JPH0991648A - Method for working magnetic head slider and device therefor - Google Patents
Method for working magnetic head slider and device thereforInfo
- Publication number
- JPH0991648A JPH0991648A JP25237795A JP25237795A JPH0991648A JP H0991648 A JPH0991648 A JP H0991648A JP 25237795 A JP25237795 A JP 25237795A JP 25237795 A JP25237795 A JP 25237795A JP H0991648 A JPH0991648 A JP H0991648A
- Authority
- JP
- Japan
- Prior art keywords
- slider
- air bearing
- magnetic head
- bearing surface
- head slider
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】磁気ヘッドスライダー(以下
スライダーと略す)の一面に設けられた、左右一対の平
面部(以下浮上面と呼ぶ)を有する突出部のエッジ部
に、微小な面取りを形成するための加工方法及び装置に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention A minute chamfer is formed on an edge portion of a protrusion provided on one surface of a magnetic head slider (hereinafter abbreviated as slider) and having a pair of left and right flat surface portions (hereinafter referred to as air bearing surfaces). To a processing method and device for
【0002】[0002]
【従来の技術】一般的なスライダーは、磁気ディスク面
に対向する面に、左右2本のレール状の浮上面が設けら
れている。最近ではスライダーと磁気デイスクの間隔
(浮上量と呼ぶ)が一定になるように、図6、図7及び
図8に示すように、浮上面長手方向側面に左右非対称
に、浮上面上の加工幅である面取り幅W、浮上面からの
加工角度である面取り角度θを形成したものが製造され
ている。この面取りは微小であるが、一般に研磨によっ
て加工され、その研磨方法としては、例えば特開平6−
203355号公報に開示されたものがある。これは、
微小段差を有する弾性材又は金属盤上に研磨シートを固
定し、該研磨シート上にスライダーの浮上面を下方に向
けて、かつ両浮上面が段差を跨ぐようにしてスライダー
を載置し、一定荷重で押圧し、弾性材又は金属盤に上下
方向と水平方向の振動とを組み合わせた進行波を印加し
て、側面に微小面取り加工を施す方法である。2. Description of the Related Art A general slider is provided with two rail-shaped air bearing surfaces on the left and right sides of a surface facing a magnetic disk surface. Recently, as shown in FIGS. 6, 7 and 8, the distance between the slider and the magnetic disk (referred to as the flying height) is asymmetric, and as shown in FIGS. A chamfered width W is formed, and a chamfered angle θ which is a processing angle from the air bearing surface is formed. Although this chamfer is minute, it is generally processed by polishing, and as a polishing method, for example, JP-A-6-
There is one disclosed in Japanese Patent Publication No. 203355. this is,
A polishing sheet is fixed on an elastic material or a metal plate having minute steps, and the slider is placed on the polishing sheet with the air bearing surface of the slider facing downward and both air bearing surfaces straddling the step. This is a method of pressing with a load, applying a traveling wave that is a combination of vertical and horizontal vibrations to an elastic material or a metal plate, and performing minute chamfering processing on the side surface.
【0003】[0003]
【発明が解決しようとする課題】上記従来の技術では、
スライダーに一定荷重を与える手段として、1本のバネ
付き押さえピンを用いており、スライダーのセット位置
ばらつき等により、両側の面取りを形成すべきエッジに
かかる荷重は一定とはなり得ない。このため、研磨シー
トを金属盤に固定したものについては、この荷重差はそ
のまま加工量差として表れ、精密に両浮上面の面取り幅
Wを制御することはできない。また、研磨シートを弾性
材に固定したものについては、まず微小段差を精度良く
形成することが難しいという問題がある。即ち、この段
差量は目標の面取り角度θと、対象スライダーの両側エ
ッジ間隔寸法で異なるが、数十μm程度と微小であり、
かつ1μm程度の寸法精度で、できるだけコーナーにR
部を生じないように加工する必要があるが、弾性材にこ
の加工を施すことは難しい。さらに、両エッジにかかる
荷重差により、弾性材の変形量が異なってしまう、とい
う問題もある。これらにより、弾性材を用いた方法で
は、面取り角度θをばらつきなく安定して加工すること
は難しい。SUMMARY OF THE INVENTION In the above conventional technique,
As one means for applying a constant load to the slider, one pressing pin with a spring is used, and the load applied to the edges on which chamfers on both sides should be formed cannot be constant due to variations in the slider set position and the like. For this reason, in the case where the polishing sheet is fixed to the metal plate, this load difference directly appears as a processing amount difference, and the chamfering width W of both air bearing surfaces cannot be precisely controlled. Further, in the case where the polishing sheet is fixed to the elastic material, there is a problem that it is difficult to form the minute step accurately first. That is, this step difference differs depending on the target chamfering angle θ and the dimension of the both-side edges of the target slider, but is as small as several tens of μm.
And with a dimensional accuracy of about 1 μm, R in the corner as much as possible
Although it is necessary to process so that no portion is formed, it is difficult to perform this processing on the elastic material. Further, there is a problem that the amount of deformation of the elastic material is different due to the load difference applied to both edges. For these reasons, it is difficult to stably process the chamfering angle θ without variation by the method using the elastic material.
【0004】さらに、磁気ヘッドの性能をより向上させ
るために、スライダーの浮上量をより一層小さく、しか
も一定に保持することが求められてきている。そのた
め、面取り加工において、面取り幅Wを浮上面長手方向
に対して、図7(b)に示すように均一ではなく、所定
寸法で広幅から狭幅になるような形状としたものが提案
されている。このような加工に対しては、前記従来技術
では面取り幅寸法を制御する手段はなく、対応できない
ことは明らかである。したがって本発明は、磁気ヘッド
スライダーの一面に設けられた左右一対の浮上面のエッ
ジに、精度良くかつ安定的に、さらには面取り幅加工寸
法を制御可能に、特に広幅から狭幅になるような形状に
微小面取りを行うための加工方法及び加工装置を提供す
ることを目的としている。Further, in order to further improve the performance of the magnetic head, it is required to keep the flying height of the slider smaller and moreover constant. Therefore, in chamfering, it has been proposed that the chamfering width W is not uniform in the longitudinal direction of the air bearing surface as shown in FIG. 7B, but has a predetermined width from wide to narrow. There is. It is obvious that the above-mentioned conventional technique cannot cope with such processing because there is no means for controlling the chamfer width dimension. Therefore, according to the present invention, it is possible to precisely and stably control the chamfering width processing dimension on the edges of the pair of left and right air bearing surfaces provided on one surface of the magnetic head slider, and in particular, to increase the width from a wide width to a narrow width. It is an object of the present invention to provide a processing method and a processing apparatus for performing minute chamfering on a shape.
【0005】[0005]
【課題を解決するための手段】本発明は上記目的を達成
するためになされたものであり、磁気ヘッドスライダー
の浮上面のエッジ部に、微小面取りを行う磁気ヘッドス
ライダーの加工方法において、スライダーをクッション
材に保持し、その浮上面を研磨体に押圧して、浮上面の
長手方向に送り走行を、交差する方向に水平振動を作用
させて加工すること特徴としている。また、磁気ヘッド
スライダーの浮上面のエッジ部に、微小面取りを行う磁
気ヘッドの加工装置において、スライダーを保持するク
ッション材と、クッション材に保持されるスライダーの
浮上面に対向して配置された研磨体と、研磨体とスライ
ダーの少なくとも一方を、スライダーの浮上面長手方向
に走行する手段と、研磨体とスライダーの少なくとも一
方を水平方向に加振する加振手段とを有することも特徴
としている。SUMMARY OF THE INVENTION The present invention has been made to achieve the above object, and in a method of processing a magnetic head slider for performing a minute chamfer on the edge portion of the air bearing surface of the magnetic head slider, the slider is It is characterized in that it is held by a cushion material, its air bearing surface is pressed against a polishing body, and is fed in the longitudinal direction of the air bearing surface, and horizontal vibration is applied in the intersecting direction for processing. In addition, in a magnetic head processing device that performs minute chamfering on the edge portion of the air bearing surface of the magnetic head slider, a cushion material that holds the slider and a polishing member that is arranged to face the air bearing surface of the slider that is held by the cushion material. It is also characterized in that it has a body, a means for moving at least one of the polishing body and the slider in the longitudinal direction of the air bearing surface of the slider, and a vibrating means for vibrating at least one of the polishing body and the slider in the horizontal direction.
【0006】[0006]
(実施例1)本発明の加工装置を図1及び図2をもとに
説明する。下部ベース20、これから立ち上がっている
コラム21、コラム上部に配設された上部ベース22で
メインフレームを形成する。コラム21には、走行手段
を有し前後方向(紙面に垂直方向)に移動制御される走
行テーブル24を配し、さらに、走行テーブル24には
昇降手段を有し上下方向に移動制御される昇降ステージ
23を配する。昇降ステージ23には、下部基台1、下
部固定具2を介して調節台3が固定されている。調節台
3の上面には、原形状が平板状をしたクッション材であ
るパッド5が固定されている。パッド5は、例えばゴム
又は発泡樹脂の材質から成り、クッション性が良く、か
つ反力の小さい性状のものが望ましい。パッド5の上面
には、スライダー7を、その左右一対の浮上面7aの長
手方向が走行テーブル24の走行方向に平行になるよう
に、かつ上方に向けて載置位置決めする固定枠6が固定
されている。下部基台1には、凹溝1aとこの凹溝1a
に連通する吸気孔1bとが設けられ、吸気孔1bには吸
引装置(図示せず)が接続されており、下部固定具2は
下部基台1上に真空吸引によって固定されている。(Embodiment 1) A processing apparatus of the present invention will be described with reference to FIGS. The lower base 20, the column 21 standing upright, and the upper base 22 disposed above the column form a main frame. The column 21 is provided with a traveling table 24 which has traveling means and whose movement is controlled in the front-back direction (perpendicular to the paper surface). Further, the traveling table 24 has elevating means which is vertically moved and controlled. Arrange the stage 23. An adjustment base 3 is fixed to the elevating stage 23 via a lower base 1 and a lower fixture 2. A pad 5, which is a cushion material having an original shape of a flat plate, is fixed to the upper surface of the adjustment table 3. The pad 5 is preferably made of rubber or foamed resin, for example, and has a good cushioning property and a small reaction force. A fixed frame 6 is fixed to the upper surface of the pad 5 so that the slider 7 is mounted and positioned upward such that the longitudinal directions of the pair of left and right floating surfaces 7a are parallel to the traveling direction of the traveling table 24. ing. The lower base 1 has a groove 1a and the groove 1a.
And a suction device (not shown) is connected to the suction hole 1b, and the lower fixture 2 is fixed on the lower base 1 by vacuum suction.
【0007】調節台3は3層の板3a,3b,3cを有
し、第1層3aと第2層3bとは、中央部において前後
方向に伸びる前後方向連結部3dによって連結されてお
り、第2層3bと第3層3cとは、中央部において左右
方向に伸びる左右方向連結部3eによって連結されてい
る。第1層3aの前後方向中央の左右端と、左右方向中
央の前後端には、それぞれめねじが設けられており、左
右端のめねじは第1層3aのみを貫通しており、これに
螺入される左調節ねじ4aと右調節ねじ4bの下端は、
第2層3bの上面に当接している。他方、前後端のめね
じは第1層3aと第2層3bを貫通しており、これに螺
入される前調節ねじ4cと後ろ調節ねじ4dの下端は、
第3層3cの上面に当接している。したがって左調節ね
じ4aをねじ戻して右調節ねじ4bをねじ込むと、調節
台3の上面は水平方向左方を下にして傾斜し、右調節ね
じ4bをねじ戻して左調節ねじ4aをねじ込むと、調節
台3の上面は水平方向右方を下にして傾斜する。同様に
前調節ねじ4cをねじ戻して後ろ調節ねじ4dをねじ込
むと、調節台3の上面は水平方向前方を下にして傾斜
し、後ろ調節ねじ4dをねじ戻して前調節ねじ4cをね
じ込むと、調節台3の上面は水平方向後方を下にして傾
斜する。The adjusting table 3 has three layers of plates 3a, 3b and 3c, and the first layer 3a and the second layer 3b are connected by a front-rear direction connecting portion 3d extending in the front-rear direction at a central portion, The second layer 3b and the third layer 3c are connected by a left-right direction connecting portion 3e extending in the left-right direction at the central portion. Female threads are provided on the left and right ends of the center of the first layer 3a in the front-rear direction and on the front and rear ends of the center of the left-right direction, and the female threads on the left and right ends penetrate only the first layer 3a. The lower ends of the left adjusting screw 4a and the right adjusting screw 4b that are screwed in are
It is in contact with the upper surface of the second layer 3b. On the other hand, the female screws at the front and rear ends penetrate the first layer 3a and the second layer 3b, and the lower ends of the front adjusting screw 4c and the rear adjusting screw 4d screwed into these are
It is in contact with the upper surface of the third layer 3c. Therefore, when the left adjusting screw 4a is unscrewed and the right adjusting screw 4b is screwed in, the upper surface of the adjusting table 3 is inclined with the left side in the horizontal direction downward, and when the right adjusting screw 4b is unscrewed and the left adjusting screw 4a is screwed in, The upper surface of the adjustment table 3 is inclined with the right side in the horizontal direction facing downward. Similarly, when the front adjustment screw 4c is unscrewed and the rear adjustment screw 4d is screwed in, the upper surface of the adjustment base 3 is inclined with the front in the horizontal direction downward, and when the rear adjustment screw 4d is unscrewed and the front adjustment screw 4c is screwed in, The upper surface of the adjustment table 3 is inclined with the rear side in the horizontal direction facing downward.
【0008】スライダー7の上方には、上部ベース22
に支持された上部基台11が配置されている。加振手段
25は、本体がコラム21に、振動付与部が上部基台1
1に取り付けられている。これにより、上部基台11は
図1の左右方向、すなわちスライダー7の両浮上面7a
の長手方向と交差する方向に加振され得る。上部基台1
1は、加振手段により有効に振動するように、上部ベー
ス22と例えば薄板で連結したり、あるいはスライドを
介した結合構造とし、左右方向に微動可能としている。
上部基台11には凹溝11aと、この凹溝11aに連通
する吸気口11bとが設けられており、吸気口11bに
は吸引装置(図示せず)が接続されており、上部固定具
10は上部基台11の下面に、真空吸着によって固定さ
れている。上部固定具10の下面には、テープ貼り付け
薄肉板9aとテープ貼り付け厚肉板9bとが、相隣接し
て固定されており、両貼り付け板9a,9bの境界に形
成される段差はスライダー7の両浮上面7aの中間に位
置するように配置されている。両貼り付け板9a,9b
は、例えば金属又はセラミックス等の前記パッド5に対
して圧倒的に剛性の高い材質で製作する。両貼り付け板
9a,9bの下面には、それぞれ研磨テープ8が貼り付
けられている。Above the slider 7, an upper base 22 is provided.
An upper base 11 supported by the above is arranged. In the vibrating means 25, the main body is in the column 21, and the vibration applying portion is in the upper base 1.
It is attached to 1. As a result, the upper base 11 is moved in the left-right direction in FIG. 1, that is, on both air bearing surfaces 7a of the slider 7.
Can be excited in a direction intersecting the longitudinal direction of the. Upper base 1
1 is connected to the upper base 22 by, for example, a thin plate so as to be effectively vibrated by the vibrating means, or has a coupling structure via a slide, and is capable of fine movement in the left-right direction.
The upper base 11 is provided with a concave groove 11a and an intake port 11b communicating with the concave groove 11a. A suction device (not shown) is connected to the intake port 11b, and the upper fixture 10 Is fixed to the lower surface of the upper base 11 by vacuum suction. On the lower surface of the upper fixture 10, a tape-attached thin plate 9a and a tape-attached thick plate 9b are fixed adjacent to each other, and the step formed at the boundary between the both attached plates 9a and 9b is The slider 7 is arranged so as to be located between the two air bearing surfaces 7a. Both attachment plates 9a, 9b
Is made of a material having overwhelmingly high rigidity with respect to the pad 5, such as metal or ceramics. Polishing tapes 8 are attached to the lower surfaces of both attachment plates 9a and 9b, respectively.
【0009】以下本実施例の作用を図1及び図3を用い
て説明する。図1において、走行テーブル24を紙面の
奥側に設定した原点位置に戻し、昇降ステージ23を下
降させて、スライダー7を、その両浮上面7aを上方に
向けてパッド5上の固定枠6の中に載置した状態にセッ
トした後、昇降ステージ23を上昇させて一定位置まで
持ち上げる。この時の上昇位置は、スライダー7の両浮
上面7aが、それぞれテープ貼り付け薄肉板9aとテー
プ貼り付け厚肉板9bの下面に貼り付けた研磨テープ8
を押圧するような位置である。この状態において、両貼
り付け板9a,9bは肉厚が異なり、貼り付け板の剛性
はパッドに比して高いため、スライダー7は、両突出部
7aの間隔と、両貼り付け板9a,9bの境界に形成さ
れる段差とに応じて定まる一定角度、即ち所定の面取り
角度θだけ、僅かに傾斜してパッド5に沈み込む。しか
し、パッド5をクッション性がよい(剛性が低い)もの
を選定しておくことによって、前記パッドの沈み込み量
差程度では、両浮上面7aのエッジ部がパッドから受け
る反力にはほとんど差はない。The operation of this embodiment will be described below with reference to FIGS. 1 and 3. In FIG. 1, the traveling table 24 is returned to the origin position set on the back side of the paper surface, the elevating stage 23 is lowered, and the slider 7 is fixed to the fixed frame 6 on the pad 5 with both floating surfaces 7a thereof facing upward. After being set inside, the elevating stage 23 is lifted and lifted to a certain position. The rising position at this time is such that the two air bearing surfaces 7a of the slider 7 are attached to the lower surfaces of the tape-attached thin plate 9a and the tape-attached thick plate 9b, respectively.
It is a position where is pressed. In this state, the two attachment plates 9a and 9b have different wall thicknesses, and the attachment plate has a higher rigidity than the pad, so that the slider 7 has a space between the protrusions 7a and both attachment plates 9a and 9b. At a certain angle determined according to the step formed at the boundary of, i.e., a predetermined chamfering angle [theta], and is slightly inclined and sunk into the pad 5. However, by selecting the pad 5 having a good cushioning property (low rigidity), there is almost no difference in the reaction force received from the pad by the edge portions of the two air bearing surfaces 7a at the difference in the sinking amount of the pad. There is no.
【0010】その後、加振手段25によって上部基台1
1を図1の左右方向に加振し、これと同時に走行テーブ
ル24を紙面の手前側に移動させる。図3は図1をA方
向から見た図である。図3において、スライダー7は左
方の原点位置から右方の停止位置まで研磨テープ8を押
圧しながら走行する。走行中、進行方向の前側の浮上面
エッジ部に対し、後ろ側の浮上面エッジ部は、すでに前
側浮上面エッジ部の加工に使用された研磨テープ面で加
工されるので、砥粒の切れ味が悪くなっており加工量が
少なくなる。従って、スライダー7が片道走行し、停止
位置に達した時点で、昇降ステージ23を下降すると、
両浮上面7aの面取り加工後の面取り幅Wは、前側は広
く、後ろ側は狭くなった形状に加工されている。面取り
角度θは前記傾斜角で規制され、浮上面全長にわたって
はぼ一定となる。After that, the vibrating means 25 is used to move the upper base 1
1 is oscillated in the left-right direction in FIG. 1, and at the same time, the traveling table 24 is moved to the front side of the paper surface. FIG. 3 is a view of FIG. 1 viewed from the A direction. In FIG. 3, the slider 7 travels from the origin position on the left side to the stop position on the right side while pressing the polishing tape 8. While traveling, the edge of the air bearing surface on the rear side with respect to the edge of the air bearing surface on the front side is processed with the polishing tape surface already used for processing the edge of the front air bearing surface, so the sharpness of the abrasive grains is It becomes worse and the amount of processing decreases. Therefore, when the slider 7 travels one way and reaches the stop position, when the elevating stage 23 is lowered,
The chamfering width W of the air bearing surfaces 7a after chamfering is processed such that the front side is wide and the rear side is narrow. The chamfer angle θ is regulated by the inclination angle and is almost constant over the entire length of the air bearing surface.
【0011】また、調節台3を操作し浮上面7aの長手
方向にパッド5を傾けてスライダー7をセットした状態
で、同様な動作で加工することも効果がある。この時、
面取り幅Wのうち、幅広に加工したい方が数百μm程度
高くなるようにする。即ち、図4(a)に示すように、
後側調節ねじ4dをねじ戻して前側調節ねじ4cをねじ
込むことにより、調節台3の上面は前側が高くなるよう
に傾斜する。前記で説明したように、パッド5はクッシ
ョン性がよい(剛性が低い)ため、数十μm程度の微小
押し込み量差に対しては反力はあまり変わらない。しか
し、その差が数百μm程度にもなると、反力差は発生す
る。この反力差からくる浮上面7aの研磨テープ8への
押圧の差による加工量差と、前記砥粒の切れ味の差が加
味され、より効率的に面取り幅加工をすることができ
る。It is also effective to operate the adjusting table 3 to incline the pad 5 in the longitudinal direction of the air bearing surface 7a and set the slider 7 to perform the same operation. This time,
Of the chamfer widths W, the width of the chamfered width W is increased by about several hundreds μm. That is, as shown in FIG.
By screwing back the rear adjusting screw 4d and screwing in the front adjusting screw 4c, the upper surface of the adjusting base 3 is inclined so that the front side becomes higher. As described above, since the pad 5 has a good cushioning property (low rigidity), the reaction force does not change so much with respect to the minute pushing amount difference of about several tens μm. However, when the difference is several hundreds of μm, a reaction force difference occurs. The chamfering width can be processed more efficiently by taking into consideration the difference in the processing amount due to the difference in the pressing force of the air bearing surface 7a against the polishing tape 8 resulting from this reaction force difference and the difference in the sharpness of the abrasive grains.
【0012】また、調節台3はその上面の左右方向の傾
きと前後方向の傾きとを調節することができるため、ス
ライダー7のロット毎の製造誤差に対して予め適切なス
ライダー姿勢に調節することもできる。また本実施例で
は、下部固定具2は真空吸着によって下部基台1に固定
されており、上部固定具10は真空吸着によって上部基
台11に固定されているから、下部固定具2と上部固定
具10との取付け取り外しを迅速に行うことができ、し
たがってスライダー7の交換と研磨テープ8の交換と
を、共に迅速に行なうことができる。Further, since the adjustment table 3 can adjust the inclination of the upper surface in the left-right direction and the inclination in the front-rear direction, it is necessary to adjust the slider posture in advance to the manufacturing error of the slider 7 for each lot. You can also Further, in this embodiment, since the lower fixture 2 is fixed to the lower base 1 by vacuum suction and the upper fixture 10 is fixed to the upper base 11 by vacuum suction, the lower fixture 2 and the upper fixture are fixed. The tool 10 can be quickly attached and detached, and therefore the slider 7 and the polishing tape 8 can both be quickly replaced.
【0013】(実施例2)図1で示した装置において、
スライダー7のセット部を、図5に示すように、本実施
例ではパッド5と固定枠6との間にスペーサー12を取
り付けた構造とした。スペーサー12は、固定枠6とほ
ぼ同様な中抜き形状であるが、スライダーの浮上面長手
方向下面の一端部を支持できるような突出し部12aを
有している。従って、スライダーをセットした時点で
は、図5(a)に示すようにスライダーは浮上面長手方
向に対し、一端をパッド5、他端をスペーサーの突き出
し部12aで支えられ、ちょうどスペーサーの厚み分傾
くことになる。(Embodiment 2) In the apparatus shown in FIG.
As shown in FIG. 5, the setting portion of the slider 7 has a structure in which a spacer 12 is attached between the pad 5 and the fixed frame 6 in this embodiment. The spacer 12 has a hollow shape similar to that of the fixed frame 6, but has a protruding portion 12a capable of supporting one end of the lower surface of the slider in the longitudinal direction of the air bearing surface. Therefore, when the slider is set, as shown in FIG. 5A, the slider is supported by the pad 5 at one end and the protruding portion 12a of the spacer at the other end in the longitudinal direction of the air bearing surface, and is inclined by exactly the thickness of the spacer. It will be.
【0014】以下本実施例の作用を図1及び図5を用い
て説明する。図1において、走行テーブル24を紙面の
奥側の原点位置に戻し、昇降ステージ23を下降させ
て、図5(a)に示すように、スライダー7をその両浮
上面7aを上方に向けて、かつ面取り幅を広くしたい方
をスペーサーの突出し部12a上になるように、パッド
5上の固定枠6の中に載置した状態にセットした後、下
部基台1を一定位置まで上昇させる。この時の上昇位置
は、スライダー7の両浮上面7aが、それぞれテープ貼
り付け薄肉板9aとテープ貼り付け厚肉板9bの下面に
貼り付けた研磨テープ8を押圧するような位置である。
本実施例においては、浮上面の長手方向に直交する面で
は、実施例1で説明したと同様、両貼り付け板9a,9
bは肉厚が異なり、貼り付け板の剛性はパッドに比して
はるかに高いため、スライダー7は、両浮上面7aの間
隔と、両貼り付け板9a,9bの境界に形成される段差
とに応じて定まる一定角度、即ち所定の面取り角度θだ
け、僅かに傾斜してパッド5に沈み込むが、研磨テープ
と接触する両浮上面7aのエッジ部の受ける反力はほと
んど同一である。The operation of this embodiment will be described below with reference to FIGS. 1 and 5. In FIG. 1, the traveling table 24 is returned to the origin position on the back side of the paper surface, the elevating stage 23 is lowered, and as shown in FIG. The lower base 1 is raised to a certain position after the lower base 1 is set in a state where it is placed in the fixed frame 6 on the pad 5 so that the side whose chamfer width is desired to be wide is on the protruding portion 12a of the spacer. At this time, the ascending position is such that both air bearing surfaces 7a of the slider 7 press the polishing tapes 8 attached to the lower surfaces of the tape-attached thin plate 9a and the tape-attached thick plate 9b, respectively.
In the present embodiment, on the surface orthogonal to the longitudinal direction of the air bearing surface, both the attachment plates 9a, 9a, as in the first embodiment.
Since the thickness of b is different and the rigidity of the sticking plate is much higher than that of the pad, the slider 7 has a gap between both air bearing surfaces 7a and a step formed at the boundary between both sticking plates 9a and 9b. Although it slightly inclines by a constant angle determined according to the above, that is, a predetermined chamfering angle θ and sinks into the pad 5, the reaction force received by the edge portions of both air bearing surfaces 7a contacting the polishing tape is almost the same.
【0015】しかし、図5(b)に示すように、浮上面
7aの長手方向面では、スライダー7は、両貼り付け板
9a,9bによりスペーサー12の厚さ分傾斜してパッ
ドに沈み込む。このため、スペーサーの突き出し部12
aを撓ませた分、スライダーは反力を受ける。最初浮上
面7aが高くセットされていた方、即ち面取り幅をより
広く加工すべき方は、突き出し部12aを弾性変形させ
るに要した力で研磨テープに押しつけられることにな
る。However, as shown in FIG. 5B, on the longitudinal surface of the air bearing surface 7a, the slider 7 is inclined by the thickness of the spacer 12 by both attachment plates 9a and 9b and sinks into the pad. Therefore, the protruding portion 12 of the spacer
The slider receives a reaction force as much as a is deflected. If the air bearing surface 7a is initially set high, that is, if the chamfering width is to be increased, the force required to elastically deform the protruding portion 12a is pressed against the polishing tape.
【0016】その後、加振手段25によって上部基台1
1を図1の左右方向に加振し、これと同時に走行テーブ
ル24を紙面の手前方向に移動させる。実施例1で述べ
たように、面取り幅加工量はスライダーの進行方向前側
が多くなる。従って、スペーサーの突き出し部12aを
進行方向の前側にセットすれば、砥粒切れ味差と、押圧
力差という両要因が加算されて、より能率の高い加工、
又はより面取り幅寸法差が大な加工が可能となる。ま
た、スライダーを往復走行して加工するようにすれば、
砥粒切れ味差という要因はキャンセルされ、スペーサー
厚さの調整だけで面取り幅W寸法の大きさを制御するこ
とができる。Then, the vibrating means 25 is used to excite the upper base 1.
1 is vibrated in the left-right direction in FIG. 1, and at the same time, the traveling table 24 is moved in the front direction on the paper surface. As described in the first embodiment, the chamfering width machining amount increases on the front side in the moving direction of the slider. Therefore, if the protruding portion 12a of the spacer is set to the front side in the traveling direction, both factors such as the difference in sharpness of the abrasive grains and the difference in pressing force are added, so that the machining with higher efficiency can be performed.
Alternatively, it is possible to perform processing with a larger chamfer width difference. Also, if you process the slider by traveling back and forth,
The factor of the difference in sharpness of the abrasive grains is canceled, and the size of the chamfer width W can be controlled only by adjusting the spacer thickness.
【0017】本実施例の方法を用いて、スペーサー12
を厚さ30μmのSUS材で製作し、加工ストロークを
往復10mm、送り速度20mm/分としてエッジ部の
微小面取り加工を行なった結果、W1とW2の差が30
μm以上で、しかもそれぞれが±5μm以内の精度で広
幅から狭幅になるような面取りを安定して加工すること
ができた。なお、本実施例では研磨テープを用いたが、
研磨シートでも、さらに砥粒を結合剤で固めたいわゆる
砥石をそのまま用いてもよい。砥石を用いる場合は、テ
ープ貼り付け板はなくしてもよい。Using the method of this embodiment, the spacer 12
Was manufactured from a SUS material having a thickness of 30 μm, and the chamfering processing of the edge portion was performed with a processing stroke of 10 mm reciprocating and a feed rate of 20 mm / min. As a result, the difference between W1 and W2 was 30.
It was possible to stably process a chamfer from a wide width to a narrow width with an accuracy of ± 5 μm or more and within ± 5 μm. In this example, the polishing tape was used,
As the polishing sheet, a so-called grindstone in which abrasive grains are hardened with a binder may be used as it is. When using a grindstone, the tape sticking plate may be omitted.
【0018】[0018]
【発明の効果】以上のように本発明によれば、下記に示
す効果を有し、スライダーの両浮上面のエッジに、極め
て正確で安定した微小面取りを形成、制御することがで
き、特に長手方向面取り幅が、広幅から狭幅になるよう
な面取りを行うことができる。 1)スライダー浮上面を研磨テープに押圧した状態で、
長手方向に直交する方向に振動させながら、長手方向に
送ることによって加工するので、機械的な送り方向、送
り量、送り速度を制御することで、浮上面長手方向の面
取り幅寸法を変えることができる。 2)上記機械的制御量を一定に設定した場合、スライダ
ー底面一端を支持するスペーサーの材質、形状を変える
ことにより、浮上面長手方向の面取り幅寸法を安定して
制御することができる。 3)テープ貼付け板を高剛性体で別体に製造しているか
ら、各々の貼付け板肉厚を精度良く製造することがで
き、両貼付け板の境界に形成される段差の精度が高くな
り、エッジ部の面取り角度を精度高く安定して形成する
ことができる。 4)スライダーの保持にクッション性の良い、反力の小
さい性状のパッドを用いたので、上記テープ貼り付け板
の段差分スライダーが傾いて沈み込んでも、反力に差が
なく、両側の浮上面は同一な荷重で研磨テープに押し付
けられるため、エッジ部の面取り角度を精度高く安定し
て形成することができる。As described above, according to the present invention, the following effects can be obtained, and extremely accurate and stable micro chamfering can be formed and controlled at the edges of both air bearing surfaces of the slider. It is possible to perform chamfering such that the width of the chamfer in the direction becomes wide to narrow. 1) With the slider air bearing surface pressed against the polishing tape,
Since machining is performed by feeding in the longitudinal direction while vibrating in the direction orthogonal to the longitudinal direction, it is possible to change the chamfer width dimension in the longitudinal direction of the air bearing surface by controlling the mechanical feed direction, feed amount, and feed speed. it can. 2) When the amount of mechanical control is set to a constant value, the chamfer width in the longitudinal direction of the air bearing surface can be stably controlled by changing the material and shape of the spacer that supports one end of the slider bottom surface. 3) Since the tape adhering plate is manufactured separately from the highly rigid body, the thickness of each adhering plate can be accurately manufactured, and the accuracy of the step formed at the boundary between both adhering plates becomes high, The chamfering angle of the edge portion can be formed with high accuracy and stability. 4) Since a pad with a good cushioning property and a small reaction force is used to hold the slider, even if the slider is tilted and sinks by the step of the tape sticking plate, there is no difference in reaction force and the air bearing surface on both sides Is pressed against the polishing tape with the same load, the chamfering angle of the edge portion can be formed with high accuracy and stability.
【図1】本発明の一実施例を示す加工装置の基本構造FIG. 1 is a basic structure of a processing apparatus showing an embodiment of the present invention.
【図2】調節台を示す斜視図FIG. 2 is a perspective view showing an adjustment table.
【図3】本発明の加工動作を示す一実施例FIG. 3 is an example showing a processing operation of the present invention.
【図4】本発明の調整台を傾けた場合の一実施例を示す
側面図FIG. 4 is a side view showing an embodiment in which the adjusting table of the present invention is tilted.
【図5】本発明のスペーサーを用いた場合の一実施例を
示す側面図FIG. 5 is a side view showing an embodiment in which the spacer of the present invention is used.
【図6】磁気ヘッドスライダーの一例を示す斜視図FIG. 6 is a perspective view showing an example of a magnetic head slider.
【図7】同じく平面図FIG. 7 is a plan view of the same.
【図8】同じく横断面図FIG. 8 is a cross-sectional view of the same
2 下部固定具 3 調節台 5 パッド 7 磁気ヘッドスライダー 7a 突出部 8 研磨テープ 9a テープ貼付け薄肉板 9b テープ貼付け厚肉板 10 上部固定具 12 スペーサー 24 走行テーブル 25 加振手段 2 Lower Fixture 3 Adjusting Stand 5 Pad 7 Magnetic Head Slider 7a Projection 8 Polishing Tape 9a Tape Attaching Thin Plate 9b Tape Attaching Thick Plate 10 Upper Fixture 12 Spacer 24 Traveling Table 25 Exciting Means
Claims (10)
部に、微小面取りを行う磁気ヘッドスライダーの加工方
法において、 スライダーをクッション材に保持し、その浮上面を研磨
体に押圧して、浮上面の長手方向に送り走行を、交差す
る方向に水平振動を作用させて加工することを特徴とす
る磁気ヘッドスライダーの加工方法。1. A method of processing a magnetic head slider, wherein fine chamfering is performed on an edge portion of an air bearing surface of a magnetic head slider, wherein the slider is held by a cushioning material, and the air bearing surface is pressed against a polishing body, A processing method of a magnetic head slider, characterized in that feed traveling is performed in a longitudinal direction and horizontal vibration is applied in a crossing direction.
エッジ部に、微小面取りを行う磁気ヘッドスライダーの
加工方法において、 スライダーをクッション材に保持し、その浮上面を浮上
面間に段差がくるように配置した研磨体に押圧して、浮
上面の長手方向に送り走行を、交差する方向に水平振動
を作用させて加工することを特徴とする磁気ヘッドスラ
イダーの加工方法。2. A method of processing a magnetic head slider, wherein minute chamfering is performed on an edge portion of a pair of air bearing surfaces of a magnetic head slider, wherein the slider is held by a cushion material, and the air bearing surface is stepped between the air bearing surfaces. A method of processing a magnetic head slider, characterized in that the magnetic head slider is processed by pressing the polishing body arranged in the above, feeding in the longitudinal direction of the air bearing surface, and applying horizontal vibration in the intersecting direction.
部に、浮上面上の長手方向面取り幅が広幅から狭幅にな
るように微小面取りを行う磁気ヘッドの加工方法におい
て、 スライダーをクッション材に保持し、その浮上面を研磨
体に押圧し、浮上面長手方向に、研磨体に対してスライ
ダーがその広幅側から狭幅側へと接触して行くように、
スライダーと研磨体の少なくとも一方を送り走行させ、
交差する方向には水平振動を作用させて加工することを
特徴とする磁気ヘッドスライダーの加工方法。3. A method of processing a magnetic head, wherein a chamfering is performed at an edge portion of an air bearing surface of a magnetic head slider so that a chamfering width in the longitudinal direction on the air bearing surface is changed from a wide width to a narrow width. Then, the air bearing surface is pressed against the polishing body, so that the slider contacts the polishing body in the longitudinal direction of the air bearing surface from the wide side to the narrow side.
At least one of the slider and the polishing body is fed and run,
A method of processing a magnetic head slider, characterized in that horizontal vibration is applied to the intersecting direction for processing.
部に、浮上面上の長手方向面取り幅が広幅から狭幅にな
るように微小面取りを行う磁気ヘッドの加工方法におい
て、 スライダーをクッション材に保持し、その浮上面を前記
広幅にする面取り側をより強く研磨体に押圧し、浮上面
長手方向には送り走行を、交差する方向には水平振動を
作用させて加工することを特徴とする磁気ヘッドスライ
ダーの加工方法。4. A method of processing a magnetic head, wherein a chamfering is performed on an edge portion of an air bearing surface of a magnetic head slider so that a chamfering width in a longitudinal direction on the air bearing surface is changed from a wide width to a narrow width. Then, the chamfered side that widens the air bearing surface is pressed more strongly to the polishing body, and the feed traveling is performed in the longitudinal direction of the air bearing surface, and horizontal vibration is applied in the intersecting direction to perform machining. Head slider processing method.
幅にする面取り側の一端にスペーサーを装入し、浮上面
を研磨体に押圧した時、前記広幅にする面取り側をより
強く研磨体に押圧することを特徴とする請求項4記載の
磁気ヘッドスライダーの加工方法。5. When a spacer is inserted between the slider and the cushion material at one end of the chamfering side for widening and the air bearing surface is pressed against the polishing body, the chamfering side for widening is made stronger for the polishing body. The method of processing a magnetic head slider according to claim 4, wherein the magnetic head slider is pressed.
してスライダーがその広幅側から狭幅側へと接触して行
くように、スライダーと研磨体の少なくとも一方を送り
走行させる請求項4又は5記載の磁気ヘッドスライダー
の加工方法。6. At least one of the slider and the polishing body is fed so that the slider comes into contact with the polishing body from the wide side to the narrow side in the air-bearing-surface longitudinal feed traveling. Alternatively, the method of processing the magnetic head slider as described in 5 above.
部に、微小面取りを行う磁気ヘッドの加工装置におい
て、 スライダーを保持するクッション材と、 クッション材に保持されるスライダーの浮上面に対向し
て配置された研磨体と、 研磨体とスライダーの少なくとも一方を、スライダーの
浮上面長手方向に走行する手段と、 研磨体とスライダーの少なくとも一方を水平方向に加振
する加振手段とを有することを特徴とする磁気ヘッドス
ライダーの加工装置。7. A magnetic head processing device for performing minute chamfering on an edge portion of an air bearing surface of a magnetic head slider, the cushion material holding the slider and the air bearing surface of the slider held by the cushion material are arranged to face each other. A polishing body, a means for moving at least one of the polishing body and the slider in the longitudinal direction of the air bearing surface of the slider, and a vibrating means for horizontally exciting at least one of the polishing body and the slider. And processing device for magnetic head slider.
エッジ部に、微小面取りを行う磁気ヘッドの加工装置に
おいて、 スライダーを保持するクッション材と、 クッション材に保持されるスライダーの浮上面に対向し
て配置されて、両浮上面の中間に対応する位置に段差を
有する研磨体と、 研磨体とスライダーの少なくとも一方を、スライダーの
浮上面長手方向に走行する手段と、 研磨体とスライダーの少なくとも一方を水平方向に加振
する加振手段とを有することを特徴とする磁気ヘッドス
ライダーの加工装置。8. In a magnetic head processing apparatus for performing minute chamfering on a pair of air bearing surface edge portions of a magnetic head slider, a cushion material for holding the slider and an air bearing surface of the slider held by the cushion material are opposed to each other. And a means for running at least one of the polishing body and the slider in the longitudinal direction of the air bearing surface of the slider, and at least one of the polishing body and the slider. And a vibrating means for horizontally vibrating the magnetic head slider.
上面長手方向の一端を支持するように固定したスペーサ
ーを有した請求項7又は8に記載の磁気ヘッドスライダ
ーの加工装置。9. The magnetic head slider processing apparatus according to claim 7, further comprising a spacer fixed on the cushion material so as to support one end of the slider bottom surface in the air bearing surface longitudinal direction.
する基体に研磨テープを貼り付けたものである請求項7
乃至9のいずれかに記載の磁気ヘッドスライダーの加工
装置。10. The polishing body is obtained by attaching a polishing tape to a substrate having rigidity equal to or higher than that of metal.
10. The magnetic head slider processing device according to any one of 1 to 9.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25237795A JPH0991648A (en) | 1995-09-29 | 1995-09-29 | Method for working magnetic head slider and device therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25237795A JPH0991648A (en) | 1995-09-29 | 1995-09-29 | Method for working magnetic head slider and device therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0991648A true JPH0991648A (en) | 1997-04-04 |
Family
ID=17236469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25237795A Pending JPH0991648A (en) | 1995-09-29 | 1995-09-29 | Method for working magnetic head slider and device therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0991648A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004100133A1 (en) * | 2003-05-12 | 2004-11-18 | Sae Magnetics (H.K) Ltd. | System and method for edge blending hard drive head sliders |
US6916227B2 (en) | 2002-11-04 | 2005-07-12 | Sae Magnetics (H.K.) Ltd. | Method and apparatus for processing sliders for use in disk drives and the like |
US6960117B1 (en) | 2004-04-28 | 2005-11-01 | Sae Magnetics (H.K.) Ltd. | Method to eliminate defects on the periphery of a slider due to conventional machining processes |
-
1995
- 1995-09-29 JP JP25237795A patent/JPH0991648A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6916227B2 (en) | 2002-11-04 | 2005-07-12 | Sae Magnetics (H.K.) Ltd. | Method and apparatus for processing sliders for use in disk drives and the like |
WO2004100133A1 (en) * | 2003-05-12 | 2004-11-18 | Sae Magnetics (H.K) Ltd. | System and method for edge blending hard drive head sliders |
US7189150B2 (en) | 2003-05-12 | 2007-03-13 | Sae Magnetics (H.K.) Ltd. | System and method for edge blending hard drive head sliders |
US6960117B1 (en) | 2004-04-28 | 2005-11-01 | Sae Magnetics (H.K.) Ltd. | Method to eliminate defects on the periphery of a slider due to conventional machining processes |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI244156B (en) | Device for fixing thin and flexible substrates | |
US8485507B2 (en) | Movable table and processing stage | |
JPH11238220A (en) | Slider | |
JPH0991648A (en) | Method for working magnetic head slider and device therefor | |
US5624298A (en) | Jig for headpiece aggregate machining and method for manufacturing a thin film magnetic head | |
JPH03259520A (en) | Rotary polishing equipment | |
JP3053104B2 (en) | Thin plate holding device | |
KR20050000605A (en) | Bonding Equipment For Bonding Anisotropic Conductive Film And Drive Chip Of Flat Panel Display | |
JPH11238214A (en) | Slider working method and device therefor | |
JP2008149238A (en) | Coating device | |
JP2007203258A (en) | Chuck table for base material | |
JP2009123875A (en) | Laser dicing method | |
JP2002224938A (en) | Grinding device and grinding method for plate shape workpiece | |
CN112548450A (en) | Ultrathin sheet fixing device and method | |
KR20160068625A (en) | Method for manufacturing a glass plate, and apparatus for manufacturing a glass plate | |
JPH08203052A (en) | Grinding device for side taper part of magnetic head slider | |
JPH0935228A (en) | Edge working device for magnetic head | |
JPH08203050A (en) | Manufacture of magnetic head slider | |
JP4517348B2 (en) | Dicing apparatus and dicing method | |
KR200325972Y1 (en) | Bonding Equipment For Bonding Anisotropic Conductive Film And Drive Chip Of Flat Panel Display | |
JP2707831B2 (en) | Method for manufacturing semiconductor device | |
JP2016108168A (en) | Scribing tool and scribing device | |
JPH0355124Y2 (en) | ||
JPH11216623A (en) | Regulation device | |
JP2008501945A (en) | Laser interferometer mirror assembly |