JPH10208691A - Icp mass spectrograph - Google Patents

Icp mass spectrograph

Info

Publication number
JPH10208691A
JPH10208691A JP9019925A JP1992597A JPH10208691A JP H10208691 A JPH10208691 A JP H10208691A JP 9019925 A JP9019925 A JP 9019925A JP 1992597 A JP1992597 A JP 1992597A JP H10208691 A JPH10208691 A JP H10208691A
Authority
JP
Japan
Prior art keywords
plasma flame
plasma
sampling cone
output coil
capacitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9019925A
Other languages
Japanese (ja)
Inventor
Koji Okada
幸治 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP9019925A priority Critical patent/JPH10208691A/en
Publication of JPH10208691A publication Critical patent/JPH10208691A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To stabilize plasma flame by automatically compensating for the detuning between a power supply and an output coil for plasma excitation caused by a fluctuation in a load as seen from a high-frequency generator when a sampling cone as the sample inlet of a mass spectrograph M approaches the plasma flame in the mass spectrograph using inductively coupled plasma(ICP) as an ion source. SOLUTION: Capacitors constituting a matching circuit 2 for use in tuning between a high-frequency generator 1 and an output coil 3 are previously provided with capacity capable of tuning when a sampling cone 6 is kept away from plasma flame and capacity capable of tuning when the sample cone 6 is brought near the plasma flame. The capacity of each capacitor is adjusted to the corresponding value, respectively by a combination of the approach and withdrawal of the sampling cone.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は高周波誘導結合プラ
ズマ(ICP)をイオン源とする質量分析装置に関し、
特にその高周波電源と出力コイルとの間の整合を成立さ
せるマッチング回路に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mass spectrometer using high frequency inductively coupled plasma (ICP) as an ion source.
In particular, the present invention relates to a matching circuit for establishing matching between the high-frequency power supply and the output coil.

【0002】[0002]

【従来の技術】ICPを用いる分析装置ではプラズマの
点灯を容易確実にし、プラズマを安定して維持するた
め、高周波電源とプラズマを励起させる高周波出力コイ
ルとの間にマッチング回路が設けられている。出力コイ
ルはプラズマ点灯前は単なる空心コイルで2次側が開放
されたトランスとみなせるが、プラズマ点灯後は2次側
に負荷が接続されたトランスとなり、電源から見た出力
コイルはインダクタンスが減小する。このため通常マッ
チング回路に主副二つのコンデンサを用意しておいて電
源とマッチング回路との間で反射波を検出することでプ
ラズマの点灯を検知し、それによって副コンデンサを回
路に追加するようになっている。このコンデンサは半固
定で予めプラズマ点灯時に電源と出力コイルとの整合が
成立つように調整してある。
2. Description of the Related Art In an analyzer using an ICP, a matching circuit is provided between a high-frequency power supply and a high-frequency output coil for exciting the plasma in order to easily and reliably turn on the plasma and stably maintain the plasma. Before the plasma is turned on, the output coil can be regarded as a mere air-core coil and a transformer whose secondary side is open. However, after the plasma is turned on, the load is connected to the secondary side, and the output coil seen from the power source has a reduced inductance. . For this reason, usually two main and sub capacitors are prepared in the matching circuit, and the lighting of the plasma is detected by detecting the reflected wave between the power supply and the matching circuit, so that the sub capacitor is added to the circuit. Has become. This capacitor is semi-fixed and adjusted in advance so that the matching between the power supply and the output coil is established when the plasma is turned on.

【0003】[0003]

【発明が解決しようとする課題】上述したような従来の
ICP分析装置で、ICPをイオン源として質量分析を
行なうため、サンプリングコーンをプラズマ炎に近づけ
ると、これが出力コイルの2次側負荷として新たに加わ
り、電源から見るとプラズマ炎点灯状態におけるより更
に出力コイルのインダクタンスが減少するから、電源と
出力コイルとの整合を保つため、マッチング回路には更
に容量を追加する必要がある。従来はこの追加容量を得
るため、プラズマ点灯時にマッチング回路に入れる半固
定のコンデンサを手動で調整していた。サンプリングコ
ーンをプラズマ炎に近づけるのは手動的に行って比較的
時間がかゝるから、上記したコンデンサの手動調整その
ものに困難性はないが、質量分析終了後は次回のプラズ
マ点灯に備えてコンデンサの容量を元に戻しておく必要
があり、分析を行なう者の操作としては面倒なものであ
った。本発明はこの操作上の面倒さを解消しようとする
ものである。
In the conventional ICP analyzer as described above, since mass spectrometry is performed using the ICP as an ion source, when the sampling cone is brought close to a plasma flame, this becomes a new load on the secondary side of the output coil. In addition, when viewed from the power supply, the inductance of the output coil is further reduced as compared with the plasma flame lighting state. Therefore, it is necessary to further add capacitance to the matching circuit in order to maintain the matching between the power supply and the output coil. Conventionally, in order to obtain this additional capacity, a semi-fixed capacitor to be put in the matching circuit at the time of plasma lighting has been manually adjusted. Since it takes relatively long time to manually bring the sampling cone close to the plasma flame, there is no difficulty in the manual adjustment of the condenser itself, but after the mass analysis is completed, the condenser is prepared for the next plasma lighting. It was necessary to return the capacity of the sample to its original state, which was cumbersome for the person performing the analysis. The present invention seeks to eliminate this operational complexity.

【0004】[0004]

【課題を解決するための手段】高周波電源とプラズマ炎
を励起させる出力コイルとの整合をとるためのマッチン
グ回路を構成しているコンデンサの容量を、質量分析装
置の試料導入口であるサンプリングコーンをプラズマ炎
から遠ざけた状態において高周波電源と上記出力コイル
との間の整合が成立つ値と、サンプリングコーンをプラ
ズマ炎に近づけたとき整合が成立つ値との間で可変と
し、サンプリングコーンをプラズマ炎に接離させる動作
と連動させて上記コンデンサを上記二つの値の間で変え
るようにした。
The capacity of a capacitor constituting a matching circuit for matching a high frequency power supply and an output coil for exciting a plasma flame is changed by a sampling cone serving as a sample introduction port of a mass spectrometer. The distance between the high-frequency power supply and the output coil in a state away from the plasma flame is varied between a value at which the matching is established when the sampling cone is brought close to the plasma flame, and the sampling cone is varied. The capacitor is changed between the two values in conjunction with the operation of moving the capacitor in and out.

【0005】上記コンデンサの容量を二つの値の間で変
える手段は別のコンデンサをマッチング回路に加えるか
外すかで行ってもよく、一つのコンデンサの容量をトリ
マの二位置間の駆動で行ってもよく、サンプリングコー
ンの接離と連動させる手段はサンプリングコーンの前後
動と機械的に連動させてスィッチを切換え或いはトリマ
を駆動するとか、高周波電源とマッチング回路との間で
反射波を検出して反射波レベルが設定値を超えたとき、
上記コンデンサ容量を変える手段を動作させるようにし
てもよい。
[0005] The means for changing the capacity of the capacitor between the two values may be performed by adding or removing another capacitor to the matching circuit, or by changing the capacity of one capacitor by driving the trimmer between two positions. Also, the means for interlocking with the contact and separation of the sampling cone is to mechanically interlock with the back and forth movement of the sampling cone to switch the switch or drive the trimmer, or to detect the reflected wave between the high frequency power supply and the matching circuit When the reflected wave level exceeds the set value,
The means for changing the capacitance of the capacitor may be operated.

【0006】[0006]

【発明の実施の形態】図1に本発明の実施形態の一つを
示す。1が高周波発生器、2がマッチング回路で、3が
出力コイルである。不図示のプラズマトーチから試料を
含んだキャリヤガスが吹出して、出力コイル3が形成す
る高周波電磁界によってイオン化され、プラズマ炎Fを
形成している。プラズマ炎と対向しているMが質量分析
器で、4はその質量分析部、5が試料導入部である。試
料導入部は図で左から、プラズマ炎に向かって突出して
先端に小孔が開けてあるサンプリングコーン6と同じよ
うな形をしたスキマ−コーン7とイオンレンズ8よりな
り、サンプリングコーンとスキマーコーンとの間および
イオンレンズ部は夫々排気系につながれている。サンプ
リングコーン6は先端の小孔によりプラズマ炎からイオ
ンを含んだガスを吸込んでいる。吸込まれたガスはサン
プリングコーンとスキマーコーンとの間で減圧され、一
部がスキマーコーン先端の小孔を通過し、イオンレンズ
を経て質量分析部4に入射せしめられる。
FIG. 1 shows one embodiment of the present invention. 1 is a high frequency generator, 2 is a matching circuit, and 3 is an output coil. A carrier gas containing a sample is blown out from a plasma torch (not shown), and is ionized by a high-frequency electromagnetic field formed by the output coil 3 to form a plasma flame F. M, which is opposite to the plasma flame, is a mass analyzer, 4 is its mass analyzer, and 5 is a sample introduction unit. The sample introduction part consists of a skimmer cone 7 and an ion lens 8 having the same shape as the sampling cone 6 protruding toward the plasma flame and having a small hole formed at the tip from the left in the figure. And the ion lens portion are connected to an exhaust system. The sampling cone 6 sucks a gas containing ions from the plasma flame through a small hole at the tip. The sucked gas is depressurized between the sampling cone and the skimmer cone, and a part of the gas passes through a small hole at the tip of the skimmer cone, and is made to enter the mass spectrometry unit 4 through the ion lens.

【0007】マッチング回路2は出力コイル3と共に共
振回路を作るためのコンデンサC1,C2 よりなってい
る。C2 はスィッチSによってマッチング回路に挿入さ
れたり、マッチング回路から外されるようになってい
る。プラズマ点灯前スイッチSは開放になっている。こ
の状態でコンデンサC1 と出力コイル3とで高周波発生
器1の出力高周波に共振するようにC1 の容量が調整し
てある。プラズマ炎が点灯するとマッチング回路の同調
が崩れて、高周波発生器1とマッチング回路2との間に
挿入してある反射波検出器9により反射波が検出され
る。この反射波が或るレベルを超すと信号が出されてス
イッチSが閉じられ、マッチング回路にコンデンサC2
が付加される。C2 の容量はプラズマ炎が点灯している
状態でコンデンサC1 と共に入力高周波に同調する容量
と、サンプリングコーン6がプラズマ炎に近接されたと
き同調する容量の二値が容量調整範囲の両端となるよう
に予め調整されている。サンプリングコーン6をプラズ
マ炎に近づけると、質量分析部(或は出力コイル)と連
結されたラックとピニオン10によってコンデンサC2
の調節軸が駆動されて、コンデンサC2 の容量はサンプ
リングコーンがプラズマ炎に近づけられたとき高周波電
源と出力コイルとが整合する値に切換えられる。
The matching circuit 2 includes capacitors C 1 and C 2 for forming a resonance circuit together with the output coil 3. C 2 is inserted into or removed from the matching circuit by a switch S. The switch S before plasma lighting is open. Capacity of C 1 to resonate with the output frequency of the high frequency generator 1 in the capacitor C 1 and the output coil 3 in this state are adjusted. When the plasma flame is turned on, the tuning of the matching circuit is broken, and the reflected wave is detected by the reflected wave detector 9 inserted between the high frequency generator 1 and the matching circuit 2. When this reflected wave exceeds a certain level, a signal is output, the switch S is closed, and the capacitor C 2 is supplied to the matching circuit.
Is added. The capacitance of C 2 is tuned to the input high frequency together with the capacitor C 1 while the plasma flame is lit, and the capacitance tuned when the sampling cone 6 is brought close to the plasma flame is the two ends of the capacitance adjustment range. It is adjusted in advance so that When the sampling cone 6 is brought close to the plasma flame, a condenser C 2 is connected to the rack connected to the mass spectrometer (or the output coil) and the pinion 10.
Adjusting shaft is driven, the capacitance of the capacitor C 2 is switched to a value where the high-frequency power source and an output coil are aligned when the sampling cone is brought close to the plasma flame.

【0008】図2は本発明の他の実施形態のマッチング
回路を示す。この例は図1におけるコンデンサC2 をC
2 とC2 ′の二つに分けたものである。スイッチS,
S′はプラズマ点灯前は「開」になっており、プラズマ
炎点灯によってまずSが閉じられ、サンプリングコーン
をプラズマ炎に近づけたときスィッチS′が閉じられ
る。スイッチS′,S′の制御手段は任意で、Sは図1
の例と同じく反射波を検出して行い、S′は同じくサン
プリングコーンの動きをラックピニオンでスイッチS′
に伝えるようにしてもよいが、両スイッチとも反射波検
出信号によって制御される制御回路11によって行なう
ようにしてもよい。制御回路11は一回目の反射波検出
信号でSを閉じ、そのことを記憶しておいて、二回目の
反射波検出信号でS′を閉じるように動作する。
FIG. 2 shows a matching circuit according to another embodiment of the present invention. In this example, the capacitor C 2 in FIG.
2 and C 2 ′. Switch S,
S 'is "open" before the plasma is turned on, S is first closed by the plasma flame lighting, and the switch S' is closed when the sampling cone is brought close to the plasma flame. The control means of the switches S 'and S' is optional, and S
S 'is performed by detecting the reflected wave in the same manner as in the example of FIG.
, Or both may be performed by the control circuit 11 controlled by the reflected wave detection signal. The control circuit 11 closes S with the first reflected wave detection signal, stores the fact, and operates to close S 'with the second reflected wave detection signal.

【0009】サンプリングコーンをプラズマ炎に接離さ
せる動作とマッチング回路のコンデンサ容量を変化させ
る動作を連動させる手段としては上例の他、図3に示す
ようにプラズマトーチPを前後させる駆動機構12(高
周波電源や質量分析器Mを移動させるよりプラズマトー
チを移動させる方が構造的に容易)とコンデンサC2
容量調節つまみを駆動する機構13を制御装置14によ
って制御し、この制御装置に手動でプラズマトーチ近接
或いは後退の指示を入力してプラズマ炎をサンプリング
コーンに接離させるとき並行してコンデンサC2 の容量
調節つまみを駆動するようにしてもよい。
As means for linking the operation of bringing the sampling cone into and out of contact with the plasma flame and the operation of changing the capacitance of the capacitor of the matching circuit, in addition to the above-mentioned means, as shown in FIG. controls mechanism 13 for those who move the plasma torch from moving the high-frequency power source and the mass analyzer M drives the structurally easy) and volume adjustment knob of the capacitor C 2 by the controller 14, manually control device it may be driven a volume adjustment knob of the capacitor C 2 in parallel when to enter the instruction for the plasma torch proximate or backward and away the plasma flame to a sampling cone.

【0010】[0010]

【発明の効果】本発明によれば、ICPを質量分析装置
のイオン源に用いる場合に、サンプリングコーンをプラ
ズマ炎に対し接離するときに起こる高周波電源と出力コ
イルとの間の整合のずれを補正するためのマッチング回
路内のコンデンサ容量の変更が自動的に行われ、分析後
装置を元の状態に戻して次回使用の際のプラズマ炎点灯
に支障のないようにしておく操作も不要となり、分析を
行なう者にとって装置の操作が楽になり、操作忘れによ
って次回プラズマ炎点灯の際まごつくと云うような事態
が起こらない。
According to the present invention, when the ICP is used as the ion source of the mass spectrometer, the misalignment between the high frequency power supply and the output coil which occurs when the sampling cone is moved toward and away from the plasma flame. The capacitance of the capacitor in the matching circuit for correction is automatically changed, and it is not necessary to return the device to its original state after analysis so that it does not interfere with the plasma flame lighting at the next use. For the person performing the analysis, the operation of the apparatus becomes easy, and the situation that the plasma flame is turned on next time due to forgetting the operation does not occur.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施態様の一例のブロック図。FIG. 1 is a block diagram showing an example of an embodiment of the present invention.

【図2】本発明の別実施態様の要部回路図。FIG. 2 is a main part circuit diagram of another embodiment of the present invention.

【図3】本発明の更に別の実施態様の要部ブロック図。FIG. 3 is a main part block diagram of still another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 高周波電源 2 マッチング回路 3 出力コイル 4 質量分析部 5 試料導入部 6 サンプリングコーン 7 スキマーコーン 8 イオンレンズ 9 反射波検出器 10 ラックとピニオン 11 制御回路 F プラズマ炎 M 質量分析器 DESCRIPTION OF SYMBOLS 1 High frequency power supply 2 Matching circuit 3 Output coil 4 Mass analysis part 5 Sample introduction part 6 Sampling cone 7 Skimmer cone 8 Ion lens 9 Reflected wave detector 10 Rack and pinion 11 Control circuit F Plasma flame M Mass spectrometer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 高周波電源とプラズマ炎を励起させる出
力コイルとの整合をとるためのマッチング回路を構成し
ているコンデンサの容量を、質量分析装置の試料導入口
であるサンプリングコーンをプラズマ炎から遠ざけた状
態において高周波電源と上記出力コイルとの間の整合が
成立する値と、サンプリングコーンをプラズマ炎に近づ
けたとき整合が成立する値との間で可変とし、サンプリ
ングコーンをプラズマ炎に接離させる動作と連動させて
上記コンデンサを上記二値の間で変えるようにしたこと
を特徴とするICP質量分析装置。
1. The capacitance of a capacitor constituting a matching circuit for matching a high-frequency power supply with an output coil for exciting a plasma flame is set such that a sampling cone serving as a sample inlet of a mass spectrometer is kept away from the plasma flame. In a state where the matching between the high-frequency power supply and the output coil is established, and the value at which the matching is established when the sampling cone is brought close to the plasma flame, and the sampling cone is moved toward and away from the plasma flame. An ICP mass spectrometer wherein the capacitor is changed between the two values in conjunction with an operation.
JP9019925A 1997-01-18 1997-01-18 Icp mass spectrograph Pending JPH10208691A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9019925A JPH10208691A (en) 1997-01-18 1997-01-18 Icp mass spectrograph

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9019925A JPH10208691A (en) 1997-01-18 1997-01-18 Icp mass spectrograph

Publications (1)

Publication Number Publication Date
JPH10208691A true JPH10208691A (en) 1998-08-07

Family

ID=12012811

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9019925A Pending JPH10208691A (en) 1997-01-18 1997-01-18 Icp mass spectrograph

Country Status (1)

Country Link
JP (1) JPH10208691A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007205899A (en) * 2006-02-02 2007-08-16 Shimadzu Corp Icp analyzer
DE102007032176A1 (en) 2006-08-11 2008-08-21 Agilent Technologies, Inc. (n.d.Ges.d. Staates Delaware), Santa Clara Inductively coupled plasma mass spectrometer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007205899A (en) * 2006-02-02 2007-08-16 Shimadzu Corp Icp analyzer
DE102007032176A1 (en) 2006-08-11 2008-08-21 Agilent Technologies, Inc. (n.d.Ges.d. Staates Delaware), Santa Clara Inductively coupled plasma mass spectrometer
US7671329B2 (en) 2006-08-11 2010-03-02 Agilent Technologies, Inc. Inductively coupled plasma mass spectrometer
DE102007032176B4 (en) * 2006-08-11 2014-04-30 Agilent Technologies, Inc. (N.D.Ges.D. Staates Delaware) Inductively coupled plasma mass spectrometer

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