JPH09866A - Process and device for treatment of exhaust gas - Google Patents

Process and device for treatment of exhaust gas

Info

Publication number
JPH09866A
JPH09866A JP7176696A JP17669695A JPH09866A JP H09866 A JPH09866 A JP H09866A JP 7176696 A JP7176696 A JP 7176696A JP 17669695 A JP17669695 A JP 17669695A JP H09866 A JPH09866 A JP H09866A
Authority
JP
Japan
Prior art keywords
exhaust gas
chamber
liquid
cleaning liquid
gas cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7176696A
Other languages
Japanese (ja)
Inventor
Hiromi Koshizuka
博美 腰塚
Kazuya Kumagai
和也 熊谷
Hisao Ido
久雄 井土
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chiyoda Corp
Chiyoda Chemical Engineering and Construction Co Ltd
Original Assignee
Chiyoda Corp
Chiyoda Chemical Engineering and Construction Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chiyoda Corp, Chiyoda Chemical Engineering and Construction Co Ltd filed Critical Chiyoda Corp
Priority to JP7176696A priority Critical patent/JPH09866A/en
Publication of JPH09866A publication Critical patent/JPH09866A/en
Pending legal-status Critical Current

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  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Separation Of Particles Using Liquids (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)

Abstract

PURPOSE: To provide a process in which the use of a wet electric dust collector is not required in the constitution of the treatment process and a device thereof for exhaust gas containing dust and sulfur dioxide. CONSTITUTION: Exhaust gas is introduced into a cooling dust removing column 31, brought into contact with atomized droplet particles, and then extracted therefrom, and fed into a second chamber of a closed tank divided into a first chamber 5, the second chamber 6 and a third chamber 7 by a first interstructure 2 and a second interstructure 3, and blown into absorption fluid in the first chamber through an exhaust gas dispersion tube 9. The exhaust gas in the upper section is raised inside an exhaust gas rising cylinder 10, and the rising exhaust gas is made to collide with an exhaust gas collision plate 26, from the end of which exhaust gas cleaning fluid is flowed down in the liquid curtain shape, and brought into contact with the exhaust gas fluid curtain to be exhausted out of an exhaust gas outlet 11, and introduced into a mist eliminator 12 to remove the droplets in the exhaust gas, and then exhausted into atmosphere. The exhaust gas cleaning fluid on the second interstructure is introduced into an exhaust gas cleaning fluid tank 31 and stored therein, and then fed to a dispersion mechanism of the exhaust gas collision plate, and a part of the cleaning fluid to be fed is introduced into a solid-liquid separation device 33, and the cleaning fluid thus provided is stored in a clean exhaust gas cleaning fluid tank 32, and transferred to the exhaust gas cleaning fluid tank 32.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、粉塵と亜硫酸ガスを含
む排ガスの処理方法及び装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for treating exhaust gas containing dust and sulfurous acid gas.

【0002】[0002]

【従来の技術】従来、粉塵と亜硫酸ガスを含む排ガスを
冷却除塵塔に導入し、ここで排ガスを冷却除塵した後、
脱硫装置に導入して脱硫処理し、次いで脱硫処理された
排ガスをミストエリミネータに導入し、ここで排ガス中
の液滴粒子(ミスト)を除去した後、湿式電気集塵装置
に導入し、ここで排ガス中に残存する粉塵を除去した
後、排ガス排出筒を介して大気へ放出する排ガスの処理
方法は広く行われている。
2. Description of the Related Art Conventionally, an exhaust gas containing dust and sulfurous acid gas is introduced into a cooling dust removal tower, where the exhaust gas is cooled and dust removed,
It is introduced into a desulfurization device for desulfurization treatment, then the desulfurized exhaust gas is introduced into a mist eliminator, where droplet particles (mist) in the exhaust gas are removed, and then introduced into a wet electrostatic precipitator, where A method of treating exhaust gas released to the atmosphere through an exhaust gas exhaust pipe after removing dust remaining in the exhaust gas is widely used.

【0003】ところで、このような排ガスの処理方法に
おいては、排ガス中に含まれる粉塵を除去するために、
前記したように、湿式電気集塵装置が用いられている
が、このものは、大規模の装置であり、その装置コスト
は非常に高く、しかもその設置面積も広いことから、排
ガス処理コストを上昇させる大きな要因の1つになって
いる。従って、このような湿式電気集塵装置は、可能で
あれば、その配設を省略することが望ましいものである
が、大気へ放出させる排ガス中の粉塵濃度規制は年々厳
しくなってきており、この点から、前記湿式電気集塵装
置の配設は余儀ないものとされていた。
By the way, in such an exhaust gas treatment method, in order to remove dust contained in the exhaust gas,
As described above, the wet electrostatic precipitator is used, but this is a large-scale device, its cost is very high, and its installation area is wide. It has become one of the major factors that cause it. Therefore, it is desirable to omit the installation of such a wet electrostatic precipitator if possible, but the dust concentration regulation in the exhaust gas discharged to the atmosphere is becoming stricter year by year. From the point of view, the wet electrostatic precipitator must be arranged.

【0004】[0004]

【発明が解決しようとする課題】本発明は、粉塵と亜硫
酸ガスを含む排ガスの処理方法及び装置において、湿式
電気集塵装置の使用を必要としない方法及び装置を提供
することをその課題とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a method and apparatus for treating exhaust gas containing dust and sulfurous acid gas, which method does not require the use of a wet electrostatic precipitator. .

【0005】[0005]

【課題を解決するための手段】本発明者らは、前記課題
を解決すべく鋭意研究を重ねた結果、本発明を完成する
に至った。即ち、本発明によれば、粉塵と亜硫酸ガスを
含む排ガスを処理する方法において、(i)排ガスを冷
却除塵塔に導入し、噴霧状液滴粒子と接触させた後、そ
の冷却除塵塔から抜出すこと、(ii)冷却除塵塔から抜
出された排ガスを、第1隔板とその上方に位置する第2
隔板とによってその内部が第1室と第1室の上方に隣接
する第2室と第2室の上方に隣接する第3室とに区画さ
れた密閉槽におけるその第2室に供給すること、(iii)
第2室に供給された排ガスを第1隔板に形成された透孔
に垂設された肺ガス分散管を通して第1室に収容されて
いる吸収液中に吹込むこと、(iv)第1室の上部空間に
存在する排ガスを第1室と第3室との間を連絡し、その
上端が第2隔板表面より上方に位置する排ガス上昇筒内
を上昇させること、(v)排ガス上昇筒を通して第3室
に上昇してきた排ガスをその排ガス上昇筒の上方に配設
されている液体流下壁と液分散機構を有し、その液体流
下壁の先端から排ガス洗浄液が液幕状に流下している排
ガス衝突板に衝突させるとともに、排ガスをその液幕と
接触させること、(vi)第3室内において前記液幕と接
触させた後の排ガスを第3室に配設された排ガス出口か
ら排出させること、(vii)第3室から排出された後の排
ガスをミストエリミネータに導入し、排ガス中に含まれ
る液滴粒子を除去した後、ミストエリミネータから抜出
すこと、(viii)ミストエリミネータから抜出した排ガ
スを湿式電気集塵処理することなく大気中へ放出させる
こと、(ix)密閉槽内の第2隔板上に滞留する排ガス洗
浄液を密閉槽外へ抜出し、排ガス洗浄液槽に導入し、貯
留すること、(x)排ガス洗浄液槽に貯留された排ガス
洗浄液を排ガス衝突板に配設した液分散機構に供給する
こと、(xi)排ガス衝突板に供給する排ガス洗浄液の一
部を固液分離装置に導入すること、(xii)固液分離装置
で得られた清澄排ガス洗浄液を清澄排ガス洗浄液槽に貯
留すること、(xiii)清澄排ガス洗浄液槽の貯留液を排
ガス洗浄液槽に移送すること、を特徴とする排ガスの処
理方法が提供される。
Means for Solving the Problems The present inventors have conducted intensive studies to solve the above-mentioned problems, and as a result, have completed the present invention. That is, according to the present invention, in the method for treating an exhaust gas containing dust and sulfurous acid gas, (i) the exhaust gas is introduced into a cooling dust removing tower, brought into contact with atomized droplet particles, and then discharged from the cooling dust removing tower. (Ii) The exhaust gas extracted from the cooling dust removal tower is supplied to the first partition plate and the second partition plate located above the first partition plate.
Supplying to the second chamber in the sealed tank, the interior of which is partitioned by the partition plate into a first chamber, a second chamber adjacent above the first chamber, and a third chamber adjacent above the second chamber. , (Iii)
Blowing the exhaust gas supplied to the second chamber into the absorbent contained in the first chamber through a lung gas dispersion pipe vertically provided in a through hole formed in the first partition plate, (iv) first Connecting the exhaust gas existing in the upper space of the chamber between the first chamber and the third chamber, and raising the upper end of the exhaust gas rising cylinder located above the surface of the second partition plate; (v) rising exhaust gas The exhaust gas rising through the cylinder to the third chamber has a liquid flow-down wall and a liquid dispersion mechanism arranged above the exhaust gas flow-up cylinder, and the exhaust gas cleaning liquid flows down like a liquid curtain from the tip of the liquid flow-down wall. The exhaust gas impinging plate that is in contact with the liquid curtain, and (vi) exhausting the exhaust gas after contacting the liquid curtain in the third chamber from the exhaust gas outlet arranged in the third chamber. (Vii) Mist emission of the exhaust gas after being discharged from the third chamber After being introduced into the exhaust gas and removing the droplet particles contained in the exhaust gas, it is extracted from the mist eliminator, and (viii) The exhaust gas extracted from the mist eliminator is released into the atmosphere without wet electrostatic precipitating treatment. , (Ix) Extracting the exhaust gas cleaning liquid staying on the second partition plate in the closed tank out of the closed tank, introducing it into the exhaust gas cleaning liquid tank, and storing it (x) exhaust gas cleaning liquid stored in the exhaust gas cleaning liquid tank Supplying to the liquid dispersion mechanism arranged on the collision plate, (xi) introducing part of the exhaust gas cleaning liquid supplied to the exhaust gas collision plate into the solid-liquid separation device, (xii) clarification obtained by the solid-liquid separation device Provided is a method for treating exhaust gas, which comprises storing the exhaust gas cleaning liquid in a clear exhaust gas cleaning liquid tank, and (xiii) transferring the stored liquid in the clear exhaust gas cleaning liquid tank to the exhaust gas cleaning liquid tank.

【0006】また、本発明によれば、排ガスを冷却除塵
する排ガス冷却除塵塔と、冷却除塵塔からの排ガスを脱
硫するための脱硫装置と、脱硫装置から排出された排ガ
ス中の液滴粒子を除去するためのミストエリミネータ
と、ミストエリミネータからの排ガスを大気中へ放出さ
せる排ガス排出筒を備えたものであって、前記脱硫装置
は、第1隔板とその上方に位置する第2隔板とによって
その内部が第1室と第1室の上方に隣接する第2室と第
2室の上方に隣接する第3室とに区画された密閉槽と、
第2室の周壁に形成された排ガス入口と、第3室に配設
された排ガス出口と、第1隔板に形成された透孔と、そ
の透孔に垂設された排ガス分散管と、第1室と第3室と
を連絡し、その上端が第2隔板表面より上方に位置する
排ガス上昇筒と、排ガス上昇筒の上方に配設され、液体
流下壁とその液体流下壁に排ガス洗浄液を供給する液分
散機構を有する排ガス衝突板と、第2隔板上に滞留する
排ガス洗浄液を排ガス洗浄液槽に移送させる排ガス洗浄
液抜出し配管と、排ガス洗浄液槽の貯留液を排ガス衝突
板に配設されている液分散機構に供給する排ガス洗浄液
供給配管と、排ガス洗浄液供給配管を流通する排ガス洗
浄液の一部を引出し、固液分離装置に移送させる排ガス
洗浄液引出し配管と、この排ガス洗浄液引出し配管を通
って引出された排ガス洗浄液を固液分離する固液分離装
置と、固液分離装置で得られた清澄排ガス洗浄液を貯留
する清澄排ガス洗浄液槽と、清澄排ガス洗浄液槽の貯留
液を排ガス洗浄液槽に移送させる配管を備えたものであ
ることを特徴とする排ガス処理装置が提供される。
Further, according to the present invention, an exhaust gas cooling dust removing tower for cooling and removing the exhaust gas, a desulfurization device for desulfurizing the exhaust gas from the cooling dust removing tower, and droplet particles in the exhaust gas discharged from the desulfurization device A mist eliminator for removing, and an exhaust gas discharge tube for discharging exhaust gas from the mist eliminator into the atmosphere, wherein the desulfurization device includes a first partition plate and a second partition plate located above the first partition plate. A closed chamber whose interior is divided into a first chamber, a second chamber adjacent above the first chamber, and a third chamber adjacent above the second chamber,
An exhaust gas inlet formed in the peripheral wall of the second chamber, an exhaust gas outlet arranged in the third chamber, a through hole formed in the first partition plate, and an exhaust gas dispersion pipe vertically provided in the through hole, The exhaust gas rising cylinder, which communicates the first chamber and the third chamber and whose upper end is located above the surface of the second partition plate, is disposed above the exhaust gas rising cylinder, and the exhaust gas is provided on the liquid falling wall and the liquid falling wall. An exhaust gas collision plate having a liquid dispersion mechanism for supplying the cleaning liquid, an exhaust gas cleaning liquid discharge pipe for transferring the exhaust gas cleaning liquid staying on the second partition plate to the exhaust gas cleaning liquid tank, and a stored liquid of the exhaust gas cleaning liquid tank are arranged on the exhaust gas collision plate. The exhaust gas cleaning liquid supply pipe to be supplied to the liquid dispersion mechanism and the exhaust gas cleaning liquid withdrawal pipe for withdrawing a part of the exhaust gas cleaning liquid flowing through the exhaust gas cleaning liquid supply pipe and transferring it to the solid-liquid separation device and the exhaust gas cleaning liquid withdrawal pipe. Drawn out A solid-liquid separator for solid-liquid separation of the cleaning liquid, a clarified exhaust gas cleaning liquid tank for storing the clarified exhaust gas cleaning liquid obtained by the solid-liquid separator, and a pipe for transferring the liquid stored in the clarified exhaust gas cleaning liquid tank to the exhaust gas cleaning liquid tank An exhaust gas treatment device is provided.

【0007】次に、本発明を図面を参照して説明する。
図1は、本発明の排ガスの処理装置の模式図を示す。こ
の図において、1は排ガス脱硫装置、1’は密閉槽、2
は第1隔板、3は第2隔板、4は天板、5は第1室、6
は第2室、7は第3室、8は排ガス導入ダクト、9は排
ガス分散管、10は排ガス上昇筒、11は排ガス導出ダ
クト、12はミストエリミネータ、13は排ガス排出
筒、14は排ガス洗浄液抜出し管、15は排ガス衝突
板、16は液分散板、17、34、36、38、39は
排ガス洗浄液供給管、21は冷却除塵塔、21’は密閉
筒体、22は排ガス導入ダクト、23は排ガス冷却液抜
出し管、25は排ガス冷却液供給管、26は排ガス冷却
液スプレーノズル、28は排ガスダクト、29はミスト
エリミネータ、31は排ガス洗浄液槽、32は清澄排ガ
ス洗浄液槽、33は固液分離装置、37、40は排ガス
洗浄液引出し管、41は清澄排ガス洗浄液移送管、4
2、43、46は清澄排ガス洗浄液供給管、50、5
1、52は液面調節計、53は流量計、L1は吸収液、
2は排ガス洗浄液、L3は排ガス冷却液を各示す。
Next, the present invention will be described with reference to the drawings.
FIG. 1 shows a schematic diagram of an exhaust gas treating apparatus of the present invention. In this figure, 1 is an exhaust gas desulfurization apparatus, 1'is a closed tank, 2
Is a first partition plate, 3 is a second partition plate, 4 is a top plate, 5 is a first chamber, 6
Is a second chamber, 7 is a third chamber, 8 is an exhaust gas introduction duct, 9 is an exhaust gas dispersion pipe, 10 is an exhaust gas rising pipe, 11 is an exhaust gas discharge duct, 12 is a mist eliminator, 13 is an exhaust gas exhaust pipe, and 14 is an exhaust gas cleaning liquid. Extraction pipe, 15 is an exhaust gas collision plate, 16 is a liquid dispersion plate, 17, 34, 36, 38, 39 are exhaust gas cleaning liquid supply pipes, 21 is a cooling dust removing tower, 21 'is a closed cylindrical body, 22 is an exhaust gas introduction duct, 23 Is an exhaust gas cooling liquid discharge pipe, 25 is an exhaust gas cooling liquid supply pipe, 26 is an exhaust gas cooling liquid spray nozzle, 28 is an exhaust gas duct, 29 is a mist eliminator, 31 is an exhaust gas cleaning liquid tank, 32 is a clear exhaust gas cleaning liquid tank, and 33 is a solid liquid. Separators, 37, 40 are exhaust gas cleaning liquid draw-out pipes, 41 are clear exhaust gas cleaning liquid transfer pipes, 4
2, 43 and 46 are clarified exhaust gas cleaning liquid supply pipes, 50 and 5
1, 52 are liquid level controllers, 53 is a flow meter, L 1 is an absorbing liquid,
L 2 is an exhaust gas cleaning liquid, and L 3 is an exhaust gas cooling liquid.

【0008】図1に示す排ガス脱硫装置1は、大型の密
閉槽1’から構成され、その槽の内部は、第1隔板2及
びその上方に位置する第2隔板3によって第1室5と第
1室の上方に隣接する第2室6と第2室の上方に隣接す
る第3室7とに区画されている。第3室の上部空間は天
板4によって密閉されている。第1隔板2は水平又はや
や傾斜したものであることができる。第2隔板3は水平
又は傾斜したものであることができ、その傾斜角は特に
制約されない。第1室5の内部には、吸収液L1が収容
されている。また、第1室には、撹拌機や、吸収液L1
中に酸素を供給する必要がある場合に用いられる酸素含
有ガス噴出ノズル等(図示されず)が配設されている。
第2室6の周壁には排ガス入口が配設され、この入口に
は排ガス導入ダクト8が連結されている。第2室の空間
には特別の装置の配設は特に必要とはされないが、必要
に応じ、吸収液をスプレーするためのスプレーノズル
(図示されず)を配設することもできる。第3室7の上
方に配設された天板4には、排ガス出口が配設され、こ
の出口には排ガス導出ダクト11が連結されている。ま
た、この排ガス導出ダクト11には、ミストエリミネー
タ12を介して排ガス排出筒13が連結されている。排
ガス出口は周壁に配設することができる。密閉槽1’の
外部には、第3室7の床面を構成する第2隔板3上に滞
留する排ガス洗浄液L2を、第3室の排ガス衝突板15
に配設した液分散機構に循環させるための循環ラインが
配設されている。この循環ラインは、洗浄液抜出し管1
4、洗浄液槽31、循環ポンプ35及び洗浄液供給管3
4、35、38、17からなる。
The exhaust gas desulfurization apparatus 1 shown in FIG. 1 is composed of a large closed tank 1 ', and the inside of the tank is composed of a first partition plate 2 and a second partition plate 3 located above the first partition plate 5'. And a second chamber 6 adjacent above the first chamber and a third chamber 7 adjacent above the second chamber. The upper space of the third chamber is sealed by the top plate 4. The first partition plate 2 may be horizontal or slightly inclined. The second partition plate 3 may be horizontal or inclined, and its inclination angle is not particularly limited. The absorbing liquid L 1 is contained inside the first chamber 5. In addition, the first chamber has a stirrer and an absorbing liquid L 1
An oxygen-containing gas jet nozzle or the like (not shown) used when it is necessary to supply oxygen therein is provided.
An exhaust gas inlet is arranged on the peripheral wall of the second chamber 6, and an exhaust gas introducing duct 8 is connected to this inlet. A special device is not particularly required to be provided in the space of the second chamber, but a spray nozzle (not shown) for spraying the absorbing liquid can be provided if necessary. An exhaust gas outlet is arranged on the top plate 4 arranged above the third chamber 7, and an exhaust gas discharge duct 11 is connected to this outlet. Further, an exhaust gas discharge tube 13 is connected to the exhaust gas discharge duct 11 via a mist eliminator 12. The exhaust gas outlet can be arranged on the peripheral wall. Outside the closed tank 1 ′, the exhaust gas cleaning liquid L 2 staying on the second partition plate 3 forming the floor surface of the third chamber 7 is discharged into the exhaust gas collision plate 15 in the third chamber.
A circulation line is provided to circulate the liquid in the liquid dispersion mechanism. This circulation line is for the cleaning liquid extraction pipe 1
4, cleaning liquid tank 31, circulation pump 35, and cleaning liquid supply pipe 3
It consists of 4, 35, 38 and 17.

【0009】第1隔板2には、第1室5と第2室6との
間を連絡する透孔が多数配設され、各透孔にはその先端
が第1室の吸収液L1中に延びる排ガス分散管9が垂設
されている。また、第1隔板2及び第2隔板3には、排
ガス上昇筒10を配設するための開口が配設され、これ
らの開口には、第1室5の上部空間に存在する排ガスを
第3室7に導入させるための排ガス上昇筒10が連結さ
れている。この場合、排ガス上昇筒10の上端は第2隔
板の表面より上方に突出し、第2隔板上の洗浄液が第2
隔板上に一定量滞留するようになっている。排ガス上昇
筒の横断面形状は、円形や正方形、長方形等の各種の形
状であることができる。排ガス上昇筒10の上方には、
排ガス衝突板15が配設されている。
The first partition plate 2 is provided with a large number of through holes that connect the first chamber 5 and the second chamber 6, and the tip of each through hole is the absorbing liquid L 1 of the first chamber. An exhaust gas dispersion pipe 9 extending inside is vertically provided. Further, the first partition plate 2 and the second partition plate 3 are provided with openings for arranging the exhaust gas rising cylinder 10, and the exhaust gas existing in the upper space of the first chamber 5 is provided in these openings. An exhaust gas rising cylinder 10 for introducing into the third chamber 7 is connected. In this case, the upper end of the exhaust gas rising cylinder 10 protrudes above the surface of the second partition plate, and the cleaning liquid on the second partition plate becomes second.
A certain amount is retained on the partition plate. The cross-sectional shape of the exhaust gas rising cylinder can be various shapes such as a circle, a square, and a rectangle. Above the exhaust gas rising cylinder 10,
An exhaust gas collision plate 15 is arranged.

【0010】本発明で用いる排ガス衝突板15は、液体
流下壁とその液体流下壁に洗浄液を供給する液分散機構
を有するものである。この衝突板は、排ガス上昇筒10
を上昇してきた排ガスをその下面で受け、排ガス中に含
まれる液滴粒子をその下面に液膜として形成させる作用
を有する。また、この衝突板は、液体流下壁とその液体
流下壁に洗浄液を供給する液分散機構を有し、その液体
流下壁の先端から洗浄液を液幕状に流下させる作用を有
する。
The exhaust gas collision plate 15 used in the present invention has a liquid flow-down wall and a liquid dispersion mechanism for supplying a cleaning liquid to the liquid flow-down wall. This collision plate is used for the exhaust gas rising cylinder 10
Has the effect of receiving the rising exhaust gas on its lower surface and forming droplet particles contained in the exhaust gas as a liquid film on its lower surface. Further, this collision plate has a liquid flow-down wall and a liquid dispersion mechanism for supplying the cleaning liquid to the liquid flow-down wall, and has an action of causing the cleaning liquid to flow down like a liquid curtain from the tip of the liquid flow-down wall.

【0011】排ガス衝突板15の全体形状は特に制約さ
れないが、一般的には、中央部が排ガス衝突面に形成さ
れ、その周縁に液体流下壁を有する下端開口した中空構
造物からなる。排ガス衝突面は平面や曲面、凹凸面等の
種々の面であることができる。液体流下壁面は、液体が
その面に沿って流下し、その先端から下方に流下し得る
面であればよく、平面や曲面、凹凸面等であることがで
きる。液体流下壁を有する衝突板の形状例を示すと、箱
状、中空半球状の他、周縁部よりも中央部が上方に突出
した形状、例えば陣笠形状等であることができる。
The overall shape of the exhaust gas impingement plate 15 is not particularly limited, but is generally a hollow structure having a central portion formed on the exhaust gas impingement surface and a liquid flow-down wall on the periphery thereof, the lower end opening. The exhaust gas collision surface can be various surfaces such as a flat surface, a curved surface, and an uneven surface. The liquid flow-down wall surface may be any surface as long as the liquid flows down along the surface and can flow down from the tip thereof, and may be a flat surface, a curved surface, an uneven surface, or the like. Examples of the shape of the collision plate having the liquid flow-down wall include a box shape, a hollow hemispherical shape, and a shape in which the central portion projects upward from the peripheral edge portion, for example, a hat shape.

【0012】本発明では、前記排ガス衝突板に対して、
液分散機構を配設する。図2に液分散機構を配設した衝
突板の1つの例について示す。図2において、15は衝
突板を示し、このものは排ガス衝突部Aと、その周縁に
形成された液体流下壁Bから構成される。また、衝突板
に配設された液分散機構は、衝突板の液体流下壁に洗浄
液を供給するもので、衝突板の中央部下方に開口する液
体供給管17と、その液体供給管の開口部を包囲する短
筒20と、その短筒の先端開口に配設した液分散板16
から構成される。液分散板16としては、液体を放射状
に噴出又は流出させる構造のものであればよい。図3及
び図4に液分散板の斜視図を示す。
In the present invention, for the exhaust gas collision plate,
A liquid dispersion mechanism is provided. FIG. 2 shows an example of a collision plate provided with a liquid dispersion mechanism. In FIG. 2, reference numeral 15 denotes a collision plate, which is composed of an exhaust gas collision portion A and a liquid flow-down wall B formed on the periphery thereof. The liquid dispersion mechanism arranged on the collision plate supplies the cleaning liquid to the liquid flow-down wall of the collision plate. The liquid supply pipe 17 opens below the central portion of the collision plate and the opening of the liquid supply pipe. And a liquid dispersion plate 16 disposed at the tip opening of the short cylinder 20 that surrounds the short cylinder 20.
Consists of The liquid dispersion plate 16 may have a structure that ejects or flows out the liquid radially. 3 and 4 are perspective views of the liquid dispersion plate.

【0013】図2に示した液分散機構を有する排ガス衝
突板15に対し、その液体供給管17を通して排ガス洗
浄液を供給すると、その洗浄液は矢印aの方向に噴出又
は流出され、衝突板15の液体流下壁Bの内面に受止さ
れ、その内面を下方に流下し、その液体流下壁先端から
矢印b方向に液幕状で流下する。排ガス上昇筒を上昇し
てきた排ガスは、衝突板15の衝突部Aの下面に衝突
し、その流路を液体流下壁Bに案内されて下方向に変更
し、その液体流下壁先端から下方に向けて形成されてい
る洗浄液の液幕を通過するとともに、その通過に際して
液幕と接触する。そして、排ガス中の粉塵はこの液幕と
の接触により排ガス中から除去される。
When the exhaust gas cleaning liquid is supplied through the liquid supply pipe 17 to the exhaust gas collision plate 15 having the liquid dispersion mechanism shown in FIG. 2, the cleaning liquid is jetted or discharged in the direction of arrow a, and the liquid of the collision plate 15 is discharged. It is received on the inner surface of the falling wall B, flows down on the inner surface, and flows down from the tip of the liquid falling wall in the direction of arrow b in a liquid curtain shape. The exhaust gas that has risen in the exhaust gas riser collides with the lower surface of the collision portion A of the collision plate 15, and its flow path is guided by the liquid flow-down wall B to change downward, and is directed downward from the tip of the liquid flow-down wall. The cleaning liquid thus formed passes through the liquid curtain, and comes into contact with the liquid curtain during the passage. Then, the dust in the exhaust gas is removed from the exhaust gas by contact with the liquid curtain.

【0014】排ガス脱硫装置1に対しては、その上流側
に、冷却除塵塔21を配設する。この冷却除塵塔21
は、密閉筒体21’と、その天板に連結された排ガス導
入ダクト22と、密閉筒体の周壁に形成された排ガス導
出口と、密閉筒体の底部に収容された排ガス冷却液L3
を密閉筒体の上部に供給する冷却液循環ラインと、冷却
液L3をスプレーさせるスプレーノズル26から構成さ
れる。また、冷却液循環ラインは、冷却液抜出し管23
と循環ポンプ24と冷却液供給管25から構成される。
A cooling dust removing tower 21 is arranged upstream of the exhaust gas desulfurization apparatus 1. This cooling dust removal tower 21
Is a closed cylindrical body 21 ', an exhaust gas introduction duct 22 connected to the top plate thereof, an exhaust gas outlet formed on the peripheral wall of the closed cylindrical body, and an exhaust gas cooling liquid L 3 stored in the bottom of the closed cylindrical body.
A coolant circulation line for supplying the upper part of the sealed tubular body, and the cooling liquid L 3 from the spray nozzles 26 for spraying. Further, the cooling liquid circulation line is provided with the cooling liquid drain pipe 23.
And a circulation pump 24 and a cooling liquid supply pipe 25.

【0015】図1に示した装置系を用いて排ガスを処理
するには、排ガスを排ガス導入ダクト22を介して冷却
除塵塔21内に導入する。冷却除塵塔21では、冷却液
3が冷却液抜出し管23、循環ポンプ24及び冷却液
供給管25を通してスプレーノズル26からスプレーさ
れており、冷却除塵塔21内に導入された排ガスは、こ
のスプレーされた冷却液粒子と接触し、排ガスの除塵と
ともに、排ガスの冷却増湿が行われる。冷却液供給管2
5を流通する冷却液の一部は冷却液抜出し管27を通っ
て抜出され、それに応じて補給用冷却液が冷却液補給管
27’を通して供給される。冷却液としては、水や、吸
収液、アルカリ性水溶液等が用いられる。冷却除塵21
に供給する排ガス中の粉塵濃度は、通常、30〜150
mg/Nm3、SO2濃度は、300〜800ppmであ
る。
To treat the exhaust gas using the system shown in FIG. 1, the exhaust gas is introduced into the cooling dust removal tower 21 through the exhaust gas introduction duct 22. In the cooling dust removing tower 21, the cooling liquid L 3 is sprayed from the spray nozzle 26 through the cooling liquid extracting pipe 23, the circulation pump 24 and the cooling liquid supply pipe 25, and the exhaust gas introduced into the cooling dust removing tower 21 is sprayed by this spray. The exhaust gas is contacted with the generated cooling liquid particles, dust is removed from the exhaust gas, and the exhaust gas is cooled and humidified. Coolant supply pipe 2
A part of the cooling liquid flowing through 5 is withdrawn through the cooling liquid withdrawal pipe 27, and accordingly, the replenishing cooling liquid is supplied through the cooling liquid replenishment pipe 27 '. As the cooling liquid, water, an absorbing liquid, an alkaline aqueous solution or the like is used. Cooling dust removal 21
The dust concentration in the exhaust gas supplied to the
The concentration of mg / Nm 3 and SO 2 is 300 to 800 ppm.

【0016】冷却除塵塔21で処理された排ガスは、そ
の冷却除塵塔21に連結された排ガスダクト28、ミス
トエリミネータ29、排ガス導入ダクト8を介して、排
ガス脱硫装置の密閉槽の第2室6内に導入され、ここか
ら排ガス分散管9を介して第1室5内の吸収液L1中に
吹込まれる。吸収液L1中に吹込まれた排ガスは気泡と
なって上昇し、その分散管のガス噴出孔より上方には気
泡と吸収液との混合相からなるフロス層が形成される。
排ガスが吸収液中を気泡として上昇する間に排ガス中に
含まれている粉塵や亜硫酸ガス等の汚染物質は吸収液に
捕捉され、排ガス中から除去される。脱硫装置1に導入
される排ガス中の粉塵濃度は、通常、150mg/Nm
3以下、好ましくは100mg/Nm3以下である。この
ようにして浄化された排ガスは、フロス層から上部空間
に放散され、ここから排ガス上昇筒10を通って第3室
7に導入される。この第3室内には、液体流下壁と液分
散機構を有する衝突板が配設され、その液分散機構に
は、その床面を形成する第2隔板3の上面に滞留する排
ガス洗浄液L2を抜出すための洗浄液抜出し管14、洗
浄液槽31、ポンプ35、洗浄液供給管34、38及び
17を通って循環される洗浄液が供給され、その衝突板
15の液体流下壁の先端から洗浄液が液幕状に流下して
いる。衝突板15の下面に衝突した排ガスは、この洗浄
液の流下液幕を通過するが、その際、洗浄液の流下液幕
と接触し、排ガス中に残存している粉塵がこの液幕に捕
捉され、排ガス中から除去される。
The exhaust gas treated in the cooling dust removal tower 21 is passed through the exhaust gas duct 28, the mist eliminator 29, and the exhaust gas introduction duct 8 connected to the cooling dust removal tower 21 to the second chamber 6 of the closed tank of the exhaust gas desulfurization apparatus. Is introduced into the first chamber 5 and blown into the absorbent L 1 in the first chamber 5 through the exhaust gas dispersion pipe 9. The exhaust gas blown into the absorbing liquid L 1 rises as bubbles, and a floss layer composed of a mixed phase of bubbles and absorbing liquid is formed above the gas ejection holes of the dispersion pipe.
While the exhaust gas rises as bubbles in the absorption liquid, contaminants such as dust and sulfur dioxide contained in the exhaust gas are captured by the absorption liquid and removed from the exhaust gas. The dust concentration in the exhaust gas introduced into the desulfurization device 1 is usually 150 mg / Nm.
It is 3 or less, preferably 100 mg / Nm 3 or less. The exhaust gas purified in this way is diffused from the floss layer to the upper space, and then introduced into the third chamber 7 through the exhaust gas rising cylinder 10. A collision plate having a liquid flow-down wall and a liquid dispersion mechanism is arranged in the third chamber, and the liquid dispersion mechanism has an exhaust gas cleaning liquid L 2 staying on the upper surface of the second partition plate 3 forming the floor surface thereof. The cleaning liquid is circulated through the cleaning liquid extraction pipe 14, the cleaning liquid tank 31, the pump 35, and the cleaning liquid supply pipes 34, 38, and 17 for discharging the cleaning liquid, and the cleaning liquid is discharged from the tip of the liquid flow-down wall of the collision plate 15. It is flowing like a curtain. The exhaust gas that has collided with the lower surface of the collision plate 15 passes through the falling liquid curtain of the cleaning liquid, but at that time, the exhaust gas comes into contact with the falling liquid curtain of the cleaning liquid, and the dust remaining in the exhaust gas is captured by the liquid curtain. It is removed from the exhaust gas.

【0017】第3室内の排ガスは第3室の上方に配設さ
れた天板4の開口部に連結された排ガス導出ダクト11
を通って槽外へ抜出され、ミストエリミネータ12に導
入され、ここでそのガス中に含まれていた吸収液粒子等
が除去された後、必要に応じ加熱器(図示されず)に入
り、ここでガス中に残存するミストが気化された後、排
ガス排出筒13を通って大気へ放出される。
The exhaust gas in the third chamber is an exhaust gas discharge duct 11 connected to the opening of the top plate 4 arranged above the third chamber.
Through the mist eliminator 12 to remove the absorbing liquid particles and the like contained in the gas, and then enter a heater (not shown) if necessary, Here, after the mist remaining in the gas is vaporized, it is discharged to the atmosphere through the exhaust gas discharge cylinder 13.

【0018】衝突板15の液体流下壁先端から液幕状で
流下した洗浄液は、第2隔板3の上面に落下滞留し、こ
こから洗浄液抜出し管14を通って洗浄液槽31へ返送
される。
The cleaning liquid that has flowed down in the form of a liquid curtain from the tip of the liquid flow-down wall of the collision plate 15 drops and stays on the upper surface of the second partition plate 3 and is returned from here to the cleaning liquid tank 31 through the cleaning liquid discharge pipe 14.

【0019】排ガス分散管9としては、下端部の周壁面
にガス噴出孔を有するものや、下端がノズル構造に形成
されたもの等の各種のものを用いることができる。図5
に下端部の周壁面にガス噴出孔を有するガス分散管の斜
視図を示す。図5において、9はガス分散管を示し、5
5はその下端部周壁面に形成されたガス噴出孔を示す。
As the exhaust gas dispersion pipe 9, various types can be used, such as one having a gas ejection hole on the peripheral wall surface at the lower end, one having a nozzle structure at the lower end, and the like. FIG.
The perspective view of the gas dispersion pipe which has a gas ejection hole in the peripheral wall surface of a lower end part is shown in FIG. In FIG. 5, 9 indicates a gas dispersion pipe, and 5
Reference numeral 5 denotes a gas ejection hole formed on the peripheral wall surface of the lower end portion.

【0020】排ガス洗浄液槽31は、第3室の床面を形
成する第2隔板3の上面から移送された洗浄液L2を一
時的に貯留させる貯槽としての作用とともに、補給用の
洗浄液の受槽としての作用を示す。補給用の洗浄液は、
洗浄液槽31に対し、清澄排ガス洗浄液槽32から配管
42、ポンプ43、配管44、45を通して供給され
る。
The exhaust gas cleaning liquid tank 31 acts as a storage tank for temporarily storing the cleaning liquid L 2 transferred from the upper surface of the second partition plate 3 forming the floor surface of the third chamber, and also receives the replenishing cleaning liquid tank. Shows the action as. The cleaning solution for replenishment is
The cleaning liquid tank 31 is supplied from the clarified exhaust gas cleaning liquid tank 32 through a pipe 42, a pump 43, and pipes 44, 45.

【0021】衝突板15に付設された液分散機構やスプ
レーノズル18に循環される洗浄液の一部は、これを循
環ライン、例えば、洗浄液抜出し管14や、洗浄液供給
管36から抜出し、系外へ排出させることができるが、
好ましくは図1に示すように、導管37を通って吸収液
1中に導入させる。このような操作により、衝突板の
液分散機構に循環される洗浄液の成分組成を常に所定の
範囲に保持し、洗浄液の排ガス中固形分の除去能力を高
く保持させることができる。
A part of the cleaning liquid circulated in the liquid dispersion mechanism attached to the collision plate 15 or the spray nozzle 18 is withdrawn from the circulation line, for example, the cleaning liquid withdrawing pipe 14 or the cleaning liquid supply pipe 36, and is taken out of the system. Can be discharged,
It is preferably introduced into the absorbent L 1 through conduit 37, as shown in FIG. By such an operation, the component composition of the cleaning liquid circulated in the liquid dispersion mechanism of the collision plate can always be kept within a predetermined range, and the ability of removing the solid content in the exhaust gas of the cleaning liquid can be kept high.

【0022】衝突板15の液体流下壁から液幕状に流下
させる全洗浄液の量は、排ガス上昇筒10から上昇する
標準状態に換算された全排ガス1m3/hr当り、通
常、0.2〜0.8kg/hr好ましくは0.2〜0.
3kg/hrである。このような洗浄液量を衝突板15
の液体流下壁から液幕状に流下させることにより、排ガ
ス上昇筒10を上昇する排ガス中に含まれている粉塵を
効果的に除去することができる。排ガス上昇筒10を上
昇する排ガス中には、冷却除塵塔21に供給される被処
理排ガス中にもともと含まれていた粉塵の他、吸収液L
1に含まれていた石こう等の固体微粒子が含まれるが、
本発明の場合、このような固体微粒子も効果的に除去す
ることができる。
The amount of the total cleaning liquid flown down from the liquid flow-down wall of the collision plate 15 in the form of a liquid curtain is usually 0.2 to about 1 m 3 / hr of the total exhaust gas converted to the standard state rising from the exhaust gas rising cylinder 10. 0.8 kg / hr, preferably 0.2-0.
It is 3 kg / hr. Such an amount of cleaning liquid is applied to the collision plate 15
By flowing the liquid in the form of a liquid curtain from the liquid flow-down wall, it is possible to effectively remove the dust contained in the exhaust gas rising in the exhaust gas rising cylinder 10. In the exhaust gas rising in the exhaust gas rising column 10, in addition to the dust originally contained in the exhaust gas to be treated supplied to the cooling dust removal tower 21, the absorbing liquid L
Solid fine particles such as gypsum contained in 1 are included,
In the case of the present invention, such solid fine particles can be effectively removed.

【0023】再び図1において、排ガス洗浄液槽31か
らポンプ35、洗浄液供給管38を通って排ガス衝突板
15に配設されている液分散機構に供給する洗浄液の一
部は、洗浄液引出し管40を通って固液分離装置33に
導入される。この固液分離装置33は、固体粒子を液中
から分離除去し得る構造のものであればどのようなもの
でもよく、例えば、シックナーや、遠心分離機、濾過機
等であることができる。
Referring again to FIG. 1, part of the cleaning liquid supplied from the exhaust gas cleaning liquid tank 31 through the pump 35 and the cleaning liquid supply pipe 38 to the liquid dispersion mechanism arranged on the exhaust gas collision plate 15 is supplied to the cleaning liquid drawing pipe 40. It is introduced into the solid-liquid separation device 33 through. The solid-liquid separation device 33 may have any structure as long as it can separate and remove solid particles from the liquid, and may be, for example, a thickener, a centrifuge, a filter or the like.

【0024】固液分離装置33で得られた清澄な洗浄液
は、配管41を通って清澄洗浄液槽32に導入され、貯
留される。この清澄洗浄液槽32内の貯留液は、配管4
2、ポンプ43、配管44、配管45を通って、洗浄液
槽31に移送される。
The clear cleaning liquid obtained by the solid-liquid separation device 33 is introduced into the clear cleaning liquid tank 32 through the pipe 41 and stored therein. The liquid stored in the clarification cleaning liquid tank 32 is supplied to the pipe 4
2, it is transferred to the cleaning liquid tank 31 through the pump 43, the pipe 44, and the pipe 45.

【0025】補給用の洗浄液は、補給用洗浄液供給管4
7を通って清澄洗浄液槽32に供給される。
The cleaning liquid for replenishment is supplied by the cleaning liquid supply pipe 4 for replenishment.
It is supplied to the clarification washing liquid tank 32 through 7.

【0026】清澄洗浄液槽32内の貯留液は、固体粒子
を実質上含まない清澄なものであるので、必要に応じ、
冷却除塵塔21で用いられる固体粒子の存在の好ましく
ない冷却液として、配管46から冷却液補給管27’を
通して冷却除塵塔21に対して供給することができる。
また、洗浄液槽31内に貯留された洗浄液は、粉塵を含
むものであるが、その量は極めて微量であることから、
この洗浄液は、必要に応じ、配管39からミストエリミ
ネータ12や、29の洗浄液として用いることもでき
る。
The stored liquid in the clarification cleaning liquid tank 32 is a clear liquid which does not substantially contain solid particles, and therefore, if necessary,
As the cooling liquid which is used in the cooling dust removing tower 21 and is not preferable in the presence of solid particles, it can be supplied to the cooling dust removing tower 21 from the pipe 46 through the cooling liquid supply pipe 27 '.
Further, the cleaning liquid stored in the cleaning liquid tank 31 contains dust, but since the amount thereof is extremely small,
This cleaning liquid can also be used as a cleaning liquid for the mist eliminator 12 or 29 through the pipe 39, if necessary.

【0027】図1に示された液面調節計50は、洗浄液
槽31内の貯留液の液面を一定高さに調節するためのも
ので、流量調節バルブ50’と連動する。液面調節計5
1は、第1室5内の貯留吸収液の液面を一定高さに調節
するためのもので、流量調節バルブ51’と連動する。
液面調節計52は、清澄洗浄液槽32内の貯留液の液面
を一定高さに調節するためのもので、流量調節バルブ5
2’と連動する。流量計53は、配管40を流通する洗
浄液量を調節するためのもので、流量調節バルブ53’
と連動する。
The liquid level controller 50 shown in FIG. 1 is for adjusting the liquid level of the stored liquid in the cleaning liquid tank 31 to a constant height, and works in conjunction with the flow rate control valve 50 '. Liquid level controller 5
Reference numeral 1 is for adjusting the liquid level of the stored absorbent in the first chamber 5 to a constant height, and works in conjunction with the flow rate adjusting valve 51 '.
The liquid level controller 52 is for adjusting the liquid level of the stored liquid in the clarification cleaning liquid tank 32 to a constant height, and the flow rate control valve 5
Works with 2 '. The flow meter 53 is for adjusting the amount of cleaning liquid flowing through the pipe 40, and is a flow rate adjusting valve 53 ′.
Works with

【0028】第1室5で用いる吸収液L1は、亜硫酸ガ
スに反応性を示す各種のものが用いられる。このような
ものとしては、例えば、アルカリ金属化合物、アルカリ
土類金属化合物等のアルカリ性物質を含む溶液やスラリ
ーが用いられ、特に水酸化カルシウムスラリーや、炭酸
カルシウムスラリーが用いられる。また、吸収液として
炭酸カルシウムスラリーや水酸化カルシウムスラリーを
用いる場合、これらのカルシウム化合物は亜硫酸ガスと
反応して亜硫酸カルシウムを形成するが、この場合、吸
収液中に空気や酸素を導入することにより、硫酸カルシ
ウム(石コウ)を得ることができる。
As the absorbing liquid L 1 used in the first chamber 5, various liquids which are reactive with sulfurous acid gas are used. As such a material, for example, a solution or slurry containing an alkaline substance such as an alkali metal compound or an alkaline earth metal compound is used, and particularly, a calcium hydroxide slurry or a calcium carbonate slurry is used. When calcium carbonate slurry or calcium hydroxide slurry is used as the absorbing liquid, these calcium compounds react with sulfurous acid gas to form calcium sulfite. In this case, by introducing air or oxygen into the absorbing liquid. , Calcium sulfate can be obtained.

【0029】排ガス洗浄液としては、液体であればどの
ようなものでも用いることができる。このような洗浄液
は、水、海水等の入手容易な任意の液体を用いることも
できる。特に水の使用は、その液滴粒子が処理した排ガ
ス中に残存しても粉塵とならないので好ましい。
As the exhaust gas cleaning liquid, any liquid can be used as long as it is a liquid. As such a cleaning liquid, any readily available liquid such as water or seawater can be used. In particular, the use of water is preferable because it does not become dust even if the droplet particles remain in the treated exhaust gas.

【0030】[0030]

【実施例】次に本発明を実施例によりさらに詳細に説明
する。 実施例1 図1に示した構造の排ガス処理装置を用いて、粉塵:1
50mg/Nm3、SO2:800volppm、O2
5vol%を含む排煙を冷却除塵塔21で処理した後、
脱硫装置1で処理した。この場合の脱硫装置条件を示す
と次の通りである。 (1)密閉槽1の直径:3.2m (2)第1室5の高さ:4m (3)第2室6の高さ:2m (4)第3室7の高さ:2.5m (5)排ガス分散管9の直径:4インチ及び本数:11
0本 (6)排ガス上昇管10の直径:410mm及び本数:
6本 (7)排ガス衝突板の構造:図2に示した構造のもの (8)第1室5における吸収液の静止液面の高さ:3m 排ガス分散管9としては、図5に示す構造のものを用
い、その下端部周壁面に設けたガス噴出孔55の位置
は、吸収液面下180mmの位置に設定した。また、図
1に示す構造の密閉槽1’の第1室5内には、あらかじ
め、吸収液として、石こう濃度:20重量%の水スラリ
ー液を高さ3mになるように収容させた。
Next, the present invention will be described in more detail with reference to examples. Example 1 Using the exhaust gas treating apparatus having the structure shown in FIG. 1, dust: 1
50 mg / Nm 3 , SO 2 : 800 volppm, O 2 :
After treating the flue gas containing 5 vol% in the cooling dust removal tower 21,
It processed with the desulfurization apparatus 1. The conditions of the desulfurizer in this case are as follows. (1) Diameter of the closed tank 1: 3.2 m (2) Height of the first chamber 5: 4 m (3) Height of the second chamber 6: 2 m (4) Height of the third chamber 7: 2.5 m (5) Diameter of exhaust gas dispersion pipe 9: 4 inches and number: 11
0 (6) Diameter of exhaust gas rising pipe 10: 410 mm and number:
Six (7) Structure of the exhaust gas collision plate: the structure shown in FIG. 2 (8) Height of the stationary liquid surface of the absorbing liquid in the first chamber 5: 3 m The structure of the exhaust gas dispersion pipe 9 shown in FIG. The position of the gas ejection hole 55 provided on the peripheral wall surface of the lower end portion was set to a position 180 mm below the absorbing liquid surface. Further, in the first chamber 5 of the closed tank 1 ′ having the structure shown in FIG. 1, a water slurry liquid having a gypsum concentration of 20% by weight was previously stored as an absorbing liquid so that the height thereof was 3 m.

【0031】次に、あらかじめ冷却除塵塔21で処理し
た排ガス(SO2:800ppm、粉塵:150mg/
Nm3)を排ガス導入ダクト8から、40,000Nm3
/hの供給量で脱硫装置1における第2室6内に供給し
て脱硫処理した。この場合、第1室5内の吸収液の静止
液面下2500mmの位置に配設した酸素含有ガス噴出
ノズルから空気を200Nm3/hで噴出させるととも
に、撹拌機を回転させて吸収液の撹拌を行った。
Next, exhaust gas (SO 2 : 800 ppm, dust: 150 mg /
Nm 3 ) from the exhaust gas introduction duct 8 to 40,000 Nm 3
/ H was supplied into the second chamber 6 of the desulfurization apparatus 1 for desulfurization treatment. In this case, air is jetted at 200 Nm 3 / h from the oxygen-containing gas jet nozzle arranged at a position 2500 mm below the stationary liquid level of the absorbent in the first chamber 5, and the stirrer is rotated to stir the absorbent. I went.

【0032】また、密閉槽1’の外部には、図1に示す
ように、洗浄液槽31、清澄洗浄液槽32及び固液分離
装置(シックナー)33を配設するとともに、洗浄液補
給管47を通して洗浄液を供給し、それらの洗浄液槽3
1及び清澄洗浄液槽32には洗浄液をあらかじめ収容さ
せた。洗浄液槽31内の洗浄液は、これを図1に示すよ
うに、洗浄液供給管38及び17を介して衝突板15に
配設した液分散機槽に供給し、衝突板の液体流下壁先端
から液幕状に流下させるとともに、第3室7の床面を形
成する第2隔板3上に滞留した洗浄液は、これを洗浄液
抜出し管14を介して密閉槽外へ抜出し、洗浄液槽31
に返送した。この場合、洗浄液供給管17を介して第3
室内の衝突板15に配設した液分散機構に供給する全洗
浄液量は、排ガス導入ダクト8から供給される排ガス量
1Nm3/hに対し、0.2kg/hの割合であった。
また、洗浄液供給管38を流通する洗浄液の一部を抜出
し、これをシックナー33に導入するとともに、このシ
ックナー33で得られる粉塵を分離した後の清澄な洗浄
液を清澄洗浄液槽32に配管41を介して導入し、さら
に、清澄洗浄液槽32内の清澄洗浄液を配管42、ポン
プ43、配管44及び配管45を介して洗浄液槽31に
導入した。
As shown in FIG. 1, a cleaning liquid tank 31, a clarification cleaning liquid tank 32, and a solid-liquid separator (thickener) 33 are arranged outside the closed tank 1 ', and a cleaning liquid is supplied through a cleaning liquid supply pipe 47. To supply those cleaning liquid tanks 3
The cleaning liquid was previously stored in the 1 and the clear cleaning liquid tank 32. As shown in FIG. 1, the cleaning liquid in the cleaning liquid tank 31 is supplied through a cleaning liquid supply pipes 38 and 17 to a liquid disperser tank arranged on the collision plate 15, and the liquid is discharged from the tip of the liquid flow-down wall of the collision plate. The cleaning liquid accumulated on the second partition plate 3 forming the floor of the third chamber 7 while being made to flow in the form of a curtain is withdrawn through the cleaning liquid discharge pipe 14 to the outside of the closed tank, and the cleaning liquid tank 31
Sent back to. In this case, the third liquid is supplied via the cleaning liquid supply pipe 17.
The total amount of cleaning liquid supplied to the liquid dispersion mechanism arranged on the collision plate 15 in the room was 0.2 kg / h with respect to the amount of exhaust gas 1 Nm 3 / h supplied from the exhaust gas introduction duct 8.
In addition, a part of the cleaning liquid flowing through the cleaning liquid supply pipe 38 is withdrawn and introduced into the thickener 33, and the clear cleaning liquid after the dust obtained in the thickener 33 is separated is passed through the pipe 41 to the clarifying cleaning liquid tank 32. Then, the clarification cleaning liquid in the clarification cleaning liquid tank 32 was further introduced into the cleaning liquid tank 31 via the pipe 42, the pump 43, the pipe 44 and the pipe 45.

【0033】前記のようにして排ガスの処理を行った結
果、洗浄液供給管38を流通する洗浄液中の固体粒子
(このものは、排ガス中にあらかじめ含まれていた粉塵
と、第1室5からの排ガス中に含まれる石こう粒子から
なる)の量は、800mg/L以下であり、また、ミス
トエリミネータ12を通過した後の排ガス中の粉塵濃度
は2.0mg/Nm3であり、SO2濃度は25ppmで
あった。
As a result of the treatment of the exhaust gas as described above, the solid particles in the cleaning liquid flowing through the cleaning liquid supply pipe 38 (this is the dust contained in the exhaust gas in advance and the particles from the first chamber 5). The amount of gypsum particles contained in the exhaust gas is 800 mg / L or less, the dust concentration in the exhaust gas after passing through the mist eliminator 12 is 2.0 mg / Nm 3 , and the SO 2 concentration is It was 25 ppm.

【0034】次に、比較のために、排ガス衝突板の配設
を省略して排ガスの処理を行ったところ、ミストエリミ
ネータ12を通過した後の排ガス中の粉塵濃度は4.0
mg/Nm3と高いものであった。
Next, for comparison, when the exhaust gas was treated without the provision of the exhaust gas collision plate, the dust concentration in the exhaust gas after passing through the mist eliminator 12 was 4.0.
It was as high as mg / Nm 3 .

【0035】[0035]

【発明の効果】本発明によれば、従来法では達成困難な
高除塵率を格別の処理コストの増加を必要とせずに、低
消費動力で容易に得ることができ、その産業的意義は多
大である。
EFFECTS OF THE INVENTION According to the present invention, a high dust removal rate, which is difficult to achieve by the conventional method, can be easily obtained with low power consumption without requiring an extra increase in treatment cost, and its industrial significance is great. Is.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の排ガス処理装置系の1例についての模
式図を示す。
FIG. 1 shows a schematic view of an example of an exhaust gas treatment system of the present invention.

【図2】液分散機構を配設した排ガス衝突板の1つの例
についての説明図を示す。
FIG. 2 is an explanatory diagram of an example of an exhaust gas collision plate provided with a liquid dispersion mechanism.

【図3】液分散板の1つの例についての斜視図を示す。FIG. 3 shows a perspective view of an example of a liquid dispersion plate.

【図4】液分散板の他の例についての斜視図を示す。FIG. 4 is a perspective view of another example of the liquid dispersion plate.

【図5】排ガス分散管の1つの例についての斜視図を示
す。
FIG. 5 shows a perspective view of an example of an exhaust gas dispersion pipe.

【符号の説明】 1 脱硫装置 1’ 密閉槽 2 第1隔板 3 第2隔板 4 天板 5 第1室 6 第2室 7 第3室 8 排ガス導入ダクト 9 排ガス分散管 10 排ガス上昇筒 11 排ガス導出ダクト 12、29 ミストエリミネータ 13’ 排ガス排出筒 14 洗浄液抜出し管 15 排ガス衝突板 16 液分散板 17 洗浄液供給管 21 排ガスの冷却除塵塔 31 排ガス洗浄液槽 32 清澄排ガス洗浄液槽 33 固液分離装置 47 排ガス洗浄液補給管 55 ガス噴出孔 L1 吸収液 L2 排ガス洗浄液 L3 排ガス冷却液[Explanation of Codes] 1 desulfurization device 1'closed tank 2 first partition plate 3 second partition plate 4 top plate 5 first chamber 6 second chamber 7 third chamber 8 exhaust gas introduction duct 9 exhaust gas dispersion pipe 10 exhaust gas rising cylinder 11 Exhaust gas discharge duct 12, 29 Mist eliminator 13 'Exhaust gas discharge tube 14 Cleaning liquid extraction pipe 15 Exhaust gas collision plate 16 Liquid dispersion plate 17 Cleaning liquid supply pipe 21 Exhaust gas cooling and dust removing tower 31 Exhaust gas cleaning liquid tank 32 Clearing exhaust gas cleaning liquid tank 33 Solid-liquid separation device 47 Exhaust gas cleaning liquid supply pipe 55 Gas injection hole L 1 Absorbing liquid L 2 Exhaust gas cleaning liquid L 3 Exhaust gas cooling liquid

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B01D 50/00 501 B01D 50/00 501G 502A 502 53/18 E 53/18 53/34 ZAB 53/34 ZAB ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI Technical display location B01D 50/00 501 B01D 50/00 501G 502A 502 53/18 E 53/18 53/34 ZAB 53 / 34 ZAB

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 粉塵と亜硫酸ガスを含む排ガスを処理す
る方法において、 (i)排ガスを冷却除塵塔に導入し、噴霧状液滴粒子と
接触させた後、その冷却除塵塔から抜出すこと、 (ii)冷却除塵塔から抜出された排ガスを、第1隔板と
その上方に位置する第2隔板とによってその内部が第1
室と第1室の上方に隣接する第2室と第2室の上方に隣
接する第3室とに区画された密閉槽におけるその第2室
に供給すること、 (iii)第2室に供給された排ガスを第1隔板に形成され
た透孔に垂設された排ガス分散管を通して第1室に収容
されている吸収液中に吹込むこと、 (iv)第1室の上部空間に存在する排ガスを第1室と第
3室との間を連絡し、その上端が第2隔板表面より上方
に位置する排ガス上昇筒内を上昇させること、 (v)排ガス上昇筒を通して第3室に上昇してきた排ガ
スをその排ガス上昇筒の上方に配設されている液体流下
壁と液分散機構を有し、その液体流下壁の先端から排ガ
ス洗浄液が液幕状に流下している排ガス衝突板に衝突さ
せるとともに、排ガスをその液幕と接触させること、 (vi)前記液幕と接触させた後の排ガスを第3室に配設
された排ガス出口から排出させること、 (vii)第3室から排出された排ガスをミストエリミネー
タに導入し、排ガス中に含まれる液滴粒子を除去した
後、ミストエリミネータから抜出すこと、 (viii)ミストエリミネータから抜出した排ガスを湿式
電気集塵処理することなく大気中へ放出させること、 (ix)前記密閉槽内の第2隔板上に滞留する排ガス洗浄
液を密閉槽外へ抜出し、排ガス洗浄液槽に導入し、貯留
すること、 (x)排ガス洗浄液槽に貯留された排ガス洗浄液を排ガ
ス衝突板に配設した液分散機構に供給すること、 (xi)排ガス衝突板に供給する排ガス洗浄液の一部を固
液分離装置に導入すること、 (xii)固液分離装置で得られた清澄排ガス洗浄液を清澄
排ガス洗浄液槽に貯留すること、 (xiii)清澄排ガス洗浄液槽の貯留液を排ガス洗浄液槽
に移送すること、を特徴とする排ガスの処理方法。
1. A method for treating an exhaust gas containing dust and sulfurous acid gas, comprising: (i) introducing the exhaust gas into a cooling dust removal tower, bringing it into contact with atomized droplet particles, and then withdrawing from the cooling dust removal tower; (Ii) The inside of the exhaust gas extracted from the cooling dust removal tower has a first partition plate and a second partition plate located above the first partition plate.
Supplying to the second chamber in the closed tank divided into a second chamber above the first chamber and a second chamber above the first chamber and a third chamber above the second chamber, and (iii) supplying to the second chamber. The discharged exhaust gas is blown into the absorbing liquid contained in the first chamber through an exhaust gas dispersion pipe vertically provided in a through hole formed in the first partition plate, (iv) existing in the upper space of the first chamber The exhaust gas to be communicated between the first chamber and the third chamber, and to raise the inside of the exhaust gas rising cylinder whose upper end is located above the surface of the second partition plate, (v) through the exhaust gas rising cylinder to the third chamber The rising exhaust gas has a liquid flow-down wall and a liquid dispersion mechanism arranged above the exhaust gas rising cylinder, and the exhaust gas cleaning liquid flows down from the tip of the liquid flow-down wall to the exhaust gas collision plate. Causing the exhaust gas to come into contact with the liquid curtain while causing the collision, (vi) after coming into contact with the liquid curtain Discharging the exhaust gas from an exhaust gas outlet provided in the third chamber, (vii) introducing the exhaust gas discharged from the third chamber into a mist eliminator, removing droplet particles contained in the exhaust gas, and then removing the mist eliminator. (Viii) releasing the exhaust gas extracted from the mist eliminator into the atmosphere without performing wet electrostatic precipitating treatment, (ix) sealing the exhaust gas cleaning liquid remaining on the second partition plate in the sealed tank (X) Supplying the exhaust gas cleaning liquid stored in the exhaust gas cleaning liquid tank to the liquid dispersion mechanism arranged on the exhaust gas collision plate, (xi) Exhaust gas collision plate A part of the exhaust gas cleaning liquid to be supplied to the solid-liquid separator, (xii) storing the clear exhaust gas cleaning liquid obtained by the solid-liquid separator in a clear exhaust gas cleaning liquid tank, (xiii) the clear exhaust gas Transferring the liquid contained in the cleaning liquid tank into the exhaust gas washing liquid tank, processing method of an exhaust gas characterized by.
【請求項2】 密閉槽内の第3室の上方に排ガス洗浄液
スプレーノズルを配設し、このスプレーノズルに排ガス
洗浄液槽に貯留されている排ガス洗浄液を供給し、スプ
レーさせる請求項1の方法。
2. The method according to claim 1, wherein an exhaust gas cleaning liquid spray nozzle is provided above the third chamber in the closed tank, and the exhaust gas cleaning liquid stored in the exhaust gas cleaning liquid tank is supplied to the spray nozzle for spraying.
【請求項3】 排ガスを冷却除塵する排ガス冷却除塵塔
と、冷却除塵塔からの排ガスを脱硫するための脱硫装置
と、脱硫装置から排出された排ガス中の液滴粒子を除去
するためのミストエリミネータと、ミストエリミネータ
からの排ガスを大気中へ放出させる排ガス排出筒を備え
たものであって、前記脱硫装置は、第1隔板とその上方
に位置する第2隔板とによってその内部が第1室と第1
室の上方に隣接する第2室と第2室の上方に隣接する第
3室とに区画された密閉槽と、第2室の周壁に形成され
た排ガス入口と、第3室に配設された排ガス出口と、第
1隔板に形成された透孔と、その透孔に垂設された排ガ
ス分散管と、第1室と第3室とを連絡し、その上端が第
2隔板表面より上方に位置する排ガス上昇筒と、排ガス
上昇筒の上方に配設され、液体流下壁とその液体流下壁
に排ガス洗浄液を供給する液分散機構を有する排ガス衝
突板と、第2隔板上に滞留する排ガス洗浄液を排ガス洗
浄液槽に移送させる排ガス洗浄液抜出し配管と、排ガス
洗浄液槽の貯留液を排ガス衝突板に配設されている液分
散機構に供給する排ガス洗浄液供給配管と、排ガス洗浄
液供給配管を流通する排ガス洗浄液の一部を引出し、固
液分離装置に移送させる排ガス洗浄液引出し配管と、こ
の排ガス洗浄液引出し配管を通って引出された排ガス洗
浄液を固液分離する固液分離装置と、固液分離装置で得
られた清澄排ガス洗浄液を貯留する清澄排ガス洗浄液槽
と、清澄排ガス洗浄液槽の貯留液を排ガス洗浄液槽に移
送させる配管を備えたものであることを特徴とする排ガ
ス処理装置。
3. An exhaust gas cooling dust removal tower for cooling and removing dust from an exhaust gas, a desulfurization device for desulfurizing exhaust gas from the cooling dust removal tower, and a mist eliminator for removing droplet particles in the exhaust gas discharged from the desulfurization device. And an exhaust gas discharge tube that discharges the exhaust gas from the mist eliminator into the atmosphere, wherein the desulfurization device has a first partition plate and a second partition plate located above the first partition plate. Chamber and first
A closed chamber partitioned into a second chamber adjacent above the chamber and a third chamber adjacent above the second chamber, an exhaust gas inlet formed on the peripheral wall of the second chamber, and a third chamber The exhaust gas outlet, the through hole formed in the first partition plate, the exhaust gas dispersion pipe vertically provided in the through hole, the first chamber and the third chamber, and the upper end thereof is the surface of the second partition plate. On the second partition plate, there is an exhaust gas riser located at a higher position, an exhaust gas collision plate disposed above the exhaust gas riser cylinder and having a liquid flow-down wall and a liquid dispersion mechanism for supplying an exhaust gas cleaning liquid to the liquid flow-down wall. The exhaust gas cleaning liquid withdrawal pipe for transferring the accumulated exhaust gas cleaning liquid to the exhaust gas cleaning liquid tank, the exhaust gas cleaning liquid supply pipe for supplying the stored liquid of the exhaust gas cleaning liquid tank to the liquid dispersion mechanism arranged on the exhaust gas collision plate, and the exhaust gas cleaning liquid supply pipe Part of the circulating exhaust gas cleaning liquid is extracted and transferred to the solid-liquid separation device. Exhaust gas cleaning liquid withdrawing pipe, a solid-liquid separation device for solid-liquid separating the exhaust gas cleaning liquid drawn through the exhaust gas cleaning liquid withdrawing pipe, and a clear exhaust gas cleaning liquid tank for storing the clear exhaust gas cleaning liquid obtained by the solid-liquid separation device An exhaust gas treatment apparatus comprising a pipe for transferring a liquid stored in a clarified exhaust gas cleaning liquid tank to the exhaust gas cleaning liquid tank.
【請求項4】 密閉槽の第3室の上方に排ガス洗浄液ス
プレーノズルを配設し、このスプレーノズルと排ガス洗
浄液槽との間を配管を介して連結させた請求項3の装
置。
4. The apparatus according to claim 3, wherein an exhaust gas cleaning liquid spray nozzle is disposed above the third chamber of the closed tank, and the spray nozzle and the exhaust gas cleaning liquid tank are connected via a pipe.
JP7176696A 1995-06-20 1995-06-20 Process and device for treatment of exhaust gas Pending JPH09866A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7176696A JPH09866A (en) 1995-06-20 1995-06-20 Process and device for treatment of exhaust gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7176696A JPH09866A (en) 1995-06-20 1995-06-20 Process and device for treatment of exhaust gas

Publications (1)

Publication Number Publication Date
JPH09866A true JPH09866A (en) 1997-01-07

Family

ID=16018149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7176696A Pending JPH09866A (en) 1995-06-20 1995-06-20 Process and device for treatment of exhaust gas

Country Status (1)

Country Link
JP (1) JPH09866A (en)

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WO2003082445A1 (en) * 2002-03-29 2003-10-09 Masanori Tashiro Method of decontaminating waste gas and apparatus therefor
JP2012101149A (en) * 2010-11-08 2012-05-31 Lapis Semiconductor Co Ltd Scrubber
KR101256512B1 (en) * 2010-08-06 2013-04-22 주식회사 포스코 Wet-type dust collector having advanced purification performance
WO2017098697A1 (en) * 2015-12-07 2017-06-15 千代田化工建設株式会社 Flue gas desulfurization apparatus
US10377862B2 (en) 2013-06-18 2019-08-13 Dupont Teijin Films U.S. Limited Partnership Copolyesterimides derived from N,N′-bis-(hydroxyalkyl)-benzophenone-3,3′,4,4′-tetracarboxylic diimide and films made therefrom

Cited By (8)

* Cited by examiner, † Cited by third party
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WO2003082445A1 (en) * 2002-03-29 2003-10-09 Masanori Tashiro Method of decontaminating waste gas and apparatus therefor
KR101256512B1 (en) * 2010-08-06 2013-04-22 주식회사 포스코 Wet-type dust collector having advanced purification performance
JP2012101149A (en) * 2010-11-08 2012-05-31 Lapis Semiconductor Co Ltd Scrubber
US10377862B2 (en) 2013-06-18 2019-08-13 Dupont Teijin Films U.S. Limited Partnership Copolyesterimides derived from N,N′-bis-(hydroxyalkyl)-benzophenone-3,3′,4,4′-tetracarboxylic diimide and films made therefrom
WO2017098697A1 (en) * 2015-12-07 2017-06-15 千代田化工建設株式会社 Flue gas desulfurization apparatus
CN108367234A (en) * 2015-12-07 2018-08-03 千代田化工建设株式会社 Flue gas desulfurization equipment
EP3388136A4 (en) * 2015-12-07 2019-08-07 Chiyoda Corporation Flue gas desulfurization apparatus
US10661222B1 (en) 2015-12-07 2020-05-26 Chyoda Corporation Flue gas desulfurization system

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