JPH056798A - Rf power supply device for icp - Google Patents
Rf power supply device for icpInfo
- Publication number
- JPH056798A JPH056798A JP3156706A JP15670691A JPH056798A JP H056798 A JPH056798 A JP H056798A JP 3156706 A JP3156706 A JP 3156706A JP 15670691 A JP15670691 A JP 15670691A JP H056798 A JPH056798 A JP H056798A
- Authority
- JP
- Japan
- Prior art keywords
- power
- matching
- matching device
- impedance
- icp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Plasma Technology (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、高周波誘導結合プラズ
マ(以下、「ICP」という)のRF電源装置に関し、
更に詳しくは、ICP分析装置に装着され電力合成後の
インピ―ダンス変換が不要なうえ整合器のコンデンサ耐
電圧を低くできる小型のICP用RF電源装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high frequency inductively coupled plasma (hereinafter referred to as "ICP") RF power supply device,
More specifically, the present invention relates to a small-sized RF power supply device for ICP which is mounted on an ICP analysis device and does not require impedance conversion after power combination and can lower the withstand voltage of a capacitor of a matching device.
【0002】[0002]
【従来の技術】四重極質量分析計を用いた高周波誘導結
合プラズマ分析装置は、一般に、プラズマト―チの外室
と最外室にガス調節器を介してアルゴンガス供給源から
アルゴンガスが供給され、内室には試料導入装置から試
料(分析対象)が搬入されるようになっている。また、
プラズマト―チに巻回された高周波誘導コイルには高周
波電源によって高周波電流が流され、該コイルの周囲に
高周波磁界が形成される。この状態で、上記高周波磁界
の近傍でアルゴンガス中に電子かイオンが植え付けられ
ると、該高周波磁界の作用によって瞬時に高周波誘導結
合プラズマが生ずる。2. Description of the Related Art A high-frequency inductively coupled plasma analyzer using a quadrupole mass spectrometer generally supplies argon gas from an argon gas supply source to the outer chamber and outermost chamber of a plasma torch via a gas regulator. The sample (analysis target) is supplied to the inner chamber from the sample introduction device. Also,
A high-frequency current is applied to the high-frequency induction coil wound around the plasma torch by a high-frequency power source, and a high-frequency magnetic field is formed around the coil. In this state, when electrons or ions are implanted in the argon gas in the vicinity of the high frequency magnetic field, high frequency inductively coupled plasma is instantaneously generated by the action of the high frequency magnetic field.
【0003】更に、ノズルとスキマ―に挟まれたフォア
チャンバ―本体内は、真空ポンプによって吸引されてい
る。また、センタ―チャンバ―内には、引出し電極,ア
パ―チャ―レンズ,四重極レンズ,アパ―チャ―,及び
エントランスレンズが設けられると共に、該センタ―チ
ャンバ―の内部は第1油拡散ポンプによってに吸引さ
れ、四重極マスフィルタを収容しているリアチャンバ―
内は第2油拡散ポンプによって吸引されている。Further, the inside of the fore chamber main body sandwiched between the nozzle and the skimmer is sucked by a vacuum pump. Further, the center chamber is provided with an extraction electrode, an aperture lens, a quadrupole lens, an aperture, and an entrance lens, and the inside of the center chamber is a first oil diffusion pump. Rear chamber, which is aspirated by and contains a quadrupole mass filter
The inside is sucked by the second oil diffusion pump.
【0004】この状態で、高周波誘導結合プラズマ中に
上述のようにして気化された試料が導入され、イオン化
や発光が行われる。該プラズマ内のイオンは、ノズルや
スキマ―を経由してのち引出し電極の間とイオンレンズ
系の間を通って収束され、四重極マスフィルタに導入さ
れる。In this state, the sample vaporized as described above is introduced into the high frequency inductively coupled plasma, and ionization and light emission are performed. Ions in the plasma are converged through the extraction electrode and the ion lens system after passing through a nozzle and a skimmer, and are introduced into the quadrupole mass filter.
【0005】このようにして四重極マスフィルタに入っ
たイオンのうち目的の質量電荷比のイオンだけが、四重
極マスフィルタを通過し二次電子増倍管に導かれて検出
される。この検出信号が信号処理部に送出されて演算・
処理されることによって、前記試料中の被測定元素分析
値が求められるようになっている。また、ICP電源は
27.12MHz若しくは40.68MHzで1.6〜
2.0kWを出力するのが一般的である。Of the ions thus entered into the quadrupole mass filter, only the ions having the desired mass-to-charge ratio pass through the quadrupole mass filter and are guided to the secondary electron multiplier to be detected. This detection signal is sent to the signal processing unit for calculation /
By processing, the elemental analysis value of the measured element in the sample can be obtained. Also, the ICP power source is 27.12 MHz or 40.68 MHz and 1.6 to
It is common to output 2.0 kW.
【0006】[0006]
【発明が解決しようとする問題点】然しながら、上記従
来例においては、真空管の場合この出力が一本の真空管
で得られるものの、半導体アンプの場合には単一モジュ
―ルで上記出力を得ることが困難となっていた。このた
め、複数のモジュ―ルの出力を合成して上記出力を得て
おり、電力の分割や合成が必要となって構成などが複雑
となる欠点があった。また、整合器の大きさは、真空管
や半導体の如何に拘らず同じ電力なら同じ容量(大き
さ)が必要で、その結果、RF電源装置の小型化が難し
いという欠点があった。However, in the above-mentioned conventional example, in the case of the vacuum tube, this output can be obtained by one vacuum tube, but in the case of the semiconductor amplifier, the above output can be obtained by a single module. Was difficult. Therefore, the outputs of a plurality of modules are combined to obtain the above-mentioned output, and there is a drawback that the division and combination of electric power are required and the configuration is complicated. In addition, the size of the matching unit needs to have the same capacity (size) for the same power regardless of whether it is a vacuum tube or a semiconductor, and as a result, it is difficult to downsize the RF power supply device.
【0007】本発明は、かかる状況に鑑みてなされもの
であり、その課題は、電力合成後のインピ―ダンス変換
が不要なうえ整合器のコンデンサ耐電圧が低い小型のI
CP用RF電源装置を提供することにある。The present invention has been made in view of such a situation, and its problem is a small-sized I which does not require impedance conversion after power combination and has a low withstand voltage of a matching device capacitor.
An object is to provide an RF power supply device for CP.
【0008】[0008]
【問題点を解決するための手段】本発明は、ICP用R
F電源装置において、第1パワ―アンプから第1伝送線
路を介して送出された電力及び第2パワ―アンプから第
2伝送線路を介して送出された電力が送出される電力合
成部と、並列コンデンサと直列コンデンサを有する整合
部とを直結させ、それらを整合器の内部に設けることに
よって前記課題を解決したものである。The present invention is an R for ICP.
In the F power supply device, a power synthesizing unit for transmitting the electric power sent from the first power amplifier via the first transmission line and the electric power sent from the second power amplifier via the second transmission line, in parallel The above problem is solved by directly connecting a capacitor and a matching section having a series capacitor and providing them inside a matching unit.
【0009】[0009]
【作用】本発明は次のように作用する。即ち、発振器か
ら送出されたRF信号は、プリアンプで増幅されて後、
電力分割器で分割され、それぞれ第1,第2パワ―アン
プに送出される。各パワ―アンプで増幅されたRF電力
は、電力合成器に入るため、その出力インピ―ダンスは
小さくなる。従って、並列コンデンサの耐圧も小さくな
って小型化できるようになる。また、電力合成部と整合
部を直結して整合器内に収容しているため、電力合成部
と整合部の間に伝送経路を経由する必要がなく、電力合
成部の出力インピ―ダンスを変換する回路も不要とな
る。The present invention operates as follows. That is, the RF signal sent from the oscillator is amplified by the preamplifier,
It is divided by the power divider and sent to the first and second power amplifiers, respectively. Since the RF power amplified by each power amplifier enters the power combiner, its output impedance becomes small. Therefore, the withstand voltage of the parallel capacitor is also reduced and the size can be reduced. In addition, since the power combiner and the matching unit are directly connected and housed in the matching unit, there is no need to pass a transmission path between the power combiner and the matching unit, and the output impedance of the power combiner is converted. The circuit to operate is also unnecessary.
【0010】[0010]
【実施例】以下、本発明について図を用いて詳細に説明
する。図1は本発明実施例のブロック回路図であり、図
中、1はRF(高周波)源を発振・発生させる発振器、
2は前段増幅器、3は電力分割器、4a,4bはパワ―
アンプ、5a,5bは伝送線路、6は整合器、61は電
力合成部、62は整合部、621は直列コンデンサ、6
22は並列コンデンサ、7はワ―クコイルである。The present invention will be described in detail below with reference to the drawings. FIG. 1 is a block circuit diagram of an embodiment of the present invention, in which 1 is an oscillator for oscillating and generating an RF (high frequency) source,
2 is a pre-stage amplifier, 3 is a power divider, 4a and 4b are power
Amplifiers 5a and 5b are transmission lines, 6 is a matching unit, 61 is a power combining unit, 62 is a matching unit, 621 is a series capacitor, 6
22 is a parallel capacitor, and 7 is a work coil.
【0011】このようなブロック回路からなる本発明の
実施例において、発振器1から送出されたRF信号は、
プリアンプ2で増幅されて後、電力分割器3で分割さ
れ、それぞれ第1,第2パワ―アンプ4a,4bに送出
される。In the embodiment of the present invention having such a block circuit, the RF signal transmitted from the oscillator 1 is
After being amplified by the preamplifier 2, it is divided by the power divider 3 and sent to the first and second power amplifiers 4a and 4b, respectively.
【0012】また、パワ―アンプ4a,4bで増幅され
たRF電力は、例えばインピ―ダンス50Ωの整合器6
に入る。このため、合成器6の出力インピ―ダンスは例
えば25Ωとなり、出力電圧は通過電圧が同じ場合、W
=V2 /Rの式に従って1/(ル―ト2)となる。従っ
て、並列コンデンサ622の耐圧は、インピ―ダンス5
0Ωの整合器の場合の1/(ル―ト2)となり、小型化
できるようになる。The RF power amplified by the power amplifiers 4a and 4b is, for example, a matching device 6 having an impedance of 50Ω.
to go into. Therefore, the output impedance of the combiner 6 is, for example, 25Ω, and the output voltage is W when the passing voltage is the same.
= V 2 / R wherein, according to an / the (Le - DOO 2) become. Therefore, the withstand voltage of the parallel capacitor 622 is the impedance 5
It becomes 1 / (route 2) of the case of a 0 Ω matching box, and the size can be reduced.
【0013】また、電力合成部61と整合部62を直結
して整合器6内に収容しているため、電力合成部61と
整合部62の間に伝送経路を経由する必要がない。従っ
て、電力合成部61の出力インピ―ダンスを25Ωから
50Ωに変換する回路も不要となる。尚、本発明は上述
の実施例に限定されることなく種々の変形が可能であ
る。Further, since the power combiner 61 and the matching unit 62 are directly connected and housed in the matching unit 6, there is no need to pass a transmission path between the power combiner 61 and the matching unit 62. Therefore, a circuit for converting the output impedance of the power combiner 61 from 25Ω to 50Ω is also unnecessary. The present invention is not limited to the above-mentioned embodiment, and various modifications can be made.
【0014】[0014]
【発明の効果】以上詳しく説明したような本発明によれ
ば、ICP用RF電源装置において、第1パワ―アンプ
から第1伝送線路を介して送出された電力及び第2パワ
―アンプから第2伝送線路を介して送出された電力が送
出される電力合成部と、並列コンデンサと直列コンデン
サを有する整合部とを直結させて整合器の内部に設けた
構成になっている。According to the present invention as described in detail above, in the RF power supply device for ICP, the electric power sent from the first power amplifier through the first transmission line and the second power amplifier from the second power amplifier are transmitted. The power combiner, to which the power sent through the transmission line is sent, and the matching part having a parallel capacitor and a series capacitor are directly connected to each other and are provided inside the matching device.
【0015】このように、電力合成部と整合部を直結し
て整合器内に収容しているため、電力合成部の出力イン
ピ―ダンスを変換する回路も不要となる。また、整合器
の耐電圧が減少する。従って、本発明によれば、電力合
成後のインピ―ダンス変換が不要なうえ整合器のコンデ
ンサ耐電圧を低くできる小型のICP用RF電源装置が
実現する。As described above, since the power combiner and the matching part are directly connected and housed in the matching box, a circuit for converting the output impedance of the power combiner is not required. Also, the withstand voltage of the matching device is reduced. Therefore, according to the present invention, it is possible to realize a small-sized ICP RF power supply device that does not require impedance conversion after power combination and can reduce the capacitor withstand voltage of the matching unit.
【図1】本発明実施例の要部ブロック回路図である。FIG. 1 is a block circuit diagram of an essential part of an embodiment of the present invention.
1 発振器 2 前段増幅器 3 電力分割器 4a,4b パワ―アンプ 5a,5b 伝送線路 6 整合器 61 電力合成部 62 整合部 7 ワ―クコイル 1 Oscillator 2 Pre-amplifier 3 Power divider 4a, 4b Power amplifier 5a, 5b Transmission line 6 Matching device 61 Power combiner 62 Matching part 7 Work coil
Claims (1)
―アンプから第1伝送線路を介して送出された電力及び
第2パワ―アンプから第2伝送線路を介して送出された
電力が送出される電力合成部と、並列コンデンサと直列
コンデンサを有する整合部とを直結させて整合器の内部
に設けたことを特徴とするICP用RF電源装置。Claim: What is claimed is: 1. In an ICP RF power supply device, the power sent from a first power amplifier via a first transmission line and the power sent from a second power amplifier via a second transmission line. An RF power supply device for ICP, characterized in that a power combining unit for transmitting the generated power and a matching unit having a parallel capacitor and a series capacitor are directly connected to each other and provided inside the matching unit.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3156706A JPH056798A (en) | 1991-06-27 | 1991-06-27 | Rf power supply device for icp |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3156706A JPH056798A (en) | 1991-06-27 | 1991-06-27 | Rf power supply device for icp |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH056798A true JPH056798A (en) | 1993-01-14 |
Family
ID=15633560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3156706A Pending JPH056798A (en) | 1991-06-27 | 1991-06-27 | Rf power supply device for icp |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH056798A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015144505A (en) * | 2014-01-31 | 2015-08-06 | 株式会社ダイヘン | High frequency power supply source |
JP2018049768A (en) * | 2016-09-23 | 2018-03-29 | 株式会社ダイヘン | Plasma generation device and rf power source |
-
1991
- 1991-06-27 JP JP3156706A patent/JPH056798A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015144505A (en) * | 2014-01-31 | 2015-08-06 | 株式会社ダイヘン | High frequency power supply source |
JP2018049768A (en) * | 2016-09-23 | 2018-03-29 | 株式会社ダイヘン | Plasma generation device and rf power source |
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