JPH056799A - Rf power supply device for icp - Google Patents

Rf power supply device for icp

Info

Publication number
JPH056799A
JPH056799A JP3156709A JP15670991A JPH056799A JP H056799 A JPH056799 A JP H056799A JP 3156709 A JP3156709 A JP 3156709A JP 15670991 A JP15670991 A JP 15670991A JP H056799 A JPH056799 A JP H056799A
Authority
JP
Japan
Prior art keywords
power
work coil
icp
coil
preamplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3156709A
Other languages
Japanese (ja)
Inventor
Shozo Ono
昌三 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yokogawa Electric Corp
Original Assignee
Yokogawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp filed Critical Yokogawa Electric Corp
Priority to JP3156709A priority Critical patent/JPH056799A/en
Publication of JPH056799A publication Critical patent/JPH056799A/en
Pending legal-status Critical Current

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  • Plasma Technology (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To simplify constitution by providing a work coil grounded in its center tap on the output side of a matching device to sum power in the work coil. CONSTITUTION:A RF signal transmitted from an oscillator 1 is amplified by a preamplifier, then divided into two by a power divider 3, and transmitted to first and second power amplifiers 4a, 4b with the phases being shifted by 180 deg.. The RF power amplified by the power amplifiers 4a, 4b is transmitted through transmission lines 5a, 5b, subjected to impedance conversion by a matching device 6, and then sent to a work coil 7. The work coil 7 is grounded in its center so that a power is summed in this coil 7 when a waveform of reversed phase is sent from both ends of the work coil 7. Thus, the power sum and impedance conversion in the course are not required, and the constitution is simplified.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、高周波誘導結合プラズ
マ(以下、「ICP」という)のRF電源装置に関し、
更に詳しくは、ICP分析装置に装着され簡単な構成で
電力合成できるICP用RF電源装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high frequency inductively coupled plasma (hereinafter referred to as "ICP") RF power supply device,
More specifically, the present invention relates to an ICP RF power supply device that can be attached to an ICP analysis device and combine power with a simple configuration.

【0002】[0002]

【従来の技術】四重極質量分析計を用いた高周波誘導結
合プラズマ分析装置は、一般に、プラズマト―チの外室
と最外室にガス調節器を介してアルゴンガス供給源から
アルゴンガスが供給され、内室には試料導入装置から試
料(分析対象)が搬入されるようになっている。また、
プラズマト―チに巻回された高周波誘導コイルには高周
波電源によって高周波電流が流され、該コイルの周囲に
高周波磁界が形成される。この状態で、上記高周波磁界
の近傍でアルゴンガス中に電子かイオンが植え付けられ
ると、該高周波磁界の作用によって瞬時に高周波誘導結
合プラズマが生ずる。
2. Description of the Related Art A high-frequency inductively coupled plasma analyzer using a quadrupole mass spectrometer generally supplies argon gas from an argon gas supply source to the outer chamber and outermost chamber of a plasma torch via a gas regulator. The sample (analysis target) is supplied to the inner chamber from the sample introduction device. Also,
A high-frequency current is applied to the high-frequency induction coil wound around the plasma torch by a high-frequency power source, and a high-frequency magnetic field is formed around the coil. In this state, when electrons or ions are implanted in the argon gas in the vicinity of the high frequency magnetic field, high frequency inductively coupled plasma is instantaneously generated by the action of the high frequency magnetic field.

【0003】更に、ノズルとスキマ―に挟まれたフォア
チャンバ―本体内は、真空ポンプによって吸引されてい
る。また、センタ―チャンバ―内には、引出し電極,ア
パ―チャ―レンズ,四重極レンズ,アパ―チャ―,及び
エントランスレンズが設けられると共に、該センタ―チ
ャンバ―の内部は第1油拡散ポンプによってに吸引さ
れ、四重極マスフィルタを収容しているリアチャンバ―
内は第2油拡散ポンプによって吸引されている。
Further, the inside of the fore chamber main body sandwiched between the nozzle and the skimmer is sucked by a vacuum pump. Further, the center chamber is provided with an extraction electrode, an aperture lens, a quadrupole lens, an aperture, and an entrance lens, and the inside of the center chamber is a first oil diffusion pump. Rear chamber, which is aspirated by and contains a quadrupole mass filter
The inside is sucked by the second oil diffusion pump.

【0004】この状態で、高周波誘導結合プラズマ中に
上述のようにして気化された試料が導入され、イオン化
や発光が行われる。該プラズマ内のイオンは、ノズルや
スキマ―を経由してのち引出し電極の間とイオンレンズ
系の間を通って収束され、四重極マスフィルタに導入さ
れる。
In this state, the sample vaporized as described above is introduced into the high frequency inductively coupled plasma, and ionization and light emission are performed. Ions in the plasma are converged through the extraction electrode and the ion lens system after passing through a nozzle and a skimmer, and are introduced into the quadrupole mass filter.

【0005】このようにして四重極マスフィルタに入っ
たイオンのうち目的の質量電荷比のイオンだけが、四重
極マスフィルタを通過し二次電子増倍管に導かれて検出
される。この検出信号が信号処理部に送出されて演算・
処理されることによって、前記試料中の被測定元素分析
値が求められるようになっている。また、ICP電源は
27.12MHz若しくは40.68MHzで1.6〜
2.0kWを出力するのが一般的である。
Of the ions thus entered into the quadrupole mass filter, only the ions having the desired mass-to-charge ratio pass through the quadrupole mass filter and are guided to the secondary electron multiplier to be detected. This detection signal is sent to the signal processing unit for calculation /
By processing, the elemental analysis value of the measured element in the sample can be obtained. Also, the ICP power source is 27.12 MHz or 40.68 MHz and 1.6 to
It is common to output 2.0 kW.

【0006】[0006]

【発明が解決しようとする問題点】然しながら、上記従
来例においては、真空管の場合この出力が一本の真空管
で得られるものの、半導体アンプの場合には単一モジュ
―ルで上記出力を得ることが困難となっていた。このた
め、複数のモジュ―ルの出力を合成して上記出力を得て
おり、電力の分割や合成が必要となって構成が複雑とな
る欠点があった。
However, in the above-mentioned conventional example, in the case of the vacuum tube, this output can be obtained by one vacuum tube, but in the case of the semiconductor amplifier, the above output can be obtained by a single module. Was difficult. Therefore, the outputs of a plurality of modules are combined to obtain the above output, and there is a drawback that the division and combination of power are required and the configuration becomes complicated.

【0007】本発明は、かかる状況に鑑みてなされもの
であり、その課題は、簡単な回路構成であると共に合成
部のコアに起因する発熱の制限がなく信頼性の高いIC
P用RF電源装置を提供することにある。
The present invention has been made in view of the above situation, and its problem is a highly reliable IC having a simple circuit structure and no limitation of heat generation due to the core of the synthesis section.
An object is to provide an RF power supply device for P.

【0008】[0008]

【問題点を解決するための手段】本発明は、ICP用R
F電源装置において、発振器と、該発振器からのRF信
号を増幅するプリアンプと、該プリアンプの出力を受け
て二分割し且つ位相を180゜ずらして出力する電力分
割器と、第1及び第2のパワ―アンプと、伝送線路を介
して送出された電力のインピ―ダンス変換を行う整合器
と、センタタップが接地されたワ―クコイルとを設け、
該ワ―クコイルで電力合成することによって前記課題を
解決したものである。
The present invention is an R for ICP.
In the F power supply device, an oscillator, a preamplifier that amplifies an RF signal from the oscillator, a power divider that receives the output of the preamplifier, divides the output into two, and outputs the output with a phase shift of 180 °, and first and second A power amplifier, a matching device that performs impedance conversion of the electric power transmitted through the transmission line, and a work coil whose center tap is grounded are provided.
The above problem is solved by combining electric power with the work coil.

【0009】[0009]

【作用】本発明は次のように作用する。即ち、発振器か
ら送出されたRF信号は、プリアンプで増幅されて後、
電力分割器で二分割され、位相が180゜ずらされて第
1,第2パワ―アンプに送出される。これらパワ―アン
プで振幅が増加されたRF電力は、伝送線路を介して整
合器に送られ、該整合器でインピ―ダンス変換されてワ
―クコイルに送られる。このワ―クコイルは、センタ―
が接地されており、ワ―クコイルの両端から逆位相の波
形がくると該コイルで電力が合成される。
The present invention operates as follows. That is, the RF signal sent from the oscillator is amplified by the preamplifier,
It is divided into two by the power divider, and the phase is shifted by 180 ° and sent to the first and second power amplifiers. The RF power whose amplitude has been increased by these power amplifiers is sent to a matching device via a transmission line, impedance-converted by the matching device, and sent to a work coil. This work coil is the center
Is grounded, and when waveforms of opposite phases come from both ends of the work coil, power is combined in the coil.

【0010】[0010]

【実施例】以下、本発明について図を用いて詳細に説明
する。図1は本発明実施例のブロック回路図であり、図
中、1はRF(高周波)源を発振・発生させる例えば水
晶でなる発振器、2は後述のパワ―アンプを駆動するに
十分なパワ―まで発信出力を増幅するプリアンプ、3は
プリアンプ2の出力を受けて二分割し且つ位相を180
゜ずらして出力する電力分割器、4a,4bはICPを
発生させるに十分な電力まで増幅するパワ―アンプ、6
は伝送線路5a,5bを介して送出された電力を後述の
ワ―クコイルに伝達するためのインピ―ダンス変換を行
う整合器、61,62は並列コンデンサ、63,64は
直列コンデンサ、7はセンタタップが接地されたワ―ク
コイルである。
The present invention will be described in detail below with reference to the drawings. FIG. 1 is a block circuit diagram of an embodiment of the present invention, in which 1 is an oscillator for oscillating and generating an RF (high frequency) source, for example an oscillator made of crystal, and 2 is a power sufficient to drive a power amplifier described later. The preamplifier 3 that amplifies the transmission output up to and receives the output of the preamplifier 2 and divides it into two and sets the phase to 180
The power dividers 4a and 4b, which are shifted and output, are power amplifiers for amplifying power enough to generate ICP, 6
Is a matching unit that performs impedance conversion for transmitting the electric power transmitted through the transmission lines 5a and 5b to a work coil described later, 61 and 62 are parallel capacitors, 63 and 64 are series capacitors, and 7 is a center. It is a work coil whose tap is grounded.

【0011】このようなブロック回路からなる本発明の
実施例において、発振器1から送出された例えば27.
12MHz若しくは40.68MHzのRF信号は、プ
リアンプ2で増幅されて後、電力分割器3で二分割さ
れ、位相が180゜ずらされてそれぞれ第1,第2パワ
―アンプ4a,4bに送出される。
In the embodiment of the present invention comprising such a block circuit, for example, 27.
The RF signal of 12 MHz or 40.68 MHz is amplified by the preamplifier 2, then divided into two by the power divider 3, the phases are shifted by 180 °, and the signals are sent to the first and second power amplifiers 4a and 4b, respectively. .

【0012】また、パワ―アンプ4a,4bで振幅が増
加されたRF電力は、伝送線路5a,5bを介して整合
器6に送られ、該整合器6でインピ―ダンス変換されて
ワ―クコイル7に送られる。このワ―クコイル7は、セ
ンタ―が接地されており、ワ―クコイル7の両端から逆
位相の波形がくると該コイルで電力が合成されるように
なっている。尚、本発明は上述の実施例に限定されるこ
となく種々の変形が可能である。
The RF power whose amplitude has been increased by the power amplifiers 4a and 4b is sent to the matching unit 6 via the transmission lines 5a and 5b, and is impedance-converted by the matching unit 6 to be converted into a work coil. Sent to 7. The center of the work coil 7 is grounded, and when waveforms of opposite phases come from both ends of the work coil 7, electric power is combined by the coil. The present invention is not limited to the above-mentioned embodiment, and various modifications can be made.

【0013】[0013]

【発明の効果】以上詳しく説明したような本発明によれ
ば、ICP用RF電源装置において、発振器と、発振器
からのRF信号を増幅するプリアンプと、プリアンプの
出力を受けて二分割し且つ位相を180゜ずらして出力
する電力分割器と、第1及び第2のパワ―アンプと、伝
送線路を介して送出された電力のインピ―ダンス変換を
行う整合器と、センタタップが接地されたワ―クコイル
とを設け、ワ―クコイルで電力合成する構成になってい
る。
According to the present invention as described in detail above, in the RF power supply device for ICP, the oscillator, the preamplifier for amplifying the RF signal from the oscillator, the output of the preamplifier, and the division into two phases are provided. A power divider that shifts the output by 180 °, first and second power amplifiers, a matching device that performs impedance conversion of the power sent through the transmission line, and a center-tapped power supply. The coil coil is provided, and power is combined by the work coil.

【0014】このようにワ―クコイルで電力を合成する
ため、途中で合成やインピ―ダンス変換が不要となり前
記従来例に比して構成が簡単になるという利点がある。
また、前記従来例においては、電力合成やインピ―ダン
ス変換に磁性材料の使用が不可欠で2kWにもなると発
熱も大きくなり信頼性が問題となっていたが、本発明に
よれば、かかる磁性材料の使用も不要となるため、信頼
性が向上するという利点もある。従って、本発明によれ
ば、簡単な回路構成であると共に合成部のコアに起因す
る発熱の制限がなく信頼性の高いICP用RF電源装置
が実現する。
Since the electric power is combined by the work coil in this way, there is an advantage that the composition and the impedance conversion are not required on the way and the structure is simpler than the conventional example.
Further, in the above-mentioned conventional example, use of a magnetic material is indispensable for power synthesis and impedance conversion, and heat generation becomes large at 2 kW and reliability becomes a problem. However, according to the present invention, such a magnetic material is used. Since there is no need to use, there is also an advantage that reliability is improved. Therefore, according to the present invention, it is possible to realize a highly reliable ICP RF power supply device which has a simple circuit configuration and is free from the limitation of heat generation due to the core of the combining unit.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明実施例の要部ブロック回路図である。FIG. 1 is a block circuit diagram of an essential part of an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 発振器 2 プリアンプ 3 電力分割器 4a,4b パワ―アンプ 5a,5b 伝送線路 6 整合器 61,62 並列コンデンサ 63,64 直列コンデンサ 7 ワ―クコイル 1 Oscillator 2 Preamplifier 3 Power divider 4a, 4b Power amplifier 5a, 5b Transmission line 6 Matching device 61,62 Parallel capacitor 63,64 Series capacitor 7 Work coil

Claims (1)

【特許請求の範囲】 【請求項1】ICP用RF電源装置において、発振器
と、該発振器からのRF信号を増幅するプリアンプと、
該プリアンプの出力を受けて二分割し且つ位相を180
゜ずらして出力する電力分割器と、第1及び第2のパワ
―アンプと、伝送線路を介して送出された電力のインピ
―ダンス変換を行う整合器と、センタタップが接地され
たワ―クコイルとを設け、該ワ―クコイルで電力合成す
ることを特徴とするICP用RF電源装置。
Claim: What is claimed is: 1. An ICP RF power supply device comprising: an oscillator; and a preamplifier for amplifying an RF signal from the oscillator.
It receives the output of the preamplifier and divides it into two and sets the phase to 180
A power divider that shifts the output, a first and a second power amplifier, a matching device that performs impedance conversion of the power sent through the transmission line, and a work coil whose center tap is grounded. And an RF power supply device for ICP, characterized in that electric power is combined by the work coil.
JP3156709A 1991-06-27 1991-06-27 Rf power supply device for icp Pending JPH056799A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3156709A JPH056799A (en) 1991-06-27 1991-06-27 Rf power supply device for icp

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3156709A JPH056799A (en) 1991-06-27 1991-06-27 Rf power supply device for icp

Publications (1)

Publication Number Publication Date
JPH056799A true JPH056799A (en) 1993-01-14

Family

ID=15633624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3156709A Pending JPH056799A (en) 1991-06-27 1991-06-27 Rf power supply device for icp

Country Status (1)

Country Link
JP (1) JPH056799A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002508883A (en) * 1997-07-05 2002-03-19 サーフィス テクノロジー システムズ ピーエルシー Plasma processing equipment
WO2003055286A1 (en) * 2001-12-10 2003-07-03 Tokyo Electron Limited High-frequency power source and its control method, and plasma processor
JP2006253150A (en) * 2005-03-10 2006-09-21 Huettinger Elektronik Gmbh & Co Kg Vacuum plasma generator
JP2013527642A (en) * 2010-03-11 2013-06-27 ヒュッティンガー エレクトローニク ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト Plasma supply device with orthogonal coupler
CN104157541A (en) * 2013-05-14 2014-11-19 东京毅力科创株式会社 Plasma treatment apparatus

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002508883A (en) * 1997-07-05 2002-03-19 サーフィス テクノロジー システムズ ピーエルシー Plasma processing equipment
JP4646272B2 (en) * 1997-07-05 2011-03-09 サーフィス テクノロジー システムズ ピーエルシー Plasma processing equipment
WO2003055286A1 (en) * 2001-12-10 2003-07-03 Tokyo Electron Limited High-frequency power source and its control method, and plasma processor
CN1305353C (en) * 2001-12-10 2007-03-14 东京毅力科创株式会社 High-frequency power source and its control method, and plasma processor
US8286581B2 (en) 2001-12-10 2012-10-16 Tokyo Electron Limited High frequency power source and its control method, and plasma processing apparatus
US8133347B2 (en) 2005-03-05 2012-03-13 Huettinger Elektronik Gmbh + Co. Kg Vacuum plasma generator
JP2006253150A (en) * 2005-03-10 2006-09-21 Huettinger Elektronik Gmbh & Co Kg Vacuum plasma generator
JP2013527642A (en) * 2010-03-11 2013-06-27 ヒュッティンガー エレクトローニク ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト Plasma supply device with orthogonal coupler
CN104157541A (en) * 2013-05-14 2014-11-19 东京毅力科创株式会社 Plasma treatment apparatus

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