JPH0959022A - Production of manganese-based perovskite oxide thin film - Google Patents

Production of manganese-based perovskite oxide thin film

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Publication number
JPH0959022A
JPH0959022A JP23592595A JP23592595A JPH0959022A JP H0959022 A JPH0959022 A JP H0959022A JP 23592595 A JP23592595 A JP 23592595A JP 23592595 A JP23592595 A JP 23592595A JP H0959022 A JPH0959022 A JP H0959022A
Authority
JP
Japan
Prior art keywords
thin film
solution
metal
alkoxide
based perovskite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP23592595A
Other languages
Japanese (ja)
Inventor
Shingo Katayama
真吾 片山
Noriko Yamada
紀子 山田
Ikuko Yoshinaga
郁子 吉永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP23592595A priority Critical patent/JPH0959022A/en
Publication of JPH0959022A publication Critical patent/JPH0959022A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To obtain the subject oxide thin film having extremely great magnetic resistance effect. SOLUTION: This thin film consisting of an Mn-based perovskite oxide of the formula AMnO3 (A is at least one metal selected from La, Pr, Ca and Sr) is obtained by coating a substrate with an organic solvent solution containing an alkoxide of the metal A and an Mn alkoxide or acetyl acetonate or a solution prepared by incorporating the above solution with water in such a proportion as to be <=1.5 based on the valence of the metal A followed by partial hydrolysis, and then by drying and baking the applied solution.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、巨大磁気抵抗効果
を有するMn系ペロフスカイト酸化物薄膜を製造する方
法に関するものである。
TECHNICAL FIELD The present invention relates to a method for producing a Mn-based perovskite oxide thin film having a giant magnetoresistive effect.

【0002】[0002]

【従来の技術】巨大磁気抵抗効果とは磁場をかけたとき
に電気抵抗が大きく変化することを言い、金属人工格子
Fe/Crにおいて発見された。
2. Description of the Related Art The giant magnetoresistive effect means that electric resistance changes greatly when a magnetic field is applied, and it was discovered in a metallic artificial lattice Fe / Cr.

【0003】これについでCo/Cuそして多くの(F
e,Co,Ni,それらの合金)/(Cu,Ag,Au
などの貴金属あるいはCr,Ru等の遷移金属)人工格
子で巨大磁気抵抗効果が発見されている。
This is followed by Co / Cu and many (F
e, Co, Ni, their alloys) / (Cu, Ag, Au)
A giant magnetoresistive effect has been found in a noble metal such as or a transition metal such as Cr or Ru) artificial lattice.

【0004】現在、巨大磁気抵抗効果のメカニズムの研
究とともにその応用についての研究も盛んに行われてい
る。
At present, research on the mechanism of the giant magnetoresistive effect and its application are being actively conducted.

【0005】巨大磁気抵抗効果の応用については、軟磁
性巨大磁気抵抗効果を目的に保持力差や磁気異方性を利
用した巨大磁気抵抗多層薄膜の研究が進んでいる。
Regarding the application of the giant magnetoresistive effect, research on a giant magnetoresistive multilayer thin film utilizing a coercive force difference and magnetic anisotropy for the purpose of the soft magnetic giant magnetoresistive effect has been advanced.

【0006】高密度磁気記録の読みだし用磁気抵抗ヘッ
ドへの適用が有望視されているスピンバルブ巨大磁気抵
抗はその代表例である。
A typical example is a spin valve giant magnetoresistor, which is expected to be applied to a magnetoresistive head for reading high-density magnetic recording.

【0007】従来、巨大磁気抵抗効果は金属系において
見られたが、最近、酸化物系でも巨大磁気抵抗効果が発
見された(Nature,vol.373,No.2,
p.407―409(1995))。
Conventionally, the giant magnetoresistive effect has been observed in the metal system, but recently, the giant magnetoresistive effect was also found in the oxide system (Nature, vol. 373, No. 2,).
p. 407-409 (1995)).

【0008】発見されたMn系ペロフスカイト酸化物
は、磁場の印加により構造相転移を起こして大きな電気
抵抗変化が生じると考えられている。
It is believed that the discovered Mn-based perovskite oxide undergoes a structural phase transition upon application of a magnetic field, resulting in a large electrical resistance change.

【0009】前記酸化物は、酸化物、炭酸塩等を混合
し、仮焼(固相反応法)して作製した粉末を成形・焼成
して焼結体とし、さらにゾーンメルトして製造される。
The above oxide is produced by mixing oxides, carbonates, etc., calcining (solid phase reaction method), forming and firing a powder, which is then sintered, and further zone melted. .

【0010】[0010]

【発明が解決しようとする課題】Mn系ペロフスカイト
酸化物のバルクでは、小型化や他のデバイスと基板上で
組み合わせるのが困難であるため、巨大磁気抵抗効果を
利用した磁気センサー等の応用範囲が狭い。
The bulk of Mn-based perovskite oxide is difficult to miniaturize and combine with other devices on the substrate, so that the application range of magnetic sensors utilizing the giant magnetoresistive effect is limited. narrow.

【0011】Mn系ペロフスカイト酸化物の巨大磁気抵
抗効果の応用範囲を広げるためには、小型化や種々のパ
ターニングができる薄膜製造が望まれる。
In order to expand the application range of the giant magnetoresistive effect of the Mn-based perovskite oxide, it is desired to manufacture a thin film capable of miniaturization and various patterning.

【0012】しかし、従来の固相法はバルク形状を作製
できるが、薄膜の製造やそのパターニングはできないと
いう問題がある。
However, the conventional solid phase method can produce a bulk shape, but has a problem that a thin film cannot be produced or patterned.

【0013】また、固相法では反応温度が高いため、成
分の一部の蒸発による組成のずれや炉からの不純物の混
入による純度の低下を招く。
Further, in the solid phase method, since the reaction temperature is high, the composition shifts due to the evaporation of a part of the components, and the purity lowers due to the inclusion of impurities from the furnace.

【0014】一方、薄膜を製造する方法としてスパッタ
ーやCVD等の気相法が考えられるが、減圧や真空容器
等が必要となり反応装置が複雑になる。
On the other hand, a vapor phase method such as sputtering or CVD is conceivable as a method for producing a thin film, but decompression and a vacuum container are required, and the reaction apparatus becomes complicated.

【0015】さらに、巨大磁気抵抗効果を示すMn系ペ
ロフスカイトのような多成分系では、組成の制御が難し
くなる。
Further, in a multi-component system such as Mn-based perovskite which exhibits a giant magnetoresistive effect, it becomes difficult to control the composition.

【0016】本発明は、上記課題を解決するために創案
されたものであり、組成制御が容易で低温合成できるM
n系ペロフスカイト酸化物薄膜の製造方法を提供するこ
とを目的としている。
The present invention was devised in order to solve the above-mentioned problems, and it is easy to control the composition and to carry out low-temperature synthesis.
It is an object of the present invention to provide a method for producing an n-based perovskite oxide thin film.

【0017】[0017]

【課題を解決するための手段】本発明は、前記目的を達
成するためになされたものである。即ち、一般式AMn
3(但し、AはLa、Pr、Ca、Srの群から選ば
れる1種以上の金属からなる)で示されるペロフスカイ
ト型酸化物の金属AのアルコキシドとMnのアルコキシ
ドの有機溶媒溶液あるいは前記溶液に金属の原子価に対
して1.5以下の割合の水を添加して部分加水分解した
溶液を基板に塗布した後、乾燥・焼成してMn系ペロフ
スカイト酸化物薄膜を製造する。
The present invention has been made to achieve the above object. That is, the general formula AMn
Organic solvent solution of alkoxide of metal A and alkoxide of Mn of perovskite type oxide represented by O 3 (where A is one or more kinds of metal selected from the group of La, Pr, Ca and Sr) or the above solution Then, a solution of partially hydrolyzed water with a ratio of 1.5 or less with respect to the valence of the metal is applied to the substrate, dried and baked to produce a Mn-based perovskite oxide thin film.

【0018】あるいは、金属AのアルコキシドとMnの
アセチルアセトナートの有機溶媒溶液あるいは前記溶液
に金属の原子価に対して1.5以下の割合の水を添加し
て部分加水分解した溶液を基板に塗布した後、乾燥・焼
成してMn系ペロフスカイト酸化物薄膜を製造する。
Alternatively, a solution of an alkoxide of metal A and an acetylacetonate of Mn in an organic solvent or a solution obtained by partially hydrolyzing water by adding water in a ratio of 1.5 or less with respect to the valence of the metal is used as a substrate. After coating, it is dried and baked to produce a Mn-based perovskite oxide thin film.

【0019】金属アルコキシドのアルコキシ基として
は、特に限定しないが、例えば、メトキシ基、エトキシ
基、ブトキシ基、プロポキシ基、メトキシエトキシ基、
エトキシエトキシ基などを用いることができる。
The alkoxy group of the metal alkoxide is not particularly limited, and examples thereof include methoxy group, ethoxy group, butoxy group, propoxy group, methoxyethoxy group,
An ethoxy ethoxy group or the like can be used.

【0020】また、アルコキシ基の一部をβ―ジケト
ン、β―ケトエステル、アルカノールアミン、アルキル
アルカノールアミン、有機酸等で置換したアルコキシド
誘導体も使用できる。
Further, an alkoxide derivative in which a part of the alkoxy group is substituted with β-diketone, β-ketoester, alkanolamine, alkylalkanolamine, organic acid or the like can also be used.

【0021】金属アルコキシドやアセチルアセトナート
を溶解する有機溶媒としては、本系の金属アルコキシド
が可溶であれば特に限定されないが、メタノール、エタ
ノール、ブタノール、プロパノール、メトキシエタノー
ル、エトキシエタノール等のアルコール、エーテル、ベ
ンゼン、トルエン、キシレン等を用いることができる。
The organic solvent for dissolving the metal alkoxide or acetylacetonate is not particularly limited as long as the metal alkoxide of the present system is soluble, but alcohols such as methanol, ethanol, butanol, propanol, methoxyethanol and ethoxyethanol, Ether, benzene, toluene, xylene and the like can be used.

【0022】金属アルコキシドやアセチルアセトナート
の溶液をそのまま基板に塗布できるが、水を加えて部分
加水分解した溶液を基板に塗布しても良い。その際、添
加する水の量は、系内の金属の原子価に対して1.5以
下が望ましい。1.5を越えると溶液中に析出物が生じ
て均質な薄膜が作製できない。
The solution of the metal alkoxide or acetylacetonate can be directly applied to the substrate, but a solution obtained by partially hydrolyzing water may be applied to the substrate. At that time, the amount of water added is preferably 1.5 or less with respect to the valence of the metal in the system. If it exceeds 1.5, precipitates are generated in the solution and a homogeneous thin film cannot be produced.

【0023】基板への塗布は、スプレーコート法、ディ
ップコート法、スピンコート法等で行われる。
The coating on the substrate is performed by a spray coating method, a dip coating method, a spin coating method or the like.

【0024】[0024]

【実施例】本発明におけるMn系ペロフスカイト酸化物
薄膜の製造方法と、それによって得られたMn系ペロフ
スカイト酸化物薄膜について以下の実施例によって具体
的に説明する。ただし、本発明は、これらの実施例のみ
に限定されるものではない。
EXAMPLES The method for producing a Mn-based perovskite oxide thin film according to the present invention and the Mn-based perovskite oxide thin film obtained thereby will be specifically described by the following examples. However, the present invention is not limited to only these examples.

【0025】[0025]

【実施例1】金属Srを過剰の乾燥エタノールに加え、
加熱・還流して反応させ、Srエトキシドのエタノール
溶液を調製した。
Example 1 Metal Sr was added to excess dry ethanol,
The mixture was heated and refluxed for reaction to prepare an ethanol solution of Sr ethoxide.

【0026】前記溶液にLaイソプロポキシドおよびM
nエトキシドをLa1-xSrxMnO3(x=0.17)
の割合になるように加え、さらにエタノールと等量のエ
トキシエタノールを加えて、加熱・還流した。
La isopropoxide and M were added to the solution.
n ethoxide was replaced with La 1-x Sr x MnO 3 (x = 0.17)
And ethoxyethanol in the same amount as ethanol, and the mixture was heated and refluxed.

【0027】本溶液をSi基板にスピンコータで塗布
し、110℃で乾燥した。前記塗布・乾燥操作を5回繰
り返した後、800℃で2時間焼成して、La1-xSrx
MnO3ペロフスカイト薄膜を作製した。
This solution was applied to a Si substrate by a spin coater and dried at 110 ° C. After repeating the above-mentioned coating and drying operations 5 times, it is baked at 800 ° C. for 2 hours to obtain La 1-x Sr x.
A MnO 3 perovskite thin film was prepared.

【0028】図1に作製した薄膜のX線回折図を示す。
回折ピークからLa1-xSrxMnO3ペロフスカイト相
であることがわかる。図2に本薄膜の磁気抵抗の測定結
果を示す。磁場をかけると抵抗が急激に低下し、巨大磁
気抵抗効果を示した。
FIG. 1 shows an X-ray diffraction pattern of the produced thin film.
From the diffraction peak, it can be seen that the phase is La 1-x Sr x MnO 3 perovskite phase. FIG. 2 shows the measurement results of the magnetic resistance of this thin film. The resistance dropped sharply when a magnetic field was applied, showing a giant magnetoresistive effect.

【0029】[0029]

【実施例2】金属Caを過剰の乾燥エタノールに加え、
加熱・還流して反応させ、Srエトキシドのエタノール
溶液を調製した。前記溶液にPrイソプロポキシドおよ
びMnエトキシドをPr1-xCaxMnO3(x=0.
3)の割合になるように加え、さらにエタノールと等量
のエトキシエタノールおよび全金属と等モルのアセト酢
酸エチルを加えて加熱・還流した。
Example 2 Add metal Ca to excess dry ethanol,
The mixture was heated and refluxed for reaction to prepare an ethanol solution of Sr ethoxide. Pr isopropoxide and Mn ethoxide were added to the above solution in the form of Pr 1-x Ca x MnO 3 (x = 0.
In addition to the ratio of 3), ethoxyethanol in an amount equal to ethanol and ethyl acetoacetate in an equimolar amount to all metals were added, and the mixture was heated and refluxed.

【0030】前記溶液に全金属の原子価に対して1モル
倍の水を加えてさらに加熱・還流した。得られた溶液を
Si基板にスピンコータで塗布し、110℃で乾燥し
た。前記塗布・乾燥操作を5回繰り返した後、800℃
で2時間焼成して、Pr1-xCaxMnO3ペロフスカイ
ト薄膜を作製した。
Water was added to the above solution in an amount 1 mole times the valence of all metals, and the mixture was further heated and refluxed. The obtained solution was applied to a Si substrate with a spin coater and dried at 110 ° C. After repeating the coating and drying operation 5 times, 800 ° C
It was baked for 2 hours to prepare a Pr 1-x Ca x MnO 3 perovskite thin film.

【0031】図3に作製した薄膜のX線回折図を示す。
回折ピークからPr1-xCaxMnO3ペロフスカイト相
であることがわかる。図4に本薄膜の磁気抵抗の測定結
果を示す。磁場をかけると抵抗が急激に低下し、巨大磁
気抵抗効果を示した。
FIG. 3 shows an X-ray diffraction pattern of the produced thin film.
It can be seen from the diffraction peak that it is a Pr 1-x Ca x MnO 3 perovskite phase. FIG. 4 shows the measurement results of the magnetic resistance of this thin film. The resistance dropped sharply when a magnetic field was applied, showing a giant magnetoresistive effect.

【0032】[0032]

【発明の効果】本発明は、以上に示したように構成され
るので、以下に記載されるような効果を奏する。
Since the present invention is constructed as described above, it has the following effects.

【0033】本発明のMn系ペロフスカイト酸化物薄膜
の製造方法は、構成金属が均一混合された溶液から薄膜
が作製されるために、従来の固相法に比べより低温での
作製が可能となる。
In the method for producing a Mn-based perovskite oxide thin film of the present invention, since the thin film is produced from the solution in which the constituent metals are uniformly mixed, it can be produced at a lower temperature than the conventional solid phase method. .

【0034】これは、焼成装置等のエネルギー消費の節
約になるとともに高温における不純物進入を防ぐことに
なる。さらに、本法では、容易に薄膜が作製できるので
磁気センサーとして小型化でき、回路基板に直接作製で
きる。
This saves energy consumption of the firing apparatus and the like and prevents impurities from entering at high temperatures. Further, according to this method, a thin film can be easily produced, so that the magnetic sensor can be miniaturized and can be directly produced on a circuit board.

【図面の簡単な説明】[Brief description of drawings]

【図1】作製した薄膜のX線回折図である。FIG. 1 is an X-ray diffraction diagram of the produced thin film.

【図2】作製した薄膜の印加磁場による抵抗変化を示し
たグラフである。
FIG. 2 is a graph showing a resistance change of a manufactured thin film due to an applied magnetic field.

【図3】作製した薄膜のX線回折図である。FIG. 3 is an X-ray diffraction diagram of the produced thin film.

【図4】作製した薄膜の印加磁場による抵抗変化を示し
たグラフである。
FIG. 4 is a graph showing a resistance change of the manufactured thin film due to an applied magnetic field.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 一般式AMnO3(但し、AはLa、P
r、Ca、Srの群から選ばれる1種以上の金属からな
る)で示されるペロフスカイト型酸化物の薄膜を製造す
る方法において、金属AのアルコキシドとMnのアルコ
キシドの有機溶媒溶液あるいは前記溶液に金属の原子価
に対して1.5以下の割合の水を添加して部分加水分解
した溶液を基板に塗布した後、乾燥・焼成することを特
徴とするMn系ペロフスカイト酸化物薄膜の製造方法。
1. A general formula AMnO 3 (where A is La, P
In the method for producing a thin film of a perovskite-type oxide represented by one or more metals selected from the group consisting of r, Ca, and Sr), an organic solvent solution of an alkoxide of metal A and an alkoxide of Mn, or a metal in the solution. A method for producing a Mn-based perovskite oxide thin film, which comprises applying a partially hydrolyzed solution to the substrate by adding water in a ratio of 1.5 or less to the valence, and then drying and firing the solution.
【請求項2】 一般式AMnO3(但し、AはLa、P
r、Ca、Srの群から選ばれる1種以上の金属からな
る)で示されるペロフスカイト型酸化物の薄膜を製造す
る方法において、金属AのアルコキシドとMnのアセチ
ルアセトナートの有機溶媒溶液あるいは前記溶液に金属
の原子価に対して1.5以下の割合の水を添加して部分
加水分解した溶液を基板に塗布した後、乾燥・焼成する
ことを特徴とするMn系ペロフスカイト酸化物薄膜の製
造方法。
2. A general formula AMnO 3 (where A is La, P
In the method for producing a thin film of a perovskite-type oxide represented by (1 or more metals selected from the group consisting of r, Ca and Sr), an organic solvent solution of the alkoxide of metal A and acetylacetonate of Mn or the above solution. A method for producing a Mn-based perovskite oxide thin film, characterized in that water is added to the substrate at a ratio of 1.5 or less with respect to the valence of the metal, and the partially hydrolyzed solution is applied to the substrate, followed by drying and firing. .
JP23592595A 1995-08-23 1995-08-23 Production of manganese-based perovskite oxide thin film Withdrawn JPH0959022A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JPH0959022A true JPH0959022A (en) 1997-03-04

Family

ID=16993277

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Country Status (1)

Country Link
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6432474B1 (en) * 1998-06-29 2002-08-13 Sharp Kabushiki Kaisha Thin film of perovskite type manganese oxide process for producing the same thin film and an infrared sensing element using the same thin film
WO2004067447A1 (en) * 2003-01-31 2004-08-12 Nippon Soda Co., Ltd. Process for propuction of dispersoid having metal-oxygen linkages and dispersoid
WO2004069740A1 (en) * 2003-02-05 2004-08-19 Nippon Soda Co., Ltd. Metal alkoxide hydrolyzate
JP2005064502A (en) * 2003-08-13 2005-03-10 Sharp Corp High-temperature annealing of spin-coated pr1-xcaxmno3 thin film for rram application
US7622418B2 (en) 2002-07-09 2009-11-24 Daihatsu Motor Company, Ltd. Method for producing exhaust gas purifying catalyst

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6432474B1 (en) * 1998-06-29 2002-08-13 Sharp Kabushiki Kaisha Thin film of perovskite type manganese oxide process for producing the same thin film and an infrared sensing element using the same thin film
US7622418B2 (en) 2002-07-09 2009-11-24 Daihatsu Motor Company, Ltd. Method for producing exhaust gas purifying catalyst
WO2004067447A1 (en) * 2003-01-31 2004-08-12 Nippon Soda Co., Ltd. Process for propuction of dispersoid having metal-oxygen linkages and dispersoid
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