JPH10182855A - Manufacture of polyethersulfone resin film - Google Patents

Manufacture of polyethersulfone resin film

Info

Publication number
JPH10182855A
JPH10182855A JP34345096A JP34345096A JPH10182855A JP H10182855 A JPH10182855 A JP H10182855A JP 34345096 A JP34345096 A JP 34345096A JP 34345096 A JP34345096 A JP 34345096A JP H10182855 A JPH10182855 A JP H10182855A
Authority
JP
Japan
Prior art keywords
polyethersulfone resin
film
solution
resin film
metal substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP34345096A
Other languages
Japanese (ja)
Other versions
JP3331889B2 (en
Inventor
Kikumi Anami
喜久美 穴見
Hiroshi Hagimori
博 萩森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP34345096A priority Critical patent/JP3331889B2/en
Publication of JPH10182855A publication Critical patent/JPH10182855A/en
Application granted granted Critical
Publication of JP3331889B2 publication Critical patent/JP3331889B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Moulding By Coating Moulds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a polyethersulfone resin film which will not stretch or break when it is removed from a metal base after it is formed on the metal base, and the obtd. film is excellent in transparency and smoothness and does not generate a striation defect rectangular to the casting direction. SOLUTION: In the manufacturing method of this polyethersulfone resin film, a solution of a polyethersulfone resin in which 100 pts.wt. sulfone resin is dissolved in a solvent is cast on a metal base, and after it is dried a film formed is peeled. In this case, 0.3-1.0 pt.wt. polyoxypropylene-polyoxyethylene condensate is added to the polyethersulfone resin solution.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ポリエーテルスル
ホン樹脂溶液を金属基材上に流延し、乾燥後、形成した
フィルムを金属基材から剥離するポリエーテルスルホン
樹脂フィルムの製造方法の改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a method for producing a polyethersulfone resin film in which a polyethersulfone resin solution is cast on a metal substrate, dried, and then the formed film is peeled from the metal substrate. .

【0002】[0002]

【従来の技術】ポリエーテルスルホン樹脂フィルムの製
造方法として、ポリエーテルスルホン樹脂を溶解した溶
液をダイより押し出して金属基材上に流延し、乾燥し、
形成したフィルムを剥離する溶液キャスト法がある。溶
液キャスト法により得られるフィルムは異物が少なく、
厚み精度、表面平滑性に優れ、光学的に等方的なフィル
ムを得ることができる。特に近年、位相差フィルム用原
反や、偏光保護フィルムなどの液晶表示用フィルムに、
この溶液キャスト法により製造されたフィルムが使用さ
れている。
2. Description of the Related Art As a method for producing a polyethersulfone resin film, a solution in which a polyethersulfone resin is dissolved is extruded from a die, cast on a metal substrate, and dried.
There is a solution casting method for peeling the formed film. The film obtained by the solution casting method has few foreign substances,
An optically isotropic film having excellent thickness accuracy and surface smoothness can be obtained. In recent years, in recent years, for raw materials for retardation films, films for liquid crystal displays such as polarization protection films,
A film manufactured by this solution casting method is used.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、ポリエ
ーテルスルホン樹脂溶液を金属基材上に流延し、乾燥
後、形成したフィルムを剥離する際、フィルムと金属基
材との接着力が強固であるため、剥離することが困難と
なり、フィルムが伸びたり、破断するなどの問題が生じ
る。一方、離型処理を施したポリエステルフィルム等を
基材として用いれば、かかる問題は発生しないものの、
表面平滑性等を維持するためにはポリエステルフィルム
の再使用は困難であり、工業的生産を考えた時、有利な
方法とは言えない。
However, when the polyethersulfone resin solution is cast on a metal substrate, and after drying, the formed film is peeled off, the adhesive strength between the film and the metal substrate is strong. Therefore, it becomes difficult to peel off, and problems such as stretching and breaking of the film occur. On the other hand, if a polyester film or the like subjected to a release treatment is used as a base material, such a problem does not occur,
It is difficult to reuse the polyester film in order to maintain the surface smoothness and the like, and it cannot be said to be an advantageous method when considering industrial production.

【0004】[0004]

【課題を解決するための手段】本発明者らは、ポリエー
テルスルホン樹脂溶液を金属基材上に流延し、乾燥後、
形成したフィルムを金属基材から剥離してポリエーテル
スルホン樹脂フィルムを製造する方法において、剥離性
の改良につき鋭意検討した結果、該ポリエーテルスルホ
ン樹脂溶液にポリオキシプロピレン−ポリオキシエチレ
ン縮合体を添加することにより、フィルムが延びたり、
破れたりすることがなく容易にかつ安定的に剥離するこ
とができることを見い出し、本発明に至った。
Means for Solving the Problems The present inventors cast a polyethersulfone resin solution on a metal substrate, dried it,
In a method of manufacturing a polyethersulfone resin film by peeling the formed film from a metal substrate, as a result of intensive studies on improvement of the releasability, a polyoxypropylene-polyoxyethylene condensate was added to the polyethersulfone resin solution. Doing so can cause the film to stretch,
The present inventors have found that they can be easily and stably peeled without being broken, and have reached the present invention.

【0005】すなわち本発明は、ポリエーテルスルホン
樹脂を溶媒に溶解したポリエーテルスルホン樹脂溶液を
金属基材上に流延し、乾燥後、形成したフィルムを金属
基材から剥離してポリエーテルスルホン樹脂フィルムを
製造する方法において、該ポリエーテルスルホン樹脂溶
液にポリオキシプロピレン−ポリオキシエチレン縮合体
を添加して行うことを特徴とするポリエーテルスルホン
樹脂フィルムの製造方法である。以下、本発明を詳細に
説明する。
That is, the present invention relates to a polyethersulfone resin solution in which a polyethersulfone resin is dissolved in a solvent, which is cast on a metal substrate, dried, and the formed film is peeled off from the metal substrate. A method for producing a polyethersulfone resin film, wherein a polyoxypropylene-polyoxyethylene condensate is added to the polyethersulfone resin solution. Hereinafter, the present invention will be described in detail.

【0006】[0006]

【発明の実施の形態】本発明に用いられるポリエーテル
スルホン樹脂としては、4,4′−ジクロロジフェニル
スルホンと4,4′−ジヒドロキシジフェニルスルホン
の共縮重合によって得られ、繰り返し構造単位中にスル
ホニル基及びエーテル基を有する芳香族ポリエーテルス
ルホン重合体が挙げられる。さらに、4,4′−ジクロ
ロジフェニルスルホンと4,4′−ジヒドロキシジフェ
ニルスルホン及びジフェニル化合物との共重合体も用い
られる。ジフェニル化合物の例としては、2,2′−ジ
ヒドロキシジフェニル、4,4′−ジヒドロキシジフェ
ニルなどが挙げられる。
BEST MODE FOR CARRYING OUT THE INVENTION The polyethersulfone resin used in the present invention is obtained by co-condensation polymerization of 4,4'-dichlorodiphenylsulfone and 4,4'-dihydroxydiphenylsulfone. Aromatic polyethersulfone polymer having a group and an ether group. Further, a copolymer of 4,4'-dichlorodiphenyl sulfone, 4,4'-dihydroxydiphenyl sulfone and a diphenyl compound is also used. Examples of the diphenyl compound include 2,2'-dihydroxydiphenyl, 4,4'-dihydroxydiphenyl, and the like.

【0007】これらの重合体は、下式 化3または化4
で示される繰り返し構造単位を有する単独重合体または
これらの共重合体である。
These polymers are represented by the following formulas 3 and 4
Or a copolymer thereof having a repeating structural unit represented by

【化3】(−Ph−SO2 −Ph−O−)Embedded image (-Ph-SO 2 -Ph-O-)

【化4】 (−Ph−SO2 −Ph−O−Ph−Ph−O−) (式 化3および化4中のPhはフェニル基を表す。)Embedded image (—Ph—SO 2 —Ph—O—Ph—Ph—O—) (Ph in Formulas 3 and 4 represents a phenyl group.)

【0008】本発明で使用するポリオキシプロピレン−
ポリオキシエチレン縮合体は下式化5で示される。
The polyoxypropylene used in the present invention
The polyoxyethylene condensate is represented by the following formula (5).

【化5】HO−(C2 4 O)a −(C3 6 O)b −
(C2 4 O)c −H
Embedded image HO- (C 2 H 4 O) a - (C 3 H 6 O) b -
(C 2 H 4 O) c -H

【0009】このようなポリオキシプロピレン−ポリオ
キシエチレン縮合体は、市販されており、例えば、商品
名「プルロニックF−68T」(販売会社:旭電化工業
(株))などとして入手可能である。この縮合体は、ポ
リエーテルスルホン樹脂に対する添加割合が後述する適
正範囲内であれば、ポリエーテルスルホン樹脂溶液中で
の相分離やフィルムのブリードアウトを生じず、かつ着
色も生じない。
Such a polyoxypropylene-polyoxyethylene condensate is commercially available, and can be obtained, for example, under the trade name "Pluronic F-68T" (a sales company: Asahi Denka Kogyo KK). When the condensate is added to the polyethersulfone resin in an appropriate ratio described below, phase separation in the polyethersulfone resin solution, bleed-out of the film, and coloring do not occur.

【0010】本発明において使用する溶媒としては、ポ
リエーテルスルホン樹脂及びポリオキシプロピレン−ポ
リオキシエチレン縮合体の溶解性が良く、白濁やゲル化
を生じることなく安定した樹脂溶液が得られるものであ
れば特に制限されない。具体的には、例えば、塩化メチ
レン、1,2−ジクロロエタン、トリクロロエタン、
1,1,2,2−テトラクロロエタン、N−メチル−2
−ピロリドン、ジメチルホルムアミド、ジメチルスルホ
キシド、テトラヒドロフラン、クロロホルムなどが挙げ
られ、これらを単独で、または混合して用いられる。
The solvent used in the present invention is one which has good solubility of the polyethersulfone resin and the polyoxypropylene-polyoxyethylene condensate and can provide a stable resin solution without causing cloudiness or gelation. It is not particularly limited. Specifically, for example, methylene chloride, 1,2-dichloroethane, trichloroethane,
1,1,2,2-tetrachloroethane, N-methyl-2
-Pyrrolidone, dimethylformamide, dimethylsulfoxide, tetrahydrofuran, chloroform and the like, and these are used alone or in combination.

【0011】ポリエーテルスルホン樹脂を溶媒に溶解す
る際の濃度は、その溶液粘度が15poise以上、好
ましくは20poise以上になるように調整すること
が望ましい。溶液粘度が15poiseより低くなる
と、乾燥時に風紋やさざ波状の欠陥が生じやすくなる。
The concentration of the polyethersulfone resin dissolved in the solvent is preferably adjusted so that the solution viscosity is 15 poise or more, preferably 20 poise or more. If the solution viscosity is lower than 15 poise, wind ripples and ripple-like defects are likely to occur during drying.

【0012】ポリオキシプロピレン−ポリオキシエチレ
ン縮合体の添加量は、ポリエーテルスルホン100重量
部に対して、0.3〜1重量部の範囲に調整することが
望ましい。0.3重量部より少ないと、金属基材からの
剥離が困難になり、フィルムの金属基材への剥げ残りま
たは破れ等の不都合を生じる。また1重量部より多くな
ると、フィルムの剥離性は良好であるがフィルムの透明
性が低下したり、フィルムの加工段階、例えば、粘着剤
塗工などの際に粘着層の剥がれ、浮きなどの欠陥を生じ
る原因となるため好ましくない。
It is desirable to adjust the amount of the polyoxypropylene-polyoxyethylene condensate to be in the range of 0.3 to 1 part by weight based on 100 parts by weight of the polyether sulfone. If the amount is less than 0.3 parts by weight, peeling from the metal substrate becomes difficult, resulting in inconvenience such as peeling or tearing of the film on the metal substrate. When the amount is more than 1 part by weight, the releasability of the film is good, but the transparency of the film is deteriorated, and defects such as peeling and floating of the adhesive layer at the processing stage of the film, for example, at the time of applying an adhesive. This is not preferable because it may cause

【0013】樹脂溶液を流延し、乾燥し、形成したフィ
ルムを剥離する方法は、通常の溶液キャスト法における
方法が用いられる。樹脂溶液を流延するための金属基材
としては、例えば、ステンレス、鉄、アルミニウム、ま
たはこれらの金属や他の金属表面をハードクロムメッキ
したもの等が挙げられる。製造するポリエーテルスルホ
ン樹脂フィルムの目的に応じ、該金属基材の表面を鏡面
仕上げしたものを用いてもよい。
The method of casting the resin solution, drying it, and peeling off the formed film is the same as that of a usual solution casting method. Examples of the metal base material for casting the resin solution include stainless steel, iron, aluminum, and those obtained by hard chrome plating the surface of these metals and other metals. Depending on the purpose of the polyethersulfone resin film to be produced, a mirror-finished surface of the metal substrate may be used.

【0014】流延方法は特に制限されるものではなく、
リップダイから押し出す方法、ドクターブレードによる
方法、コンマコーターによる方法等が用いられる。
The casting method is not particularly limited.
A method using a lip die, a method using a doctor blade, a method using a comma coater, and the like are used.

【0015】金属基材上に流延されたポリエーテルスル
ホン樹脂溶液は、通常、熱風によって乾燥され、金属基
材上にポリエーテルスルホン樹脂フィルムが形成され
る。熱風の温度、量などは乾燥中の表面にさざ波や発泡
が生じることなく、金属基材より剥離する時点で該フィ
ルムが十分に乾燥されているように溶媒の揮発性等を考
慮して適宜設定される。金属基材より剥離されたポリエ
ーテルスルホン樹脂フィルムは、更に適当な乾燥条件下
で、該フィルムの使用目的に応じて要求される残留溶剤
量まで乾燥することができる。
The polyethersulfone resin solution cast on the metal substrate is usually dried by hot air to form a polyethersulfone resin film on the metal substrate. The temperature and amount of the hot air are appropriately set in consideration of the volatility of the solvent so that the film is sufficiently dried at the time when the film is peeled off from the metal substrate without causing ripples and foaming on the surface during drying. Is done. The polyethersulfone resin film peeled from the metal substrate can be further dried under appropriate drying conditions to a residual solvent amount required according to the intended use of the film.

【0016】[0016]

【発明の効果】本発明の方法によれば、金属基材上に形
成されたポリエーテルスルホン樹脂フィルムを金属基材
から剥離する際、フィルムがのびたり破れたりすること
なく、また得られたフィルムも、流延方向と直角方向の
スジ故障の発生のない、透明性、平滑性に優れたポリエ
ーテルスルホン樹脂フィルムを得ることができる。本発
明の方法によって得られたポリエーテルスルホン樹脂フ
ィルムは、目的に応じそのまま使用してもよく、また延
伸などの二次加工を施して、液晶表示装置用のセル用基
板や位相差フィルムなどの光学用途あるいは電子、電気
機器用途、さらには内装材用途として有用である。
According to the method of the present invention, when a polyethersulfone resin film formed on a metal substrate is peeled off from the metal substrate, the film does not stretch or break, and the resulting film is obtained. In addition, it is possible to obtain a polyethersulfone resin film excellent in transparency and smoothness without occurrence of streak failure in a direction perpendicular to the casting direction. The polyethersulfone resin film obtained by the method of the present invention may be used as it is depending on the purpose, or subjected to secondary processing such as stretching, such as a cell substrate for a liquid crystal display device or a retardation film. It is useful for optical applications, electronic and electrical equipment applications, and further as interior material applications.

【0017】[0017]

【実施例】以下、実施例により本発明を詳細に説明する
が、本発明はこれに限定されるものではない。なお、得
られたフィルムのヘーズは、日本精密光学(株)製 ポ
イック積分球式ヘーズメーターを用いて測定した。
EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited to these examples. The haze of the obtained film was measured using a Poick integrating sphere haze meter manufactured by Nippon Seimitsu Kogaku KK.

【0018】参考例1 (ポリエーテルスルホン樹脂の製造)前記の式 化3お
よび化4で示される繰り返し構造単位からなる共重合体
であって、化3で示される繰り返し構造単位の比率が8
2.4モル%であり、1.0g/100mlのN,N−
ジメチルホルムアミド溶液を25℃でオストワルド型粘
度管を用いて測定した還元粘度が0.38dl/gであ
るポリエーテルスルホン樹脂を以下の方法で製造した。
Reference Example 1 (Production of polyether sulfone resin) A copolymer comprising the repeating structural units represented by the above formulas (3) and (4), wherein the ratio of the repeating structural units represented by the formula (3) is 8
2.4 mol%, 1.0 g / 100 ml of N, N-
A polyethersulfone resin having a reduced viscosity of 0.38 dl / g when the dimethylformamide solution was measured at 25 ° C. using an Ostwald-type viscosity tube was produced by the following method.

【0019】撹拌機、窒素導入管、温度計、先端に受器
を付したコンデンサーとを備えた重合槽に、4,4´−
ジヒドロキシジフェニルスルホン、4,4’−ジヒドロ
キシジフェニル、4,4´−ジクロロジフェニルスルホ
ンを上記の繰り返し構造単位となるように仕込み、重合
溶媒としてジフェニルスルホンを4,4´−ジクロロジ
フェニルスルホン100重量部に対して160重量部に
なるように仕込み、系内に窒素ガスを流通させながら1
80℃まで昇温し、モノマーを溶融させた。次に、無水
炭酸カリウムをジオール成分のヒドロキシ基に対して
1.04当量添加した。その後、290℃まで徐々に昇
温し、290℃でさらに2時間反応させた。反応終了
後、反応液を室温まで冷却固化し、細かく粉砕した後、
温水洗浄及びアセトン、メタノール混合溶媒での洗浄を
数回行った後、150℃で加熱乾燥を行い所望のポリエ
ーテルスルホン樹脂粉末を得た。
A polymerization vessel equipped with a stirrer, a nitrogen inlet tube, a thermometer, and a condenser having a receiver at the end was charged with 4,4'-
Dihydroxydiphenylsulfone, 4,4'-dihydroxydiphenyl, and 4,4'-dichlorodiphenylsulfone were charged so as to be the above-mentioned repeating structural unit, and diphenylsulfone was used as a polymerization solvent in 100 parts by weight of 4,4'-dichlorodiphenylsulfone. To a weight of 160 parts by weight, and while flowing nitrogen gas through the system, add 1 part by weight.
The temperature was raised to 80 ° C. to melt the monomer. Next, 1.04 equivalents of anhydrous potassium carbonate was added to the hydroxy group of the diol component. Thereafter, the temperature was gradually raised to 290 ° C., and the reaction was further performed at 290 ° C. for 2 hours. After the completion of the reaction, the reaction solution was cooled and solidified to room temperature, pulverized finely,
After washing with warm water and washing with a mixed solvent of acetone and methanol several times, the resultant was dried by heating at 150 ° C. to obtain a desired polyethersulfone resin powder.

【0020】実施例1〜3 上記ポリエーテルスルホン樹脂を塩化メチレンに樹脂の
濃度が30重量%になるよう添加し、さらに、ポリオキ
シプロピレン−ポリオキシエチレン縮合体(旭電化工業
(株)製 プルロニックF−68T)をポリエーテルス
ルホン樹脂100重量部に対して表1に示す重量比にな
るよう添加した後、攪拌し、樹脂溶液を得た。この樹脂
溶液の25℃における溶液粘度は25poiseであっ
た。この溶液をリップダイを用いて鏡面仕上げの1mm
厚みステンレスベルト上に流延し、60℃の熱風で30
分間乾燥後、剥離し、厚みが100μmのポリエーテル
スルホン樹脂フィルムを得た。このポリエーテルスルホ
ン樹脂フィルムのステンレスベルトからの手による剥離
性の結果と得られたフィルムのヘーズ値を表1に示す。
Examples 1 to 3 The above polyethersulfone resin was added to methylene chloride so that the concentration of the resin was 30% by weight. F-68T) was added at a weight ratio shown in Table 1 with respect to 100 parts by weight of the polyethersulfone resin, followed by stirring to obtain a resin solution. The solution viscosity at 25 ° C. of the resin solution was 25 poise. This solution is mirror-finished using a lip die to 1 mm
Cast on a stainless steel belt with hot air at 60 ° C.
After drying for minutes, the film was peeled off to obtain a polyethersulfone resin film having a thickness of 100 μm. Table 1 shows the results of the peelability of the polyethersulfone resin film from the stainless steel belt by hand and the haze value of the obtained film.

【0021】比較例1 ポリオキシプロピレン−ポリオキシエチレン縮合体を添
加しなかった以外は、実施例1〜3と同様に行った。そ
の評価結果を表1に示す。
Comparative Example 1 The same procedure as in Examples 1 to 3 was carried out except that the polyoxypropylene-polyoxyethylene condensate was not added. Table 1 shows the evaluation results.

【0022】比較例2 ポリオキシプロピレン−ポリオキシエチレン縮合体の添
加量をポリエーテルスルホン樹脂100重量部に対して
0.2重量部とした以外は、実施例1〜3と同様に行っ
た。その評価結果を表1に示す。
Comparative Example 2 The same procedure as in Examples 1 to 3 was carried out except that the amount of the polyoxypropylene-polyoxyethylene condensate was changed to 0.2 part by weight based on 100 parts by weight of the polyether sulfone resin. Table 1 shows the evaluation results.

【0023】比較例3 ポリオキシプロピレン−ポリオキシエチレン縮合体の添
加量をポリエーテルスルホン樹脂100重量部に対して
1.5重量部とした以外は、実施例1〜3と同様に行っ
た。その評価結果を表1に示す。
Comparative Example 3 The same procedure as in Examples 1 to 3 was carried out except that the amount of the polyoxypropylene-polyoxyethylene condensate was changed to 1.5 parts by weight based on 100 parts by weight of the polyether sulfone resin. Table 1 shows the evaluation results.

【0024】[0024]

【表1】 ○:均一に剥離できたことを示す。 ×:は剥がれない、破れるなどの不都合があったことを示す.[Table 1] :: indicates that the film was uniformly peeled. ×: indicates that there was an inconvenience such as not peeling or tearing.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】ポリエーテルスルホン樹脂を溶媒に溶解し
たポリエーテルスルホン樹脂溶液を金属基材上に流延
し、乾燥後、形成したフィルムを金属基材から剥離して
ポリエーテルスルホン樹脂フィルムを製造する方法にお
いて、該ポリエーテルスルホン樹脂溶液にポリオキシプ
ロピレン−ポリオキシエチレン縮合体を添加して行うこ
とを特徴とするポリエーテルスルホン樹脂フィルムの製
造方法。
1. A polyethersulfone resin solution in which a polyethersulfone resin is dissolved in a solvent is cast on a metal substrate, dried, and the formed film is peeled from the metal substrate to produce a polyethersulfone resin film. A method for producing a polyethersulfone resin film, wherein a polyoxypropylene-polyoxyethylene condensate is added to the polyethersulfone resin solution.
【請求項2】ポリオキシプロピレン−ポリオキシエチレ
ン縮合体の添加量が、ポリエーテルスルホン樹脂100
重量部に対して0.3〜1.0重量部である請求項1記
載のポリエーテルスルホン樹脂フィルムの製造方法。
2. The polyoxypropylene-polyoxyethylene condensate is added in an amount of 100 wt.
The method for producing a polyethersulfone resin film according to claim 1, wherein the amount is 0.3 to 1.0 part by weight based on part by weight.
【請求項3】ポリエーテルスルホン樹脂が、下式 化1
および化2で示される繰り返し構造単位からなる重合体
である請求項1記載のポリエーテルスルホン樹脂フィル
ムの製造方法。 【化1】(−Ph−SO2 −Ph−O−) 【化2】 (−Ph−SO2 −Ph−O−Ph−Ph−O−) (式 化1および化2中のPhはフェニル基を表す。)
3. A polyether sulfone resin represented by the following formula:
The method for producing a polyethersulfone resin film according to claim 1, wherein the polymer is a polymer comprising a repeating structural unit represented by the following formula (2). ## STR1 ## (- Ph-SO 2 -Ph- O-) ## STR2 ## (-Ph-SO 2 -Ph-O -Ph-Ph-O-) (Ph in the formula of 1 and formula 2 are phenyl Represents a group.)
JP34345096A 1996-12-24 1996-12-24 Method for producing polyethersulfone resin film Expired - Fee Related JP3331889B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34345096A JP3331889B2 (en) 1996-12-24 1996-12-24 Method for producing polyethersulfone resin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34345096A JP3331889B2 (en) 1996-12-24 1996-12-24 Method for producing polyethersulfone resin film

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JPH10182855A true JPH10182855A (en) 1998-07-07
JP3331889B2 JP3331889B2 (en) 2002-10-07

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Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017138599A1 (en) * 2016-02-10 2017-08-17 住友化学株式会社 Resin film, laminated film, and substrate for flexible printed wiring board
US11104771B2 (en) 2016-02-10 2021-08-31 Sumitomo Chemical Company, Limited Resin film, laminated film, and substrate for flexible printed wiring board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017138599A1 (en) * 2016-02-10 2017-08-17 住友化学株式会社 Resin film, laminated film, and substrate for flexible printed wiring board
US11104771B2 (en) 2016-02-10 2021-08-31 Sumitomo Chemical Company, Limited Resin film, laminated film, and substrate for flexible printed wiring board

Also Published As

Publication number Publication date
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