JPH1010429A5 - - Google Patents

Info

Publication number
JPH1010429A5
JPH1010429A5 JP1996179881A JP17988196A JPH1010429A5 JP H1010429 A5 JPH1010429 A5 JP H1010429A5 JP 1996179881 A JP1996179881 A JP 1996179881A JP 17988196 A JP17988196 A JP 17988196A JP H1010429 A5 JPH1010429 A5 JP H1010429A5
Authority
JP
Japan
Prior art keywords
optical system
imaging optical
catadioptric
aspherical
intermediate image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996179881A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1010429A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8179881A priority Critical patent/JPH1010429A/ja
Priority claimed from JP8179881A external-priority patent/JPH1010429A/ja
Priority to US08/877,920 priority patent/US6157498A/en
Publication of JPH1010429A publication Critical patent/JPH1010429A/ja
Priority to US09/679,267 priority patent/US6392822B1/en
Priority to US10/086,472 priority patent/US6867931B2/en
Publication of JPH1010429A5 publication Critical patent/JPH1010429A5/ja
Pending legal-status Critical Current

Links

JP8179881A 1996-06-19 1996-06-19 ２回結像光学系 Pending JPH1010429A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8179881A JPH1010429A (ja) 1996-06-19 1996-06-19 ２回結像光学系
US08/877,920 US6157498A (en) 1996-06-19 1997-06-18 Dual-imaging optical system
US09/679,267 US6392822B1 (en) 1996-06-19 2000-10-04 Dual-imaging optical system
US10/086,472 US6867931B2 (en) 1996-06-19 2002-02-28 Dual-imaging optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8179881A JPH1010429A (ja) 1996-06-19 1996-06-19 ２回結像光学系

Publications (2)

Publication Number Publication Date
JPH1010429A JPH1010429A (ja) 1998-01-16
JPH1010429A5 true JPH1010429A5 (enrdf_load_stackoverflow) 2004-10-21

Family

ID=16073540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8179881A Pending JPH1010429A (ja) 1996-06-19 1996-06-19 ２回結像光学系

Country Status (1)

Country Link
JP (1) JPH1010429A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US5969882A (en) * 1997-04-01 1999-10-19 Nikon Corporation Catadioptric optical system
WO1999052004A1 (fr) * 1998-04-07 1999-10-14 Nikon Corporation Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction
EP1293832A1 (en) 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
US7046459B1 (en) 2001-12-18 2006-05-16 Carl Zeiss Smt Ag Catadioptric reductions lens

Similar Documents

Publication Publication Date Title
US6665126B2 (en) Projection exposure lens with aspheric elements
KR100991584B1 (ko) 반사굴절식 투영 대물렌즈
US7006304B2 (en) Catadioptric reduction lens
JP3747951B2 (ja) 反射屈折光学系
USRE39024E1 (en) Exposure apparatus having catadioptric projection optical system
US4747678A (en) Optical relay system with magnification
US20080259441A1 (en) Imaging System
US6084723A (en) Exposure apparatus
JPH08203812A (ja) 反射屈折縮小投影光学系及び露光装置
KR20000011933A (ko) 카타다이옵트릭광학시스템및그를구비한노광장치
JPH09211332A (ja) 高開口数リングフィールド光学縮小系
US6333781B1 (en) Projection optical system and exposure apparatus and method
JPH0533368B2 (enrdf_load_stackoverflow)
US6069749A (en) Catadioptric reduction optical system
US6081382A (en) Catadioptric reduction projection optical system
US7403262B2 (en) Projection optical system and exposure apparatus having the same
JPH1195095A (ja) 投影光学系
US20040075894A1 (en) Catadioptric reduction objective
US9436103B2 (en) Wynne-Dyson projection lens with reduced susceptibility to UV damage
KR100511360B1 (ko) 투영광학계 및 그것을 사용한 투영노광장치, 및디바이스제조방법
JPH1010429A5 (enrdf_load_stackoverflow)
WO2005015316A2 (en) Projection objective for microlithography
JPH1010430A5 (enrdf_load_stackoverflow)
JPH11352398A (ja) 両側テレセントリック光学系
JPH05188298A (ja) 反射屈折縮小投影光学系