JPH10186690A - Production of electrophotographic photoreceptor - Google Patents
Production of electrophotographic photoreceptorInfo
- Publication number
- JPH10186690A JPH10186690A JP34422996A JP34422996A JPH10186690A JP H10186690 A JPH10186690 A JP H10186690A JP 34422996 A JP34422996 A JP 34422996A JP 34422996 A JP34422996 A JP 34422996A JP H10186690 A JPH10186690 A JP H10186690A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- conductive substrate
- temperature
- resin
- coating solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、導電性基体を塗布
液に浸漬し、該導電性基体を該塗布液から引き上げるこ
とによって該導電性基体上に塗膜を形成する電子写真感
光体の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an electrophotographic photosensitive member in which a conductive substrate is immersed in a coating solution, and the conductive substrate is pulled up from the coating solution to form a coating film on the conductive substrate. About the method.
【0002】[0002]
【従来の技術】従来より、ドラム状の電子写真感光体の
製造方法として、生産性に優れていることから、浸漬塗
布方法が広く実施されている。この浸漬塗布方法では、
一般に、塗布液中に被塗布物である導電性基体を下降さ
せて塗布したいところまで導電性基体を浸漬させ、次い
でこの導電性基体を引き上げた後これを乾燥させること
によって、導電性基体上に塗膜を形成させており、塗布
液ダレを防止して均一な塗膜を形成することが重要であ
る。2. Description of the Related Art A dip coating method has been widely used as a method for producing a drum-shaped electrophotographic photosensitive member because of its excellent productivity. In this dip coating method,
In general, a conductive substrate, which is an object to be coated, is lowered into a coating solution, and the conductive substrate is immersed to a point where it is desired to be coated, and then the conductive substrate is pulled up and dried, so that the conductive substrate is dried. Since a coating film is formed, it is important to prevent a dripping of the coating liquid and to form a uniform coating film.
【0003】塗布液ダレを防止するため、特開昭62−
50836号公報には、導電性基体の温度を高く維持す
ることによって塗膜の乾燥を促進させる技術が開示され
ている。しかし、基体の温度のみを高く設定すると、基
体表面での塗布液粘度が上昇し、かえって液ダレを生じ
ることがある。また、特開平7−319181号公報に
は、導電性基体の温度を低く設定して導電性基体表面で
の塗布液粘度を低下させることによって、液ダレを防止
する技術が開示されている。しかし、液温に対して基体
の温度を低く設定しすぎると、塗布液浸漬中に基体の開
口部より基体が吹き出し、塗膜に著しい欠陥を生じるこ
とがある。このように、従来技術は塗布液ダレを防ぎ、
均一な塗膜を形成するという目的に対しては不十分であ
った。[0003] In order to prevent coating liquid dripping, Japanese Patent Application Laid-Open
Japanese Patent Application Publication No. 50836 discloses a technique for promoting drying of a coating film by maintaining a high temperature of a conductive substrate. However, if only the temperature of the substrate is set high, the viscosity of the coating solution on the surface of the substrate increases, and liquid dripping sometimes occurs. Japanese Patent Application Laid-Open No. 7-319181 discloses a technique for preventing the liquid dripping by setting the temperature of the conductive substrate to be low and reducing the viscosity of the coating liquid on the surface of the conductive substrate. However, if the temperature of the substrate is set too low with respect to the liquid temperature, the substrate may blow out from the opening of the substrate during the immersion of the coating solution, resulting in significant defects in the coating film. In this way, the conventional technology prevents coating liquid dripping,
It was insufficient for the purpose of forming a uniform coating film.
【0004】[0004]
【発明が解決しようとする課題】本発明は従来技術では
解決できない問題を考慮してなされたものであり、導電
性基体の全体又は一部における液ダレを防止し、均一な
塗膜を形成することができる電子写真感光体の製造方法
を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in consideration of a problem that cannot be solved by the prior art, and prevents liquid dripping on the whole or a part of a conductive substrate and forms a uniform coating film. It is an object of the present invention to provide a method of manufacturing an electrophotographic photoreceptor capable of performing the above-described processes.
【0005】[0005]
【課題を解決するための手段】本発明者らは鋭意検討を
重ねた結果、導電性基体を塗布液に浸漬塗布する前後
で、導電性基体上部の温度と下部の温度との差を制御す
ることにより、上記目的を達成できることを見い出し、
発明を完成するに至った。Means for Solving the Problems As a result of extensive studies, the present inventors have controlled the difference between the temperature of the upper portion of the conductive substrate and the temperature of the lower portion before and after dip coating the conductive substrate with the coating solution. By doing so, we found that we could achieve the above objectives,
The invention has been completed.
【0006】即ち、本発明は、導電性基体を塗布液に浸
漬し、該導電性基体を該塗布液から引き上げることによ
って該導電性基体上に塗膜を形成する電子写真感光体の
製造方法において、浸漬直前の該導電性基体上部の温度
と浸漬直前の該導電性基体下部の温度との差の絶対値、
及び引き上げ直後の該導電性基体上部の温度と引き上げ
直後の該導電性基体下部の温度との差の絶対値がいずれ
も0℃より大きく2℃より小さくなるように、該導電性
基体の温度を制御することを特徴とする。That is, the present invention relates to a method for producing an electrophotographic photoreceptor in which a conductive film is formed on a conductive substrate by immersing the conductive substrate in a coating solution and pulling up the conductive substrate from the coating solution. The absolute value of the difference between the temperature of the upper portion of the conductive substrate immediately before immersion and the temperature of the lower portion of the conductive substrate immediately before immersion,
And the temperature of the conductive substrate is adjusted so that the absolute value of the difference between the temperature of the upper portion of the conductive substrate immediately after the pulling and the temperature of the lower portion of the conductive substrate immediately after the pulling is both greater than 0 ° C and less than 2 ° C. It is characterized by controlling.
【0007】[0007]
【発明の実施の形態】以下、本発明についてさらに詳し
く説明する。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in more detail.
【0008】図1には、円筒状の導電性基体14を備え
た電子写真感光体の製造方法で使用する電子写真感光体
の支持手段の一例が示されている。図1(A)に示され
るように、この支持手段は水平に配置された方形板状の
パレット10を備えており、パレット10にはマトリッ
クス状に通風孔16が穿設されている。図1(B)に示
されるように、パレット10の下面側には、空気圧によ
り直径を変化させることができるゴム製先端部12Aが
先端についたチャック12が、チャック12の軸方向と
通風孔16の軸方向とが平行になるように、固定されて
いる。FIG. 1 shows an example of an electrophotographic photosensitive member supporting means used in a method of manufacturing an electrophotographic photosensitive member having a cylindrical conductive substrate 14. As shown in FIG. 1 (A), the supporting means includes a horizontally arranged rectangular plate-shaped pallet 10, and ventilation holes 16 are formed in the pallet 10 in a matrix. As shown in FIG. 1 (B), on the lower surface side of the pallet 10, a chuck 12 having a rubber tip 12A whose diameter can be changed by air pressure is attached to the axial direction of the chuck 12 and a ventilation hole 16A. Are fixed so that the axis direction of the is parallel to the axis direction.
【0009】導電性基体14は、導電性基体14の内部
に先端部12Aが圧入され、導電性基体14に対する先
端部12Aの押圧力によって、パレット10の下方に支
持される。支持手段に支持された導電性基体14は図示
しない搬送手段によって、図示しない加熱炉内に入れら
れて、ここで所定時間加熱される。次いで、支持手段に
支持された導電性基体14は図示しない搬送手段によっ
て、乾燥炉から取り出され、図示しない冷風供給用ダク
トの真下に配置されたときにこの冷風供給用ダクトから
下方に向けて吹き出され且つ通風孔16を通った冷風に
よって、冷却される。次に、支持手段に支持された導電
性基体14は、図示しない昇降手段によって、図示しな
い塗布浴内の塗布液に浸漬され、次いで引き上げられ、
図示しない乾燥手段によって乾燥される。The conductive base 14 is supported under the pallet 10 by press-fitting the distal end 12A into the conductive base 14 and pressing the distal end 12A against the conductive base 14. The conductive substrate 14 supported by the supporting means is put into a heating furnace (not shown) by a conveying means (not shown), and is heated there for a predetermined time. Next, the conductive substrate 14 supported by the support means is taken out of the drying furnace by a transport means (not shown), and blows downward from the cool air supply duct when it is disposed immediately below a cool air supply duct (not shown). The air is cooled by the cool air that has passed through the ventilation holes 16. Next, the conductive substrate 14 supported by the supporting means is immersed in a coating liquid in a coating bath (not shown) by a lifting means (not shown), and then pulled up.
It is dried by a drying means (not shown).
【0010】なお、加熱後に冷却することによって浸漬
直前の導電性基体の温度を制御する方法は、電子写真感
光体の製造方法における導電性基体の温度制御方法の一
例に過ぎず、本発明に使用可能な導電性基体の上部と下
部との温度差制御方法は、これに限定されない。The method of controlling the temperature of the conductive substrate immediately before immersion by cooling after heating is merely an example of the method of controlling the temperature of the conductive substrate in the method of manufacturing an electrophotographic photosensitive member, and is used in the present invention. A possible method of controlling the temperature difference between the upper and lower portions of the conductive substrate is not limited to this.
【0011】本発明では、冷風の温度、風の強さ及び冷
却時間を調整することにより、浸漬する直前の導電性基
体14の上部の温度と浸漬する直前の導電性基体14の
下部の温度との差の絶対値、及び引き上げた直後の導電
性基体14の上部の温度と引き上げた直後の導電性基体
14の下部の温度との差の絶対値がいずれも0℃より大
きく2℃より小さくなるように、導電性基体14の温度
を制御する。このように、塗布前後の導電性基体14の
上部の温度と下部の温度とを調節することにより、塗布
液ダレが防止され、均一な塗膜が形成される。本発明に
おいて、導電性基体14の上部とは、導電性基体の上端
から導電性基体の長さの10%までの領域をいい、導電
性基体14の下部とは、導電性基体の下端から導電性基
体の長さの10%までの領域をいい、両領域内の任意の
点における温度差の絶対値が0℃より大きく2℃より小
さいことが必要である。In the present invention, the temperature of the upper portion of the conductive substrate 14 immediately before immersion and the temperature of the lower portion of the conductive substrate 14 immediately before immersion are adjusted by adjusting the temperature of the cold air, the intensity of the wind, and the cooling time. And the absolute value of the difference between the temperature of the upper portion of the conductive substrate 14 immediately after being raised and the temperature of the lower portion of the conductive substrate 14 immediately after being pulled are both larger than 0 ° C. and smaller than 2 ° C. Thus, the temperature of the conductive substrate 14 is controlled. As described above, by adjusting the upper and lower temperatures of the conductive substrate 14 before and after coating, dripping of the coating liquid is prevented, and a uniform coating film is formed. In the present invention, the upper portion of the conductive substrate 14 refers to a region from the upper end of the conductive substrate to 10% of the length of the conductive substrate, and the lower portion of the conductive substrate 14 refers to a region from the lower end of the conductive substrate to the conductive portion. Refers to a region of up to 10% of the length of the conductive substrate, and it is necessary that the absolute value of the temperature difference at any point in both regions is larger than 0 ° C and smaller than 2 ° C.
【0012】塗布液は、通常、所定の温度に維持される
が、本発明では、その設定温度が15℃〜30℃である
ことが好ましい。塗布液温度が15℃より低い場合は、
塗布前後の導電性基体14の上部の温度と下部の温度と
の関係を前記のように維持するのにコストがかかり過ぎ
る。また、塗布液温度が30℃より高い場合は、塗布液
溶媒の蒸発量が多くなり、製造時における環境安全性を
確保するためにコストがかかり過ぎる。The coating solution is usually maintained at a predetermined temperature. In the present invention, the set temperature is preferably 15 ° C. to 30 ° C. If the coating liquid temperature is lower than 15 ° C,
Maintaining the relationship between the upper and lower temperatures of the conductive substrate 14 before and after the application as described above is too costly. On the other hand, when the temperature of the coating solution is higher than 30 ° C., the amount of the solvent of the coating solution evaporates, and the cost is too high in order to ensure environmental safety during manufacturing.
【0013】本発明の電子写真感光体の製造方法によっ
て製造される電子写真感光体は、導電性基体上に、下引
き層、電荷発生層及び電荷輸送層、その他必要な層を任
意の順序で備えることができ、これらの層形成のいずれ
の工程で本発明を用いてもよい。また、本発明の電子写
真感光体の製造方法によって製造される電子写真感光体
は、導電性基体上に単一の層を備えたものであってもよ
い。The electrophotographic photoreceptor produced by the method for producing an electrophotographic photoreceptor of the present invention comprises an undercoat layer, a charge generation layer, a charge transport layer, and other necessary layers on a conductive substrate in any order. The present invention may be used in any of the steps of forming these layers. Further, the electrophotographic photoreceptor manufactured by the method for manufacturing an electrophotographic photoreceptor of the present invention may have a single layer on a conductive substrate.
【0014】導電性基体としては、例えば、アルミニウ
ム、ニッケル、クロム、ステンレス鋼等の金属類、アル
ミニウム、チタニウム、ニッケル、クロム、ステンレ
ス、金、バナジウム、酸化錫、酸化インジウム、ITO
等の薄膜を設けたプラスチックフィルム等、導電性付与
剤を塗布若しくは含浸させた紙、及びプラスチックフィ
ルム等が挙げられる。Examples of the conductive substrate include metals such as aluminum, nickel, chromium, and stainless steel, aluminum, titanium, nickel, chromium, stainless steel, gold, vanadium, tin oxide, indium oxide, and ITO.
And the like, such as a plastic film provided with a thin film such as the above, paper coated or impregnated with a conductivity imparting agent, and a plastic film.
【0015】また、必要に応じて、導電性支持体の表面
に、画質に影響のない範囲で各種の表面処理、例えば、
表面の酸化処理や薬品処理、及び、着色処理等、砂目立
て等の乱反射処理等を行うことができる。If necessary, various surface treatments may be applied to the surface of the conductive support within a range that does not affect the image quality.
Oxidation treatment, chemical treatment, coloring treatment, irregular reflection treatment such as graining, etc. of the surface can be performed.
【0016】下引き層には結着樹脂を使用する。下引き
層に使用可能な結着樹脂としては、ポリエチレン樹脂、
ポリプロピレン樹脂、アクリル樹脂、メタクリル樹脂、
ポリアミド樹脂、塩化ビニル樹脂、酢酸ビニル樹脂、フ
ェノール樹脂、ポリカーボネート樹脂、ポリウレタン樹
脂、ポリイミド樹脂、塩化ビニリデン樹脂、ポリビニル
アセタール樹脂、塩化ビニル−酢酸ビニル共重合体、ポ
リビニルアルコール樹脂、水溶性ポリエステル樹脂、ニ
トロセルロース、カゼイン、ゼラチン、ポリグルタミン
酸、澱粉、スターチアセテート、アミノ澱粉、ポリアク
リル酸、ポリアクリルアミド、ジルコニウムキレート化
合物、ジルコニウムアルコキシド化合物、チタニルキレ
ート化合物、チタニルアルコキシド化合物、有機チタニ
ル化合物、シランカップリング剤等の公知の材料が挙げ
られるが、これらに限定されるものではない。これらの
結着樹脂は単独で又は2種以上混合して用いることがで
きる。A binder resin is used for the undercoat layer. As the binder resin usable for the undercoat layer, polyethylene resin,
Polypropylene resin, acrylic resin, methacrylic resin,
Polyamide resin, vinyl chloride resin, vinyl acetate resin, phenol resin, polycarbonate resin, polyurethane resin, polyimide resin, vinylidene chloride resin, polyvinyl acetal resin, vinyl chloride-vinyl acetate copolymer, polyvinyl alcohol resin, water-soluble polyester resin, nitro Cellulose, casein, gelatin, polyglutamic acid, starch, starthiacetate, amino starch, polyacrylic acid, polyacrylamide, zirconium chelate compound, zirconium alkoxide compound, titanyl chelate compound, titanyl alkoxide compound, organic titanyl compound, silane coupling agent, etc. There are known materials, but the materials are not limited to these. These binder resins can be used alone or in combination of two or more.
【0017】電荷発生層は電荷発生材料を主成分とし、
結着樹脂、並びに必要に応じて公知の結合剤、可塑剤及
び増感剤を用いることができる。電荷発生材料として
は、アゾ顔料、ジスアゾ顔料、キノン顔料、キノシアニ
ン顔料、ペリレン顔料、インジゴ顔料、ビスベンゾイミ
ダゾール顔料、フタロシアニン顔料、キナクリドン顔
料、ピリリウム塩、アズレニウム塩、三晶方型セレン等
が挙げられるが、これらに限定されるものではない。こ
れらの電荷発生材料は単独で又は2種以上混合して用い
ることができる。また、ポリ−N−ビニルカルバゾー
ル、ポリビニルアントラセン、ポリビニルピレン、ポリ
シラン等の有機光導電性ポリマーから選択することもで
きる。The charge generation layer contains a charge generation material as a main component,
A binder resin and, if necessary, known binders, plasticizers and sensitizers can be used. Examples of the charge generation material include azo pigments, disazo pigments, quinone pigments, quinocyanine pigments, perylene pigments, indigo pigments, bisbenzimidazole pigments, phthalocyanine pigments, quinacridone pigments, pyrylium salts, azurenium salts, and tricrystalline selenium. However, the present invention is not limited to these. These charge generation materials can be used alone or in combination of two or more. Further, it can be selected from organic photoconductive polymers such as poly-N-vinylcarbazole, polyvinylanthracene, polyvinylpyrene, and polysilane.
【0018】また、電荷発生層に使用可能な結着樹脂と
しては、広範な絶縁性樹脂から選択することができる。
好ましい結着樹脂としては、ポリビニルブチラール樹
脂、ポリアリレート樹脂(ビスフェノールAとフタル酸
の重縮合体等)、ポリカーボネート樹脂、ポリエステル
樹脂、フェノキシ樹脂、塩化ビニル−酢酸ビニル共重合
体、ポリアミド樹脂、アクリル樹脂、ポリアクリルアミ
ド樹脂、ポリビニルピリジン樹脂、セルロース樹脂、ウ
レタン樹脂、エポキシ樹脂、カゼイン、ポリビニルアル
コール樹脂、ポリビニルピロリドン樹脂等の公知の絶縁
性樹脂を挙げることができるが、これらに限定されるも
のではない。これらの結着樹脂は単独で又は2種以上混
合して用いることができる。The binder resin usable for the charge generation layer can be selected from a wide range of insulating resins.
Preferred binder resins include polyvinyl butyral resin, polyarylate resin (polycondensate of bisphenol A and phthalic acid, etc.), polycarbonate resin, polyester resin, phenoxy resin, vinyl chloride-vinyl acetate copolymer, polyamide resin, acrylic resin And known insulating resins such as polyacrylamide resin, polyvinyl pyridine resin, cellulose resin, urethane resin, epoxy resin, casein, polyvinyl alcohol resin, and polyvinylpyrrolidone resin, but are not limited thereto. These binder resins can be used alone or in combination of two or more.
【0019】電荷輸送層は、電荷輸送材料を適当な結着
樹脂中に含有させて形成される。電荷輸送材料として
は、2,5−ビス(p−ジエチルアミノフェニル)−
1,3,4−オキサジアゾール等のオキサジアゾール誘
導体、1,3,5−トリフェニル−ピラゾリン、1−
[ピリジル−(2)]−3−(p−ジエチルアミノスチ
リル)−5−(p−ジエチルアミノフェニル)ピラゾリ
ン等のピラゾリン誘導体、トリフェニルアミン、ジベン
ジルアニリン等の芳香族第3級アミノ化合物、N,N’
−ジフェニル−N.N’−ビス−(3−メチルフェニ
ル)−[1,1’−ビフェニル]−4,4’−ジアミン
等の芳香族第3級ジアミノ化合物、3−(4’−ジエチ
ルアミノフェニル)−5,6−ジ−(4’−メトキシフ
ェニル)−1,2,4−トリアジン等の1,2,4−ト
リアミン誘導体、4−ジエチルアミノベンズアルデヒド
−1,1’−ジフェニルヒドラゾン等のヒドラゾン誘導
体、2−フェニル−4−スチリルキナゾリン等のキナゾ
リン誘導体、6−ヒドロキシ−2,3−ジ(p−メトキ
シフェニル)ベンゾフラン等のベンゾフラン誘導体、p
−(2,2’−ジフェニルビニル)−N,N−ジフェニ
ルアニリン等のα−スチルベン誘導体、“Journa
l of Imaging Science“29:7
〜10(1985)に記載されているエナミン誘導体、
N−エチルカルバゾール等のポリ−N−ビニルカルバゾ
ール及びその誘導体、ポリ−γ−カルバゾールエチルグ
ルタメート及びその誘導体、ピレン、ポリビニルピレ
ン、ポリビニルアントラセン、ポリビニルアクリジン、
ポリ−9−ビフェニルアントラセン、ピレン/ホルムア
ルデヒド樹脂、エチルカルバゾール/ホルムアルデヒド
樹脂等の公知の電荷輸送材料を用いることができるが、
これらに限定されるものではない。これらの電荷輸送材
料は単独で又は2種以上混合して用いることができる。The charge transport layer is formed by including a charge transport material in an appropriate binder resin. As a charge transport material, 2,5-bis (p-diethylaminophenyl)-
Oxadiazole derivatives such as 1,3,4-oxadiazole, 1,3,5-triphenyl-pyrazoline, 1-
Pyrazoline derivatives such as [pyridyl- (2)]-3- (p-diethylaminostyryl) -5- (p-diethylaminophenyl) pyrazoline; aromatic tertiary amino compounds such as triphenylamine and dibenzylaniline; N '
-Diphenyl-N. Aromatic tertiary diamino compounds such as N'-bis- (3-methylphenyl)-[1,1'-biphenyl] -4,4'-diamine; 3- (4'-diethylaminophenyl) -5,6 1,2-, 4-triamine derivatives such as -di- (4'-methoxyphenyl) -1,2,4-triazine, hydrazone derivatives such as 4-diethylaminobenzaldehyde-1,1'-diphenylhydrazone, 2-phenyl- Quinazoline derivatives such as 4-styrylquinazoline, benzofuran derivatives such as 6-hydroxy-2,3-di (p-methoxyphenyl) benzofuran, p
Α-stilbene derivatives such as-(2,2′-diphenylvinyl) -N, N-diphenylaniline, “Journa
l of Imaging Science "29: 7
10 to (1985), an enamine derivative,
Poly-N-vinylcarbazole such as N-ethylcarbazole and derivatives thereof, poly-γ-carbazoleethylglutamate and derivatives thereof, pyrene, polyvinylpyrene, polyvinylanthracene, polyvinylacridine,
Known charge transport materials such as poly-9-biphenylanthracene, pyrene / formaldehyde resin, ethylcarbazole / formaldehyde resin can be used,
It is not limited to these. These charge transport materials can be used alone or in combination of two or more.
【0020】また、電荷輸送層に用いる結着樹脂は、ポ
リカーボネート樹脂、ポリエステル樹脂、メタクリル樹
脂、アクリル樹脂、ポリ塩化ビニル樹脂、ポリ塩化ビニ
リデン樹脂、ポリスチレン樹脂、ポリビニルアセテート
樹脂、スチレン−ブタジエン共重合体、塩化ビニリデン
−アクリロニトリル共重合体、塩化ビニル−酢酸ビニル
共重合体、塩化ビニル−酢酸ビニル−無水マレイン酸共
重合体、シリコン樹脂、シリコン−アルキッド樹脂、フ
ェノール−ホルムアルデヒド樹脂、スチレン−アルキッ
ド樹脂、ポリ−N−ビニルカルバゾール等の公知の樹脂
を挙げることができるが、これらに限定されるものでは
ない。これらの結着樹脂は単独で又は2種以上混合して
用いることができる。The binder resin used for the charge transport layer is a polycarbonate resin, a polyester resin, a methacrylic resin, an acrylic resin, a polyvinyl chloride resin, a polyvinylidene chloride resin, a polystyrene resin, a polyvinyl acetate resin, a styrene-butadiene copolymer. , Vinylidene chloride-acrylonitrile copolymer, vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinyl acetate-maleic anhydride copolymer, silicone resin, silicone-alkyd resin, phenol-formaldehyde resin, styrene-alkyd resin, poly Known resins such as -N-vinylcarbazole may be mentioned, but not limited thereto. These binder resins can be used alone or in combination of two or more.
【0021】下引き層、電荷発生層及び電荷輸送層の塗
布液作成に用いる溶剤としては、例えば、メタノール、
エタノール、イソプロパノール等のアルコール類、アセ
トン、メチルエチルケトン、シクロヘキサノン等のケト
ン類、テトラヒドロフラン、ジオキサン、エチレングリ
コールモノメチルエーテル等のエーテル類、クロロホル
ム、ジクロルメタン、ジクロルエタン、四塩化炭素、ト
リクロルエチレン等の脂肪族ハロゲン化炭化水素類、
N,N−ジメチルホルムアミド、N,N−ジメチルアセ
トアミド等のアミド類、酢酸メチル、酢酸エチル等のエ
ステル類、ベンゼン、トルエン、キシレン、モノクロル
ベンゼン、ジクロルベンゼン等の芳香族類等の一般に電
子写真感光体の塗布液の作成に用いられる公知の有機溶
媒を挙げることができるが、これらに限定されるもので
はない。これらの溶剤は単独で又は2種以上混合して用
いることができる。The solvent used for preparing the coating liquid for the undercoat layer, the charge generation layer and the charge transport layer includes, for example, methanol,
Alcohols such as ethanol and isopropanol; ketones such as acetone, methyl ethyl ketone and cyclohexanone; ethers such as tetrahydrofuran, dioxane and ethylene glycol monomethyl ether; and aliphatic halogenated carbons such as chloroform, dichloromethane, dichloroethane, carbon tetrachloride, and trichloroethylene. Hydrogens,
Generally, electrophotography of amides such as N, N-dimethylformamide and N, N-dimethylacetamide, esters such as methyl acetate and ethyl acetate, and aromatics such as benzene, toluene, xylene, monochlorobenzene, and dichlorobenzene. Known organic solvents used for preparing a coating solution for the photoreceptor can be mentioned, but are not limited thereto. These solvents can be used alone or in combination of two or more.
【0022】[0022]
【実施例】以下、本発明を実施例によりさらに詳細に説
明するが、本発明はその要旨を超えない限り、以下の実
施例に限定されるものではない。なお、実施例及び比較
例で用いた化合物の組成と塗布液の組成は、以下の通り
である。塗布液A(下引き層 ) 構造式(1)のジルコニウム化合物 20重量部 構造式(2)のシランカップリング剤 2重量部 構造式(3)のポリビニルブチラール樹脂 2重量部 n−ブタノール 70重量部EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist. In addition, the composition of the compound and the composition of the coating solution used in Examples and Comparative Examples are as follows. Coating solution A (undercoat layer ) 20 parts by weight of zirconium compound of structural formula (1) 2 parts by weight of silane coupling agent of structural formula (2) 2 parts by weight of polyvinyl butyral resin of structural formula (3) 70 parts by weight of n-butanol
【0023】[0023]
【化1】 Embedded image
【0024】塗布液B1(電荷発生層) クロルガリウムフタロシアニン 5重量部 構造式(4)の塩化ビニル−酢酸ビニル共重合体 5重量部 酢酸n−ブチル 65重量部 キシレン 130重量部 上記成分を1mmφのガラスビーズを用いたサンドミル
で2時間分散して得られた分散液を塗布液B1とした。 Coating solution B1 (charge generation layer) Chlorgallium phthalocyanine 5 parts by weight Vinyl chloride-vinyl acetate copolymer of structural formula (4) 5 parts by weight n-butyl acetate 65 parts by weight Xylene 130 parts by weight The dispersion obtained by dispersing for 2 hours with a sand mill using glass beads was used as a coating liquid B1.
【0025】[0025]
【化2】 Embedded image
【0026】塗布液B2(電荷発生層) クロルガリウムフタロシアニン 5重量部 構造式(4)の塩化ビニル−酢酸ビニル共重合体 5重量部 酢酸n−ブチル 195重量部 上記成分を1mmφのガラスビーズを用いたサンドミル
で2時間分散して得られた分散液を塗布液B2とした。塗布液C1(電荷輸送層) 構造式(5)の電荷輸送物質 1重量部 構造式(6)のポリカーボネート樹脂 1重量部 モノクロルベンゼン 3重量部 テトラヒドロフラン 3重量部 Coating solution B2 (charge generation layer) Chlorgallium phthalocyanine 5 parts by weight Vinyl chloride-vinyl acetate copolymer of the structural formula (4) 5 parts by weight n-butyl acetate 195 parts by weight The above components were used with 1 mmφ glass beads. The dispersion obtained by dispersing with a sand mill for 2 hours was used as a coating liquid B2. Coating liquid C1 (charge transport layer) 1 part by weight of charge transport material of structural formula (5) 1 part by weight of polycarbonate resin of structural formula (6) 1 part by weight of monochlorobenzene 3 parts by weight of tetrahydrofuran 3 parts by weight
【0027】[0027]
【化3】 Embedded image
【0028】塗布液C2(電荷輸送層 ) 構造式(5)の電荷輸送物質 1重量部 構造式(6)のポリカーボネート樹脂 1重量部 モノクロルベンゼン 6重量部 (実施例1〜3)30mmφ×340mmLの円筒状ア
ルミニウム基体を、図1に示す装置にチャックで固定
し、塗布前に冷却風によりアルミニウム基体を冷却し、
下引き層(塗布液A)を、乾燥平均膜厚が1.0μmに
なるような引上げ速度でアルミニウム基体を引き上げて
アルミニウム基体上に塗布し、2分間自然乾燥させ、次
いで乾燥温度150℃、10分間乾燥させた。塗布液温
度、塗布前後のアルミニウム基体の上部(上端より30
mm下の位置)と下部(下端より30mm上の位置)の
温度をそれぞれ表1に示すように設定した。 Coating solution C2 (charge transport layer ) 1 part by weight of charge transport material of structural formula (5) 1 part by weight of polycarbonate resin of structural formula (6) 1 part by weight of monochlorobenzene 6 parts by weight (Examples 1-3) of 30 mmφ × 340 mmL The cylindrical aluminum substrate is fixed to the apparatus shown in FIG. 1 with a chuck, and the aluminum substrate is cooled by cooling air before coating,
The undercoat layer (coating liquid A) is applied to the aluminum substrate by pulling up the aluminum substrate at a pulling speed such that the average dry film thickness becomes 1.0 μm, and is naturally dried for 2 minutes. Dried for minutes. Coating solution temperature, upper part of aluminum substrate before and after coating (30 minutes from upper end)
mm) and the temperature at the lower part (the position 30 mm above the lower end) were set as shown in Table 1, respectively.
【0029】なお、以下の実施例及び比較例において
も、アルミニウム基体の温度の測定位置は同様である。 (比較例1〜3)塗布液温度、塗布前後のアルミニウム
基体の上部と下部の温度をそれぞれ表1に示すように設
定した以外は、実施例1〜3と同様に塗布した。In the following Examples and Comparative Examples, the measurement positions of the temperature of the aluminum substrate are the same. (Comparative Examples 1 to 3) Coating was performed in the same manner as in Examples 1 to 3, except that the temperature of the coating solution and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 1, respectively.
【0030】[0030]
【表1】 [Table 1]
【0031】(実施例4〜6)30mmφ×340mm
Lの円筒状アルミニウム基体を、図1に示す装置にチャ
ックで固定し、塗布前に冷却風によりアルミニウム基体
を冷却し、電荷発生層(塗布液B1)を、乾燥平均膜厚
が0.2μmになるような引上げ速度で塗布し、20分
間自然乾燥させた。塗布液温度、塗布前後のアルミニウ
ム基体の上部と下部の温度をそれぞれ表2に示すように
設定した。 (比較例4〜6)塗布液温度、塗布前後のアルミニウム
基体の上部と下部の温度をそれぞれ表2に示すように設
定した以外は、実施例4〜6と同様に塗布した。(Examples 4 to 6) 30 mmφ × 340 mm
The cylindrical aluminum substrate of L is fixed to the apparatus shown in FIG. 1 with a chuck, and the aluminum substrate is cooled by cooling air before coating, and the charge generation layer (coating solution B1) is dried to a dry average film thickness of 0.2 μm. The composition was applied at a pulling rate as described above and allowed to dry naturally for 20 minutes. The coating solution temperature and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 2, respectively. (Comparative Examples 4 to 6) Coating was performed in the same manner as in Examples 4 to 6, except that the temperature of the coating solution and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 2, respectively.
【0032】[0032]
【表2】 [Table 2]
【0033】(実施例7〜9)塗布液温度、塗布前後の
アルミニウム基体の上部と下部の温度をそれぞれ表3に
示すように設定し、塗布液B1をB2にした以外は、実
施例4〜6と同様に塗布した。(比較例7〜9)塗布液
温度、塗布前後のアルミニウム基体の上部と下部の温度
をそれぞれ表3に示すように設定し、塗布液B1をB2
にした以外は、実施例4〜6と同様に塗布した。Examples 7 to 9 Except that the temperature of the coating solution and the temperatures of the upper and lower portions of the aluminum substrate before and after the coating were set as shown in Table 3, and that the coating solution B1 was changed to B2, the same as in Examples 4 to 9 was used. 6 was applied. (Comparative Examples 7 to 9) The coating liquid temperature and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 3, respectively, and the coating liquid B1 was changed to B2.
The coating was performed in the same manner as in Examples 4 to 6, except that
【0034】[0034]
【表3】 [Table 3]
【0035】(実施例10〜12)30mmφ×340
mmLの円筒状アルミニウム基体を、図1に示す装置に
チャックで固定し、塗布前に冷却風によりアルミニウム
基体を冷却し、電荷輸送層(塗布液C1)を、乾燥平均
膜厚が20μmになるような引上げ速度でアルミニウム
基体を引き上げて塗布し、2分間自然乾燥させ、次いで
乾燥温度135℃、60分間乾燥させた。塗布液温度、
塗布前後のアルミニウム基体の上部と下部の温度をそれ
ぞれ表4に示すように設定した。 (比較例10〜12)塗布液温度、塗布前後のアルミニ
ウム基体の上部と下部の温度をそれぞれ表4に示すよう
に設定した以外は、実施例10〜12と同様に塗布し
た。(Examples 10 to 12) 30 mmφ × 340
The cylindrical aluminum substrate of mmL is fixed to the apparatus shown in FIG. 1 with a chuck, and before coating, the aluminum substrate is cooled by cooling air so that the charge transport layer (coating solution C1) has a dry average film thickness of 20 μm. The aluminum substrate was pulled up and applied at an appropriate pulling rate, air-dried for 2 minutes, and then dried at 135 ° C. for 60 minutes. Coating liquid temperature,
The temperatures of the upper and lower portions of the aluminum substrate before and after coating were set as shown in Table 4, respectively. (Comparative Examples 10 to 12) Coating was performed in the same manner as in Examples 10 to 12, except that the temperature of the coating solution and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 4, respectively.
【0036】[0036]
【表4】 [Table 4]
【0037】(実施例13〜15)塗布液温度、塗布前
後のアルミニウム基体の上部と下部の温度をそれぞれ表
5に示すように設定し、塗布液C1をC2にした以外
は、実施例10〜12と同様に塗布した。 (比較例13〜15)塗布液温度、塗布前後のアルミニ
ウム基体の上部と下部の温度をそれぞれ表5に示すよう
に設定し、塗布液C1をC2にした以外は、実施例10
〜12と同様に塗布した。(Examples 13 to 15) Examples 10 to 15 were repeated except that the temperature of the coating solution and the temperatures of the upper and lower portions of the aluminum base before and after coating were set as shown in Table 5, and the coating solution C1 was changed to C2. 12 was applied. (Comparative Examples 13 to 15) Example 10 except that the temperature of the coating solution and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 5, and the coating solution C1 was changed to C2.
-12.
【0038】[0038]
【表5】 [Table 5]
【0039】(実施例16〜18)予め実施例4と同様
にして電荷発生層(塗布液B1)を塗布した30mmφ
×340mmLの円筒状アルミニウム基体を、図1に示
す装置にチャックで固定し、塗布前に冷却風によりアル
ミニウム基体を冷却し、電荷輸送層(塗布液C1)を、
乾燥平均膜厚が20μmになるような引上げ速度でアル
ミニウム基体を引き上げて塗布し、2分間自然乾燥さ
せ、次いで乾燥温度135℃、60分間乾燥させた。塗
布液温度、塗布前後のアルミニウム基体の上部と下部の
温度をそれぞれ表6に示すように設定した。 (比較例16〜18)塗布液温度、塗布前後のアルミニ
ウム基体の上部と下部の温度をそれぞれ表6に示すよう
に設定した以外は、実施例16〜18と同様に塗布し
た。(Examples 16 to 18) 30 mmφ previously coated with the charge generation layer (coating solution B1) in the same manner as in Example 4.
A 340 mmL cylindrical aluminum substrate was fixed to the apparatus shown in FIG. 1 with a chuck, and before coating, the aluminum substrate was cooled with cooling air to form a charge transport layer (coating solution C1).
The aluminum substrate was pulled up at a pulling rate such that the dry average film thickness became 20 μm, applied, air-dried for 2 minutes, and then dried at 135 ° C. for 60 minutes. The coating solution temperature and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 6, respectively. (Comparative Examples 16 to 18) Coating was carried out in the same manner as in Examples 16 to 18, except that the temperature of the coating solution and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 6, respectively.
【0040】[0040]
【表6】 [Table 6]
【0041】(実施例19〜21)予め実施例1と同様
にして下引き層(塗布液A)を塗布した30mmφ×3
40mmの円筒状アルミニウム基体を、図1に示す装置
にチャックで固定し、塗布前に冷却風によりアルミニウ
ム基体を冷却し、電荷発生層(塗布液B1)を、乾燥平
均膜厚が0.2μmになるような引上げ速度でアルミニ
ウム基体を引き上げて塗布し、20分間自然乾燥させ
た。塗布液温度、塗布前後のアルミニウム基体の上部と
下部の温度をそれぞれ表7に示すように設定した。 (比較例19〜21)塗布液温度、塗布前後のアルミニ
ウム基体の上部と下部の温度をそれぞれ表7に示すよう
に設定した以外は、実施例19〜21と同様に塗布し
た。(Examples 19 to 21) 30 mmφ × 3 previously coated with an undercoat layer (coating solution A) in the same manner as in Example 1.
A 40 mm cylindrical aluminum substrate is fixed to the apparatus shown in FIG. 1 with a chuck, and before coating, the aluminum substrate is cooled by cooling air, and the charge generation layer (coating solution B1) is dried to a dry average film thickness of 0.2 μm. The aluminum substrate was pulled up at such a pulling speed and applied, followed by natural drying for 20 minutes. The coating solution temperature and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 7, respectively. (Comparative Examples 19 to 21) Coating was performed in the same manner as in Examples 19 to 21, except that the temperature of the coating solution and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 7, respectively.
【0042】[0042]
【表7】 [Table 7]
【0043】(実施例22〜24)予め実施例19と同
様にして下引き層(塗布液A)及び電荷発生層(塗布液
B1)を塗布した30mmφ×340mmLの円筒状ア
ルミニウム基体を、図1に示す装置にチャックで固定
し、塗布前に冷却風によりアルミニウム基体を冷却し、
電荷輸送層(塗布液C1)を、乾燥平均膜厚が20μm
になるような引上げ速度でアルミニウム基体を引き上げ
て塗布し、2分間自然乾燥させ、次いで乾燥温度135
℃、60分間乾燥させた。塗布液温度、塗布前後のアル
ミニウム基体の上部と下部の温度をそれぞれ表8に示す
ように設定した。 (比較例22〜24)塗布液温度、塗布前後のアルミニ
ウム基体の上部と下部の温度をそれぞれ表8に示すよう
に設定した以外は、実施例22〜24と同様に塗布し
た。(Examples 22 to 24) A 30 mmφ × 340 mmL cylindrical aluminum substrate to which an undercoat layer (coating solution A) and a charge generation layer (coating solution B1) were applied in advance in the same manner as in Example 19 was prepared as shown in FIG. The aluminum base was cooled by a cooling air before coating,
The charge transport layer (coating solution C1) was dried at an average film thickness of 20 μm.
The aluminum substrate is pulled up at a pulling speed such that the coating is performed, and the coating is naturally dried for 2 minutes.
C. and dried for 60 minutes. The coating solution temperature and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 8, respectively. (Comparative Examples 22 to 24) Coating was performed in the same manner as in Examples 22 to 24, except that the temperature of the coating solution and the upper and lower temperatures of the aluminum substrate before and after coating were set as shown in Table 8, respectively.
【0044】[0044]
【表8】 [Table 8]
【0045】実施例1〜24及び比較例1〜24で得ら
れた電子写真感光体の上端より30mm下の位置及び下
端より30mm上の位置の膜厚を測定し、塗膜の均一性
を評価した。The film thickness of the electrophotographic photosensitive members obtained in Examples 1 to 24 and Comparative Examples 1 to 24 was measured at a position 30 mm below the upper end and at a position 30 mm above the lower end to evaluate the uniformity of the coating film. did.
【0046】実施例1〜3(下引き層)及び比較例1〜
3(下引き層)の塗膜性の評価では、アルミニウム基体
上部及び下部の膜厚の差の絶対値が0.1μm以下のと
きに、良好であるとした。Examples 1 to 3 (undercoat layer) and Comparative Examples 1 to
In the evaluation of the coating property of No. 3 (undercoat layer), it was determined to be good when the absolute value of the difference between the film thicknesses of the upper and lower portions of the aluminum base was 0.1 μm or less.
【0047】また、実施例4〜9(電荷発生層)、実施
例19〜21(電荷発生層)、比較例4〜9(電荷発生
層)及び比較例19〜21(電荷発生層)の塗膜性の評
価では、アルミニウム基体上部及び下部の膜厚の差の絶
対値が0.02μm以下のときに、良好であるとした。The coating of Examples 4 to 9 (charge generation layer), Examples 19 to 21 (charge generation layer), Comparative Examples 4 to 9 (charge generation layer) and Comparative Examples 19 to 21 (charge generation layer) In the evaluation of the film properties, it was determined to be good when the absolute value of the difference between the film thicknesses of the upper and lower portions of the aluminum substrate was 0.02 μm or less.
【0048】実施例10〜18(電荷輸送層)、実施例
22〜24(電荷輸送層)、比較例10〜18(電荷輸
送層)及び比較例22〜24(電荷輸送層)の塗膜性の
評価では、アルミニウム基体上部及び下部の膜厚の差の
絶対値が2μm以下のときに、良好であるとした。Coating Properties of Examples 10 to 18 (Charge Transport Layer), Examples 22 to 24 (Charge Transport Layer), Comparative Examples 10 to 18 (Charge Transport Layer) and Comparative Examples 22 to 24 (Charge Transport Layer) In the evaluation of, it was determined that the sample was good when the absolute value of the difference between the film thicknesses of the upper and lower portions of the aluminum base was 2 μm or less.
【0049】評価結果をそれぞれ表1〜8に示す。The evaluation results are shown in Tables 1 to 8, respectively.
【0050】[0050]
【発明の効果】本発明の電子写真感光体の製造方法は、
浸漬直前及び引き上げ直後の導電性基体の上部と下部と
の間の温度差を一定範囲にしているため、導電性基体の
全体又は一部における液ダレを防止することができ、塗
膜欠陥のない均一な塗膜を得ることができる。The method for producing an electrophotographic photoreceptor of the present invention comprises:
Since the temperature difference between the upper part and the lower part of the conductive substrate immediately before immersion and immediately after lifting is within a certain range, it is possible to prevent liquid dripping in the whole or a part of the conductive substrate, and there is no coating defect. A uniform coating film can be obtained.
【図1】本発明を実施するための電子写真感光体の支持
手段の概略構成の一例を示す。FIG. 1 shows an example of a schematic configuration of a support means of an electrophotographic photosensitive member for carrying out the present invention.
10 パレット 12 チャック 12A 先端部 14 導電性基体 16 通風孔 DESCRIPTION OF SYMBOLS 10 Pallet 12 Chuck 12A Tip part 14 Conductive substrate 16 Ventilation hole
Claims (4)
基体を該塗布液から引き上げることによって該導電性基
体上に塗膜を形成する電子写真感光体の製造方法におい
て、 浸漬直前の該導電性基体上部の温度と浸漬直前の該導電
性基体下部の温度との差の絶対値、及び引き上げ直後の
該導電性基体上部の温度と引き上げ直後の該導電性基体
下部の温度との差の絶対値がいずれも0℃より大きく2
℃より小さくなるように、該導電性基体の温度を制御す
ることを特徴とする電子写真感光体の製造方法。1. A method for producing an electrophotographic photoreceptor in which a conductive substrate is immersed in a coating solution, and the conductive substrate is pulled up from the coating solution to form a coating film on the conductive substrate. The absolute value of the difference between the temperature of the upper portion of the conductive substrate and the temperature of the lower portion of the conductive substrate immediately before immersion, and the difference between the temperature of the upper portion of the conductive substrate immediately after the pulling and the temperature of the lower portion of the conductive substrate immediately after the pulling The absolute value of which is greater than 0 ° C. 2
A method for producing an electrophotographic photoreceptor, wherein the temperature of the conductive substrate is controlled so as to be lower than ℃.
特徴とする請求項1に記載の電子写真感光体の製造方
法。2. The method according to claim 1, wherein the coating liquid contains a charge generating material.
特徴とする請求項1に記載の電子写真感光体の製造方
法。3. The method according to claim 1, wherein the coating liquid contains a charge transporting material.
むことを特徴とする請求項1に記載の電子写真感光体の
製造方法。4. The method according to claim 1, wherein the coating liquid contains a binder resin for an undercoat layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34422996A JPH10186690A (en) | 1996-12-24 | 1996-12-24 | Production of electrophotographic photoreceptor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34422996A JPH10186690A (en) | 1996-12-24 | 1996-12-24 | Production of electrophotographic photoreceptor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10186690A true JPH10186690A (en) | 1998-07-14 |
Family
ID=18367637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34422996A Pending JPH10186690A (en) | 1996-12-24 | 1996-12-24 | Production of electrophotographic photoreceptor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH10186690A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020166241A (en) * | 2019-03-28 | 2020-10-08 | キヤノン株式会社 | Method of manufacturing electrophotographic photoreceptor |
-
1996
- 1996-12-24 JP JP34422996A patent/JPH10186690A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020166241A (en) * | 2019-03-28 | 2020-10-08 | キヤノン株式会社 | Method of manufacturing electrophotographic photoreceptor |
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