JPH09292507A - Production of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter capable of forming multicolored fine patterns having high precision and no difference in level without limitation on the thickness of a black matrix. SOLUTION: The method for manufacturing the color filter is constituted of (1) a sticking process in which a photosensitive film composed of a base film and a monocolored photosensitive resin layer on a transparent substrate is stuck so that the colored photosensitive resin layer is faced to the substrate, (2) an exposing process in which the photosensitive film is exposed in pattern shapes and (3) a developing process. In the method for manufacturing the color filter, a first coloring process is a process for forming black pixels (black matrix), the film thickness of black pixels is made not to be larger than the film thickness of pixels of three primary colors (red, green, blue) and the process (2) at and after second coloring is performed. After stripping the base film, a flattening process on the black pixels in the photosensitive resin layer at the second coloring is performed by pressing and heating. At and after third coloring is transferring process of the photosensitive resin layer to spaces between the pixels by pressing and heating is performed between the process (1) and the process (3).

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter.

[0002]

2. Description of the Related Art A color filter is an extremely transparent stripe-like or mosaic-like pattern having two or more different hues on a surface of an optically transparent substrate such as glass which is parallel or parallel to each other. It is a crossed arrangement. It is necessary for these patterns to arrange hues in a predetermined order at predetermined intervals and to form a uniform layer with little thickness unevenness, and various color filter manufacturing methods have been proposed. For example, the screen printing method can form a low-cost color filter. Further, a method using a photolithography technique, that is, a method of irradiating a transparent film formed on a color filter substrate with ultraviolet rays through a predetermined negative mask to remove an unexposed portion, and then dyeing while forming a stain-proof layer is available. is there.

There is known a method for manufacturing a color filter which can easily and highly accurately form a multicolor fine stripe-shaped or mosaic-shaped pattern using a photosensitive film composed of a base film and a photosensitive resin layer. A step of laminating a photosensitive film comprising a base film and a photosensitive resin layer colored in one color on a transparent substrate so that the colored photosensitive resin layer faces the substrate, and forming a predetermined pattern by exposure. The step of removing the base film and the step of developing the base film are repeated to form a multicolor pattern, thereby producing a color filter. Photosensitive films are known, and the basic composition and constitution and their action are described in JP-B-45-
Details are disclosed in Japanese Patent No. 25231.

For example, a layer of a photosensitive resin containing a colorant of one hue is applied to a support and dried, and the photosensitive resin layer of the photosensitive film is transferred onto a transparent plate to form a mask having a predetermined pattern. Through exposure and development to form a pattern (JP-A-61-99102), alkali development (JP-A-2-239205), and method using a water-soluble base film (JP-A-2). No. 271301, gazette), this film is heat-pressed onto a transparent plate,
A method of exposing through a mask having a predetermined pattern, peeling off the base film, and developing to form a transparent colored image pattern (JP-A-63-187203, JP-A-2).
No. 244005, etc.) is known. Furthermore,
A method for producing a color filter using a photosensitive film is disclosed in JP-A-3-160454 and JP-A-3-160454.
-111802, JP-A-2-151805, JP-A-4-212161, and JP-A-4-301.
Japanese Patent Laid-Open No. 602 and Japanese Patent Laid-Open No. 5-2107 are known.

Regarding the followability of the photosensitive film, it is necessary to solve the problem in order to obtain a good pattern, and various measures have been taken to obtain good followability of the photosensitive film.
Researchers at Bell Laboratories have developed a three-layer resist method, which is characterized in that the substrate can be precisely micromachined even if there is a step on the substrate (for example, J.Vac.Sci.Tecnol.,
Volume 16 pages 1620 issued in 1968). In addition, detailed studies have also been conducted on the conformability of the printed circuit board to the unevenness of the substrate, and they have been put to practical use. Since the photosensitive film is in a semi-solid state, lamination (thermocompression bonding) is important for improving the followability so as to form a state close to a liquid (close to a liquid resist).
In order to follow unevenness, it is necessary to set the temperature of the laminate so that the viscosity is sufficiently low. It is said that if the liquidity is large, the storage stability at room temperature tends to be poor and cold flow occurs, so that the viscosity cannot be made too low. A thicker film is considered to be advantageous for filling the recess (for example, Solid State Technology (Solid State Technology)).
Volume 29, No. 6, 153, published in 1986, Proc.

In the conventional method for producing a color film, when the second and subsequent layers are formed, the colored layers which are already formed and which directly contact the second and subsequent colored layers on the colored layer (front pixel) are formed. A step is generated between the layers. This step is determined by the thickness (1 to 5 μm) of the already formed colored layer. Due to this step, the new colored layer does not come into contact with the base (transparent glass), and due to insufficient adhesive pressure, the adhesive strength becomes insufficient, the colored layer does not adhere to the base, and the base film is peeled off. , The base film is peeled off to form a part where the colored layer does not adhere to the base. Further, if exposure and development are performed as they are, there is a problem that a portion where a colored image does not exist is exposed, and there is a disadvantage that a desired color filter cannot be obtained.

More specifically, particularly when the color filter is composed of pixels of stripe-shaped three primary colors (red, green, blue), the stripe-shaped pixel of the first color has, for example, a thickness of 2.0 μm and a width. 70 μm, spacing 300 μm
When a colored layer of the second color is pasted on the transparent substrate, the unevenness of about 2.0 μm is generated due to the front pixels, and thus the insufficient contact between the transparent substrate and the colored layer may occur. However, there is a drawback that the second colored layer does not sufficiently follow this unevenness.

Further, on the pixels of the second and subsequent colors, a part of the colored photosensitive resin layer on the pixels of the first color flows in, and in the second color, the edge close to the pixels of the first color is lifted, and the pixel The surface becomes slanted, and its cross section is a so-called J shape,
It becomes n-shaped. The pixels of the third color have a so-called M-shaped cross section because both ends of the pixels are lifted because the colored photosensitive resin layer flows in from both adjacent pixels. In Figure 2, J-shaped, n-shaped,
The schematic diagram of the cross section of an M-shaped pixel is shown. If there is a J-shaped lift, the unevenness of the surface of the three-color pixels is not achieved, the desired flatness cannot be obtained, and the lifted edge comes into contact with the counter electrode, resulting in an image defect and even color unevenness. There was a defect such as causing it. In FIG. 2, 2 is a transparent substrate, 8 is a first color pixel, 9 is a second color pixel, and 10 is a third color pixel.

Due to the defects of pixels, the thickness of the black matrix is particularly limited, and is 0.1 to 0.2 μm for a chromium vapor deposition film and 0.2 to 0 for a photosensitive resin film containing graphite or carbon black. The film thickness could not be increased because the limit was 0.6 μm. Therefore, in the photosensitive resin film containing graphite or carbon black, the proportion of the pigment is large, and defects in the film strength and photosensitivity occur, and improvement in practical use has been desired.

[0010]

The invention according to claim 1 provides a method for manufacturing a color filter which has good workability and is capable of forming a multi-color fine pattern with high accuracy.

[0011]

According to the present invention, there is provided a photosensitive film comprising a base film and a photosensitive resin layer colored in one color on a transparent substrate, wherein (1) the colored photosensitive resin layer is A step of bonding so as to face the substrate,
In a method of manufacturing a color filter in which a process including (2) exposing in a pattern and (3) a developing process are repeated to form a multicolor pattern, the first color process is a black pixel (black matrix) forming process. The thickness of the black pixel is not larger than the thickness of the pixels of the three primary colors (red, green, blue), and the second and subsequent colored photosensitive resin layers face the substrate, A black pixel of the photosensitive resin layer of the second color is formed by performing a step of forming a space between the pixels and adhering, peeling off the base film after the step (2) in the step of the second color, and then applying pressure and heat. The above flattening step is performed, and for the steps of the third color and thereafter, during the steps of (1) and (3), transfer of the photosensitive resin layer of the third color and thereafter to the inter-pixel space by pressurization and heating. Of the color filter characterized by carrying out the process Granulation method on.

[0012]

According to the manufacturing method of the present invention, the photosensitive film of the second and subsequent colors can be satisfactorily followed by the unevenness formed by the pixels. That is, due to the transfer process by pressure for transferring the photosensitive resin layers of the second and subsequent colors from the base film to the surface of the substrate, the unevenness on the pixel surface, which is the above-mentioned defect, is reduced. This is because when a photosensitive film is attached to a transparent substrate having a front pixel on the surface and then the second or subsequent colored photosensitive resin layer is transferred to the substrate surface, the above-mentioned defect, that is, the unevenness of the pixel surface, occurs. Decrease. In the conventional method, the photosensitive resin layer on the front pixel spreads out and rides on the pixels of the second color and subsequent pixels, resulting in a phenomenon that unevenness occurs on the pixel surface. This produces a pixel surface without irregularities.

FIG. 1 is a schematic diagram showing the manufacturing method of the present invention.
FIG. 1 shows an example in which the film thickness of the black matrix 1 and other pixels is 1: 2. FIG. 1A shows a state in which, for example, a red colored photosensitive resin layer 3 is being laminated on a transparent substrate 2 having a black matrix 1 formed thereon. 4 is a base film. Lamination is performed so that the colored photosensitive resin layer 3 does not enter between the black matrixes 1. At this time, a space 5 appears in a portion sandwiched between the red colored photosensitive resin layer 3 and the black matrix 1. Only the second color (in this case, red) step is described in (2) above.
After the step (1), the transfer step is performed after the base film 4 is peeled off. The state where the base film 4 is peeled off is shown in (b). Since the base film 4 is not provided, the photo-cured portion and the uncured portion are similarly melted and softened by the application of pressure and heat, and are transferred to the substrate surface and adhered to the substrate, but the red colored photosensitive resin layer 3 The surface of extends over the entire substrate, creating a plane. That is, the surface tension acts over a wide range to make the surface uniform.

The red colored photosensitive resin layer 3 is changed to the state of FIG. 3C by the transfer process (pressurization and heating), and the black matrix 1 is buried in the red colored photosensitive resin layer 3. It becomes a state. The surface is flat, and steps such as M-shape do not appear. Next, when development is performed, it becomes (d), and the red colored photosensitive resin layer 3 becomes a pixel in a shape that partially covers the black matrix 1. Next, for the third and subsequent colors (in this case, green or blue), the green or blue colored photosensitive resin layer 6 or 7 is not brought into contact with the black matrix 1 when laminating as shown in (d). No, red colored photosensitive resin layer 3
, That is, a space 5 appears between each pixel and above the black matrix 1.

When the transition step (heating) is performed between the steps (1) and (3), the state shown in FIG. 1 (f) is obtained. The peeling of the base film may be performed before the transfer step or after the transfer step. The green and blue colored photosensitive resin layers 6 and 7 are partially overlapped with the black matrix 1. Therefore, the film thickness does not change, and a color filter having a pixel cross-sectional shape without unevenness can be obtained. .

When the color filter is formed by the method of the present invention, the red, green and blue pixels formed of the colored photosensitive resin layer and the black matrix are in good contact with each other, so that there is no light leakage and the surface flatness is good. The color filter function is sufficient even without a protective film. The surface of the pixel of (f) is flat and does not have the M-shaped or J-shaped surface deformation as in the prior art. The black matrix film thickness is preferably less than or equal to the pixel thickness of the three primary colors (red, green, blue), and the three primary colors (red, green, blue).
It is more preferable that the film thickness is smaller than the film thickness of the pixel. Black matrix film thickness and three primary colors (red, green,
The ratio of (blue) to the film thickness of the pixel is preferably in the range of 1: 1 to 1: 2.

For example, the film thickness of the three primary color pixels is 2.0 μm.
When, the thickness of the black matrix is 1.0 μm
The thickness is preferably 2.0 μm. When the film thickness of the black matrix is less than 1.0 μm, the ratio of the black pigment is high, which tends to lower the sensitivity, and when it exceeds 2.0 μm, the surface flatness of the color filter tends to be poor. The film thickness of the black matrix is 0.2 to 0.4 μm from the film thickness of the pixels of the three primary colors (red, green, blue).
It is particularly preferable to make it thin. As a result, the pixels of the three primary colors (red, green, and blue) are overlapped on the black matrix, the leaked light is completely shielded, and the alignment accuracy is improved.

The step of transferring the colored photosensitive resin layer to the space portion is performed by applying pressure and heating. The pressurization and heating are performed at room temperature or higher and at a temperature at which the colored photosensitive resin layer starts the thermosetting reaction. The transfer is completed at a low temperature for a long time and at a high temperature in a short time, and the transferred colored photosensitive resin layer surface has a high degree of flatness. Pressurization is rubber roll heating, roll (elastic body)
Pressurization is good, and substrate heating includes oven heating, ultrasonic heating, infrared heating, electromagnetic induction heating, hot water immersion, friction heat heating, heating in a pressure oven, heating in a vacuum container, etc. It is not limited to these. The temperature of the rubber roll is
It is preferable that the temperature is not higher than the temperature at which a development dull occurs due to thermosetting at room temperature or higher. The pressure of the rubber roll is preferably 0.5 to 10 kgf, more preferably 1 to 4 kgf. The feed rate of the roll is preferably 0.1 to 10 mm / min, more preferably 1 to 4 mm / min.

The photosensitive film used in the present invention is obtained by coating a transparent base film, for example, a film of polyethylene terephthalate or the like, with a photosensitive resin composition colored in one color and drying it to color the film in one color. A photosensitive resin layer is formed. Since this colored photosensitive resin layer is uncured, flexible and sticky, it is desirable to further attach a protective film such as a polyethylene film thereon to prevent external damage, adhesion of foreign matter, and the like. . The colored photosensitive resin layer formed on the photosensitive film is laminated on a transparent substrate while peeling off the protective film, and the base film on the surface of the colored photosensitive resin layer is removed after being exposed through a predetermined pattern of a negative pattern. Is done.

As the photosensitive resin composition, known ones can be used without particular limitation, and examples thereof include an ethylenically unsaturated compound (a), a carboxyl group-containing film-imparting polymer (b), and a photopolymerization initiator (c). ) And pigments or dyes (d)
Is preferred.

As the ethylenically unsaturated compound (a),
For example, compounds obtained by adding an α, β-unsaturated carboxylic acid to a polyhydric alcohol (trimethylolpropane diacrylate, trimethylolpropane triacrylate, tetramethylolmethane triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate) Acrylate), compounds obtained by adding an α, β-unsaturated carboxylic acid to a glycidyl group-containing compound (trimethylolpropane triglycidyl ether triacrylate, bisphenol A diglycidyl ether diacrylate, etc.), polyvalent carboxylic acid (anhydride) Esterified product of a compound having a hydroxyl group and an ethylenically unsaturated group (such as β-hydroxyethyl acrylate), an alkyl ester of acrylic acid (methyl acrylate, ethyl acrylate, Butyl acrylate, 2-ethylhexyl acrylate, etc.), urethane diacrylate compounds obtained by reacting trimethylhexamethylene diisocyanate, dihydric alcohol and dihydric acrylate monoester, and methacrylates corresponding thereto. Can be These compounds are used alone or in combination of two or more. In terms of light sensitivity and developability,
The amount of the component (a) is preferably 90 to 50 parts by weight based on 100 parts by weight of the total amount of the components (a) and (b).

The carboxyl group-containing film-forming polymer (b) is, for example, a copolymer of an acrylic acid alkyl ester or a methacrylic acid alkyl ester and acrylic acid or methacrylic acid, an acrylic acid alkyl ester or a methacrylic acid alkyl ester, and an acrylic acid. Examples thereof include a copolymer of an acid or methacrylic acid and a vinyl monomer copolymerizable therewith.

Examples of alkyl acrylates include methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate and the like. Examples of the alkyl methacrylate include those corresponding to the above-mentioned alkyl acrylate. Examples of the copolymerizable vinyl monomer include, for example,
Dimethylaminoethyl acrylate, tetrahydrofurfuryl acrylate, aminoethyl acrylate, 2,2,2-trifluoroethyl acrylate,
2,2,3,3-tetrafluoropropyl acrylate, methacrylate, acrylamide, methacrylamide diacetone acrylamide, styrene, vinyltoluene and the like corresponding thereto.

(B) As the carboxyl group-containing film-forming polymer, for example, polyester using terephthalic acid, isophthalic acid, sebacic acid, etc., copolymer of butadiene and acrylonitrile, cellulose acetate, cellulose acetate butyrate, methyl cellulose, Ethyl cellulose and the like can be used together.
The use of the component (b) improves the coating properties and the film properties of the cured product, and the compounding amount is preferably from 10 to 50 parts by weight based on 100 parts by weight of the total amount of the components (a) and (b). . When the amount is less than 10 parts by weight, the photosensitivity tends to decrease due to an increase in the amount of the ethylenically unsaturated compound.
If the amount exceeds the weight part, the photocured product tends to become brittle. Further, the weight average molecular weight of the component (b) is preferably from 10,000 to 500,000 from the viewpoint of the coating properties and the film strength. The weight average molecular weight is a value converted into polystyrene by gel permeation chromatography.

Examples of the photopolymerization initiator (c) include aromatic ketones (benzophenone, N, N'-tetramethyl-4,4'-diaminobenzophenone (Michler's ketone), 4-methoxy-4'-dimethyl. Aminobenzophenone, 4,4'-diethylaminobenzophenone, 2-
Ethyl anthraquinone, phenanthrene quinone, etc.), benzoin ether (benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether, etc.), benzoin (methyl benzoin, ethyl benzoin, etc.), 2,4,5-triarylimidazole dimer, 2- (O-chlorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl)-
4,5-di (m-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (o-fluorophenyl) -4,5-diphenylimidazole dimer, 2-
(O-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) -4,5
-Diphenylimidazole dimer, 2,4-di (p-methoxyphenyl) -5-phenylimidazole dimer,
2- (2,4-dimethoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methylmercaptophenyl) -4,5-diphenylimidazole dimer, etc., acridine derivative (1,7- Bis (9-acridinyl) heptane and the like are used. These compounds are used alone or in combination of two or more.

The compounding amount of the component (c) is 0.1 to 10 relative to 100 parts by weight of the total amount of the components (a) and (b).
Parts by weight are preferred. If the content is less than 0.1 parts by weight, the photosensitivity tends to be insufficient, and if it exceeds 10 parts by weight, the light absorption on the surface of the composition during exposure increases,
Internal photocuring tends to be inadequate.

As the above-mentioned pigment or dye (d), a generally known coloring agent can be used, and the compatibility with the photosensitive resin layer, particularly the ethylenically unsaturated compound or the carboxyl group-containing film-forming polymer, is targeted. It is selected in consideration of hue, light transmittance and the like. As a pigment that can be used for a color filter, various compounds can be used.
Examples include inorganic pigments such as barium sulfate, zinc oxide, lead sulfate, titanium oxide, red iron oxide, carbon black, graphite, and chromium oxide, and the following organic pigments (color index numbers).

Yellow pigment: CI Pigment Yellow 20,
24, 83, 86, 93, 109, 110, 117, 1
25, 137, 138, 139, 147, 148, 15
3, 154, 166, 168 Orange pigment: CI Pigment Orange 36, 43, 5
1, 55, 59, 61 Red pigment: CI Pigment Red 9, 97, 122, 1
23, 149, 168, 177, 180, 092, 21
5, 216, 217, 220, 223, 224, 22
6, 227, 228, 240, 48: 1 Violet pigment: CI Pigment Violet 19,
23, 29, 30, 37, 40, 50 Blue pigment: CI Pigment Blue 15, 15: 6, 2,
2, 60, 64 Green pigment: CI Pigment Green 7, 36 Black pigment: CI Pigment Black 7

The blending amount of the component (d) is preferably 1 to 50 parts by weight based on 100 parts by weight of the total amount of the components (a) and (b). If the amount is less than 1 part by weight, the coloring tends to be insufficient, and if it exceeds 50 parts by weight, the light transmittance tends to decrease.

In the colored photosensitive resin layer, a melamine resin and / or an epoxy resin which thermally reacts with the carboxyl group of the carboxyl group-containing film-forming polymer in order to enhance the heat curability, the component (a) and the component (b). Total amount of ingredients 10
It is preferable to add 1 to 20 parts by weight to 0 parts by weight and heat the mixture. The heating temperature is preferably from 130 to 200 ° C., and the heating time is preferably from 30 to 60 minutes, from the viewpoint of improving the crosslinking density of the colored layer, improving the heat resistance, and the like.

[0031]

The present invention will be described below by way of examples. Example 1 (1) Production of coating liquid for colored photosensitive resin layer: 135 parts by weight of the pigment paste of any one of Table 2 and 200 parts by weight of a solution prepared by uniformly dissolving the materials of Table 1 and melamine resin 5
Parts by weight and 5 parts by weight of a silane coupling agent were added and dissolved and dispersed to obtain a coating liquid for a colored photosensitive resin layer.

[0032]

[Table 1]

[0033]

[Table 2]

Melamine resin Cymel 300 (trade name of hexamethoxymethyl melamine, manufactured by Mitsui Toatsu Chemicals, Inc.) Silane coupling agent KBM503 (manufactured by Shin-Etsu Chemical Co., Ltd.) Preparation of coating liquid Immediately before use Was ultrasonically dispersed for 2.5 hours before use.

(2) Production of Photosensitive Film The obtained coating solution was applied to a polyethylene terephthalate film having a thickness of 6 μm (Tetron film S6 manufactured by Teijin Ltd.).
It was coated on the above to a uniform thickness and dried in a dryer at 100 ° C. for 2 minutes. A 30 μm-thick polyethylene film was laminated as a protective film to obtain a photosensitive film. The thickness of the photosensitive resin layer after drying is 2.0 for black, red, blue and green.
μm.

(3) Production of color filter (a) Substrate heating A base substrate for a color filter (a glass substrate having a thickness of 1.1 mm, Corning 7074 manufactured by Corning Incorporated) was heated at 80 ° C. for 10 minutes. (B) Laminating step While peeling off the protective film of the photosensitive film,
The colored photosensitive resin layer was laminated under the following conditions on the base substrate for the color filter heated under the above conditions. Roll temperature: 120 ℃ Roll pressure: 1.0kgf / cm ² Speed: 1.5m / min

(C) Exposure Step An exposure machine HMW-201B (3 kW, ultra-high pressure mercury lamp, manufactured by Oak Manufacturing Co., Ltd.) is passed through a negative mask of a predetermined pattern (normal stripe pattern, black is a grid pattern other than the pixel portion). Exposed. (D) Peeling step The polyethylene terephthalate film was removed. (E) Development step The unexposed portion was removed by spray developing with a 0.08 wt% Na ₂ CO ₃ aqueous solution at 30 ° C. for 15 seconds to form a colored pattern of one color.

The steps of forming the colored patterns (a) to (e) were repeated using the photosensitive films of respective colors in the order of black, red, blue and green. When the second color of red is laminated, the film is fed by making the film feed direction orthogonal to the black striped pattern of the front pixels, and then
After the peeling step of (d), pressure was applied with a roll of 120 ° C. at a pressure of 4 kgf and heating was performed at 60 ° C. for 15 minutes (transition step, in which the colored photosensitive resin layer passing through the space due to pressure and heat was black (Transfer to the substrate surface between the matrices), for the third color blue and the fourth color green (c)
Similarly, after the exposure step, pressure is applied with a roll and the temperature is set to 60 ° C. for 15 minutes.
Heating was performed for a minute (a transfer step, which is a step in which the colored photosensitive resin layer that has been through the space is transferred to the space on the substrate surface) to form a multicolor pattern. The exposure dose at this time is 50 mJ / cm ² for the black, red, blue and green photosensitive resin layers.
And The pattern of the mask used is such that the stripe forms an independent rectangle for each pixel and a gap is provided in the longitudinal direction of the stripe.

An ultraviolet irradiator (lamp H5600L / 2, manufactured by Toshiba Denshi Co.) was applied to the obtained multicolor pattern to 3 J / cm.
After irradiating at ² , the mixture was heated at 150 ° C. for 45 minutes to obtain a color filter. The obtained color filter has red, blue and green patterns (rectangles of 70 μm × 270 μm have a gap of 30 μm in the longitudinal direction, a length of 150 mm, a gap of 30 μm in the parallel direction, and a gap in the parallel direction. Thirty
Striped patterns having a period of 0 μm) were arranged in an orderly manner. Followability was good. The gap between the black black matrix and each color pixel was closed, and no leak light was observed. In addition, there was no step in the pixel, and neither M nor J shape was recognized in the cross section of the pixel.

Example 2 (1) Production of coating liquid for colored photosensitive resin layer: To 200 parts by weight of a solution prepared by uniformly dissolving the materials shown in Table 3, 145 parts by weight of the pigment paste of any one of Table 2 and 5 of the melamine resin were added.
Parts by weight and 5 parts by weight of a silane coupling agent were added and dissolved and dispersed to obtain a coating liquid for a colored photosensitive resin layer.

[0041]

[Table 3]

Melamine resin Cymel 300 (trade name of hexamethoxymethylmelamine, manufactured by Mitsui Toatsu Chemicals, Inc.) Silane coupling agent KBM503 (manufactured by Shin-Etsu Chemical Co., Ltd.) Preparation of coating solution Preparation of coating solution The above materials were gradually added to the pigment paste and kneaded and dispersed in a ball mill for 8 hours to prepare a pigment paste.

(2) Production of Photosensitive Film A coating solution obtained was applied to a polyethylene terephthalate film having a thickness of 23 μm (Tetron Film S manufactured by Teijin Ltd.).
6) The above was coated using a kiss-touch reverse roll coater. It was dried for 2 minutes in a dryer at 100 ° C. A 30 μm-thick polyethylene film was laminated as a protective film to obtain a photosensitive film. The thickness of the photosensitive resin layer after drying is 1.0 μm for black and 2.0 for red, blue and green.
μm.

(3) Production of color filter (a) Substrate heating The base substrate for the color filter used in Example 1 was heated to 80 ° C.
For 10 minutes. (B) Laminating step While peeling off the protective film of the photosensitive film,
The colored photosensitive resin layer was laminated under the following conditions on the base substrate for the color filter heated under the above conditions. Roll temperature: 80 ℃ Roll pressure: 1.0kgf / cm ² Speed: 2.5m / min

(C) Exposure step The exposure machine H is passed through a negative mask of a predetermined pattern (for a normal color filter consisting of stripe-shaped pixels).
Exposure was performed with a predetermined exposure amount using MW-201B (3 kW, ultra-high pressure mercury lamp, manufactured by Oak Manufacturing Co., Ltd.). (D) Peeling step The polyethylene terephthalate film was removed. (E) Development step The unexposed portion was removed by spray developing with a 0.08 wt% Na ₂ CO ₃ aqueous solution at 30 ° C. for 15 seconds to form a colored pattern of one color.

The steps of forming the colored patterns (a) to (e) above were repeated using the photosensitive films of respective colors in the order of black, red, blue and green. When laminating the second color red, feed the film by making the film feed direction orthogonal to the longitudinal direction of the front black matrix, and then
After the peeling step (d), pressure is applied under the same conditions as in the laminating step and heating is performed at 60 ° C. for 15 minutes (transfer step). For blue and green, the film feeding direction is set to the longitudinal direction of the black matrix in front. Send the film in the orthogonal direction,
Heat at 60 ° C. for 15 minutes before exposure of (c) (transition step)
After the peeling step of (d), the same pressure as in (b) was applied to form a multicolor pattern. The exposure amount at this time is 50 for the red, blue and green photosensitive resin layers.
mJ / cm ² . For black, it is 130 mJ / cm ² .

An ultraviolet irradiator (lamp H5600L / 2, manufactured by Toshiba Denshi Co.) was applied to the obtained multicolor pattern to 3 J / cm.
After irradiating at ² , the mixture was heated at 150 ° C. for 45 minutes to obtain a color filter. The obtained color filter has red, blue and green patterns (rectangles of 70 μm × 270 μm having a gap of 30 μm in the longitudinal direction and a length of 150 mm,
There is a 30 μm gap in the parallel direction, and the gap in the parallel direction is 3
Striped patterns with a period of 00 μm) were arranged in order. The space around the pixels of the three primary colors was covered with a black matrix. The followability is good, there is no step in the pixel, and the cross section of the pixel has an M shape of J
No condition was observed.

Example 3 The procedure of Example 1 was repeated except that the materials in Table 4 below were replaced with the materials in Table 1.

[Table 4]

The obtained color filter has red, blue and green patterns (rectangles of 70 μm × 270 μm having a gap of 30 μm in the longitudinal direction and a length of 150 mm, and a gap of 30 μm in the parallel direction, Interval of 300
The stripe-shaped pattern having a period of μm) was arranged in order, and the followability was good. In addition, there was no step in the pixel, and neither M nor J shape was recognized in the cross section of the pixel.

Example 4 Example 4 was carried out in the same manner as in Example 1 except that the following combinations of film thicknesses were substituted. The thickness of the black colored photosensitive resin layer is 1.2μ
m, red is 2.3 μm, green is 2.3 μm, and blue is 2.3 μm
Met. The obtained color filter had red, blue and green patterns arranged in an orderly manner and had good followability. Also,
There was no step in the pixel, and neither M-shaped nor J-shaped was observed in the cross section of the pixel.

Example 5 Example 5 was carried out in the same manner as in Example 1 except that the following combinations of film thicknesses were substituted. The thickness of the black colored photosensitive resin layer is 1.8μ.
m, red is 2.3 μm, green is 2.3 μm, and blue is 2.3 μm
Met. The obtained color filter had red, blue and green patterns arranged in an orderly manner and had good followability. Also,
There was no step in the pixel, and neither M-shaped nor J-shaped was observed in the cross section of the pixel.

Example 6 Example 6 was carried out in the same manner as in Example 1 except that the following combinations of film thicknesses were substituted. The thickness of the black colored photosensitive resin layer is 1.2μ
m, red 2.0 μm, green 2.0 μm, blue 2.0 μm
Met. The obtained color filter had red, blue and green patterns arranged in an orderly manner and had good followability. Also,
There was no step in the pixel, and neither M-shaped nor J-shaped was observed in the cross section of the pixel.

Example 7 Example 7 was carried out in the same manner as in Example 1 except that the following combinations of film thicknesses were substituted. The thickness of the black colored photosensitive resin layer is 1.7μ
m, red is 1.9 μm, green is 1.9 μm, and blue is 1.9 μm
Met. The resulting color filter had a red, blue, and green pattern arranged neatly. The followability was good, there was no step in the pixel, and neither M-shaped nor J-shaped was observed in the cross section of the pixel.

Comparative Example 1 A black colored pattern was formed in the same manner as in Example 1, and then the pattern forming process was performed in the same manner as in Example 1 in red.
The process was repeated using the photosensitive films of each color in the order of blue and green, but the transfer process of heating at 60 ° C. for 15 minutes was not performed before the exposure of (c). Further, the pressing process after peeling was not performed. At this time, the stripe pattern has a width of 70
The stripes were 150 μm in length, 150 mm in length, and spaced at intervals of 300 μm. The film had insufficient followability, and some wrinkles were generated on the film, resulting in poor followability. Further, when the surface of the pixel was blue, the cross section thereof was J-shaped, and the difference in film thickness between both ends was 0.3 μm. In green, the cross section was M-shaped, and there was a difference in film thickness of 0.5 μm between both ends and the center. This is because even if the film thickness was the same, a rectangular pixel cross section could not be obtained because the baking step of baking at 60 ° C. for 15 minutes was not performed before the exposure of (c).

[0055]

According to the method of manufacturing a color filter according to the first aspect of the present invention, a highly precise multicolor fine pattern having a uniform thickness is formed on a substrate with good followability and workability of the photosensitive film. It is possible to manufacture a color filter having excellent heat resistance. The thickness of the black matrix is not limited, and is 0.1 to 0.2 μm for a chromium vapor deposition film and 0.2 to 0.6 μm for a photosensitive resin layer containing graphite or carbon black as in the past. Is not a limit, and the film can be thickened as needed. Therefore, the ratio of the pigment (pigment / binder ratio) in the photosensitive resin layer containing graphite or carbon black can be reduced, and a resist or a photosensitive film having excellent film strength and photosensitivity can be designed.

[Brief description of drawings]

FIG. 1 is a schematic view showing a production method of the present invention.

FIG. 2 is a schematic view of a cross section of a pixel of a conventional color filter.

[Explanation of symbols]

 1 Black Matrix 2 Transparent Substrate 3 Colored Photosensitive Resin Layer (Red) 4 Base Film 5 Space 6 Colored Photosensitive Resin Layer (Green) 7 Colored Photosensitive Resin Layer (Blue) 8 First Color Pixel 9 Second Color Pixel 10 3 Pixel of color

Claims (1)

[Claims] 1. A photosensitive film comprising a base film and a photosensitive resin layer colored in one color on a transparent substrate,
A color in which a multicolor pattern is formed by repeating steps including (1) a step of attaching a colored photosensitive resin layer so as to face the substrate, (2) a step of exposing in a pattern, and (3) a developing step. In the filter manufacturing method, the first color step is the black pixel (black matrix) forming step, and the black pixel film thickness is not larger than the three primary color (red, green, blue) pixel film thickness. Then, the step of forming a space between the pixels and adhering is performed so that the colored photosensitive resin layers of the second and subsequent colors face the substrate, and after the step (2) of the second color, the base is formed. After the film is peeled off, the step of flattening the black pixels of the photosensitive resin layer of the second color by pressure and heating is performed, and the steps of the third color and thereafter are between the steps (1) and (3) above. To the third and subsequent colors by pressing and heating. Preparation of a color filter which is characterized in that the transition process to the inter-pixel space of the resin layer.