JPH0940775A - Polyimide film - Google Patents

Polyimide film

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Publication number
JPH0940775A
JPH0940775A JP19653795A JP19653795A JPH0940775A JP H0940775 A JPH0940775 A JP H0940775A JP 19653795 A JP19653795 A JP 19653795A JP 19653795 A JP19653795 A JP 19653795A JP H0940775 A JPH0940775 A JP H0940775A
Authority
JP
Japan
Prior art keywords
polyimide
polyimide film
film
solution
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19653795A
Other languages
Japanese (ja)
Other versions
JP3444035B2 (en
Inventor
Akinori Shiotani
陽則 塩谷
Hiroaki Yamaguchi
裕章 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP19653795A priority Critical patent/JP3444035B2/en
Priority to US08/690,107 priority patent/US5741598A/en
Priority to KR1019960032251A priority patent/KR100417030B1/en
Publication of JPH0940775A publication Critical patent/JPH0940775A/en
Priority to US10/454,730 priority patent/US6797392B2/en
Application granted granted Critical
Publication of JP3444035B2 publication Critical patent/JP3444035B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a polyimide film having all of good flexibility, strength, heat resistance and heat fusibility by forming a film from a polyimide consisting of specified imide units and terminal groups. SOLUTION: This polyimide film is composed mainly of a polyimide consisting of 80-100mol% imide units of formula I and 20-0mol% imide units of formula II (R and R' respectively are a tetravalent and divalent aromatic or aliphatic group) and having a polymer terminal comprising a tetracarboxylic acid anhydride residue or having the amine terminal blocked with a dicarboxylic acid anhydride. A solution of a polyamic acid or polyimide is cast on the surface of a support and heated to a temperature higher than the glass transition temperature of polymide and equal to the cure temperature thereof, i.e., 270-350 deg.C, to effect ring-closing through dehydration and remove the solvent, thus giving a film of a polyimide having an inherent viscosity <=inh of 0.3-3dl/g.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、ポリイミドフィ
ルムに関するものであり、特に柔軟性、強度、耐熱性お
よび熱融着性をあわせもつポリイミドフィルムに関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyimide film, and more particularly to a polyimide film having flexibility, strength, heat resistance and heat fusion property.

【0002】[0002]

【従来の技術】耐熱性と接着性とをあわせ持つポリマ−
として、ポリイミド系、ポリベンズイミダゾ−ル系のポ
リマ−が開発されている。熱可塑性ポリイミド系フィル
ムもいくつか知られている(例えば、米国特許第406
5345号、米国特許第5298331号、特開平2−
272077号、特開平7−41752号、特開平7−
118625号)。しかし、従来公知の熱可塑性ポリイ
ミドフィルムは、イミド化・フィルム成形時に低温での
加熱が必要であり、フィルム成形時に高温に加熱すると
劣化(ゲル化)しやすい。このため熱的に安定で、熱融
着による接着力の大きいポリイミドフィルムや膜を得る
ことが困難である。
2. Description of the Related Art Polymer having both heat resistance and adhesiveness
As such, polyimide-based and polybenzimidazole-based polymers have been developed. Some thermoplastic polyimide-based films are also known (eg, US Pat. No. 406).
5345, U.S. Pat. No. 5,298,331, JP-A-2-
272077, JP-A-7-41752, JP-A-7-
118625). However, a conventionally known thermoplastic polyimide film requires heating at a low temperature during imidization / film formation, and is easily deteriorated (gelled) when heated at a high temperature during film formation. For this reason, it is difficult to obtain a polyimide film or film that is thermally stable and has a large adhesive force by heat fusion.

【0003】また、2,3,3’,4’−ビフェニルテ
トラカルボン酸二無水物と1,3−ビス(4−アミノフ
ェノキシ)ベンゼンをモノマ−成分に用いた耐湿性ポリ
イミド(特開昭61−143433号)や、コ−ティン
グ剤(特開平2−286743号)が知られているが、
これらを熱融着用のポリイミドフィルムとして使用した
例はなく、結局耐熱性を有し熱融着可能なポリイミドフ
ィルムを得ることは困難である。
Further, a moisture-resistant polyimide using 2,3,3 ', 4'-biphenyltetracarboxylic dianhydride and 1,3-bis (4-aminophenoxy) benzene as a monomer component (Japanese Patent Laid-Open No. Sho 61-61). No. 143433) and a coating agent (JP-A-2-286743) are known.
There is no example of using these as a polyimide film for heat fusion, and it is difficult to obtain a polyimide film having heat resistance and capable of heat fusion after all.

【0004】[0004]

【発明が解決しようとする課題】この発明の目的は、高
温下でのイミド化・フィルム成形時にゲル化が実質的に
起こらない耐熱性と、フィルムとしての柔軟性および強
度を有し、かつ熱融着による接着力を有するポリイミド
フィルムを提供することである。
SUMMARY OF THE INVENTION An object of the present invention is to have heat resistance such that gelation does not substantially occur during imidization / film forming at high temperature, flexibility and strength as a film, and heat resistance. An object of the present invention is to provide a polyimide film having adhesive strength by fusion bonding.

【0005】[0005]

【課題を解決するための手段】すなわち、この発明は、
下記のイミド単位(A)および(B)からなり、
That is, the present invention provides:
Consisting of the following imide units (A) and (B),

【化3】 Embedded image

【化4】 〔式(B)において、R,R’はそれぞれ4価および2
価の芳香族基または脂肪族基を表す。〕 (A)が80〜100モル%、(B)が20〜0モル%
であって、このポリマ−末端がテトラカルボン酸無水物
残基であるか、またはアミン末端をジカルボン酸無水物
で封止したポリイミドを主成分とすることを特徴とする
ポリイミドフィルムに関するものである。
Embedded image [In the formula (B), R and R ′ are respectively tetravalent and 2
Represents a valent aromatic group or an aliphatic group. (A) is 80 to 100 mol%, and (B) is 20 to 0 mol%.
The present invention relates to a polyimide film characterized in that the polymer terminal is a tetracarboxylic acid anhydride residue, or a polyimide having an amine terminal sealed with a dicarboxylic acid anhydride as a main component.

【0006】この発明におけるポリイミドは、1,3−
ビス(4−アミノフェノキシ)ベンゼン(以下単に、T
PE−Rと略記することもある)と、2,3,3’,
4’−ビフェニルテトラカルボン酸二無水物(以下単
に、a−BPDAと略記することもある)の2成分と、
場合により他のテトラカルボン酸二無水物およびジアミ
ン成分とを前記2成分が80モル%以上となる割合で使
用し、テトラカルボン酸二無水物を過剰の条件下、もし
くはジカルボン酸無水物でジアミン末端を封止する条件
下で有機溶媒中で反応させてポリアミック酸の溶液(均
一な溶液状態が保たれていれば一部がイミド化されてい
てもよい)とし、該ポリアミック酸の溶液からフィルム
化・イミド化(脱水閉環)・乾燥することによって製造
することができる。
The polyimide in this invention is 1,3-
Bis (4-aminophenoxy) benzene (hereinafter simply referred to as T
PE-R may be abbreviated), 2, 3, 3 ',
Two components of 4'-biphenyltetracarboxylic dianhydride (hereinafter sometimes simply referred to as a-BPDA);
In some cases, other tetracarboxylic dianhydride and diamine component are used in a ratio such that the above-mentioned two components are 80 mol% or more, and the tetracarboxylic dianhydride is used under an excess condition or with a dicarboxylic acid anhydride at a diamine terminal. Is reacted in an organic solvent under the condition of sealing to form a solution of polyamic acid (part of which may be imidized if a uniform solution state is maintained), and a film is formed from the solution of polyamic acid. It can be produced by imidization (dehydration ring closure) and drying.

【0007】上記のポリアミック酸は、2,3,3’,
4’−ビフェニルテトラカルボン酸二無水物と1,3−
ビス(4−アミノフェノキシ)ベンゼンと、さらに場合
により他のテトラカルボン酸二無水物および他のジアミ
ンとを、有機溶媒中、約100℃以下、特に20〜60
℃の温度で重合することによって好適に合成される。こ
の発明のポリイミドフィルムは上記ポリアミック酸の溶
液組成物をド−プ液として使用し、そのド−プ液の薄膜
を形成し、その薄膜から溶媒を蒸発させ除去すると共に
ポリアミック酸をイミド化することにより製造すること
ができる。
The above-mentioned polyamic acid is 2, 3, 3 ',
4'-biphenyltetracarboxylic dianhydride and 1,3-
Bis (4-aminophenoxy) benzene and optionally other tetracarboxylic dianhydrides and other diamines in an organic solvent at about 100 ° C. or less, especially 20-60.
It is preferably synthesized by polymerizing at a temperature of ° C. The polyimide film of the present invention uses the solution composition of the polyamic acid as a dope solution, forms a thin film of the dope solution, and evaporates and removes the solvent from the thin film and imidizes the polyamic acid. Can be manufactured by.

【0008】また、前述のようにして製造したポリアミ
ック酸を150〜250℃に加熱するか、またはイミド
化剤を添加して150℃以下、特に15〜50℃の温度
で反応させて、イミド環化した後溶媒を蒸発させる、も
しくは貧溶媒中に析出させて粉末とした後、該粉末を有
機溶液に溶解してフィルム化・乾燥するいずれの方法に
よってもポリイミドフィルムを製造することができる。
Further, the polyamic acid produced as described above is heated to 150 to 250 ° C., or an imidizing agent is added and reacted at a temperature of 150 ° C. or lower, particularly 15 to 50 ° C. to give an imide ring. The polyimide film can be produced by any method of evaporating the solvent and then precipitating it in a poor solvent to obtain a powder, and then dissolving the powder in an organic solution to form a film and drying.

【0009】この発明で使用することができるテトラカ
ルボン酸二無水物としては、2,3,3’,4’−ビフ
ェニルテトラカルボン酸二無水物が最も好ましいが、そ
の20モル%以下が他の芳香族テトラカルボン酸二無水
物(前記式中、R基を含むテトラカルボン酸二無水
物)、例えば、ピロメリット酸二無水物、3,3’,
4,4’−ベンゾフェノンテトラカルボン酸二無水物、
3,3’,4,4’−ビフェニルテトラカルボン酸二無
水物、2,2−ビス(3、4−ジカルボキシフェニル)
プロパン二無水物、ビス(3,4−ジカルボキシフェニ
ル)エ−テル二無水物、ビス(3,4−ジカルボキシフ
ェニル)スルホン二無水物あるいは2,3,6,7−ナ
フタレンテトラカルボン酸二無水物など、好適には3,
3’,4,4’−ビフェニルテトラカルボン酸二無水物
によって置き換えられてもよい。
As the tetracarboxylic acid dianhydride which can be used in the present invention, 2,3,3 ', 4'-biphenyltetracarboxylic acid dianhydride is most preferable, but 20 mol% or less thereof is other than that. Aromatic tetracarboxylic dianhydride (in the above formula, tetracarboxylic dianhydride containing an R group), for example, pyromellitic dianhydride, 3,3 ′,
4,4′-benzophenonetetracarboxylic dianhydride,
3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl)
Propane dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, bis (3,4-dicarboxyphenyl) sulfone dianhydride or 2,3,6,7-naphthalenetetracarboxylic dianhydride Anhydrous or the like, preferably 3,
It may be replaced by 3 ', 4,4'-biphenyltetracarboxylic dianhydride.

【0010】この発明で使用することができるジアミン
としては、1,3−ビス(4−アミノフェノキシ)ベン
ゼンが最も好ましいが、その20モル%以下が他のジア
ミン(前記式中R’基を含むジアミン)、例えば、4,
4’−ジアミノジフェニルエ−テル、4,4’−ジアミ
ノジフェニルスルフィド、4,4’−ジアミノベンゾフ
ェノン、4,4’−ジアミノジフェニルメタン、2,2
−ビス(4−アミノフェニル)プロパン、1,4−ビス
(4−アミノフェノキシ)ベンゼン、4,4’−ビス
(4−アミノフェニル)ジフェニルエ−テル、4,4’
−ビス(4−アミノフェニル)ジフェニルスルホン、
4,4’−ビス(4−アミノフェニル)ジフェニルスル
フィド、4,4’−ビス(4−アミノフェニル)ジフェ
ニルメタン、4,4’−ビス(4−アミノフェノキシ)
ジフェニルエ−テル、4,4’−ビス(4−アミノフェ
ノキシ)ジフェニルスルホン、4,4’−ビス(4−ア
ミノフェノキシ)ジフェニルスルフィド、4,4’−ビ
ス(4−アミノフェノキシ)ジフェニルメタン、2,2
−ビス〔4−(アミノフェノキシ)フェニル〕プロパ
ン、2,2−ビス〔4−(4−アミノフェノキシ)フェ
ニル〕ヘキサフルオロプロパンなどの複数のベンゼン環
を有する柔軟な芳香族ジアミン、1,4−ジアミノブタ
ン、1,6−ジアミノヘキサン、1,8−ジアミノオク
タン、1,10−ジアミノデカン、1,12−ジアミノ
ドデカンなどの脂肪族ジアミン、キシレンジアミンなど
のジアミン、その中でも複数のベンゼン環を有する柔軟
な芳香族ジアミンによって置き換えられてもよい。
As the diamine which can be used in the present invention, 1,3-bis (4-aminophenoxy) benzene is most preferable, but 20 mol% or less of the other diamine (containing R'group in the above formula). Diamines), for example 4,
4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminobenzophenone, 4,4'-diaminodiphenylmethane, 2,2
-Bis (4-aminophenyl) propane, 1,4-bis (4-aminophenoxy) benzene, 4,4'-bis (4-aminophenyl) diphenylether, 4,4 '
-Bis (4-aminophenyl) diphenyl sulfone,
4,4'-bis (4-aminophenyl) diphenyl sulfide, 4,4'-bis (4-aminophenyl) diphenylmethane, 4,4'-bis (4-aminophenoxy)
Diphenyl ether, 4,4'-bis (4-aminophenoxy) diphenyl sulfone, 4,4'-bis (4-aminophenoxy) diphenyl sulfide, 4,4'-bis (4-aminophenoxy) diphenylmethane, , 2
-Flexible aromatic diamine having a plurality of benzene rings such as bis [4- (aminophenoxy) phenyl] propane and 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane, 1,4- Aliphatic diamines such as diaminobutane, 1,6-diaminohexane, 1,8-diaminooctane, 1,10-diaminodecane, and 1,12-diaminododecane, diamines such as xylenediamine, and more than one benzene ring among them. It may be replaced by a flexible aromatic diamine.

【0011】この発明においてポリマ−のアミン末端を
封止するためのジカルボン酸無水物としては、無水フタ
ル酸およびその置換体、ヘキサヒドロ無水フタル酸およ
ぼその置換体、無水コハク酸およびその置換体などが挙
げられる。特に、無水フタル酸が好適に挙げられる。
In the present invention, examples of the dicarboxylic acid anhydride for blocking the amine terminal of the polymer include phthalic anhydride and its substitution product, hexahydrophthalic anhydride and its substitution product, succinic anhydride and its substitution product, and the like. Is mentioned. Particularly, phthalic anhydride is preferable.

【0012】前記のポリアミック酸を合成するさいに使
用する有機溶媒としては、N−メチル−2−ピロリド
ン、N,N−ジメチルホルムアミド、N,N−ジメチル
アセトアミド、N,N−ジエチルアセトアミド、ジメチ
ルスルホキシド、ヘキサメチルホスホルアミド、N−メ
チルカプロラクタム、クレゾ−ル類などが挙げられる。
これらの有機溶媒は単独で用いてもよく、2種以上を併
用してもよい。
The organic solvent used for synthesizing the polyamic acid is N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, dimethylsulfoxide. , Hexamethylphosphoramide, N-methylcaprolactam, cresols and the like.
These organic solvents may be used alone or in combination of two or more.

【0013】この発明におけるポリイミドを得るために
は、前記の有機溶媒中、ジアミン(アミノ基のモル数と
して)の使用量が酸無水物の全モル数(テトラ酸二無水
物とジカルボン酸無水物の酸無水物基としての総モルと
して)に対する比として、好ましくは0.92〜1.
0、特に0.98〜1.0、そのなかでも特に0.99
〜1.0であり、ジカルボン酸無水物の使用量がテトラ
カルボン酸二無水物の酸無水物基モル量に対する比とし
て、好ましくは0.05以下、特に0.0001〜0.
02であるような割合の各成分を反応させてポリアミッ
ク酸とすることが好ましい。
To obtain the polyimide of the present invention, the amount of diamine (as the number of moles of amino groups) used in the above organic solvent is the total number of moles of acid anhydride (tetraacid dianhydride and dicarboxylic acid anhydride). As total moles as acid anhydride groups), preferably 0.92-1.
0, particularly 0.98 to 1.0, of which 0.99 in particular
Is 1.0 to 1.0, and the amount of the dicarboxylic acid anhydride used is preferably 0.05 or less, particularly 0.0001 to 0. 0, as a ratio of the tetracarboxylic dianhydride to the molar amount of the acid anhydride group.
It is preferable to react each component in a ratio of 02 to obtain a polyamic acid.

【0014】前記のジアミンおよびジカルボン酸無水物
の使用量が前記の範囲外であると、得られるポリアミッ
ク酸、従ってポリイミドの分子量が小さく、フィルムの
強度および接着力の低下をもたらす。また、特にジアミ
ン成分過剰の条件では、ポリアミック酸のイミド化ある
いは溶媒の除去の際にゲル化などを生じ、フィルムの物
性低下および熱融着力の低下をもたらす。これらのゲル
化を制限する目的でリン系安定剤、例えば亜リン酸トリ
フェニル、リン酸トリフェニル等をポリアミック酸重合
時に固形分(ポリマ−)濃度に対して0.01〜1%の
範囲で添加することができる。
When the amount of the above-mentioned diamine and dicarboxylic acid anhydride used is out of the above range, the molecular weight of the polyamic acid obtained, that is, the polyimide, is small, and the strength and adhesive strength of the film are lowered. Further, particularly under conditions where the diamine component is in excess, gelation occurs during imidization of the polyamic acid or removal of the solvent, resulting in deterioration of the physical properties of the film and deterioration of the heat fusion force. For the purpose of limiting gelation, phosphorus stabilizers such as triphenyl phosphite and triphenyl phosphate are added in a range of 0.01 to 1% with respect to the solid content (polymer) concentration during polyamic acid polymerization. It can be added.

【0015】この発明の接着性ポリイミドフィルムは、
上記のようにして得たポリアミック酸溶液(透明粘調な
溶液)を、ガラス板、ステンレス鏡面、ベルト面等の支
持体上に流延塗布し、100〜180℃で乾燥後、流延
基材から剥離し、好ましくは180〜350℃、特に好
ましくはガラス転移温度(Tg)より高くかつ350℃
以下、その中でも特に270〜350℃(特に300〜
350℃が好ましい)のキュア温度で1〜60分間加熱
して脱水閉環してイミド化・溶媒除去して、イミド化率
99%以上、揮発成分含有率0.1%以下、厚み1〜5
0μmの透明なフィルムとして作成することができる。
または、この発明のポリイミドフィルムは溶媒可溶性
(例えば、N−メチル−2−ピロリドン、m−クレゾ−
ル等の溶媒に可溶)であるため、ポリアミック酸溶液を
150〜250℃に加熱するか、またはイミド化剤を添
加して、150℃以下の温度、特に15〜50℃で反応
させてイミド化し、得られたポリイミド溶液を流延・塗
布し、好適には270〜350℃の温度まで加熱して溶
媒蒸発させて、ポリイミドフィルムを得ることができ
る。または、前記ポリイミド溶液を貧溶媒中に析出させ
て、ポリイミド粉末とした後、蒸発の容易な有機溶媒に
溶解してポリイミド溶液とし、次いで流延・塗布・溶媒
蒸発させて、ポリイミドフィルムを得ることもできる。
このようにして、対数粘度ηinhが0.3〜3dl/
g、好適には0.5〜2.0dl/gのポリイミドから
なるポリイミドフィルムを得ることができる。
The adhesive polyimide film of the present invention comprises
The polyamic acid solution (transparent viscous solution) obtained as described above is cast-coated on a support such as a glass plate, a stainless steel mirror surface, and a belt surface, dried at 100 to 180 ° C., and then a casting substrate. From the glass transition temperature, preferably 180 to 350 ° C., particularly preferably higher than the glass transition temperature (Tg) and 350 ° C.
Hereinafter, among them, in particular, 270 to 350 ° C. (especially 300 to
It is heated at a curing temperature of (350 ° C. is preferable) for 1 to 60 minutes to perform dehydration ring closure to imidize and remove the solvent, and the imidization rate is 99% or more, the volatile component content is 0.1% or less, and the thickness is 1 to 5
It can be made as a 0 μm transparent film.
Alternatively, the polyimide film of the present invention is solvent soluble (eg, N-methyl-2-pyrrolidone, m-crezo-
(Soluble in a solvent such as a solvent), the polyamic acid solution is heated to 150 to 250 ° C., or an imidizing agent is added and reacted at a temperature of 150 ° C. or lower, particularly 15 to 50 ° C. Then, the obtained polyimide solution is cast and applied, preferably heated to a temperature of 270 to 350 ° C. to evaporate the solvent to obtain a polyimide film. Alternatively, the polyimide solution is precipitated in a poor solvent to form a polyimide powder, which is then dissolved in an organic solvent that is easy to evaporate to form a polyimide solution, which is then cast / coated / solvent evaporated to obtain a polyimide film. You can also
Thus, the logarithmic viscosity ηinh is 0.3 to 3 dl /
It is possible to obtain a polyimide film composed of polyimide, which is preferably 0.5 to 2.0 dl / g.

【0016】上記のようにして得られるポリイミドフィ
ルムは、柔軟性、強度および耐熱性を有しているので、
各種基材(好ましくは金属箔)と熱融着によって積層体
を製造するために使用することができる。
Since the polyimide film obtained as described above has flexibility, strength and heat resistance,
It can be used for producing a laminate by heat fusion with various base materials (preferably metal foil).

【0017】上記のポリイミドフィルムを、好適には各
種基材の間に挿入し、1〜1000kg/cm2 の圧
力、ポリイミドのガラス転移温度(Tg)以上の温度で
かつ350℃以下、特に250〜350℃の温度で、1
秒〜30分間熱融着することにより、剥離強度の大きい
積層体を得ることができる。
The above-mentioned polyimide film is preferably inserted between various substrates, and the pressure is 1-1000 kg / cm 2 , the temperature is not less than the glass transition temperature (Tg) of polyimide and not more than 350 ° C., and particularly 250-. 1 at a temperature of 350 ° C
By heat-sealing for 2 seconds to 30 minutes, a laminate having high peel strength can be obtained.

【0018】この発明におけるポリイミドフィルムは、
いわゆるフィルムに限定されず基材の表面に被覆膜とし
て形成した膜の形態のものも含まれる。この場合の厚み
は1〜50μmであることが好ましい。この場合には、
基材の表面にポリアミック酸溶液あるいはポリイミド溶
液を塗布した後、前記フィルム形成と同様の加熱条件に
よって膜を形成することができる。この膜を介して、前
記と同様の条件で同種あるいは異種の基材と熱融着して
積層体を得ることができる。
The polyimide film in this invention is
The film is not limited to a so-called film, but may be in the form of a film formed as a coating film on the surface of a substrate. In this case, the thickness is preferably 1 to 50 μm. In this case,
After applying the polyamic acid solution or the polyimide solution to the surface of the base material, a film can be formed under the same heating conditions as in the film formation. Through this film, a laminate can be obtained by heat fusion with the same or different base materials under the same conditions as described above.

【0019】[0019]

【実施例】以下、この発明を実施例および比較例により
さらに詳細に説明する。実施例および比較例において、
各ポリイミドフィルムについて下記の各測定試験を行っ
た。ポリイミドのガラス転移温度(Tg)はDSC測定
により、吸熱曲線の変曲点より求めた。ポリイミドの対
数粘度ηinhは、ポリアミック酸溶液をガラス板上に
流延し、80℃で20分、200℃で20分、300℃
で30分、空気中で熱処理を行い、ポリイミドフィルム
としたものについて、N−メチル−2−ピロリドン中
0.5g/dl(30℃)の濃度で測定し、下記式で算
出した。 対数粘度ηinh=ln(t/to )/c (ただし、式中cはポリイミドの濃度であり、to はN
−メチル−2−ピロリドンが粘度管中を落下する時間、
tは試料溶液が粘度管中を落下する時間である。) ポリイミドフィルムの機械的物性は、ASTM D−8
82により測定した。ポリイミドフィルムの熱融着性お
よび耐熱性は、2枚の金属箔(厚み35μmの電解銅
箔)をポリイミドフィルムによって熱融着した金属箔積
層体について、IPC−TM−(2.4.9)の「90
°剥離法」に従って測定した剥離強度と、金属箔積層体
を290℃の半田浴に1分間浮かべた後の剥離強度を測
定するとともに、外観を観察して評価した。
The present invention will be described below in more detail with reference to examples and comparative examples. In Examples and Comparative Examples,
The following measurement tests were performed on each polyimide film. The glass transition temperature (Tg) of polyimide was determined from the inflection point of the endothermic curve by DSC measurement. The logarithmic viscosity ηinh of polyimide is obtained by casting a polyamic acid solution on a glass plate, and then 20 minutes at 80 ° C, 20 minutes at 200 ° C, and 300 ° C.
Heat treatment was performed in the air for 30 minutes in air to obtain a polyimide film, which was measured in N-methyl-2-pyrrolidone at a concentration of 0.5 g / dl (30 ° C.) and calculated by the following formula. Logarithmic viscosity ηinh = ln (t / t o ) / c (where c is the concentration of polyimide and t o is N
The time for the methyl-2-pyrrolidone to fall through the viscous tube,
t is the time for the sample solution to drop in the viscous tube. ) The mechanical properties of the polyimide film are ASTM D-8.
82. The heat-sealing property and heat resistance of the polyimide film are IPC-TM- (2.4.9) for a metal foil laminate in which two metal foils (electrolytic copper foil having a thickness of 35 μm) are heat-sealed with a polyimide film. '90
The peel strength measured in accordance with the “Peeling method” and the peel strength after floating the metal foil laminate in a solder bath at 290 ° C. for 1 minute were measured, and the appearance was observed and evaluated.

【0020】実施例1 攪拌機、冷却管、温度計および窒素導入管を備えた反応
容器に、1,3−ビス(4−アミノフェノキシ)ベンゼ
ン(TPE−R)29.23g(0.100モル)、リ
ン酸トリフェニル59mg、およびN,N−ジメチルア
セトアミド269gを入れた。次に、窒素気流下2,
3,3’,4’−ビフェニルテトラカルボン酸二無水物
(a−BPDA)29.71g(0.101モル)を徐
々に添加し、60℃以下の温度に保ちながら4時間攪拌
して、淡褐色透明粘調なポリアミック酸溶液を得た(ワ
ニスAと略記することもある)。
Example 1 29.23 g (0.100 mol) of 1,3-bis (4-aminophenoxy) benzene (TPE-R) was placed in a reaction vessel equipped with a stirrer, a cooling tube, a thermometer and a nitrogen introducing tube. , 59 mg of triphenyl phosphate, and 269 g of N, N-dimethylacetamide. Next, under a nitrogen stream 2,
29.71 g (0.101 mol) of 3,3 ′, 4′-biphenyltetracarboxylic dianhydride (a-BPDA) was gradually added, and the mixture was stirred for 4 hours while maintaining a temperature of 60 ° C. or lower to give a light weight. A brown transparent viscous polyamic acid solution was obtained (sometimes abbreviated as varnish A).

【0021】このワニスAをガラス板上にアプリケ−タ
を用いて塗布し、140℃で20分加熱して乾燥後、フ
ィルム状物を剥がし、ステンレス製ピンテンタ−に固定
して200℃で20分、300℃で30分空気中で加熱
して、厚み10μmの黄色透明なポリイミドフィルムを
得た。このポリイミドフィルムを用いてηinhおよび
機械的物性を測定した。ポリイミドフィルムはηinh
が0.70、Tgが250℃であり、引張弾性率が27
0kgf/mm2 、引張強度が10.5kgf/m
2 、伸びが75%であった。
This varnish A was applied on a glass plate with an applicator, heated at 140 ° C. for 20 minutes and dried, and then the film-like material was peeled off, fixed on a stainless pin tenter and fixed at 200 ° C. for 20 minutes. After heating in air at 300 ° C. for 30 minutes, a yellow transparent polyimide film having a thickness of 10 μm was obtained. Using this polyimide film, ηinh and mechanical properties were measured. The polyimide film is ηinh
Of 0.70, Tg of 250 ° C., and tensile modulus of 27
0 kgf / mm 2 , tensile strength 10.5 kgf / m
The m 2 and the elongation were 75%.

【0022】上記フィルムを2枚の電解銅箔(厚み35
μm)の間にはさみ、300℃に保った熱プレスで5分
間予熱後、20秒間30kgf/cm2 の圧力で熱融着
により圧着した。次いで、室温まで冷却して積層体であ
る金属箔積層体を得た。この金属箔積層体の剥離強度は
1.9kgf/cmであり、半田処理後も90°剥離強
度は1.9kgf/cmを保ち、外観に異状は認められ
なかった。
Two films of the above-mentioned film were used as electrolytic copper foils (thickness: 35).
μm) and preheated with a hot press kept at 300 ° C. for 5 minutes, and then pressure-bonded by heat fusion at a pressure of 30 kgf / cm 2 for 20 seconds. Then, it cooled to room temperature and obtained the metal foil laminated body which is a laminated body. The peel strength of this metal foil laminate was 1.9 kgf / cm, and the 90 ° peel strength remained 1.9 kgf / cm even after soldering, and no abnormalities were observed in the appearance.

【0023】実施例1におけるポリイミドフィルムを、
厚み25μmの高剛性ポリイミドフィルム(カプトン、
デュポン社製)と電解銅箔との間にはさみ、実施例1に
記載の条件と同様の熱融着操作を行った。90°剥離強
度は1.2kgf/cmであり、半田処理後も1.2k
gf/cmを保ち、外観に異状は認められなかった。な
お、剥離は2種類のポリイミドフィルムの間で生じてい
た。
The polyimide film of Example 1 was replaced with
Highly rigid polyimide film with a thickness of 25 μm (Kapton,
It was sandwiched between a DuPont company) and an electrolytic copper foil, and the same heat fusion operation as the conditions described in Example 1 was performed. 90 ° peel strength is 1.2kgf / cm, 1.2k after soldering
The gf / cm was maintained, and no abnormalities were found in the appearance. The peeling occurred between the two types of polyimide films.

【0024】実施例2 実施例1におけるTPE−Rを29.52g(0.10
1モル)、a−BPDAを29.42g(0.100モ
ル)に変更し、反応時間を4時間から1時間に変えた他
は実施例1と同様にしてポリアミック酸の重合を行った
後、無水フタル酸0.296g(0.02モル)を添加
し、引き続き3時間重合を行い、淡褐色透明粘稠なポリ
アミック酸溶液を得た。この溶液から実施例1と同様に
して黄色透明なポリイミドフィルムを得た。このポリイ
ミドフィルムは、ηinhが0.73、Tgが250
℃、引張弾性率が270kgf/mm2 、引張強度が1
0.5kgf/mm2 、伸びが75%であった。
Example 2 29.52 g (0.10 g) of TPE-R in Example 1 was used.
1 mol), a-BPDA was changed to 29.42 g (0.100 mol), and the reaction time was changed from 4 hours to 1 hour. After polymerization of polyamic acid was carried out in the same manner as in Example 1, 0.296 g (0.02 mol) of phthalic anhydride was added, followed by polymerization for 3 hours to obtain a light brown transparent viscous polyamic acid solution. A yellow transparent polyimide film was obtained from this solution in the same manner as in Example 1. This polyimide film has an ηinh of 0.73 and a Tg of 250.
° C, tensile elastic modulus 270 kgf / mm 2 , tensile strength 1
It was 0.5 kgf / mm 2 and the elongation was 75%.

【0025】上記ポリイミドフィルムを実施例1と同様
に2枚の電解銅箔の間に介在し、熱圧着した。得られた
金属箔積層体の90°剥離強度が2.0kgf/cmで
あり、半田処理後も2.0kgf/cmと変化なく、外
観異状もなかった。
As in Example 1, the polyimide film was interposed between two electrolytic copper foils and thermocompression bonded. The 90 ° peel strength of the obtained metal foil laminate was 2.0 kgf / cm, which was 2.0 kgf / cm even after the soldering treatment and had no abnormal appearance.

【0026】実施例3 実施例1における重合溶媒:N,N−ジメチルアセトア
ミド269gを、N−メチル−2−ピロリドン235g
に変え、実施例2と同様の操作で無水フタル酸残基でア
ミン末端を無水フタル酸残基で末端封止したポリアミッ
ク酸溶液を得た。次いで、冷却管を水分離器付き冷却管
と置き換えてトルエンを30g反応液に添加した後、反
応系中の温度を180℃に上昇させ、反応を5時間続け
た。イミド化による生成水をトルエンとともに共沸さ
せ、理論量の水を系外に除去し、淡黄褐色透明粘稠なポ
リイミド溶液を得た。この溶液から実施例1に記載の方
法と同様にして黄色透明なポリイミドフィルムを得た。
Example 3 Polymerization solvent used in Example 1: 269 g of N, N-dimethylacetamide and 235 g of N-methyl-2-pyrrolidone
In the same manner as in Example 2, a polyamic acid solution in which the amine terminal was capped with a phthalic anhydride residue was obtained in the same manner as in Example 2. Then, the cooling tube was replaced with a cooling tube equipped with a water separator, 30 g of toluene was added to the reaction solution, the temperature in the reaction system was raised to 180 ° C., and the reaction was continued for 5 hours. The water produced by imidization was azeotropically distilled with toluene, and a theoretical amount of water was removed to the outside of the system to obtain a pale yellowish brown transparent viscous polyimide solution. A yellow transparent polyimide film was obtained from this solution in the same manner as in Example 1.

【0027】この接着性ポリイミドフィルムは、ηin
hが0.75、Tgが250℃、引張弾性率が270k
gf/cm、引張強度が10.5kgf/mm2 、伸び
が75%であった。上記ポリイミドフィルムを実施例1
と同様に2枚の電解銅箔の間に介在し、熱融着した。得
られた金属箔積層体の90°剥離強度が2.1kgf/
cmであり、半田処理後も2.1kgf/cmと変化な
く、外観異状もなかった。
This adhesive polyimide film has ηin
h is 0.75, Tg is 250 ° C, and tensile modulus is 270k.
It had a gf / cm, a tensile strength of 10.5 kgf / mm 2 , and an elongation of 75%. Example 1 using the above polyimide film
In the same manner as above, it was interposed between two electrolytic copper foils and heat-sealed. The 90 ° peel strength of the obtained metal foil laminate was 2.1 kgf /
The result was 2.1 cmf / cm even after soldering, and there was no abnormal appearance.

【0028】実施例4 実施例1におけるa−BPDA29.71g(0.10
1モル)に代えて、a−BPDA23.68g(0.0
81モル)と3,3’,4,4’−ビフェニルテトラカ
ルボン酸二無水物5.88g(0.020モル)を使用
した他は実施例1と同様に実施して黄色透明なポリイミ
ドフィルムを得た。
Example 4 29.71 g (0.10) of a-BPDA in Example 1
1-mol), a-BPDA 23.68g (0.0
81 mol) and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride 5.88 g (0.020 mol) were used and the same procedure as in Example 1 was carried out to obtain a yellow transparent polyimide film. Obtained.

【0029】このポリイミドフィルムは、ηinhが
0.75、Tgが248℃、引張弾性率が280kgf
/cm、引張強度が11kgf/mm2 、伸びが80%
であった。上記ポリイミドフィルムを実施例1と同様に
2枚の電解銅箔の間に介在し、熱融着した。得られた金
属箔積層体の90°剥離強度が1.4kgf/cmであ
り、半田処理後も1.4kgf/cmと変化なく、外観
異状もなかった。
This polyimide film has an ηinh of 0.75, a Tg of 248 ° C. and a tensile elastic modulus of 280 kgf.
/ Cm, tensile strength 11 kgf / mm 2 , elongation 80%
Met. Similar to Example 1, the polyimide film was interposed between two electrolytic copper foils and heat-sealed. The 90 ° peel strength of the obtained metal foil laminate was 1.4 kgf / cm, which was 1.4 kgf / cm even after the soldering treatment and had no abnormal appearance.

【0030】比較例1 実施例1におけるTPE−Rを29.53g(0.10
1モル)、a−BPDAを29.42g(0.100モ
ル)に変更した他は実施例1と同様に実施してポリイミ
ドフィルムを得た。
Comparative Example 1 The TPE-R used in Example 1 was 29.53 g (0.10).
1 mol) and a-BPDA were changed to 29.42 g (0.100 mol), and the same procedure as in Example 1 was carried out to obtain a polyimide film.

【0031】このポリイミドフィルムはゲルが生じてお
り、ηinhを測定しようとしたところ、溶媒であるN
−メチル−2−ピロリドンに膨潤するだけで溶解せず測
定不能であった。上記ポリイミドフィルムを実施例1と
同様に2枚の電解銅箔の間に介在し、熱圧着した。得ら
れた金属箔積層体の90°剥離強度が0.1kgf/c
m以下であった。
This polyimide film was found to have a gel, and when trying to measure ηinh, N
It swelled in -methyl-2-pyrrolidone but did not dissolve and could not be measured. As in Example 1, the polyimide film was interposed between two electrolytic copper foils and thermocompression bonded. The 90 ° peel strength of the obtained metal foil laminate is 0.1 kgf / c.
It was m or less.

【0032】実施例5 実施例1におけるTPE−R29.23g(0.100
モル)に代えて、TPE−R26.32g(0.090
モル)と1,6−ジアミノヘキサン1.16g(0.0
10モル)を使用した他は実施例1と同様にしてポリイ
ミドフィルムを得た。このポリイミドフィルムは、ηi
nhが0.83、Tgが232℃であった。上記ポリイ
ミドフィルムを実施例1と同様に2枚の電解銅箔の間に
介在し、熱融着した。得られた金属箔積層体の90°剥
離強度が1.6kgf/cmであり、半田処理後も1.
6kgf/cmと変化なく、外観異状もなかった。
Example 5 TPE-R in Example 1 29.23 g (0.100)
26.32 g (0.090) of TPE-R instead of mol.
Mol) and 1,6-diaminohexane 1.16 g (0.0
A polyimide film was obtained in the same manner as in Example 1 except that 10 mol) was used. This polyimide film is ηi
The nh was 0.83 and the Tg was 232 ° C. Similar to Example 1, the polyimide film was interposed between two electrolytic copper foils and heat-sealed. The 90 ° peel strength of the obtained metal foil laminate was 1.6 kgf / cm, which was 1.
There was no change of 6 kgf / cm, and there was no abnormal appearance.

【0033】[0033]

【発明の効果】この発明のポリイミドフィルムは、高温
下の成形によってゲル化が実質的に生じないという耐熱
性と、フィルムとしての柔軟性および強度を有し、かつ
実用上問題のない熱融着性を有している。
INDUSTRIAL APPLICABILITY The polyimide film of the present invention has heat resistance such that gelation does not substantially occur by molding under high temperature, flexibility and strength as a film, and heat fusion bonding which causes no practical problems. Have sex.

【0034】この発明のポリイミドフィルムは、ポリイ
ミドが熱的に安定でありガラス転移温度以上の温度でキ
ュアして得たものについては、揮発分の含有率が少なく
熱的に変化の少ない安定な性能を有している。
The polyimide film of the present invention, which is obtained by curing polyimide at a temperature not lower than the glass transition temperature and is thermally stable, has a stable content with a small volatile content and a small thermal change. have.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 下記のイミド単位(A)および(B)か
らなり、 【化1】 【化2】 〔式(B)において、R,R’はそれぞれ4価および2
価の芳香族基または脂肪族基を表す。〕 (A)が80〜100モル%、(B)が20〜0モル%
であって、このポリマ−末端がテトラカルボン酸無水物
残基であるか、またはアミン末端をジカルボン酸無水物
で封止したポリイミドを主成分とすることを特徴とする
ポリイミドフィルム。
1. A compound comprising the following imide units (A) and (B): Embedded image [In the formula (B), R and R ′ are respectively tetravalent and 2
Represents a valent aromatic group or an aliphatic group. (A) is 80 to 100 mol%, and (B) is 20 to 0 mol%.
The polyimide film is characterized in that the polymer terminal is a tetracarboxylic acid anhydride residue or a polyimide having an amine terminal sealed with a dicarboxylic acid anhydride as a main component.
【請求項2】 ポリアミック酸またはポリイミドの溶液
を支持体面上に流延塗布し、ポリイミドのガラス転移温
度より高くかつ270〜350℃のキュア温度まで加熱
して脱水閉環・溶媒除去してなり、ポリイミドの対数粘
度ηinhが0.3〜3dl/gである請求項1記載の
ポリイミドフィルム。
2. A method comprising casting a solution of polyamic acid or polyimide on the surface of a support and heating it to a curing temperature higher than the glass transition temperature of polyimide and 270 to 350 ° C. for dehydration ring closure and solvent removal. The polyimide film according to claim 1, wherein the logarithmic viscosity ηinh is 0.3 to 3 dl / g.
【請求項3】 ポリイミドのガラス転移温度Tgが23
0〜300℃である請求項2記載のポリイミドフィル
ム。
3. The glass transition temperature Tg of polyimide is 23.
The polyimide film according to claim 2, which has a temperature of 0 to 300 ° C.
JP19653795A 1995-08-01 1995-08-01 Polyimide film Expired - Lifetime JP3444035B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP19653795A JP3444035B2 (en) 1995-08-01 1995-08-01 Polyimide film
US08/690,107 US5741598A (en) 1995-08-01 1996-07-31 Polyimide/metal composite sheet
KR1019960032251A KR100417030B1 (en) 1995-08-01 1996-08-01 Polyimide/metal composite sheet
US10/454,730 US6797392B2 (en) 1995-08-01 2003-06-03 Polyimide/metal composite sheet

Applications Claiming Priority (1)

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JP19653795A JP3444035B2 (en) 1995-08-01 1995-08-01 Polyimide film

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Publication Number Publication Date
JPH0940775A true JPH0940775A (en) 1997-02-10
JP3444035B2 JP3444035B2 (en) 2003-09-08

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10310639A (en) * 1997-05-09 1998-11-24 Ube Ind Ltd Colorless transparent polyimide and production thereof
JP2003531487A (en) * 2000-04-18 2003-10-21 イー−インク コーポレイション Process for manufacturing thin film transistor
JP2007208270A (en) * 2007-02-15 2007-08-16 Ube Ind Ltd Stacked wafer, its manufacturing method, and substrate
JP2014177559A (en) * 2013-03-15 2014-09-25 Ube Ind Ltd Thermally conductive resin composition, and laminate using the same
JP2014177558A (en) * 2013-03-15 2014-09-25 Ube Ind Ltd Resin composition, and laminate using the same
JP5648630B2 (en) * 2009-04-28 2015-01-07 宇部興産株式会社 Multilayer polyimide film
WO2016121817A1 (en) * 2015-01-29 2016-08-04 宇部興産株式会社 Polyimide precursor composition, and process for producing insulating coating layer using same
WO2020166913A1 (en) * 2019-02-14 2020-08-20 주식회사 엘지화학 Polyimide precursor composition and polyimide film manufactured using same
KR20200099469A (en) * 2019-02-14 2020-08-24 주식회사 엘지화학 Compoistion of polyimide precursor and polyimide film prepared using same

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JP3534151B2 (en) * 1996-10-29 2004-06-07 宇部興産株式会社 Polyimide precursor composition and polyimide film

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10310639A (en) * 1997-05-09 1998-11-24 Ube Ind Ltd Colorless transparent polyimide and production thereof
JP2003531487A (en) * 2000-04-18 2003-10-21 イー−インク コーポレイション Process for manufacturing thin film transistor
JP2007208270A (en) * 2007-02-15 2007-08-16 Ube Ind Ltd Stacked wafer, its manufacturing method, and substrate
JP5648630B2 (en) * 2009-04-28 2015-01-07 宇部興産株式会社 Multilayer polyimide film
JP2014177559A (en) * 2013-03-15 2014-09-25 Ube Ind Ltd Thermally conductive resin composition, and laminate using the same
JP2014177558A (en) * 2013-03-15 2014-09-25 Ube Ind Ltd Resin composition, and laminate using the same
WO2016121817A1 (en) * 2015-01-29 2016-08-04 宇部興産株式会社 Polyimide precursor composition, and process for producing insulating coating layer using same
WO2020166913A1 (en) * 2019-02-14 2020-08-20 주식회사 엘지화학 Polyimide precursor composition and polyimide film manufactured using same
KR20200099469A (en) * 2019-02-14 2020-08-24 주식회사 엘지화학 Compoistion of polyimide precursor and polyimide film prepared using same

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