JPH1018080A - Formation of metallic conductive layer on surface of fluorine plastic body - Google Patents

Formation of metallic conductive layer on surface of fluorine plastic body

Info

Publication number
JPH1018080A
JPH1018080A JP8188292A JP18829296A JPH1018080A JP H1018080 A JPH1018080 A JP H1018080A JP 8188292 A JP8188292 A JP 8188292A JP 18829296 A JP18829296 A JP 18829296A JP H1018080 A JPH1018080 A JP H1018080A
Authority
JP
Japan
Prior art keywords
conductive layer
fluororesin
metal
forming
fluororesin body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8188292A
Other languages
Japanese (ja)
Inventor
Tatsuo Yamaguchi
辰男 山口
Hiroshi Kitazawa
弘 北沢
Shunichi Yoshimura
俊一 吉村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Totoku Electric Co Ltd
Original Assignee
Totoku Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Totoku Electric Co Ltd filed Critical Totoku Electric Co Ltd
Priority to JP8188292A priority Critical patent/JPH1018080A/en
Publication of JPH1018080A publication Critical patent/JPH1018080A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Electric Cables (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method which decreases the number of stages, facilitates stage maintenance and reduces a production cost as a method for formation of a metallic conductive layer on the surface of a body. SOLUTION: (1) The surface of the fluorine plastic body, for example, tetrafluoroethylene resin, subjected to a degreasing treatment is first subjected to an activation treatment by an immersion treatment in a sodium metal- naphthalene complex soln., etc., as an activation treatment stage S1. (2) Next, a conductive coating material, for example, a silver conductive coating material contg. conductive particles consisting of silver is applied on the surface of the fluorine plastic body subjected to the activation treatment and is dried to form a ground surface conductive layer as a conductive coating material applying and drying stage S2. (3)) Next, the surface of the ground surface conductive layer is subjected to copper plating by a copper electroplating treatment using a plating liquid of, for example, copper sulfate, to form a copper plating conductive layer, by which the metallic conductive layer is formed on the surface of the fluorine plastic body, as an electroplating stage S3.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、弗素樹脂体表面に金属
導電層を形成する方法に関する。更に詳しくは、特に高
周波用途の同軸ケーブルや電気回路基板などの部材に使
用される弗素樹脂体表面に金属導電層を形成する方法に
関するものである。
The present invention relates to a method for forming a metal conductive layer on the surface of a fluororesin body. More particularly, the present invention relates to a method for forming a metal conductive layer on the surface of a fluororesin used for a member such as a coaxial cable or an electric circuit board for high frequency use.

【0002】[0002]

【従来の技術】優れた高周波性能の要求される同軸ケー
ブルや電気回路基板などの絶縁部材には低誘電率特性を
持つ弗素樹脂が採用されている。しかしながら、弗素樹
脂は化学的に安定な特性を有するために、その表面に強
固な密着性を有する金属導電層を形成させることはかな
りの困難さを伴っている。そのため、弗素樹脂体表面の
改質を行ってから無電解めっきにより下地金属導電層を
薄く形成させ、次いでこの下地金属導電層の上に電気め
っき法により銅等の金属導電層を厚く形成していた。
2. Description of the Related Art Fluororesins having a low dielectric constant are used for insulating members such as coaxial cables and electric circuit boards which require excellent high-frequency performance. However, since fluororesins have chemically stable properties, it is quite difficult to form a metal conductive layer having strong adhesion on the surface thereof. Therefore, after modifying the surface of the fluororesin body, the underlying metal conductive layer is formed thin by electroless plating, and then a thick metal conductive layer such as copper is formed on the underlying metal conductive layer by electroplating. Was.

【0003】以下、従来の弗素樹脂体表面への金属導電
層形成方法、即ち化学的な表面改質法とめっき法による
弗素樹脂体表面への金属導電層形成方法について、図5
のフロー図を参照して各工程に沿って説明する。なお、
前記フロー図5には、弗素樹脂体表面のアルコール等に
よる脱脂および各工程の後処理としての水洗処理の記載
は除去してある。
A conventional method of forming a metal conductive layer on the surface of a fluororesin body, that is, a method of forming a metal conductive layer on the surface of a fluororesin body by a chemical surface modification method and a plating method will be described with reference to FIG.
Each step will be described with reference to the flowchart of FIG. In addition,
In the flow chart 5, the description of the degreasing of the surface of the fluororesin body with alcohol or the like and the washing process as a post-treatment of each step is removed.

【0004】(1)先ず、活性化処理工程T1として、
脱脂処理された弗素樹脂体表面を金属ナトリウム−ナフ
タレン錯体溶液浸漬処理等により活性化処理する。 (2)次に活性化処理された弗素樹脂体を無電解めっき
する前の前処理工程T2として、 先ずコンディショナ処理で、活性化処理された弗素系
体表面をマイナス(−)に帯電させる。 次にプレディッピング処理で、前記コンディショナ処
理の処理液が次工程の触媒化処理液中に混入するのを防
止する。 次に無電解めっき前の弗素樹脂体表面に触媒金属を析
出させる触媒化工程として、先ずアクチべイティング処
理で、弗素樹脂体表面にPd++とSn++をコロイド状態
で吸着させる。 次にアクセレータ処理で、塩化第一錫(SnC12
と塩化パラジウム(PdC12 )との酸化還元反応
〔Sn+++Pd++→Sn+++++Pd0 〕によって、Pd
++を金属Pdとして弗素樹脂体表面に還元析出させる。
(1) First, as an activation processing step T1,
The surface of the degreased fluororesin body is activated by immersion in a metal sodium-naphthalene complex solution or the like. (2) Next, as a pre-treatment step T2 before electroless plating of the activated fluorine resin body, first, the activated fluorine-based body surface is charged to minus (-) by a conditioner treatment. Next, in the pre-dipping treatment, the treatment liquid of the conditioner treatment is prevented from being mixed into the catalyzing treatment liquid of the next step. Next, as a catalyzing step for depositing a catalytic metal on the surface of the fluororesin body before electroless plating, first, Pd ++ and Sn ++ are adsorbed in a colloidal state on the surface of the fluororesin body by an activating process. Next, in accelerator treatment, stannous chloride (SnCl 2)
Redox reaction of palladium chloride (PDC1 2) and
By [Sn ++ + Pd ++ → Sn ++++ + Pd 0 ], Pd
++ is reduced and precipitated on the surface of the fluororesin body as metal Pd.

【0005】以上の前処理工程T2を経て、金属Pdが
表面に還元析出された弗素樹脂体は無電解めっき工程T
3へと導入される。 (3)無電解めっき工程T3として、例えば無電解ニッ
ケルめっき処理で、金属Pdの析出された弗素樹脂体表
面にニッケルめっきが施され、下地金属めっき層が設け
られる。 (4)次に電気めっき工程T4として、例えば硫酸銅め
っき液を用いる電気銅めっき処理で、前記無電解ニッケ
ルめっき層の上に銅めっきが施され、銅めっき層が設け
られる。 以上の工程を経て、弗素樹脂体表面へ金属めっき導電層
が形成される。
[0005] Through the above pretreatment step T2, the fluororesin body on which the metal Pd is reduced and deposited on the surface is subjected to the electroless plating step T2.
3 is introduced. (3) In the electroless plating step T3, nickel plating is applied to the surface of the fluorine resin body on which the metal Pd is deposited by, for example, electroless nickel plating to provide a base metal plating layer. (4) Next, as an electroplating step T4, copper plating is performed on the electroless nickel plating layer by, for example, an electrolytic copper plating process using a copper sulfate plating solution to provide a copper plating layer. Through the above steps, a metal plating conductive layer is formed on the surface of the fluororesin body.

【0006】[0006]

【発明が解決しようとする課題】上述したように、従来
方法では弗素樹脂体表面に金属導電層を形成するのに多
くの工程を要していた。殊に、無電解めっき工程T3に
先行する前処理工程T2では、無電解めっき前の弗素樹
脂体表面に触媒金属を析出させるという化学吸着反応工
程を伴うため、これに関与する一連の工程数が増え、処
理時間も長くなり、また各工程に於いて安定した条件で
液管理をするのは難しかった。このため、製造コストの
増大と不具合の発生による製品歩留りの低下が問題とな
っていた。
As described above, in the conventional method, many steps were required to form a metal conductive layer on the surface of the fluororesin body. In particular, since the pretreatment step T2 preceding the electroless plating step T3 involves a chemical adsorption reaction step of precipitating a catalytic metal on the surface of the fluororesin body before the electroless plating, a series of steps involved in this is required. However, it has been difficult to control the solution under stable conditions in each step. For this reason, there has been a problem that the production cost increases and the product yield decreases due to the occurrence of defects.

【0007】本発明は上記従来技術が有する各種問題点
を解決するためになされたもので、工程数が少なく、し
かも工程管理が容易で、更に製造コストを低減させる、
弗素樹脂体表面への金属導電層の形成方法を提供するこ
とを目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned various problems of the prior art, and has a small number of processes, easy process management, and further reduces manufacturing costs.
An object of the present invention is to provide a method for forming a metal conductive layer on the surface of a fluororesin body.

【0008】[0008]

【課題を解決するための手段】第1の観点では、本発明
は、弗素樹脂体表面を活性化処理する活性化処理工程
と、活性化処理された弗素樹脂体表面に金属系導電性塗
料を塗布,乾燥して下地金属導電層を形成する導電性塗
料塗布,乾燥工程と、形成された下地金属導電層の上に
電気めっき法により銅めっき層を形成する電気めっき工
程とを有する弗素樹脂体表面への金属導電層形成方法を
提供する。
According to a first aspect of the present invention, there is provided an activation step of activating a surface of a fluororesin body, and applying a metal-based conductive coating on the surface of the activated fluororesin body. A fluororesin body having a conductive paint application and drying step of applying and drying to form a base metal conductive layer, and an electroplating step of forming a copper plating layer on the formed base metal conductive layer by electroplating Provided is a method for forming a metal conductive layer on a surface.

【0009】第2の観点では、本発明は、前記金属系導
電性塗料の導電性粒子が、金,銀,銅,ニッケル,アル
ミニウムの何れかの金属粒子からなる弗素樹脂体表面へ
の金属導電層形成方法を提供する。
According to a second aspect of the present invention, the conductive particles of the metal-based conductive coating are formed on a surface of a fluororesin body made of any one of gold, silver, copper, nickel and aluminum. A method for forming a layer is provided.

【0010】第3の観点では、本発明は、前記活性化処
理が、金属ナトリウム−ナフタレン錯体溶液浸漬処理,
スパッタエッチング処理,エキシマレーザ照射処理,プ
ラズマ処理またはこれらの組合せである弗素樹脂体表面
への金属導電層形成方法を提供する。
[0010] In a third aspect, the present invention provides the method according to the above, wherein the activation treatment is performed by immersing a metal sodium-naphthalene complex solution.
Provided is a method for forming a metal conductive layer on the surface of a fluororesin body, which is a sputter etching treatment, an excimer laser irradiation treatment, a plasma treatment or a combination thereof.

【0011】第4の観点では、本発明は、前記弗素樹脂
体が、中心導体の外周に設けられた被覆弗素樹脂体であ
り、前記各工程により高周波用同軸ケーブルが製造され
る弗素樹脂体表面への金属導電層形成方法を提供する。
According to a fourth aspect of the present invention, there is provided the present invention, wherein the fluororesin body is a coated fluororesin body provided on the outer periphery of a center conductor, and the surface of the fluororesin body from which the high-frequency coaxial cable is manufactured in each of the above steps. To provide a method for forming a metal conductive layer on a substrate.

【0012】第5の観点では、本発明は、前記弗素樹脂
体が、基板を構成する樹脂体であり、前記各工程により
低誘電率プリント基板が製造される弗素樹脂体表面への
金属導電層形成方法を提供する。
According to a fifth aspect of the present invention, there is provided the present invention, wherein the fluororesin body is a resin body constituting a substrate, and a metal conductive layer is formed on the surface of the fluororesin body on which a low dielectric constant printed circuit board is manufactured in each of the steps. A method of forming is provided.

【0013】前記弗素樹脂体としては、四弗化エチレン
樹脂(PTFE),四弗化エチレン−パーフロロアルキ
ルビニルエーテル共重合体樹脂(PFA),四弗化エチ
レン−六弗化プロピレン共重合体樹脂(FEP),四弗
化エチレン−エチレン共重合体樹脂(ETFE)の何れ
かの単体弗素樹脂を用いることができる。
Examples of the fluororesin include a tetrafluoroethylene resin (PTFE), a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer resin (PFA), and a tetrafluoroethylene-hexafluoropropylene copolymer resin ( FEP) or a single fluororesin such as tetrafluoroethylene-ethylene copolymer resin (ETFE) can be used.

【0014】前記金属系導電性塗料としては、前記金,
銀等の導電性粒子をアクリル樹脂,エポキシ樹脂あるい
はPVC樹脂等のバインダー中に均一に分散,混入させ
たもの等が挙げられる。具体例としては、(株)徳力化
学研究所製の商品名:シルベスト P-248,P-255、タツタ
電線(株)製の商品名:DDペースト AE1300 等を挙げ
ることができる。なお、導電性粒子がカーボンブラッ
ク,グラファイト等からなるカーボン系導電性塗料の場
合は電気特性が悪いので好ましくない。また、前記金属
系導電性塗料の他に金属系導電性接着剤を用いることも
できる。
As the metal-based conductive paint, the gold,
Examples thereof include particles in which conductive particles such as silver are uniformly dispersed and mixed in a binder such as an acrylic resin, an epoxy resin, or a PVC resin. Specific examples include Silvest P-248 and P-255 (trade names, manufactured by Tokuri Kagaku Kenkyusho Co., Ltd.) and DD Paste AE1300 (trade name, manufactured by Tatsuta Electric Wire Co., Ltd.). In addition, it is not preferable that the conductive particles are carbon-based conductive paints made of carbon black, graphite, or the like, because the electrical characteristics are poor. In addition, a metal-based conductive adhesive can be used in addition to the metal-based conductive paint.

【0015】[0015]

【作用】本発明の第1の観点による弗素樹脂体表面への
金属導電層形成方法では、弗素樹脂体表面を活性化処理
する活性化処理工程S1と、活性化処理された弗素樹脂
体表面に導電性塗料を塗布,乾燥して下地金属導電層
(以下、下地導電層と略記する)を形成する導電性塗料
塗布,乾燥工程S2と、形成された下地導電層の上に電
気めっき法により銅めっき層を形成する電気めっき工程
S3により弗素樹脂体表面へ金属導電層を形成するの
で、工程数が少なく効率の良い金属導電層形成方法とな
る。
In the method for forming a metal conductive layer on the surface of a fluororesin according to the first aspect of the present invention, an activation step S1 for activating the surface of the fluororesin and a step of activating the surface of the activated fluororesin are performed. A conductive paint application and drying step S2 of applying and drying a conductive paint to form a base metal conductive layer (hereinafter abbreviated as a base conductive layer); and forming a copper on the formed base conductive layer by electroplating. Since the metal conductive layer is formed on the surface of the fluororesin body by the electroplating step S3 for forming the plating layer, the number of steps is small and the method for forming the metal conductive layer is efficient.

【0016】前記下地金属導電層は、導電性塗料の塗
布,乾燥(硬化も含む)により形成されるので、弗素樹
脂体表面との密着性が良くなり、次工程の電気めっきに
より数十〜数百ミクロン厚さの銅めっき層を容易に形成
させることができる。また前記下地導電層の形成では、
導電性塗料を塗布,乾燥させるだけの、極めて単純な工
程で済むので、従来方法の化学吸着反応工程の如き一連
の前処理工程が不要となり、また工程の液管理も不要と
なる。この結果、製造コストが激減し、また製品の品質
も安定して歩留りも向上する。
Since the base metal conductive layer is formed by applying and drying (including curing) a conductive paint, the adhesion to the surface of the fluororesin body is improved, and several tens to several tens by electroplating in the next step. A copper plating layer having a thickness of 100 microns can be easily formed. In the formation of the underlying conductive layer,
Since only a very simple process of applying and drying the conductive paint is required, a series of pretreatment steps such as a conventional chemisorption reaction step is not required, and liquid management in the step is not required. As a result, the manufacturing cost is drastically reduced, the product quality is stabilized, and the yield is improved.

【0017】本発明の第2の観点による弗素樹脂体表面
への金属導電層形成方法では、前記導電性塗料の導電性
粒子が、金,銀,銅,ニッケル,アルミニウムの何れか
の金属粒子からなるので、得られる下地導電層は導電性
が良好となる。
In the method for forming a metal conductive layer on the surface of a fluororesin body according to a second aspect of the present invention, the conductive particles of the conductive paint are made of any one of gold, silver, copper, nickel and aluminum. Therefore, the obtained underlying conductive layer has good conductivity.

【0018】本発明の第3の観点による弗素樹脂体表面
への金属導電層形成方法では、前記活性化処理が、金属
ナトリウム−ナフタレン錯体溶液浸漬処理,スパッタエ
ッチング処理,エキシマレーザ照射処理,プラズマ処理
またはこれらの組合せからなるので、弗素樹脂体表面の
活性化が良好に行え、下地導電層との密着性が良好とな
る。
In the method for forming a metal conductive layer on the surface of a fluororesin body according to a third aspect of the present invention, the activation treatment is performed by immersing a metal sodium-naphthalene complex solution, sputter etching, excimer laser irradiation, plasma treatment. Alternatively, because of the combination thereof, the activation of the surface of the fluororesin body can be favorably performed, and the adhesion to the underlying conductive layer is improved.

【0019】本発明の第4の観点による弗素樹脂体表面
への金属導電層形成方法では、前記弗素樹脂体が、中心
導体の外周に設けられた被覆弗素樹脂体であり、前記各
工程により高周波用同軸ケーブルが製造されるので、特
性の良い高周波用同軸ケーブが効率良く得られる。
According to a fourth aspect of the present invention, in the method for forming a metal conductive layer on the surface of a fluororesin body, the fluororesin body is a coated fluororesin body provided on the outer periphery of a center conductor. Since the coaxial cable for high frequency is manufactured, a coaxial cable for high frequency with good characteristics can be efficiently obtained.

【0020】本発明の第5の観点による弗素樹脂体表面
への金属導電層形成方法では、前記弗素樹脂体が、基板
を構成する弗素樹脂体であり、前記各工程により低誘電
率プリント基板が製造されるので、特性の良い低誘電率
プリント基板が効率良く得られる。
In the method for forming a metal conductive layer on the surface of a fluororesin body according to a fifth aspect of the present invention, the fluororesin body is a fluororesin body constituting a substrate, and a low dielectric constant printed circuit board is formed by each of the steps. Since it is manufactured, a low dielectric constant printed circuit board having good characteristics can be efficiently obtained.

【0021】[0021]

【実施例】本発明の弗素樹脂体表面への金属導電層形成
方法について、実施例を挙げて詳細に説明する。なお、
本発明は本実施例に限定されるものではない。 実施例1 実施例1について、本発明の弗素樹脂体表面への金属導
電層形成方法を説明するためのフロー図1に沿って説明
する。なお、フロー図1には、弗素樹脂体表面のアルコ
ール等による脱脂および各工程の後処理としての水洗処
理の記載は除去してある。
EXAMPLES The method of forming a metal conductive layer on the surface of a fluororesin body of the present invention will be described in detail with reference to examples. In addition,
The present invention is not limited to this embodiment. Example 1 Example 1 will be described with reference to a flow chart 1 for explaining a method for forming a metal conductive layer on the surface of a fluororesin body of the present invention. In FIG. 1, the descriptions of the degreasing of the surface of the fluororesin body with alcohol and the like and the washing process as a post-treatment of each step are removed.

【0022】(1)先ず、活性化処理工程S1として、
脱脂処理された弗素樹脂体、例えば四弗化エチレン樹脂
(PTFE)表面を金属ナトリウム−ナフタレン錯体溶
液浸漬処理等により活性化処理する。 (2)次に導電性塗料塗布,乾燥工程S2として、前記
活性化処理された弗素樹脂体表面に導電性塗料、例えば
導電性粒子が銀からなる銀系導電性塗料を塗布,乾燥し
て下地導電層を形成する。 (3)次に電気めっき工程S3として、例えば硫酸銅め
っき液を用いる電気銅めっき処理で、前記下地導電層の
上に銅めっきを施し、銅めっき導電層を形成する。 以上の工程を経て、弗素樹脂体表面へ金属導電層を形成
する。
(1) First, as an activation processing step S1,
The surface of the degreased fluororesin body, for example, the surface of a tetrafluoroethylene resin (PTFE) is activated by immersion treatment with a metal sodium-naphthalene complex solution. (2) Next, as a conductive paint application and drying step S2, a conductive paint, for example, a silver-based conductive paint in which conductive particles are made of silver is applied and dried on the surface of the activated fluororesin body, and dried. A conductive layer is formed. (3) Next, as an electroplating step S3, copper plating is performed on the underlying conductive layer by, for example, electrolytic copper plating using a copper sulfate plating solution to form a copper-plated conductive layer. Through the above steps, a metal conductive layer is formed on the surface of the fluororesin body.

【0023】実施例2 次に、本発明方法を適用した高周波用同軸ケーブルの実
施例について、前記図1および高周波用同軸ケーブルの
断面図2を用いて説明する。中心導体1として、線径0.
203mの銀めっき銅被覆鋼線上に、弗素樹脂体2として四
弗化エチレン樹脂(PTFE)を押出し被覆し、外径0.
66mmの弗素樹脂線材3とした。この線材3をアルコール
液中に通して、表面の油脂等の除去を行った後、活性化
処理工程S1として、液温10℃の金属ナトリウム−ナ
フタレン錯体溶液〔(株)潤工社製の商品名:テトラエ
ッチ〕中を1分間浸漬通過させて表面活性化処理し、次
いで水洗いした。続いて、導電性塗料塗布,乾燥工程S
2として、活性化処理された弗素樹脂線材3を、銀系導
電性塗料〔(株)徳力化学研究所製の商品名:シルベス
ト P-248( 62%銀, 11%バインダー, 26%溶剤) 〕中を
0.1分間浸漬通過させてからフェルトにより余分な塗
料を絞り、該線材3のPTFE被覆の表面に均一に導電
性塗料を塗布し、続いて100 ℃で1分間乾燥させて、被
覆表面に3μm 厚さの下地導電層4を形成させた。引き
続いて、電気めっき工程S3として、液温25℃の硫酸
銅めっき液中に導入し、4A/dm2 の電流密度条件
で、120 分間、銅の電気めっきを行い、100 μm 厚さの
銅めっき導電層5を形成し、次いで水洗いして高周波用
同軸ケーブル6を得た。
Embodiment 2 Next, an embodiment of a high-frequency coaxial cable to which the method of the present invention is applied will be described with reference to FIG. 1 and a sectional view 2 of the high-frequency coaxial cable. As center conductor 1, wire diameter 0.
A 203 m silver-plated copper-coated steel wire is extruded and coated with a tetrafluoroethylene resin (PTFE) as a fluorine resin body 2 to have an outer diameter of 0.1 mm.
A 66 mm fluororesin wire 3 was used. After passing the wire 3 through an alcohol solution to remove fats and oils on the surface, as an activation treatment step S1, a metal sodium-naphthalene complex solution at a liquid temperature of 10 ° C. [trade name of Junkosha Co., Ltd .: [Tetra etch] for 1 minute to perform a surface activation treatment, and then washed with water. Subsequently, a conductive paint application and drying step S
As an example 2, the activated fluororesin wire 3 was replaced with a silver-based conductive paint [trade name: Sylvest P-248 (62% silver, 11% binder, 26% solvent) manufactured by Tokurika Kagaku Kenkyusho]] After passing through the inside for 0.1 minute, the excess paint is squeezed out by felt, and the conductive paint is uniformly applied to the surface of the PTFE coating of the wire 3 and subsequently dried at 100 ° C. for 1 minute to obtain a coated surface. Then, an underlying conductive layer 4 having a thickness of 3 μm was formed. Subsequently, as an electroplating step S3, the resultant was introduced into a copper sulfate plating solution at a liquid temperature of 25 ° C., and electroplated with copper at a current density of 4 A / dm 2 for 120 minutes to form a 100 μm thick copper plate. The conductive layer 5 was formed and then washed with water to obtain a high-frequency coaxial cable 6.

【0024】実施例3 次に、本発明方法を適用した低誘電プリント基板の実施
例について前記図1およびプリント基板の要部を示す断
面図3を用いて説明する。弗素樹脂体11として、所定
の位置にスルーホールを設けた縦150mm ×横150mm ×厚
さ1mm のPTFE基板を用い、このPTFE基板11表
面の油脂等をアルコール液中にて除去した後、活性化処
理工程S1として、液温10℃の金属ナトリウムーナフ
タレン錯体溶液中に1分間浸漬して表面活性化処理し、
次いで水洗いした。続いて導電性塗料塗布,乾燥工程S
2として、活性化処理されたPTFE基板11を、実施
例2と同じ銀系導電性塗料中に10秒間浸漬し、引き上
げた後、100 ℃で2分間乾燥させて、表面に3μm 厚さ
の下地導電層12を形成させた。引き続いて、電気めっ
き工程S3として、実施例2と同じ液温25℃の硫酸銅
めっき液中にて、5A/dm2 の電流密度条件で45分
間、銅の電気めっきを行い、下地導電層12の上に15
μm 厚さの銅めっき導電層13を形成し、次いで水洗い
した。
Embodiment 3 Next, an embodiment of a low dielectric printed circuit board to which the method of the present invention is applied will be described with reference to FIG. 1 and a sectional view 3 showing a main part of the printed circuit board. As the fluororesin body 11, a 150 mm × 150 mm × 1 mm thick PTFE substrate provided with a through hole at a predetermined position is used. After removing fats and oils on the surface of the PTFE substrate 11 in an alcohol solution, activation is performed. As a treatment step S1, a surface activation treatment is performed by immersing in a metal sodium naphthalene complex solution at a liquid temperature of 10 ° C. for 1 minute,
Then, it was washed with water. Subsequently, conductive paint application and drying process S
As No. 2, the activated PTFE substrate 11 was immersed in the same silver-based conductive paint as in Example 10 for 10 seconds, pulled up, and dried at 100 ° C. for 2 minutes to form a 3 μm thick base on the surface. The conductive layer 12 was formed. Subsequently, as an electroplating step S3, copper electroplating was performed for 45 minutes in a copper sulfate plating solution at the same solution temperature of 25 ° C. as in Example 2 at a current density of 5 A / dm 2 , and the underlying conductive layer 12 was formed. 15 on
A copper-plated conductive layer 13 having a thickness of μm was formed and then washed with water.

【0025】次いで、図示はしないが、公知の配線パタ
ーン形成法である、レジスト塗布→プリベーク→露光→
現像→洗浄→ポストベーク→エッチング→レジスト剥離
の工程からなるフォトファブリケーション法により、前
記銅めっき導電層13が形成されたPTFE基板11の
両面及びスルホール14に配線パターンを形成し、低誘
電率プリント基板15を得た。
Next, although not shown, resist coating → prebaking → exposure →
A wiring pattern is formed on both surfaces and through holes 14 of the PTFE substrate 11 on which the copper-plated conductive layer 13 is formed by a photofabrication method including a step of development → cleaning → post bake → etching → resist stripping, and a low dielectric constant print is performed. Substrate 15 was obtained.

【0026】実施例4 次に、本発明方法を適用した低誘電プリント基板の他の
実施例について、前記図1および低誘電率プリント基板
を説明するための略図4を用いて説明する。なお、同図
(a)は圧膜スクリーン印刷法により弗素樹脂基板上に
配線パターンが形成される状態を示す断面図であり、ス
キージs、パターニング用スクリーンpを用い導電性塗
料dによるパターン22’を印刷により形成させるもの
である。また同図(b)は下地導電層を形成させた弗素
樹脂基板を示す斜視図であり、更に同図(c)は下地導
電層の上に銅めっき導電層を形成させた低誘電率プリン
ト基板を示す断面図である。
Embodiment 4 Next, another embodiment of a low dielectric printed circuit board to which the method of the present invention is applied will be described with reference to FIG. 1 and a schematic diagram 4 for explaining a low dielectric constant printed circuit board. FIG. 4A is a cross-sectional view showing a state in which a wiring pattern is formed on a fluororesin substrate by a pressure screen printing method, and a pattern 22 'made of a conductive paint d using a squeegee s and a patterning screen p. Is formed by printing. FIG. 1B is a perspective view showing a fluororesin substrate on which an underlying conductive layer is formed, and FIG. 1C is a low dielectric constant printed circuit board on which a copper plating conductive layer is formed on the underlying conductive layer. FIG.

【0027】上記実施例3と同一のPTFE基板21を
用い、活性化処理工程S1迄は前記実施例3と同様に行
った。次に導電性塗料塗布,乾燥工程S2として、先ず
図4(a)に示すように、活性化処理されたPTFE板
21の表面に実施例2と同じ導電性塗料dを圧膜スクリ
ーン印刷法を用いて配線パターン22’を印刷して塗布
し、続いて100 ℃で2分間乾燥して図4(b)に示すよ
うに10μm 厚さの下地導電層22を形成させた。引き
続いて電気めっき工程S3として、前記実施例2と同じ
液温25℃の硫酸銅めっき液中にて5A/dm2 の電流
密度条件で30分間銅の電気めっきを行い、図4(c)
に示すように、前記下地導電層22の上に15μm 厚さ
の銅めっき導電層23を形成し、次いで水洗いして低誘
電率プリント基板25を得た。
The same PTFE substrate 21 as in the third embodiment was used, and the same steps as in the third embodiment were performed up to the activation processing step S1. Next, as a conductive paint application and drying step S2, first, as shown in FIG. 4 (a), the same conductive paint d as in Example 2 is applied to the surface of the activated PTFE plate 21 by a pressure screen screen printing method. Then, a wiring pattern 22 'was printed and applied, followed by drying at 100 ° C. for 2 minutes to form a base conductive layer 22 having a thickness of 10 μm as shown in FIG. 4B. Subsequently, as an electroplating step S3, copper electroplating was performed in the same copper sulfate plating solution at a solution temperature of 25 ° C. at a current density of 5 A / dm 2 for 30 minutes in the same manner as in Example 2, and FIG.
As shown in FIG. 7, a copper plating conductive layer 23 having a thickness of 15 μm was formed on the underlying conductive layer 22 and then washed with water to obtain a low dielectric constant printed circuit board 25.

【0028】比較例 比較例1 比較例1について、前記フロー図5および前記同軸ケー
ブルの断面図2を用いて説明する。前記実施例2と同一
構造の弗素樹脂線材3を用い、図5に示す活性化処理工
程T1、前処理工程T2および無電解めっき工程T3に
よって、下地導電層4の無電解ニッケルめっき層を 0.1
μm 厚さに形成した。次いで実施例2と全く同一の処理
条件にて電気めっき工程T4を行い、100 μm 厚さの銅
めっき導電層5を形成し、次いで水洗いして高周波用同
軸ケーブル6を得た。なお、活性化処理工程T1は前記
実施例2の活性化処理工程S1と全く同一である。
Comparative Example Comparative Example 1 Comparative Example 1 will be described with reference to the flow chart 5 and the sectional view 2 of the coaxial cable. Using the fluororesin wire 3 having the same structure as that of the second embodiment, the electroless nickel plating layer of the underlying conductive layer 4 was reduced to 0.1 by the activation process T1, the pretreatment process T2, and the electroless plating process T3 shown in FIG.
It was formed to a thickness of μm. Next, an electroplating step T4 was performed under exactly the same processing conditions as in Example 2 to form a copper-plated conductive layer 5 having a thickness of 100 μm, followed by washing with water to obtain a high-frequency coaxial cable 6. The activation processing step T1 is exactly the same as the activation processing step S1 of the second embodiment.

【0029】上記実施例2および比較例1について、下
地導電層の厚さ、表面活性化処理から下地導電層形成ま
での処理時間,処理液の管理性及び高周波用同軸ケーブ
ルの減衰特性を試験した結果を下記表1に示す。
With respect to Example 2 and Comparative Example 1, the thickness of the underlying conductive layer, the processing time from the surface activation treatment to the formation of the underlying conductive layer, the controllability of the processing solution, and the attenuation characteristic of the high-frequency coaxial cable were tested. The results are shown in Table 1 below.

【0030】[0030]

【表1】 [Table 1]

【0031】上記表1から明らかな如く、本発明によれ
ば従来方法に比べ弗素樹脂体表面への下地導電層形成時
間が短縮され、また処理液の管理性にも優れることが分
かる。また、本発明により得られる高周波用同軸ケーブ
ルは、移動体通信などに使用されている 2.0GHzまで
の周波数領域における減衰特性が良好である。
As is clear from Table 1 above, according to the present invention, the time required for forming the underlying conductive layer on the surface of the fluororesin body is shorter than that of the conventional method, and the controllability of the processing solution is excellent. Further, the high-frequency coaxial cable obtained by the present invention has good attenuation characteristics in a frequency region up to 2.0 GHz used for mobile communication and the like.

【0032】[0032]

【発明の効果】本発明の弗素樹脂体表面への金属導電層
形成方法によれば、下地導電層の形成にあたっては、従
来方法の無電解めっき工程の前に必要とされた化学吸着
反応の一連の前処理工程が不要となり、極めて単純な工
程で済むようになった。その結果、工程処理時間が数百
分の一から数十分の一に短縮し、また液管理の負担も低
減されようになったので製造コストが激減し、製品の品
質も安定し、また歩留りも向上した。また、本発明の方
法による高周波用同軸ケーブルは、移動体通信用途とし
て使用されている2GHz程度までは従来方法と同等の
伝送特性が得られる。また、本発明の方法による低誘電
率プリント基板は、表皮効果により下地導電層の抵抗は
殆ど関与しないので、優れた高周波特性を持たせること
ができる。従って、本発明は、特に高周波用同軸ケーブ
ルや低誘電率プリント基板の製造に極めて有効であり、
産業上に寄与する効果は極めて大である。
According to the method for forming a metal conductive layer on the surface of a fluororesin body of the present invention, the formation of the underlying conductive layer requires a series of chemical adsorption reactions required before the electroless plating step of the conventional method. This eliminates the need for a pre-treatment step, and requires only a very simple step. As a result, the processing time has been reduced from hundreds to several tenths, and the burden of liquid management has been reduced, resulting in drastic reductions in manufacturing costs, stable product quality, and high yields. Also improved. Further, the high-frequency coaxial cable according to the method of the present invention can obtain transmission characteristics equivalent to those of the conventional method up to about 2 GHz used for mobile communication. In addition, the low-permittivity printed circuit board according to the method of the present invention can have excellent high-frequency characteristics because the resistance of the underlying conductive layer hardly contributes due to the skin effect. Therefore, the present invention is extremely effective especially in the production of high-frequency coaxial cables and low dielectric constant printed circuit boards,
The effect that contributes to the industry is extremely large.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の弗素樹脂体表面への金属導電層形成方
法を示すフロー図である。
FIG. 1 is a flowchart showing a method for forming a metal conductive layer on the surface of a fluororesin body of the present invention.

【図2】本発明の実施例2の高周波用同軸ケーブルを示
す断面図である。(比較例の説明にも使用)
FIG. 2 is a sectional view showing a high-frequency coaxial cable according to a second embodiment of the present invention. (Also used for explaining comparative examples)

【図3】本発明の実施例3の低誘電率プリント基板の要
部を示す断面図である。
FIG. 3 is a sectional view showing a main part of a low dielectric constant printed circuit board according to a third embodiment of the present invention.

【図4】本発明の実施例4の低誘電率プリント基板を説
明するための略図である。(a)は圧膜スクリーン印刷
法により弗素樹脂基板上に配線パターンが形成される状
態を示す断面図である。(b)は下地導電層を形成させ
た弗素樹脂基板を示す斜視図である。(c)は下地導電
層の上に銅めっき導電層を形成させた低誘電率プリント
基板を示す断面図である。
FIG. 4 is a schematic diagram for explaining a low dielectric constant printed circuit board according to Example 4 of the present invention. FIG. 3A is a cross-sectional view showing a state in which a wiring pattern is formed on a fluororesin substrate by a pressure screen printing method. (B) is a perspective view showing a fluororesin substrate on which a base conductive layer is formed. (C) is a sectional view showing a low dielectric constant printed circuit board in which a copper-plated conductive layer is formed on a base conductive layer.

【図5】従来の弗素樹脂体表面への金属導電層形成方法
を示すフロー図である。
FIG. 5 is a flowchart showing a conventional method for forming a metal conductive layer on the surface of a fluororesin body.

【符号の説明】[Explanation of symbols]

1 中心導体 2 弗素樹脂体 3 弗素樹脂線材 4,12,22 下地導電層 5,13,23 電気銅めっき層 6 高周波用同軸ケーブル 11,21 弗素樹脂基板 14 スルホール 15 25 低誘電率プリント基板 22’パターン d 導電性塗料 p パターニング用スクリーン s スキージ REFERENCE SIGNS LIST 1 center conductor 2 fluororesin body 3 fluororesin wire 4,12,22 underlying conductive layer 5,13,23 electrolytic copper plating layer 6 high-frequency coaxial cable 11,21 fluororesin substrate 14 through hole 15 25 low dielectric constant printed circuit board 22 ′ Pattern d conductive paint p patterning screen s squeegee

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H05K 1/09 H05K 1/09 C 3/24 7511−4E 3/24 A ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code Agency reference number FI Technical indication location H05K 1/09 H05K 1/09 C 3/24 7511-4E 3/24 A

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 弗素樹脂体表面を活性化処理する活性化
処理工程と、活性化処理された弗素樹脂体表面に金属系
導電性塗料を塗布,乾燥して下地金属導電層を形成する
導電性塗料塗布,乾燥工程と、形成された下地金属導電
層の上に電気めっき法により銅めっき層を形成する電気
めっき工程とを有することを特徴とする弗素樹脂体表面
への金属導電層形成方法。
An activation process for activating the surface of a fluororesin body, and a conductive process for applying a metal conductive paint on the surface of the activated fluororesin body and drying to form a base metal conductive layer. A method for forming a metal conductive layer on a surface of a fluororesin body, comprising: a step of applying and drying a paint; and an electroplating step of forming a copper plating layer on the formed underlying metal conductive layer by an electroplating method.
【請求項2】 前記金属系導電性塗料の導電性粒子が、
金,銀,銅,ニッケル,アルミニウムの何れかの金属粒
子からなることを特徴とする請求項1記載の弗素樹脂体
表面への金属導電層形成方法。
2. The conductive particles of the metal-based conductive paint,
2. The method for forming a metal conductive layer on the surface of a fluororesin body according to claim 1, comprising a metal particle of any one of gold, silver, copper, nickel and aluminum.
【請求項3】 前記活性化処理が、金属ナトリウム−ナ
フタレン錯体溶液浸漬処理,スパッタエッチング処理,
エキシマレーザ照射処理,プラズマ処理またはこれらの
組合せであることを特徴とする請求項1または2記載の
弗素樹脂体表面への金属導電層形成方法。
3. The activation treatment includes a metal sodium-naphthalene complex solution immersion treatment, a sputter etching treatment,
3. The method for forming a metal conductive layer on a surface of a fluororesin body according to claim 1, wherein the method is an excimer laser irradiation treatment, a plasma treatment, or a combination thereof.
【請求項4】 前記弗素樹脂体が、中心導体の外周に設
けられた被覆弗素樹脂体であり、前記各工程により高周
波用同軸ケーブルが製造されることを特徴とする請求項
1、2または3記載の弗素樹脂体表面への金属導電層形
成方法。
4. The high-frequency coaxial cable according to claim 1, wherein the fluororesin body is a coated fluororesin body provided on an outer periphery of a center conductor, and a high-frequency coaxial cable is manufactured in each of the steps. The method for forming a metal conductive layer on the surface of a fluororesin body according to the above.
【請求項5】 前記弗素樹脂体が、基板を構成する弗素
樹脂体であり、前記各工程により低誘電率プリント基板
が製造されることを特徴とする請求項1、2または3記
載の弗素樹脂体表面への金属導電層形成方法。
5. The fluororesin according to claim 1, wherein the fluororesin body is a fluororesin body constituting a substrate, and a low-dielectric-constant printed circuit board is manufactured by each of the steps. A method for forming a metal conductive layer on a body surface.
JP8188292A 1996-06-27 1996-06-27 Formation of metallic conductive layer on surface of fluorine plastic body Pending JPH1018080A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8188292A JPH1018080A (en) 1996-06-27 1996-06-27 Formation of metallic conductive layer on surface of fluorine plastic body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8188292A JPH1018080A (en) 1996-06-27 1996-06-27 Formation of metallic conductive layer on surface of fluorine plastic body

Publications (1)

Publication Number Publication Date
JPH1018080A true JPH1018080A (en) 1998-01-20

Family

ID=16221081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8188292A Pending JPH1018080A (en) 1996-06-27 1996-06-27 Formation of metallic conductive layer on surface of fluorine plastic body

Country Status (1)

Country Link
JP (1) JPH1018080A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009123490A (en) * 2007-11-14 2009-06-04 Hitachi Cable Ltd Coaxial cable, and manufacturing method thereof
US20120031656A1 (en) * 2009-04-24 2012-02-09 Yoshio Oka Substrate for printed wiring board, printed wiring board, and methods for producing same
JP2013021366A (en) * 2009-04-24 2013-01-31 Sumitomo Electric Ind Ltd Substrate for printed wiring board, printed wiring board, and method for manufacturing substrate for printed wiring board
JP2014506737A (en) * 2011-02-25 2014-03-17 タイワン グリーン ポイント エンタープライジーズ カンパニー リミテッド Harmless technique for making continuous conductive circuits on the surface of non-conductive substrates
US10076028B2 (en) 2015-01-22 2018-09-11 Sumitomo Electric Industries, Ltd. Substrate for printed circuit board, printed circuit board, and method for producing printed circuit board
US10237976B2 (en) 2014-03-27 2019-03-19 Sumitomo Electric Industries, Ltd. Substrate for printed circuit board, printed circuit board, and method for producing substrate for printed circuit board

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009123490A (en) * 2007-11-14 2009-06-04 Hitachi Cable Ltd Coaxial cable, and manufacturing method thereof
US20120031656A1 (en) * 2009-04-24 2012-02-09 Yoshio Oka Substrate for printed wiring board, printed wiring board, and methods for producing same
JP2013021366A (en) * 2009-04-24 2013-01-31 Sumitomo Electric Ind Ltd Substrate for printed wiring board, printed wiring board, and method for manufacturing substrate for printed wiring board
JP2014506737A (en) * 2011-02-25 2014-03-17 タイワン グリーン ポイント エンタープライジーズ カンパニー リミテッド Harmless technique for making continuous conductive circuits on the surface of non-conductive substrates
US10237976B2 (en) 2014-03-27 2019-03-19 Sumitomo Electric Industries, Ltd. Substrate for printed circuit board, printed circuit board, and method for producing substrate for printed circuit board
US10076028B2 (en) 2015-01-22 2018-09-11 Sumitomo Electric Industries, Ltd. Substrate for printed circuit board, printed circuit board, and method for producing printed circuit board

Similar Documents

Publication Publication Date Title
US3698940A (en) Method of making additive printed circuit boards and product thereof
US3099608A (en) Method of electroplating on a dielectric base
US4217182A (en) Semi-additive process of manufacturing a printed circuit
US3506482A (en) Method of making printed circuits
US3854973A (en) Method of making additive printed circuit boards
US3666549A (en) Method of making additive printed circuit boards and product thereof
US4830880A (en) Formation of catalytic metal nuclei for electroless plating
JPH0799790B2 (en) Method of manufacturing printed circuit board
US20190174637A1 (en) Method of manufacturing a polymer printed circuit board
US4783247A (en) Method and manufacture for electrically insulating base material used in plated-through printed circuit panels
US4430154A (en) Method of producing printed circuit boards
GB2090476A (en) Electrical conductors arranged in multiple layers and preparation thereof
JPH1018080A (en) Formation of metallic conductive layer on surface of fluorine plastic body
CN100424226C (en) Method for electroless metalisation of polymer substrate
USRE28042E (en) Method of making additive printed circuit boards and product thereof
JP2001110940A (en) Semiconductor package substrate and manufacturing method thereof
JPS6350878B2 (en)
JP2987556B2 (en) Method for forming metal conductive layer on fluororesin body surface
GB2038101A (en) Printed circuits
JPH03264678A (en) Copper powder for conductive paste
CN110149790B (en) Graphene electromagnetic shielding film and preparation method thereof
CA2177708C (en) Method of making a printed circuit board
JPH06260759A (en) Manufacture of printed circuit board
JP2842631B2 (en) Manufacturing method of printed wiring board
JP2513158B2 (en) Manufacturing method of printed wiring board