JPH10188710A - Electric contact and its manufacture - Google Patents

Electric contact and its manufacture

Info

Publication number
JPH10188710A
JPH10188710A JP29608897A JP29608897A JPH10188710A JP H10188710 A JPH10188710 A JP H10188710A JP 29608897 A JP29608897 A JP 29608897A JP 29608897 A JP29608897 A JP 29608897A JP H10188710 A JPH10188710 A JP H10188710A
Authority
JP
Japan
Prior art keywords
less
layer
silver alloy
contact
outer peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29608897A
Other languages
Japanese (ja)
Inventor
Noboru Uenishi
昇 上西
Yasuhiko Suzuki
恭彦 鈴木
Chihiro Takada
千尋 高田
Akinori Kobayashi
晄▲徳▼ 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP29608897A priority Critical patent/JPH10188710A/en
Publication of JPH10188710A publication Critical patent/JPH10188710A/en
Pending legal-status Critical Current

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  • Contacts (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Manufacture Of Switches (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an electric contact suited for use in a breaker for 100A or less rated current. SOLUTION: In this structure, a peripheral layer 2 having 135mHv or more micro Vickers hardness of a contact surface and a central layer 1 less than 135mHv micro Vickers hardness of a section are compounded. The peripheral layer 2 occupies a contact surface region of 32.7% or more 91.0% or less from a contact surface peripheral edge, in an electric contact, the central layer 1 and the peripheral layer 2 are composed of silver alloy 8.0% or more 25.0% or less cadmium(Cd), 1.1% or more 5% or less tin (Sn), 0.07% or more 3% or less nickel(Ni) and 0.2% or less impurity element.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、配電用遮断器,
漏電遮断器、安全ブレーカー、サーキットプロテクター
などに用いる電気接点に関する。
The present invention relates to a circuit breaker for power distribution,
The present invention relates to an electrical contact used for an earth leakage breaker, a safety breaker, a circuit protector, and the like.

【0002】[0002]

【従来の技術】一般に配電用遮断器、ノーヒューズブレ
ーカー、漏電遮断器、サーキットプロテクターや安全ブ
レーカーその他分電盤に用いられるブレーカー(以降こ
れらをまとめてブレ−カ−と呼ぶ)には電気接点が使用
されている。これらブレーカー用の電気接点としては、
Ag合金が広く使われている。このAg合金にはAgマ
トリックス中にIn酸化物、Sn酸化物、Cd酸化物、
Bi酸化物、Co酸化物、Ni酸化物、Zn酸化物、S
b酸化物、Ca酸化物、などが分散した酸化物分散強化
型合金が広く使用されている。
2. Description of the Related Art In general, an electrical contact is provided in a power distribution circuit breaker, a no-fuse breaker, an earth leakage breaker, a circuit protector, a safety breaker, and other breakers used for a distribution board (hereinafter collectively referred to as breakers). It is used. Electrical contacts for these breakers include:
Ag alloys are widely used. In this Ag alloy, In oxide, Sn oxide, Cd oxide,
Bi oxide, Co oxide, Ni oxide, Zn oxide, S
An oxide dispersion strengthened alloy in which b oxide, Ca oxide, and the like are dispersed is widely used.

【0003】この電気接点に要求される特性としては、
(1)耐溶着性、(2)初期温度特性、(3)過負荷試
験後の温度特性、(4)耐久試験後の温度特性、(5)
遮断試験後の温度特性や絶縁特性などがある。
[0003] The characteristics required of this electrical contact include:
(1) welding resistance, (2) initial temperature characteristics, (3) temperature characteristics after overload test, (4) temperature characteristics after durability test, (5)
There are temperature characteristics and insulation characteristics after the cutoff test.

【0004】そして、定格電流が100A以下のブレー
カー用の電気接点の場合、定格電流が225A以上のブ
レーカー用の電気接点とは異なり、非常に電気接点自体
が小さく、通常は、電気接点の面積や厚みが225A以
上の場合に比べて非常に小さく薄い。また電気接点を支
持する基材への取り付け方法も225A以上の場合のよ
うな、ろう付けの場合もあるが、カシメ方法の場合が多
い。この場合には、接点形状も225A以上の場合のよ
うな粒状ではなく純Cuと貼り合わさったビス形状にす
るなど相違点が多い。また、100A以下の場合は、ブ
レーカー内のスペースも小さくする必要がある場合が多
い。
In the case of an electrical contact for a breaker having a rated current of 100 A or less, the electrical contact itself is very small, unlike an electrical contact for a breaker having a rated current of 225 A or more. It is very small and thin compared to the case where the thickness is 225A or more. Also, the method of attaching to the base material supporting the electrical contact may be brazing as in the case of 225 A or more, but it is often the caulking method. In this case, there are many differences, for example, the contact shape is not a granular shape as in the case of 225 A or more, but a screw shape bonded to pure Cu. In the case of 100A or less, it is often necessary to reduce the space in the breaker.

【0005】そのため、この電気接点に求められる性能
上の前記(1)〜(5)のような要求特性とこれを満足
するための最適な接点の構造や合金組成も225A以上
の場合と100A以下の場合とは異なってくる。以上の
事実を鑑み、本願では、定格電流100Aクラス以下の
ブレーカー用途に適した電気接点を開示する事を目的と
する。
[0005] Therefore, the above-mentioned required characteristics (1) to (5) in terms of the performance required of the electric contact and the optimum contact structure and alloy composition for satisfying the above are 225 A or more and 100 A or less. It is different from the case. In view of the above facts, an object of the present invention is to disclose an electric contact suitable for a breaker application having a rated current of 100 A class or less.

【0006】なお、本願は、硬度と配置形態を管理した
外周層と中央層とを有し、化学組成を最適化することに
より、初めて本願の意図する定格電流100A以下のブ
レーカーに適した電気接点を供する事ができるのであ
る。従って、導電性の良い材料を第2層(下層)にし、
硬度の高い材料からなる層を第1層(上層)とする特開
昭62−97213号公報とは異なり、更に同特開昭6
2−97213号公報の様に第1層はAg−SnO2や
In2O3系ではなく、第2層は純Agでもない点から
も特開昭62−97213号公報とは異なる。
The present invention has an outer layer and a center layer whose hardness and arrangement are controlled, and by optimizing a chemical composition, is an electric contact suitable for a breaker having a rated current of 100 A or less intended by the present application for the first time. Can be offered. Therefore, a material having good conductivity is used as the second layer (lower layer),
Unlike Japanese Patent Application Laid-Open No. 62-97213, in which a layer made of a material having a high hardness is the first layer (upper layer), Japanese Patent Application Laid-Open No.
The first layer is not based on Ag-SnO2 or In2O3 as in JP-A-97-213 and the second layer is not pure Ag, which is different from JP-A-62-97213.

【0007】本願発明の電気接点は、定格電流100A
以下、中でも60A以下の使用条件に於いて最もその効
果を発揮するものであり、リレーなどのさらに低負荷用
途の接点を示したものではない。また本願の示す中央層
は主に温度特性の改善、また外周層は耐溶着性能の改善
を図ったものである。
The electrical contact of the present invention has a rated current of 100 A
In the following, among others, the effect is most exerted under the use condition of 60 A or less, and it does not show a contact for further low load use such as a relay. The central layer shown in the present application is mainly for improving the temperature characteristics, and the outer peripheral layer is for improving the welding resistance.

【0008】従って、例えば公知例である特開昭58−
189913号公報の様に、第1層目(上層)を耐消耗
性と耐溶着性を有する導電体とし、第2層目(下層)を
短絡電流においてアークの切れが良好な導電体とする場
合とは明らかに異なり、本願では同特開昭58−189
913号公報の様に、第1層と第2層との境界面に凹凸
を形成する必要はない。
Accordingly, for example, Japanese Patent Application Laid-Open No.
In the case where the first layer (upper layer) is made of a conductor having wear resistance and welding resistance, and the second layer (lower layer) is made of a conductor having good arc breaking at short-circuit current as described in JP-A-189913. This is clearly different from the above-mentioned Japanese Patent Application Laid-Open No. 58-189.
It is not necessary to form irregularities on the boundary surface between the first layer and the second layer as in JP-A-913.

【0009】また本願では、同特開昭58−18991
3号公報のような、第2層に銀−リチウム系、銀−イン
ジウム系を用いておらず、本願はその目的、構成などで
公知のいずれの例とも異なる発明である。
In the present application, Japanese Patent Application Laid-Open No. 58-18991 is also used.
No silver-lithium-based or silver-indium-based material is used for the second layer as disclosed in Japanese Patent Application Laid-Open No. 3 (1993) -313, and the present application is an invention that is different from any known examples in terms of its purpose and configuration.

【0010】[0010]

【発明が解決しようとする課題】前記(1)〜(5)の
接点要求特性の内で、いくつかは互いに相反する特性の
関係にあり、例えば温度特性(通電による温度上昇は小
さい程良い)と耐溶着特性とは互いにトレードオフの関
係にある。このため温度特性を改善するためには、耐溶
着特性を犠牲にせねばならない。これまでの電気接点
は、これら多くの要求特性のそれぞれについて検討し、
最適の特性組み合わせを持つ接点合金を選び出す作業を
行っていたが、(1)〜(5)全ての特性について十分
に満足する接点を選び出すことは上記のトレードオフの
関係上、不可能であった。
Among the required contact characteristics of the above (1) to (5), some have mutually opposite characteristics, such as temperature characteristics (the smaller the temperature rise due to energization, the better). And the welding resistance are in a trade-off relationship with each other. Therefore, in order to improve the temperature characteristics, the welding resistance must be sacrificed. Previous electrical contacts considered each of these many required characteristics,
Although the work of selecting a contact alloy having an optimal combination of properties was performed, it was impossible to select a contact that fully satisfies all the properties (1) to (5) due to the above trade-off relationship. .

【0011】なかでも、定格電流30A用、50A用を
中心とした、100A以下のブレーカー用接点として
は、温度特性(特に初期温度特性と過負荷試験後の温度
特性)と耐溶着特性の両立が困難であった。例えば耐溶
着特性が良くても、初期温度性能が悪くなり、初期温度
(低いほど良い)は高い値を示すか又は良い場合と悪い
場合が不定期に起こるいわゆるバラツキの大きい状態に
なる事が多かった。
Above all, a breaker contact having a rated current of 30 A or 50 A and a breaker contact of 100 A or less has both temperature characteristics (particularly, initial temperature characteristics and temperature characteristics after an overload test) and welding resistance. It was difficult. For example, even if the welding resistance is good, the initial temperature performance is deteriorated, and the initial temperature (the lower the better) shows a high value, or the state where the good and bad cases occur irregularly occurs in a so-called large variation state. Was.

【0012】すなわち、特に本願発明の対象とする定格
電流が100A以下、特に定格電流30A〜50Aのブ
レーカー用接点では、耐溶着特性と温度特性を両立させ
ることが困難であった。その理由は、本来トレードオフ
の関係にある特性の両方を満足させる接点の開発自体が
難しいからであるとともに、それぞれ個々の要求特性を
満足させるために必要とされる理想的接点合金組成及び
構造が明らかにされていないからであった。
That is, in the case of a breaker contact having a rated current of 100 A or less, particularly a rated current of 30 A to 50 A, it is difficult to achieve both welding resistance and temperature characteristics. The reason is that it is difficult to develop a contact that satisfies both characteristics that are originally in a trade-off relationship, and the ideal contact alloy composition and structure required to satisfy each individual required characteristic is Because it was not disclosed.

【0013】例えば、定格50A用の接点の場合におい
て、耐溶着性改良の為に必要な接点合金組成と構造の組
み合わせが如何にあるべきか、かつ初期温度特性の向上
に必要な接点合金組成と構造の組み合わせは如何にある
べきか、又それは定格電流が225Aの場合の耐溶着特
性と初期温度特性の為に必要な接点合金組成と構造の最
適組み合わせと比較してどの様に異なるのかについての
知見が必ずしも明確でなかった。
For example, in the case of a contact having a rating of 50 A, what should be the combination of the contact alloy composition and the structure required for improving the welding resistance, and the contact alloy composition necessary for improving the initial temperature characteristics? It should be noted how the combination of structures should be, and how they differ from the optimal combination of contact alloy composition and structure required for welding resistance and initial temperature characteristics when the rated current is 225A. The findings were not always clear.

【0014】また、たとえそれらの理想的接点合金組成
および構造が分かったとしても、それらの個々の特性を
満足させるために必要な、多種類の理想的接点合金組成
及び構造を一つの接点が同時に合わせ持つ事は困難であ
り、さらに例え合わせ持つために本願のごとき複合化さ
せる方法を発明したとしても、それらの最適の組み合わ
せ、例えばどの合金とどの合金をどういう割合でどうい
う状態に組み合わせるのかその製造法はどのようなもの
であるのかが不明であった。
Further, even if their ideal contact alloy compositions and structures are known, one contact can simultaneously use various ideal contact alloy compositions and structures necessary to satisfy their individual characteristics. It is difficult to combine them, and even if we invent the method of compounding as in the present application in order to combine them, even if we invent the optimal combination of them, for example, what kind of alloy and what alloy to combine in what ratio and in what state It was unclear what the law was.

【0015】[0015]

【課題を解決するための手段】本願発明の電気接点にお
いてはマイクロビッカース硬度135mHv未満の中央
層の外周にマイクロビッカース硬度135mHv以上の
外周層を配して複合化させた構造で、前記外周層は接点
表面外周縁から32.7%以上91.0%以下の接点表
面領域を占める。前記中央層内にマイクロビッカース硬
度135mHv以上の層があるのも有用である。
The electric contact of the present invention has a structure in which an outer peripheral layer having a micro Vickers hardness of 135 mHv or more is arranged around the central layer having a micro Vickers hardness of less than 135 mHv to form a composite. It occupies 32.7% or more and 91.0% or less of the contact surface area from the outer peripheral edge of the contact surface. It is also useful that a layer having a micro Vickers hardness of 135 mHv or more is provided in the central layer.

【0016】定格電流が100アンペア(A)以下のブ
レーカーに用いる電気接点では、中央層及び外周層が重
量%でカドミウム(Cd)が8.0%以上25.0%以
下、スズ(Sn)が1.1%以上5%以下、ニッケル
(Ni)が0.07%以上3%以下、不純元素が0.2
%以下、望ましくはカドミウム(Cd)が8.0%以上
25.0%以下、スズ(Sn)が1.2%以上4%以
下、ニッケル(Ni)が0.22%以上0.7%以下を
含有する銀合金である。
In an electrical contact used for a breaker having a rated current of 100 amperes (A) or less, the center layer and the outer peripheral layer are in a weight percentage of cadmium (Cd) of 8.0% to 25.0%, and tin (Sn) of tin. 1.1% or more and 5% or less, nickel (Ni) is 0.07% or more and 3% or less, and impurity elements are 0.2% or less.
% Or less, desirably 8.0% to 25.0% cadmium (Cd), 1.2% to 4% tin (Sn), and 0.22% to 0.7% nickel (Ni). Is a silver alloy.

【0017】定格電流60アンペア(A)以下のブレー
カーに用いる電気接点では、重量%でカドミウム(C
d)が14.0%以上25.0%以下、スズ(Sn)が
2.4%以上4%以下、ニッケル(Ni)が0.24%
以上0.7%以下の銀合金を用いる。
In an electrical contact used for a breaker having a rated current of 60 amperes (A) or less, cadmium (C
d) is 14.0% or more and 25.0% or less, tin (Sn) is 2.4% or more and 4% or less, and nickel (Ni) is 0.24%.
A silver alloy of at least 0.7% is used.

【0018】更に重量%でアンチモン(Sb)が0%以
上2%以下、カルシウム(Ca)が0%以上0.3%以
下、ビスマス(Bi)が0%以上1%以下、亜鉛(Z
n)が0%以上2%以下、コバルト(Co)が0%以上
0.5%以下、インジウム(In)が0%以上5%以下
の銀合金を用いることも好ましい。なお、外周層の厚み
は、5μmという非常に薄い厚みのものでも有効であ
り、平均で5μm以上あればよい。
Further, in weight%, antimony (Sb) is 0% or more and 2% or less, calcium (Ca) is 0% or more and 0.3% or less, bismuth (Bi) is 0% or more and 1% or less, and zinc (Z
It is also preferable to use a silver alloy in which n) is 0% to 2%, cobalt (Co) is 0% to 0.5%, and indium (In) is 0% to 5%. The thickness of the outer peripheral layer is effective even if it is as thin as 5 μm, and may be 5 μm or more on average.

【0019】本願の電気接点の製造法では、外周層を粉
末溶射法、又は蒸着法で形成する方法、あるいは、中央
層を酸化された銀合金チップで形成し、該チップの外側
に外周層となる酸化された銀合金の粒を配し、加圧成形
した後、焼結する方法、酸性溶液に浸漬洗浄後、焼鈍軟
化した中央層となる銀合金の周囲に、外周層となる銀合
金を嵌合し、中央層と外周層とを一体化し拡散焼鈍する
方法、中央層となる銀合金板と外周層となる純銀(A
g)層付き銀合金板とを打ち抜き、焼鈍の後、酸化する
方法がある。
In the method of manufacturing the electric contact of the present invention, the outer peripheral layer is formed by powder spraying or vapor deposition, or the central layer is formed of an oxidized silver alloy chip, and the outer peripheral layer is formed outside the chip. After arranging the grains of the oxidized silver alloy, press-forming, sintering, immersing and washing in an acidic solution, and surrounding the silver alloy as the central layer that has been annealed and softened, the silver alloy as the outer peripheral layer is formed. A method in which the central layer and the outer layer are integrated and diffusion annealing is performed, and a silver alloy plate serving as the center layer and pure silver (A
g) There is a method in which a silver alloy plate with a layer is punched, annealed, and then oxidized.

【0020】更には中央層となる銀合金棒の周囲に、外
周層となる銀合金円筒材を嵌合し、該棒と該円筒材との
外境界部を気密溶接した後、熱間静水圧成形(HIP)法
で複合構造の棒材を形成したり、中央層となる酸化後の
銀合金の粒を成形した円柱部材の周囲に、前記銀合金の
粒を成形した銀合金円筒部材を円柱状に結合し、複合構
造の円柱状線材を熱間押出加工法で形成する。
Further, a silver alloy cylindrical material as an outer peripheral layer is fitted around a silver alloy rod as a central layer, and the outer boundary between the rod and the cylindrical material is hermetically welded. A silver alloy cylindrical member formed with the silver alloy particles is formed around a cylindrical member formed with a composite structure bar by the forming (HIP) method, or formed with the oxidized silver alloy particles serving as the central layer. A columnar wire is formed by a hot extrusion method to form a cylindrical wire having a composite structure.

【0021】そして、前記棒材あるいは線材の長手方向
に対し直角に円板状接点を切り出して酸化する方法によ
る。又、円板状接点を中央層となる銀合金円柱と外周層
となる銀合金リング状部材とを一体化鍛造法で形成し酸
化する方法も有効である。本願は、高い耐溶着性を維持
したままで温度特性を改善することを目的として周辺の
外周層において高い硬度のAg合金部を配し、中央層に
おいて硬度の低いAg合金を配置する方法を示し、更に
この構造における最適な合金組成を示したものである。
即ち、本願のように複合構造としない通常の接点ならば
Cd濃度が8.0%以上25.0%以下、またSn濃度
が1.2%以上4%以下、Ni濃度が0.22%以上
0.7%以下になると、耐溶着性能は良いとしても温度
特性は極めて悪いものになる(温度上昇は極めて高くな
る)。
Then, a disk-shaped contact is cut out at right angles to the longitudinal direction of the rod or wire and oxidized. It is also effective to form a disk-shaped contact by a forging method in which a silver alloy cylinder serving as a central layer and a silver alloy ring-shaped member serving as an outer peripheral layer are oxidized. The present application shows a method of arranging a high-hardness Ag alloy portion in a peripheral layer around the object and improving the hardness of the Ag alloy in a central layer for the purpose of improving temperature characteristics while maintaining high welding resistance. Further, it shows the optimum alloy composition in this structure.
That is, in the case of a normal contact not having a composite structure as in the present application, the Cd concentration is 8.0% or more and 25.0% or less, the Sn concentration is 1.2% or more and 4% or less, and the Ni concentration is 0.22% or more. When it is 0.7% or less, the temperature characteristics become extremely poor (the temperature rise becomes extremely high) even though the welding resistance is good.

【0022】本願が示す構造の接点においては、中央部
の硬度の低い層が温度特性を改善する効果があるので温
度特性はこの中央層により改善される分だけ、温度特性
が必ずしも良いとはいえない高濃度のCd、Sn、Ni
含有時においても良好な温度特性を得ることができる。
In the contact having the structure shown in the present application, the layer having low hardness at the center has the effect of improving the temperature characteristics. Therefore, the temperature characteristics are not necessarily good because the temperature characteristics are improved by the central layer. No high concentration of Cd, Sn, Ni
Good temperature characteristics can be obtained even when it is contained.

【0023】この様に本願では温度特性は複合構造で要
求特性を満たしつつ、一方では接点合金組成を高いC
d、Sn、Ni濃度に設定することにより高い耐溶着特
性を得ることができるようにしたものである。つまり、
複合構造だけでも本発明は十分な効果を発揮せず、また
接点合金組成を本願の示す組成範囲にするだけでも本発
明が示す十分な効果を発揮することはできない。複合構
造にしても接点合金組成を上記の範囲にしなければ高い
耐溶着特性は実現せず、一方接点合金組成だけを本願の
組成範囲にしても、複合構造としなければ優れた温度特
性は実現しないのである。
As described above, in the present application, the temperature characteristics satisfy the required characteristics with a composite structure, while the contact alloy composition is increased to a high C value.
By setting d, Sn, and Ni concentrations, high welding resistance can be obtained. That is,
The present invention does not exert a sufficient effect only with the composite structure alone, and the sufficient effect exhibited by the present invention cannot be exerted only by setting the contact alloy composition within the composition range shown in the present application. Even in the case of a composite structure, unless the contact alloy composition is within the above range, high welding resistance cannot be realized. On the other hand, even when the contact alloy composition alone is in the composition range of the present application, excellent temperature characteristics cannot be realized unless the composite structure is used. It is.

【0024】従って、本願においては接点合金組成と複
合構造の組み合わせは極めて重要な相互に改善すべき特
性を補填しあう関係をもつものである。本願が明らかに
する接点合金組成や、複合構造の最適な範囲は、それぞ
れの値を任意に選択したものではなく、この様に複合構
造と接点合金組成が相互に依存し合う関係を持つ事を明
らかにした上で、その複合構造の場合において優れた特
性を示す接点合金組成範囲を研究の結果明らかにしたも
のである。
Therefore, in the present application, the combination of the contact alloy composition and the composite structure has a relationship that complements the extremely important properties to be improved. The contact alloy composition and the optimum range of the composite structure revealed in the present application are not arbitrarily selected from the respective values, and thus the composite structure and the contact alloy composition have a mutually dependent relationship. After clarifying, the research clarified the contact alloy composition range that shows excellent characteristics in the case of the composite structure.

【0025】[0025]

【発明の実施の形態】本願は、主として定格電流が10
0A以下、特に30A〜60Aのブレーカーに適した電
気接点について、その理想的複合構造及び接点合金組成
を検討した結果を開示するものである。ただし、その接
点は定格電流225Aや400Aのブレーカーには使用
し得ないものではない。
BEST MODE FOR CARRYING OUT THE INVENTION
The present invention discloses the results of a study on an ideal composite structure and a contact alloy composition of an electrical contact suitable for a breaker of 0 A or less, particularly 30 A to 60 A. However, the contact is not something that cannot be used for a breaker with a rated current of 225 A or 400 A.

【0026】発明者は、主として100A以下用接点と
して最適な接点合金組成と構造を探索した結果、接点の
構造を図1のように中央層1の外周に外周層2を配した
複合構造にすることが良いことを見出した。この複合構
造の接点表面と反対の面には図2に示すように純Ag層
があっても良い。この純Ag層はろう付け性を良くする
ために用いられるものであり本願はこの層があることを
妨げるものではない。
The inventor of the present invention has searched for an optimum contact alloy composition and structure mainly for a contact of 100 A or less, and as a result, the structure of the contact has a composite structure in which an outer peripheral layer 2 is arranged on the outer periphery of a central layer 1 as shown in FIG. I found that it was good. A surface of the composite structure opposite to the contact surface may have a pure Ag layer as shown in FIG. This pure Ag layer is used for improving the brazing property, and the present invention does not prevent the existence of this layer.

【0027】また、図1や図2のように外周層2厚みは
中央層と同じでも良いし、図3(a)、図3(b)のよ
うに外周層2は表面部8にのみあっても良い。例えば接
点厚みの半分(1/2)の厚みであっても良い。図3の
ように表面部8にのみ外周層を配置する場合には、この
外周層は平均5μm以上の厚み、より望ましくは10μ
m以上の厚みがあることが望ましい。これは厚みが薄い
と外周層を配した効果が認め難くなるからであり、実験
の結果5μm未満ではその効果がないわけではないにし
てもその効果は少なく、望ましくは10μm以上必要で
ある。
The thickness of the outer peripheral layer 2 may be the same as that of the central layer as shown in FIGS. 1 and 2, or the outer peripheral layer 2 is only provided on the surface 8 as shown in FIGS. 3 (a) and 3 (b). May be. For example, the thickness may be half (1/2) of the contact thickness. When the outer peripheral layer is arranged only on the surface portion 8 as shown in FIG. 3, the outer peripheral layer has an average thickness of 5 μm or more, more preferably 10 μm or more.
m or more. This is because the effect of arranging the outer peripheral layer is difficult to be recognized when the thickness is small. As a result of the experiment, if the thickness is less than 5 μm, the effect is small, if not ineffective, and desirably 10 μm or more.

【0028】ブレーカーは機種によって特徴がある(バ
ネ圧や引き外し力など)ため、この外周層の接点厚み
は、一概に何μmでないといけないとは決めがたく5μ
m未満であってもその効果が認められる。しかしなが
ら、多くの場合は5μm以上有ることが好ましく、10
μmではより有効に本願の効果が認められた。
Since the breaker has characteristics depending on the model (spring pressure, tripping force, etc.), it is hard to determine that the contact thickness of the outer peripheral layer must be unconditionally several μm, ie, 5 μm.
Even if it is less than m, the effect is recognized. However, in many cases, it is preferably 5 μm or more,
At μm, the effect of the present application was more effectively recognized.

【0029】又、マイクロビッカース硬度135mHv
未満である中央層の中には、図3(b)に示すように1
部にマイクロビッカース硬度135mHv以上の層1−
1が中央層の70%以下の範囲で存在してもかまわな
い。これは、この範囲内であれば、マイクロヒ゛ッカース硬度13
5mHv未満の中央層が存在する効果を失わないし、場
合により耐溶着性が向上する場合があることが判ったか
らである。
The micro Vickers hardness is 135 mHv.
In the middle layer that is less than one, as shown in FIG.
Layer having a micro Vickers hardness of 135 mHv or more
1 may be present in a range of 70% or less of the central layer. If the hardness is within this range, the micro-Hickers hardness is 13
This is because it has been found that the effect of the presence of the central layer of less than 5 mHv is not lost, and the welding resistance may be improved in some cases.

【0030】電気接点の下部にCuビス部4がある例
(図4、5、6、7)を示した。Cuビス部を有した電
気接点は、定格電流が100A以下で広く一般的に用い
られ、例えばカシメにより図8に示すような基材7に結
合されることが多い。このCuビス部は接点性能に大き
な影響はなく、あってもなくても良い。
Examples in which a Cu screw portion 4 is provided below the electric contact (FIGS. 4, 5, 6, and 7) are shown. An electric contact having a Cu screw portion has a rated current of 100 A or less and is widely and generally used, and is often coupled to the base member 7 as shown in FIG. 8 by, for example, caulking. The Cu screw portion does not significantly affect the contact performance and may or may not be present.

【0031】図1〜7に於いて、本願発明の電気接点は
マイクロビッカース硬度135mHv未満の中央層1の
外周にマイクロビッカース硬度135mHv以上の外周
層2を配し、接点表面が平面になるように複合化させた
構造であり、この外周層面積は接点表面の外周縁より3
2.7%以上91.0%以下の領域を占める。
1 to 7, an electric contact according to the present invention has an outer peripheral layer 2 having a micro Vickers hardness of 135 mHv or more disposed on the outer periphery of a central layer 1 having a micro Vickers hardness of less than 135 mHv so that the contact surface becomes flat. The outer layer area is 3 mm from the outer edge of the contact surface.
Occupies an area of 2.7% or more and 91.0% or less.

【0032】もしこの外周層が32.7%未満である
と、外周層を配した効果が認めがたくなるため耐溶着性
能と一部の温度特性が悪くなる。逆に91.0%を越え
ると温度特性が悪くなる。より好ましくは32.7%以
上69.8%未満がよい。この範囲の方が、より安定し
た耐溶着・温度特性が得られるからである。中央層及び
外周層の接点合金組成はともに重量%でCdが8.0%
以上25.0%以下、Snが1.1%以上5%以下、N
iが0.07%以上3%以下である。(%は、重量%で
ある。以下同じ。)
If the content of the outer peripheral layer is less than 32.7%, the effect of disposing the outer peripheral layer is hardly recognized, so that the welding resistance and some temperature characteristics are deteriorated. Conversely, if it exceeds 91.0%, the temperature characteristics deteriorate. More preferably, it is 32.7% or more and less than 69.8%. This is because in this range, more stable welding resistance and temperature characteristics can be obtained. The contact alloy composition of the central layer and the outer peripheral layer is both weight% and Cd is 8.0%.
Not less than 25.0%, Sn is not less than 1.1% and not more than 5%, N
i is 0.07% or more and 3% or less. (% Is% by weight. The same applies hereinafter.)

【0033】また、この接点合金組成について、Cd濃
度が8.0%未満であると、耐溶着性が低くなり、2
5.0%を越えてCd濃度が高くなるにつれ製造ができ
にくくなり、凝集と呼ばれる酸化物の堆積した部分が接
点内部に発生しやすく接点の温度特性上好ましくない。
If the Cd concentration of this contact alloy composition is less than 8.0%, the welding resistance is lowered, and
As the Cd concentration becomes higher than 5.0%, the production becomes difficult, and a portion of the oxide, called agglomeration, on which the oxide is deposited tends to be generated inside the contact, which is not preferable in terms of the temperature characteristics of the contact.

【0034】Sn濃度が1.1%未満であると耐溶着性
が低く、5%を越えると、温度特性の内、初期温度特性
と過負荷試験後の温度特性が劣化する。Niに関して
は、0.07%未満であると耐溶着性が低く、3%を越
えると製造が困難となり、また温度特性が悪くなる。特
にCdが8.0%以上25.0%以下、Snが1.2%
以上4%以下、Niが0.22%以上0.7%以下であ
る事が望ましい。
If the Sn concentration is less than 1.1%, the welding resistance is low, and if it exceeds 5%, the initial temperature characteristics and the temperature characteristics after the overload test among the temperature characteristics deteriorate. Regarding Ni, if it is less than 0.07%, the welding resistance is low, and if it exceeds 3%, the production becomes difficult and the temperature characteristics deteriorate. In particular, Cd is 8.0% or more and 25.0% or less, and Sn is 1.2%.
It is preferable that the Ni content is not less than 0.2% and not more than 0.7%.

【0035】なお定格電流60A以下クラスのブレーカ
ー用電気接点としては、Cdが14.0%以上25.0
%以下、Snが2.4%以上4%以下、Niが0.24
%以上0.7%以下にすると、多少温度特性は劣化する
が、耐溶着特性は高くなり、このクラスのブレーカーに
は最適である。
The breaker electrical contact having a rated current of 60 A or less has a Cd of 14.0% or more and 25.0 or more.
%, Sn is 2.4% or more and 4% or less, and Ni is 0.24% or less.
When it is set to be not less than 0.7% and not more than 0.7%, the temperature characteristic is slightly deteriorated, but the welding resistance is increased, and it is optimal for a breaker of this class.

【0036】また、耐溶着性や、温度特性改善のために
添加するSbは0%以上2%以下、Caは0%以上0.
3%以下、Biは0%以上1%以下、Znは0%以上2
%以下、Coは0%以上0.5%以下、Inは0%以上
5%以下の範囲が良い。 これらの元素は、基本的にC
d、Sn、Niの濃度が上記範囲にある限り、本願の意
図する100A以下のブレーカーに適した接点性能が期
待できることが分かった。
Sb added for improving the welding resistance and temperature characteristics is 0% or more and 2% or less, and Ca is 0% or more and 0.1% or less.
3% or less, Bi is 0% or more and 1% or less, Zn is 0% or more and 2% or less.
% Or less, Co is 0% or more and 0.5% or less, and In is 0% or more and 5% or less. These elements are basically C
It was found that as long as the concentrations of d, Sn, and Ni are within the above ranges, contact performance suitable for a breaker of 100 A or less intended by the present application can be expected.

【0037】勿論、ブレーカーの性能評価に於ける規格
値(上述の温度や耐溶着性能の規格値)が緩和されれば、
例えばSn濃度は1.1%未満や、5%を越える値であ
っても使用に耐えない訳ではなく、発明者もその様にな
る可能性があり得ることや1.1%未満や、5%を越え
る値であっても使用し得ることは知っているが、ブレー
カーが安全上重要な装置であることや、実使用に於いて
どの様な製品でもバラツキが存在することを考慮にいれ
た場合、やはり上記のSn範囲であることが望ましいと
考える。同様のことはCd、Niについても当てはま
る。
Of course, if the standard values in the performance evaluation of the breaker (the above-mentioned standard values of the temperature and the welding resistance) are relaxed,
For example, even if the Sn concentration is less than 1.1% or more than 5%, it does not mean that it is not usable, and the inventor may be able to do so. We know that even if the value exceeds%, we have taken into account that the breaker is an important device for safety and that there is variation in any product in actual use. In this case, it is considered that it is desirable that the above-mentioned Sn range is still satisfied. The same applies to Cd and Ni.

【0038】一般に接点の含有元素は上記のごとき元素
であるが、Cd、Sn、Ni、Sb、Ca、Bi、Z
n、Co、In以外の元素を微量に添加しても、本願の
示す複合構造にした場合に同様の効果が期待できること
は容易に想像しうるところである。逆に言うなら、本願
は、本願が示す接点構造およびCd,Sn,Niの接点
合金組成の範囲で本願が示す効果を損なわない程度に微
量添加元素を添加することを禁じるものではない。
In general, the elements contained in the contact are the elements as described above, but Cd, Sn, Ni, Sb, Ca, Bi, Z
It is easy to imagine that the same effect can be expected in the case of the composite structure shown in the present application even if a small amount of elements other than n, Co, and In are added. In other words, the present application does not prohibit the addition of a trace amount of an additive element to such an extent that the effect of the present application is not impaired within the range of the contact structure and the contact alloy composition of Cd, Sn, and Ni shown in the present application.

【0039】外周層のCd、Sn、Ni、Sb、Ca、
Bi、Zn、Co、In濃度は請求項第4項〜第7項の
範囲内にある限り、中央層の濃度より高くとも低くとも
良い。また、Auのごとき高価な元素を表面部に用いる
必要もない。
Cd, Sn, Ni, Sb, Ca,
The concentrations of Bi, Zn, Co, and In may be higher or lower than the concentration of the central layer as long as they are within the range of claims 4 to 7. Further, it is not necessary to use an expensive element such as Au for the surface portion.

【0040】更に外周層2と中央層1を複合させる方法
については、蒸着、減圧中での溶射、粉末の焼結、酸洗
浄・焼鈍後のはめ合わせ法、外周層となるべき板と中央
層となるべき板を打ち抜きにより成形する方法、HI
P、押出による方法、外周層と中央層を別個に作製した
後鍛造で接点形状に成形する方法、のどれを用いても接
点の構造と合金組成が本願の示す構造と合金組成の範囲
にある限り同様の効果が期待できるものである。
Further, the outer layer 2 and the center layer 1 are combined by vapor deposition, thermal spraying under reduced pressure, sintering of powder, fitting after acid cleaning / annealing, a plate to be the outer layer and the center layer. Method of forming a plate to be formed by punching, HI
Regardless of P, a method by extrusion, a method of forming an outer peripheral layer and a central layer separately and then forging into a contact shape, the structure and alloy composition of the contact are within the range of the structure and alloy composition shown in the present application. As long as the same effect can be expected.

【0041】このほかにも外周層と中央層を別個に作製
した後ミクロな溶接で接合する方法や焼きばめ、冷やし
ばめ、メッキも考えられ、上記と同様に接点の構造と合
金組成が本願の示す構造と合金組成の範囲にある限り同
様の効果が期待できるが、コスト及び品質の安定した製
品を安価に量産するという観点から量産性に欠け、また
接合界面の清浄性を維持するという面から必ずしも望ま
しくない。
In addition, a method in which the outer peripheral layer and the central layer are separately formed and then joined by micro welding, shrink fitting, cold fitting, and plating are also conceivable. The same effect can be expected as long as it is within the range of the structure and alloy composition shown in the present application, but it lacks mass productivity from the viewpoint of mass production of products with stable cost and quality at low cost, and also maintains the cleanliness of the bonding interface. It is not always desirable from the viewpoint.

【0042】なお一般に内部酸化した接点には表面から
内部に向かっての緩やかな濃度勾配が一般に見られる
が、本願の複合構造は勿論この内部酸化に見られる一般
的な濃度勾配を示すものではなく、図3、図6、図7の
ように表面近くにのみ外周層2を形成する場合であって
も、中央層1との境界面における数μm幅の境界部に於
ける連続的な硬度や組織の変化はあっても、例えば光学
顕微鏡などによる組織観察において、明らかに外周層2
と中央層1とは異なる組織の違いとマイクロビッカース
における硬度の違いを呈するものである。
In general, a gradual concentration gradient from the surface toward the inside is generally observed at the internally oxidized contact. However, the composite structure of the present invention, of course, does not exhibit the general concentration gradient observed in the internal oxidation. Even if the outer peripheral layer 2 is formed only near the surface as shown in FIG. 3, FIG. 6 and FIG. Although there is a change in the structure, the outer layer 2 is clearly observed, for example, in the structure observation using an optical microscope.
The difference between the microstructure and the center layer 1 is different from that of the microlayer Vickers.

【0043】図3、図6のように外周層が接点の表面近
くにしかない場合、この外周層の厚みは平均で5μm以
上であることが望ましいが、この場合には、外周層は非
常に薄いことになる。しかし本願においては少なくと
も、外周層とは、例えば接点表面から数μm以下の極表
面に接点面全面に施すAgメッキを指すのではない。本
願は硬度の高い(135mHv以上)層を外周部のみに
形成させた物であり上記のメッキとは根本的に異なる。
When the outer peripheral layer is located only near the surface of the contact as shown in FIGS. 3 and 6, it is desirable that the outer peripheral layer has an average thickness of 5 μm or more. In this case, the outer peripheral layer is very thin. Will be. However, in the present application, at least the outer peripheral layer does not refer to, for example, Ag plating applied to the entire contact surface on an extremely small surface of several μm or less from the contact surface. In the present application, a layer having a high hardness (135 mHv or more) is formed only on the outer peripheral portion, and is fundamentally different from the above plating.

【0044】但し、工業製品であり、またどの様な接点
においても合金組成や組織は多少の濃度勾配や組織、硬
度の変化は見られるものであるという意味から、外周層
及び中央層のそれぞれに於いて、一般的な内部酸化材に
見られる濃度勾配はあってもかまわない。濃度勾配に伴
う硬度分布の勾配も、外周層は135mHv以上、中央
層では135mHv未満の範囲であれば、濃度勾配に伴
う硬度分布の勾配があってもかまわない。
However, since it is an industrial product, and the alloy composition and structure of any contact point show a slight change in concentration gradient, structure, and hardness, the outer layer and the center layer are different from each other. In this case, there may be a concentration gradient found in a general internal oxidizing material. The gradient of the hardness distribution accompanying the concentration gradient may have a gradient of the hardness distribution according to the concentration gradient as long as it is in the range of 135 mHv or more in the outer peripheral layer and less than 135 mHv in the central layer.

【0045】また、従来例として、ビス形状の接点の製
造工程において銅台金とAg合金を接合するために炉中
を通す熱処理を行うことがある。この場合、Ag合金の
表面近傍のCdが炉中に散逸してしまうことがあり、こ
のために表面の硬度が多少低くなる可能性がある。この
様な場合には、本願の示すような中央層と外周層の硬度
分布や中央層と外周層の硬度配置を管理することがむつ
かしいのが通常であって、その硬度値も本願が示すよう
な低い値ではないので本願の意図するものと異なる。
Further, as a conventional example, in a manufacturing process of a screw-shaped contact, there is a case where heat treatment is performed in a furnace to join a copper base metal and an Ag alloy. In this case, Cd in the vicinity of the surface of the Ag alloy may be dissipated into the furnace, so that the hardness of the surface may be slightly reduced. In such a case, it is usually difficult to manage the hardness distribution of the center layer and the outer layer and the hardness arrangement of the center layer and the outer layer as shown in the present application, and the hardness value is also shown in the present application. Since it is not a very low value, it differs from what is intended by the present application.

【0046】本願においては、Sbは0%以上2%以
下、Caは0%以上0.3%以下、Biは0%以上1%
以下、Znは0%以上2%以下、Coは0%以上0.5
%以下、Inは0%以上5%以下の範囲のAg合金であ
っても、請求項7記載の範囲に属する限りにおいて差し
支えないのと同様に、他の元素が添加されることを妨げ
るものではない。
In the present application, Sb is 0% or more and 2% or less, Ca is 0% or more and 0.3% or less, and Bi is 0% or more and 1% or less.
Hereinafter, Zn is 0% or more and 2% or less, and Co is 0% or more and 0.5% or less.
% Or less, and even if the In alloy is in the range of 0% or more and 5% or less, as long as it falls within the scope of claim 7, it does not prevent addition of other elements. Absent.

【0047】さらに公知例であるように、例えば通常
0.001%以上5%以下添加されるCe、0.1%以
上6.2%以下添加されるSb、0.01%以上5%以
下添加されるLi、0.05%以上10%以下添加され
るSi、0.01%以上0.5%以下添加されるFe、
0.05%以上0.1%以下添加されるPb、0.00
1%以上5%以下添加されるCrとSr、0.5%以上
5%以下添加されるTi、0.5%以上5%以下添加さ
れるTe、0.5%以上5%以下添加されるMn、0.
01%以上3%以下添加されるAlF3とMgF2とC
rF3とCaF2、1%以上3%以下添加されるGeと
Ga、0.01%以上0.1%以下添加されるMgを添
加することを妨げるものではない。これらの場合に於い
ても請求項に記載する構成の範囲にある限りにおいて
は、これら元素がない場合と同様の効果が期待できるか
らであり、本願の有益な効果を損なわない程度にこれら
の他元素を混ぜることを本願は妨げるものではないから
である。
Further, as is well known, for example, Ce is usually added at 0.001% or more and 5% or less, Sb is added at 0.1% or more and 6.2% or less, and 0.01% or more and 5% or less is added. Li added, Si added at 0.05% or more and 10% or less, Fe added at 0.01% or more and 0.5% or less,
Pb added at 0.05% or more and 0.1% or less, 0.00
Cr and Sr added at 1% to 5%, Ti added at 0.5% to 5%, Te added at 0.5% to 5%, and 0.5% to 5% added Mn, 0.
AlF3, MgF2 and C added in the range of 01% to 3%
This does not prevent the addition of rF3 and CaF2, Ge and Ga added at 1% to 3%, and Mg added at 0.01% to 0.1%. In these cases, the same effects as those without these elements can be expected as long as they are within the scope of the configuration described in the claims. This is because the present application does not prevent mixing of elements.

【0048】(実施例1) 縦4mm、横4mm、厚さ
1mm及び縦4mm、横4mm、厚さ1.2mmの一対
(図8の可動接点5と固定接点6に該当する。なお、図
1〜7は、説明上、固定接点を示している。)の電気接
点のいずれも厚みの10%の純Ag層付きとし、外周層
となる蒸着層形成部の凹み(表5、6に該凹みの領域と
して、外周層割合も示す。)を0.8mm深さにし、接
点合金組成が、表1、2(方法の欄に「プ」との記載が
該当する。表3〜6も同じ。)になるような接点中央層
を作製し、その表面(純Agとは反対側の面)に減圧プ
ラズマ溶射法にてアルゴンと水素ガス(Ar+H2)の
雰囲気中で表3、4の組成の合金粉末を溶射し外周層を
形成した。なお、表1は、中央層の接点合金組成、表2
は、同じく中央層の接点合金組成で、比較例を示す。
Example 1 A pair of 4 mm long, 4 mm wide, 1 mm thick and 4 mm long, 4 mm wide, 1.2 mm thick (corresponds to the movable contact 5 and the fixed contact 6 in FIG. 8; FIG. 7 to 7 indicate fixed contacts for the sake of explanation). Each of the electrical contacts has a pure Ag layer having a thickness of 10%, and the recesses in the vapor deposition layer forming portion serving as the outer peripheral layer (Tables 5 and 6 show the recesses). , The outer peripheral layer ratio is also shown as 0.8%), and the contact alloy composition is as shown in Tables 1 and 2 ("P" in the column of the method. The same applies to Tables 3 to 6). ) Is formed, and the surface (the surface opposite to the pure Ag) of the alloy having the composition shown in Tables 3 and 4 is formed by a reduced pressure plasma spray method in an atmosphere of argon and hydrogen gas (Ar + H2). The powder was sprayed to form an outer peripheral layer. Table 1 shows the contact alloy composition of the center layer, and Table 2
Is a contact alloy composition of the center layer, and shows a comparative example.

【0049】[0049]

【表1】 [Table 1]

【0050】[0050]

【表2】 [Table 2]

【0051】原料にはプレアロイ粉末を用い、粉末粒径
は1μm以下から2μmまでの粉末を用いた。フィード
用のキャリアーガスにはArを用いた。また溶射中には
溶射ガンの先端を自動制御にて揺動させ均一溶射層の形
成をはかるとともに、サブストレイになる電気接点内部
層と溶射層の密着性をあげる目的で、サブストレイをプ
ラズマ災に曝して加熱後に溶射を行った。凹み部分に溶
射層を設け易いように、すなわち凹み部分以外の中央層
へ溶射をしないために、凹み部分以外の中央層へはマス
キングしておいた。なお、表3は、外周層の接点合金組
成、表4は同じく外周層の接点合金組成(比較例)を示
す。
As a raw material, a prealloy powder was used, and a powder having a particle size of 1 μm or less to 2 μm was used. Ar was used as a carrier gas for the feed. In addition, during spraying, the tip of the spray gun is swung by automatic control to form a uniform sprayed layer and, at the same time, increase the adhesion between the inner layer of the electrical contact that becomes the subsley and the sprayed layer, and apply the plasma spray to the substrate. After spraying and heating, thermal spraying was performed. In order to make it easier to provide a thermal spray layer on the concave portion, that is, to prevent thermal spraying on the central layer other than the concave portion, the central layer other than the concave portion was masked. Table 3 shows the contact alloy composition of the outer peripheral layer, and Table 4 shows the contact alloy composition of the outer peripheral layer (Comparative Example).

【0052】[0052]

【表3】 [Table 3]

【0053】[0053]

【表4】 [Table 4]

【0054】その結果得た酸化後の電気接点の構造と硬
度は表5、6の通りである。これら接点を定格100A
以下のブレーカーにおいて、220V、5kAの遮断電
流にて遮断試験と、初期温度測定、過負荷試験後の温度
特性、耐久試験後の温度特性、短絡試験後の温度特性を
評価した結果を表5(本願発明の評価結果)、表6(比
較例の評価結果)に示す。なお、表5のH(*)表示の
欄は、中央層の内にマイクロビッカ−ス硬度135mH
v以上の領域が10%存在する3層構造の場合である。
Tables 5 and 6 show the structure and hardness of the resulting electrical contacts after oxidation. These contacts are rated 100A
In the following breakers, the results of the breaking test at 220 V, 5 kA breaking current and the evaluation of the initial temperature measurement, the temperature characteristics after the overload test, the temperature characteristics after the durability test, and the temperature characteristics after the short circuit test are shown in Table 5 ( The results are shown in Table 6 (Evaluation results of Comparative Example). In addition, the column of H (*) display in Table 5 shows that the micro Vickers hardness is 135 mH in the center layer.
This is a case of a three-layer structure in which 10% or more regions exist.

【0055】[0055]

【表5】 [Table 5]

【0056】[0056]

【表6】 [Table 6]

【0057】過負荷試験条件は定格電流の6倍とし50
回、耐久試験は定格電流にて5000回の試験を行っ
た。評価を図4に示すようにCuビス部付きで行う場合
は、ろう付けまたは加熱・加圧による直接接合にてCu
ビス部を作製した。なお、評価結果は、評価ブレーカー
によって異なるため、総合評価を5〜1で示した。最も
優れた結果を5、使用可能の下限を3、最も劣る結果を
1で示している。
The overload test conditions were 6 times the rated current and 50
And the endurance test was performed 5000 times at the rated current. When the evaluation is performed with a Cu screw portion as shown in FIG. 4, Cu bonding is performed by brazing or direct bonding by heating and pressing.
A screw portion was prepared. In addition, since the evaluation results differed depending on the evaluation breaker, the overall evaluation was shown as 5-1. The best result is indicated by 5, the lower usable limit is indicated by 3, and the worst result is indicated by 1.

【0058】(実施例2) 縦4mm、横4mm、厚さ
1mm及び縦4mm、横4mm、厚さ1.2mmの一対
の電気接点、及び直径6mm厚さ1.5mmの同じ大き
さ一対の電気接点の、各々いずれも厚みの10%の純A
g層付きとし、外周層となる蒸着層形成部の凹みを50
μm深さに設け、表1、2(方法の欄に「蒸」と記載が
該当する。表3〜6も同じ。)の接点合金組成を有する
接点の内部層となる接点基材の表面(純Agとは反対側
の面)に、表3、4の接点合金組成を有するターゲット
を用いて、マグネトロンスパッター法により蒸着を行っ
た。
Example 2 A pair of electrical contacts having a length of 4 mm, a width of 4 mm, a thickness of 1 mm and a length of 4 mm, a width of 4 mm, and a thickness of 1.2 mm, and a pair of electrical contacts having a diameter of 6 mm and a thickness of 1.5 mm Contact points, each of which is 10% pure A
g layer, and the dent of the vapor deposition layer
A surface of a contact base material which is provided at a depth of μm and has an inner layer of a contact having a contact alloy composition shown in Tables 1 and 2 (the description of “steam” in the column of “method”; the same applies to Tables 3 to 6) Using a target having the contact alloy composition shown in Tables 3 and 4, vapor deposition was performed on the surface opposite to the pure Ag by magnetron sputtering.

【0059】基材7の温度はSnの再蒸発を防止するた
めに200℃に保持し、Ar雰囲気で圧力を数トル(to
rr)から数10トル(torr)に保った。また、基材であ
る接点内部と蒸着層である外周層との密着性を良くする
ために、予め接点中央層となる接点基材の表面は高周波
により発生したイオンによりクリーニングを施した後蒸
着を行った。得られた接点を酸化した後、これら接点を
実施例1と同じ条件の遮断試験、初期温度測定、過負荷
試験後の温度特性、過負荷試験後の温度特性、短絡試験
後の温度特性を評価した結果を硬度とともに表5、6に
示した。
The temperature of the base material 7 is maintained at 200 ° C. in order to prevent re-evaporation of Sn, and the pressure is reduced to several torr (to
rr) to a few tens of torr (torr). In addition, in order to improve the adhesion between the inside of the contact, which is the base material, and the outer peripheral layer, which is the vapor deposition layer, the surface of the contact base material, which is to be the contact center layer, is previously cleaned with ions generated by high frequency and then subjected to vapor deposition. went. After the obtained contacts were oxidized, these contacts were evaluated for the breaking test, initial temperature measurement, temperature characteristics after overload test, temperature characteristics after overload test, and temperature characteristics after short circuit test under the same conditions as in Example 1. The results are shown in Tables 5 and 6 together with the hardness.

【0060】(実施例3) 接点合金組成が、表1、2
(方法の欄に「粉」と記載が該当する。表3〜6も同
じ。)になるように、図9に示す中央層に相当するAg
合金チップ10(純Ag層11を配する場合は厚みの1
0%とした)を作製し酸化後した後、その外側に表3、
4の組成(表1、2と同一組成)の酸化後の外周層に相
当するAg合金粒9を配し、加圧成形の後、真空雰囲気
中の融点下30Kの温度で焼結した。得られた複合合金
チップ12にコイニングを施し、約650℃で焼鈍し
た。これにより縦4mm、横4mm、厚さ1mm及び縦
4mm、横4mm、厚さ1.2mmの一対の電気接点を
作製した。
Example 3 The contact alloy compositions were as shown in Tables 1 and 2.
(Ag corresponds to the central layer shown in FIG. 9) so that “Powder” is described in the method column. The same applies to Tables 3 to 6.
Alloy chip 10 (when the pure Ag layer 11 is provided,
0%) and after oxidation, Table 3,
Ag alloy grains 9 corresponding to the oxidized outer peripheral layer having the composition of No. 4 (the same composition as in Tables 1 and 2) were arranged, pressed, and sintered at a temperature of 30K below the melting point in a vacuum atmosphere. The obtained composite alloy chip 12 was coined and annealed at about 650 ° C. Thus, a pair of electrical contacts having a length of 4 mm, a width of 4 mm, and a thickness of 1 mm, and a length of 4 mm, a width of 4 mm, and a thickness of 1.2 mm were produced.

【0061】これら接点を実施例1と同じ条件の遮断試
験、初期温度測定、過負荷試験後の温度特性、過負荷試
験後の温度特性、短絡試験後の温度特性を評価した結果
を硬度とともに表5、6に示す。
These contacts were evaluated for the breaking test, the initial temperature measurement, the temperature characteristics after the overload test, the temperature characteristics after the overload test, and the temperature characteristics after the short-circuit test under the same conditions as in Example 1 together with the hardness. 5 and 6.

【0062】(実施例4) 中央層となる表1、2(方
法の欄に「酸+焼」と記載が該当する。表3〜6も同
じ。)の組成の純Ag層付きの部材を酸性溶液に浸け表
面の汚れを除去し清浄にした後、焼鈍し合金を軟らかく
した。この周りに、接点合金組成が、表3、4になるよ
うな外周層となるべきリング状の部材を作製し、嵌めあ
わせた後更に焼鈍し拡散により一体化した。
(Example 4) A member having a pure Ag layer having a composition of Tables 1 and 2 (the description of "acid + baking" in the column of the method; the same applies to Tables 3 to 6) as the central layer was used. After being immersed in an acidic solution to remove and clean the surface, the alloy was annealed to soften the alloy. Around this, a ring-shaped member to be an outer peripheral layer having a contact alloy composition as shown in Tables 3 and 4 was produced, and after being fitted, further annealed and integrated by diffusion.

【0063】その結果得た酸化後の複合接点の構造と硬
度を表5、6に示した。これら接点を実施例1と同じ条
件にて遮断試験と、初期温度測定、過負荷試験後の温度
特性、過負荷試験後の温度特性、短絡試験後の温度特性
を評価した。
Tables 5 and 6 show the structure and hardness of the resulting composite contact after oxidation. These contacts were subjected to a cutoff test, initial temperature measurement, temperature characteristics after an overload test, temperature characteristics after an overload test, and temperature characteristics after a short circuit test under the same conditions as in Example 1.

【0064】(実施例5) 接点合金組成が表1、2
(方法の欄に「板」と記載が該当する。表3〜6も同
じ。)になるような中央層となるべき純Ag層付きAg
合金板を作製し、表3、4の組成の合金板とともに打ち
抜き加工し、中央層と外周層とからなる複合構造の合金
に形成した。なお、外周層は中央層より鍛錬比を30%
高くして鍛造した。その後焼鈍を温度700℃で5時間
行った。
Example 5 The contact alloy compositions were as shown in Tables 1 and 2.
(A description of “plate” corresponds to the column of the method. The same applies to Tables 3 to 6.) Ag with a pure Ag layer to be the central layer.
An alloy plate was prepared and punched together with an alloy plate having the composition shown in Tables 3 and 4 to form an alloy having a composite structure including a central layer and an outer peripheral layer. The outer layer has a forging ratio of 30% compared to the central layer.
It was raised and forged. Thereafter, annealing was performed at a temperature of 700 ° C. for 5 hours.

【0065】その後酸化して得た複合構造の接点の構造
と硬度を表3に示した。これら接点を実施例1と同じ条
件にて遮断試験と、初期温度測定、過負荷試験後の温度
特性、過負荷試験後の温度特性、短絡試験後の温度特性
を評価した。
Table 3 shows the structure and hardness of the contact having the composite structure obtained by oxidation. These contacts were subjected to a cutoff test, initial temperature measurement, temperature characteristics after an overload test, temperature characteristics after an overload test, and temperature characteristics after a short circuit test under the same conditions as in Example 1.

【0066】(実施例6) 接点合金組成が表1、2
(方法の欄に「HIP」と記載が該当する。表3〜6も
同じ。)となるような中央層となるべき銀合金棒13を
作製し、酸化し、その表面に、表3、4の組成の銀合金
円筒材14を嵌合し、銀合金棒と銀合金円筒材との外境
界部16を溶接にて気密とした。図10(a)には、嵌
合した部材15を示している。その後、温度700℃で
圧力1800kg/cm2、2時間の条件でArガス中
にてHIPを行い、複合構造の棒材を得た。
Example 6 The contact alloy compositions were as shown in Tables 1 and 2.
(The description of "HIP" corresponds to the column of the method. The same applies to Tables 3 to 6.) A silver alloy rod 13 to be a central layer is prepared and oxidized, and the surface thereof is oxidized. The silver alloy cylindrical material 14 having the following composition was fitted, and the outer boundary 16 between the silver alloy rod and the silver alloy cylindrical material was welded to be airtight. FIG. 10A shows the fitted member 15. Thereafter, HIP was performed in an Ar gas at a temperature of 700 ° C. and a pressure of 1800 kg / cm 2 for 2 hours to obtain a composite-structured bar.

【0067】これを長手方向に垂直な方向から切断し円
板状接点に仕上げ純Ag層を貼り合わせた。この円板状
接点を実施例1と同じ条件にて遮断試験、初期温度測
定、過負荷試験後の温度特性、過負荷試験後の温度特
性、短絡試験後の温度特性を評価した。
This was cut from a direction perpendicular to the longitudinal direction, and a finished pure Ag layer was bonded to a disc-shaped contact. This disk-shaped contact was evaluated under the same conditions as in Example 1 for a breaking test, initial temperature measurement, temperature characteristics after an overload test, temperature characteristics after an overload test, and temperature characteristics after a short-circuit test.

【0068】又、これとは別に、銀合金円筒材14−1
の中にあらかじめ銀合金棒13−1を嵌合し、溶接にて
気密とした後に、銀合金円筒材14に嵌合し、溶接にて
気密とした3重構造の嵌合した部材15−1(図10
(b)に示す。)についても同様に実施例1と同じ条件
にて評価を実施した。
Separately from this, the silver alloy cylindrical material 14-1
A silver alloy rod 13-1 is fitted in advance, air-tight by welding, and then fitted to the silver alloy cylindrical material 14, and a triple-fitted member 15-1 which is air-tight by welding. (FIG. 10
(B). ) Was also evaluated under the same conditions as in Example 1.

【0069】(実施例7) 次に、接点合金組成が表
1、2(方法の欄に「押出」と記載が該当する。表3〜
6も同じ。)の中央層1となるべき、図11に示すよう
な円柱部材17を酸化したAg合金粒を成形して作製
し、その周囲に表3、4の組成の外周層2となるべき酸
化したAg合金粒を成形して作製した円筒部材18を円
柱状に結合した直径80mm、長さ200mmの円柱ビ
レットを作製した。
Example 7 Next, the compositions of the contact alloys are shown in Tables 1 and 2 ("Extrusion" is described in the column of the method. Tables 3 to 3)
Same for 6. 11), a cylindrical member 17 as shown in FIG. 11 which is to be the central layer 1 is formed by molding oxidized Ag alloy particles, and the oxidized Ag which is to be the outer peripheral layer 2 having the composition shown in Tables 3 and 4 is formed therearound. A cylindrical billet having a diameter of 80 mm and a length of 200 mm was formed by joining cylindrical members 18 formed by molding alloy grains into a cylindrical shape.

【0070】その後温度800℃で2時間の条件でAr
雰囲気中で加熱後、熱間で押出加工を行い円柱状線材1
9とした後、円柱状線材19の長手方向と垂直な方向に
切断し円板状接点を作製した。この円板状接点の厚みの
10分の1(1/10)の厚みの純Ag層板を張り合わ
せた後酸化して、直径5mm、高さ1.5mmの接点を
作製した。接点を実施例1と同じ条件にて遮断試験と、
初期温度測定、過負荷試験後の温度特性、過負荷試験後
の温度特性、短絡試験後の温度特性を評価した。
After that, Ar was added at a temperature of 800 ° C. for 2 hours.
After heating in an atmosphere, extrude hot and perform cylindrical wire 1
After setting to 9, the cylindrical wire 19 was cut in a direction perpendicular to the longitudinal direction to produce a disc-shaped contact. A pure Ag layer plate having a thickness of one tenth (1/10) of the thickness of the disc-shaped contact was bonded and then oxidized to produce a contact having a diameter of 5 mm and a height of 1.5 mm. A breaking test was performed on the contacts under the same conditions as in Example 1,
The initial temperature measurement, the temperature characteristics after the overload test, the temperature characteristics after the overload test, and the temperature characteristics after the short circuit test were evaluated.

【0071】(実施例8) 次に、接点合金組成が表
1、2(方法の欄に「鍛」と記載が該当する。表3〜6
も同じ。)の組成の中央層となるべき図12に示すよう
な円柱21(高さの12%の厚さの純Ag層22付き)
と、表3、4の化学組成の外周層となるべきリング状部
材20(外径が円柱21と同じであるリング状)とを、
鍛造によりリング状部材20の中央に純Ag層22が入
り込み一体化した直径6mm、高さ1.8mmの形状の
円板状接点とした。
Example 8 Next, contact alloy compositions are described in Tables 1 and 2 ("Forging" is described in the column of method. Tables 3 to 6).
The same is true. )) To be a central layer having a composition as shown in FIG. 12 (with a pure Ag layer 22 having a thickness of 12% of the height) as shown in FIG.
And a ring-shaped member 20 (a ring-shaped member having the same outer diameter as the cylinder 21) to be an outer peripheral layer having the chemical composition shown in Tables 3 and 4.
The pure Ag layer 22 was inserted into the center of the ring-shaped member 20 by forging to form a disc-shaped contact having a diameter of 6 mm and a height of 1.8 mm.

【0072】この円板状接点を酸化後に実施例1と同じ
条件にて遮断試験と、初期温度測定、過負荷試験後の温
度特性、過負荷試験後の温度特性、短絡試験後の温度特
性を評価した。
After this disk-shaped contact was oxidized, a breaking test was performed under the same conditions as in Example 1, and the initial temperature measurement, the temperature characteristics after the overload test, the temperature characteristics after the overload test, and the temperature characteristics after the short-circuit test were performed. evaluated.

【0073】これら実施例1〜8の試験の結果は、比較
例とともに表1〜6に示している。すなわち、表2の比
較例((11)〜(16))は中央層の接点合金組成が
本発明から外れているもの、表4の比較例(K〜P)は
外周層の接点合金組成が本発明から外れているもの、表
6比較例は、初めの6個は外周層の接点合金組成が、次
の6個は中央層の接点合金組成が、次の3個は外周層厚
及び硬度が、最後の比較例は評価の定格電流が本発明か
ら外れている。結果的に、本発明に示した接点は比較例
に比べて明らかに優れた温度特性と耐溶着特性を示し
た。
The results of the tests of Examples 1 to 8 are shown in Tables 1 to 6 together with Comparative Examples. That is, the comparative examples ((11) to (16)) in Table 2 are those in which the contact layer alloy composition of the center layer deviates from the present invention, and the comparative examples (K to P) in Table 4 are those in which the contact layer alloy composition of the outer layer is not. Table 6 Comparative Examples deviating from the present invention show that the first six have the contact alloy composition of the outer layer, the next six have the contact alloy composition of the center layer, and the next three have the outer layer thickness and hardness. However, the final comparative example is different from the present invention in the rated current of the evaluation. As a result, the contact point shown in the present invention showed clearly superior temperature characteristics and welding resistance characteristics as compared with the comparative example.

【0074】[0074]

【発明の効果】本願は、定格電流100A以下の電気接
点に用いるに適した構造(硬度を含む。)と接点合金組
成により、優れた温度性能(初期、過負荷試験後、耐久
試験後、及び短絡遮断試験後)と優れた耐溶着性能を合
わせ持つ接点を提供することができる。
According to the present invention, excellent temperature performance (initial, after overload test, after endurance test, and excellent temperature performance) is achieved by a structure (including hardness) and a contact alloy composition suitable for use in electrical contacts having a rated current of 100 A or less. (After a short-circuit breaking test) and excellent welding resistance can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本願の固定接点の断面を示す図である。FIG. 1 is a diagram showing a cross section of a fixed contact of the present invention.

【図2】他の固定接点の断面を示す図である。FIG. 2 is a diagram showing a cross section of another fixed contact.

【図3】表面部にのみ外周層が存在する場合の固定接点
の断面を示す図である。
FIG. 3 is a diagram showing a cross section of a fixed contact in a case where an outer peripheral layer exists only on a surface portion.

【図4】図1の固定接点にCuビス部をつけた場合の接
点の断面を示す図である。
FIG. 4 is a view showing a cross section of a contact when a Cu screw portion is provided on the fixed contact of FIG. 1;

【図5】図2の固定接点にCuビス部をつけた場合の接
点の断面を示す図である。
5 is a view showing a cross section of the fixed contact in FIG. 2 when a Cu screw portion is provided.

【図6】図3(a)の固定接点にCuビス部をつけた場
合の接点の断面を示す図である。
FIG. 6 is a view showing a cross section of the contact in the case where a Cu screw portion is added to the fixed contact of FIG. 3 (a).

【図7】図3(b)の固定接点にCuビス部をつけた場
合の接点の断面を示す図である。
FIG. 7 is a view showing a cross section of the fixed contact of FIG. 3 (b) when a Cu screw portion is provided.

【図8】一対の電気接点(可動接点、固定接点)を示す
概念図である。
FIG. 8 is a conceptual diagram showing a pair of electric contacts (movable contact, fixed contact).

【図9】Ag合金チップにAg合金粒を配した複合合金
チップの断面図である。(実施例3)
FIG. 9 is a cross-sectional view of a composite alloy chip in which Ag alloy particles are arranged on an Ag alloy chip. (Example 3)

【図10】HIP前の銀合金棒、銀合金円筒材及びこれ
らの嵌合された状況を示す図である。(実施例6)
FIG. 10 is a view showing a silver alloy rod and a silver alloy cylindrical material before HIP, and a state where they are fitted. (Example 6)

【図11】熱間で押出し前と、その後を示す図である。
(実施例7)
FIG. 11 shows before and after hot extrusion.
(Example 7)

【図12】鍛造するリング状部材と純Ag層付き円柱を
示す図である。(実施例8)
FIG. 12 is a view showing a ring-shaped member to be forged and a cylinder with a pure Ag layer. (Example 8)

【符号の説明】[Explanation of symbols]

1:中央層 1−1:中央層の中の別の層 2:外周層 3:純Ag層 4:Cuビス部 5:可動接点 6:固定接点 7:基材 8:(接点)表面部 9:Ag合金粒 10:Ag合金チップ 11:純Ag層 12:複合合金チップ 13:銀合金棒(HIP前) 13−1:別の銀合金棒(HIP前) 14:銀合金円筒材(HIP前) 14−1:別の銀合金円筒材(HIP前) 15:嵌合した部材 15−1:別の嵌合した部材 16:銀合金棒と銀合金円筒材との外境界部 17:円柱部材 18:円筒部材 19:円柱状線材 20:リング状部材 21:円柱 22:純Ag層 1: Central layer 1-1: Another layer in the central layer 2: Peripheral layer 3: Pure Ag layer 4: Cu screw portion 5: Movable contact 6: Fixed contact 7: Base material 8: (Contact) surface 9 : Ag alloy particle 10: Ag alloy chip 11: Pure Ag layer 12: Composite alloy chip 13: Silver alloy rod (before HIP) 13-1: Another silver alloy rod (before HIP) 14: Silver alloy cylindrical material (before HIP) 14-1: another silver alloy cylindrical material (before HIP) 15: fitted member 15-1: another fitted member 16: outer boundary portion between silver alloy rod and silver alloy cylindrical material 17: cylindrical member 18: cylindrical member 19: columnar wire 20: ring member 21: column 22: pure Ag layer

フロントページの続き (51)Int.Cl.6 識別記号 FI C23C 14/14 C23C 14/14 D 30/00 30/00 A H01H 11/04 H01H 11/04 B (72)発明者 小林 晄▲徳▼ 兵庫県伊丹市昆陽北一丁目1番1号 住友 電気工業株式会社伊丹製作所内Continuation of the front page (51) Int.Cl. 6 Identification code FI C23C 14/14 C23C 14/14 D 30/00 30/00 A H01H 11/04 H01H 11/04 B (72) Inventor Kobayashi Akira 1-1 1-1 Kunyokita, Itami-shi, Hyogo Sumitomo Electric Industries, Ltd. Itami Works

Claims (15)

【特許請求の範囲】[Claims] 【請求項1】 定格電流が100アンペア(A)以下の
遮断器(ブレーカー)に用いる電気接点であって、少な
くとも接点表面において、マイクロビッカース硬度13
5mHv以上の外周層とマイクロビッカース硬度135
mHv未満の中央層とを複合化させた構造で、外周層面
積が接点外周縁より32.7%以上91.0%以下の構
造であることを特徴とする電気接点。
An electrical contact for use in a circuit breaker (breaker) having a rated current of 100 amperes (A) or less, wherein at least the contact surface has a micro Vickers hardness of 13
Outer layer of 5 mHv or more and micro Vickers hardness 135
An electric contact, wherein the electric contact has a structure in which a central layer having a mHv of less than mHv is compounded, and an outer peripheral layer area is 32.7% or more and 91.0% or less from an outer peripheral edge of the contact.
【請求項2】 前記中央層内にマイクロビッカース硬度
135mHv以上の層があることを特徴とする請求項1
記載の電気接点。
2. The method according to claim 1, wherein a layer having a micro Vickers hardness of 135 mHv or more is provided in the central layer.
Electrical contacts as described.
【請求項3】 前記外周層の厚みが平均で5μm以上で
あることを特徴とする請求項1又は請求項2記載の電気
接点。
3. The electrical contact according to claim 1, wherein the thickness of the outer peripheral layer is 5 μm or more on average.
【請求項4】 前記中央層及び外周層が重量%でカドミ
ウム(Cd)が8.0%以上25.0%以下、スズ(S
n)が1.1%以上5%以下、ニッケル(Ni)が0.
07%以上3%以下、不純元素が0.2%以下の銀合金
であることを特徴とする請求項1〜3のいずれか1項に
記載の電気接点。
4. The method according to claim 1, wherein the weight of the central layer and the outer peripheral layer is not less than 8.0% and not more than 25.0% of cadmium (Cd).
n) is 1.1% or more and 5% or less, and nickel (Ni) is 0.1% or more.
The electrical contact according to any one of claims 1 to 3, wherein the silver alloy is a silver alloy having a content of from 07% to 3% and an impurity element of 0.2% or less.
【請求項5】 前記中央層及び外周層が重量%でカドミ
ウム(Cd)が8.0%以上25.0%以下、スズ(S
n)が1.2%以上4%以下、ニッケル(Ni)が0.
22%以上0.7%以下の銀合金であることを特徴とす
る請求項1〜3のいずれか1項に記載の電気接点。
5. The method according to claim 1, wherein the central layer and the outer peripheral layer are in a weight percentage of cadmium (Cd) of not less than 8.0% and not more than 25.0%, and tin (Sd).
n) is 1.2% or more and 4% or less, and nickel (Ni) is 0.1% or more.
The electrical contact according to any one of claims 1 to 3, wherein the electrical contact is a silver alloy of 22% or more and 0.7% or less.
【請求項6】 定格電流60アンペア(A)以下の遮断
器(ブレーカー)に用いる電気接点は、重量%でカドミ
ウム(Cd)が14.0%以上25.0%以下、スズ
(Sn)が2.4%以上4%以下、ニッケル(Ni)が
0.24%以上0.7%以下の銀合金であることを特徴
とする請求項1〜3のいずれか1項に記載の電気接点。
6. An electrical contact used for a circuit breaker (breaker) having a rated current of 60 amperes (A) or less, wherein cadmium (Cd) is 14.0% or more and 25.0% or less and tin (Sn) is 2% by weight. The electrical contact according to any one of claims 1 to 3, wherein the electrical contact is a silver alloy of not less than 4% and not more than 4% and nickel (Ni) is not less than 0.24% and not more than 0.7%.
【請求項7】 重量%でアンチモン(Sb)が0%以上
2%以下、カルシウム(Ca)が0%以上0.3%以
下、ビスマス(Bi)が0%以上1%以下、亜鉛(Z
n)が0%以上2%以下、コバルト(Co)が0%以上
0.5%以下、インジウム(In)が0%以上5%以下
の銀合金であることを特徴とする請求項4〜6のいずれ
か1項に記載の電気接点。
7. An antimony (Sb) of 0% or more and 2% or less, a calcium (Ca) of 0% or more and 0.3% or less, a bismuth (Bi) of 0% or more and 1% or less, and a zinc (Z
7. A silver alloy wherein n) is 0% or more and 2% or less, cobalt (Co) is 0% or more and 0.5% or less, and indium (In) is 0% or more and 5% or less. An electrical contact according to any one of the preceding claims.
【請求項8】 前記接点表面の中央層となる領域の外側
に凹みを形成し、該凹みに銀合金を粉末溶射法で溶射し
て外周層を形成することを特徴とする請求項1〜3のい
ずれか1項に記載の電気接点の製造法。
8. The contact layer according to claim 1, wherein a recess is formed outside a region serving as a central layer on the surface of the contact, and a silver alloy is sprayed on the recess by a powder spraying method to form an outer peripheral layer. The method for producing an electrical contact according to any one of the preceding claims.
【請求項9】 前記接点表面の中央層となる領域の外側
に凹みを形成し、該凹みに銀合金を蒸着法で蒸着して外
周層を形成することを特徴とする請求項1〜3のいずれ
か1項に記載の電気接点の製造法。
9. The method according to claim 1, wherein a recess is formed outside a region serving as a central layer on the contact surface, and a silver alloy is deposited on the recess by a vapor deposition method to form an outer peripheral layer. A method for producing an electrical contact according to any one of the preceding claims.
【請求項10】 前記中央層を酸化された銀合金チップ
で形成し、該チップの外側に外周層となる酸化された銀
合金の粒を配し、加圧成形した後、焼結することを特徴
とする請求項1〜3のいずれか1項に記載の電気接点の
製造法。
10. The method according to claim 1, wherein the central layer is formed of an oxidized silver alloy chip, and oxidized silver alloy particles serving as an outer peripheral layer are arranged on the outer side of the chip. The method for producing an electrical contact according to any one of claims 1 to 3, wherein
【請求項11】 酸性溶液に浸漬洗浄後、焼鈍軟化した
中央層となる銀合金の周囲に、外周層となる銀合金を嵌
合し、中央層と外周層とを一体化し拡散焼鈍することを
特徴とする請求項1〜3のいずれか1項に記載の電気接
点の製造法。
11. After immersion and washing in an acidic solution, a silver alloy serving as an outer peripheral layer is fitted around a silver alloy serving as an annealed and softened central layer, and the central layer and the outer peripheral layer are integrated and diffusion-annealed. The method for producing an electrical contact according to any one of claims 1 to 3, wherein
【請求項12】 前記中央層となる銀合金板と外周層と
なる純銀(Ag)層付き銀合金板とを打ち抜き、焼鈍の
後、酸化することを特徴とする請求項1〜3のいずれか
1項に記載の電気接点の製造法。
12. The method according to claim 1, wherein the silver alloy plate as the central layer and the silver alloy plate with a pure silver (Ag) layer as the outer peripheral layer are punched, annealed, and then oxidized. 2. The method for producing an electrical contact according to claim 1.
【請求項13】 前記中央層となる銀合金棒の周囲に、
外周層となる銀合金円筒材を嵌合し、該棒と該円筒材と
の外境界部を気密溶接したのち、熱間静水圧成形(HI
P)法で複合構造の棒材を形成し、該棒材の長手方向に
対し直角に円板状接点を切り出して酸化することを特徴
とする請求項1〜3のいずれか1項に記載の電気接点の
製造法。
13. Around the silver alloy rod serving as the central layer,
After fitting a silver alloy cylindrical material serving as an outer peripheral layer and hermetically welding an outer boundary portion between the rod and the cylindrical material, hot isostatic pressing (HI
The bar according to any one of claims 1 to 3, wherein a bar having a composite structure is formed by the P) method, and a disc-shaped contact is cut out at right angles to a longitudinal direction of the bar and oxidized. Manufacturing method of electrical contacts.
【請求項14】 前記中央層となる酸化後の銀合金の粒
を成形した円柱部材の周囲に、前記銀合金の粒を成形し
た銀合金円筒部材を円柱状に結合し、熱間押出加工法で
複合構造の円柱状線材を形成し、該線材の長手方向に対
し直角に円板状接点を切り出して酸化することを特徴と
する請求項1〜3のいずれか1項に記載の電気接点の製
造法。
14. A silver alloy cylindrical member formed of silver alloy particles is bonded in a cylindrical shape around a cylindrical member formed of oxidized silver alloy particles serving as the central layer, and is subjected to hot extrusion. 4. A cylindrical wire having a composite structure is formed by cutting a disk-shaped contact at right angles to a longitudinal direction of the wire to oxidize the wire. Manufacturing method.
【請求項15】 円板状接点を中央層となる銀合金円柱
と外周層となる銀合金リング状部材とを一体化鍛造法で
形成し酸化することを特徴とする請求項1〜3のいずれ
か1項に記載の電気接点の製造法。
15. The disk-shaped contact according to claim 1, wherein a silver alloy cylinder serving as a central layer and a silver alloy ring-shaped member serving as an outer peripheral layer are formed by integral forging and oxidized. The method for producing an electrical contact according to claim 1.
JP29608897A 1996-11-01 1997-10-29 Electric contact and its manufacture Pending JPH10188710A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29608897A JPH10188710A (en) 1996-11-01 1997-10-29 Electric contact and its manufacture

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP29165996 1996-11-01
JP8-291659 1996-11-01
JP29608897A JPH10188710A (en) 1996-11-01 1997-10-29 Electric contact and its manufacture

Publications (1)

Publication Number Publication Date
JPH10188710A true JPH10188710A (en) 1998-07-21

Family

ID=26558641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29608897A Pending JPH10188710A (en) 1996-11-01 1997-10-29 Electric contact and its manufacture

Country Status (1)

Country Link
JP (1) JPH10188710A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6974923B2 (en) 2002-01-21 2005-12-13 Sumitomo Electric Industries, Ltd. Electric contact and breaker using the same
CN115216665A (en) * 2022-06-29 2022-10-21 重庆科技学院 Crystal oscillator alloy electrode and process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6974923B2 (en) 2002-01-21 2005-12-13 Sumitomo Electric Industries, Ltd. Electric contact and breaker using the same
CN115216665A (en) * 2022-06-29 2022-10-21 重庆科技学院 Crystal oscillator alloy electrode and process
CN115216665B (en) * 2022-06-29 2023-11-17 重庆科技学院 Crystal oscillator alloy electrode and process

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