JPH09306341A - Manufacture of plasma display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a simple partition wall forming method by which a highly accurate pattern having the high aspect ratio can be attained. SOLUTION: After photosensitive glass paste 2 using a photoreactive organic component and glass powder as an essential is applied on a glass substrate 1, exposure is performed from both surfaces of a glass surface by using a photomask 3, and a light irradiated part or a light unirradiated part is eluted by development, and after a pattern 4 is formed, an organic substance is removed by baking, and a partition wall layer is formed. Or after a light shielding pattern is formed on the glass substrate 1, the photosensitive glass paste 2 using a photoreactive organic component and glass powder as an essential component is applied, and exposure is performed from both surfaces of a glass surface, and a light irradiated part or a light unirradiated part is eluted by development, and after a pattern 4 is formed, an organic substance is removed by baking, and a partition wall layer is formed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing method for accurately forming barrier ribs having a high aspect ratio in displays such as plasma displays and plasma addressed liquid crystal displays.

[0002]

2. Description of the Related Art In recent years, miniaturization and high definition of displays have been progressing, and accordingly, there has been a demand for an improvement in pattern processing technology. In particular, in forming the partition walls of the plasma display panel, a material that is highly accurate and is capable of pattern processing with a high aspect ratio is desired.

Conventionally, when patterning an inorganic material, screen printing using a paste composed of an inorganic powder and an organic binder is often used. However, screen printing has a drawback that a highly accurate pattern cannot be formed.

As a method for solving this problem, Japanese Patent Laid-Open No.
-296534, JP-A-2-165538,
Japanese Unexamined Patent Publication No. 5-342992 proposes a method of forming a photosensitive paste by a photolithography technique. However, because the sensitivity and resolution of the photosensitive paste are low, high aspect ratio and high-definition partition walls cannot be obtained. For example, when patterning a thickness of more than 80 μm, a plurality of processing steps (screen printing, Since it requires exposure and development, there is a drawback that the process becomes long.

In Japanese Patent Application Laid-Open No. 2-165538, after a photosensitive paste is coated on transfer paper,
Japanese Patent Application Laid-Open No. 3-57138 proposes a method of transferring a transfer film onto a glass substrate to form partitions, in which grooves of a photoresist layer are filled with a dielectric paste to form partitions. . In addition, JP-A-4-109
Japanese Patent No. 536 proposes a method of forming partition walls using a photosensitive organic film. However, these methods have a problem that the number of processes is increased because a transfer film, a photoresist, or an organic film is required. Further, a partition having a high definition and a high aspect ratio has not been obtained.

Further, although the formation of partition walls using a photosensitive glass paste has been proposed, it is impossible to form a thick film pattern.
Six coating and exposure steps were required.

[0007]

The inventors of the present invention have made intensive studies on a photosensitive paste free from the above-mentioned disadvantages, and as a result, have arrived at the following invention. In particular, we have found a simple method that enables pattern processing with a high aspect ratio and high accuracy. It is an object of the present invention to provide a method of manufacturing a plasma display having a partition wall layer which is patterned with high aspect ratio and high precision.

[0008]

DISCLOSURE OF THE INVENTION The inventors have found that patterning by photolithography using a photosensitive glass paste is effective for accurately forming a pattern having a high aspect ratio with respect to the photosensitive glass paste. Therefore, the present invention has been achieved.

That is, according to the present invention, a photosensitive glass paste containing a photoreactive organic component and glass powder as essential components is applied onto a glass substrate, and then a photomask is used to apply the photosensitive glass paste onto the coated surface. And exposing from both sides of the glass surface, which is the back surface of the coating surface, to elute the light-irradiated portion or the non-light-irradiated portion by development, form a pattern, and then remove the organic matter by firing to form partition walls. A method for manufacturing a plasma display characterized by forming a layer, further, the present invention, after forming a light-shielding pattern on the glass substrate, the photoreactive organic component and glass powder as an essential component photosensitive The glass paste is applied, and the coated surface coated with the photosensitive glass paste, and exposure is performed from both sides of the glass surface which is the back surface of the coated surface,
A method of manufacturing a plasma display, characterized in that a portion irradiated with light or a portion not irradiated with light is eluted by development to form a pattern, and then organic material is removed by baking to form a partition layer.

[0010]

BEST MODE FOR CARRYING OUT THE INVENTION According to the present invention, a photosensitive glass paste is applied onto a glass substrate by using screen printing or a doctor blade. After the application, the photosensitive glass paste is applied onto the applied surface once through a photomask. Alternatively, the method involves forming a glass partition wall by exposing twice, exposing, removing unnecessary portions, firing, and removing organic substances. By doing so, it is possible to form high-precision partition walls that are difficult to form by screen printing or sandblasting.In addition, even when the conditions for making them are inappropriate, the exposed light passes through the deep part of the coating film, causing photoreaction. Therefore, it is possible to provide a plasma display capable of forming a high-aspect partition wall without pattern loss.

The glass substrate used in the present invention is not particularly limited as long as it is a known glass plate, and soda lime glass, borosilicate-based low-alkali or non-alkali glass, and soda glass used for ordinary window glass and the like are used. High strain point glass (trade name "PD-200", manufactured by Asahi Glass Co., Ltd.) having an improved strain point can be used.

When the glass powder constituting the photosensitive glass paste used in the present invention has a glass transition temperature (Tg) of 350 to 550 ° C., pattern processing can be easily performed on the glass substrate. Is preferable because it can

Preferably, glass powder containing 10 to 80 parts by weight or more of at least one of bismuth oxide and lead oxide is used in an amount of 50% by weight or more with respect to the total amount of the inorganic components in the photosensitive glass paste. It is possible to obtain a photosensitive glass paste having temperature characteristics capable of being patterned on a substrate. In particular, bismuth oxide 10-8
Using glass containing 0% by weight has advantages such as a long pot life of the paste. As a glass composition containing bismuth oxide, 50% by weight or more of a composition containing Bi ₂ O ₃ 10 to 80% by weight, SiO ₂ 3 to 60% by weight, B ₂ O ₃ 5 to 40% by weight in terms of oxide conversion. It is preferable.

Further, ZnO and Al ₂ O are contained in the glass powder.
₃ , Li ₂ O, CaO, TiO ₂ , ZrO _{2 and the} like can be contained, but the amount thereof is preferably 20% by weight or less. Further, the content of oxide metal such as Na ₂ O, K ₂ O and Y ₂ O ₃ is preferably 5% by weight or less. As the composition in the glass powder, SiO ₂ is 3 to 6
It is preferable to blend in the range of 0% by weight, and when it is less than 3% by weight, the denseness, strength and stability of the glass layer are deteriorated.
In addition, a mismatch between the glass substrate and the coefficient of thermal expansion occurs, which deviates from the desired value. Further, when the content is set to 60% by weight or less, there is an advantage that the heat softening point is lowered and baking on a glass substrate becomes possible. By blending B ₂ O ₃ in the range of 5 to 40% by weight, electrical insulation, strength,
It is possible to improve electric, mechanical and thermal characteristics such as a coefficient of thermal expansion and the denseness of the insulating layer. If it exceeds 40% by weight, the stability of the glass decreases. Bi ₂ O ₃ is preferably blended in the range of 10 to 80% by weight. When it is less than 10% by weight, the effect of controlling the baking temperature is small when the photosensitive glass paste is baked on the glass substrate. If it exceeds 80% by weight, the heat resistant temperature of the glass becomes too low and baking on a glass substrate becomes difficult, and the insulation resistance becomes low, which is not preferable. .

The particle size of the glass powder used in the above is selected in consideration of the shape of the pattern to be produced, but the 50% by weight particle size is preferably 0.1 to 10 μm. The inventors have also found that high aspect ratio patterning is possible by using glass powder having a spherical shape as the glass powder. The glass powder used in this case has a 50 wt% (average) particle size of 1.0 to 7 μm and a 10 wt% particle size of 0.
4 to 2 μm, 90 wt% particle size of 4 to 10 μm, specific surface area of 0.2 to 3.0 m ² / g, and sphericity of 80 number% or more are preferred. More preferably, the average particle size is 1.5 to 4 μm, and the specific surface area is 0.5 to 1.5 m ² /
g, sphericity is 90% by number or more. The sphericity is a ratio of the number of powders having a spherical shape (including an ellipsoidal shape) in observing glass powder with a microscope or the like.

As the photoreactive organic component used in the present invention, one selected from at least one of a photosensitive monomer, a photosensitive oligomer and a photosensitive polymer can be preferably used.

The photoreactive organic component includes a photoinsolubilizing type (negative type) and a photosolubilizing type (positive type). As the photoinsolubilizing type, (1) an unsaturated group in the molecule Functional monomer, oligomer having one or more of
Containing a polymer, (2) aromatic diazo compound,
Examples include so-called diazo resins such as those containing a photosensitive compound such as an aromatic azide compound and an organic halogen compound, and (3) a condensation product of a diazo amine and formaldehyde. In addition, as the photo-soluble type,
(4) Complexes of diazo compounds with inorganic salts and organic acids, containing quinonediazos, (5) quinonediazos combined with a suitable polymer binder, for example, phenol, naphthoquinone 1,2-diazide of novolac resin There are 5-sulfonic acid ester and the like.

As the photoreactive organic component used in the present invention, all of the above can be used.

Examples of the photosensitive monomer as the photoreactive organic component include compounds containing a carbon-carbon unsaturated bond, and specific examples thereof include methyl acrylate, ethyl acrylate, n-propyl acrylate and isopropyl. Acrylate, n-butyl acrylate, sec-butyl acrylate, sec-butyl acrylate, iso-butyl acrylate, tert-butyl acrylate, n-pentyl acrylate, allyl acrylate, benzyl acrylate, butoxyethyl acrylate, butoxytriethylene glycol acrylate, cyclohexyl acrylate , Dicyclopentanyl acrylate, dicyclopentenyl acrylate, 2
-Ethylhexyl acrylate, glycerol acrylate, glycidyl acrylate, heptadecafluorodecyl acrylate, 2-hydroxyethyl acrylate,
Isobonyl acrylate, 2-hydroxypropyl acrylate, isodexyl acrylate, isooctyl acrylate, lauryl acrylate, 2-methoxyethyl acrylate, methoxyethylene glycol acrylate, methoxydiethylene glycol acrylate, octafluoropentyl acrylate, phenoxyethyl acrylate, stearyl acrylate, triaryl acrylate Fluoroethyl acrylate, allylic cyclohexyl diacrylate, 1,4-butanediol diacrylate, 1,3-
Butylene glycol diacrylate, ethylene glycol diacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, dipentaerythritol hexaacrylate, dipentaerythritol monohydroxypentaacrylate, ditrimethylolpropane tetraacrylate, glycerol diacrylate,
Methoxylated cyclohexyl diacrylate, neopentyl glycol diacrylate, propylene glycol diacrylate, polypropylene glycol diacrylate, triglycerol diacrylate, trimethylol propane triacrylate, acrylamide, aminoethyl acrylate and some of the acrylates in the molecule of the above compounds All changed to methacrylate, γ-methacryloxypropyltrimethoxysilane,
1-vinyl-2-pyrrolidone and the like can be mentioned.

In the present invention, these may be used alone or in combination of two or more. In addition, by adding an unsaturated carboxylic acid, the developability after exposure can be improved. Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, crotonic acid,
Maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof are exemplified.

On the other hand, specific examples of the photosensitive oligomer or photosensitive polymer as the photoreactive organic component include phenyl (meth) acrylate and phenoxyethyl (meth).
Acrylate, benzyl (meth) acrylate, 1-naphthyl (meth) acrylate, 2-naphthyl (meth) acrylate, bisphenol A di (meth) acrylate, bisphenol A-ethylene oxide adduct di (meth) acrylate, bisphenol A-propylene Di (meth) acrylate, thiophenol (meth) acrylate, benzyl mercaptan (meth) acrylate of an oxide adduct, and a monomer in which 1 to 5 hydrogen atoms of these aromatic rings are replaced with chlorine or bromine atoms, Alternatively, styrene, p-methylstyrene, o
-Methylstyrene, m-methylstyrene, chlorinated styrene, brominated styrene, α-methylstyrene, chlorinated α-
An oligomer or polymer obtained by polymerizing at least one kind of methylstyrene, brominated α-methylstyrene, chloromethylstyrene, and hydroxymethylstyrene can be used.

During the polymerization, other reactive monomers can be copolymerized so that the content of these monomers is 10% by weight or more, more preferably 35% by weight or more. As the monomer to be copolymerized, the aforementioned compound containing a carbon-carbon unsaturated bond can be used.

By copolymerizing an unsaturated carboxylic acid, the developability after exposure can be improved. Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid,
Examples thereof include fumaric acid, vinyl acetic acid, and acid anhydrides thereof.

The acid value (AV) of the polymer or oligomer having a carboxyl group on the side chain thus obtained is 5
The range is preferably from 0 to 180, and more preferably from 70 to 140.
When the acid value is less than 50, the allowable development width becomes narrow. On the other hand, if the acid value exceeds 180, the solubility of the unexposed portion in the developing solution decreases, so that if the developing solution concentration is increased, peeling occurs up to the exposed portion, making it difficult to obtain a high-definition pattern.

Photosensitivity can be imparted to the above-described polymer or oligomer by adding a photoreactive group to a side chain or a molecular end. Preferred photoreactive groups are those having an ethylenically unsaturated group. Examples of the ethylenically unsaturated group include a vinyl group, an allyl group, an acryl group, and a methacryl group. The method of adding such a side chain to an oligomer or a polymer includes an ethylenically unsaturated compound having a glycidyl group or an isocyanate group, a mercapto group, an amino group, a hydroxyl group, and a carboxyl group in the polymer, acrylic acid chloride, and methacrylic acid. There is a method of making an acid chloride or allyl chloride by an addition reaction.

Examples of the ethylenically unsaturated compound having a glycidyl group include glycidyl acrylate, glycidyl methacrylate, allyl glycidyl ether, glycidyl ethyl acrylate, crotonyl glycidyl ether, crotonic acid glycidyl ether, and isocrotonic acid glycidyl ether. . Examples of the ethylenically unsaturated compound having an isocyanate group include (meth) acryloyl isocyanate and (meth) acryloyl ethyl isocyanate. The ethylenically unsaturated compound having a glycidyl group or an isocyanate group, acrylic acid chloride, methacrylic acid chloride or allyl chloride is used in an amount of 0.05 to 1 molar equivalent based on the mercapto group, amino group, hydroxyl group or carboxyl group in the polymer. It is preferable to add them.

The photosensitive glass paste used in the present invention is
The content of the photoreactive organic component is preferably 10% by weight or more based on the total amount of the organic components in the photosensitive glass paste from the viewpoint of light sensitivity. Further, it is preferably 30% by weight or more. As the organic component in the photosensitive glass paste, in addition to the photoreactive organic component, a binder, a photopolymerization initiator, an ultraviolet absorber, a sensitizer, a sensitization aid,
Polymerization inhibitor, plasticizer, thickener, organic solvent, antioxidant,
Additive components such as dispersants and organic suspending agents may be included.

In the photosensitive glass paste used in the present invention, a binder, a photopolymerization initiator, an ultraviolet light absorber, a sensitizer, a sensitization aid, a polymerization inhibitor, a plasticizer, a thickener,
Additive components such as an organic solvent, an antioxidant, a dispersant, and an organic or inorganic suspending agent are also added.

As the binder, polyvinyl alcohol, polyvinyl butyral, methacrylic acid ester polymer, acrylic acid ester polymer, acrylic acid ester-
Examples include methacrylate copolymers, α-methylstyrene polymers, and butyl methacrylate resins. Increasing the refractive index of the binder component is also effective for increasing the refractive index of the photoreactive organic component. As a method for increasing the refractive index of the binder component, any of the above-described photosensitive polymers and photosensitive oligomers in which an ethylenically unsaturated group that is a photoreactive group is not added to a side chain or a molecular terminal can be used. In other words, those in which the step of providing the reactive group of the photosensitive polymer or the photosensitive oligomer is omitted can be used as the binder.

Specific examples of the photopolymerization initiator include:
Benzophenone, methyl o-benzoylbenzoate, 4,
4-bis (dimethylamino) benzophenone, 4,4-
Bis (diethylamino) benzophenone, 4,4-dichlorobenzophenone, 4-benzoyl-4-methyldiphenylketone, dibenzylketone, fluorenone, 2,
2-diethoxyacetophenone, 2,2-dimethoxy-
2-phenyl-2-phenylacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxanthone, benzyl, Benzyl dimethyl ketanol, benzyl-methoxyethyl acetal, benzoin, benzoin methyl ether, benzoin butyl ether, anthraquinone, 2-t-butylanthraquinone, 2-amylanthraquinone, β-chloroanthraquinone, anthrone, benzanthrone, dibenzosuberone, methyleneanthrone. , 4-azidobenzalacetophenone, 2,6-bis (p-azidobenzylidene) cyclohexanone, 2,6
-Bis (p-azidobenzylidene) -4-methylcyclohexanone, 2-phenyl-1,2-butadione-2-
(O-methoxycarbonyl) oxime, 1-phenyl-
Propanedione-2- (o-ethoxycarbonyl) oxime, 1,3-diphenyl-propanetrione-2-
(O-ethoxycarbonyl) oxime, 1-phenyl-
3-ethoxy-propanetrione-2- (o-benzoyl) oxime, Michler's ketone, 2-methyl- [4-
(Methylthio) phenyl] -2-morpholino-1-propanone, naphthalenesulfonyl chloride, quinoline sulfonyl chloride, N-phenylthioacridone,
Photoreducing properties of 4,4-azobisisobutyronitrile, diphenyl disulfide, benzthiazole disulfide, triphenylphosphine, camphor quinone, carbon tetrabromide, tribromophenyl sulfone, benzoin peroxide and eosin, methylene blue, etc. And a reducing agent such as ascorbic acid or triethanolamine. In the present invention, these may be used alone or in combination of two or more. The photopolymerization initiator is added in the range of 0.05 to 10% by weight with respect to the photoreactive organic component,
More preferably, it is 0.1 to 5% by weight. If the amount of the polymerization initiator is too small, the photosensitivity becomes poor, and if the amount of the photopolymerization initiator is too large, the residual ratio of the exposed portion may be too small.

It is also effective to add an ultraviolet absorber. A high aspect ratio, high definition, and high resolution can be obtained by adding a light absorber having a high ultraviolet absorption effect. As the ultraviolet light absorber, one made of an organic dye is used,
Among them, an organic dye having a high UV absorption coefficient in a wavelength range of 350 to 450 nm is preferably used. Specifically, azo dyes, aminoketone dyes, xanthene dyes, quinoline dyes, aminoketone dyes, anthraquinones, benzophenones, diphenylcyanoacrylates, triazines, p-aminobenzoic acid dyes and the like can be used. . Even when the organic dye is added as a light absorbing agent, it is preferable because deterioration of the insulating film characteristics due to the light absorbing agent can be reduced without remaining in the insulating film after firing. Among these, azo dyes and benzophenone dyes are preferred.
The amount of organic dye added is 0.0 based on the entire photosensitive glass paste.
5 to 5 parts by weight is preferable. If it is less than 0.05% by weight, the effect of adding the ultraviolet absorber is reduced, and if it exceeds 5% by weight, the characteristics of the insulating film after firing are deteriorated, such being undesirable. More preferably, it is 0.15 to 1% by weight. As an example of a method of adding an ultraviolet light absorber composed of an organic pigment, it can be prepared by preparing a solution in which the organic pigment is dissolved in an organic solvent in advance, and then mixing glass powder in the organic solvent and drying.
By this method, a so-called capsule-like powder in which an organic film is coated on the surface of each glass powder can be produced.

The sensitizer is added to improve high sensitivity. Specific examples of the sensitizer include 2,4-diethylthioxanthone, isopropylthioxanthone, and 2,3-diethylthioxanthone.
Bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-dimethylaminibenzal) cyclohexanone, 2,6-bis (4-dimethylaminobenzal) -4-methylcyclohexanone, Michler's ketone, 4, 4, -bis (diethylamino) -benzophenone, 4,4-bis (dimethylamino) chalcone, 4,4
-Bis (diethylamino) chalcone, p-dimethylaminocinnamylideneindanone, p-dimethylaminobenzylideneindanone, 2- (p-dimethylaminophenylvinylene) -isonaphthothiazole, 1,3- ^ bis (4-dimethyl) Aminobenzal) acetone, 1,3-carbonyl-bis (4-diethylaminobenzal) acetone, 3,3-carbonyl-bis (7-diethylaminocoumarin), N-phenyl-N-ethylethanolamine, N-phenylethanol Amine, N-tolyldiethanolamine, N-phenylethanolamine, dimethylaminobenzoic acid isoamyl, diethylaminobenzoic acid isoamyl, 3-phenyl-5-benzoylthio-tetrazo-razole, 1-phenyl-5-ethoxycarbonylthio-tetrazo And the like. In the present invention, these may be used alone or in combination of two or more. Some sensitizers can also be used as photopolymerization initiators. When the sensitizer is added to the photosensitive glass paste of the present invention, the amount added is usually 0.05 to 5% by weight, more preferably 0.1 to 2% by weight, based on the photoreactive organic component. If the amount of the sensitizer is too small, the effect of improving the photosensitivity is not exhibited, and if the amount of the sensitizer is too large, the residual ratio of the exposed portion may be too small.

The polymerization inhibitor is added to improve the thermal stability during storage. Specific examples of the polymerization inhibitor include hydroquinone, monoesterified hydroquinone,
N-nitrosodiphenylamine, phenothiazine, p-
t-butylcatechol, N-phenylnaphthylamine,
2,6-di-t-butyl-p-methylphenol, chloranil, pyrogallol and the like. When the polymerization inhibitor is added, the addition amount thereof is usually 0.001 to 1% by weight in the photosensitive glass paste.

Specific examples of the plasticizer include dibutyl phthalate, dioctyl phthalate, polyethylene glycol and glycerin.

The antioxidant is added to prevent oxidation of the acrylic copolymer during storage. Specific examples of antioxidants include 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, and 2,6-di-t.
-4-ethylphenol, 2,2-methylene-bis-
(4-methyl-6-t-butylphenol), 2,2-
Methylene-bis- (4-ethyl-6-t-butylphenol), 4,4-tibis- (3-methyl-6-t-butylphenol), 1,1,3-tris- (2-methyl-)
6-t-butylphenol), 1,1,3-tris-
(2-methyl-4-hydroxy-t-butylphenyl)
Butane, bis [3,3-bis- (4-hydroxy-3-
t-Butylphenyl) butyric acid] glycol ester, dilaurylthiodipropionate, triphenylphosphite and the like. When an antioxidant is added, its amount is usually 0.001 to 1% by weight in the photosensitive glass paste.

An organic solvent may be added to the photosensitive glass paste of the present invention when the viscosity of the solution is desired to be adjusted. As the organic solvent used at this time, methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl ethyl ketone, dioxane, acetone, cyclohexanone,
Contains cyclopentanone, isobutyl alcohol, isopropyl alcohol, tetrahydrofuran, dimethyl sulfoxide, γ-butyrolactone, bromobenzene, chlorobenzene, dibromobenzene, dichlorobenzene, bromobenzoic acid, chlorobenzoic acid, etc. and one or more of these A mixture of organic solvents is used.

In the present invention, Pb, Fe, Cd, Mn, Co, Mg contained in inorganic fine particles such as glass powder.
Metals and oxides such as may react with the reactive components contained in the paste to cause the paste to gel in a short time, making it impossible to apply. In order to prevent such a reaction, it is preferable to add a stabilizer to prevent gelation. As the stabilizer used, a triazole compound is preferably used. Among the triazole compounds, benzotriazole works particularly effectively. As an example of the surface treatment of glass powder with benzotriazole used in the present invention, a predetermined amount of benzotriazole with respect to inorganic fine particles was dissolved in an organic solvent such as methyl acetate, ethyl acetate, ethyl alcohol, and methyl alcohol. Thereafter, the particles are immersed in a solution for 1 to 24 hours so that the particles can be sufficiently immersed. After immersion, preferably 20 to 3
The powder is naturally dried at 0 ° C., the solvent is evaporated, and a triazole-treated powder is prepared. The amount of the stabilizer used is preferably 0.05 to 5% by weight based on the whole inorganic fine particles.

Thus, the photosensitive glass paste of the present invention usually contains a photoreactive organic component such as a photosensitive polymer or a photosensitive monomer and a glass frit such as glass powder, and other photopolymerization initiators, inorganic fine particles, It can be prepared by mixing various components such as an ultraviolet absorber and a solvent so as to have a predetermined composition, and then uniformly mixing and dispersing them with a three-roller or a kneader. The viscosity of the photosensitive glass paste is appropriately adjusted by the addition ratio of the inorganic fine particles, the thickener, the organic solvent, the plasticizer, the suspending agent, etc., but the range is 2000 to 200,000 cps (centipoise). For example, when applying to a glass substrate by a spin coating method other than the screen printing method, 2000 to 5000c
ps is preferred. In order to obtain a film thickness of 10 to 20 μm by applying once by a screen printing method, 50,000 to 200,000 cps is preferable.

Next, an example of performing pattern processing using a photosensitive glass paste will be described, but the present invention is not limited to this.

On the glass substrate, the photosensitive glass paste is applied all over or partially. As a coating method, a known method such as screen printing, a bar coater, and a roll coater can be used. The coating thickness can be adjusted by selecting the number of coatings, the screen mesh, and the viscosity of the paste.

Here, when the photosensitive glass paste is applied onto the glass substrate, the surface treatment of the substrate can be performed in order to enhance the adhesion between the substrate and the coating film. As the surface treatment liquid, a silane coupling agent such as vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, tris- (2-methoxyethoxy) vinylsilane, γ-glycidoxypropyltrimethoxysilane,
γ- (methacryloxypropyl) trimethoxysilane,
γ (2-aminoethyl) aminopropyltrimethoxysilane, γ-chloropropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, etc. or organic metals such as organic titanium, organic aluminum, organic zirconium, etc. Is. A silane coupling agent or an organic metal diluted with an organic solvent such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl alcohol, ethyl alcohol, propyl alcohol or butyl alcohol to a concentration of 0.1 to 5%. To use.
Next, this surface treatment solution is applied uniformly on a substrate with a spinner or the like, and then a photosensitive paste that can be surface treated by drying at 80 to 140 ° C. for 10 to 60 minutes is applied, and then an oxygen shielding film is applied to the surface. By providing
The pattern shape can be improved. An example of the oxygen shielding film is a film of polyvinyl alcohol (PVA). The PVA film is formed by uniformly applying an aqueous solution having a concentration of 0.5 to 5% by weight on a substrate by a method such as a spinner and then drying at 70 to 90 ° C. for 10 to 60 minutes to evaporate water. be able to. In addition, it is preferable to add a small amount of alcohol to the aqueous solution because the coatability with the insulating film is improved and the evaporation is facilitated. A more preferable PVA solution concentration is 1 to 3% by weight. Within this range, the sensitivity is further improved. It is estimated that the reason why the PVA coating improves the sensitivity is as follows. That is, when the reactive component undergoes a photoreaction, it is considered that the presence of oxygen in the air interferes with the photocuring sensitivity. However, the presence of a PVA film can block excess oxygen, so that the sensitivity is improved during exposure, which is preferable. . In addition to PVA, a water-soluble and transparent polymer such as cellulosic methylcellulose can also be used.

As a method of exposure, it is a general method to apply a photosensitive paste and then to perform exposure from the application surface through a photomask. In the present invention, however, the method is simple and highly accurate. As a method for forming partition walls having an aspect ratio, an effective method by exposure from both sides, for example, the following (i)
The method of (iii) is mentioned.

(I) A method in which a photomask is applied to the coated surface of a glass substrate coated with the photosensitive glass paste on one side to perform exposure from both sides, and (ii) the photosensitive glass paste is coated on one side. A method of applying a photomask to both the coated surface and the glass surface of the glass substrate to perform exposure from both surfaces, (iii) forming a light-shielding pattern on the glass substrate, and then forming a photosensitive glass paste on it Is applied, a photomask is applied to the coated surface, and exposure is performed from both the coated surface and the glass surface.

The exposure from both sides may be carried out simultaneously by using a double-sided exposure machine, but may be carried out successively by using a single-sided exposure machine, which is included in the present invention and the same effect can be obtained.

In particular, the methods (i) and (iii) are characterized in that the accuracy does not decrease due to the sequential execution. The reason why the pattern of high aspect ratio can be formed in the method (i) is considered to be that the photoreactive organic component in the paste reacts by the exposure from the glass surface to improve the adhesiveness to the glass surface. However, in this case, if the exposure amount from the glass surface is large, the developability is deteriorated. Therefore, the exposure amount from the glass surface is preferably 1/10 or less of the exposure amount from the coating surface. With the method (ii), it is not necessary to reduce the exposure amount from the glass surface as long as the photomask patterns used for both the coating surface and the glass surface are the same pattern. In the method (iii), the light-shielding pattern to be formed is formed by applying a photosensitive light-shielding agent paste obtained by adding a light-absorbing agent that absorbs light at the exposure wavelength in a photoreactive organic substance onto a glass substrate, and then exposing it. -It can be formed by a photolithography method by development.

The glass substrate can also be formed by a general resist patterning method such as resist coating-exposure-developing-etching-resist stripping after applying a light-shielding agent paste obtained by adding a light absorbing agent to an organic substance having no photoreactivity.

The light absorbing agent to be used is not particularly limited as long as it is a known one, but one having an ultraviolet absorbing property is particularly preferable. A benzophenone compound, a benzotriazole compound, and a hindered amine compound, which are commonly used ultraviolet absorbers, are used. It is also effective to add an ultraviolet light absorber composed of an organic dye. 3 among them
A compound having UV absorption in the wavelength range of 50 to 450 nm is preferably used. Specifically, azo dyes, aminoketone dyes, xanthene dyes, quinoline dyes,
Aminoketone dyes, anthraquinone dyes, benzophenone dyes, diphenylcyanoacrylate dyes, triazine dyes, p-aminobenzoic acid dyes and the like can be used.

The amount of the light absorber added is preferably 0.05 to 20 parts by weight. If it is less than 0.05% by weight, the effect of adding the ultraviolet absorber will be reduced, and if it exceeds 20% by weight, the pattern processability will be deteriorated.

The mask used is either a negative type or a positive type depending on the type of the photosensitive organic component.

The active light source used at this time is, for example,
Examples include near-ultraviolet rays, ultraviolet rays, electron beams, and X-rays.
Among these, ultraviolet rays are preferable, and as a light source thereof, for example, a low pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a halogen lamp, a germicidal lamp or the like can be used. Among these, an ultra-high pressure mercury lamp is preferred. Exposure conditions vary depending on the coating thickness, but exposure is performed for 1 to 30 minutes using an ultra-high pressure mercury lamp having an output of 5 to 100 mW / cm ² .

After exposure, development is performed using a developing solution. In this case, dipping or spraying is used. As the developing solution, an organic solvent capable of dissolving the organic component in the photosensitive glass paste can be used. Water may be added to the organic solvent as long as the solvent does not lose its solubility. When a compound having a carboxyl group is present in the photosensitive glass paste, it can be developed with an aqueous alkaline solution. As the alkali aqueous solution, a metal alkali aqueous solution such as a sodium hydroxide or calcium hydroxide aqueous solution can be used, but it is preferable to use an organic alkali aqueous solution since the alkali component can be easily removed at the time of firing. As the organic alkali, a known amine compound can be used. Specific examples include tetramethylammonium hydroxide, trimethylbenzylammonium hydroxide, monoethanolamine, diethanolamine and the like. The concentration of the aqueous alkali solution is usually 0.01 to 10% by weight, more preferably 0.1 to 10% by weight.
It is 1 to 5% by weight. If the alkali concentration is too low, the unexposed portions are not removed, and if the alkali concentration is too high, the pattern portions may be peeled off and the exposed portions may be corroded, which is not good.

Next, firing is performed in a firing furnace. The firing atmosphere and temperature vary depending on the type of paste or substrate, but usually firing is performed in air or a nitrogen atmosphere. Firing temperature is 4
Perform at 00-1000 ° C. 520 when pattern processing is performed on a glass substrate or when silver is used as inorganic fine particles.
Baking is performed by holding at a temperature of ˜610 ° C. for 10 to 60 minutes.

A heating step at 50 to 300 ° C. may be introduced in the above steps for the purpose of drying and preliminary reaction.

[0054]

The present invention will be specifically described below with reference to examples. However, the present invention is not limited to this. The concentration (%) in the examples and comparative examples is% by weight.

Example 1 (Production of glass powder A) SiO2: 17.4%, Al2
O3: 3.5%, B2O3: 13.3%, BaO: 8.
4%, Bi2O3: 37.4%, ZnO: 16% Na2
O: Using a glass powder raw material having a composition of 4.0%,
A spheroidizing treatment was performed in a plasma stream. The obtained powder has an average particle diameter of 3.4 μm, a specific surface area of 4.1 m 2 / g,
The sphericity was 95% by number. The sphericity was measured by enlarging the powder 300 times with an optical microscope and measuring the ratio of spherical particles among countable particles. 100g of these glass particles
Is a solution of organic dye "Ubinal" D-50 in isopropanol (dye 0.1 g / solvent 20).
g) and stirred uniformly with a homogenizer. Next, the solution in which this glass powder was added and dispersed was heated to 150 ° C. by a rotary evaporator, and the solvent was distilled off to obtain glass powder A.

(Organic component B containing a photoreactive organic component
The following binder polymer 50g was dissolved in the following solvent 50g, and then the following photosensitive monomer 50g, the following photopolymerization initiator 10g, the following sensitizer 10g and the following photopolymerization accelerator 5g were added. And stirred to obtain an organic component B. Solvent: γ-butyrolactone Binder polymer: Polymer photopolymerization initiator in which 0.4 equivalent of glycidyl methacrylate is added to the carboxyl group of a copolymer composed of 30% methyl methacrylate, 40% methacrylic acid, and 30% styrene. : 2-methyl-1- [4- (methylthio)
Phenyl] -2-morpholinopropanone Photosensitive monomer: trimethylolpropane triacrylate Sensitizer: 2,4-diethylthioxanthone Photopolymerization accelerator: Ethyl p-dimethylaminobenzoate

(Production of Photosensitive Glass Paste C) The powdered inorganic fine particles A and the organic component B are melted while heating at 80 ° C., then the inorganic fine particles C are added and kneaded by a kneader with three rollers. , Photosensitive glass paste C
It was created.

(Formation of partition walls) The photosensitive glass paste C was applied onto a 30 cm square soda glass substrate 1 by a method using a doctor blade, 60, 80, 100, 120, 1 respectively.
After coating so as to have a thickness of 50 μm, it was dried at 80 ° C. for 20 minutes. Next, exposure was performed using a mask.
The mask is a chrome mask designed to have a pitch of 220 μm, a line width of 50 μm, and a stripe pattern. The exposure was performed by UV exposure using a double-sided exposure machine (single-sided exposure is also possible) having an ultrahigh pressure mercury lamp with an output of 50 mW / cm @ 2 on one side. As shown in FIG. 1, the exposure method is to apply the photosensitive glass paste 2 and then apply 5 from the glass substrate surface.
After exposure for 2 seconds, the photomask 3 was brought into close contact with the coated surface, and the coated surface was exposed for 5 minutes.

Then, it was immersed in a 1% aqueous solution of sodium carbonate for development. Further, the obtained glass substrate was dried at 100 ° C. for 30 minutes and then baked at 580 ° C. for 1 hour.

The evaluation was performed on the partition wall pattern shape (line width: 50 μm).
m × height 120 μm, pitch 220 μm target)
Were observed by electron microscopy. Obtained 60, 8
The partition pattern 4 was not missing in all of the partition patterns applied with a thickness of 0, 100, 120, and 150 μm.

Example 2 As shown in FIG. 2 in the exposure method, after coating the glass substrate 1 with the photosensitive glass paste 2, the photomask 7 and the photomask 3 having the same pattern are formed on both the glass substrate surface and the coated surface. Was adhered, and a partition was formed and evaluated in exactly the same manner as in Example 1 except that the method of exposing from both sides for 3 minutes using a double-sided exposure machine was changed. 60, 80, 1 obtained
The partition pattern 4 was not missing in all of the partition patterns applied to the thicknesses of 00, 120, and 150 μm.

Example 3 As shown in FIG. 3 for the exposure method, a photosensitive light-shielding agent paste was applied to a glass substrate 1 in a thickness of 15 μm, and then a photomask 3 (a pattern opposite to the necessary partition pattern was formed. Exposure (1 minute) using a mask for forming a light-shielding agent pattern by developing and drying. Then, the photosensitive glass paste 2 is applied on the glass substrate 1 on which the light shielding agent pattern 5 is formed, the photomask 3 is brought into close contact with only the application surface, and exposure is performed for 3 minutes from both sides using a double-sided exposure device. Partition walls were formed and evaluated in exactly the same manner as in Example 1 except that the method was changed. Obtained 60, 80,
The partition pattern 4 was not missing in all of the partition patterns applied to the thickness of 100, 120, and 150 μm.

Comparative Example 1 Example except that the exposure method was changed to a method in which a photosensitive glass paste was applied to a glass substrate, a photomask was closely attached to the application surface, and exposure was performed for 5 minutes from the application surface. 1
Partition walls were formed and evaluated in exactly the same manner as. Obtained 6
The partition pattern applied to a thickness of 0 μm could be formed without omission. The partition pattern applied to each of the thicknesses of 80 and 100 μm was found to be missing at a plurality of locations. 120, 150 μm
Most of the partition pattern applied to each thickness was missing.

[0064]

According to the method of the present invention, it is possible to perform pattern processing with a high aspect ratio and high precision in the manufacture of a display such as a plasma display or a plasma addressed liquid crystal display which requires an insulating partition. In particular, a highly accurate partition wall of a plasma display panel can be formed easily.

[Brief description of drawings]

FIG. 1 is a flow chart of an exposure method performed in a first embodiment.

FIG. 2 is a flow chart of an exposure method performed in a second embodiment.

FIG. 3 is a flow chart of an exposure method performed in a third embodiment.

[Explanation of symbols]

 1: Glass substrate 2: Photosensitive glass paste 3: Photomask 4: Partition wall pattern

Claims (3)

[Claims] 1. A photosensitive glass paste containing a photoreactive organic component and glass powder as essential components is applied onto a glass substrate,
Using a photomask, perform exposure from both the coated surface coated with the photosensitive glass paste and the glass surface, which is the back surface of the coated surface, and elute the exposed or unexposed areas by development. Then, after forming the pattern, the organic material is removed by firing to form the partition layer, which is a method for manufacturing a plasma display. 2. A light-shielding pattern is formed on a glass substrate, a photosensitive glass paste containing a photoreactive organic component and glass powder as essential components is then applied, and a coated surface coated with the photosensitive glass paste, and Exposure is performed from both sides of the glass surface, which is the back surface of the coating surface, and the light-irradiated portion or the non-light-irradiated portion is eluted by development to form a pattern, and then the organic substance is removed by firing to form a partition wall layer. A method of manufacturing a plasma display, comprising: 3. The method for producing a plasma display according to claim 1, wherein the exposure amount from the glass surface is set to 1/10 or less of the exposure amount from the coating surface.