JPH10204527A - Continuous annealing method and continuous annealing equipment - Google Patents
Continuous annealing method and continuous annealing equipmentInfo
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- JPH10204527A JPH10204527A JP2451197A JP2451197A JPH10204527A JP H10204527 A JPH10204527 A JP H10204527A JP 2451197 A JP2451197 A JP 2451197A JP 2451197 A JP2451197 A JP 2451197A JP H10204527 A JPH10204527 A JP H10204527A
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明はＨ2 を使用する連続
焼鈍方法及び連続焼鈍設備、特に、Ｈ2 濃度が高い方向
性珪素鋼板の脱炭焼鈍、ステンレスの光輝焼鈍に用いる
連続焼鈍方法及び連続焼鈍設備に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous annealing method and a continuous annealing apparatus using H 2 , and more particularly to a continuous annealing method and a continuous annealing method for decarburizing annealing of a grain-oriented silicon steel sheet having a high H 2 concentration and bright annealing of stainless steel. It relates to annealing equipment.
【０００２】[0002]
【従来の技術】最近、Ｈ2 を使用する焼鈍炉では、雰囲
気ガス回収装置を設置し、雰囲気回収が試みられてい
る。例えば、特開平４−３０４３０９号公報、特開平４
−３０４３１７号公報に、炉からの雰囲気ガス回収、精
整、再吹き込みの例が見られる。しかるに、これらの例
では、雰囲気ガス導入の時の具体的記述がなされていな
い。なお、雰囲気ガス精製方法としては、ＰＳＡ法（Ｐ
ｒｅｓｓｕｒｅ Ｓｗｉｎｇ Ａｄｓｏｒｐｔｉｏ
ｎ）、或いは、ポリミド等の分離膜を使用した膜分離法
等が一般的であり、いずれも、Ｈ2 の回収率としては６
０〜７０％が期待される。 2. Description of the Related Art Recently, in an annealing furnace using H 2 , an atmosphere gas recovery device has been installed to attempt to recover the atmosphere. For example, JP-A-4-304309, JP-A-4-304309
JP-A-304317 discloses an example of recovery of atmospheric gas from a furnace, refinement, and re-blowing. However, in these examples, no specific description at the time of introducing the atmospheric gas is given. In addition, PSA method (P
resource Swing Adsorption
n), or membrane separation method using a separation membrane such as a polyimide is general, both as recovery of H 2 6
0-70% is expected.
【０００３】図２に従来の焼鈍設備の一例を示す。これ
は方向性珪素鋼板の脱炭焼鈍炉である。Ｈ2 源ガスとし
ては、ＮＨ3 分解ガスが使用されている。また、製品処
理時に炉２内へ供給される雰囲気ガスの組成は、加湿さ
れたＮＨ3 分解ガス組成（Ｈ2 ７５％、Ｎ2 ２５％：ド
ライベース）である。FIG. 2 shows an example of a conventional annealing facility. This is a decarburizing annealing furnace for grain-oriented silicon steel sheets. As the H 2 source gas, an NH 3 decomposition gas is used. The composition of the atmosphere gas supplied into the furnace 2 during product processing is a humidified NH 3 decomposition gas composition (H 2 75%, N 2 25%: dry base).
【０００４】炉２内に雰囲気ガスを導入するときには、
回収雰囲気ガス循環配管バルブ４２及び回収雰囲気ガス
供給管バルブ１８は閉じられており、先ず、Ｈ2 源ガス
供給管バルブ３４、放散管バルブ６２が徐々に開かれ、
Ｈ2 源ガス供給管３３よりＨ2 源ガスが供給され、炉２
の後方の雰囲気ガス供給管２０を経て炉２内に入り、大
部分は炉２の前部に至り雰囲気ガス排出管１１から炉外
に排出され、最後に放散管６１から放散・燃焼される。
Ｈ2 源ガス供給管バルブ３４、放散管バルブ６２を更に
開き、製品処理時の雰囲気ガスに加え雰囲気ガス精製装
置１５での精製開始時の消費量を加えた量に相当する量
に達した後、炉２内の雰囲気ガス組成がＨ2 源ガスの組
成と同じとなったことを確認し、回収雰囲気ガス循環配
管バルブ４２及び回収雰囲気ガス供給管バルブ１８を徐
々に開くとともに、放散管バルブ６２及びＨ2 源ガス供
給管バルブ３４を徐々に閉じ、放散管バルブ６２は最終
的には閉じられる。When introducing an atmospheric gas into the furnace 2,
The recovery atmosphere gas circulation pipe valve 42 and the recovery atmosphere gas supply pipe valve 18 are closed. First, the H 2 source gas supply pipe valve 34 and the diffusion pipe valve 62 are gradually opened.
Source of H 2 gas from the source of H 2 gas supply pipe 33 is supplied, the furnace 2
The furnace gas enters the furnace 2 through an atmosphere gas supply pipe 20 at the rear of the furnace, most of which reaches the front portion of the furnace 2, is discharged from the atmosphere gas discharge pipe 11 to the outside of the furnace, and finally is diffused and burned from a diffusion pipe 61.
The H 2 source gas supply pipe valve 34 and the diffusion pipe valve 62 are further opened to reach an amount corresponding to the sum of the amount of consumption at the start of purification in the atmosphere gas purification device 15 in addition to the atmosphere gas during product processing. The atmosphere gas composition in the furnace 2 was confirmed to be the same as the composition of the H 2 source gas, the recovery atmosphere gas circulation pipe valve 42 and the recovery atmosphere gas supply pipe valve 18 were gradually opened, and the diffusion pipe valve 62 was opened. and gradually closing the source of H 2 gas supply pipe valve 34, dissipating bulb 62 is finally closed.
【０００５】こうして、炉２から排出された雰囲気ガス
は、回収雰囲気ガス循環配管４１、入側ガスホルダー１
４を経て、雰囲気ガス精製装置１５で精製される。雰囲
気ガス精製装置１５で精製され、一部減量された再生ガ
スは、出側ガスホルダー１６を経て、ガス分析装置２６
でガス成分の濃度を分析され、雰囲気ガス１次成分調整
装置１７で不足する不活性ガス（Ｎ2 ）を補充され、Ｈ
2 源ガス（ＮＨ3 分解ガス）と同じ成分とされる。この
後、雰囲気ガス２次成分調整装置１９に入れられ、Ｈ2
源ガス供給管３３より雰囲気ガス精製装置１５での減量
分のＨ2 源ガス（ＮＨ3 分解ガス）を、そしてＨ2 Ｏ源
ガス供給管３５からＨ2 Ｏを付加される。Ｈ2 源ガスの
供給量は、炉２への雰囲気ガス導入時の一時期には、製
品処理時の２〜３倍以上となる。[0005] The atmospheric gas discharged from the furnace 2 is collected by the recovered atmospheric gas circulation pipe 41 and the inlet gas holder 1.
After passing through No. 4, it is refined by the atmospheric gas refining device 15. The regenerated gas purified by the atmospheric gas purifier 15 and partially reduced in volume passes through the outlet gas holder 16 and passes through the gas analyzer 26
, The concentration of gas components is analyzed, and the inert gas (N 2 ) which is insufficient in the atmosphere gas primary component adjusting device 17 is replenished.
It has the same components as the two source gases (NH 3 decomposition gas). Thereafter, placed in the ambient gas secondary component adjustment apparatus 19, H 2
Sources decrease amount of source of H 2 gas in the ambient gas purification unit 15 from the gas supply pipe 33 a (NH 3 decomposition gas), and is added of H 2 O from the H 2 O source gas supply pipe 35. The supply amount of the H 2 source gas at one time when the atmospheric gas is introduced into the furnace 2 is 2 to 3 times or more as compared with the time of product processing.
【０００６】尚、上記回路中には、雰囲気ガス排出管バ
ルブ１２が配設され、炉２内の圧力制御を行うととも
に、雰囲気ガス循環装置１３が配設され、雰囲気ガス循
環・精製に必要な駆動力を付与する。また、Ｈ2 源ガス
の供給に先立ち、一般的には、炉２、雰囲気ガス精製装
置１５等のＮ2 置換が行われる。In the circuit, an atmosphere gas discharge pipe valve 12 is provided to control the pressure in the furnace 2 and an atmosphere gas circulating device 13 is provided, which is necessary for circulation and purification of the atmosphere gas. Apply driving force. Further, prior to the supply of the H 2 source gas, generally, the N 2 substitution in the furnace 2, the atmospheric gas purification device 15, and the like is performed.
【０００７】[0007]
【発明が解決しようとする課題】従来、雰囲気ガス回収
装置をＨ2 を使用する焼鈍炉に設置しても、雰囲気ガス
補給量は、雰囲気ガス回収装置設置無しに比べ、製品処
理時には１／２〜１／３となったものの、炉内への雰囲
気ガス導入時には減らず、雰囲気ガス補給設備を小さく
することができず、高い設備投資を必要とし、雰囲気ガ
スコストも十分に低減できなかった。Conventionally, even if an atmospheric gas recovery device is installed in an annealing furnace using H 2 , the amount of atmospheric gas replenishment is reduced by half during product processing as compared with the case where no atmospheric gas recovery device is installed. Although it was reduced to １ ／, it did not decrease when the atmosphere gas was introduced into the furnace, the atmosphere gas replenishing equipment could not be reduced, a high capital investment was required, and the atmosphere gas cost could not be sufficiently reduced.
【０００８】また、雰囲気ガスの炉への導入時と製品処
理時とでは、補給する雰囲気ガスの量が２〜３倍も変動
し、これにより補給する雰囲気ガスの品質が大きく変動
し、製品品質への影響も多々発生した。In addition, the amount of the supplied atmospheric gas fluctuates two to three times between the time when the atmospheric gas is introduced into the furnace and the time when the product is processed, whereby the quality of the supplied atmospheric gas fluctuates greatly. Many impacts have also occurred.
【０００９】本発明は上述した従来の焼鈍工程が持って
いる課題に鑑み、雰囲気ガスを安価に供給するともに、
高位に品質の安定した製品を供給する連続焼鈍方法及び
連続焼鈍設備の提供を目的とする。In view of the above-mentioned problems of the conventional annealing process, the present invention supplies an atmospheric gas at a low cost,
An object of the present invention is to provide a continuous annealing method and a continuous annealing facility for supplying a product having a high quality and a stable quality.
【００１０】[0010]
【課題を解決するための手段】本発明の要旨は以下の
（１）〜（４）の通りである。The gist of the present invention is as follows (1) to (4).
【００１１】（１）Ｈ2 を使用する連続焼鈍方法におい
て、炉から雰囲気ガスを回収し、使用済み雰囲気ガスを
精製してＨ2 、不活性ガス及び不可避不純物からなる再
生雰囲気ガスを生産し、その成分を調整して炉に供給す
るとともに、炉への雰囲気ガス導入時、炉から回収した
雰囲気ガスを雰囲気ガス精製装置をバイパスさせて循環
させることにより雰囲気ガスを増量することを特徴とす
る連続焼鈍方法。(1) In a continuous annealing method using H 2 , an atmosphere gas is recovered from a furnace, and a used atmosphere gas is purified to produce a regeneration atmosphere gas comprising H 2 , an inert gas, and unavoidable impurities. It is characterized by continuously adjusting the components and supplying them to the furnace, and increasing the amount of the atmosphere gas by circulating the atmosphere gas recovered from the furnace by bypassing the atmosphere gas purification device when introducing the atmosphere gas into the furnace. Annealing method.
【００１２】（２）炉への雰囲気ガス導入時、雰囲気ガ
スの循環量を製品処理時の量まで高めた後、使用済み雰
囲気ガスの精製を開始することを特徴とする前記（１）
の連続焼鈍方法。(2) When introducing the atmosphere gas into the furnace, after the circulation amount of the atmosphere gas is increased to the amount at the time of processing the product, the purification of the used atmosphere gas is started.
Continuous annealing method.
【００１３】（３）炉への雰囲気ガス導入時、雰囲気ガ
スの循環量を製品処理時の量に使用済み雰囲気ガスの精
製開始時の精製装置での消費量を加えた量まで高めた
後、使用済み雰囲気ガスの精製を開始することを特徴と
する前記（１）の連続焼鈍方法。(3) When introducing the atmosphere gas into the furnace, the circulation amount of the atmosphere gas is increased to an amount obtained by adding the consumption amount of the used atmosphere gas in the refining apparatus at the start of the purification of the used atmosphere gas to the amount at the time of product processing. The continuous annealing method according to the above (1), wherein the purification of the used atmosphere gas is started.
【００１４】（４）Ｈ2 を使用する連続焼鈍設備におい
て、炉に雰囲気ガス取出口と雰囲気ガス供給口を設け、
該取出口と該供給口との間に、雰囲気ガスを回収し、使
用済み雰囲気ガスを精製してＨ2 、不活性ガス及び不可
避不純物からなる再生雰囲気ガスを生産する雰囲気ガス
精製装置、その成分を調整する雰囲気ガス成分調整装置
及び回収雰囲気ガス循環配管を配設するとともに、雰囲
気ガス精製装置をバイパスする雰囲気ガス初期循環用の
バイパス配管を設けたことを特徴とする連続焼鈍設備。(4) In a continuous annealing facility using H 2 , an atmosphere gas outlet and an atmosphere gas supply port are provided in a furnace,
Atmospheric gas purifying apparatus for collecting an atmospheric gas between the outlet and the supply port, purifying a used atmospheric gas to produce a regenerating atmospheric gas composed of H 2 , an inert gas, and unavoidable impurities, and components thereof. Continuous annealing equipment characterized by comprising an atmosphere gas component adjusting device for adjusting pressure and a recovery atmosphere gas circulation pipe, and a bypass pipe for initial circulation of atmosphere gas bypassing the atmosphere gas purification apparatus.
【００１５】Ｈ2 含有雰囲気ガスの導入時の雰囲気ガス
量が製品処理時に比べ著しく多いので、Ｈ2 含有雰囲気
ガスの導入時には、雰囲気ガスを雰囲気ガス精製装置を
バイパスさせて循環させることにより循環量を増加させ
れば、補給するＨ2 源ガス量を、炉への雰囲気ガス導入
時であるか製品処理時であるかに係わらず少量とし、且
つ、変動を小さくすることが可能となり、雰囲気ガスを
安価に供給するとともに、極めて安定して製品を生産す
ることが可能となる。Since the amount of the atmosphere gas when introducing the H 2 -containing atmosphere gas is remarkably larger than that during product processing, the amount of the circulation of the atmosphere gas is reduced by bypassing and circulating the atmosphere gas purification device when introducing the H 2 -containing atmosphere gas. When the amount of H 2 source gas is increased, the amount of H 2 source gas to be supplied can be reduced and the fluctuation can be reduced regardless of whether the atmosphere gas is introduced into the furnace or the product is being processed. Can be supplied at low cost, and a product can be produced extremely stably.
【００１６】[0016]
【発明の実施の形態】以下、本発明について詳細に説明
する。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
【００１７】図１に本発明の焼鈍設備の一例を示す。こ
の設備も方向性珪素鋼板の脱炭焼鈍炉である。Ｈ2 源ガ
スとしては、ＮＨ3 分解ガスが使用されている。また、
製品処理時に炉２内へ供給される雰囲気ガスの組成は、
加湿されたＮＨ3 分解ガス組成（Ｈ2 ７５％、Ｎ2 ２５
％：ドライベース）である。FIG. 1 shows an example of the annealing equipment of the present invention. This equipment is also a decarburizing annealing furnace for oriented silicon steel sheets. As the H 2 source gas, an NH 3 decomposition gas is used. Also,
The composition of the atmosphere gas supplied into the furnace 2 during product processing is
Humidified NH 3 decomposition gas composition (H 2 75%, N 2 25
%: Dry base).
【００１８】炉２内に雰囲気ガスを導入するときには、
回収雰囲気ガス循環配管バルブ４２、回収雰囲気ガス供
給管バルブ１８及びバイパス配管バルブ５２は閉じられ
ており、先ず、Ｈ2 源ガス供給管バルブ３４、放散管バ
ルブ６２が徐々に開かれ、Ｈ2 源ガス供給管３３よりＨ
2 源ガスが供給され、炉２の後方の雰囲気ガス供給管２
０を経て炉２内に入り、大部分は炉２の前部に至り雰囲
気ガス排出管１１から炉外に排出され、最後に放散管６
１から放散・燃焼される。炉２内の雰囲気ガス組成がＨ
2 源ガスの組成と同じとなったことを確認し、バイパス
配管バルブ５２を徐々に開くとともに、放散管バルブ６
２を徐々に閉じ、最終的に、放散管バルブ６２は閉じら
れる。回収雰囲気ガスは、バイパス配管５１を経て、雰
囲気ガス２次成分調整装置１９に至る。ここで、Ｈ2 源
ガス供給管３３よりＨ2 源ガスが供給され、循環ガス量
が増加され、炉２の後方の雰囲気ガス供給管２０を経て
炉２内に入る。When introducing the atmospheric gas into the furnace 2,
The recovery atmosphere gas circulation pipe valve 42, the recovery atmosphere gas supply pipe valve 18 and the bypass pipe valve 52 are closed. First, the H 2 source gas supply pipe valve 34 and the diffusion pipe valve 62 are gradually opened, and the H 2 source H from gas supply pipe 33
2 Source gas is supplied, and the atmosphere gas supply pipe 2 behind the furnace 2
0, the furnace gas enters the furnace 2, most of which reaches the front part of the furnace 2, is discharged from the atmosphere gas discharge pipe 11 to the outside of the furnace, and finally the diffusion pipe 6.
Emitted from 1 and burned. The atmosphere gas composition in the furnace 2 is H
2 Confirm that the composition of the source gas is the same, gradually open the bypass pipe valve 52, and
2 is gradually closed, and finally the diffusion tube valve 62 is closed. The recovered atmosphere gas reaches the atmosphere gas secondary component adjusting device 19 via the bypass pipe 51. Here, the H 2 source gas is supplied from the H 2 source gas supply pipe 33, the amount of circulating gas is increased, and the H 2 source gas enters the furnace 2 through the atmosphere gas supply pipe 20 behind the furnace 2.
【００１９】こうして循環ガス量は徐々に増加されるの
で、Ｈ2 源ガスの供給量は少量の一定値にすることが可
能である。最小値としては、製品処理時の量とすること
が可能である。循環ガス量が、製品処理時の雰囲気ガス
量に雰囲気ガス精製装置１５での精製開始時の消費量を
加えた量に相当する量に達した後、回収雰囲気ガス循環
配管バルブ４２及び回収雰囲気ガス供給管バルブ１８を
徐々に開くとともに、バイパス配管バルブ５２を徐々に
閉じ、最終的に閉じる。Since the circulating gas amount is thus gradually increased, the supply amount of the H 2 source gas can be set to a small and constant value. The minimum value can be an amount during product processing. After the amount of circulating gas reaches an amount equivalent to the amount of atmospheric gas during product processing plus the amount of consumption at the start of purification in the atmospheric gas refining device 15, the recovery atmosphere gas circulation pipe valve 42 and the recovery atmosphere gas The supply pipe valve 18 is gradually opened, and the bypass pipe valve 52 is gradually closed and finally closed.
【００２０】こうして、炉２から排出された雰囲気ガス
は、回収雰囲気ガス循環配管４１、入側ガスホルダー１
４を経て、雰囲気ガス精製装置１５で精製される。雰囲
気ガス精製装置１５で精製され、一部減量された再生ガ
スは、出側ガスホルダー１６を経て、ガス分析装置２６
でガス成分の濃度を分析され、雰囲気ガス１次成分調整
装置１７で不足する不活性ガス（Ｎ2 ）を補充され、Ｈ
2 源ガス（ＮＨ3 分解ガス）と同じ成分とされる。この
後、雰囲気ガス２次成分調整装置１９に入れられ、Ｈ2
源ガス供給管３３より雰囲気ガス精製装置１５での減量
分のＨ2 源ガス（ＮＨ3 分解ガス）を、そしてＨ2 Ｏ源
ガス供給管３５からＨ2 Ｏを付加される。このように、
Ｈ2 源ガス供給管３３からのＨ2 源ガス供給量を少なく
且つ変動を小さくすることが可能であり、最小量は製品
処理時の量とすることができる。The atmosphere gas discharged from the furnace 2 is collected by the recovery atmosphere gas circulation pipe 41 and the inlet gas holder 1.
After passing through No. 4, it is refined by the atmospheric gas refining device 15. The regenerated gas purified by the atmospheric gas purifier 15 and partially reduced in volume passes through the outlet gas holder 16 and passes through the gas analyzer 26
, The concentration of gas components is analyzed, and the inert gas (N 2 ) which is insufficient in the atmosphere gas primary component adjusting device 17 is replenished.
It has the same components as the two source gases (NH 3 decomposition gas). Thereafter, placed in the ambient gas secondary component adjustment apparatus 19, H 2
Sources decrease amount of source of H 2 gas in the ambient gas purification unit 15 from the gas supply pipe 33 a (NH 3 decomposition gas), and is added of H 2 O from the H 2 O source gas supply pipe 35. in this way,
The supply amount of the H 2 source gas from the H 2 source gas supply pipe 33 can be reduced and the fluctuation can be reduced, and the minimum amount can be the amount at the time of product processing.
【００２１】尚、上記回路中には、雰囲気ガス排出管バ
ルブ１２が配設され、炉２内の圧力制御を行うととも
に、雰囲気ガス循環装置１３が配設され、雰囲気ガス循
環・精製に必要な駆動力を付与する。また、Ｈ2 源ガス
の供給に先立ち、一般的には、炉２、雰囲気ガス精製装
置１５等のＮ2 置換が行われる。In the above circuit, an atmosphere gas discharge pipe valve 12 is provided to control the pressure in the furnace 2 and an atmosphere gas circulation device 13 is provided, which is necessary for circulation and purification of the atmosphere gas. Apply driving force. Further, prior to the supply of the H 2 source gas, generally, the N 2 substitution in the furnace 2, the atmospheric gas purification device 15, and the like is performed.
【００２２】また、雰囲気ガス精製方法には特に難しい
条件はなく、例えば、吸着剤として活性アルミナ、活性
炭、ゼオライト等を使用したＰＳＡ法、或いは、ポリミ
ド等の分離膜を使用した膜分離法等が採用可能である。
いずれの方法でも、雰囲気ガス精製によりＨ2 濃度は高
められる。There are no particularly difficult conditions for the purification method of the atmosphere gas. For example, a PSA method using activated alumina, activated carbon, zeolite or the like as an adsorbent, or a membrane separation method using a separation membrane such as polyamide is used. Can be adopted.
In any method, the H 2 concentration is increased by the purification of the atmosphere gas.
【００２３】尚、Ｈ2 及び不可避不純物からなる再生雰
囲気ガスを生産する場合も同様である。The same applies to the case of producing a regeneration atmosphere gas comprising H 2 and unavoidable impurities.
【００２４】更に、種々のＨ2 源ガスについても、上記
関係が成り立つ。Further, the above relationship holds for various H 2 source gases.
【００２５】加えて、方向性珪素鋼板の脱炭焼鈍炉に限
らず、あらゆるＨ2 を使用する焼鈍炉、例えば、無方向
性電磁鋼板の脱炭焼鈍炉、ステンレス及び無方向性電磁
鋼板の光輝焼鈍炉等のＨ2 を使用する焼鈍炉、フェライ
ト焼鈍炉においても、上記関係が成り立つ。In addition, not only the decarburizing annealing furnace for grain-oriented silicon steel sheets, but also any kind of annealing furnace using H 2 , for example, the decarburizing annealing furnace for non-oriented electrical steel sheets, and the brightness of stainless steel and non-oriented electrical steel sheets annealing furnace for using H 2 in the annealing furnace or the like, even in the ferrite annealing furnace, the relationship is established.
【００２６】[0026]
【発明の効果】本発明により、補給するＨ2 源ガス量を
雰囲気導入時及び製品処理時に係わらず少量とし、且つ
変動を小さくすることを可能とし、雰囲気ガスを安価に
供給するとともに、極めて安定して製品を生産すること
が可能となる。According to the present invention, the amount of H 2 source gas to be replenished can be reduced and the fluctuation can be reduced irrespective of the introduction of the atmosphere and the processing of the product. To produce products.
【図１】本発明の焼鈍設備の一例を示す図である。FIG. 1 is a diagram showing an example of the annealing equipment of the present invention.
【図２】従来の焼鈍設備の一例を示す図である。FIG. 2 is a diagram showing an example of a conventional annealing facility.
１ 鋼板 ２ 炉 ３ 雰囲気ガス取出口 ４ 雰囲気ガス供給口 １１ 雰囲気ガス排出管 １２ 雰囲気ガス排出管バルブ １３ 雰囲気ガス循環装置 １４ 入側ガスホルダー １５ 雰囲気ガス精製装置 １６ 出側ガスホルダー １７ 雰囲気ガス１次成分調整装置 １８ 回収雰囲気ガス供給管バルブ １９ 雰囲気ガス２次成分調整装置 ２０ 雰囲気ガス供給管 ２６、２７ ガス分析装置 ３１ 不活性ガス供給管 ３２ 不活性ガス供給管バルブ ３３ Ｈ2 源ガス供給管 ３４ Ｈ2 源ガス供給管バルブ ３５ Ｈ2 Ｏ源ガス供給管 ３６ Ｈ2 Ｏ源ガス供給管バルブ ４１ 回収雰囲気ガス循環配管 ４２ 回収雰囲気ガス循環配管バルブ ５１ バイパス配管 ５２ バイパス配管バルブ ６１ 放散管 ６２ 放散管バルブDESCRIPTION OF SYMBOLS 1 Steel plate 2 Furnace 3 Atmospheric gas outlet 4 Atmospheric gas supply port 11 Atmospheric gas discharge pipe 12 Atmospheric gas discharge pipe valve 13 Atmospheric gas circulation device 14 Inlet gas holder 15 Atmospheric gas purification device 16 Outlet gas holder 17 Atmospheric gas primary Component adjuster 18 Recovered atmosphere gas supply pipe valve 19 Atmospheric gas secondary component adjuster 20 Atmosphere gas supply pipe 26, 27 Gas analyzer 31 Inert gas supply pipe 32 Inert gas supply pipe valve 33 H 2 source gas supply pipe 34 H 2 source gas supply pipe valve 35 H 2 O source gas supply pipe 36 H 2 O source gas supply pipe valve 41 Recovery atmosphere gas circulation pipe 42 Recovery atmosphere gas circulation pipe valve 51 Bypass pipe 52 Bypass pipe valve 61 Dispersion pipe 62 Dissipation pipe valve
Claims (4)
炉から雰囲気ガスを回収し、使用済み雰囲気ガスを精製
してＨ2 、不活性ガス及び不可避不純物からなる再生雰
囲気ガスを生産し、その成分を調整して炉に供給すると
ともに、炉への雰囲気ガス導入時、炉から回収した雰囲
気ガスを雰囲気ガス精製装置をバイパスさせて循環させ
ることにより雰囲気ガスを増量することを特徴とする連
続焼鈍方法。In a continuous annealing method using H 2 ,
Atmosphere gas is recovered from the furnace, used atmosphere gas is purified to produce a regenerating atmosphere gas composed of H 2 , inert gas and unavoidable impurities, the components of which are adjusted and supplied to the furnace. A continuous annealing method characterized by increasing the amount of the atmosphere gas by circulating the atmosphere gas recovered from the furnace by bypassing the atmosphere gas purification device when introducing the gas.
循環量を製品処理時の量まで高めた後、使用済み雰囲気
ガスの精製を開始することを特徴とする請求項１記載の
連続焼鈍方法。2. The continuous annealing according to claim 1, wherein when introducing the atmosphere gas into the furnace, the refining of the used atmosphere gas is started after increasing the circulation amount of the atmosphere gas to an amount at the time of processing the product. Method.
循環量を製品処理時の量に使用済み雰囲気ガスの精製開
始時の精製装置での消費量を加えた量まで高めた後、使
用済み雰囲気ガスの精製を開始することを特徴とする請
求項１記載の連続焼鈍方法。3. When introducing the atmosphere gas into the furnace, the circulation amount of the atmosphere gas is increased to the amount obtained by adding the consumption amount of the used atmosphere gas in the refining apparatus at the start of the purification of the used atmosphere gas to the amount used in the processing of the product. 2. The continuous annealing method according to claim 1, wherein the purification of the used atmosphere gas is started.
炉に雰囲気ガス取出口と雰囲気ガス供給口を設け、該取
出口と該供給口との間に、雰囲気ガスを回収し、使用済
み雰囲気ガスを精製してＨ2 、不活性ガス及び不可避不
純物からなる再生雰囲気ガスを生産する雰囲気ガス精製
装置、その成分を調整する雰囲気ガス成分調整装置及び
回収雰囲気ガス循環配管を配設するとともに、雰囲気ガ
ス精製装置をバイパスする雰囲気ガス初期循環用のバイ
パス配管を設けたことを特徴とする連続焼鈍設備。4. In a continuous annealing facility using H 2 ,
A furnace is provided with an atmosphere gas outlet and an atmosphere gas supply port, and between the outlet and the supply port, an atmosphere gas is recovered, and a used atmosphere gas is purified to remove H 2 , inert gas, and unavoidable impurities. Atmosphere gas purifier that produces a regenerated atmosphere gas, an atmosphere gas component adjuster that adjusts its components, and a recovery atmosphere gas circulation pipe are provided, and a bypass pipe for the atmosphere gas initial circulation that bypasses the atmosphere gas purification apparatus is provided. Continuous annealing equipment characterized by being provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2451197A JPH10204527A (en) | 1997-01-24 | 1997-01-24 | Continuous annealing method and continuous annealing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2451197A JPH10204527A (en) | 1997-01-24 | 1997-01-24 | Continuous annealing method and continuous annealing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10204527A true JPH10204527A (en) | 1998-08-04 |
Family
ID=12140206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2451197A Withdrawn JPH10204527A (en) | 1997-01-24 | 1997-01-24 | Continuous annealing method and continuous annealing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10204527A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020042160A (en) * | 2000-11-30 | 2002-06-05 | 이구택 | purge control apparatus and method using N2 in heat treatment process |
| JP2011137229A (en) * | 2009-12-16 | 2011-07-14 | Ipsen Internatl Gmbh | Method and apparatus for controlling process-gas for heat-treating metallic material/metallic workpiece in industrial furnace |
| CN104962709A (en) * | 2015-06-12 | 2015-10-07 | 内蒙古包钢钢联股份有限公司 | Novel silicon steel continuous annealing furnace nitrogen-hydrogen ratio humidification device and continuous annealing decarburization method |
-
1997
- 1997-01-24 JP JP2451197A patent/JPH10204527A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020042160A (en) * | 2000-11-30 | 2002-06-05 | 이구택 | purge control apparatus and method using N2 in heat treatment process |
| JP2011137229A (en) * | 2009-12-16 | 2011-07-14 | Ipsen Internatl Gmbh | Method and apparatus for controlling process-gas for heat-treating metallic material/metallic workpiece in industrial furnace |
| CN104962709A (en) * | 2015-06-12 | 2015-10-07 | 内蒙古包钢钢联股份有限公司 | Novel silicon steel continuous annealing furnace nitrogen-hydrogen ratio humidification device and continuous annealing decarburization method |
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