JPH10135000A - Synchrotron radiation generating device - Google Patents

Synchrotron radiation generating device

Info

Publication number
JPH10135000A
JPH10135000A JP30082596A JP30082596A JPH10135000A JP H10135000 A JPH10135000 A JP H10135000A JP 30082596 A JP30082596 A JP 30082596A JP 30082596 A JP30082596 A JP 30082596A JP H10135000 A JPH10135000 A JP H10135000A
Authority
JP
Japan
Prior art keywords
storage ring
radiation
incident
synchrotron radiation
floor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30082596A
Other languages
Japanese (ja)
Inventor
Masaki Hirose
正起 広瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to JP30082596A priority Critical patent/JPH10135000A/en
Publication of JPH10135000A publication Critical patent/JPH10135000A/en
Pending legal-status Critical Current

Links

Landscapes

  • Particle Accelerators (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce the installation space by distributing an incidence device and a storage ring in upstairs and downstairs of a building, and communicating the incidence device and the storage ring with each other with a beam transmitting unit, which is arranged through a deflecting magnet. SOLUTION: Electron beam, which is deflected by a deflecting magnet 11', is deflected by a deflecting magnet 12 so as to enter a storage ring 3. Periphery of the storage ring 3 is provided with beam lines 6, 6, 6... for transmitting the radiation radiated from the storage ring 3 and radiation utilizing devices (X-ray exposing device) 7, 7, 7... for utilizing the radiation. Periphery of the X-ray exposing device 7 is provided with a carrying line 13 for carrying wafers to the X-ray exposing device. In this case, an incidence device is located downstairs, and the storage ring 3 is located upstairs so that a shield wall of a floor part of the storage ring 3 is used as a shield wall of a ceiling part of the incidence device.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、シンクロトロン放射光
(以下SR光という)発生装置、特に産業用の小型のS
R光発生装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a synchrotron radiation (hereinafter referred to as "SR light") generator, and more particularly to a small-sized industrial S
The present invention relates to an R light generator.

【0002】[0002]

【従来の技術】SR光発生装置は、電子または陽電子を
所定のエネルギーで蓄積し放射光を発生させる蓄積リン
グと、該蓄積リングに電子又は陽電子を入射する入射装
置と、電子又は陽電子を入射装置から蓄積リングへ導く
ビーム輸送部と、これらを制御する制御装置(含む電源
装置、ユーティリティ装置)から構成されている。
2. Description of the Related Art An SR light generator includes a storage ring for storing electrons or positrons at a predetermined energy to generate radiation, an injector for injecting electrons or positrons into the storage ring, and an injector for injecting electrons or positrons. And a control device (including a power supply device and a utility device) for controlling them.

【0003】図4は従来からのSR光発生装置である。
1はマイクロトロンあるいはライナック等の入射装置
で、該入射装置は電子あるいは陽電子を発生させる装置
と電子あるいは陽電子を加速させる装置とから構成され
ている。2は入射エネルギーまで加速された電子あるい
は陽電子を蓄積リング3まで輸送するビーム輸送部であ
る。蓄積リング3はビーム輸送部2から運ばれてきた電
子又は陽電子を蓄積軌道に乗せるための電磁石や周回さ
せるための電磁石及び放射光を放射出した電子または陽
電子にエネルギーを供給する高周波装置で構成されてい
る。
FIG. 4 shows a conventional SR light generator.
Reference numeral 1 denotes an injection device such as a microtron or a linac, which is constituted by a device for generating electrons or positrons and a device for accelerating electrons or positrons. Reference numeral 2 denotes a beam transport unit that transports electrons or positrons accelerated to the incident energy to the storage ring 3. The storage ring 3 is composed of an electromagnet for putting electrons or positrons carried from the beam transport unit 2 on a storage orbit, an electromagnet for orbiting, and a high-frequency device for supplying energy to the emitted electrons or positrons. ing.

【0004】電子または陽電子の入射エネルギーが蓄積
エネルギーより小さいときは制御装置により蓄積リング
3を制御して所定の蓄積エネルギーまで加速させる。5
は入射装置から発生する放射線を遮蔽する放射線遮蔽
壁、5´は蓄積リング3からの放射線を遮蔽する放射線
遮蔽壁である。これらの遮蔽壁は数10cmから100
数10cm厚のコンクリート壁で構成されており、蓄積
リング3の遮蔽壁より入射装置1の遮蔽壁のほうが分厚
い構造でできている。
When the incident energy of electrons or positrons is smaller than the stored energy, the control device controls the storage ring 3 to accelerate the storage ring 3 to a predetermined stored energy. 5
Is a radiation shielding wall for shielding radiation generated from the incident device, and 5 'is a radiation shielding wall for shielding radiation from the storage ring 3. These shielding walls are from several tens of cm to 100
It is composed of a concrete wall having a thickness of several tens of centimeters. The shielding wall of the incident device 1 is thicker than the shielding wall of the storage ring 3.

【0005】6、6、6・・・は蓄積リング3のビーム
取出し口に取付けられたビームラインで、その先端部に
はそれぞれ放射光を利用するための放射光利用装置7、
7、7・・・が設置されている。8は電源室、9は制御
室、10は冷却水装置室である。
Reference numerals 6, 6, 6... Denote beam lines attached to the beam extraction ports of the storage ring 3, and at their ends, a radiation light utilization device 7 for utilizing radiation light.
7, 7,... Are installed. Reference numeral 8 denotes a power supply room, 9 denotes a control room, and 10 denotes a cooling water device room.

【0006】上記従来のSR光発生装置は入射装置1の
ビーム輸送部2と蓄積リング3は同一階に設置されてい
るために、SR発生装置の設置スペースは広くなり、ま
た、ビーム輸送部2が同一階にあるために、ビーム輸送
部の設置箇所には放射光利用装置7を設置することがで
きず、SR光発生装置を建屋内の任意の場所に自由に設
置することはできなかった。
In the above-mentioned conventional SR light generator, since the beam transport unit 2 and the storage ring 3 of the incident device 1 are installed on the same floor, the installation space for the SR generator becomes large, and the beam transport unit 2 Is located on the same floor, the radiation light utilization device 7 could not be installed at the installation location of the beam transport unit, and the SR light generation device could not be freely installed anywhere in the building. .

【0007】[0007]

【発明が解決しようとする課題】放射光利用装置7の設
置場所がビーム輸送部2によって制約されることがな
く、且つ、SR光発生装置を建屋の最適な場所に任意に
設置することができる構造のSR光発生装置を提供する
ことを目的とする。
The installation location of the synchrotron radiation device 7 is not restricted by the beam transport section 2, and the SR light generator can be arbitrarily installed at an optimum location in the building. It is an object of the present invention to provide an SR light generator having a structure.

【0008】[0008]

【課題を解決するための手段】入射装置1と該入射装置
1からの電子または陽電子を蓄積リング3へ導くビーム
輸送部2からなるシンクロトロン放射光発生装置におい
て、入射装置1と蓄積リング3を夫々建屋の階上と階下
に分散設置し、入射装置1と蓄積リング3とを偏向マグ
ネット11、11´を介して配設せるビーム輸送部2で
連通したことを特徴とする。
SUMMARY OF THE INVENTION In a synchrotron radiation light generating apparatus comprising an injection device 1 and a beam transport section 2 for guiding electrons or positrons from the injection device 1 to a storage ring 3, the injection device 1 and the storage ring 3 are connected to each other. It is characterized in that it is installed separately on the upper floor and lower floor of the building, and the incident device 1 and the storage ring 3 are communicated with each other by the beam transport unit 2 disposed via the deflection magnets 11 and 11 '.

【0009】[0009]

【発明の実施の形態】本発明の実施の形態について半導
体工場に本発明のSR光発生装置を設置した例を図1な
いし図3を参照して説明する。1はマイクロトロン等の
入射装置で、図示の例では1階部分の床に設置されてお
り、入射装置室の天井、床、前後左右側壁は放射線遮蔽
壁5で遮蔽されている。入射装置室の真上の2階部分に
蓄積リング3が設置されており、入射装置1で加速され
た電子は偏向マグネット11、11´及び入射装置室の
天井遮蔽壁を貫通して垂直方向に設置されたビーム輸送
部2を通って蓄積リング3へ投射される。図示の偏向マ
グネットは水平方向の電子ビームを垂直方向へ、また、
垂直方向から水平方向へ偏向させるために270度曲げ
るα電磁石を示しているが、90度曲げる偏向マグネッ
トであっても差支えない。5´は蓄積リングからの放射
線を遮蔽するための遮蔽壁で天井部と前後左右側面を遮
蔽している。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described with reference to FIGS. 1 to 3 in which an SR light generating apparatus of the present invention is installed in a semiconductor factory. Reference numeral 1 denotes an incident device such as a microtron, which is installed on the floor of the first floor in the illustrated example. The ceiling, floor, front, rear, left and right side walls of the incident device room are shielded by radiation shielding walls 5. A storage ring 3 is installed on the second floor just above the incident device room, and the electrons accelerated by the incident device 1 penetrate through the deflection magnets 11 and 11 'and the ceiling shield wall of the incident device room and are vertically extended. The light is projected onto the storage ring 3 through the installed beam transport unit 2. The deflection magnet shown moves the electron beam in the horizontal direction vertically,
Although an α-electromagnet that bends 270 degrees to deflect it from the vertical direction to the horizontal direction is shown, a deflection magnet that bends 90 degrees may be used. 5 'is a shielding wall for shielding radiation from the storage ring, which shields the ceiling and the front, rear, left and right side surfaces.

【0010】図3は蓄積リング3が設置されている2階
部分の平面図である。偏向マグネット11´で曲げられ
た電子ビームは偏向マグネット12で曲げられて蓄積リ
ング3に入射される。蓄積リング3の周囲には蓄積リン
グより放射される放射光を通すためのビームライン6、
6、6・・・と放射光を利用するための放射光利用装置
(X線露光装置)7、7、7・・・が設置されている。
そして、X線露光装置7の周辺には該X線露光装置にウ
エハを搬送するための搬送ライン13が設置されてい
る。14はウエハストッカ、15は入射装置室の天井に
設置さている天井クレーンである。なお、電源装置や制
御装置、冷却水装置等は図示されていないが入射装置を
設置している階や、蓄積リングを設置している階に適当
に設置されている。
FIG. 3 is a plan view of the second floor where the storage ring 3 is installed. The electron beam bent by the deflection magnet 11 ′ is bent by the deflection magnet 12 and enters the storage ring 3. A beam line 6 around the storage ring 3 for passing radiation emitted from the storage ring,
., And a radiation utilization apparatus (X-ray exposure apparatus) 7, 7, 7,... For utilizing the radiation.
A transfer line 13 for transferring a wafer to the X-ray exposure apparatus is provided around the X-ray exposure apparatus 7. 14 is a wafer stocker, and 15 is an overhead crane installed on the ceiling of the incident device room. Although not shown, the power supply device, the control device, the cooling water device, and the like are appropriately installed on the floor where the incident device is installed or on the floor where the storage ring is installed.

【0011】本発明の図示の例では階下に入射装置1を
設置し、上階に蓄積リング3を設置したことにより蓄積
リングの床部分の遮蔽壁が入射装置1の天井部分の遮蔽
壁で兼用される利点があるが、建屋の構造、工場のレイ
アウト等により階上に入射装置を設置し、階下に蓄積リ
ングを設置してもよい。要は入射装置1と蓄積リング3
とは同一階に設置することなく、階上、階下の上下方向
に設置されることである。
In the illustrated example of the present invention, the incident device 1 is installed on the lower floor and the storage ring 3 is installed on the upper floor, so that the shielding wall on the floor of the storage ring is also used as the shielding wall on the ceiling of the incident device 1. However, the incident device may be installed on the upper floor and the storage ring may be installed on the lower floor depending on the structure of the building, layout of the factory, and the like. In short, the injection device 1 and the storage ring 3
Is not installed on the same floor but installed up and down the floor.

【0012】[0012]

【発明の効果】 本発明によれば、入射装置と蓄積リングを上下方向
に設置したためSR光発生装置の設置スペースを従来の
同一床面に設置しているものに比べて小さくすることが
できた。 入射装置1からの電子または陽電子は蓄積リング3
の近傍から入射でき、ビーム輸送部2が放射光利用スペ
ースを横切ることがないので、SR光発生装置を設置し
た後の放射光利用スペースを自由に利用できる。 SR光発生装置の入射装置1と蓄積リング3が上下
方向に設置されているため、工場の建屋の中でSR光装
置を建屋の中央に設置したり、端に設置したり最適な位
置に自由に設置できる。 入射装置1を階下に、蓄積リング3を階上に設置し
たときは蓄積リング3床面の遮蔽壁が入射装置1の天井
部分遮蔽壁と兼用できるので経済的である。
According to the present invention, since the incident device and the storage ring are installed in the vertical direction, the installation space for the SR light generation device can be made smaller than that of a conventional device installed on the same floor. . The electrons or positrons from the injector 1 are stored in the storage ring 3
, And the beam transport unit 2 does not cross the space for using the radiation light, so that the space for using the radiation light after the SR light generator is installed can be used freely. Since the incident device 1 and the storage ring 3 of the SR light generating device are installed in the vertical direction, the SR light device can be installed at the center of the building or at the end of the building, and can be placed at an optimum position. Can be installed in When the incident device 1 is installed downstairs and the storage ring 3 is installed on the floor, the shielding wall on the floor surface of the storage ring 3 can also be used as the shielding wall of the ceiling of the incident device 1, which is economical.

【0013】[0013]

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のSR光発生装置を設置している建屋の
部分断面図。
FIG. 1 is a partial cross-sectional view of a building in which an SR light generation device of the present invention is installed.

【図2】本発明の入射装置を設置している建屋の1階部
分の平面図。
FIG. 2 is a plan view of the first floor of a building in which the incident device of the present invention is installed.

【図3】本発明の蓄積リングを設置している建屋の2階
部分の平面図。
FIG. 3 is a plan view of the second floor of a building in which the storage ring of the present invention is installed.

【図4】従来のSR光発生装置を設置している建屋の平
面図。
FIG. 4 is a plan view of a building in which a conventional SR light generation device is installed.

【符号の説明】[Explanation of symbols]

1 入射装置 2 ビーム輸送部 3 蓄積リング 4 制御装置 5 入射装置遮蔽壁 5´ 蓄積リング遮蔽
壁 6 ビームライン 7 放射光利用装置 8 電源室 9 制御室 10 冷却水装置室 11、11´ ビーム輸送部
偏向マグネット 12 偏向マグネット 13 搬送ライン 14 ウエハストッカ 15 天井クレーン
REFERENCE SIGNS LIST 1 incident device 2 beam transport unit 3 storage ring 4 control device 5 incident device shielding wall 5 ′ storage ring shielding wall 6 beam line 7 synchrotron radiation utilization device 8 power supply room 9 control room 10 cooling water device room 11, 11 ′ beam transport unit Deflection magnet 12 deflection magnet 13 transfer line 14 wafer stocker 15 overhead crane

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】入射装置(1)と該入射装置(1)からの
電子または陽電子を蓄積リング(3)へ導くビーム輸送
部(2)からなるシンクロトロン放射光発生装置におい
て、入射装置(1)と蓄積リング(3)を夫々建屋の階
上と階下に分散設置し、入射装置(1)と蓄積リング
(3)とを偏向マグネット(11)、(11´)を介し
て配設せるビーム輸送部(2)で連通したことを特徴と
するシンクロトロン放射光発生装置。
1. A synchrotron radiation light generating apparatus comprising an injection device (1) and a beam transport section (2) for guiding electrons or positrons from the injection device (1) to a storage ring (3). ) And the storage ring (3) are distributed and installed on the upper and lower floors of the building, respectively, and the beam which allows the incident device (1) and the storage ring (3) to be disposed via the deflection magnets (11) and (11 '). A synchrotron radiation light generating device, wherein the synchrotron radiation light generating device communicates with a transport section (2).
【請求項2】蓄積リング(3)は入射装置(1)の遮蔽
壁(5)の天井部に設置されていることを特徴とする請
求項1記載のシンクロトロン放射光発生装置。
2. The synchrotron radiation light generating device according to claim 1, wherein the storage ring is installed on a ceiling of the shielding wall of the incident device.
【請求項3】入射装置(1)は蓄積リング(3)の遮蔽
壁(5´)の天井部に設置されていることを特徴とする
請求項1記載のシンクロトロン放射光発生装置。
3. The synchrotron radiation light generating device according to claim 1, wherein the incident device is mounted on a ceiling of a shielding wall of the storage ring.
JP30082596A 1996-10-28 1996-10-28 Synchrotron radiation generating device Pending JPH10135000A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30082596A JPH10135000A (en) 1996-10-28 1996-10-28 Synchrotron radiation generating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30082596A JPH10135000A (en) 1996-10-28 1996-10-28 Synchrotron radiation generating device

Publications (1)

Publication Number Publication Date
JPH10135000A true JPH10135000A (en) 1998-05-22

Family

ID=17889566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30082596A Pending JPH10135000A (en) 1996-10-28 1996-10-28 Synchrotron radiation generating device

Country Status (1)

Country Link
JP (1) JPH10135000A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010153205A (en) * 2008-12-25 2010-07-08 Mitsubishi Electric Corp Particle accelerator
CN102484942A (en) * 2009-09-03 2012-05-30 西门子公司 Particle accelerator having a switch arrangement near an accelerator cell

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010153205A (en) * 2008-12-25 2010-07-08 Mitsubishi Electric Corp Particle accelerator
CN102484942A (en) * 2009-09-03 2012-05-30 西门子公司 Particle accelerator having a switch arrangement near an accelerator cell
JP2013504150A (en) * 2009-09-03 2013-02-04 シーメンス アクティエンゲゼルシャフト Particle accelerator with switch arrangement near the accelerator cell

Similar Documents

Publication Publication Date Title
US5349198A (en) Beam supply device
CN105794055B (en) Electron injector and free electron laser
US20040113099A1 (en) Gantry system for transport and delivery of a high energy ion beam in a heavy ion cancer therapy facility
JP2009217938A (en) Accelerator system and particle beam medical treatment system
JP2001085200A (en) Accelerator system
KR101839369B1 (en) Boron Neutron Capture Therapy System
EP3946583A1 (en) Compact rotational gantry for proton radiation systems
JP2014171560A (en) Particle beam therapy facility
JPH0636893A (en) Particle accelerator
WO2015029178A1 (en) Particle therapy system
JPH10135000A (en) Synchrotron radiation generating device
Barkov et al. A proposal to install a superconducting wiggler magnet on the storage ring VEPP-3 for generation of the synchrotron radiation
US6770890B2 (en) Stage devices including linear motors that produce reduced beam-perturbing stray magnetic fields, and charged-particle-beam microlithography systems comprising same
US11511134B2 (en) Particle therapy system and extension method thereof
TWI818626B (en) Neutron capture therapy system
JP2000075100A (en) Charged particle irradiation device
NL2014430A (en) Radiation Source.
TWI643531B (en) Particle acceleration system and method for adjusting particle acceleration system
JP2020069085A (en) Particle beam irradiation system
EP4029562A1 (en) Particle beam irradiation system and particle beam irradiation facility
TW201632033A (en) Improved beam pipe
JP7317618B2 (en) Particle therapy system
JP3307521B2 (en) Synchrotron equipment
WO2022210278A1 (en) Neutron generation apparatus and neutron therapy facility
Nishikawa et al. Status of KEK TRISTAN project