JPH09286620A - Method for supplying gaseous raw material and device therefor - Google Patents

Method for supplying gaseous raw material and device therefor

Info

Publication number
JPH09286620A
JPH09286620A JP9861596A JP9861596A JPH09286620A JP H09286620 A JPH09286620 A JP H09286620A JP 9861596 A JP9861596 A JP 9861596A JP 9861596 A JP9861596 A JP 9861596A JP H09286620 A JPH09286620 A JP H09286620A
Authority
JP
Japan
Prior art keywords
raw material
tank
material gas
volume
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9861596A
Other languages
Japanese (ja)
Inventor
Tatsuhiko Saito
達彦 齋藤
Shinji Ishikawa
真二 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP9861596A priority Critical patent/JPH09286620A/en
Publication of JPH09286620A publication Critical patent/JPH09286620A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/80Feeding the burner or the burner-heated deposition site
    • C03B2207/85Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/86Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method by which a gaseous raw material can be supplied at a stable flow rate even when some change in temp. of a raw material tank is caused and also to provide a device for the method. SOLUTION: This method comprises receiving a liquid raw material 3 of glass in a raw material tank 1 provided with a heater 2 and stably supplying the gaseous raw material 4 vaporized in the raw material tank 1 to a reactor. At this time, the liquid raw material 3 is continuously supplied to the raw material tank 1 so as to always maintain the gas volume occupied by the gaseous raw material 4 at a prescribed volume value and when the heating temp. of the raw material tank 1 is changed to cause a change in pressure inside the tank 1 whose vapor phase is occupied by the gaseous raw material 4, the volume of a closed body 6 communicated with the vapor phase of the raw material tank 1 is changed to keep the pressure inside the tank 1 constant.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、原料ガスを安定に
供給する方法及びその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for stably supplying a raw material gas.

【0002】[0002]

【従来の技術】光ファイバを製造するには軸付け法、外
付け法あるいは内付け法等によって多孔質ガラス母材を
形成し、これを脱水・焼結して線引きする方法が行なわ
れている。近年、光ファイバの長尺化あるいは高能率化
の観点から大量のガラス原料を連続的に供給する方法が
採用されている。このような原料供給装置の構成は図3
に示すように、パイプ22から送られた原料液3は一旦
サービスタンク20に貯えられる。サービスタンク20
には供給ライン21を通って加圧ガスが導入され、この
ガス圧によって原料液3はパイプ23を通って原料タン
ク1に圧送される。気化された原料ガス4はAr等の不
活性ガスをキャリアガスとしてパイプ14、コンデンサ
11を経てガラスの反応装置へ送られる。キャリアガス
は流量制御装置12を通して原料タンク1に圧送され
る。
2. Description of the Related Art In order to manufacture an optical fiber, a method of forming a porous glass base material by an axial attachment method, an external attachment method, an internal attachment method or the like, and dehydrating / sintering this to draw it . In recent years, a method of continuously supplying a large amount of glass raw material has been adopted from the viewpoint of lengthening or increasing the efficiency of an optical fiber. The configuration of such a raw material supply device is shown in FIG.
As shown in, the raw material liquid 3 sent from the pipe 22 is temporarily stored in the service tank 20. Service tank 20
A pressurized gas is introduced through the supply line 21 and the raw material liquid 3 is pressure-fed to the raw material tank 1 through the pipe 23 by this gas pressure. The vaporized raw material gas 4 is sent to a glass reactor through a pipe 14 and a condenser 11 using an inert gas such as Ar as a carrier gas. The carrier gas is pressure-fed to the raw material tank 1 through the flow rate controller 12.

【0003】ここで均一な構造の光ファイバを得るため
には、原料ガスの流量調整が重要となる。そのために従
来は、加熱ヒータの温度を十分制御するとともに、コン
デンサ11、流量制御装置12を用いていた。ところ
で、単位時間当たりの原料ガスの流量はキャリアガスの
流量と原料タンク内での飽和蒸気圧、即ち原料ガスの温
度によって決定される。従って、理論的にはキャリアガ
スの流量と原料ガスの温度を一定に保持することによっ
て原料ガスの流量を一定に保つことが出来る。このよう
な考えに基づき、従来は原料タンクの温度を一定に保
ち、あるいは原料ガスの温度が変動した場合、この温度
変動をいかなる制御方法を介して加熱手段に帰還し、原
料ガスの流量を一定に保つことが出来るかを問題にして
きた。代表的な方法としては特公平7−72091号公
報がある。
In order to obtain an optical fiber having a uniform structure, it is important to adjust the flow rate of the raw material gas. Therefore, conventionally, the temperature of the heater has been sufficiently controlled, and the condenser 11 and the flow control device 12 have been used. The flow rate of the raw material gas per unit time is determined by the flow rate of the carrier gas and the saturated vapor pressure in the raw material tank, that is, the temperature of the raw material gas. Therefore, theoretically, the flow rate of the raw material gas can be kept constant by keeping the flow rate of the carrier gas and the temperature of the raw material gas constant. Based on this idea, conventionally, when the temperature of the raw material tank is kept constant, or when the temperature of the raw material gas fluctuates, this temperature fluctuation is returned to the heating means through any control method to keep the raw material gas flow rate constant. I have been wondering if I can keep it. As a typical method, there is Japanese Patent Publication No. 7-72091.

【0004】[0004]

【発明が解決しようとする課題】このような装置を用
い、原料タンクの温度は比例(P)、積分(I)、微分
(D)制御を採用してきたが、0.1℃以下に抑制する
ことは殆ど不可能であった。しかしながら、最近の光フ
ァイバに要求される精度は益々高まり、原料タンクの温
度制御を0.1℃以下に抑えることが必要となってい
る。そこで本発明は、原料タンクの温度変動が若干あっ
たとしても、原料ガスの流量を安定に供給する方法及び
その装置を提供することを目的とする。
Using such a device, the temperature of the raw material tank has been controlled by proportional (P), integral (I), and derivative (D) control, but it is suppressed to 0.1 ° C. or less. Was almost impossible. However, the precision required for recent optical fibers is increasing more and more, and it is necessary to suppress the temperature control of the raw material tank to 0.1 ° C. or less. Therefore, it is an object of the present invention to provide a method and an apparatus for stably supplying a flow rate of a raw material gas even if there is a slight temperature fluctuation in the raw material tank.

【0005】[0005]

【課題を解決するための手段】本発明に係わる原料ガス
の供給方法は、加熱ヒータが装着された原料タンク内に
ガラスの原料液を収容し、該原料タンク内で気化した原
料ガスを反応装置に送出する原料ガスの供給方法であっ
て、前記原料タンクには原料液を連続的に供給して前記
原料ガスの占める体積が常に所定値となるように保持
し、かつ、該原料タンクの加熱温度が変動して前記原料
ガスが占めるタンク内の圧力が変化すると原料タンクと
連通された密閉体の体積が変化してタンク内の圧力を一
定に保持することを特徴とする。
According to the method of supplying a raw material gas according to the present invention, a raw material liquid of glass is contained in a raw material tank equipped with a heater, and the raw material gas vaporized in the raw material tank is used as a reactor. A method of supplying a raw material gas to be delivered to a raw material tank, wherein the raw material liquid is continuously supplied to the raw material tank so that the volume occupied by the raw material gas is always kept at a predetermined value, and the raw material tank is heated. When the temperature fluctuates and the pressure in the tank occupied by the raw material gas changes, the volume of the sealed body communicating with the raw material tank changes, and the pressure in the tank is kept constant.

【0006】また、本発明に係わる原料ガスの供給装置
は、ガラスの原料液を収容する原料タンクに加熱ヒータ
が装着された原料タンクと、該原料タンク内で気化した
原料ガスを反応装置に送出する配管を備えた原料ガスの
供給装置であって、前記原料タンクには前記原料ガスの
占める体積が常に所定値となるように原料液が連続的に
供給される機構を具備するとともに、体積可変の密閉体
が原料タンクに連通して設けられ、前記原料タンクの加
熱温度が変動して前記原料ガスが占めるタンク内の圧力
が変化すると密閉体の体積が変化してタンク内の圧力を
一定に保持することを特徴とする。
The raw material gas supply apparatus according to the present invention is a raw material tank in which a heater is attached to a raw material tank for containing a raw material liquid for glass, and the raw material gas vaporized in the raw material tank is sent to a reactor. And a mechanism for continuously supplying a raw material liquid to the raw material tank so that the volume occupied by the raw material gas is always a predetermined value. The sealed body is provided in communication with the raw material tank, and when the heating temperature of the raw material tank fluctuates and the pressure in the tank occupied by the raw material gas changes, the volume of the sealed body changes to keep the pressure in the tank constant. It is characterized by holding.

【0007】[0007]

【発明の実施の形態】以下、添付図面を参照して本発明
の実施形態を説明する。なお、図面の説明において同一
要素には同一符号を付し、重複する説明を省略する。図
1は本発明に係わる原料ガスの供給装置の構成を示す図
であり、ガラスの原料液3を収容し、外周に加熱ヒータ
2が装着した原料タンク1と、この原料タンク1内で気
化した原料ガス4をキャリアガスと共に反応装置に送出
する配管14、コンデンサ11及びキャリアガスの流量
制御装置12を備えている。そして、原料タンク1には
原料ガス4の占める体積が常に所定値となるように原料
液3が連続的に供給される機構:例えば、原料ガス4が
反応装置によって消費され、原料液3の液面が低下する
とパイプ23を介してサービスタンク20の原料液3が
原料タンク1に自動的に供給される。また、原料タンク
1には体積可変の密閉体6が原料タンク1に連通管7を
介して接続され、加熱ヒータ2の温度変動によって原料
ガス4が占めるタンク内の圧力が変化すると原料タンク
1と連通している密閉体6の体積が変化してタンク内の
圧力を一定に保持するようになっている。
DETAILED DESCRIPTION OF THE INVENTION Embodiments of the present invention will be described below with reference to the accompanying drawings. In the description of the drawings, the same elements will be denoted by the same reference symbols, without redundant description. FIG. 1 is a diagram showing a configuration of a raw material gas supply device according to the present invention, which contains a raw material liquid 3 of glass, a raw material tank 1 having a heater 2 mounted on the outer periphery thereof, and vaporized in the raw material tank 1. A pipe 14, a condenser 11, and a carrier gas flow rate controller 12 for delivering the raw material gas 4 to the reaction device together with the carrier gas are provided. Then, a mechanism in which the raw material liquid 3 is continuously supplied to the raw material tank 1 so that the volume occupied by the raw material gas 4 is always a predetermined value: For example, the raw material gas 4 is consumed by the reaction device and the liquid of the raw material liquid 3 is consumed. When the surface is lowered, the raw material liquid 3 in the service tank 20 is automatically supplied to the raw material tank 1 through the pipe 23. Further, a variable volume sealing body 6 is connected to the raw material tank 1 via a communication pipe 7 and the raw material tank 1 is connected to the raw material tank 1 when the pressure in the tank occupied by the raw material gas 4 changes due to the temperature change of the heater 2. The volume of the communicating sealing body 6 is changed to keep the pressure in the tank constant.

【0008】密閉体6のより具体的な構成としては、図
2に示すようにシリンダ61の一方の端面は連通管7を
介して原料タンク1に接続され、他方の端面はシリンダ
61の軸方向に移動可能なピストン62の先端に設けら
れた端面63からなるダンパ60がある。原料タンクの
加熱温度が変動して原料ガスが占めるタンク内の圧力が
変動すると、その変動分は制御装置63を介してピスト
ン62にフィードバックされてタンク内の圧力は一定に
保持される。
As a more specific structure of the sealing body 6, as shown in FIG. 2, one end surface of the cylinder 61 is connected to the raw material tank 1 through the communication pipe 7, and the other end surface thereof is in the axial direction of the cylinder 61. There is a damper 60 composed of an end surface 63 provided at the tip of a piston 62 that is movable to the inside. When the heating temperature of the raw material tank fluctuates and the pressure in the tank occupied by the raw material gas fluctuates, the fluctuation is fed back to the piston 62 via the control device 63 and the pressure in the tank is kept constant.

【0009】さらに簡単な密閉体6の形態としては、ビ
ニールで形成された袋状の風船がある(図示せず)。風
船の入口は連通管7を介して原料タンク1に接続されて
いる。風船は通常、萎んでいるが、原料ガス4が占める
タンク内の圧力が上がって反応装置へより多くの原料ガ
スが供給される状態になると、余分の原料ガスは風船に
流れてタンク内の圧力上昇を緩和するのである。
A simpler form of the closed body 6 is a bag-shaped balloon made of vinyl (not shown). The inlet of the balloon is connected to the raw material tank 1 via a communication pipe 7. The balloon is normally deflated, but when the pressure in the tank occupied by the raw material gas 4 rises and more raw material gas is supplied to the reactor, excess raw material gas flows into the balloon and the pressure in the tank increases. It moderates the rise.

【0010】このような構成の供給装置を用いて原料ガ
スを安定に供給する第1の要件は、原料タンク1には原
料液3を連続的に供給して原料ガス4の占める体積が常
に所定値となるように保持することである。第2の要件
は、温度制御された後に残された僅かな温度変動によっ
て原料ガス4が占めるタンク内の圧力が変化することに
なるので、この僅かな圧力変化を原料タンク1と連通さ
れた密閉体6にフィードバックして圧力を一定に保持す
るものである。
The first requirement for stably supplying the raw material gas using the supply device having such a configuration is that the raw material liquid 3 is continuously supplied to the raw material tank 1 and the volume occupied by the raw material gas 4 is always predetermined. It is to hold so that it becomes a value. The second requirement is that the pressure in the tank occupied by the raw material gas 4 changes due to the slight temperature fluctuations left after the temperature control, so that this slight pressure change is sealed by the raw material tank 1. The pressure is kept constant by feeding back to the body 6.

【0011】ここで、原料ガス4の占める体積は原料タ
ンク及び密閉体を加えた体積の30%以下、5%以上の
中から選ばれた値に保持することである。この原料ガス
が占める空間は小さいほど加熱温度の変動が原料ガスの
圧力変化へ及ぼす影響が小さくなるので好ましいが、体
積が小さすぎると反応装置への供給が中断する恐れがあ
るからである。
Here, the volume occupied by the source gas 4 is to be maintained at a value selected from 30% or less and 5% or more of the volume of the source tank and the closed body. The smaller the space occupied by the raw material gas, the smaller the influence of the fluctuation of the heating temperature on the pressure change of the raw material gas is, which is preferable, but if the volume is too small, the supply to the reactor may be interrupted.

【0012】また、原料タンク1の上部の空間には、原
料ガスの他にAr等のキャリアガスも共存するので、原
料ガスの分圧制御を併用することは更に好ましい。
Since a carrier gas such as Ar coexists in addition to the raw material gas in the space above the raw material tank 1, it is more preferable to use the partial pressure control of the raw material gas together.

【0013】〈実施例〉図1に示すようは原料タンク1
の上部にダンパ6を連通した供給装置によって光ファイ
バ用母材を作製した。この時、原料タンク1内には原料
液を連続的に供給し、原料ガスの体積は全体の10%に
なるように保持した。加熱ヒータ2の温度制御は通常使
用されているP、I、D制御を用いたが、温度変動は
0.2℃であった。この装置で製造した光ファイバ用母
材を線引きして得られた光ファイバの比屈折率差の分布
を測定したところ、変動は0.005%以下であった。
<Example> As shown in FIG. 1, a raw material tank 1
An optical fiber preform was produced by a supply device in which the damper 6 was connected to the upper part of the. At this time, the raw material liquid was continuously supplied into the raw material tank 1, and the volume of the raw material gas was maintained at 10% of the whole volume. The temperature of the heater 2 was controlled by the P, I, and D controls that are normally used, but the temperature fluctuation was 0.2 ° C. When the distribution of the relative refractive index difference of the optical fiber obtained by drawing the optical fiber preform manufactured by this apparatus was measured, the variation was 0.005% or less.

【0014】〈比較例1〉実施例と同じ供給装置を用
い、原料ガスの体積は実施例と比べて3倍とした。その
他の条件は実施例と同じである。このようにして製造し
た光ファイバ用母材を線引きして得られた光ファイバの
比屈折率差の分布を測定したところ、変動は0.009
%以下に抑えることが出来た。
<Comparative Example 1> The same supply device as that of the embodiment was used, and the volume of the raw material gas was made three times as large as that of the embodiment. Other conditions are the same as those in the example. When the distribution of the relative refractive index difference of the optical fiber obtained by drawing the optical fiber preform thus manufactured was measured, the variation was 0.009.
I was able to suppress it to less than%.

【0015】〈比較例2〉原料タンクのダンパ6を除去
した図3に示した供給装置によって光ファイバ用母材を
作製した。原料タンク内には原料液を連続的に供給し、
原料ガスの体積は全体の10%になるように保持した。
加熱ヒータ2の温度制御は実施例と同じである。このよ
うにして製造した光ファイバ用母材を線引きして得られ
た光ファイバの比屈折率差の分布を測定したところ、変
動は0.03%以下であった。
<Comparative Example 2> An optical fiber preform was produced by the feeder shown in FIG. 3 from which the damper 6 of the raw material tank was removed. The raw material liquid is continuously supplied into the raw material tank,
The volume of the raw material gas was maintained so as to be 10% of the whole.
The temperature control of the heater 2 is the same as in the embodiment. When the distribution of the relative refractive index difference of the optical fiber obtained by drawing the optical fiber preform thus manufactured was measured, the variation was 0.03% or less.

【0016】[0016]

【発明の効果】本発明は、以上説明したような形態で実
施され、以下に記載されるような効果を奏する。
The present invention is embodied in the form described above and has the following effects.

【0017】温度制御された後の僅かな温度変動が残存
し、この温度変動によって原料ガスが占めるタンク内の
圧力が変化しようとしても、圧力変化を原料タンクと連
通された密閉体にフィードバックしているので、原料ガ
スの流量を高精度に制御することができる。
A slight temperature fluctuation remains after the temperature control, and even if the pressure in the tank occupied by the raw material gas changes due to this temperature fluctuation, the pressure change is fed back to the sealed body communicating with the raw material tank. Therefore, the flow rate of the raw material gas can be controlled with high accuracy.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係わる原料ガスの供給装置の構成を示
す図である。
FIG. 1 is a diagram showing a configuration of a source gas supply device according to the present invention.

【図2】本発明に適用されるダンパの構成を示す図であ
る。
FIG. 2 is a diagram showing a configuration of a damper applied to the present invention.

【図3】従来の供給装置の構成を示す図である。FIG. 3 is a diagram showing a configuration of a conventional supply device.

【符号の説明】[Explanation of symbols]

1:原料タンク 2:加熱ヒータ 3:原料液 4:原料ガス 5:キャリアガス供給ライン 6:密閉体 7:連通管 11:コンデンサ 12:流量制御装置 20:サービスタンク 60:ダンパ 61:シリンダ 62:ピストン 63:ピストンの端面 64:ダンパの制御装置 14、22、23:パイプ 1: Raw material tank 2: Heater 3: Raw material liquid 4: Raw material gas 5: Carrier gas supply line 6: Sealed body 7: Communication pipe 11: Condenser 12: Flow control device 20: Service tank 60: Damper 61: Cylinder 62: Piston 63: End face of piston 64: Control device for damper 14, 22, 23: Pipe

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 加熱ヒータが装着された原料タンク内に
ガラスの原料液を収容し、該原料タンク内で気化した原
料ガスを反応装置に送出する原料ガスの供給方法であっ
て、 前記原料タンクには原料液を連続的に供給して前記原料
ガスの占める体積が常に所定値となるように保持し、か
つ、該原料タンクの加熱温度が変動して前記原料ガスが
占めるタンク内の圧力が変化すると原料タンクと連通さ
れた密閉体の体積が変化してタンク内の圧力を一定に保
持することを特徴とする原料ガスの供給方法。
1. A raw material gas supply method in which a raw material gas for glass is contained in a raw material tank equipped with a heater and the raw material gas vaporized in the raw material tank is delivered to a reactor. The raw material liquid is continuously supplied to maintain the volume occupied by the raw material gas at a predetermined value at all times, and the heating temperature of the raw material tank varies so that the pressure in the tank occupied by the raw material gas is A method of supplying a raw material gas, characterized in that the volume of a sealed body communicating with the raw material tank is changed to change so that the pressure in the tank is kept constant.
【請求項2】 原料ガスの占める体積は原料タンク及び
密閉体を加えた体積の5〜30%の範囲から選ばれた値
であることを特徴とする請求項1に記載の原料ガスの供
給方法。
2. The method for supplying a raw material gas according to claim 1, wherein the volume occupied by the raw material gas is a value selected from the range of 5 to 30% of the volume of the raw material tank and the sealed body. ..
【請求項3】 原料ガスが占めるタンク内の圧力を検出
し、該圧力が一定になるように密閉体の体積を制御する
ことを特徴とする請求項1に記載の原料ガスの供給方
法。
3. The method for supplying a raw material gas according to claim 1, wherein the pressure in the tank occupied by the raw material gas is detected, and the volume of the sealed body is controlled so that the pressure becomes constant.
【請求項4】 ガラスの原料液を収容する原料タンクに
加熱ヒータが装着された原料タンクと、該原料タンク内
で気化した原料ガスを反応装置に送出する配管を備えた
原料ガスの供給装置であって、 前記原料タンクには前記原料ガスの占める体積が常に所
定値となるように原料液が連続的に供給される機構を具
備するとともに、体積可変の密閉体が原料タンクに連通
して設けられ、前記原料タンクの加熱温度が変動して前
記原料ガスが占めるタンク内の圧力が変化すると密閉体
の体積が変化してタンク内の圧力を一定に保持すること
を特徴とする原料ガスの供給装置。
4. A raw material gas supply device comprising a raw material tank in which a heater is mounted in a raw material tank for containing a raw material liquid for glass, and a pipe for delivering the raw material gas vaporized in the raw material tank to a reactor. The raw material tank is provided with a mechanism for continuously supplying the raw material liquid so that the volume occupied by the raw material gas is always a predetermined value, and a variable volume sealed body is provided in communication with the raw material tank. When the heating temperature of the raw material tank fluctuates and the pressure in the tank occupied by the raw material gas changes, the volume of the sealed body changes to keep the pressure in the tank constant. apparatus.
【請求項5】 密閉体がダンパであることを特徴とする
請求項4に記載の原料ガスの供給装置。
5. The raw material gas supply device according to claim 4, wherein the closed body is a damper.
【請求項6】 密閉体が風船であることを特徴とする請
求項4に記載の原料ガスの供給装置。
6. The raw material gas supply device according to claim 4, wherein the closed body is a balloon.
JP9861596A 1996-04-19 1996-04-19 Method for supplying gaseous raw material and device therefor Pending JPH09286620A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9861596A JPH09286620A (en) 1996-04-19 1996-04-19 Method for supplying gaseous raw material and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9861596A JPH09286620A (en) 1996-04-19 1996-04-19 Method for supplying gaseous raw material and device therefor

Publications (1)

Publication Number Publication Date
JPH09286620A true JPH09286620A (en) 1997-11-04

Family

ID=14224486

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9861596A Pending JPH09286620A (en) 1996-04-19 1996-04-19 Method for supplying gaseous raw material and device therefor

Country Status (1)

Country Link
JP (1) JPH09286620A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040000689A (en) * 2002-06-25 2004-01-07 삼성전자주식회사 Raw material providing device for chemical vapor deposition process
JP2011132090A (en) * 2009-12-25 2011-07-07 Cosmo Oil Co Ltd Method and apparatus for supplying zinc vapor
KR20150078607A (en) * 2013-12-31 2015-07-08 세메스 주식회사 Tank and substrate treating apparatus and method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040000689A (en) * 2002-06-25 2004-01-07 삼성전자주식회사 Raw material providing device for chemical vapor deposition process
JP2011132090A (en) * 2009-12-25 2011-07-07 Cosmo Oil Co Ltd Method and apparatus for supplying zinc vapor
KR20150078607A (en) * 2013-12-31 2015-07-08 세메스 주식회사 Tank and substrate treating apparatus and method

Similar Documents

Publication Publication Date Title
KR890001122B1 (en) Apparatus for suppling of liquid material
JP5703114B2 (en) Raw material vaporizer
JPH0772091B2 (en) Method and apparatus for controlling vapor discharge in optical preform manufacturing
CN101724828A (en) Material gas concentration control system
JP6978991B2 (en) Manufacturing method and manufacturing equipment for porous glass base material for optical fiber
CN101629674A (en) Hydrogen supply equipment
JPH0781965A (en) Gas producer, method for producing optical waveguide and optical fiber preform and device therefor
US6978984B2 (en) Raw material providing device for chemical vapor deposition process
JPH09286620A (en) Method for supplying gaseous raw material and device therefor
JP2004338996A (en) Method of supplying gas material and equipment, glass particulate built-up body and manufacturing method of glass material
JP2003013233A (en) Device for vaporizing/feeding liquid raw material
JPS6023290Y2 (en) Raw material gas supply device
JPH085690B2 (en) Raw material supply method and device
JPH0251436A (en) Dehydrating sintering furnace for mother material of optical glass
JPH0480860B2 (en)
JPH0332501Y2 (en)
JPS5992933A (en) Feeder for raw material gas
JPH01290540A (en) Method and device for supplying glass raw material
JP3707104B2 (en) Raw material supply apparatus and raw material supply method
JP3077106B1 (en) Supply device for raw material liquid of porous glass base material
JPS621334B2 (en)
JP3186446B2 (en) Method for producing silica glass
JPH06277494A (en) Raw material supplying apparatus
JPH0714770A (en) Liquid source supply device
JPS61295249A (en) Raw material gas feeding device