JPH0964638A - Production of reflector - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily produce a reflector and to attain high production accuracy by irradiating a metallic film layer formed on a reflection face with ultraviolet laser beam to remove the metallic film and forming a metallic film layer pattern. SOLUTION: A copper film layer 11 is formed on the reflection face of a surface material 10 constituting a reflector body 14 and the layer 11 is irradiated with ultraviolet laser beam. The layer 11 is removed by the irradiation and a copper film layer pattern is formed on the surface material 10. The layer 11 can be removed without thermally damaging a honeycomb core 12 including the material 10 by the thermal characteristics of the laser beam. Since the copper film layer pattern can be formed only by a process for forming the copper film layer 11 on the material 10 and a process for removing the layer by laser beam and forming the pattern, the necessity of large darkroom installation or the like can be eliminated, the production facilities can be simplified and the aperture of the body 14 can be increased.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a reflector suitable for mounting on a spacecraft such as an artificial satellite.

[0002]

2. Description of the Related Art Conventionally, in an antenna system, as shown in FIG.
And the second reflectors 1 and 2 are stacked in the directivity direction, and the first and second power feeding portions 3 and 4 are arranged to face each other in correspondence with the first and second reflectors 1 and 2. The composition is known. These first and second reflectors 1,
As shown in FIG. 9, the metal film layer patterns (grid lines) 1a and 2a are provided on the reflection surface 2 at right angles to each other, and the lines radiated from the first and second power feeding portions 3 and 4 are provided. Each of the V-polarized light and the H-polarized light that are parallel to is selectively reflected and radiated to the free space.

The V polarized wave radiated from the first feeding section 3 is
It has an electric field component substantially parallel to the metal film layer pattern 1a of the first reflector 1 and is reflected by the metal film layer pattern 1a of the first reflector 1. On the other hand, the H polarized wave radiated from the second power feeding section 4 is an electric field component orthogonal to the metal film layer pattern 1 a of the first reflector 1 (that is, the second reflector 2).
Electric field component substantially parallel to the metal film layer pattern 2a of
The light passes through the first reflector 1 and is reflected by the metal film layer pattern 2 a of the second reflector 2.

Incidentally, as a method of manufacturing such a reflector, Japanese Patent Publication No. 5-57762 and Japanese Patent Publication No.
What is disclosed in Japanese Patent Publication No. 577641 is known. That is, a conductive film is formed on a skin material made of an insulating substrate of a reflector body, and a liquid photosensitive resist is applied on the conductive film. Next, the photosensitive resist on the conductive film is irradiated with laser light to be exposed, and further developed to remove a portion not irradiated with light, and the exposed conductive film is subjected to etching treatment to obtain a desired metal. A film layer pattern is formed.

However, in the above manufacturing method, since a photosensitive resist has to be applied to the skin material and subjected to exposure and development processing, a large dark room facility or the like is required for manufacturing the reflector, so that the reflector is required. However, there is a problem that it is restricted by the promotion of the increase in diameter. Such a problem is one of the serious problems particularly when a large diameter reflector is required, which is required in the field of recent space development.

[0006]

As described above, the conventional reflector manufacturing method has a problem that it is difficult to increase the diameter of the reflector because a large dark room facility or the like is required. Have.

The present invention has been made in view of the above circumstances, and provides a reflector manufacturing method capable of realizing high-precision manufacturing accuracy and facilitating simple manufacturing. The purpose is to do.

[0008]

According to the present invention, there is provided a first step of forming a metal film layer on a reflecting surface of a reflector main body formed of an insulating substrate, and an ultraviolet laser beam is applied to the metal film layer on the insulating substrate. Then, the second step of removing the metal film layer and forming a metal film layer pattern on the reflection surface of the insulating substrate is carried out to manufacture the reflector.

According to the above structure, the metal film layer is formed on the insulating substrate, and the metal film layer is directly removed by the ultraviolet laser light to form the metal film layer pattern on the insulating substrate. Thereby, a desired metal film pattern can be formed on the insulating substrate only by the first step of forming the metal film layer and the second step of removing the metal film layer by the ultraviolet laser beam to form the pattern. This makes it possible to simplify the manufacturing equipment, and it is also possible to cope with an increase in the diameter of the reflector body.

Further, according to the present invention, a first step of forming a metal film layer on a reflecting surface of a reflector body formed of an insulating substrate and irradiating the metal film layer on the insulating substrate with an ultraviolet laser beam, A second step of performing a slit process for removing the film layer into a slit shape and peeling the metal film layer between the slits to form a metal film layer pattern is configured to manufacture a reflector.

According to the above construction, the metal film layer is formed on the insulating substrate, the metal film layer is directly removed by the ultraviolet laser light in a slit shape to form the slit, and the metal film between the slits is formed. The desired metal film layer pattern is formed on the insulating substrate by removing the layer. Thereby, only the first step of forming the metal film layer and the second step of removing the metal film layer in a slit shape by the ultraviolet laser light and removing the metal film layer between the slits to form a pattern With this, it becomes possible to form a metal film pattern on the insulating substrate, simplification of manufacturing equipment can be achieved, and it is possible to cope with an increase in the diameter of the reflector body.

[0012]

Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 shows a manufacturing procedure of a reflector manufacturing method according to an embodiment of the present invention. First, in a metal film forming step, an insulating substrate, for example, an aramid fiber / epoxy resin composite has a predetermined mirror surface shape. The skin material 10 is formed (see FIG. 2). A metal film layer, for example, a copper foil is attached to the entire reflecting surface of the skin material 10 to form a copper film layer 11. Then, the skin material 10 on which the copper film layer 11 is formed is adhered to one surface of the honeycomb core 12 formed of, for example, aramid fiber using a film adhesive, and the other surface of the honeycomb core 12 is adhered to the other surface. For example, a skin material 13 which is the same as the skin material 10 is adhered using a film adhesive to form a reflector body 14 called a grid reflector.

The process proceeds to the next pattern forming step, and FIG.
As shown in FIG. 5, the reflector body 14 is mounted on the XY table 20 which constitutes the pattern forming device with the copper film layer 11 as the upper surface. Then, the copper film layer 11 of the reflector main body 14 is irradiated with an ultraviolet laser beam such as a Kr F excimer laser beam emitted from a laser light source 21 as a laser irradiation section 22.
The copper film layer pattern 23 (see FIG. 4) having a predetermined shape called, for example, a grid line is formed by being irradiated with the light.

That is, the XY table 20 is connected to the table drive unit 24, and is two-dimensionally driven and controlled in the X-axis and Y-axis directions via the table drive unit 24. The XY table 20 has the laser beam irradiating section 22 opposed thereto.

A laser light source 21 is optically connected to the input side of the laser light irradiating section 22, and is opposed to the XY table 20 via an optical system driving section 25 so as to be movable in the directions of arrows A and B. The laser light source 21 is provided and optically connected to the input side thereof. The laser light irradiation unit 22 is composed of, for example, a well-known telecentric optical system, and the ultraviolet laser light from the laser light source 21 is placed on the copper film layer 11 of the reflector body 14 of the XY table 20 so that the deviation amount of the laser spot is large. Almost no irradiation is achieved with high precision.

The telecentric optical system has a transmission window 22a.
And the pair of lenses 22b and 22c, the ultraviolet laser light shown in FIG.
Is converted into laser light having a substantially parallel light intensity, and the copper film layer 11 of the reflector body 14 on the XY table 22 is irradiated with the laser light, and the copper film layer 11 is removed by the ultraviolet laser light. Then, a desired copper film layer pattern 23 is formed.

A control unit 26 is connected to the table drive unit 24 and the optical system drive unit 25. The control unit 26 relatively drives the table driving unit 24 and the optical system driving unit 25 so that the irradiation position of the laser light irradiation unit 22 and the copper film layer 11 of the reflector body 14 of the XY table 20 are curved. The three-dimensional movement control is performed in accordance with the
Then, the copper film layer 11 is removed by irradiating the copper film layer 11 with the ultraviolet laser light corresponding to a predetermined pattern shape. Here, the copper film layer pattern 23 is formed on the surface material 10 of the reflector body 14, and the manufacture of the reflector is completed.

The reflector main body 14 on which the copper film layer pattern 23 is formed by using the ultraviolet laser light is irradiated with the ultraviolet laser light directly on the copper film layer 11 to remove the copper film layer 11 when the copper film layer 11 is removed. It was confirmed that due to the thermal characteristics of the laser light, the honeycomb core 12 including the skin material 10 was not thermally damaged, stable removal was achieved, and the radio wave transmission characteristics as the reflector were maintained in the initial characteristic state. There is.

Further, for example, a protective film (not shown) is applied to the reflecting surface of the skin material 10 of the reflector body 14 including the copper film layer pattern 23. As a result, the skin material 10
Is a copper film layer pattern 2 formed by a protective film (not shown).
The reflective surface including 3 is protected.

As described above, according to the above-described reflector manufacturing method, the copper film layer 11 is formed on the reflecting surface of the skin material 10 constituting the reflector body 14, and the copper film layer 11 is irradiated with ultraviolet laser light. The copper film layer 11 was directly removed to form the copper film layer pattern 23 on the skin material 10.

According to this, the copper film layer 11 is formed on the skin material 10.
It becomes possible to form a desired copper film layer pattern 23 on the skin material 10 only by the step of forming the pattern and the step of removing the copper film layer 11 on the skin material 10 with the ultraviolet laser light to form a pattern. As compared with the conventional method, the manufacturing equipment can be simplified, and it is possible to easily contribute to the promotion of the increase in the diameter of the reflector body 14.

In the above-described embodiment, the copper film layer 11 is formed by directly irradiating the copper film layer 11 with ultraviolet laser light to directly remove the copper film layer 11 corresponding to the copper film layer pattern 23. Although the case has been described, the present invention is not limited to this. For example, first, as shown in FIGS. 7 and 8, the copper film layer 11 is first irradiated with ultraviolet laser light in a slit shape, and then the copper film layer 11 is irradiated.
To remove a pair of slits 30a, 30a
To form the copper film layer 11 between the slits 30a and 30a.
May be removed to form the copper film layer pattern 30 having a predetermined pattern shape.

Further, in the above embodiment, the copper film layer patterns 23 and 30 formed in the form of grid lines were described as a representative, but the present invention is not limited to this, and other
It is possible to form various shapes of copper film layer patterns. Further, the shape of the reflector main body 14 is not limited to a curved shape, but can be applied to various shapes including a planar shape.

Furthermore, in the above embodiment, the case where the copper film layer 11 is formed as the metal film layer has been described, but the present invention is not limited to this, and other metal materials such as aluminum may be used. It may be configured.

Furthermore, in the above embodiment, the skin material 10 having the copper film layer 11 formed thereon is adhered to the honeycomb core 12 to form the reflector body 14, and then the copper film layer patterns 23 and 30 are formed. However, the present invention is not limited to this, and for example, the copper film layer 11 may be used as the skin material 1.
The copper film layer patterns 23 and 30 may be formed in a state of being stacked on the substrate 0, and then the reflector body 14 may be formed by adhering to the honeycomb core 12.

Therefore, it is needless to say that the present invention is not limited to the above-described embodiment, and various other embodiments can be configured without departing from the scope of the invention.

[0027]

As described in detail above, according to the present invention, it is possible to realize a high precision manufacturing accuracy, and to make it easy,
It is possible to provide a method of manufacturing a reflector that can realize simple manufacturing.

[Brief description of drawings]

FIG. 1 is a view showing a manufacturing procedure of a reflector manufacturing method according to an embodiment of the present invention.

FIG. 2 is a view showing a part of the reflector manufactured in FIG.

FIG. 3 is a diagram showing a pattern forming apparatus used in FIG.

FIG. 4 is a diagram showing a pattern formation state of FIG. 3;

FIG. 5 is a diagram showing a light intensity characteristic of general ultraviolet laser light.

FIG. 6 is a diagram showing a light intensity characteristic of ultraviolet laser light applied to the present invention.

FIG. 7 is a diagram showing another embodiment of the present invention.

FIG. 8 is a diagram showing another embodiment of the present invention.

FIG. 9 is a diagram shown for explaining the outline of a reflector to which the present invention is applied.

10 is a diagram showing a positional relationship between the reflector of FIG. 9 and a power feeding unit.

[Explanation of symbols]

 10, 13 ... Skin material. 11 ... Copper film layer. 12 ... Honeycomb core. 14 ... Reflector body. 20 XY table. 21 ... Laser light source. 22 ... Laser light irradiation part. 22a ... Transparent window. 22b, 22c ... Lenses. 23, 30 ... Copper film layer pattern. 24 ... Table drive unit. 25 ... Optical system drive section. 26 ... Control unit. 30a ... slit.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kuniaki Goto 33 Shinisogo-cho, Isogo-ku, Yokohama-shi, Kanagawa Inside the Toshiba Industrial Technology Research Institute, Inc. (72) Inventor Shigeki Matsunaka Shinisogo-cho, Isogo-ku, Yokohama-shi, Kanagawa No. 33 Incorporated company Toshiba Production Engineering Laboratory

Claims (5)

[Claims] 1. A first step of forming a metal film layer on a reflecting surface of a reflector main body formed of an insulating substrate, and irradiating the metal film layer on the insulating substrate with an ultraviolet laser beam to remove the metal film layer. And a second step of forming a metal film layer pattern on the reflective surface of the insulating substrate. 2. A first step of forming a metal film layer on a reflecting surface of a reflector main body formed of an insulating substrate; and irradiating the metal film layer on the insulating substrate with an ultraviolet laser beam to slit the metal film layer. A second step of forming a metal film layer pattern by performing slit processing for removing the metal film in a uniform shape and peeling the metal film layer between the slits. 3. In the second step, the light width of the ultraviolet laser light is converted into substantially parallel light, the metal film layer is irradiated, and the metal film layer is removed to form a metal film pattern. The method for manufacturing the reflector according to claim 1, wherein the reflector is manufactured. 4. In the second step, the laser light irradiation part of the ultraviolet laser light and the insulating substrate side are three-dimensionally drive-controlled to irradiate the metal film layer on the insulating substrate to the metal film. A pattern is formed, wherein the pattern is formed.
A method for manufacturing a reflector according to any one of 1. 5. The method for manufacturing a reflector according to claim 1, wherein the metal film layer is a copper film layer.