JPH0977690A - Production of acetylene - Google Patents
Production of acetyleneInfo
- Publication number
- JPH0977690A JPH0977690A JP7234240A JP23424095A JPH0977690A JP H0977690 A JPH0977690 A JP H0977690A JP 7234240 A JP7234240 A JP 7234240A JP 23424095 A JP23424095 A JP 23424095A JP H0977690 A JPH0977690 A JP H0977690A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- methane
- gas
- microwave
- acetylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、メタン含有ガスよ
りアセチレンを製造する方法に関する。[0001] The present invention relates to a method for producing acetylene from a methane-containing gas.
【0002】[0002]
【従来の技術】メタン、あるいはメタンを含有する天然
ガス等のガスから、メタン以外の低級炭化水素を合成す
る方法は種々提案されており、たとえばマイクロ波プラ
ズマ反応を用いる方法についてもエタン、エチレン等の
製造を主たる目的として検討がなされている。2. Description of the Related Art Various methods for synthesizing lower hydrocarbons other than methane from a gas such as methane or methane-containing natural gas have been proposed. For example, a method using a microwave plasma reaction has been proposed. The main purpose of this study is to study the production of
【0003】[0003]
【発明が解決しようとする課題】しかしながら、アセチ
レンを目的とする場合、従来の方法では、メタンの転換
率は向上しえても、アセチレンの選択率を大きくするこ
とは困難であった。そこで、本発明者は、アセチレンの
選択率を向上しうる方法を見出すべく、種々検討を行な
い、意外にもマイクロ波プラズマ反応を特定の条件で行
なうことにより、この課題を達成しうることを見出し、
本発明に到達した。すなわち、本発明は、メタンを含有
するガスを、マイクロ波出力100W以上の出力の下
で、マイクロ波プラズマ反応させて、該メタンをアセチ
レンに転換することによりアセチレンを得ることを特徴
とするアセチレンの製造法を要旨とする。However, when acetylene is intended, it is difficult to increase the selectivity of acetylene by the conventional method, although the conversion of methane can be improved. Therefore, the present inventors have conducted various studies to find a method that can improve the selectivity of acetylene, and have surprisingly found that this problem can be achieved by performing a microwave plasma reaction under specific conditions. ,
The present invention has been reached. That is, the present invention provides a gas containing methane under microwave power of 100 W or more in a microwave plasma reaction to obtain acetylene by converting the methane into acetylene. The manufacturing method is the main point.
【0004】[0004]
【発明の実施の形態】以下、本発明を詳細に説明する。
まず、本発明において、出発原料となるメタンを含有す
るガスとしては、メタンガス、天然ガス等が挙げられ、
メタンの含有率は特に制服されない。このメタンを含有
するガスをマイクロ波プラズマ反応に供するに際して
は、Ar、N2 等の、該反応に不活性なガスをキャリヤ
ガスとして用いるのが好適である。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below.
First, in the present invention, examples of the gas containing methane as a starting material include methane gas and natural gas,
Methane content is not particularly uniform. When subjecting the gas containing methane to the microwave plasma reaction, it is preferable to use a gas inert to the reaction, such as Ar or N 2 , as the carrier gas.
【0005】マイクロ波プラズマ反応を行なう反応装置
は、ガス供給部、マイクロ波発生部、反応部よりなる。
ガス混合器で所定の成分比に調整した供給ガスを、たと
えば石英ガラス管のようなマイクロ波を吸収しない反応
管からなる反応部に導入する反応管は縦型とするのが、
プラズマ発生時の管内挙動の観察の点から好ましい。[0005] A reactor for performing a microwave plasma reaction includes a gas supply unit, a microwave generation unit, and a reaction unit.
The reaction gas introduced into the reaction section, which is a reaction tube that does not absorb microwaves, such as a quartz glass tube, having a feed gas adjusted to have a predetermined component ratio in the gas mixer is of a vertical type.
It is preferable from the viewpoint of observing the behavior inside the tube when plasma is generated.
【0006】この反応部には、マイクロ波発生部、たと
えば、2.45GHzのマイクロ波発振器で発生させた
マイクロ波を水平に設置した導波管を通して照射してプ
ラズマ反応させるのが好適である。本発明においては、
このプラズマ反応を行なうに際し、マイクロ波出力を1
00W以上とするのが必要である。通常100〜400
W、好適には200〜350Wから選ばれる。100W
未満では、アセチレンの選択率が低下し、メタンの転化
率も低下する。It is preferable that the reaction section is irradiated with a microwave generated by a microwave generation section, for example, a microwave oscillator of 2.45 GHz through a horizontally installed waveguide to cause a plasma reaction. In the present invention,
When carrying out this plasma reaction, the microwave output is set to 1
It is necessary to set it to 00 W or more. Usually 100-400
W, preferably 200 to 350 W. 100W
When it is less than 1, the selectivity of acetylene is lowered and the conversion of methane is also lowered.
【0007】本発明によれば、メタンの転化率75%以
上でアセチレンの選択率を85%以上、好適には95%
以上とすることができる。原料ガスの供給は、通常0.
1〜10mmol/min程度で行なわれ、反応圧は、
通常2〜10kPa程度から選ばれる。また、反応時間
は、0.1〜10秒 (被照射時間)程度から選ぶのが一
般的である。反応部より導出された反応生成物は、常法
により、目的物を分離される。According to the present invention, the methane conversion is 75% or more and the acetylene selectivity is 85% or more, preferably 95%.
The above can be done. The supply of the raw material gas is usually 0.
The reaction pressure is about 1 to 10 mmol / min.
It is usually selected from about 2 to 10 kPa. Further, the reaction time is generally selected from about 0.1 to 10 seconds (irradiation time). The target product is separated from the reaction product derived from the reaction section by an ordinary method.
【0008】[0008]
【実施例】以下、実施例により本発明を詳細に説明す
る。 実施例1 メタン(純度99.2%)/Arの比率を変えてマイク
ロ波プラズマ反応装置に導入した。反応管は石英ガラス
製の縦型(内径22.3mm、厚さ1.6mm、長さ3
00mm)であり、2.45GHzのマイクロ波を出力
200Wで発生させ水平に設置した導波管(断面積;縦
54.5mm、横108.7mm)を通して反応管に照
射した。反応ガスの供給速度は1.92mmol/mi
nであり、反応圧は7.5kPaであった。反応生成物
の分析は減圧用サンプラーを用いてガスクロマトグラフ
ィーで分析した。反応生成物の収率は次のとおりであっ
た。The present invention will be described in detail below with reference to examples. Example 1 The ratio of methane (purity 99.2%) / Ar was changed and introduced into a microwave plasma reactor. The reaction tube is a vertical type made of quartz glass (inner diameter 22.3 mm, thickness 1.6 mm, length 3
A microwave of 2.45 GHz was generated at an output of 200 W, and the reaction tube was irradiated through a horizontally installed waveguide (cross-sectional area: vertical 54.5 mm, horizontal 108.7 mm). Reaction gas supply rate is 1.92 mmol / mi
n, and the reaction pressure was 7.5 kPa. The reaction products were analyzed by gas chromatography using a vacuum sampler. The yield of the reaction product was as follows.
【0009】[0009]
【表1】 出力200W メタンモル分率 100% 80% 60% 40% 20% メタン転化率 83.3 85.8 81.6 65.2 58.5 アセチレン選択率 96.3 95.9 96.0 73.9 40 エチレン選択率 2.3 2.1 2.6 1.8 0.3 エタン選択率 0.7 0.7 1.2 3.2 2.5 なお、C3 、C4 化合物の生成は微量であった。[Table 1] Output 200W Methane mole fraction 100% 80% 60% 40% 20% Methane conversion rate 83.3 85.8 81.6 65.2 58.5 Acetylene selectivity 96.3 95.9 96.0 73.9 40 Ethylene selectivity 2.3 2.1 2.6 1.8 0.3 Ethane selectivity 0.7 0.7 1.2 3.2 2.5 The amounts of C 3 and C 4 compounds produced were very small.
Claims (1)
力100W以上の出力の下で、マイクロ波プラズマ反応
させて、該メタンをアセチレンに転換することによりア
セチレンを得ることを特徴とするアセチレンの製造法。1. Production of acetylene, characterized in that methane is obtained by subjecting a gas containing methane to microwave plasma reaction under microwave power of 100 W or more to convert the methane into acetylene. Law.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7234240A JPH0977690A (en) | 1995-09-12 | 1995-09-12 | Production of acetylene |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7234240A JPH0977690A (en) | 1995-09-12 | 1995-09-12 | Production of acetylene |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0977690A true JPH0977690A (en) | 1997-03-25 |
Family
ID=16967884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7234240A Pending JPH0977690A (en) | 1995-09-12 | 1995-09-12 | Production of acetylene |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0977690A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015516958A (en) * | 2012-04-07 | 2015-06-18 | シュピッツル ラルフSPITZL, Ralf | Method and apparatus for producing acetylene using plasma technology |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3663394A (en) * | 1970-06-01 | 1972-05-16 | Dow Chemical Co | Process for the vapor phase rearrangement of hydrocarbons utilizing microwave energy |
JPS56139431A (en) * | 1980-03-31 | 1981-10-30 | Osaka Gas Co Ltd | Synthetic method of acetylene |
JPS62164886A (en) * | 1986-01-13 | 1987-07-21 | Shinryo Air Conditioning Co Ltd | Production of acetylene |
JPH11502760A (en) * | 1995-03-14 | 1999-03-09 | ロッキード アイダホ テクノロジーズ カンパニー | Fast cooling reactor and method |
-
1995
- 1995-09-12 JP JP7234240A patent/JPH0977690A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3663394A (en) * | 1970-06-01 | 1972-05-16 | Dow Chemical Co | Process for the vapor phase rearrangement of hydrocarbons utilizing microwave energy |
JPS56139431A (en) * | 1980-03-31 | 1981-10-30 | Osaka Gas Co Ltd | Synthetic method of acetylene |
JPS62164886A (en) * | 1986-01-13 | 1987-07-21 | Shinryo Air Conditioning Co Ltd | Production of acetylene |
JPH11502760A (en) * | 1995-03-14 | 1999-03-09 | ロッキード アイダホ テクノロジーズ カンパニー | Fast cooling reactor and method |
Non-Patent Citations (5)
Title |
---|
HUANG J. AND SUIB S. L.: "Dimerization of Methane through Microwave Plasmas", J. PHYS. CHEM., vol. 97, JPN4006009649, 1993, pages 9403 - 9407, XP055065680, ISSN: 0000744161, DOI: 10.1021/j100139a025 * |
HUANG J. AND SUIB S. L.: "Dimerization of Methane through Microwave Plasmas", J. PHYS. CHEM., vol. 97, JPNX007019751, 1993, pages 9403 - 9407, XP055065680, ISSN: 0000840150, DOI: 10.1021/j100139a025 * |
OUMGHAR A. ET AL.: "A kinetic study of methane conversion by a dinitrogen microwave plasma", PLASMA CHEMISTRY AND PLASMA PROCESSING, vol. 14, no. 3, JPN4006009129, 1994, pages 229 - 249, ISSN: 0000744160 * |
OUMGHAR A. ET AL.: "A kinetic study of methane conversion by a dinitrogen microwave plasma", PLASMA CHEMISTRY AND PLASMA PROCESSING, vol. 14, no. 3, JPNX007019750, 1994, pages 229 - 249, ISSN: 0000840149 * |
OUMGHAR A. ET AL.: "A kinetic study of methane conversion by a dinitrogen microwave plasma", PLASMA CHEMISTRY AND PLASMA PROCESSING, vol. 14, no. 3, JPNX007048215, 1994, pages 229 - 249, ISSN: 0000890873 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015516958A (en) * | 2012-04-07 | 2015-06-18 | シュピッツル ラルフSPITZL, Ralf | Method and apparatus for producing acetylene using plasma technology |
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