JPH09306813A - 観察装置及び該装置を備えた露光装置 - Google Patents

観察装置及び該装置を備えた露光装置

Info

Publication number
JPH09306813A
JPH09306813A JP8120404A JP12040496A JPH09306813A JP H09306813 A JPH09306813 A JP H09306813A JP 8120404 A JP8120404 A JP 8120404A JP 12040496 A JP12040496 A JP 12040496A JP H09306813 A JPH09306813 A JP H09306813A
Authority
JP
Japan
Prior art keywords
light
reticle
mark
optical system
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8120404A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09306813A5 (enExample
Inventor
Hideo Mizutani
英夫 水谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8120404A priority Critical patent/JPH09306813A/ja
Publication of JPH09306813A publication Critical patent/JPH09306813A/ja
Publication of JPH09306813A5 publication Critical patent/JPH09306813A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8120404A 1996-05-15 1996-05-15 観察装置及び該装置を備えた露光装置 Pending JPH09306813A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8120404A JPH09306813A (ja) 1996-05-15 1996-05-15 観察装置及び該装置を備えた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8120404A JPH09306813A (ja) 1996-05-15 1996-05-15 観察装置及び該装置を備えた露光装置

Publications (2)

Publication Number Publication Date
JPH09306813A true JPH09306813A (ja) 1997-11-28
JPH09306813A5 JPH09306813A5 (enExample) 2004-07-22

Family

ID=14785382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8120404A Pending JPH09306813A (ja) 1996-05-15 1996-05-15 観察装置及び該装置を備えた露光装置

Country Status (1)

Country Link
JP (1) JPH09306813A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7345739B2 (en) 2003-03-07 2008-03-18 Asml Netherlands B.V. Lithographic alignment system and device manufacturing method
KR20180103730A (ko) 2017-03-09 2018-09-19 캐논 가부시끼가이샤 임프린트 장치 및 물품 제조 방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7345739B2 (en) 2003-03-07 2008-03-18 Asml Netherlands B.V. Lithographic alignment system and device manufacturing method
KR20180103730A (ko) 2017-03-09 2018-09-19 캐논 가부시끼가이샤 임프린트 장치 및 물품 제조 방법
JP2018152374A (ja) * 2017-03-09 2018-09-27 キヤノン株式会社 インプリント装置および物品製造方法

Similar Documents

Publication Publication Date Title
US7551262B2 (en) Exposure apparatus having a position detecting system and a wavelength detector
EP1041608A1 (en) Mark detection method and mark position sensor
US6016186A (en) Alignment device and method with focus detection system
KR19980042190A (ko) 위치검출용 마크, 마크 검출방법 및 그 장치, 및 노광장치
JP2010225940A (ja) 位置検出装置、露光装置及びデバイス製造方法
US20090225327A1 (en) Position measurement apparatus, position measurement method, and exposure apparatus
JPH11251226A (ja) Ｘ線投影露光装置
JP4032501B2 (ja) 投影光学系の結像特性計測方法及び投影露光装置
JPH09246160A (ja) 投影露光装置
JP5137526B2 (ja) 形状測定装置、形状測定方法、および露光装置
JP3980469B2 (ja) リソグラフィック装置及びデバイス製造方法
JP2000299276A (ja) 露光装置
JP2000010013A (ja) 位相差顕微鏡及び重ね合わせ測定装置
JPH0963924A (ja) アライメント方法
JPH09306813A (ja) 観察装置及び該装置を備えた露光装置
KR20090026082A (ko) 노광장치, 노광방법, 및 디바이스의 제조방법
JP2001185474A (ja) アライメント方法、アライメント装置、基板、マスク、及び露光装置
JPH10172900A (ja) 露光装置
JPH11251233A (ja) 投影露光装置、アライメント装置およびアライメント方法
JP3223932B2 (ja) 半導体素子の製造方法、並びに該方法に使用する位置検出装置及び露光装置
JPH11304422A (ja) 位置検出装置及び位置検出方法並びに露光装置
JP3295244B2 (ja) 位置決め装置
JP2006078283A (ja) 位置計測装置、該位置計測装置を備えた露光装置及び該位置計測装置を使用する露光方法
JPH04267536A (ja) 位置検出装置
JP2004103932A (ja) 位置計測装置、位置計測方法および露光装置並びに露光方法

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20040907

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20040922

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20050131