JPH10158080A - Glaze to form vitreous glaze layer on surface of refractory material in furnace and forming method of vitreous glaze layer - Google Patents

Glaze to form vitreous glaze layer on surface of refractory material in furnace and forming method of vitreous glaze layer

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Publication number
JPH10158080A
JPH10158080A JP28731697A JP28731697A JPH10158080A JP H10158080 A JPH10158080 A JP H10158080A JP 28731697 A JP28731697 A JP 28731697A JP 28731697 A JP28731697 A JP 28731697A JP H10158080 A JPH10158080 A JP H10158080A
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JP
Japan
Prior art keywords
glaze
weight
furnace
glaze layer
refractory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28731697A
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Japanese (ja)
Other versions
JP3128213B2 (en
Inventor
Seiichi Sakaguchi
誠一 坂口
Mitsutoshi Murase
光俊 村瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kagaku Kogyo Co Ltd
Original Assignee
Asahi Kagaku Kogyo Co Ltd
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Priority to JP09287316A priority Critical patent/JP3128213B2/en
Publication of JPH10158080A publication Critical patent/JPH10158080A/en
Application granted granted Critical
Publication of JP3128213B2 publication Critical patent/JP3128213B2/en
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Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a glazing material to form a dense vitreous glaze layer having high durability on a refractory wall material of a high temp. furnace by a thermal spraying method, and to provide a forming method of a vitreous glaze layer. SOLUTION: The glazing material contains 10 to 40wt.% R2 O calculated as oxides (wherein R is Na or K), 0 to 10wt.% Li2 O and 0 to 10wt.% B2 O3 , and the balance SiO2 and has <=900 deg.C melting point. The glazing material or the glazing material with addition of a controlling agent for the coef. of thermal expansion in the same or smaller amt. as that of the glazing material is applied on the surface of a refractory material in a hot sate or in a cool state, and then heated to a temp. higher than the melting point of the glazing material but lower than the operating temp. of the furnace so as to form a vitreous glaze layer.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、高温炉の壁面である耐
火煉瓦、不定形耐火物、目地などの部位に熱間または冷
間で施工し、前記耐火物表面にガラス状釉層を形成する
釉薬およびガラス状釉層を形成する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for hot or cold construction of refractory bricks, irregular refractories, joints, etc., which are walls of a high-temperature furnace, to form a glass-like glaze layer on the surface of the refractory. And a method for forming a glassy glaze layer.

【0002】[0002]

【従来の技術】高温炉、たとえばコークス炉は石炭を約
1100℃で20〜25時間蒸焼することによってコー
クスを製造する。この石炭の乾留過程でタール状物質や
炭化水素のガスが発生する。これらはコークス炉内壁、
炉蓋、石炭投入口等の隙間や、炉体耐火物の開口気孔に
侵入、熱分解炭化して強固なカーボンの付着物を形成す
る。またカーボン焼成炉は、カーボン原料を焼成してカ
ーボンを製造する。このカーボン原料の焼成に際してカ
ーボンの一部が飛散して、炉内耐火物に強固に付着成長
する。
BACKGROUND OF THE INVENTION High temperature furnaces, such as coke ovens, produce coke by steaming coal at about 1100 DEG C. for 20 to 25 hours. Tar-like substances and hydrocarbon gases are generated during the coal distillation process. These are the inner wall of the coke oven,
It penetrates into gaps such as furnace lids and coal inlets, and open pores of the furnace refractory, and undergoes pyrolytic carbonization to form strong carbon deposits. The carbon firing furnace produces carbon by firing carbon raw materials. When the carbon raw material is fired, a part of the carbon is scattered and firmly grows on the refractory in the furnace.

【0003】このカーボン付着物は耐火物の融点を低下
させ、かつ耐火物の脆化の原因となる。また堆積するカ
ーボン付着物のために炉蓋の開閉が困難になり、かつ炉
蓋の炉に対する密封性を悪くする。このため付着したカ
ーボンを機械的に除去することも行われているが、付着
が強固なため、除去作業に長時間かかり、作業環境も劣
悪である。さらに除去作業中に、耐火物自体の表面が削
り取られることもある。別の方法として、空気または酸
素ガスを吹き込んで焼き落としを行っているが、この方
法では作業範囲は炉口近傍に限られてしまう。炉の全域
を清掃するためには、炉の操業を中断し、炉を空窯状態
にして焼落としせねばならない。しかし焼落とし作業自
体苛酷な高熱作業であるとともに、焼落とし時の燃焼熱
は炉体の耐火物に対して局部的な高熱状態をもたらし、
炉体損傷の原因ともなる。またコークス炉は、長期の使
用によって、たとえば目地切れなどが発生する。
[0003] The carbon deposits lower the melting point of the refractory and cause embrittlement of the refractory. In addition, the deposited carbon deposits make it difficult to open and close the furnace lid and deteriorate the hermeticity of the furnace lid to the furnace. For this reason, the adhered carbon is mechanically removed, but the adherence is so strong that the removal operation takes a long time and the working environment is poor. Further, during the removal operation, the surface of the refractory itself may be scraped off. As another method, burning is performed by blowing air or oxygen gas, but in this method, the working range is limited to the vicinity of the furnace port. To clean the entire area of the furnace, the furnace must be shut down and the furnace left empty to burn down. However, the burn-off operation itself is a severe high-temperature operation, and the combustion heat at the time of burn-down brings a local high-temperature state to the refractory of the furnace body,
It may cause furnace body damage. In addition, a coke oven, for example, is subject to joint breakage due to long-term use.

【0004】このような状況に対し、従来よりカーボン
の付着しにくい耐火物や耐火物表面をカーボンの付着し
難いコーティング膜で被覆することおよび目地切れなど
を補修する方法について種々検討されてきた。たとえ
ば、 特公昭62−19477:炭化ケイ素、窒化珪素また
は黒鉛粒子と無機結合剤とから成る組成物をコークス炉
内の内張り煉瓦上に塗布する。 特開昭62−197371:炭化ケイ素、窒化ケイ素
などから成る耐熱性およびタール性物質浸透防止性付与
剤と、リン酸塩、酸化イットリウムなどから成るバイン
ダーと、チタン酸カリウム繊維から成る断熱性付与剤と
をコークス炉の内壁面に塗布する。 特公昭63−40463:黒鉛粉末とコロイダルシリ
カ、アルミナゾルなどの無機バインダーをコークス炉の
ドア用内張耐火物に塗布する。 特開昭63−236783:釉薬と煉瓦を同時焼成し
釉層が形成されたコークス炉用耐火煉瓦を製造する。
In order to cope with such a situation, various studies have been made on a refractory to which carbon does not easily adhere and a method for coating the surface of the refractory with a coating film to which carbon does not easily adhere and for repairing joint breakage. For example, Japanese Patent Publication No. 62-19777: A composition comprising silicon carbide, silicon nitride or graphite particles and an inorganic binder is applied to a lining brick in a coke oven. JP-A-62-197371: A heat-resistant and tar-based substance permeation preventive agent made of silicon carbide, silicon nitride, or the like, a binder made of phosphate, yttrium oxide, or the like, and a heat-insulating agent made of potassium titanate fiber Is applied to the inner wall surface of the coke oven. JP-B-63-40463: A graphite powder and an inorganic binder such as colloidal silica and alumina sol are applied to a lining refractory for a door of a coke oven. JP-A-63-236783: Simultaneously firing a glaze and a brick to produce a refractory brick for a coke oven having a glaze layer formed thereon.

【0005】前記の方法のうち、炭化ケイ素、窒化ケイ
素または黒鉛などを使用する,,の方法は、これ
らの粒子とバインダーの馴染みが悪く、密着強度が不充
分で、操業中被覆層が剥離脱落するという問題がある。
[0005] Among the above-mentioned methods, the method using silicon carbide, silicon nitride or graphite, etc., has poor adhesion between the particles and the binder, has insufficient adhesion strength, and the coating layer peels off during operation. There is a problem of doing.

【0006】の釉層を形成した煉瓦を用いる方法は、
密着性が良好で操業中脱落することもない。また釉層被
膜中の気孔もほとんどないため、カーボンが浸透するこ
ともなく非常に効果的な方法である。しかしながら、コ
ークス炉または炉蓋などを新たに製作する場合、この方
法が適用可能であるが、炉を操業しながら、炉の耐火物
表面に釉層を形成することは不可能である。
[0006] The method of using a brick on which a glaze layer is formed is as follows.
It has good adhesion and does not fall off during operation. Further, since there are almost no pores in the glaze layer coating, carbon is not penetrated, and this is a very effective method. However, when a coke oven or a furnace lid is newly manufactured, this method can be applied, but it is impossible to form a glaze layer on the surface of the refractory of the furnace while operating the furnace.

【0007】[0007]

【発明が解決しようとする課題】本発明は、前記の問題
点に鑑みて成されたものであり、高温炉の炉内壁面に、
釉薬を熱間または冷間で施工し、壁面耐火物上に緻密で
耐久性のあるガラス状釉層を溶着形成させる釉薬、およ
びガラス状釉層を形成する方法を提供することを目的と
する。
DISCLOSURE OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and has been described in the art.
It is an object of the present invention to provide a glaze that is formed by hot or cold glazing to form a dense and durable glass-like glaze layer on a wall refractory, and a method of forming a glass-like glaze layer.

【0008】[0008]

【課題を解決するための手段】本発明は、釉層を形成す
る組成として、酸化物基準で、R2O(RはNaまたは
Kを表す、以下同じ)が10〜40重量%と、残部にS
iO2 とを含み、かつ融点が900℃以下であることを
特徴とする炉内耐火物表面にガラス状釉層を熱間施工ま
たは冷間施工で形成する釉薬である。
Means for Solving the Problems The present invention provides a composition for forming a glaze, on an oxide basis, R 2 O (R represents Na or K, the same applies hereinafter) is 10 to 40 wt%, the balance To S
A glaze that contains iO 2 and has a melting point of 900 ° C. or less, and a glassy glaze layer is formed on a surface of a refractory in a furnace by hot working or cold working.

【0009】本発明者らは、多様な金属酸化物の組合せ
について、酸化珪素と共に用いた場合の釉薬としての利
用可能性を試験し、900℃以下の温度で溶融し、溶融
後成分の一部が高温炉の操業温度以下で揮散または拡散
して、その融点が上昇し、高温炉の操業温度で溶融しな
い金属酸化物をみつけ本発明を完成した。
The present inventors have tested the availability of various metal oxide combinations as glazes when used with silicon oxide, and melted at a temperature of 900 ° C. or less, and some of the components after melting. Volatilized or diffused below the operating temperature of the high-temperature furnace, the melting point thereof increased, and a metal oxide that did not melt at the operating temperature of the high-temperature furnace was found, thus completing the present invention.

【0010】本明細書中で釉薬とは、高温炉の炉体を構
成する耐火物の表面に塗布される状態の薬剤を指す。施
工後各々酸化物に変換される金属塩あるいは金属化合物
と珪酸化合物とを含有すればよく、必ずしも前記酸化物
を施工前から含む必要はない。
[0010] In the present specification, the glaze refers to a chemical applied to the surface of a refractory constituting a furnace body of a high-temperature furnace. It is sufficient that the metal oxide contains a metal salt or a metal compound which is converted into an oxide after the application and a silicate compound, and it is not always necessary to include the oxide before the application.

【0011】本発明に従えば、釉薬はR2Oを10〜4
0重量%と残部にSiO2とを含む。R2Oは、Na2
またはK2Oから成り、両者の混合物であってもよい。
2Oが10重量%未満では、釉薬の融点が900℃以
下にならず、またこれが40重量%を超えると、融点が
低くなりすぎ、施工後の融点上昇に時間がかかり、鉛直
面に塗布された場合に垂下がり現象を起こす。さらに釉
層からの揮散物が増加し、緻密な釉層ができない。
According to the present invention, the glaze comprises R 2 O of 10-4.
It contains 0% by weight and the balance SiO 2 . R 2 O is Na 2 O
Alternatively, it may be composed of K 2 O, and may be a mixture of both.
If the content of R 2 O is less than 10% by weight, the melting point of the glaze will not be 900 ° C. or less. When it is done, it causes a drooping phenomenon. Furthermore, the amount of volatiles from the glaze layer increases, and a dense glaze layer cannot be formed.

【0012】前記酸化物に変換される適当な前駆体とし
て、同一の金属の水酸化物、炭酸塩、硝酸塩、燐酸塩、
硫酸塩、塩化物等が挙げられる。前駆体は施工後、好ま
しくは約600℃以上の温度で酸化物に変換されるもの
であればよい。
Suitable precursors to be converted to the oxides are hydroxides, carbonates, nitrates, phosphates of the same metal,
Sulfate, chloride and the like can be mentioned. The precursor can be converted to an oxide after application, preferably at a temperature of about 600 ° C. or higher.

【0013】Na2Oの前駆体としては、水酸化ナトリ
ウム、炭酸ナトリウム、炭酸水素ナトリウム、硝酸ナト
リウム、燐酸ナトリウム、硫酸ナトリウム、塩化ナトリ
ウム、珪酸ナトリウムなどが好ましい。
As a precursor of Na 2 O, sodium hydroxide, sodium carbonate, sodium hydrogen carbonate, sodium nitrate, sodium phosphate, sodium sulfate, sodium chloride, sodium silicate and the like are preferable.

【0014】K2Oの前駆体としては、水酸化カリウ
ム、炭酸カリウム、炭酸水素カリウム、硝酸カリウム、
燐酸カリウム、硫酸カリウム、塩化カリウム、珪酸カリ
ウムなどが好ましい。
As precursors of K 2 O, potassium hydroxide, potassium carbonate, potassium hydrogen carbonate, potassium nitrate,
Potassium phosphate, potassium sulfate, potassium chloride, potassium silicate and the like are preferred.

【0015】本発明において、釉薬の融点が施工後、高
温炉の操業温度以下の温度で上昇する理由は、組成物中
の成分の一部が時間とともに揮散または拡散するためと
考えられる。この機構の詳細は、本発明を限定するもの
ではないが、R2OがSiO2と共存すると、融点(Si
2単独なら1728℃)を著しく降下させる。これら
アルカリ金属酸化物は拡散係数が大きくまた蒸気圧も比
較的高いため、施工後、時間の経過とともに拡散、揮散
し釉層の組成がSiO2 膜に近づき、その結果融点が上
昇する。
In the present invention, the reason why the melting point of the glaze rises after the application at a temperature lower than the operating temperature of the high-temperature furnace is considered to be that some of the components in the composition volatilize or diffuse with time. Although the details of this mechanism do not limit the present invention, when R 2 O coexists with SiO 2 , the melting point (Si
(O 2 alone, 1728 ° C) significantly decreases. Since these alkali metal oxides have a large diffusion coefficient and a relatively high vapor pressure, they diffuse and volatilize over time after application, and the composition of the glaze layer approaches the SiO 2 film, and as a result, the melting point increases.

【0016】また本発明は、釉層を形成する組成とし
て、酸化物基準で、Li2Oが0〜10重量%、B23
が0〜10重量%、R2Oが10〜40重量%と、残部
にSiO2 とを含み、かつ融点が900℃以下であるこ
とを特徴とする炉内耐火物表面にガラス状釉層を熱間施
工または冷間施工で形成する釉薬である。
In the present invention, as a composition for forming a glaze layer, Li 2 O is 0 to 10% by weight and B 2 O 3
There 0-10 wt%, and R 2 O is 10 to 40 wt%, and a SiO 2 to the remainder, and the glassy glaze into the furnace refractory surface, wherein the melting point of 900 ° C. or less Glaze formed by hot or cold work.

【0017】また本発明は、Li2Oを0.2〜10重
量%含むことを特徴とする。また本発明は、B23
0.5〜10重量%含むことを特徴とする。
Further, the present invention is characterized in that it contains 0.2 to 10% by weight of Li 2 O. The present invention, the B 2 O 3, characterized in that it comprises 0.5 to 10 wt%.

【0018】本発明に従う釉薬は、酸化物基準で、Li
2O、0〜約10重量%と、B23、0〜約10重量%
とを含むことが好ましい。さらにLi2O、0.2〜約
10重量%および/またはB23、0.5〜約10重量
%を含むことが特に好ましい。
The glaze according to the invention is based on oxides, Li
2 O, 0 to about 10% by weight, B 2 O 3 , 0 to about 10% by weight
It is preferable to include Furthermore Li 2 O, 0.2 to about 10 wt% and / or B 2 O 3, it is particularly preferred to include about 10 wt% 0.5.

【0019】したがって、釉薬の組成として、前記R2
O、10〜40重量%および残部がSiO2からなる基
本組成のものの他に、第1の好適な釉薬の組成として、
Li2O、0.2〜10重量%、R2O、10〜40重量
%および残部がSiO2からなるものと、第2の好適な
釉薬の組成として、B23、0.5〜10重量%、R2
O、10〜40重量%および残部がSiO2からなるも
のと、第3の好適な釉薬の組成として、Li2O、0.
2〜10重量%、B23 、0.5〜10重量%、R
2O、10〜40重量%および残部がSiO2からなるも
のとがある。
Therefore, the composition of the glaze is represented by R 2
O, in addition to 10 to 40 wt% and the balance as the basic composition consisting of SiO 2, the composition of a first preferred glaze,
Li 2 O, 0.2 to 10% by weight, R 2 O, 10 to 40% by weight and the balance being SiO 2 , and B 2 O 3 , 0.5 to 10% by weight, R 2
O, 10 to 40% by weight, with the balance being SiO 2, and a third suitable glaze composition, Li 2 O, 0.
2-10 wt%, B 2 O 3, 0.5~10 wt%, R
2 O, 10 to 40% by weight, with the balance being SiO 2 .

【0020】Li2O,B23は、釉薬の融点を下げる
のに効果があり、また釉層が形成された後、昇温によっ
て揮散しやすい。Li2O,B23の割合が10重量%
を超えると、融点が低くなり過ぎ好ましくない。
Li 2 O and B 2 O 3 are effective in lowering the melting point of the glaze, and are easily volatilized by increasing the temperature after the glaze layer is formed. Li 2 O, B 2 O 3 ratio of 10% by weight
If it exceeds, the melting point becomes too low, which is not preferred.

【0021】本発明に用いる釉薬の融点は、実炉温度以
下で、炉内壁耐火物の周辺部を考慮して約900℃以下
に設定する必要がある。融点を設定値以下になるよう
に、組成物の成分比を適宜調整することも本発明の一態
様である。具体的には、Li2O−Na2O−SiO2
三成分系の場合、その状態図(たとえば、F.C.Kracek,
J.Am.Chem.Soc.,61,2871(1939)を参照)から融点9
00℃以下の適当な領域で各成分の重量%を求め、所望
の成分比を与えるよう、Li2O,Na2O,SiO2
前駆体を各々規定量混合し、本発明の釉薬を得ることが
できる。
The melting point of the glaze used in the present invention must be set at a temperature not higher than the actual furnace temperature and at about 900 ° C. or less in consideration of the peripheral portion of the refractory on the inner wall of the furnace. It is also one embodiment of the present invention to appropriately adjust the component ratio of the composition so that the melting point is equal to or lower than the set value. Specifically, in the case of a ternary system of Li 2 O—Na 2 O—SiO 2 , the state diagram (for example, FCKracek,
J. Am. Chem. Soc., 61,2871 (1939)).
The weight percent of each component is determined in an appropriate region of 00 ° C. or lower, and precursors of Li 2 O, Na 2 O, and SiO 2 are mixed in specified amounts so as to give a desired component ratio, thereby obtaining a glaze of the present invention. be able to.

【0022】Li2O,B23は、R2Oと同じく前駆体
の形で水溶液またはスラリーとして釉薬に用いられる。
Li2Oの前駆体としては、水酸化リチウム、炭酸リチ
ウム、炭酸水素リチウム、硝酸リチウム、燐酸リチウ
ム、硫酸リチウム、塩化リチウム、珪酸リチウムなどが
好ましい。B23の前駆体としては、ホウ酸、ホウ酸ナ
トリウム、ホウ酸カリウムなどが好ましい。
[0022] Li 2 O, B 2 O 3 is used to glaze as an aqueous solution or slurry in the form of R 2 O and also precursors.
As the precursor of Li 2 O, lithium hydroxide, lithium carbonate, lithium hydrogen carbonate, lithium nitrate, lithium phosphate, lithium sulfate, lithium chloride, lithium silicate and the like are preferable. As a precursor of B 2 O 3 , boric acid, sodium borate, potassium borate and the like are preferable.

【0023】また本発明は、釉層を形成する組成とし
て、酸化物基準で、Li2Oが0〜10重量%、B23
が0〜10重量%、R2Oが10〜40重量%と、残部
にSiO2 を含み、かつ融点が900℃以下である組成
物100重量部に対し、熱膨張率調整剤を100重量部
以下を添加して成ることを特徴とする炉内耐火物表面に
ガラス状釉層を熱間施工または冷間施工で形成する釉薬
である。
Further, according to the present invention, as a composition for forming a glaze layer, 0 to 10% by weight of Li 2 O and B 2 O 3
There 0-10 wt%, and R 2 O is 10 to 40 wt%, wherein the SiO 2 to the remainder, and melting point relative to 100 parts by weight of the composition is 900 ° C. or less, 100 parts by weight of thermal expansion modifier A glaze formed by hot-working or cold-working a glass-like glaze layer on the surface of a refractory in a furnace, characterized by adding:

【0024】また本発明は、前記熱膨張率調整剤がAl
23 、MgO、CaO、ZrO2およびTiO2 から成
る群より選ばれることを特徴とする。
In the present invention, the thermal expansion coefficient adjusting agent may be Al
It is selected from the group consisting of 2 O 3 , MgO, CaO, ZrO 2 and TiO 2 .

【0025】本発明に従えば、R2OなどとSiO2とか
ら成る前記の釉薬組成物に適当な熱膨張率調整剤が添加
される。以下、熱膨張率調整剤の添加された釉薬を改善
釉薬と呼称する。高温炉の炉内温度は操業によって上下
する場合があり、耐火物と釉層との熱膨張率差が大きい
と釉層にクラック等が発生し、被膜のカーボン付着防止
効果が劣化することがしばしば起こる。そこで、釉層と
耐火物の馴染みをよくするため、熱膨張率調整剤を釉薬
組成物に所定量加える。熱膨張率調整剤としては、耐火
物と同一または同種のものがよく、特に好ましくはAl
23、MgO、CaO、ZrO2およびTiO2から成る
群より選ばれる1種または2種以上が使用できる。使用
量は、釉薬組成物100重量部に対し、熱膨張率調整剤
100重量部以下である。熱膨張率調整剤が釉薬を施工
したとき、釉層の中で一体化し良好な被膜を形成するた
めには、前記の範囲が好ましい。
According to the present invention, a suitable thermal expansion coefficient adjusting agent is added to the above glaze composition comprising R 2 O or the like and SiO 2 . Hereinafter, the glaze to which the thermal expansion coefficient adjusting agent is added is referred to as an improved glaze. The furnace temperature of a high-temperature furnace may fluctuate depending on the operation, and if the difference in the coefficient of thermal expansion between the refractory and the glaze layer is large, cracks and the like occur in the glaze layer, often deteriorating the carbon adhesion prevention effect of the coating. Occur. Therefore, in order to improve the familiarity between the glaze layer and the refractory, a predetermined amount of a thermal expansion coefficient adjusting agent is added to the glaze composition. As the thermal expansion coefficient adjusting agent, the same or the same type as that of the refractory is preferable, and particularly preferable is Al.
One or more selected from the group consisting of 2 O 3 , MgO, CaO, ZrO 2 and TiO 2 can be used. The amount used is 100 parts by weight or less of the thermal expansion coefficient adjusting agent with respect to 100 parts by weight of the glaze composition. When the thermal expansion coefficient adjusting agent is applied to the glaze, the above range is preferable in order to integrate the glaze layer and form a good coating.

【0026】施工に際しては、釉薬組成物に熱膨張率調
整剤(通常固体粉末)を添加し、スラリー状にし、熱膨
張率調整剤を加えない釉薬と同様に熱間または冷間で耐
火物表面に塗布する。
At the time of application, a thermal expansion coefficient adjusting agent (usually a solid powder) is added to the glaze composition to form a slurry, and the surface of the refractory can be heated or cold as in the case of the glaze without the thermal expansion coefficient adjusting agent. Apply to.

【0027】熱膨張率調整剤は概して融点が高く、全体
が速やかに一体化すると改善釉薬が高融点化し、900
℃以下の温度で釉層の被膜形成が困難となる。しかし、
一方高融点のため、熱膨張率調整剤の自己拡散係数が小
さい。このため固体粉末で添加しておくとまず固体粉末
以外の部分が溶融し、固体粉末自身が釉層の中に包み込
まれた形で皮膜が形成する。その後時間とともに固体粉
末の成分が拡散し全体として一体化した皮膜となり、熱
膨張係数が調整された釉層を得ることができる。この改
善釉薬を使用すると釉層の剥離がおこりにくく、カーボ
ン付着防止効果も一段と助長される。
The thermal expansion coefficient regulator generally has a high melting point, and when the whole is rapidly integrated, the improved glaze has a high melting point, and the
When the temperature is lower than ℃, it is difficult to form a glaze layer. But,
On the other hand, due to its high melting point, the coefficient of thermal expansion has a small self-diffusion coefficient. Therefore, if the solid powder is added, portions other than the solid powder are first melted, and a film is formed in a form in which the solid powder itself is wrapped in the glaze layer. Thereafter, the components of the solid powder are diffused with time to form an integrated film as a whole, and a glaze layer having a controlled thermal expansion coefficient can be obtained. When this improved glaze is used, peeling of the glaze layer is less likely to occur, and the effect of preventing carbon adhesion is further promoted.

【0028】改善釉薬中の構成粒子の粒径は特に制限は
ないが、粒径が大きくなりすぎると施工しにくく、また
小さくなりすぎると施工後、収縮が大きく被膜の亀裂が
起こる。したがって、実用的には、約0.5〜約50μ
m程度の範囲が好ましい。
The particle size of the constituent particles in the improved glaze is not particularly limited. However, if the particle size is too large, it is difficult to perform the application, and if the particle size is too small, after application, the shrinkage is large and the coating film cracks. Therefore, practically, about 0.5 to about 50 μm
A range of about m is preferable.

【0029】また本発明は、SiO2 を形成する化合物
が珪酸ナトリウム、珪酸カリウムおよび珪酸リチウムか
ら成る群より選ばれる一種以上およびアルカリシリコネ
ートから成ることを特徴とする。
Further, the present invention is characterized in that the compound forming SiO 2 comprises at least one compound selected from the group consisting of sodium silicate, potassium silicate and lithium silicate, and an alkali siliconate.

【0030】また本発明は、アルカリシリコネートがナ
トリウムメチルシリコネートで、かつCH3SiO1.5
基準で2重量%〜30重量%であることを特徴とする。
In the present invention, the alkali siliconate is sodium methylsiliconate, and CH 3 SiO 1.5
It is characterized in that it is 2% by weight to 30% by weight on the basis.

【0031】本発明に従えば、SiO2を形成する化合
物(SiO2前駆体)としては、前記のものが好まし
い。またアルカリシリコネートとしてナトリウムメチル
シリコネートが特に好ましく、これがCH3SiO1.5
準でSiO2を形成する化合物の2〜30重量%含まれ
るものが特に好ましい。
According to the invention, as the compound for forming the SiO 2 (SiO 2 precursor), the foregoing is preferred. Also particularly preferred sodium methyl siliconate alkali siliconate titanate, which is particularly preferably one containing 2 to 30% by weight of the compound forming the SiO 2 in CH 3 SiO 1.5 standards.

【0032】また本発明は、炉内耐火物が耐火煉瓦、目
地および不定形耐火物から成る群より選ばれることを特
徴とする。
[0032] The invention is also characterized in that the refractory in the furnace is selected from the group consisting of refractory bricks, joints and irregular refractories.

【0033】本発明に従えば、釉薬を塗布して釉層を形
成する炉内耐火物は特に限定されないが、耐火煉瓦、目
地および不定形耐火物に対して用いることが好ましく、
特に目地切れなどを熱間で補修するのに好ましい。
According to the present invention, the refractory in the furnace for forming a glaze layer by applying a glaze is not particularly limited, but is preferably used for refractory bricks, joints and irregular refractories.
Particularly, it is preferable for repairing joint breakage by hot.

【0034】また本発明は、前記釉薬を炉内耐火物の表
面に熱間施工することを特徴とするガラス状釉層の形成
方法である。
The present invention is also a method for forming a glassy glaze layer, wherein the glaze is hot-worked on the surface of a refractory in a furnace.

【0035】本発明に従う釉薬を高温炉の内壁面を構成
する耐火物表面に施工するためには、釉薬を所定面には
けもしくはこてで塗布または吹付け等の標準的な塗布方
法を用いる。したがって、耐火物表面に均一に施工する
には、釉薬は水溶液あるいは水溶液に近いスラリー状に
されることが望ましい。前記の金属塩および金属化合物
のうち水溶性ものもは、金属を所望の組成比に、水溶液
中で容易に調製できる。また水に不溶または難溶のもの
は微粉砕し、水中に分散させてスラリー状として使用す
る。
In order to apply the glaze according to the present invention to the surface of the refractory constituting the inner wall surface of the high-temperature furnace, a standard application method such as applying or spraying the glaze on a predetermined surface with a brush or a trowel is used. . Therefore, in order to apply the glaze uniformly on the surface of the refractory, the glaze is desirably made into an aqueous solution or a slurry close to the aqueous solution. Among the above-mentioned metal salts and metal compounds, water-soluble ones can be easily prepared in an aqueous solution so that the metal has a desired composition ratio. Those insoluble or hardly soluble in water are finely pulverized, dispersed in water and used as a slurry.

【0036】施工する水溶液中の金属酸化物換算の固形
分濃度は通常約5〜約50重量%、好ましくは約10〜
約40重量%に調整する。濃度が約50重量%以上にな
ると、施工時熱によりゲル化が起こりやすく、吹付けノ
ズルの目詰まりが発生する。また約5重量%以下になる
と、充分な被膜を形成するには大量の組成物水溶液が必
要になり施工の効率が悪くなる。釉層の厚みには特に制
限はないが、実用的には約3mm以下でよい。
The concentration of the solid content in terms of metal oxide in the aqueous solution to be applied is usually about 5 to about 50% by weight, preferably about 10 to about 50% by weight.
Adjust to about 40% by weight. When the concentration is about 50% by weight or more, gelation is likely to occur due to heat during construction, and the spray nozzle is clogged. On the other hand, when the content is less than about 5% by weight, a large amount of the aqueous solution of the composition is required to form a sufficient film, and the efficiency of construction is reduced. The thickness of the glaze layer is not particularly limited, but may be practically about 3 mm or less.

【0037】本発明に従えば、釉薬はその融点近くの高
温で施工される。したがって塗布された時点で水分が蒸
発し、釉薬が耐火物表面で溶融し、耐火物表面に均一で
緻密なガラス質釉層が形成される。溶融した釉層は、高
粘度であり、鉛直な壁面に形成されても短時間内で垂下
がることはない。釉層は時間の経過とともに融点が上昇
し、高温炉の操業温度以上となるので、堅固な被膜とな
り再び溶融することはない。高温施工は、炉の操業を停
止せずに行えるが、炉外から長い柄のこて、はけまたは
吹付工具を用いて行わねばならず、小規模の補修に適す
る。
According to the present invention, the glaze is applied at a high temperature near its melting point. Therefore, at the time of application, moisture evaporates, the glaze melts on the surface of the refractory, and a uniform and dense glassy glaze layer is formed on the surface of the refractory. The molten glaze layer has a high viscosity and does not hang down in a short time even if formed on a vertical wall surface. The melting point of the glaze layer rises with time and becomes higher than the operating temperature of the high-temperature furnace, so that it becomes a firm film and does not melt again. High-temperature construction can be performed without stopping the furnace operation, but must be performed from outside the furnace using a long-handled iron, brush or spray tool, and is suitable for small-scale repairs.

【0038】また本発明は、前記釉薬を炉内耐火物の表
面に冷間施工後、釉薬の融点以上で炉の操業温度以下の
温度に加熱することを特徴とするガラス状釉層の形成方
法である。
Further, the present invention provides a method for forming a glass-like glaze layer, wherein the glaze is cold-worked on the surface of the refractory in the furnace and then heated to a temperature not lower than the melting point of the glaze and not higher than the operating temperature of the furnace. It is.

【0039】本発明に従えば、釉薬は100℃以下の低
温で施工される。釉薬の形状は熱間施工と同じく水溶液
またはスラリー状である。低温施工は、塗布後コークス
炉が昇温され、まず水分が蒸発し、次いで釉薬の溶融温
度で釉薬が溶融して耐火物表面に均一で緻密な釉層が形
成され、高温炉の操業温度に昇温されるまでの間に、釉
層の融点が上昇し、堅固な釉層被膜を形成する。低温塗
布は、よい作業環境で行えるので、完全な塗布ができる
が、コークス炉の操業を一時停止せねばならず、大規模
な補修に適する。
According to the present invention, the glaze is applied at a low temperature of 100 ° C. or less. The shape of the glaze is in the form of an aqueous solution or slurry as in hot working. In low-temperature application, the temperature of the coke oven is raised after application, moisture evaporates first, and then the glaze melts at the melting temperature of the glaze, forming a uniform and dense glaze layer on the surface of the refractory. Before the temperature is raised, the melting point of the glaze layer increases, and a firm glaze layer film is formed. The low-temperature coating can be performed in a good working environment, so that complete coating can be performed. However, the operation of the coke oven has to be temporarily stopped, which is suitable for large-scale repair.

【0040】先行技術において、種々の釉薬は知られて
いるが、融点を考慮した組成となっていないため、施工
後、釉層が溶融して垂下し、耐火物を露出させたり、釉
層がガラス状を保ち得ず水飴のようになり、カーボンの
付着を促進する。またカーボン粒子によって釉層が削り
取られることもあり、満足な結果を得られない。これに
対し本発明の釉薬は、前記のように融点を考慮し、施工
後釉薬が溶融して耐火物表面に強固に溶着した釉層を形
成し、炉の操業温度以下で釉層から一部の成分が揮散し
て融点が上昇し、高温炉の操業温度以上の溶融温度のガ
ラス状釉層となる。
In the prior art, various glazes are known, but since the composition does not take into account the melting point, the glaze layer melts and hangs down after construction, exposing refractories, and It cannot be kept glassy and looks like syrup and promotes adhesion of carbon. Also, the glaze layer may be scraped off by the carbon particles, so that satisfactory results cannot be obtained. On the other hand, the glaze of the present invention takes into consideration the melting point as described above, and after the application, the glaze is melted to form a glaze layer which is firmly welded to the surface of the refractory, and a part of the glaze layer is formed below the furnace operating temperature. Component evaporates and the melting point rises, forming a glass-like glaze layer having a melting temperature higher than the operating temperature of the high-temperature furnace.

【0041】[0041]

【発明の実施の形態】以下本発明を実施例によりさらに
詳しく説明するが、本発明はこれらによって制限される
ものではない。実施例中「%」は全て重量%を表す。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in more detail with reference to the following examples, but the present invention is not limited by these examples. In the examples, all “%” represent% by weight.

【0042】(実施例1)3号水ガラス(Na2
8.7%、SiO2 27.8%、水 63.5%)1
00重量部、珪酸リチウム(Li2O 2.2%、Si
2 20%)50重量部を混合し、完全な透明液とな
るまで撹拌した。これをA液とする。
Example 1 No. 3 water glass (Na 2 O)
8.7%, SiO 2 27.8%, water 63.5%) 1
00 parts by weight, lithium silicate (2.2% Li 2 O, Si
50 parts by weight of O 2 ( 20%) were mixed and stirred until a completely transparent liquid was obtained. This is designated as solution A.

【0043】水959重量部に水酸化リチウム(LiO
H)96重量部を添加し、溶解した。次いでホウ酸粉末
(H3BO3)318重量部を添加し、撹拌し完全に透明
液にした。これをB液とする。
Lithium hydroxide (LiO) was added to 959 parts by weight of water.
H) 96 parts by weight were added and dissolved. Then, 318 parts by weight of boric acid powder (H 3 BO 3 ) was added, and the mixture was stirred to make a completely transparent liquid. This is designated as solution B.

【0044】ナトリウムメチルシリコーネート(Na2
O 10.7%、CH3SiO1.520%:SiO2 とし
て17.9%)100重量部にB液を12.5重量部添
加し透明液となるまで撹拌した。これをC液とする。
Sodium methylsiliconate (Na 2
(10.7% of O, 20% of CH 3 SiO 1.5 : 17.9% as SiO 2 ) 12.5 parts by weight of the liquid B was added to 100 parts by weight, and the mixture was stirred until a transparent liquid was obtained. This is designated as liquid C.

【0045】A液100重量部にC液30重量部を添加
し、透明液となるまで撹拌した。これをD液とする。
To 100 parts by weight of the liquid A, 30 parts by weight of the liquid C was added and stirred until a transparent liquid was obtained. This is designated as solution D.

【0046】なおこれらの調合に際し、速度を速めるた
め70〜80℃で加熱しても特に結果は変わらなかっ
た。
In these preparations, heating at 70 to 80 ° C. to increase the speed did not change the results.

【0047】得られた釉薬組成物は酸化物となったとき
の釉薬組成としてはNa2O 21.7%、Li2
2.2%、B23 1.1%、SiO2 75.0%で
あった。SiO2 36%、Al23 54%を含む市
販のキャスタブルレンガを100×100×40mmに
切断し、試験耐火物片を作成した。
When the obtained glaze composition became an oxide, the glaze composition was 21.7% of Na 2 O and Li 2 O
2.2%, B 2 O 3 1.1 %, was SiO 2 75.0%. A commercially available castable brick containing 36% of SiO 2 and 54% of Al 2 O 3 was cut into 100 × 100 × 40 mm to prepare a test refractory piece.

【0048】この試験片を900℃の炉入れ加熱した。
レンガの温度が900℃に上がったのを確認した後、レ
ンガを取り出すと同時にスプレーガンにてD液をレンガ
面に噴霧した。最初レンガが発泡するが約1分くらいの
後、溶融し均一、強固なガラス被膜が形成された。これ
を再び900℃の炉に入れ、2時間保持した。
The test piece was placed in a furnace at 900 ° C. and heated.
After confirming that the temperature of the brick had risen to 900 ° C., the brick was taken out and, at the same time, the liquid D was sprayed on the brick surface with a spray gun. Initially, the brick foamed, but after about one minute, it melted and a uniform, strong glass coating was formed. This was placed again in a furnace at 900 ° C. and held for 2 hours.

【0049】このようにして釉層被膜を形成したレンガ
上に石炭粉5部、コールタール3部から成るスラリーを
塗り、不活性雰囲気下(たとえば、窒素下)800℃で
3時間加熱保持した。冷却後、接着テープを用いて付着
カーボンの剥がれ易さを評価したところ、カーボンは簡
単に剥離した。
A slurry comprising 5 parts of coal powder and 3 parts of coal tar was applied to the brick on which the glaze layer film was formed in this manner, and heated and maintained at 800 ° C. for 3 hours in an inert atmosphere (for example, under nitrogen). After cooling, the adhesion carbon was easily peeled off using an adhesive tape, and the carbon was easily peeled off.

【0050】一方、本発明の釉薬組成物を塗布しなかっ
た試料は、レンガ表面に強固にカーボンが付着し、機械
的な力を加えても完全に除去できなかった。
On the other hand, in the sample to which the glaze composition of the present invention was not applied, carbon was firmly adhered to the brick surface and could not be completely removed even by applying a mechanical force.

【0051】(実施例2)3号水ガラス(Na2
9.6%、SiO2 27.8%、水 62.6%)1
00%、珪酸リチウム(Li2O 2.2%、SiO2
20%、水 77.8%)4.4重量部を混合し、完全
な透明液となるまで撹拌し、これをA液とした。
(Example 2) No. 3 water glass (Na 2 O)
9.6%, SiO 2 27.8%, water 62.6%) 1
00%, lithium silicate (2.2% Li 2 O, SiO 2
(20%, water 77.8%) 4.4 parts by weight were mixed and stirred until a completely transparent liquid was obtained, which was used as Liquid A.

【0052】A液100重量部に水10.1重量部を添
加し、ついで実施例1と同一組成のB液を2.7重量部
添加し、最後にナトリウムメチルシリコネート(Na2
O10.7%、CH3SiO1.5 20.0%:SiO2
として17.9%)を10.5%添加し、透明液となる
まで撹拌した。これをD液とする。
To 100 parts by weight of liquid A, 10.1 parts by weight of water was added, and then 2.7 parts by weight of liquid B having the same composition as in Example 1 were added. Finally, sodium methylsiliconate (Na 2
O 10.7%, CH 3 SiO 1.5 20.0%: SiO 2
17.9%) and stirred until a clear liquid was obtained. This is designated as solution D.

【0053】得られた釉薬組成物は酸化物となったとき
の釉薬組成としてはNa2O 25.8%、Li2
0.4%、B23 1.0%、SiO2 72.8%で
あった。なお、ナトリウムメチルシリコネートのメチル
基が消失する前の組成としてはSiO2 67.8%、
Li2O 0.4%、Na2O 25.6%、B23
1.0%、CH3SiO1.5 5.2%であった。また実
施例1と同様の試験耐火物片を作成した。
When the obtained glaze composition turned into an oxide, the glaze composition was Na 2 O 25.8%, Li 2 O
0.4%, B 2 O 3 1.0 %, was SiO 2 72.8%. The composition before the methyl group of sodium methylsiliconate disappeared was SiO 2 67.8%,
Li 2 O 0.4%, Na 2 O 25.6%, B 2 O 3
1.0% and CH 3 SiO 1.5 5.2%. Test refractory pieces similar to those in Example 1 were prepared.

【0054】この試験片を900℃の炉に入れ加熱し
た。レンガの温度が900℃に上がったのを確認した
後、レンガを取出すと同時にスプレーガンにてD液をレ
ンガ面に噴霧した。最初レンガが発泡するが、約1分く
らいの後、溶融し均一、強固なガラス被膜が形成され
た。
This test piece was placed in a furnace at 900 ° C. and heated. After confirming that the temperature of the brick had risen to 900 ° C., the brick was taken out and, at the same time, the liquid D was sprayed on the brick surface with a spray gun. Initially, the brick foamed, but after about one minute, it melted and a uniform, strong glass coating was formed.

【0055】なお、上記のナトリウムメチルシリコネー
トの量を1/5にした他は、ほぼ同様の組成としたもの
をE液とした。
A solution having substantially the same composition except that the amount of sodium methylsiliconate was reduced to 1/5 was used as solution E.

【0056】得られたE液は酸化物となったときの釉薬
組成としてNa2O 25.0%、Li2O 0.5%、
23 1.1%、SiO2 73.5%であった。
The obtained solution E had a glaze composition of 25.0% Na 2 O, 0.5% Li 2 O,
B 2 O 3 was 1.1% and SiO 2 was 73.5%.

【0057】またナトリウムメチルシリコネートのメチ
ル基が消失する前の組成としては、SiO2 72.4
%、Li2O 0.5%、Na2O 24.9%、B23
1.3%、CH3SiO1.5 1.1%であった。
The composition before the methyl group of sodium methylsiliconate disappeared was SiO 2 72.4
%, Li 2 O 0.5%, Na 2 O 24.9%, B 2 O 3
1.3% and CH 3 SiO 1.5 1.1%.

【0058】このものを実施例1と同様の方法でテスト
した結果、均一強固なガラス皮膜が形成されたが、煉瓦
の垂直面に塗布した場合には、かなりの部分垂下した。
This was tested in the same manner as in Example 1. As a result, a uniform and strong glass film was formed. However, when it was applied to a vertical surface of a brick, a considerable portion was drooped.

【0059】(実施例3〜6)釉の組成が表1に示すも
のになるように、実施例1と同様な方法で釉薬組成物を
調製し、得られた釉層について被膜形成と付着カーボン
の剥離の評価を行った。それぞれ組成と評価結果を表1
に示す。
(Examples 3 to 6) A glaze composition was prepared in the same manner as in Example 1 so that the composition of the glaze was as shown in Table 1. Was evaluated for peeling. Table 1 shows the composition and evaluation results.
Shown in

【0060】(実施例7)前記実施例1の釉薬組成物の
D液を100重量部と、平均粒径〜5μmのアルミナ粉
末20重量部とを混合しスラリー状とし、改善された釉
薬を得た。
Example 7 An improved glaze was obtained by mixing 100 parts by weight of the liquid D of the glaze composition of Example 1 and 20 parts by weight of alumina powder having an average particle size of 5 μm to obtain a slurry. Was.

【0061】このスラリーを実施例1と同様な方法でレ
ンガに噴霧した。形成された被膜は透明ではないが表面
は光沢があり、ガラス状であった。
This slurry was sprayed on bricks in the same manner as in Example 1. The formed film was not transparent, but the surface was glossy and glassy.

【0062】(比較例1〜2)釉の組成が表1に示すも
のになるように、実施例1と同様な方法で組成物を調製
し、さらに得られた釉層について評価を行った。それぞ
れの組成と評価結果を表1に示す。
(Comparative Examples 1-2) A composition was prepared in the same manner as in Example 1 so that the composition of the glaze was as shown in Table 1, and the obtained glaze layer was evaluated. Table 1 shows the compositions and evaluation results.

【0063】[0063]

【表1】 [Table 1]

【0064】融点は600℃,700℃,800℃,9
00℃,1000℃で熱処理した際、釉薬が溶融、釉層
を形成するかどうか肉眼で観察して推定した。
The melting points are 600 ° C., 700 ° C., 800 ° C., 9
When heat-treated at 00 ° C. and 1000 ° C., it was estimated by visual observation whether the glaze melted and formed a glaze layer.

【0065】表1の試験結果より、実施例の釉薬は、被
膜形成に優れ、カーボン付着防止効果も顕著であるが、
比較例の釉薬は両者において劣ることが明らかになっ
た。
From the test results shown in Table 1, the glazes of the examples have excellent film formation and a remarkable effect of preventing carbon adhesion.
It became clear that the glaze of the comparative example was inferior in both.

【0066】(高温保持テスト)実施例1で得られた釉
層で被覆したレンガを900℃の温度で約5時間保持
し、焼成レンガの釉層被膜中の成分を分析するとSiO
2/Na2Oのモル比は3.5で当初の3.0に比べNa
2Oが減少傾向にあった。
(High Temperature Holding Test) The brick covered with the glaze layer obtained in Example 1 was held at a temperature of 900 ° C. for about 5 hours, and the components in the glaze layer coating of the fired brick were analyzed.
The molar ratio of 2 / Na 2 O was 3.5, which was higher than the initial 3.0.
2 O tended to decrease.

【0067】さらに1100℃で1時間保持するとモル
比は7.5でNa2Oの減少が顕著に認められた。なお
このときB23 、Li2Oは検出されなかった。この釉
層の融点は1300℃以上であり、初期の800℃以下
の融点から顕著な融点上昇効果が認められた。
Further, when the temperature was maintained at 1100 ° C. for 1 hour, the molar ratio was 7.5, and a remarkable decrease in Na 2 O was observed. At this time, B 2 O 3 and Li 2 O were not detected. The melting point of this glaze layer was 1300 ° C. or higher, and a remarkable melting point increasing effect was observed from the initial melting point of 800 ° C. or lower.

【0068】[0068]

【発明の効果】以上のように本発明によれば、R2Oと
SiO2とを含み、融点が900℃以下の釉薬であり、
またはそれに熱膨張率調整剤を添加した改善釉薬であ
る。これらの本発明の釉薬は、熱間施工されまたは冷間
施工された後、融点以上の温度で溶融してガラス状釉層
を形成する。この釉層は時間の経過とともに、高温炉の
操業温度以下で融点が上昇し、高温炉の操業温度では再
び溶融しない。これによって高温炉を構成する耐火物の
表面に緻密で均一なガラス状釉層が強固に形成され、高
温の操業によって発生するカーボンなどが耐火物表面に
付着することがほとんどなく、また少量の付着したカー
ボンなどは容易に剥離できるとともに耐火物表面が容易
に補修できる。
As described above, according to the present invention, a glaze containing R 2 O and SiO 2 and having a melting point of 900 ° C. or less,
Or it is an improved glaze to which a thermal expansion coefficient adjusting agent is added. These glazes of the present invention are hot-worked or cold-worked and then melt at a temperature equal to or higher than the melting point to form a glassy glaze layer. As time passes, the melting point of the glaze layer increases below the operating temperature of the high-temperature furnace and does not melt again at the operating temperature of the high-temperature furnace. As a result, a dense and uniform glass-like glaze layer is firmly formed on the surface of the refractory constituting the high-temperature furnace, and carbon generated by high-temperature operation hardly adheres to the surface of the refractory, and a small amount of the carbon adheres. The removed carbon can be easily peeled off and the surface of the refractory can be easily repaired.

Claims (14)

【特許請求の範囲】[Claims] 【請求項1】 釉層を形成する組成として、酸化物基準
で、R2O(RはNaまたはKを表す)が10〜40重
量%と、残部にSiO2 とを含み、かつ融点が900℃
以下であることを特徴とする炉内耐火物表面にガラス状
釉層を熱間施工で形成する釉薬。
1. A composition for forming a glaze layer, which contains, on an oxide basis, 10 to 40% by weight of R 2 O (R represents Na or K), the balance containing SiO 2 and a melting point of 900. ° C
A glaze for forming a glassy glaze layer on a refractory surface in a furnace by hot working, characterized by the following.
【請求項2】 釉層を形成する組成として、酸化物基準
で、R2O(RはNaまたはKを表す)が10〜40重
量%と、残部にSiO2 とを含み、かつ融点が900℃
以下であることを特徴とする炉内耐火物表面にガラス状
釉層を冷間施工で形成する釉薬。
2. The composition for forming a glaze layer contains, on an oxide basis, 10 to 40% by weight of R 2 O (R represents Na or K), the balance being SiO 2 and a melting point of 900. ° C
A glaze that forms a glassy glaze layer on the surface of a refractory in a furnace by cold working, characterized in that:
【請求項3】 釉層を形成する組成として、酸化物基準
で、Li2Oが0〜10重量%、B23 が0〜10重量
%、R2O(RはNaまたはKを表す)が10〜40重
量%と、残部にSiO2 とを含み、かつ融点が900℃
以下であることを特徴とする炉内耐火物表面にガラス状
釉層を熱間施工で形成する釉薬。
3. A composition for forming a glaze layer, wherein, based on oxides, Li 2 O is 0 to 10% by weight, B 2 O 3 is 0 to 10% by weight, and R 2 O (R represents Na or K). ) Contains 10 to 40% by weight, the balance being SiO 2 and having a melting point of 900 ° C.
A glaze for forming a glassy glaze layer on a refractory surface in a furnace by hot working, characterized by the following.
【請求項4】 釉層を形成する組成として、酸化物基準
で、Li2Oが0〜10重量%、B23 が0〜10重量
%、R2O(RはNaまたはKを表す)が10〜40重
量%と、残部にSiO2 とを含み、かつ融点が900℃
以下であることを特徴とする炉内耐火物表面にガラス状
釉層を冷間施工で形成する釉薬。
4. A composition for forming a glaze layer, wherein, based on oxides, Li 2 O is 0 to 10% by weight, B 2 O 3 is 0 to 10% by weight, and R 2 O (R represents Na or K). ) Contains 10 to 40% by weight, the balance being SiO 2 and having a melting point of 900 ° C.
A glaze that forms a glassy glaze layer on the surface of a refractory in a furnace by cold working, characterized in that:
【請求項5】 Li2Oを0.2〜10重量%含む請求
項3または4記載の釉薬。
5. The glaze according to claim 3, comprising 0.2 to 10% by weight of Li 2 O.
【請求項6】 B23を0.5〜10重量%含む請求項
3〜5のいずれかに記載の釉薬。
6. The glaze according to claim 3, comprising 0.5 to 10% by weight of B 2 O 3 .
【請求項7】 釉層を形成する組成として、酸化物基準
で、Li2Oが0〜10重量%、B23 が0〜10重量
%、R2O(RはNaまたはKを表す)が10〜40重
量%と、残部にSiO2 を含み、かつ融点が900℃以
下である組成物100重量部に対し、熱膨張率調整剤を
100重量部以下を添加して成ることを特徴とする炉内
耐火物表面にガラス状釉層を熱間施工で形成する釉薬。
7. As a composition for forming a glaze layer, Li 2 O is 0 to 10% by weight, B 2 O 3 is 0 to 10% by weight, and R 2 O (R represents Na or K) on an oxide basis. ) Of 10 to 40% by weight, the balance being 100 parts by weight of a composition containing SiO 2 and having a melting point of 900 ° C. or less, and 100 parts by weight or less of a coefficient of thermal expansion. A glaze that forms a glassy glaze layer on the surface of the refractory inside the furnace by hot working.
【請求項8】 釉層を形成する組成として、酸化物基準
で、Li2Oが0〜10重量%、B23 が0〜10重量
%、R2O(RはNaまたはKを表す)が10〜40重
量%と、残部にSiO2 を含み、かつ融点が900℃以
下である組成物100重量部に対し、熱膨張率調整剤を
100重量部以下を添加して成ることを特徴とする炉内
耐火物表面にガラス状釉層を冷間施工で形成する釉薬。
8. The composition for forming the glaze layer is such that Li 2 O is 0 to 10% by weight, B 2 O 3 is 0 to 10% by weight, and R 2 O (R represents Na or K) on an oxide basis. ) Of 10 to 40% by weight, the balance being 100 parts by weight of a composition containing SiO 2 and having a melting point of 900 ° C. or less, and 100 parts by weight or less of a coefficient of thermal expansion. A glaze that forms a glassy glaze layer on the surface of the refractory inside the furnace by cold working.
【請求項9】 前記熱膨張率調整剤がAl23 、Mg
O、CaO、ZrO2およびTiO2 から成る群より選
ばれる請求項7または8記載の釉薬。
9. The method according to claim 1, wherein the thermal expansion coefficient adjusting agent is Al 2 O 3 , Mg.
O, CaO, claim 7 or 8 glazes according selected from the group consisting of ZrO 2 and TiO 2.
【請求項10】 SiO2 を形成する化合物が珪酸ナト
リウム、珪酸カリウムおよび珪酸リチウムから成る群よ
り選ばれる一種以上およびアルカリシリコネートから成
る請求項1〜9のいずれかに記載の釉薬。
10. The glaze according to claim 1, wherein the compound forming SiO 2 is at least one selected from the group consisting of sodium silicate, potassium silicate and lithium silicate and an alkali siliconate.
【請求項11】 アルカリシリコネートがナトリウムメ
チルシリコネートで、かつCH3SiO1.5 基準で2重
量%〜30重量%である請求項10記載の釉薬。
11. The glaze according to claim 10, wherein the alkali siliconate is sodium methylsiliconate and is 2% to 30% by weight based on CH 3 SiO 1.5 .
【請求項12】 炉内耐火物が耐火煉瓦、目地および不
定形耐火物から成る群より選ばれる請求項1〜11のい
ずれかに記載の釉薬。
12. The glaze according to claim 1, wherein the refractory in the furnace is selected from the group consisting of refractory bricks, joints and irregular refractories.
【請求項13】 請求項1〜12のいずれかに記載の釉
薬を炉内耐火物の表面に熱間施工することを特徴とする
ガラス状釉層の形成方法。
13. A method for forming a glassy glaze layer, comprising hot-working the glaze according to claim 1 on the surface of a refractory in a furnace.
【請求項14】 請求項1〜12のいずれかに記載の釉
薬を炉内耐火物の表面に冷間施工後、釉薬の融点以上で
炉の操業温度以下の温度に加熱することを特徴とするガ
ラス状釉層の形成方法。
14. The method according to claim 1, wherein the glaze according to any one of claims 1 to 12 is cold-worked on the surface of the refractory in the furnace, and then heated to a temperature higher than the melting point of the glaze and lower than the operating temperature of the furnace. A method for forming a glass-like glaze layer.
JP09287316A 1997-10-20 1997-10-20 Glaze for forming glassy glaze layer on refractory surface in furnace and method for forming glassy glaze layer Expired - Lifetime JP3128213B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP52951395A Division JP2748328B2 (en) 1994-05-17 1995-05-16 Glaze for hot application to coke oven refractories and method of forming glaze layer

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JPH10158080A true JPH10158080A (en) 1998-06-16
JP3128213B2 JP3128213B2 (en) 2001-01-29

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005016846A1 (en) * 2003-08-12 2005-02-24 Ut-Battelle, Llc Alkali resistant refractories
CN113620602A (en) * 2021-09-06 2021-11-09 吴国雄 Wear-resistant and corrosion-resistant glazed porcelain and preparation method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005016846A1 (en) * 2003-08-12 2005-02-24 Ut-Battelle, Llc Alkali resistant refractories
CN113620602A (en) * 2021-09-06 2021-11-09 吴国雄 Wear-resistant and corrosion-resistant glazed porcelain and preparation method thereof
CN113620602B (en) * 2021-09-06 2023-03-28 广东群发陶瓷有限公司 Wear-resistant and corrosion-resistant glazed porcelain and preparation method thereof

Also Published As

Publication number Publication date
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