JPH0946041A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPH0946041A
JPH0946041A JP19023295A JP19023295A JPH0946041A JP H0946041 A JPH0946041 A JP H0946041A JP 19023295 A JP19023295 A JP 19023295A JP 19023295 A JP19023295 A JP 19023295A JP H0946041 A JPH0946041 A JP H0946041A
Authority
JP
Japan
Prior art keywords
conductor
resin sheet
synthetic resin
conductor bump
conductive metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19023295A
Other languages
Japanese (ja)
Inventor
Fumitoshi Ikegaya
文敏 池ケ谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP19023295A priority Critical patent/JPH0946041A/en
Publication of JPH0946041A publication Critical patent/JPH0946041A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To adopt constitution that a rigid laminated unitary body is formed and the tip part of a conductor bum is directly connected to a conductive metal foil, by achieving no-oxidation of the entire surface of the conductive metal foil in contact with the tip part of the conductor bump penetrating a synthetic-resin-based sheet, and roughening the surface. SOLUTION: A printed wiring board comprises a laminated element 7 wherein the tip part of a conductor bump 2 is protruding from the surface of a synthetic-resin- based sheet 3. One main surface is reduced and processed beforehand at the protruding surface. The rouphened surface is made to face, and a copper foil 8 is laminated and arranged. A polyimide-resin-based film as a protecting film 9 is laminated and arranged on the copper foil 8 and heated. With the film being compressed, the protecting film 9 is cooled and released. A double-surface copper-foil laminate layer 10, whose both surfaces are electrically connected, is formed. The copper foil 8 is minutely bonded to the surface of the synthetic-resin-based sheet 3 so as to form a unitary body. At the same time, the tip part of the conductor bump 2 penetrated into the synthetic-resin-based sheet 3 in contact with the surface of the copper foil 8 undergoes plastic deformation, and the same plane is formed. Therefore, the constitution that the tip part of the conductor bump is directly connected to the conductive metal foil can be adopted.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は印刷配線板の製造方
法に係り、さらに詳しくは配線層間を信頼性の高い導体
配線部で接続する印刷配線板を工数の低減を図りなが
ら、歩留まり良好に製造し得る方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a printed wiring board, and more particularly, to a printed wiring board in which wiring layers are connected by a highly reliable conductor wiring portion with good yield while reducing the number of steps. About possible ways.

【0002】[0002]

【従来の技術】両面型印刷配線板もしくは多層型印刷配
線板においては、両面導電パターンなどの配線層間の電
気的な接続を、次のようにして行っている。たとえば両
面型印刷配線板の場合は、両面銅箔張り基板の所定位置
に穴明け加工(穿設加工)を施し、穿設した穴の内壁面
を含め、全面に化学メッキ処理を施してから、電気メッ
キ処理で厚付けし、穴の内壁面の金属層を厚くして信頼
性を高め、配線層間の電気的な接続を行っている。
2. Description of the Related Art In a double-sided printed wiring board or a multi-layered printed wiring board, electrical connection between wiring layers such as double-sided conductive patterns is made as follows. For example, in the case of a double-sided printed wiring board, perforation processing (perforation processing) is performed at a predetermined position on the double-sided copper foil-clad substrate, and chemical plating treatment is performed on the entire surface including the inner wall surface of the perforated hole, The metal layer on the inner wall surface of the hole is thickened by electroplating to improve reliability and electrically connect the wiring layers.

【0003】また、多層印刷配線板の場合は、基板両面
に張られた銅箔をそれぞれパターニングした後、そのパ
ターニング面上に、絶縁シート(たとえばプリプレグ)
を介して銅箔を積層・配置し、加熱加圧により一体化し
た後、前述の両面型印刷配線板のときと同様に、穴明け
加工およびメッキ処理による配線層間の電気的な接続、
および表面銅箔についてのパターニングによって、多層
型印刷配線板を得ている。なお、より配線層の多い多層
型印刷配線板の場合は、中間に介挿させる両面型印刷配
線板数を増やす方式で製造できる。
Further, in the case of a multilayer printed wiring board, after patterning copper foils stretched on both sides of the substrate respectively, an insulating sheet (for example, prepreg) is formed on the patterned surface.
After stacking and arranging the copper foil via the, and integrating by heating and pressing, as in the case of the above-mentioned double-sided printed wiring board, electrical connection between wiring layers by drilling and plating,
A multilayer printed wiring board is obtained by patterning the surface copper foil. In the case of a multilayer printed wiring board having more wiring layers, it can be manufactured by a method of increasing the number of double-sided printed wiring boards inserted in the middle.

【0004】さらに、製造工程の簡略化を図ることがで
きる印刷配線板の製造方法として、次のような手段が知
られている。すなわち、円錐状などの導体バンプを形設
した支持基板面に、合成樹脂系シートおよび導電体箔を
積層配置し、この積層体の加熱加圧する。この加熱加圧
によって、前記導体バンプ先端部を導電体箔面に合成樹
脂系シートを貫挿・対接させて電気的な接続を構成した
後、導電体箔を配線パターニングするものである。この
手段の場合は、層間接続用の穴明け加工およびメッキに
よる導通化処理など省略できるだけでなく、前記穴明け
の省略化に伴う配線領域および実装領域も可能となるの
で注目されている。
Further, the following means are known as a method of manufacturing a printed wiring board which can simplify the manufacturing process. That is, a synthetic resin sheet and a conductor foil are laminated and arranged on the surface of a support substrate on which conductor bumps having a conical shape are formed, and the laminate is heated and pressed. By this heating and pressing, the tip of the conductor bump is inserted and contacted with a synthetic resin sheet on the conductor foil surface to form an electrical connection, and then the conductor foil is subjected to wiring patterning. In the case of this means, not only the drilling process for interlayer connection and the conduction process by plating can be omitted, but also the wiring region and the mounting region accompanying the omission of the drilling can be omitted, and therefore, attention is paid.

【0005】[0005]

【発明が解決しようとする課題】上記、説明したよう
に、配線層間の電気的な接続にメッキ法を利用する印刷
配線板の製造方法においては、基板に配線層間の電気的
な接続用の穴明け(穿穴)加工、穿設した穴内壁面を含
めたメッキ処理工程などを要し、印刷配線板の製造工程
が冗長であるとともに、工程管理も煩雑であるという欠
点がある。
As described above, in a method of manufacturing a printed wiring board that utilizes a plating method for electrical connection between wiring layers, holes for electrical connection between wiring layers are formed in a substrate. It has the drawbacks that it requires drilling (drilling) processing, plating processing including the hole inner wall surface, and the manufacturing process of the printed wiring board is redundant and process management is complicated.

【0006】一方、 (a)導体バンプ先端部の絶縁体層
(合成樹脂系シート)貫挿、 (b)対向する導電体層(導
電体箔や配線パターン)面への対接、 (c)対接面での塑
性変形による密着・圧接,電気的な接続を骨子とする印
刷配線板の製造方法の場合にも、次のような問題が懸念
される。すなわち、この製造方法の場合は、一般的に、
配線層と絶縁体層との密着性、もしくは所要の密着力を
確保するためする、素材としての導電体箔(たとえば銅
箔)に、表面を黒化処理したものが使用される。この表
面を黒化処理した銅箔は、黒化処理、換言すると薄い酸
化層の生成によって、表面粗化されているので、前記密
着力の確保が可能になるからである。
On the other hand, (a) insertion of an insulator layer (synthetic resin sheet) at the tip of the conductor bump, (b) contact with the opposing conductor layer (conductor foil or wiring pattern) surface, (c) In the case of a method for manufacturing a printed wiring board, which has the skeleton of close contact / pressure contact due to plastic deformation on the contact surface, and electrical connection, the following problems are feared. That is, in the case of this manufacturing method, in general,
A conductor foil (for example, a copper foil) as a material, which has a blackened surface, is used to secure the adhesiveness between the wiring layer and the insulating layer or a required adhesive force. This is because the copper foil having its surface blackened has its surface roughened by the blackening treatment, in other words, the formation of a thin oxide layer, so that the adhesion can be secured.

【0007】しかし、前記黒化=薄い酸化層の生成は、
結果として絶縁層の介在を意味することになり、前記導
体バンプ先端部の対接・塑性変形における電気的な接続
に問題を残す。つまり、一般的には、加熱加圧による圧
着・対接の過程で、薄い酸化層は破損されて所要の電気
的な接続を形成するが、部分的に薄い酸化層の破損が不
十分なことも起こる恐れがあり、信頼性の点で懸念され
る。
However, the blackening = the formation of a thin oxide layer is
As a result, it means the interposition of an insulating layer, and a problem remains in the electrical connection in the contacting / plastic deformation of the conductor bump tips. That is, in general, the thin oxide layer is damaged in the process of pressing and contacting by heating and pressing to form the required electrical connection, but the damage of the thin oxide layer is partially insufficient. There is also a possibility that it will occur, and there is concern about reliability.

【0008】本発明は上記事情に対処してなされたもの
で、簡易なプロセスで、より高密度の配線および実装な
ども可能で、より信頼性の高い層間導体配線部を備えた
印刷配線板の製造方法の提供を目的とする。
The present invention has been made in view of the above circumstances, and provides a printed wiring board having a more reliable interlayer conductor wiring portion, which enables a higher density wiring and mounting by a simple process. The purpose is to provide a manufacturing method.

【0009】[0009]

【課題を解決するための手段】請求項1の発明は、導電
体層面の所定位置に導体バンプを形成する工程と、前記
導体バンプ形成面に合成樹脂系シ−トを積層配置する工
程と、前記合成樹脂系シ−ト面上に、この合成樹脂系シ
−トに対接する面が非酸化で、かつ粗面化された導電性
金属箔を積層配置する工程と、前記積層体を加圧して合
成樹脂系シ−トの厚さ方向に、前記導体バンプを貫挿さ
せ、導体バンプ先端部を塑性変形により対向する導電性
金属箔面に接続させて貫通型の導体配線部を形成する工
程と、前記導電性金属箔を配線パターニングする工程と
を具備することを特徴とする印刷配線板の製造方法であ
る。
According to a first aspect of the present invention, there is provided a step of forming a conductor bump at a predetermined position on a conductor layer surface, and a step of laminating a synthetic resin sheet on the conductor bump formation surface. On the surface of the synthetic resin sheet, a step of laminating a roughened conductive metal foil whose surface facing the synthetic resin sheet is non-oxidized and roughened, and pressing the laminated body A step of inserting the conductor bump in the thickness direction of the synthetic resin sheet and connecting the tip end of the conductor bump to the opposing conductive metal foil surface by plastic deformation to form a through-type conductor wiring portion. And a step of subjecting the conductive metal foil to wiring patterning, which is a method for manufacturing a printed wiring board.

【0010】請求項2の発明は、導電体層面の所定位置
に導体バンプを形成する工程と、前記導体バンプ形成面
に合成樹脂系シ−トを積層配置する工程と、前記合成樹
脂系シ−ト面上に、この合成樹脂系シ−トに対接する面
が黒化・還元処理された導電性金属箔を積層配置する工
程と、前記積層体を加圧して合成樹脂系シ−トの厚さ方
向に、前記導体バンプを貫挿させ、導体バンプ先端部を
塑性変形により対向する導電性金属箔面に接続させて貫
通型の導体配線部を形成する工程と、前記導電性金属箔
を配線パターニングする工程とを具備することを特徴と
する印刷配線板の製造方法である。
According to a second aspect of the present invention, a step of forming a conductor bump at a predetermined position on the surface of the conductor layer, a step of laminating a synthetic resin sheet on the conductor bump forming surface, and a step of forming the synthetic resin sheet. A step of laminating and placing a conductive metal foil whose surface facing the synthetic resin sheet is blackened / reduced on the sheet surface, and pressing the laminated body to increase the thickness of the synthetic resin sheet. In the depth direction, the step of inserting the conductor bump and connecting the tip of the conductor bump to the opposite conductive metal foil surface by plastic deformation to form a through-type conductor wiring portion; and wiring the conductive metal foil. And a step of patterning the printed wiring board.

【0011】請求項3の発明は、導電体層面の所定位置
に導体バンプを形成する工程と、前記導体バンプ形成面
に合成樹脂系シ−トを積層配置する工程と、前記合成樹
脂系シ−ト面上に、この合成樹脂系シ−トに対接する面
がメッキ処理で粗面化された導電性金属箔を積層配置す
る工程と、前記積層体を加圧して合成樹脂系シ−トの厚
さ方向に、前記導体バンプを貫挿させ、導体バンプ先端
部を塑性変形により対向する導電性金属箔面に接続させ
て貫通型の導体配線部を形成する工程と、前記導電性金
属箔を配線パターニングする工程とを具備することを特
徴とする印刷配線板の製造方法である。
According to a third aspect of the present invention, a step of forming a conductor bump at a predetermined position on the surface of the conductor layer, a step of laminating a synthetic resin sheet on the surface of the conductor bump formation, and a step of forming the synthetic resin sheet. A step of laminating and placing a conductive metal foil whose surface facing the synthetic resin sheet is roughened by a plating treatment on the sheet surface, and pressing the laminated body to press the synthetic resin sheet. In the thickness direction, a step of inserting the conductor bump, connecting the tip of the conductor bump to the opposing conductive metal foil surface by plastic deformation to form a through-type conductor wiring portion, and the conductive metal foil, A method of manufacturing a printed wiring board, comprising: a wiring patterning step.

【0012】本発明において、導体バンプを形設する導
電体層としては、導電性金属箔、もしくは導電体パター
ンなどが挙げられ、その形状はとくに限定されないし、
さらに導体バンプは、一主面だけでなく、両主面にそれ
ぞれ形設した形のものを用いてもよい。一方、絶縁体層
を介して積層する導電性金属箔も同様に、1枚のシー
ト、もしくはパターン化されたものでもよい。しかし導
電性金属箔の場合は、絶縁体層に接する主面(絶縁体層
を貫挿する導体バンプ先端部が対接する主面)がいずれ
も非酸化状態で、かつ粗面化している必要がある。
In the present invention, the conductor layer forming the conductor bump may be a conductive metal foil or a conductor pattern, and its shape is not particularly limited.
Further, the conductor bumps may be formed not only on one main surface but also on both main surfaces. On the other hand, the conductive metal foil laminated via the insulating layer may also be a single sheet or patterned one. However, in the case of a conductive metal foil, it is necessary that the main surface in contact with the insulator layer (the main surface with which the tip of the conductor bump that penetrates the insulator layer contacts) is non-oxidized and roughened. is there.

【0013】そして、この非酸化状態・粗面化は、たと
えば微細な溝形成加工もしくは微細な凹凸面化加工後の
還元処理、黒化処理後の還元処理、あるいは還元処理面
へのメッキ処理(無電解メッキ処理および電解メッキ処
理のすくなくともいずれ化一方)などで行われる。
This non-oxidized state / roughening is performed, for example, by a reduction treatment after fine groove formation processing or a fine uneven surface treatment, a reduction treatment after blackening treatment, or a plating treatment on the reduction treated surface ( The electroless plating process and the electrolytic plating process are at least one of the two).

【0014】本発明において、導体バンプは、たとえば
銀,金,銅,半田粉などの導電性粉末、これらの合金粉
末もしくは複合(混合)金属粉末と、バインダー樹脂成
分との混合で調製された導電性組成物で形成される。そ
して、バインダー樹脂成分としては、たとえばポリカー
ボネート樹脂,ポリスルホン樹脂,ポリエステル樹脂,
フェノキシ樹脂,フェノール樹脂,ポリイミド樹脂など
が挙げられる。また、メチルメタアクリレ−ト、ジエチ
ルメチルアクリレ−ト、トリメチロ−ルプロパントリア
クリレ−ト、ジエチレングリコ−ルジエチルアクリレ−
ト、アクリル酸メチル、アクリル酸エチル、アクリル酸
ジエチレングリコ−ルエトキシレ−ト、ε−カプロラク
トン変性ジペンタエリスリト−ルのアクリレ−トなどの
アクリル酸エステル、メタアクリス酸エステルなどの紫
外線硬化型樹脂もしくは電子線照射で硬化する樹脂も使
用できる。なお、前記バンプ群の形設は、たとえば比較
的厚いメタルマスクを用いた印刷法により、アスペクト
比の高いバンプを形成でき、そのバンプ群の高さは一般
的に、 100〜 400μm 程度が望ましく、さらにバンプ群
の高さは、一層の合成樹脂系シートを貫通し得る高さ、
もしくは複数層の合成樹脂系シートを貫通し得る高さと
が適宜混在していてもよい。
In the present invention, the conductor bump is made of a conductive powder prepared by mixing conductive powder such as silver, gold, copper and solder powder, an alloy powder or a composite (mixed) metal powder of these with a binder resin component. Formed of a sex composition. As the binder resin component, for example, polycarbonate resin, polysulfone resin, polyester resin,
Examples include phenoxy resin, phenol resin, and polyimide resin. Further, methyl methacrylate, diethyl methyl acrylate, trimethylol propane triacrylate, diethylene glycol diethyl acrylate.
UV ray-curable resin or electron beam such as acrylic acid ester, methacrylic acid ester, methyl acrylate, ethyl acrylate, acrylic acid diethylene glycol ethoxylate, ε-caprolactone modified dipentaerythritol acrylate, etc. A resin that cures upon irradiation can also be used. The bump group can be formed by, for example, a printing method using a relatively thick metal mask to form a bump having a high aspect ratio, and the height of the bump group is generally preferably 100 to 400 μm. Furthermore, the height of the bump group is such that it can penetrate one layer of synthetic resin sheet,
Alternatively, the height that can penetrate a plurality of layers of the synthetic resin sheet may be appropriately mixed.

【0015】本発明において、導体バンプを貫挿させ、
貫通型の導体配線部を形成する絶縁体層(合成樹脂系シ
ート)としては、たとえば熱可塑性樹脂フイルム(シー
ト)が挙げられ、またその厚さは50〜 800μm 程度が好
ましい。ここで、熱可塑性樹脂シートとしては、たとえ
ばポリカーボネート樹脂,ポリスルホン樹脂,熱可塑性
ポリイミド樹脂,4フッ化ポリエチレン樹脂,6フッ化
ポリプロピレン樹脂,ポリエーテルエーテルケトン樹脂
などのシート類が挙げられる。また、硬化前の状態に保
持される熱硬化性樹脂シートも使用でき、このような熱
硬化性樹脂シートとしては、エポキシ樹脂,ビスマレイ
ミドトリアジン樹脂,ポリイミド樹脂,フェノール樹
脂,ポリエステル樹脂,メラミン樹脂などが挙げられ、
さらに、ブタジェンゴム,ブチルゴム,天然ゴム,ネオ
プレンゴム,シリコーンゴムなどの生ゴムのシート類も
使用し得る。これら合成樹脂は、単独でもよいが、絶縁
性無機物や有機物系の充填物を含有してもよく、さら
に、ガラスクロスやマット、有機合成繊維布やマット、
あるいは紙などの補強材と組み合わせて成るシートであ
ってもよい。
In the present invention, a conductor bump is inserted,
Examples of the insulator layer (synthetic resin sheet) forming the through-type conductor wiring portion include a thermoplastic resin film (sheet), and the thickness thereof is preferably about 50 to 800 μm. Here, examples of the thermoplastic resin sheet include sheets such as polycarbonate resin, polysulfone resin, thermoplastic polyimide resin, polyethylene tetrafluoride resin, polypropylene hexafluoride resin, and polyether ether ketone resin. Further, a thermosetting resin sheet that is kept in a state before curing can also be used, and examples of such a thermosetting resin sheet include epoxy resin, bismaleimide triazine resin, polyimide resin, phenol resin, polyester resin, melamine resin, etc. ,
Furthermore, raw rubber sheets such as butadiene rubber, butyl rubber, natural rubber, neoprene rubber, and silicone rubber may be used. These synthetic resins may be used alone or may contain an insulating inorganic or organic filler, and further, glass cloth or mat, organic synthetic fiber cloth or mat,
Alternatively, it may be a sheet formed by combining with a reinforcing material such as paper.

【0016】本発明においては、導体バンプを形設した
導電体層、たとえば導電性金属箔主面に、絶縁体層など
を積層配置して成る積層体を加熱して加圧するとき、プ
レスなどの加圧体との間に、寸法や変形の少ない金属フ
イルム、もしくは耐熱性樹脂板シートなどを介挿させて
もよく、また、積層体の加圧に当たり、加熱して合成樹
脂系シートの樹脂分が柔らかくなった状態で加圧し、導
体バンプを貫挿させると、より容易に導体バンプの貫挿
による層間接続を達成できる。
In the present invention, when a conductor layer having conductor bumps formed thereon, for example, a main surface of a conductive metal foil, is laminated with an insulator layer and the like to heat and press, a press or the like is used. A metal film with little size or deformation, or a heat-resistant resin plate sheet may be inserted between the pressure body and the resin component of the synthetic resin sheet when heated to press the laminate. When the conductor bumps are pressed in a softened state to insert the conductor bumps, it is possible to more easily achieve interlayer connection by inserting the conductor bumps.

【0017】請求項1の発明では、合成樹脂系シ−トを
貫挿する導体バンプ先端部の対接する導電性金属箔全面
が、非酸化で、かつ粗面化されているため、所要の密着
力によって強固な積層一体化を形成できるだけでなく、
導体バンプ先端部も導電性金属箔面に直接(絶縁層を介
在せずに)接続した構成を確実に採ることになる。つま
り、全体的に強固に一体化し、また、信頼性の高い配線
層間の電気的な接続を備えた印刷配線板を歩留まりよく
提供できる。
According to the first aspect of the present invention, since the entire surface of the conductive metal foil, which is in contact with the tip of the conductor bump and which penetrates the synthetic resin sheet, is non-oxidized and roughened, a required adhesion is obtained. Not only can a strong laminated unity be formed by force, but
The tip portion of the conductor bump also surely adopts a configuration in which it is directly connected (without an insulating layer) to the surface of the conductive metal foil. That is, it is possible to provide a printed wiring board that is firmly integrated as a whole and that has a highly reliable electrical connection between wiring layers with high yield.

【0018】請求項2の発明では、合成樹脂系シ−トを
貫挿する導体バンプ先端部の対接する導電性金属箔全面
が、黒化・還元処理によって、非酸化・粗面化を有して
いるため、所要の密着力によって、容易に強固な積層一
体化を形成できるだけでなく、導体バンプ先端部も導電
性金属箔面に直接(絶縁層を介在せずに)接続した構成
を確実に採ることになる。つまり、全体的に強固に一体
化し、また、信頼性の高い配線層間の電気的な接続を備
えた印刷配線板を、より容易かつ歩留まりよく提供でき
る。
According to the second aspect of the present invention, the entire surface of the conductive metal foil, which is in contact with the tip of the conductor bump and which penetrates the synthetic resin sheet, is non-oxidized and roughened by the blackening / reduction treatment. Therefore, not only can you easily form a strong laminated integration with the required adhesion, but also ensure that the tip of the conductor bump is directly connected (without an insulating layer) to the conductive metal foil surface. Will be taken. That is, it is possible to provide a printed wiring board that is firmly integrated as a whole and that has highly reliable electrical connection between wiring layers more easily and with high yield.

【0019】請求項3の発明では、合成樹脂系シ−トを
貫挿する導体バンプ先端部の対接する導電性金属箔全面
が、メッキ処理によって、非酸化・粗面化を有している
ため、所要の密着力によって、容易に強固な積層一体化
を形成できるだけでなく、導体バンプ先端部も導電性金
属箔のメッキ面に直接(絶縁層を介在せずに)接続した
構成を確実に採ることになる。つまり、全体的に強固に
一体化し、また、信頼性の高い配線層間の電気的な接続
を備えた印刷配線板を、より容易かつ歩留まりよく提供
できる。
According to the third aspect of the invention, the entire surface of the conductive metal foil, which is in contact with the tip of the conductor bump and which penetrates the synthetic resin sheet, is non-oxidized and roughened by plating. , In addition to easily forming a strong laminated integration with the required adhesion, the tip of the conductor bump is connected directly to the plated surface of the conductive metal foil (without interposing an insulating layer). It will be. That is, it is possible to provide a printed wiring board that is firmly integrated as a whole and that has highly reliable electrical connection between wiring layers more easily and with high yield.

【0020】[0020]

【発明の実施の形態】以下図1 (a)〜 (c),図2 (a)〜
(e)および図3 (a)〜 (c)を参照して本発明の実施例を
説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, FIGS. 1 (a) to (c) and 2 (a) to
An embodiment of the present invention will be described with reference to (e) and FIGS. 3 (a) to 3 (c).

【0021】実施例1 図1 (a)〜 (c)および図2 (a)〜 (d)はこの実施例の実
施態様を模式的に示すものである。
Example 1 FIGS. 1 (a) to 1 (c) and 2 (a) to 2 (d) schematically show an embodiment of this example.

【0022】先ず、導電体層1として印刷配線板の製造
に一般的に使用されている厚さ35μm の電解銅箔(導電
性金属箔)を、導電性ペーストとしてポリエーテルサル
ホンをバインダーとした銀系導電性ペースト(商品名,
ユニメック H9141,北陸塗料KK製)を、また、厚さ 200
μm のステンレス鋼板の所定箇所に径 0.3mmの穴を明け
たメタルマスクをそれぞれ用意した。
First, an electrolytic copper foil (conductive metal foil) having a thickness of 35 μm, which is generally used in the production of printed wiring boards, is used as the conductive layer 1, and a polyether sulfone is used as a binder as a conductive paste. Silver-based conductive paste (trade name,
Unimec H9141, made by Hokuriku Paint KK) and thickness 200
Metal masks with holes of 0.3 mm in diameter were prepared at predetermined locations on a μm stainless steel plate.

【0023】次に、前記銅箔1面に、メタルマスクを位
置決め配置し、導電性ペーストをスクリーン印刷した。
この印刷した導電性ペーストが乾燥後、前記メタルマス
クを同一位置に位置決め配置,導電性ペーストのスクリ
ーン印刷,乾燥の工程を3回繰り返して、図1 (a)に断
面的に示すごとく、高さ約 200μm の導体バンプ2を銅
箔1面に形設した。
Next, a metal mask was positioned and arranged on the surface of the copper foil 1, and a conductive paste was screen-printed.
After the printed conductive paste is dried, the steps of positioning the metal mask at the same position, screen-printing the conductive paste, and drying are repeated three times, and as shown in a sectional view in FIG. A conductor bump 2 of about 200 μm was formed on one surface of the copper foil.

【0024】その後、予め用意しておいた厚さ 200μm
の合成樹脂系シート(ガラスクロスにエポキシ樹脂を含
浸被着させたもの)3を、前記銅箔1の導体バンプ2形
設面に位置決め配置した。そして、図1 (b)に断面的に
示すごとく、前記合成樹脂系シート3面上に、厚さ15μ
m のアルミ箔4,厚さ 3mm程度のシリコーンゴム板(被
押圧板)5および当て板6aを順次配置する一方、銅箔1
の裏面側に当て板6bを配置して、加熱・加圧・冷却機構
付きプレス装置にセットし、加圧せずに加温した。 120
℃に昇温した時点で、 2 MPaの樹脂圧を加えて1次加圧
したまま冷却してから取り出したところ、図1 (c)に断
面的に示すごとく、銅箔1面に形設した導体バンプ2の
先端部が、そのままの形で位置ズレなど起こさずに合成
樹脂系シート3およびアルミ箔4を貫挿したアルミ箔付
き積層素材が得られた。
Thereafter, a thickness of 200 μm prepared in advance
The synthetic resin sheet 3 (glass cloth impregnated with epoxy resin) 3 was positioned on the conductor bump 2 forming surface of the copper foil 1. Then, as shown in a sectional view in FIG. 1 (b), a thickness of 15 μm is formed on the surface of the synthetic resin sheet 3.
An aluminum foil of m 4, a silicone rubber plate (pressed plate) 5 with a thickness of about 3 mm, and a contact plate 6a are sequentially arranged, while a copper foil 1
The backing plate 6b was placed on the back surface side of, and set in a press device with a heating / pressurizing / cooling mechanism to heat without pressurizing. 120
When the temperature was raised to ℃, a resin pressure of 2 MPa was applied, and the product was cooled with the primary pressure applied and then taken out. As shown in the cross-sectional view in FIG. 1 (c), it was formed on one surface of the copper foil. A laminated material with an aluminum foil was obtained by inserting the synthetic resin sheet 3 and the aluminum foil 4 in the same shape as the tip of the conductor bump 2 without causing positional deviation.

【0025】次いで、前記アルミ箔付き積層素材からア
ルミ箔4を剥がしとり、導体バンプ2先端部が合成樹脂
系シート3面から突出した積層素材7とした。この積層
素材7の導体バンプ2先端部が突出した面に、図2 (a)
に断面的に示すごとく、予め一主面が還元処理され、か
つ粗面化された面を対向させて、厚さ35μm の銅箔8を
積層配置し、さらに、前記銅箔8上に保護膜9としてポ
リイミド樹脂系フィルムを積層配置して、プレス装置に
セット・加熱し、 2 MPaの樹脂圧を作用させてから、さ
らに、 170℃で 1時間保持し、加圧したまま冷却して取
り出し、保護膜9を剥離して、図2 (b)に断面的に示す
ような、両面間が電気的に接続された両面銅箔積層板10
を得た。この両面銅箔積層板10の断面を観察したとこ
ろ、合成樹脂系シート3面に対して銅箔8が緻密に接着
・一体化するとともに、合成樹脂系シート3を貫挿した
導体バンプ2の銅箔8面に対接した先端部は、塑性変形
(潰された形)し、同一平面を成して銅箔8面に接続し
ていた。
Next, the aluminum foil 4 was peeled off from the laminated material with the aluminum foil to obtain a laminated material 7 in which the tips of the conductor bumps 2 were projected from the surface of the synthetic resin sheet 3. On the surface of the laminated material 7 where the tip of the conductor bump 2 is projected, as shown in FIG.
As shown in a sectional view in FIG. 1, one main surface is subjected to reduction treatment in advance and the roughened surfaces are opposed to each other, and a copper foil 8 having a thickness of 35 μm is laminated and arranged, and a protective film is further provided on the copper foil 8. As shown in Fig. 9, polyimide resin film is laminated and set, heated and pressed in a press machine, and a resin pressure of 2 MPa is applied. Then, it is kept at 170 ° C for 1 hour, cooled while being taken out, and taken out. The protective film 9 is peeled off, and a double-sided copper foil laminated plate 10 is electrically connected between both sides as shown in a sectional view in FIG. 2 (b).
I got Observation of the cross section of the double-sided copper foil laminate 10 shows that the copper foil 8 is closely adhered and integrated with the surface of the synthetic resin sheet 3 and the copper of the conductor bump 2 having the synthetic resin sheet 3 inserted therethrough. The tip end portion which was in contact with the foil 8 surface was plastically deformed (crushed) to form the same plane and was connected to the copper foil 8 surface.

【0026】前記両面銅箔積層板10の両面に、図2 (c)
に断面的に示すごとく、通常のエッチングレジストイン
ク(商品名,PSR-4000 H,製造元:太陽インキkk製)を
スクリーン印刷し、導体パターン部をマスク11してか
ら、塩化第2銅をエッチング液としてエッチング処理
し、配線パターニング 12a, 12bした後、レジストマス
ク剥離して、図2 (d)に断面的に示すような両面印刷配
線板12を得た。
On both sides of the double-sided copper foil laminate 10, as shown in FIG.
As shown in the cross-section in Fig. 1, ordinary etching resist ink (trade name, PSR-4000 H, manufacturer: Taiyo Ink KK) is screen-printed, the conductor pattern is masked 11, and then the cupric chloride etching solution is used. As a result, the wiring patterning 12a and 12b were performed, and the resist mask was peeled off to obtain a double-sided printed wiring board 12 as shown in cross section in FIG. 2 (d).

【0027】上記両面印刷配線板12について、通常実施
されている電気チェックを行ったところ、全ての接続に
不良ないし信頼性などの問題は認められなかった。ま
た、フロー半田耐熱試験( 288℃,10秒)を行った場合
も、層間剥離は認められず、導体の抵抗率変化も10%以
下であった。
When the double-sided printed wiring board 12 was subjected to a normal electrical check, no problems such as defects or reliability were found in all the connections. Also, when the flow soldering heat resistance test (288 ° C, 10 seconds) was performed, delamination was not observed, and the change in resistivity of the conductor was 10% or less.

【0028】実施例2 図3 (a)〜 (d)はこの実施例の実施態様を模式的に示し
たものである。
Example 2 FIGS. 3 (a) to 3 (d) schematically show an embodiment of this example.

【0029】実施例1の場合と同様にして、先ず、両面
印刷配線板12を製造し、この両面印刷配線板12の配線パ
ターン 12a, 12b面を黒化処理液(商品名,プロポンド
80,シプレイファーストkk製)で酸化処理した後、黒化
処理還元液(商品名, HIST-100B,日立化成工業kk製)
で還元処理を行って、図3 (a)に断面的に示すごとく、
配線パターン 12a, 12b面を非酸化,粗面化した。
In the same manner as in Example 1, first, the double-sided printed wiring board 12 is manufactured, and the wiring patterns 12a and 12b of the double-sided printed wiring board 12 are subjected to the blackening treatment liquid (trade name, Propond).
After the oxidation treatment with 80, Shipley First kk), blackening treatment reducing solution (trade name, HIST-100B, Hitachi Chemical Co., Ltd. kk)
The reduction process is performed at
The wiring patterns 12a and 12b are non-oxidized and roughened.

【0030】次に、図3 (b)に断面的に示すごとく、前
記両面印刷配線板12の配線パターン12a, 12b面が非酸
化,粗面化面側に、厚さ 200μm のエポキシプリプレグ
層3を介して、予め作成しておいた導体バンプ2先端部
が合成樹脂系シート3面から突出した積層素材7を積層
配置した。この積層体を、実施例1の場合に準じた手段
で、図3 (c)に断面的に示すごとく、加圧・加熱,一体
化した後、さらに両面銅箔1の配線パターニングを行っ
て、図3 (d)に断面的に示すような多層型の印刷配線板
13を製造した。
Next, as shown in a sectional view in FIG. 3B, the wiring patterns 12a and 12b of the double-sided printed wiring board 12 are non-oxidized and roughened, and a 200 μm thick epoxy prepreg layer 3 is provided on the roughened surface side. Through the above, the laminated material 7 in which the tip of the conductor bump 2 previously formed protrudes from the surface of the synthetic resin sheet 3 is laminated and arranged. This laminated body is pressed, heated and integrated as shown in a sectional view in FIG. 3 (c) by a method similar to that of Example 1, and then wiring patterning of the double-sided copper foil 1 is further performed. Multilayer printed wiring board as shown in cross section in Figure 3 (d)
13 were manufactured.

【0031】上記多層型の印刷配線板13について、通常
実施されている電気チェックを行ったところ、全ての接
続に不良ないし信頼性などの問題は認められなかった。
また、フロー半田耐熱試験( 288℃,10秒)を行った場
合も、層間剥離は認められず、導体の抵抗率変化も10%
以下であった。さらに、配線パターン間の接続の信頼性
を評価するため、ホットオイルテストで( 260℃のオイ
ル中に10秒浸漬,20℃のオイル中に20秒浸漬のサイクル
を 1サイクルとして)、 500回行っても不良発生は認め
られず、配線パターン層間の接続信頼性がすぐれてい
た。
When the above-mentioned multi-layered printed wiring board 13 was subjected to an electrical check which is usually carried out, no problems such as defects or reliability were found in all the connections.
In addition, even when a flow soldering heat resistance test (288 ° C, 10 seconds) was performed, delamination was not observed and the change in resistivity of the conductor was 10%.
It was below. Furthermore, in order to evaluate the reliability of the connection between the wiring patterns, a hot oil test (one cycle of immersion in 260 ° C. oil for 10 seconds and 20 ° C. oil for 20 seconds) was performed 500 times. However, no defect was found and the connection reliability between the wiring pattern layers was excellent.

【0032】実施例3 実施例1の場合と同様にして、導体バンプ先端部が合成
樹脂系シート面から突出した積層素材を先ず作成した。
この積層素材の導体バンプ先端部突出面に、厚さ 200μ
m のエポキシプリプレグ層、粗面化された厚さ37μm 銅
箔を準じ積層配置した。ここで、銅箔は、エポキシプリ
プレグ層に対接する面が無電解メッキ液(商品名,CUPO
SIT250,シプレイファーストkk製)処理で、約 2μm 厚
の粗面なメッキ膜が形成されたものである。
Example 3 In the same manner as in Example 1, a laminated material was first prepared in which the tip end portions of the conductor bumps were projected from the synthetic resin sheet surface.
The thickness of 200 μm on the protruding surface of the conductor bump tip of this laminated material
A m 3 epoxy prepreg layer and a roughened 37 μm-thick copper foil were laminated and arranged according to each other. Here, in the copper foil, the surface facing the epoxy prepreg layer is an electroless plating solution (trade name, CUPO
SIT250, Shipley First kk) treatment, a rough plating film with a thickness of about 2 μm was formed.

【0033】前記積層体を、実施例1の場合に準じた手
段で、加圧・加熱,一体化した後、さらに両面銅箔の配
線パターニングを行って、両面型の印刷配線板を製造し
た。上記両面型の印刷配線板について、通常実施されて
いる電気チェックを行ったところ、全ての接続に不良な
いし信頼性などの問題は認められなかった。
The laminated body was pressed, heated and integrated by a means similar to that of Example 1, and then the double-sided copper foil was subjected to wiring patterning to manufacture a double-sided printed wiring board. When the double-sided printed wiring board was subjected to a normal electrical check, no problems such as defects or reliability were found in all the connections.

【0034】また、前記両面型の印刷配線板の配線パタ
ーン面を非酸化,粗面化した後、前記両面印刷配線板の
配線パターン面が非酸化,粗面化面側に、厚さ 200μm
のエポキシプリプレグ層を介して、予め作成しておいた
導体バンプ先端部が合成樹脂系シート面から突出した積
層素材を積層配置した。この積層体を、実施例1の場合
に準じた手段で、加圧・加熱,一体化した後、さらに両
面銅箔の配線パターニングを行って、多層型の印刷配線
板を製造した。
After the wiring pattern surface of the double-sided printed wiring board is non-oxidized and roughened, the wiring pattern surface of the double-sided printed wiring board has a thickness of 200 μm on the non-oxidized and roughened surface side.
Through the epoxy prepreg layer, the laminated material in which the tips of the conductor bumps, which were prepared in advance, protruded from the synthetic resin sheet surface, was laminated and arranged. This laminated body was pressed, heated, and integrated by a means similar to that of Example 1, and then wiring patterning of the double-sided copper foil was further performed to manufacture a multilayer printed wiring board.

【0035】上記多層型の印刷配線板について、通常実
施されている電気チェックを行ったところ、全ての接続
に不良ないし信頼性などの問題は認められなかった。ま
た、フロー半田耐熱試験( 288℃,10秒)を行った場合
も、層間剥離は認められず、導体の抵抗率変化も10%以
下であった。さらに、配線パターン間の接続の信頼性を
評価するため、ホットオイルテストで( 260℃のオイル
中に10秒浸漬,20℃のオイル中に20秒浸漬のサイクルを
1サイクルとして)、 500回行っても不良発生は認めら
れず、配線パターン層間の接続信頼性がすぐれていた。
When the above-mentioned multi-layered printed wiring board was subjected to an electrical check which is usually carried out, no problems such as defects or reliability were found in all the connections. Also, when the flow soldering heat resistance test (288 ° C, 10 seconds) was performed, delamination was not observed, and the change in resistivity of the conductor was 10% or less. In addition, in order to evaluate the reliability of the connection between the wiring patterns, a hot oil test (a cycle of dipping in oil at 260 ° C for 10 seconds and dipping in oil at 20 ° C for 20 seconds was used.
No defect was found even after 500 cycles (for one cycle), and the connection reliability between the wiring pattern layers was excellent.

【0036】なお、上記において、エポキシプリプレグ
層に対接する面が無電解メッキ処理で粗面化された銅箔
を用いる代りに、銅メッキ液(硫酸銅200g/l)を用い、
陰極電流密度5A/dm2 で約 2μm 厚の粗面なメッキ膜が
形成された銅箔を用いた他はは、同一の条件で両面型の
印刷配線板および多層型の印刷配線板をそれぞれ製造し
た。そして、これらの印刷配線板について、上記と同様
の試験評価を行ったところ、同様の結果が認められた。
In the above, instead of using the copper foil whose surface facing the epoxy prepreg layer is roughened by electroless plating, a copper plating solution (copper sulfate 200 g / l) is used,
A double-sided printed wiring board and a multi-layered printed wiring board were manufactured under the same conditions, except that copper foil with a rough plating film of about 2 μm thickness was used at a cathode current density of 5 A / dm 2. did. Then, when the same test evaluation was performed on these printed wiring boards, similar results were observed.

【0037】上記では両面型および4層型の印刷配線板
の製造例について例示したが、本発明はこの例示に限定
されるものでなく、発明の趣旨を逸脱しない範囲で3層
型もしくは5層以上の多層型の印刷配線板の製造もてき
る。また合成樹脂シートや導体バンプの素材も、前記例
示以外の材質であってもよい。
Although an example of manufacturing a double-sided type and a four-layer type printed wiring board has been described above, the present invention is not limited to this example, and is a three-layer type or a five-layer type without departing from the spirit of the invention. It is also possible to manufacture the multilayer printed wiring board described above. Further, the synthetic resin sheet and the conductor bumps may be made of materials other than those exemplified above.

【0038】[0038]

【発明の効果】上記説明から分かるように、本発明によ
れば、合成樹脂系シ−トを貫挿する導体バンプ先端部の
対接する導電性金属箔全面が、非酸化で、かつ粗面化さ
れているため、所要の密着力によって強固な積層一体化
を形成され、また層間接続部を形成する導体バンプ先端
部も絶縁層を介在せずに接続した構成を確実に採る。し
たかって、全体的に強固に一体化し、また、信頼性の高
い配線層間の電気的な接続を備えた印刷配線板を歩留ま
りよく提供できる。つまり、簡略化されたプロセスを採
って、量産性やコスト面に大きく寄与しながら、コンパ
クト化(スルホール省略化による配線密度や実装密度の
向上)なども図ることができ、また性能的にも信頼性の
高いる印刷配線板を容易に提供できる。
As can be seen from the above description, according to the present invention, the entire surface of the conductive metal foil which is in contact with the tips of the conductor bumps which penetrate the synthetic resin sheet is non-oxidized and roughened. Therefore, a strong laminated integration is formed by the required adhesion force, and the tip end portion of the conductor bump forming the interlayer connection portion is surely connected without interposing the insulating layer. Therefore, it is possible to provide a printed wiring board that is firmly integrated as a whole and that has a highly reliable electrical connection between wiring layers with high yield. In other words, by adopting a simplified process, it is possible to contribute to mass productivity and cost while making it compact (improving wiring density and mounting density by omitting through holes), and also in terms of performance. It is possible to easily provide a printed wiring board having high performance.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施態様例を模式的に示すもので、
(a)は導体金属箔面に導電バンプを形設した状態を示す
断面図、 (b)は導体バンプを形設した導体金属箔,絶縁
樹脂シート層などを積層・配置した状態を示す断面図、
(c)は積層体をプレスして片面銅張り積層素材化した状
態を示す断面図。
FIG. 1 schematically shows an embodiment of the present invention.
(a) is a sectional view showing a state where conductive bumps are formed on the conductor metal foil surface, and (b) is a sectional view showing a state where conductor metal foils having conductor bumps formed and insulating resin sheet layers are laminated and arranged. ,
(c) is a cross-sectional view showing a state in which the laminated body is pressed into a single-sided copper-clad laminated material.

【図2】本発明の実施態様例を模式的に示すもので、
(a)は積層素材面に絶縁樹脂シート層および導体金属箔
を積層・配置した状態を示す断面図、 (b)は積層体をプ
レスして両面銅張り積層板した状態を示す断面図、 (c)
は両面銅張り積層板面にレジストマスクした状態を示す
断面図、 (d)は両面銅張り積層板の両面を配線パターニ
ングした状態を示す断面図。
FIG. 2 schematically shows an embodiment of the present invention,
(a) is a cross-sectional view showing a state in which an insulating resin sheet layer and a conductor metal foil are laminated and arranged on the surface of a laminated material, (b) is a cross-sectional view showing a state in which a laminate is pressed to form a double-sided copper-clad laminate, ( c)
Is a cross-sectional view showing a state where a resist mask is applied to the surface of the double-sided copper-clad laminate, and (d) is a cross-sectional view showing a state where wiring is patterned on both sides of the double-sided copper-clad laminate.

【図3】本発明の実施態様例を模式的に示すもので、
(a)は両面型配線板の配線パターン面を非酸化,粗面化
した状態を示す断面図、 (b)は配線パターン面を非酸
化,粗面化した両面型配線板の両面に合成樹脂シートお
よび積層素材を積層配置した状態を示す断面図、 (c)は
積層体をプレスして両面銅張り積層板した状態を示す断
面図、 (d)は両面銅張り積層板の両面を配線パターニン
グした状態を示す断面図。
FIG. 3 schematically shows an embodiment example of the present invention,
(a) is a cross-sectional view showing a state where the wiring pattern surface of the double-sided wiring board is non-oxidized and roughened, and (b) is a synthetic resin on both sides of the double-sided wiring board whose wiring pattern surface is non-oxidized and roughened. A cross-sectional view showing a state in which sheets and laminated materials are laminated and arranged, (c) a cross-sectional view showing a state where a laminate is pressed to form a double-sided copper-clad laminate, and (d) a wiring pattern on both sides of the double-sided copper-clad laminate Sectional drawing which shows the state.

【符号の説明】[Explanation of symbols]

1……導体金属箔(層) 2……導電バンプ 3……絶縁樹脂シート層 4……アルミ箔 5……被押圧体 6a,6b……当ていた 7……積層素材 8……絶縁樹脂シート層に対接する面が非酸化,粗面化
された銅箔 9……保護膜 10……両面銅箔張り積層板 11……エッチングレジスト膜 12……両面型の印刷配線板 13……多層型の印刷配線板
1 ... Conductor metal foil (layer) 2 ... Conductive bump 3 ... Insulating resin sheet layer 4 ... Aluminum foil 5 ... Pressed body 6a, 6b ... Applied 7 ... Laminated material 8 ... Insulating resin Copper foil whose surface facing the sheet layer is non-oxidized and roughened 9 Protective film 10 Double-sided copper foil-clad laminated plate 11 Etching resist film 12 Double-sided printed wiring board 13 Multilayer Mold printed wiring board

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 導電体層面の所定位置に導体バンプを形
成する工程と、 前記導体バンプ形成面に合成樹脂系シ−トを積層配置す
る工程と、 前記合成樹脂系シ−ト面上に、この合成樹脂系シ−トに
対接する面が非酸化で、かつ粗面化された導電性金属箔
を積層配置する工程と、 前記積層体を加圧して合成樹脂系シ−トの厚さ方向に、
前記導体バンプを貫挿させ、導体バンプ先端部を塑性変
形により対向する導電性金属箔面に接続させて貫通型の
導体配線部を形成する工程と、 前記導電性金属箔を配線パターニングする工程とを具備
することを特徴とする印刷配線板の製造方法。
1. A step of forming a conductor bump at a predetermined position on a conductor layer surface, a step of laminating a synthetic resin sheet on the conductor bump forming surface, and a step of stacking a synthetic resin sheet on the conductor bump forming surface. A step of laminating and arranging a roughened conductive metal foil whose surface facing the synthetic resin sheet is non-oxidized, and pressurizing the laminated body so that the thickness direction of the synthetic resin sheet is increased. To
A step of inserting the conductor bump, connecting the tip of the conductor bump to the opposing conductive metal foil surface by plastic deformation to form a through-type conductor wiring portion; and a step of wiring patterning the conductive metal foil. A method for manufacturing a printed wiring board, comprising:
【請求項2】 導電体層面の所定位置に導体バンプを形
成する工程と、 前記導体バンプ形成面に合成樹脂系シ−トを積層配置す
る工程と、 前記合成樹脂系シ−ト面上に、この合成樹脂系シ−トに
対接する面が黒化・還元処理された導電性金属箔を積層
配置する工程と、 前記積層体を加圧して合成樹脂系シ−トの厚さ方向に、
前記導体バンプを貫挿させ、導体バンプ先端部を塑性変
形により対向する導電性金属箔面に接続させて貫通型の
導体配線部を形成する工程と、 前記導電性金属箔を配線パターニングする工程とを具備
することを特徴とする印刷配線板の製造方法。
2. A step of forming a conductor bump at a predetermined position on a conductor layer surface, a step of laminating a synthetic resin sheet on the conductor bump forming surface, and a step of stacking a synthetic resin sheet on the conductor bump surface. A step of stacking and arranging a conductive metal foil whose surface facing the synthetic resin sheet is blackened / reduced, and pressing the laminated body in the thickness direction of the synthetic resin sheet,
A step of inserting the conductor bump, connecting the tip of the conductor bump to the opposing conductive metal foil surface by plastic deformation to form a through-type conductor wiring portion; and a step of wiring patterning the conductive metal foil. A method for manufacturing a printed wiring board, comprising:
【請求項3】 導電体層面の所定位置に導体バンプを形
成する工程と、 前記導体バンプ形成面に合成樹脂系シ−トを積層配置す
る工程と、 前記合成樹脂系シ−ト面上に、この合成樹脂系シ−トに
対接する面がメッキ処理で粗面化された導電性金属箔を
積層配置する工程と、 前記積層体を加圧して合成樹脂系シ−トの厚さ方向に、
前記導体バンプを貫挿させ、導体バンプ先端部を塑性変
形により対向する導電性金属箔面に接続させて貫通型の
導体配線部を形成する工程と、 前記導電性金属箔を配線パターニングする工程とを具備
することを特徴とする印刷配線板の製造方法。
3. A step of forming a conductor bump at a predetermined position on a conductor layer surface, a step of stacking a synthetic resin sheet on the conductor bump forming surface, and a step of stacking a synthetic resin sheet on the conductor bump surface. A step of laminating and disposing a conductive metal foil whose surface facing the synthetic resin sheet is roughened by plating, and pressing the laminated body in the thickness direction of the synthetic resin sheet,
A step of inserting the conductor bump, connecting the tip of the conductor bump to the opposing conductive metal foil surface by plastic deformation to form a through-type conductor wiring portion; and a step of wiring patterning the conductive metal foil. A method for manufacturing a printed wiring board, comprising:
JP19023295A 1995-07-26 1995-07-26 Manufacture of printed wiring board Pending JPH0946041A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19023295A JPH0946041A (en) 1995-07-26 1995-07-26 Manufacture of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19023295A JPH0946041A (en) 1995-07-26 1995-07-26 Manufacture of printed wiring board

Publications (1)

Publication Number Publication Date
JPH0946041A true JPH0946041A (en) 1997-02-14

Family

ID=16254697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19023295A Pending JPH0946041A (en) 1995-07-26 1995-07-26 Manufacture of printed wiring board

Country Status (1)

Country Link
JP (1) JPH0946041A (en)

Cited By (8)

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JP2001244365A (en) * 2000-02-28 2001-09-07 Hitachi Chem Co Ltd Wiring board, semiconductor device and method of manufacturing wiring board
JP2002134189A (en) * 2000-10-23 2002-05-10 Ibiden Co Ltd Connection material, connection structure and method for manufacturing them
WO2002080639A1 (en) * 2001-03-28 2002-10-10 North Corporation Multilayer wiring board, method for producing multilayer wiring board, polisher for multilayer wiring board, and metal sheet for producing wiring board
EP1599079A1 (en) * 2004-01-26 2005-11-23 Matsushita Electric Industrial Co., Ltd. Method for producing circuit-forming board and material for producing circuit-forming board
WO2006059428A1 (en) * 2004-12-03 2006-06-08 Sony Chemical & Information Device Corporation Process for producing multilayer wiring board
JP2006165130A (en) * 2004-12-03 2006-06-22 Sony Chem Corp Multilayer wiring board and manufacturing method thereof
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JP2014063981A (en) * 2012-08-31 2014-04-10 Murata Mfg Co Ltd Wiring board and manufacturing method of the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7704799B2 (en) 2000-02-28 2010-04-27 Hitachi Chemical Co., Ltd. Method of manufacturing wiring substrate
WO2001065602A1 (en) * 2000-02-28 2001-09-07 Hitachi Chemical Co., Ltd. Wiring board, semiconductor device, and method of manufacturing wiring board
US7205645B2 (en) 2000-02-28 2007-04-17 Hitachi Chemical Co., Ltd. Wiring board, semiconductor device, and method of manufacturing wiring board
JP2001244365A (en) * 2000-02-28 2001-09-07 Hitachi Chem Co Ltd Wiring board, semiconductor device and method of manufacturing wiring board
JP2002134189A (en) * 2000-10-23 2002-05-10 Ibiden Co Ltd Connection material, connection structure and method for manufacturing them
WO2002080639A1 (en) * 2001-03-28 2002-10-10 North Corporation Multilayer wiring board, method for producing multilayer wiring board, polisher for multilayer wiring board, and metal sheet for producing wiring board
EP1599079A4 (en) * 2004-01-26 2008-05-21 Matsushita Electric Ind Co Ltd Method for producing circuit-forming board and material for producing circuit-forming board
EP1599079A1 (en) * 2004-01-26 2005-11-23 Matsushita Electric Industrial Co., Ltd. Method for producing circuit-forming board and material for producing circuit-forming board
US7624502B2 (en) 2004-01-26 2009-12-01 Panasonic Corporation Method for producing circuit-forming board and material for producing circuit-forming board
JP2006165133A (en) * 2004-12-03 2006-06-22 Sony Chem Corp Method of manufacturing multilayer wiring board
JP2006165130A (en) * 2004-12-03 2006-06-22 Sony Chem Corp Multilayer wiring board and manufacturing method thereof
WO2006059428A1 (en) * 2004-12-03 2006-06-08 Sony Chemical & Information Device Corporation Process for producing multilayer wiring board
JP4509757B2 (en) * 2004-12-03 2010-07-21 ソニーケミカル&インフォメーションデバイス株式会社 Manufacturing method of multilayer wiring board
US8112881B2 (en) 2004-12-03 2012-02-14 Tessera Interconnect Materials, Inc. Method for manufacturing multilayer wiring board
KR100797720B1 (en) * 2006-05-09 2008-01-23 삼성전기주식회사 Manufacturing method of printed circuit board for fine circuit formation
JP2014063981A (en) * 2012-08-31 2014-04-10 Murata Mfg Co Ltd Wiring board and manufacturing method of the same

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