes smaller, so that irregular reflection is suppressed and high gloss is achieved. In other words, the higher the glossiness of the dispersion, the better the dispersion state. The dispersion is applied on a glass substrate by a spin coater, and is heated to 80 ° C. on a hot plate.
Dry for 1 minute. This sample was measured for specular gloss at 20 degrees using a gloss meter (manufactured by BYK-Chemie). The results are shown in Table
3 is shown.

Preparation of Resist Composition Using the carbon black dispersion described above, each component was added so that the solid content was as shown below, and the mixture was stirred and dissolved by a stirrer. 1) Composition of resist a) Binder resin (synthesized in the following Synthesis Example-12) 25 g b) Acrylic monomer; dipentaerythritol hexaacrylate 15 g c) Initiator (combination of 3 types) c-1: 2- (2-chlorophenyl) -4,5-diphenylimidazole dimer 2 g c-2: 4,4'-bis (diethylamino) benzophenone 1.0 g c-3: 2-mercaptobenzothiazole 1 g d) Pigment 50 g of carbon black described in Table-3 ) Dispersion resin Table 3-5 g f) Solvent propylene glycol monomethyl ether acetate 300 g

2) Evaluation of Resist The black resist composition was applied to a glass substrate (7059, manufactured by Corning) using a spin coater, and dried on a hot plate at 80 ° C. for 1 minute. The thickness of the dried resist was measured by a stylus-type film thickness meter (α-step, manufactured by Tencor Corporation) and found to be 1 μm. The coating unevenness of the dried resist film was evaluated by visual observation.ら れ る indicates that a uniform coating was obtained, and X indicates that coating unevenness was observed. Further, the optical density (OD) was measured with a Macbeth reflection densitometer TR927 (manufactured by Colmorgun).

Next, this sample was exposed to 2,000 mj / cm ² image with a high-pressure mercury lamp through a mask. Temperature 25
The resist pattern was obtained by immersion and development in a 0.05% aqueous solution of potassium hydroxide at a temperature of 0.05% for 1 minute. The resist pattern that can be formed was observed under a microscope at a magnification of 200 times, and the resolution was determined. When the resolving power was 10 μ or less, it was evaluated as ○, and when it exceeded 10 μ, it was evaluated as x. In addition, cellotape test (peel the cellotape on the resist pattern and then peel off the cellotape)
Was used to evaluate the adhesion.し な い indicates that the resist pattern was not peeled off, and x indicates that the resist pattern was only peeled off. further,
The black resist composition was left at room temperature for one day, and the same image formation was performed. Those that can form a resist pattern of 10 μm or less were evaluated as stability ○, and those that did not are evaluated as x. The results are shown in Table-3.

The binder resin (also used as the dispersant of Comparative Example 1) was produced and used according to the following Synthesis Example-12. Synthesis Example-12 A flask was charged with 20 g of a styrene / acrylic acid resin having an acid value of 200 and a molecular weight of 5,000, 0.2 g of p-methoxyphenol, 0.2 g of dodecyltrimethylammonium chloride, and 40 g of propylene glycol monomethyl ether acetate. 4-epoxycyclohexyl)
7.6 g of methyl acrylate was added dropwise and reacted at a temperature of 100 ° C. for 30 hours. The reaction solution was reprecipitated in water and dried to obtain a resin. When the neutralization titration with KOH was performed, the acid value of the resin was 80. The specific surface area and pH of the carbon black used are as shown in Table-2.

[0054]

[Table 1]

[0055]

Table 2 Specific surface area (m ² / g) pH Asahi Thermal 248.8 MA-220 31 3.0 SP 250 40 3.1 SP 350 65 3.5 MA-11 104 3.5

[0056]

[Table 3] * 1: Weight average molecular weight 4,900, acid value 230 * 2: Weight average molecular weight 10,000, acid value 100 * 3: Weight average molecular weight 4,800, acid value 70

A black matrix is formed on a glass substrate using the black resist compositions of Examples 1 to 15, and then red, green, and blue pixels are formed to obtain good light-shielding properties and adhesion. A color filter having a black matrix was manufactured.

[0058]

The resist composition for a color filter of the present invention is excellent in developability, resolution, adhesion and stability. By using a specific dispersing resin, many pigments can be efficiently dispersed, and in the case of a black resist composition, a light-shielding property can be stably formed with a high-precision black matrix, and red, green A blue or other color resist composition also has the effect of expanding the color reproduction region, and can provide a high-quality, low-cost color filter for liquid crystal displays and the like.

────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. ⁶ Identification symbol FI G03F 7/028 G03F 7/028 7/032 7/032 // C08F 2/50 C08F 2/50 (72) Inventor Yasuyuki Taniguchi Kanagawa 1000, Kamoshida-cho, Aoba-ku, Yokohama-shi

Claims (25)

[Claims] 1. A resist composition for a color filter comprising a pigment, a dispersant and a solvent, wherein the dispersant is a polyisocyanate compound and a compound having one or more hydroxyl groups in the same molecule and having a number average molecular weight of 300 to 10,000. And a resist composition for a color filter, which is a dispersion resin obtained by reacting a compound having an active hydrogen and a tertiary amino group in the same molecule. 2. The resist composition for a color filter according to claim 1, wherein the polyisocyanate compound is a trimer of an organic diisocyanate compound. 3. The resist composition for a color filter according to claim 1, wherein the polyisocyanate compound is a trimer of tolylene diisocyanate and / or a trimer of isophorone diisocyanate. 4. The resist composition for a color filter according to claim 1, wherein the compound having one or more hydroxyl groups in the same molecule is polyether glycol and / or polyester glycol. 5. A compound having one or more hydroxyl groups in the same molecule and having a number average molecular weight of 300 to 10,000, such as polypropylene glycol, polyethylene glycol, polyoxytetramethylene glycol, or a compound in which one terminal hydroxyl group of these compounds has carbon atoms. The compound alkoxylated with an alkyl group of 1 to 25, polycaprolactone glycol, or at least one selected from polycaprolactone having an alcohol having 1 to 25 carbon atoms as an initiator. Resist composition for color filters. 6. The dispersion resin has a weight average molecular weight in terms of polystyrene measured by GPC of 1,000 to 200,000.
The resist composition for a color filter according to any one of claims 1 to 5, wherein 7. The compound having an active hydrogen and a tertiary amino group, wherein the active hydrogen is derived from an NH ₂ group.
7. The resist composition for a color filter according to any one of 6. 8. The compound according to claim 1, wherein the tertiary amino group of the compound having active hydrogen and a tertiary amino group has an alkyl group having 1 to 4 carbon atoms and / or has a heterocyclic structure. Resist composition for color filters. 9. The resist composition for a color filter according to claim 8, wherein the heterocyclic structure is an imidazole ring or a triazole ring. 10. The dispersant has an amine value of 1 to 100 mgK.
The resist composition for a color filter according to any one of claims 1 to 9, which is OH / g. 11. The method according to claim 1, wherein at least one pigment selected from the group consisting of anthraquinone, phthalocyanine, azo, dioxazine, isoindoline, isoindolinone, quinacridone, perylene and carbon black is blended. The resist composition for a color filter according to the above. 12. The pigment is carbon black, and the pigment is carbon black.
Specific surface area is 110m ^Two / G or less and a pH of 2-9.
The color filter according to any one of claims 1 to 11,
Luster resist composition. 13. The color according to claim 1, wherein the resist composition for a color filter contains a binder resin, a monomer which is cured by the action of a photopolymerization initiator, and a photopolymerization initiator. A resist composition for a filter. 14. The color filter resist composition according to claim 13, wherein the binder resin is alkali-soluble. 15. The resist composition for a color filter according to claim 14, wherein the binder resin is a vinyl resin having a carboxyl group. 16. The resist composition for a color filter according to claim 15, wherein the binder resin contains styrene and (meth) acrylic acid as monomers. 17. The resist composition for a color filter according to claim 15, wherein the binder resin is a resin having a double bond in a side chain. 18. The resist composition for a color filter according to claim 15, wherein the binder resin is a resin having a (meth) acryloyl group in a side chain. 19. The resist composition for a color filter according to claim 18, wherein the (meth) acryloyl group of the resin side chain is introduced by an alicyclic epoxy compound having a (meth) acryloyl group. 20. The pigment concentration in the total solid content is 20 to 70 watts.
The resist composition for a color filter according to any one of claims 1 to 19, wherein the content is t%. 21. A monomer which is cured by the action of a photopolymerization initiator is an acrylic monomer having three or more functional groups.
21. The resist composition for a color filter according to any one of 3 to 20. 22. The photopolymerization initiator according to claim 13, wherein at least one compound selected from the group consisting of triazines, oxadiazoles, biimidazoles, and titanocenes is blended. 3. The resist composition for a color filter according to item 1. 23. The solid content concentration in the resist composition for a color filter is in the range of 10 to 35 wt%.
23. The resist composition for a color filter according to any one of the above items. 24. A color filter having a colored pixel and / or a black matrix formed on a transparent substrate by the composition according to claim 1. Description: 25. Carbon black, a dispersant and a solvent, wherein the dispersant is a polyisocyanate compound and has a number average molecular weight of 300 to 1 having at least one hydroxyl group in the same molecule.
A resist composition for forming a light-shielding film, which is a dispersion resin obtained by reacting a compound having a tertiary amino group with an active hydrogen in the same molecule as the compound having a molecular weight of 000.