JPH09239571A - Optical beam treating method - Google Patents

Optical beam treating method

Info

Publication number
JPH09239571A
JPH09239571A JP8052805A JP5280596A JPH09239571A JP H09239571 A JPH09239571 A JP H09239571A JP 8052805 A JP8052805 A JP 8052805A JP 5280596 A JP5280596 A JP 5280596A JP H09239571 A JPH09239571 A JP H09239571A
Authority
JP
Japan
Prior art keywords
mask
shape
irradiated
marked
marking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8052805A
Other languages
Japanese (ja)
Inventor
Nobuyoshi Osuge
信義 大菅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP8052805A priority Critical patent/JPH09239571A/en
Publication of JPH09239571A publication Critical patent/JPH09239571A/en
Pending legal-status Critical Current

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  • Laser Beam Processing (AREA)
  • Lasers (AREA)

Abstract

PROBLEM TO BE SOLVED: To execute a clear marking in one shot on an irradiated surface having irradiated parts at the positions having different beam axial direction. SOLUTION: After forming an irradiating laser beam L from a laser beam oscillator to a rectangular spot shape, the laser beam reaches a mask 4 through a cylindrical lens 2. In the mask 4, punching hole letters 5 are formed and the shape of the mask 4 is formed stepwise corresponding to the shape of the surface 11 to be marked of an electronic parts 10. The laser beam L passed through the punched hole letter 5 part irradiates the electronic parts 10 as the material to be marked after condensing with a meniscus lens 6. The electronic parts 10 provides the surface 11 to be marked having the parts 11a, 11b to be marked at the position having different beam axial C directions. That is, the surface 11 to be marked is the stepwise surface and the laser beam L marks on the surface 11 to be marked.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、光ビーム処理方
法、特に光ビームによるマーキングや露光、研磨等の処
理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light beam processing method, and more particularly to a processing method such as marking, exposure and polishing with a light beam.

【0002】[0002]

【従来の技術】例えば、パルス型レーザマーキング法
は、一般に矩形のスポット形状を有するレーザビーム
を、光軸に対して略垂直に配置した平板状のマスクに照
射し、マスクに設けた抜き穴文字等の部分を通過したレ
ーザビームをメニスカスレンズで集光させ、被表示面に
照射してマーキングするものであった。
2. Description of the Related Art For example, in the pulse type laser marking method, a laser beam having a generally rectangular spot shape is applied to a flat plate mask arranged substantially perpendicular to the optical axis to form a punched hole character on the mask. The laser beam that has passed through such portions is condensed by a meniscus lens, and the surface to be displayed is irradiated for marking.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、従来の
レーザマーキング法にあっては、被表示面の形状が光軸
方向に例えば1mm以上の段差を有している場合、1シ
ョットでのマーキングはマーキング文字が不鮮明になる
という問題があった。このため、被表示面の段差が1m
m以上の場合には、被表示面を区画内の段差が1mm以
内になるように複数の区画に仕切り、区画毎に1ショッ
トを当てて対応していた。従って、一つの被表示面に対
して複数のショットが必要となり、レーザ装置の構造は
複雑となり、高価格化を招いていた。
However, in the conventional laser marking method, when the shape of the surface to be displayed has a step of, for example, 1 mm or more in the optical axis direction, marking with one shot is marked. There was a problem that the letters became unclear. Therefore, the step on the display surface is 1 m
In the case of m or more, the surface to be displayed is divided into a plurality of sections such that the step difference within the section is within 1 mm, and one shot is applied to each section. Therefore, a plurality of shots are required for one display surface, the structure of the laser device becomes complicated, and the cost is increased.

【0004】そこで、本発明の目的は、光軸方向の異な
る位置にそれぞれ被照射部を有した被照射面に、1ショ
ットで鮮明なマーキング等を行なうことができる光ビー
ム処理方法を提供することにある。
Therefore, an object of the present invention is to provide a light beam processing method capable of performing clear marking or the like with one shot on an irradiated surface having irradiated portions at different positions in the optical axis direction. It is in.

【0005】[0005]

【課題を解決するための手段】以上の目的を達成するた
め、本発明に係る光ビーム処理方法は、光軸方向の異な
る位置にそれぞれ被照射部を有した被照射面に、前記被
照射面の形状に対応した形状のマスクを介して光ビーム
を照射することを特徴とする。また、本発明に係る光ビ
ーム処理方法は、光軸方向の異なる位置にそれぞれ被照
射部を有した被照射面の形状に対応させて複数のマスク
を配置し、光ビームを前記複数のマスクを介して前記被
照射面に照射することを特徴とする。
In order to achieve the above object, a method of processing a light beam according to the present invention is directed to an irradiation surface having irradiation portions at different positions in the optical axis direction. The light beam is emitted through a mask having a shape corresponding to the shape of. Further, the light beam processing method according to the present invention, a plurality of masks are arranged corresponding to the shape of the irradiated surface having the irradiated portion at different positions in the optical axis direction, and the light beam is irradiated by the plurality of masks. It is characterized in that the surface to be irradiated is irradiated with the light.

【0006】ここに、光ビームとしては、レーザビーム
や紫外線等がある。また、光軸方向の異なる位置にそれ
ぞれ被照射部を有した被照射面としては、例えば階段状
の面、傾斜状の面、曲面等がある。
Here, as the light beam, there are a laser beam, an ultraviolet ray and the like. Further, examples of the irradiated surface having the irradiated portions at different positions in the optical axis direction include, for example, a stepped surface, an inclined surface, and a curved surface.

【0007】[0007]

【作用】マスクの形状を被照射面の形状に対応させた
り、あるいは、被照射面の形状に対応させて複数のマス
クを配置したため、被照射面に合わせて鮮明なマーキン
グや露光や研磨を行なうことができ、光軸方向の被照射
部の位置差が吸収される。
Function: The mask shape is made to correspond to the shape of the irradiation surface, or a plurality of masks are arranged so as to correspond to the shape of the irradiation surface, so that clear marking, exposure and polishing are performed according to the irradiation surface. Therefore, the position difference of the irradiated portion in the optical axis direction is absorbed.

【0008】[0008]

【発明の実施の形態】以下、本発明に係る光ビーム処理
方法の実施形態について添付図面を参照して説明する。
各実施形態は電子部品の識別表示をマーキングする場合
を例にして説明する。また、各実施形態において同一部
品及び同一部分には同じ符号を付した。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a light beam processing method according to the present invention will be described below with reference to the accompanying drawings.
Each embodiment will be described by taking an example of marking an identification display of an electronic component. Further, in each embodiment, the same reference numerals are given to the same parts and the same parts.

【0009】[第1実施形態、図1]図1に示すよう
に、パルス型レーザマーキング光学系1は、概略、レー
ザ発振器(図示せず)と、シリンドリカルレンズ2と、
マスク4と、メニスカスレンズ6にて構成されている。
レーザ発振器から放射されたレーザビームLは、横断面
が矩形のスポット形状とされた後、シリンドリカルレン
ズ2を介してマスク4に到達する。マスク4には抜き穴
文字5が形成されており、マスク4の形状は後述の電子
部品10の被表示面11の形状に対応して階段状であ
る。抜き穴文字5は、被表示面11の表示部11aのマ
ーキングに利用される抜き穴文字5aと、被表示部11
bのマーキングに利用される抜き穴文字5bにて構成さ
れている。
[First Embodiment, FIG. 1] As shown in FIG. 1, a pulse type laser marking optical system 1 is roughly composed of a laser oscillator (not shown), a cylindrical lens 2 and
It is composed of a mask 4 and a meniscus lens 6.
The laser beam L emitted from the laser oscillator reaches the mask 4 via the cylindrical lens 2 after being made into a spot shape having a rectangular cross section. The mask 4 is formed with punched characters 5, and the shape of the mask 4 is stepwise corresponding to the shape of the display surface 11 of the electronic component 10 described later. The punched hole characters 5 are the punched hole characters 5a used for marking the display portion 11a of the display surface 11 and the display portion 11a.
It is composed of a punched hole character 5b used for marking b.

【0010】抜き穴文字5の部分を通過したレーザビー
ムLはメニスカスレンズ6によって集光された後、被表
示物の電子部品10に照射される。電子部品10は、光
軸C方向の異なる位置にそれぞれ被表示部11a,11
bを有する被表示面11を備えている。すなわち、被表
示面11は階段状の面であり、レーザビームLはこの被
表示面11にマーキングする。
The laser beam L that has passed through the portion of the punched character 5 is condensed by the meniscus lens 6 and then irradiated on the electronic component 10 of the display object. The electronic component 10 has the display target portions 11a and 11 at different positions in the optical axis C direction.
The display surface 11 having b is provided. That is, the display surface 11 is a stepped surface, and the laser beam L marks the display surface 11.

【0011】次に、電子部品10の被表示面に鮮明なマ
ーキングを行なう方法について詳説する。一般に、マス
ク4とメニスカスレンズ6間の距離をA1、メニスカス
レンズ6と被表示面11間の距離をB1、メニスカスレ
ンズ6の焦点距離をfとすると、被表示面11に鮮明な
マーキングを行なうための条件として、以下の関係式
(1)及び(2)が成立することが必要である。
Next, a method for making a clear marking on the display surface of the electronic component 10 will be described in detail. Generally, when the distance between the mask 4 and the meniscus lens 6 is A1, the distance between the meniscus lens 6 and the display surface 11 is B1, and the focal length of the meniscus lens 6 is f, clear marking is performed on the display surface 11. It is necessary that the following relational expressions (1) and (2) are satisfied as the condition of.

【0012】 A1=(k+1)×f ……(1) B1={(k+1)/k}×f ……(2) ここに、1/kは縮小率と称されるもので、1/k=
(被表示面11上の文字寸法)/(マスク4に形成され
た抜き穴文字寸法)の関係にある。ところで、被表示部
11a,11bは、光軸Cの方向に段差△hを有してい
る。従って、被表示部11aに鮮明なマーキングを行な
う条件として前記関係式(1)及び(2)を採用する
と、被表示部11bに鮮明なマーキングを行なう条件
は、次の関係式(3)及び(4)が成立することが必要
となる。ここに、マスク4の抜き穴文字5bとメニスカ
スレンズ6間の距離をA2、メニスカスレンズ6と被表
示部11b間の距離をB2とする。
A1 = (k + 1) × f (1) B1 = {(k + 1) / k} × f (2) where 1 / k is a reduction ratio, and 1 / k =
The relationship is (character size on display surface 11) / (character size of punched hole formed in mask 4). By the way, the displayed portions 11a and 11b have a step Δh in the direction of the optical axis C. Therefore, if the above relational expressions (1) and (2) are adopted as the conditions for making clear marking on the displayed portion 11a, the conditions for making clear marking on the displayed portion 11b are as follows. 4) is required to be established. Here, the distance between the punched hole character 5b of the mask 4 and the meniscus lens 6 is A2, and the distance between the meniscus lens 6 and the displayed portion 11b is B2.

【0013】 A2=(k+1)×f−△h×k ……(3) B2={(k+1)/k}×f+△h ……(4) つまり、被表示面11の段差は、マスク4の抜き穴文字
5aとメニスカスレンズ6間の距離、並びに抜き穴文字
5bとメニスカスレンズ6間の距離を異ならせることに
より吸収できる。具体的には、マスク4の形状は階段状
にされ、被表示部11aのマーキングに利用される抜き
穴文字5aと被表示部11bのマーキングに利用される
抜き穴文字5bとの間には、光軸Cの方向に△h×kの
寸法差が設定される。
A2 = (k + 1) × f−Δh × k (3) B2 = {(k + 1) / k} × f + Δh (4) That is, the step on the display surface 11 is the mask 4 This can be absorbed by changing the distance between the hole character 5a and the meniscus lens 6 and the distance between the hole character 5b and the meniscus lens 6. Specifically, the shape of the mask 4 is stepwise, and between the punched hole character 5a used for marking the displayed portion 11a and the punched hole character 5b used for marking the displayed portion 11b, A dimensional difference of Δh × k is set in the direction of the optical axis C.

【0014】以上の構成からなるマスク4を用いること
によって、光軸Cの方向に1mm以上の段差を有した被
照射面11に、1ショットで鮮明なマーキングを行なう
ことができる。
By using the mask 4 having the above structure, it is possible to make clear marking with one shot on the irradiated surface 11 having a step of 1 mm or more in the direction of the optical axis C.

【0015】[第2実施形態、図2]図2に示すよう
に、パルス型レーザマーキング光学系12は、マスク1
4a,14bを残して第1実施形態の光学系1と同様の
ものである。マスク14a,14bにはそれぞれ抜き穴
文字15a,15bが形成されている。マスク14a
は、電子部品10の被表示部11aのマーキングに利用
され、マスク14bは被表示部11bのマーキングに利
用される。そして、被照射面11に1ショットで鮮明な
マーキングを行なうために、マスク14aと14bは光
軸Cの方向に△h×kの取付け位置差で配置されてい
る。
[Second Embodiment, FIG. 2] As shown in FIG. 2, the pulse type laser marking optical system 12 includes a mask 1
The optical system 1 is the same as the optical system 1 of the first embodiment except for 4a and 14b. The masks 14a and 14b are provided with punched characters 15a and 15b, respectively. Mask 14a
Is used for marking the displayed portion 11a of the electronic component 10, and the mask 14b is used for marking the displayed portion 11b. The masks 14a and 14b are arranged in the direction of the optical axis C with a mounting position difference of Δh × k in order to perform clear marking on the irradiated surface 11 with one shot.

【0016】[第3実施形態、図3]図3に示すよう
に、パルス型レーザマーキング光学系21は、マスク2
3を残して第1実施形態の光学系1と同様のものであ
る。マーキング光学系21は、傾斜状の被表示面31を
備えた電子部品30に1ショットで鮮明なマーキングを
行なうことができるものである。
[Third Embodiment, FIG. 3] As shown in FIG. 3, the pulse type laser marking optical system 21 includes a mask 2
It is the same as the optical system 1 of the first embodiment except for 3. The marking optical system 21 is capable of making clear marking with one shot on the electronic component 30 having the inclined display surface 31.

【0017】マスク23には抜き穴文字24が形成され
ている。マスク23の形状は平板であり、電子部品30
の被表示面31の形状に対応して光軸Cに対して傾いて
いる。抜き穴文字24は抜き穴文字24aと抜き穴文字
24bにて構成され、抜き穴文字24aは被表示面31
の下側寄りの被表示部31aのマーキングに利用され、
抜き穴文字24bは上側寄りの被表示部31bのマーキ
ングに利用される。
The mask 23 is formed with punched characters 24. The shape of the mask 23 is a flat plate, and the electronic component 30
Inclining with respect to the optical axis C corresponding to the shape of the surface 31 to be displayed. The punched hole character 24 is composed of a punched hole character 24a and a punched hole character 24b, and the punched hole character 24a corresponds to the displayed surface 31.
It is used to mark the displayed part 31a near the bottom of
The punched-out character 24b is used for marking the displayed portion 31b on the upper side.

【0018】[他の実施形態]なお、本発明に係る光ビ
ーム処理方法は前記実施形態に限定するものではなく、
その要旨の範囲内で種々に変更することができる。前記
実施形態は、電子部品の品名及び規格等をマーキングす
る場合を例にして説明したが、医薬品、化粧品、飲料品
等の容器または各種パッケージ類にマーキングする場合
にも利用できる。さらに、フォトリソグラフィ等の露光
工程、あるいは金属表面等の研磨工程等にも利用するこ
とができる。
[Other Embodiments] The light beam processing method according to the present invention is not limited to the above embodiment.
Various modifications can be made within the scope of the gist. The embodiment has been described by taking the case of marking the product name, standard, etc. of the electronic component as an example, but it can also be used in the case of marking containers or various packages such as pharmaceuticals, cosmetics, and beverages. Furthermore, it can also be used in an exposure process such as photolithography, or a polishing process of a metal surface or the like.

【0019】また、マスクに形成した抜き穴は、必ずし
も完全な開口でなくてもよく、レーザ光が透過するもの
であれば透明体が介在されていてもよい。さらに、被照
射面の形状は、前記実施形態の階段状や傾斜状に限るも
のではなく、曲面状等であってもよい。
Further, the hole formed in the mask does not necessarily have to be a complete opening, and a transparent body may be interposed as long as it allows laser light to pass therethrough. Further, the shape of the irradiated surface is not limited to the stepped shape or the inclined shape of the above-described embodiment, and may be a curved surface shape or the like.

【0020】[0020]

【発明の効果】以上の説明で明らかなように、本発明に
よれば、被照射面の形状に対応した形状のマスクを用い
たり、あるいは被照射面の形状に対応させて複数のマス
クを配置したので、鮮明なマーキングや研磨や露光を行
なうことができる位置が被照射面に追随し、光軸方向の
被照射部の位置差を吸収することができる。この結果、
光軸方向の異なる位置にそれぞれ被照射部を有する被照
射面に、1ショットで鮮明なマーキングや研磨や露光を
行なうことができる。
As is apparent from the above description, according to the present invention, a mask having a shape corresponding to the shape of the irradiation surface is used, or a plurality of masks are arranged corresponding to the shape of the irradiation surface. Therefore, the position where clear marking, polishing, and exposure can be performed follows the irradiation surface, and the position difference of the irradiation portion in the optical axis direction can be absorbed. As a result,
It is possible to perform clear marking, polishing, and exposure with one shot on the irradiated surface having the irradiated portions at different positions in the optical axis direction.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る光ビーム処理方法の第1実施形態
を示す斜視図。
FIG. 1 is a perspective view showing a first embodiment of a light beam processing method according to the present invention.

【図2】本発明に係る光ビーム処理方法の第2実施形態
を示す斜視図。
FIG. 2 is a perspective view showing a second embodiment of a light beam processing method according to the present invention.

【図3】本発明に係る光ビーム処理方法の第3実施形態
を示す斜視図。
FIG. 3 is a perspective view showing a third embodiment of the light beam processing method according to the present invention.

【符号の説明】[Explanation of symbols]

1,12,21…レーザマーキング光学系 4,14a,14b,23…マスク 11,31…被表示面 11a,11b,31a,31b…被表示部 C…光軸 L…レーザビーム 1, 12, 21 ... Laser marking optical system 4, 14a, 14b, 23 ... Mask 11, 31 ... Displayed surface 11a, 11b, 31a, 31b ... Displayed portion C ... Optical axis L ... Laser beam

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 光軸方向の異なる位置にそれぞれ被照射
部を有した被照射面に、前記被照射面の形状に対応した
形状のマスクを介して光ビームを照射することを特徴と
する光ビーム処理方法。
1. A light beam irradiating a surface to be irradiated, each of which has an irradiation target portion at a position different in the optical axis direction, through a mask having a shape corresponding to the shape of the irradiation surface. Beam processing method.
【請求項2】 光軸方向の異なる位置にそれぞれ被照射
部を有した被照射面の形状に対応させて複数のマスクを
配置し、光ビームを前記複数のマスクを介して前記被照
射面に照射することを特徴とする光ビーム処理方法。
2. A plurality of masks are arranged at different positions in the optical axis direction so as to correspond to the shape of a surface to be irradiated having respective portions to be irradiated, and a light beam is directed to the surface to be irradiated through the plurality of masks. A light beam processing method characterized by irradiating.
JP8052805A 1996-03-11 1996-03-11 Optical beam treating method Pending JPH09239571A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8052805A JPH09239571A (en) 1996-03-11 1996-03-11 Optical beam treating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8052805A JPH09239571A (en) 1996-03-11 1996-03-11 Optical beam treating method

Publications (1)

Publication Number Publication Date
JPH09239571A true JPH09239571A (en) 1997-09-16

Family

ID=12925068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8052805A Pending JPH09239571A (en) 1996-03-11 1996-03-11 Optical beam treating method

Country Status (1)

Country Link
JP (1) JPH09239571A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010143402A1 (en) * 2009-06-09 2010-12-16 株式会社フジクラ Optical device, laser irradiation device and laser therapy device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010143402A1 (en) * 2009-06-09 2010-12-16 株式会社フジクラ Optical device, laser irradiation device and laser therapy device
JP5184700B2 (en) * 2009-06-09 2013-04-17 株式会社フジクラ Optical apparatus, laser irradiation apparatus, and laser treatment apparatus

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