JPH0925574A - Base body holder - Google Patents

Abstract

PROBLEM TO BE SOLVED: To subject base body surfaces to uniform film formation or irradiation with ions even if this base bodies are three-dimensional structures by rotating a holder around a revolving shaft by revolution of this revolving shaft and successively moving shafts for oscillation, thereby oscillating the holder. SOLUTION: The holder 22 is rotated via a universal joint 23 by rotating of the revolving shaft 21. Respective cylinder shafts 26 are moved axially by driving of respective air cylinders 25 in a moving means 31 and the respective shafts 30 for oscillation are successively moved axially via links 29. The holder 22 is oscillated in the state that the front ends of the respective shafts 30 for oscillation are held fitted in the annular grooves 24 of the holder 22. The angle formed by the surface of the holder 22 with the revolving shaft 21 changes regardless of the rotating speed of the revolving shaft 21 and base bodies 32 of a recessed shape, etc., are subjected to the film formation or the irradiation with the ions. The change rate of the inclination of the holder 22 with the revolving shaft 21 is arbitrarily adjusted by the change in the axial moving quantity of the shafts 30 for oscillation.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate holding device for holding a substrate which is subjected to film formation or ion irradiation.

[0002]

2. Description of the Related Art Conventionally, the PVD method (physical vapor deposition method) has been widely used to form a film on the surface of a substrate. Further, it is industrially widely used to perform processing by cleaning or etching, or to irradiate the surface of a substrate with ions for ion implantation or film formation. At this time, various devices for uniformly forming a film on the surface of a substrate having a three-dimensional structure, for example, an uneven substrate surface, or for irradiating ions have been proposed. There is an apparatus described in Japanese Patent Laid-Open No. 64-26365.

The apparatus described in this publication is shown in FIG. 3, in which 1 is a cylindrical chamber, 2 is a lid plate that hermetically closes an opening 3 in the upper surface of the chamber 1, and 4 is a lid plate. A motor 5 provided outside the cover plate 2 is a rotating shaft of the motor 4, and the rotating shaft 5 penetrates the cover plate 2 airtightly and is introduced into the chamber 1. Reference numeral 6 is a support base fixed to the tip of the rotary shaft 5, and the end face is inclined. Reference numeral 7 denotes a holding body which is supported perpendicularly to the end surface of the support base 6 via a ball bearing 8 and is provided at a position eccentric to the rotary shaft 5. Reference numeral 9 is a base body held by the holder 7.

Reference numeral 10 denotes an idle pulley provided on the inner surface of the cover plate 2 in parallel with the rotary shaft 5, 11 denotes a rotary belt for transmitting the rotation of the rotary shaft 5 to the pulley 10, and 12 denotes rotation of the pulley 10 on a holder 7. An elastic rubber belt for transmission, 13 is a target located below the rotating shaft 5, and 14 is an ion gun.

The rotation of the rotary shaft 5 causes the holder 7 to rotate via the support base 6, and the rotation of the rotary shaft 5 causes the holder 7 to rotate via the rotary belt 11, the pulley 10 and the rubber belt 12. The ion beam emitted from the ion gun collides with the target 13, and the ions sputtered and ejected are applied to the substrate 9 held by the holder 7.

[0006]

The conventional substrate holding device described above has a problem that it is not possible to uniformly form a film on the surface of the concave substrate 9 or perform ion irradiation.

In consideration of the above points, the present invention has a simple mechanism for holding a substrate even if the substrate is a three-dimensional structure having a concave shape or the like, which allows uniform film formation or ion irradiation on the substrate surface. The purpose is to provide a device.

[0008]

In order to solve the above-mentioned problems, the substrate holding device of the present invention comprises a rotary shaft that is airtightly introduced into a chamber, and a central portion of the back surface via a universal joint at the tip of the rotary shaft. Are connected to each other and are provided at a position substantially parallel to the rotation axis and at substantially equal intervals around the rotation axis with respect to the holding body holding the base body on the front surface, and the tips are in contact with the back surface of the holding body. The swing shaft and the moving means for sequentially moving the swing shaft in the axial direction are provided.

Therefore, during film formation or ion irradiation on the surface of the substrate, the rotation of the rotary shaft causes the holder to rotate about the rotary shaft, and the swinging shafts are sequentially moved by the moving means to shake the holder. Even if the substrate is a three-dimensional structure having a concave and convex shape, the film can be uniformly formed on the surface or ion irradiation can be performed, and the mechanism is simple.

Also, the amount of change in the inclination of the holder with respect to the rotation axis can be adjusted arbitrarily by changing the amount of movement of the swing shaft in the axial direction, and film formation or ion irradiation can be performed on the substrate.

[0011]

BEST MODE FOR CARRYING OUT THE INVENTION One embodiment will be described with reference to FIG. 1 which is a cutaway front view and FIG. 2 which is a partial plan view. In these figures, 15 is an opening formed in the cover plate 2 of the chamber 1, 16 is a mounting plate that closes the opening 15, and 17 is the cover plate 2.
Is an O-ring interposed between the peripheral edge of the opening 15 and the mounting plate 16, and maintains airtightness in the chamber 1.

Reference numeral 18 is a motor 19 mounted on the mounting plate 16.
Is a supporting plate, 20 is an O-ring interposed between the mounting plate 16 and the supporting plate 18, and 21 is a rotating shaft of the motor 19, which penetrates the supporting plate 18 and the mounting plate 16 and is introduced into the chamber 1. There is. Reference numeral 22 denotes a disk-shaped holder whose central portion on the back surface is connected to the tip of the rotary shaft 21 via a universal joint 23, and 24 denotes an annular groove formed on the back surface of the holder 22 in a concentric pattern about the rotary shaft 21. Is.

Reference numeral 25 denotes three air cylinders, which are supported on the mounting plate 16 by supporting means (not shown) on the same circumference of the rotary shaft 21 at equal intervals. 26 is the cylinder shaft of the air cylinder 25 that penetrates the mounting plate 16, and 27 is the mounting plate 1.
6 is a bellows penetrating the cylinder shaft 6, the central rigid body portion is fixedly penetrated through the mounting plate 16, the movable portions at both ends are fixed to the cylinder shaft 26, and the cylinder shaft 26 is introduced into the chamber 1. Maintains hermeticity.

Reference numeral 28 denotes three support rods which are planted on the inner surface of the mounting plate 16, and 29 denotes a link which is rotatably supported by the tip of the support rod 28, and one end of which has a tip of the cylinder shaft 26. Are linked to. Reference numeral 30 denotes three swing shafts, which are positioned substantially parallel to the rotary shaft 21 and at substantially equal intervals on the same circumference of the rotary shaft 21, and the base of the swing shaft 30 is a link 29.
Is connected to the other end of the holder 22 and the tip is inserted into the annular groove 24 of the holder 22.

The air cylinder 25 and the cylinder shaft 2
6, the bellows 27, the support rod 28, and the link 29 form a moving means 31 for sequentially moving the swinging shafts 30 in the axial direction, and the film formation surface or the ion irradiation surface is convex or concave on the surface of the holder 22. The base body 32 is held.

Next, the operation will be described. Motor 1
The rotation of the rotary shaft 21 by the drive of 9 rotates the holding body 22 via the universal joint 23, and the drive of the air cylinders 25 in the moving means 31 causes the cylinder shafts 26 to move in the axial direction and the links 29 to move. The swing shafts 30 sequentially move in the axial direction through the swing shafts 30, and the holder 22 is swung with the tip of each swing shaft 30 fitted in the annular groove 24. The angle changes regardless of the rotation speed of the rotating shaft 21, and the substrate 32 is subjected to film formation or ion irradiation.

The number of swing shafts 30 is not limited to three, and the guide of each swing shaft 30 is the annular groove 2.
It is not limited to four.

[0018]

The present invention has the following effects. In the substrate holding device of the present invention, the center of the back surface of the holder 22 is connected to the tip of the rotary shaft 21 that is hermetically introduced into the chamber 1 through the universal joint 23, and the substrate 32 is attached to the surface of the holder 22. The swing shafts 30 that are held and provided substantially parallel to the rotary shaft 21 and at substantially equal intervals around the rotary shaft 21 contact the back surface of the holding body 22, and the moving means 31 causes the swing shafts 3 to move.
Since 0 is sequentially moved in the axial direction, during the film formation on the surface of the substrate 32 or the ion irradiation, the holder 22 is rotated about the rotating shaft 21 by the rotation of the rotating shaft 21, and
Even if each of the swinging shafts 30 is sequentially moved by the moving means 31 in the axial direction to swing the holding body 22, and the substrate 32 is a three-dimensional structure having an uneven shape, uniform film formation or ion irradiation is performed on the surface. And the mechanism is simple.

Further, the amount of change in the inclination of the holder 22 with respect to the rotary shaft 21 can be arbitrarily adjusted by changing the amount of movement of the swing shaft 30 in the axial direction, and film formation or ion irradiation can be performed on the substrate 32.

[Brief description of drawings]

FIG. 1 is a cutaway front view of one embodiment of the present invention.

FIG. 2 is a plan view of a part of FIG.

FIG. 3 is a cutaway front view of a conventional example.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 chamber 21 rotating shaft 22 holding body 23 universal joint 30 swinging shaft 31 moving means 32 base body

Claims (1)

[Claims] 1. A substrate holding device for holding a substrate to be film-formed or ion-irradiated on the surface thereof, wherein a rotary shaft airtightly introduced into a chamber, and a central portion of the rear surface via a universal joint at the tip of the rotary shaft. A holding body that is connected and holds the base body on the front surface, and a plurality of members that are provided substantially parallel to the rotation axis and at substantially equal intervals around the rotation axis, and whose tips are in contact with the back surface of the holding body. A substrate holding device comprising: one swing shaft; and a moving unit that sequentially moves each swing shaft in the axial direction of each swing shaft.