JPH09235166A - Joint structure of metal member with ceramics member and production thereof - Google Patents

Joint structure of metal member with ceramics member and production thereof

Info

Publication number
JPH09235166A
JPH09235166A JP6744496A JP6744496A JPH09235166A JP H09235166 A JPH09235166 A JP H09235166A JP 6744496 A JP6744496 A JP 6744496A JP 6744496 A JP6744496 A JP 6744496A JP H09235166 A JPH09235166 A JP H09235166A
Authority
JP
Japan
Prior art keywords
metal member
accommodation hole
hole
metal
ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6744496A
Other languages
Japanese (ja)
Other versions
JP3776499B2 (en
Inventor
Tomoyuki Fujii
知之 藤井
Ryusuke Ushigoe
隆介 牛越
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP06744496A priority Critical patent/JP3776499B2/en
Publication of JPH09235166A publication Critical patent/JPH09235166A/en
Application granted granted Critical
Publication of JP3776499B2 publication Critical patent/JP3776499B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a joint structure that is composed of a metal member and ceramics member with no fear of causing cracking and fracture in the ceramics member of the structure when subjected to heat cycles or kept at high temperature by reducing residual stress in the ceramics member at the time when both the members are jointed by fitting at least a part of the metal member into a fitting hole of the ceramics member. SOLUTION: This joint structure is obtained in such a way that at least a part of a metal member 12 is fitted into a fitting hole 6 of ceramics member by providing a 0.2-mm or wider gap 14 between the bottom face 12b of the metal member and the side-wall face 6c of the fitting hole 6, forming a joint section 16, in which the metal member is joined with the ceramic member 1, between the bottom face 12b of the metal member and the bottom face 6b of the fitting hole, and exposing a part of the joint section 16 in the gap 14 so as to cover the bottom face of the fitting hole.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、セラミックス部材と金
属部材との接合構造およびその製造方法に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a joint structure between a ceramic member and a metal member and a method for manufacturing the same.

【0002】[0002]

【従来の技術】窒化アルミニウムは、高熱伝導性、高電
気絶縁性、低熱膨張性、低誘電率特性等の特性を有して
いることから、高出力半導体素子用基板材料といった種
々の用途に使用されている。特に、窒化アルミニウム部
材と金属部材との接合体は、種々の構成のものが様々な
用途に使用されている。例えば、半導体製造装置におい
て用いられるセラミックスヒーター、静電チャックおよ
び高周波電極等においては、窒化アルミニウム部材と種
々のセラミック部材との間、窒化アルミニウム部材と熱
電対セット用の金具との間、窒化アルミニウム部材と電
極との間等を接合する必要がある。
2. Description of the Related Art Aluminum nitride has properties such as high thermal conductivity, high electrical insulation, low thermal expansion, and low dielectric constant, so it is used in various applications such as substrate materials for high power semiconductor devices. Has been done. In particular, the joined body of the aluminum nitride member and the metal member has various configurations and is used for various purposes. For example, in ceramic heaters, electrostatic chucks, high-frequency electrodes, etc. used in semiconductor manufacturing equipment, aluminum nitride members and various ceramic members, aluminum nitride members and thermocouple set fittings, and aluminum nitride members. It is necessary to join between the electrode and the electrode.

【0003】従来、セラミックス部材を金属部材に対し
て接合する方法としては、セラミックス部材と金属部材
との間にろう材を介在させ、ろう材を加熱して溶融させ
ることで、接合させることが知られている。しかし、金
属用のろう材は多数知られているが、セラミックス部
材、特に非酸化物系セラミックスに対しては、いずれの
ろう材も濡れ性が悪い。このため、非酸化物系セラミッ
クス部材を金属部材等に対して接合するためのろう材と
しては、ろう材の濡れ性を改善するために、チタン、ジ
ルコニウム等の活性金属を含有するろう材が使用されて
いる。例えば、「窒化アルミニウムと金属の接合」(中
尾 嘉邦、「軽金属溶接」Vol.31 1993年
No.8 第359頁〜365頁)によれば、窒化アル
ミニウムを銅と接合するためのろう材として、Ag−C
u系合金、Ag−Cu−Ti系合金といった各種の合金
が試験されてきており、これらの合金からなるろう材の
中に、活性金属として、チタン、ジルコニウム、ニオ
ブ、ハフニウム、バナジウムを含有させることが知られ
ている。
Conventionally, as a method of joining a ceramic member to a metal member, a brazing material is interposed between the ceramic member and the metal member, and the brazing material is heated and melted to perform the joining. Has been. However, although many brazing materials for metals are known, all of the brazing materials have poor wettability with respect to ceramic members, particularly non-oxide ceramics. Therefore, as the brazing material for joining the non-oxide ceramic member to the metal member, etc., a brazing material containing an active metal such as titanium or zirconium is used to improve the wettability of the brazing material. Has been done. For example, “Aluminum Nitride-Metal Joining” (Yoshikuni Nakao, “Light Metal Welding”, Vol. 31, 1993).
No. 8 pages 359-365), Ag-C as a brazing material for joining aluminum nitride with copper.
Various alloys such as u-based alloys and Ag-Cu-Ti-based alloys have been tested, and a brazing material made of these alloys should contain titanium, zirconium, niobium, hafnium and vanadium as active metals. It has been known.

【0004】[0004]

【発明が解決しようとする課題】本発明者は、半導体製
造装置において用いられるセラミックスヒーター、静電
チャックおよび高周波電極を製造するのに際して、窒化
アルミニウムや窒化珪素等からなる基体に機械加工によ
って孔を形成し、この孔に内部の金属電極を露出させ、
この孔に円柱状の金具を挿入し、金具の先端面をろう付
けすることを提案した(特願平7−21657号明細
書)。
The present inventor, when manufacturing a ceramics heater, an electrostatic chuck and a high frequency electrode used in a semiconductor manufacturing apparatus, forms a hole in a substrate made of aluminum nitride, silicon nitride or the like by machining. Form, expose the internal metal electrode in this hole,
It has been proposed to insert a cylindrical metal fitting into this hole and braze the tip surface of the metal fitting (Japanese Patent Application No. 7-21657).

【0005】しかし、本発明者が更に検討を進めるのに
つれて、次の問題が生ずることが判明した。即ち、初期
においては所定の接合強度および導電性を確保すること
には成功したが、室温と600℃の間での熱サイクル試
験と600℃での長期間の保持試験を行ったところ、収
容孔の側壁面の周囲に、窒化アルミニウム基体の方にク
ラックが発生し、あるいはこのクラックが進展すること
があった。
However, as the present inventor further studied, it was found that the following problems would occur. That is, although it was successful in ensuring the prescribed bonding strength and conductivity in the initial stage, a thermal cycle test between room temperature and 600 ° C and a long-term holding test at 600 ° C were performed, and it was found that In some cases, a crack was generated around the side wall surface of the aluminum nitride substrate, or the crack propagated.

【0006】本発明の課題は、セラミックス部材の収容
孔に金属部材の少なくとも一部を収容し、金属部材とセ
ラミックス部材とを接合する形態の接合構造において、
セラミックス部材に残留する応力を減少させ、接合体を
高温と低温との間の熱サイクルに供したり、あるいは高
温で長期間保持した場合にも、セラミックス部材の方に
クラックや破損が発生するおそれをなくすることであ
る。
An object of the present invention is to provide a joining structure in which at least a part of a metal member is housed in a housing hole of a ceramic member and the metal member and the ceramic member are joined together.
Even if the stress remaining in the ceramic member is reduced and the joined body is subjected to a thermal cycle between high temperature and low temperature, or if it is held at high temperature for a long time, the ceramic member may be cracked or damaged. It is to lose.

【0007】[0007]

【課題を解決するための手段】本発明に係る接合構造
は、金属部材と、この金属部材の少なくとも一部を収容
する収容孔を備えているセラミックス部材とを接合する
ものであり、金属部材が収容孔内に収容されており、金
属部材の底面側で収容孔の側壁面と金属部材との間に幅
0.2mm以上の間隙部が設けられており、金属部材と
セラミックス部材とを接合する接合層が金属部材の底面
と収容孔の底面との間に形成されており、かつこの接合
層の一部分が収容孔の底面を被覆するように間隙部に露
出していることを特徴とする。
A joining structure according to the present invention joins a metal member and a ceramic member having a housing hole for housing at least a part of the metal member. It is housed in the housing hole, and a gap portion having a width of 0.2 mm or more is provided between the side wall surface of the metal member and the metal member on the bottom surface side of the metal member to join the metal member and the ceramic member. The bonding layer is formed between the bottom surface of the metal member and the bottom surface of the housing hole, and a part of the bonding layer is exposed in the gap so as to cover the bottom surface of the housing hole.

【0008】また、本発明に係る接合構造は、金属部材
と、この金属部材の少なくとも一部を収容する収容孔を
備えているセラミックス部材との接合に際して、金属部
材が収容孔内に収容されており、金属部材が、本体とこ
の本体から収容孔の底面側へと突出している先端部とを
備えており、先端部、本体、収容孔の側壁面および収容
孔の底面によって包囲された間隙部が形成されており、
金属部材とセラミックス部材とを接合する接合層が金属
部材の底面と収容孔の底面との間に形成されており、か
つこの接合層の一部分が収容孔の底面を被覆するように
間隙部に露出していることを特徴とする。
Further, in the joining structure according to the present invention, when the metal member and the ceramic member having the accommodation hole for accommodating at least a part of the metal member are joined, the metal member is accommodated in the accommodation hole. The metal member includes a main body and a tip portion projecting from the main body to the bottom surface side of the accommodation hole, and a gap portion surrounded by the tip portion, the main body, the side wall surface of the accommodation hole, and the bottom surface of the accommodation hole. Is formed,
A joining layer for joining the metal member and the ceramic member is formed between the bottom surface of the metal member and the bottom surface of the accommodation hole, and a part of the joining layer is exposed in the gap so as to cover the bottom surface of the accommodation hole. It is characterized by doing.

【0009】また、本発明は、金属部材と、金属部材の
少なくとも一部を収容する収容孔を備えているセラミッ
クス部材との接合構造を製造するのに際して、金属部材
を収容孔内へと収容し、少なくとも金属部材の底面側で
収容孔の側壁面と金属部材との間に幅0.2mm以上の
間隙部を設け、金属部材と収容孔の底面との間に接合用
材料を介在させ、接合用材料を加熱して金属部材の底面
と収容孔の底面との間に接合層を形成し、接合層の一部
分を底面を被覆するように前記間隙部に露出させること
を特徴とする。
Further, according to the present invention, when manufacturing a joint structure of a metal member and a ceramic member having a housing hole for housing at least a part of the metal member, the metal member is housed in the housing hole. , A gap having a width of 0.2 mm or more is provided between the side wall surface of the housing hole and the metal member at least on the bottom surface side of the metal member, and the bonding material is interposed between the metal member and the bottom surface of the housing hole to bond the metal member. The bonding material is heated to form a bonding layer between the bottom surface of the metal member and the bottom surface of the accommodation hole, and a part of the bonding layer is exposed in the gap so as to cover the bottom surface.

【0010】また、本発明は、金属部材と、金属部材の
少なくとも一部を収容する収容孔を備えているセラミッ
クス部材との接合構造を製造するのに際して、金属部材
が、本体と、本体から収容孔の底面側へと突出してい
る、本体よりも横断面方向の寸法が小さい先端部とを備
えており、金属部材を先端部側から収容孔内へと収容
し、この際先端部と収容孔の底面との間に接合用材料を
介在させ、先端部、本体、収容孔の側壁面および収容孔
の底面によって間隙部を形成し、少なくとも接合用材料
を加熱して金属部材の底面と収容孔の底面との間に接合
層を形成し、この接合層の一部分を底面を被覆するよう
に間隙部に露出させることを特徴とする。
Further, according to the present invention, in manufacturing a joint structure of a metal member and a ceramic member having a housing hole for housing at least a part of the metal member, the metal member is housed in and from the body. The metal member is accommodated from the tip end side into the accommodation hole, and the tip end and the accommodation hole are provided. The joining material is interposed between the bottom surface of the metal member and the bottom surface of the metal member, and a gap is formed by the tip portion, the main body, the side wall surface of the housing hole, and the bottom surface of the housing hole. It is characterized in that a bonding layer is formed between the bonding layer and the bottom surface of the above, and a part of this bonding layer is exposed in the gap so as to cover the bottom surface.

【0011】以下、図1〜図4を参照しつつ、本発明の
課題解決手段について詳細に説明する。
Hereinafter, the means for solving the problems of the present invention will be described in detail with reference to FIGS.

【0012】本発明者は、まず、図1(a)に示すよう
な形態のセラミックス部材1に対して金属部材2を接合
する実験を行った。ここで、セラミックス部材1中に
は、後述するような網状電極5が埋設され、一体焼結さ
れている。部材1の背面20側に円形の凹部1cを形成
し、凹部1cの内側に、横断面が略円形の収容孔6を形
成する。本例では、円柱形状の金属部材2を収容孔6内
に収容するのに先立って、収容孔6の底面6bおよび側
壁面6cの底面側部分を覆うように金属箔4を形成し
た。従って金属箔4は、底面6bを覆う水平部分4a
と、側壁面6cの底面側を覆う垂直部分4bとを含む。
The inventor of the present invention first carried out an experiment for joining a metal member 2 to a ceramic member 1 having a form as shown in FIG. 1 (a). Here, a mesh electrode 5 as described later is embedded in the ceramic member 1 and is integrally sintered. A circular recess 1c is formed on the rear surface 20 side of the member 1, and an accommodation hole 6 having a substantially circular cross section is formed inside the recess 1c. In this example, prior to housing the cylindrical metal member 2 in the housing hole 6, the metal foil 4 was formed so as to cover the bottom surface 6b of the housing hole 6 and the bottom surface side portion of the side wall surface 6c. Therefore, the metal foil 4 has a horizontal portion 4a that covers the bottom surface 6b.
And a vertical portion 4b that covers the bottom surface side of the side wall surface 6c.

【0013】金属部材2の底面2bと収容孔の底面6b
とを対向させ、これらの間に平板形状のろう材7を介在
させた。金属部材2の側壁面2aと収容孔6の側壁面6
cとの間の間隙の大きさtを、できるだけ少なくするこ
とによって、金属部材2に対して加わる曲げ応力を緩和
する構造を採用した。
The bottom surface 2b of the metal member 2 and the bottom surface 6b of the receiving hole.
And were opposed to each other, and a flat plate-shaped brazing material 7 was interposed therebetween. The side wall surface 2a of the metal member 2 and the side wall surface 6 of the housing hole 6
By adopting a structure in which the bending stress applied to the metal member 2 is relieved by reducing the size t of the gap between the metal member c and c as much as possible.

【0014】この状態でろう付けを行うことによって、
図1(b)に示すように、金属部材2とセラミックス部
材1とを接合層8によって接合することに成功した。し
かし、接合後に熱サイクル試験や高温での保持試験を行
うと、ほぼ30で示すようなクラックが発生することが
あった。この接合構造のうち金属部材2の角部付近を拡
大して図2に示す。
By brazing in this state,
As shown in FIG. 1B, the metal member 2 and the ceramic member 1 were successfully joined by the joining layer 8. However, when a thermal cycle test or a high temperature holding test is performed after joining, cracks as indicated by 30 may occur. FIG. 2 is an enlarged view of the vicinity of the corner of the metal member 2 in this joint structure.

【0015】本発明者はこの理由について検討したが、
この過程で、ろう材の一部分が金属部材2と収容孔の側
壁面6cとの僅かな隙間を上昇することに着目した。即
ち、ろう付け時には、ろう材7に流動性が生ずるため
に、金属部材2に加えられる若干の荷重や金属部材2の
自重によって、ろう材が流動して収容孔の周縁部分へと
向かう。この際、金属部材2と収容孔の側壁面との間の
クリアランスは可能な限り小さくされており、通常は
0.05mm以下である。このため、ろう材がクリアラ
ンスを高い位置まで上昇する。即ち、接合層8のうち8
aは金属部材の底面2bと収容孔の底面6bとの間に形
成されるが、8bは金属部材の側壁面2aと収容孔の側
壁面6cとの間に形成される。
The present inventor has examined the reason for this,
In this process, it was noted that a part of the brazing material rises a slight gap between the metal member 2 and the side wall surface 6c of the accommodation hole. That is, during brazing, the brazing filler metal 7 has fluidity, so that the brazing filler metal flows toward the peripheral portion of the accommodation hole due to a slight load applied to the metal member 2 and the own weight of the metal member 2. At this time, the clearance between the metal member 2 and the side wall surface of the accommodation hole is made as small as possible, and is usually 0.05 mm or less. For this reason, the brazing material rises up to a position where the clearance is high. That is, 8 of the bonding layers 8
Although a is formed between the bottom surface 2b of the metal member and the bottom surface 6b of the accommodation hole, 8b is formed between the side wall surface 2a of the metal member and the side wall surface 6c of the accommodation hole.

【0016】しかし、ろう付け材直後の冷却時には、ろ
う材とセラミックス部材1との熱膨張差に由来する引っ
張り応力が、細長い接合層8bの長さ方向へと向かっ
て、セラミックス部材内に働く。しかも、この接合層8
bは金属部材2によっても強く拘束されているので、ろ
う材とセラミックス部材との熱膨張差による応力を逃が
すことができない。このためにセラミックス部材に残留
応力があり、これによって熱サイクル時または高温保持
時にセラミックス部材内にクラック30が発生し、また
は既に存在するクラック30が進展するものと考えられ
る。
However, at the time of cooling immediately after the brazing material, the tensile stress resulting from the difference in thermal expansion between the brazing material and the ceramic member 1 acts in the ceramic member in the lengthwise direction of the elongated bonding layer 8b. Moreover, this bonding layer 8
Since b is also strongly restrained by the metal member 2, the stress due to the difference in thermal expansion between the brazing material and the ceramic member cannot be released. Therefore, it is considered that there is residual stress in the ceramic member, which causes cracks 30 to occur in the ceramic member during thermal cycling or high temperature holding, or cracks that already exist are propagated.

【0017】なお、図2においては、金属部2の角部材
に面取り部材2cが形成されており、また収容孔6の角
部6aには加工上の都合からアール6aが生成してい
る。また、11は、接合層6cの最上部を示す。
In FIG. 2, a chamfering member 2c is formed on the corner member of the metal portion 2, and a radius 6a is formed on the corner portion 6a of the accommodation hole 6 for convenience of processing. Further, 11 indicates the uppermost part of the bonding layer 6c.

【0018】本発明者は、この接合構造を更に検討し、
典型的には図3(a)、(b)および図4に示すような
形態の接合構造を想到した。即ち、金属部材12の本体
12fは略円形とするが、本体12fの先端側に、収容
孔の幅方向に見た寸法が小さい、即ち直径が小さい先端
部12dを形成する。即ち、先端部12dの横の方には
リング状の凹部12cを形成する。
The present inventor further examined this joint structure,
Typically, a joint structure having a configuration as shown in FIGS. 3 (a), 3 (b) and FIG. 4 has been conceived. That is, although the main body 12f of the metal member 12 has a substantially circular shape, the front end side of the main body 12f is formed with a front end portion 12d having a small size when viewed in the width direction of the accommodation hole, that is, a small diameter. That is, a ring-shaped recess 12c is formed on the side of the tip 12d.

【0019】収容孔6の底面6b上を被覆するように金
属箔33を形成する。この際金属箔33の両端は、収容
孔のアール6aまでは被覆するが、収容孔6の側壁面6
cまでは形成されないようにする。金属箔33上に円盤
形状のろう材13を配置する。
A metal foil 33 is formed so as to cover the bottom surface 6b of the accommodation hole 6. At this time, both ends of the metal foil 33 are covered up to the radius 6a of the accommodation hole, but the side wall surface 6 of the accommodation hole 6 is covered.
Do not form up to c. The disc-shaped brazing material 13 is arranged on the metal foil 33.

【0020】金属部材12を収容孔6内に収容し、先端
部12dの底面12bをろう材13に対して対向させ
る。この状態でろう付けを行うことによって、図3
(b)に示すように、金属部材の底面12bと収容孔の
底面6bとの間に接合層16を形成する。金属部材の本
体12fの側壁面12aと収容孔の側壁面6cとの間の
隙間15の大きさtは、金属部材12が挿入可能な範囲
で可能な限り小さくする。
The metal member 12 is housed in the housing hole 6, and the bottom surface 12b of the tip portion 12d is opposed to the brazing material 13. By brazing in this state,
As shown in (b), the bonding layer 16 is formed between the bottom surface 12b of the metal member and the bottom surface 6b of the accommodation hole. The size t of the gap 15 between the side wall surface 12a of the main body 12f of the metal member and the side wall surface 6c of the accommodation hole is made as small as possible within a range in which the metal member 12 can be inserted.

【0021】図3の接合構造の主要部を、図4に拡大し
て示す。本体12f、先端部12d、収容孔の底面6b
および側壁面6cによって、間隙部14が生ずる。金属
部材の底面12bと収容孔の底面6bとの間に接合層1
6aが形成されるが、このろう材の一部は、流動の結
果、金属部材の底面12bから間隙部14の方へと向か
って流れる。このとき、間隙部14には収容孔の底面6
bの周縁部分とアール6aと側壁面6cとが露出してい
るので、ろう材は、この順序で、収容孔への露出面を濡
らすように流れる。
FIG. 4 is an enlarged view of the main part of the joining structure shown in FIG. Main body 12f, tip 12d, bottom surface 6b of accommodation hole
And the side wall surface 6c forms the gap portion 14. The bonding layer 1 is provided between the bottom surface 12b of the metal member and the bottom surface 6b of the accommodation hole.
6a is formed, but as a result of the flow, a part of the brazing material flows from the bottom surface 12b of the metal member toward the gap portion 14. At this time, the bottom surface 6 of the accommodation hole is in the gap portion 14.
Since the peripheral portion of b, the radius 6a, and the side wall surface 6c are exposed, the brazing material flows in this order so as to wet the surface exposed to the accommodation hole.

【0022】この際、ろう材は先端部12dの側壁面1
2eに対して濡れ易いので、側壁面12eに沿って若干
上昇する。この結果、金属部材の側壁面12eに沿って
延びる第一の隆起部分16bが生成する。また、金属箔
33を収容孔の底面6bの全体にわたって、アール6a
をも含んで被覆するように形成することによって、底面
6bがその周縁部を含んでろう材によって濡れやすくな
り、この結果側壁面6cに沿ってろう材が濡れる。従っ
て側壁面に沿って少し上昇したろう材によって隆起部分
16dが形成され、隆起部分16bと16dとの間に陥
没部分16cが形成される。
At this time, the brazing material is the side wall surface 1 of the tip portion 12d.
Since it easily gets wet with respect to 2e, it slightly rises along the side wall surface 12e. As a result, the first raised portion 16b extending along the side wall surface 12e of the metal member is generated. In addition, the metal foil 33 is provided on the entire bottom surface 6b of the accommodating hole with a radius 6a.
By including so as to cover the bottom surface 6b as well, the bottom surface 6b is easily wetted by the brazing material including its peripheral portion, and as a result, the brazing material is wetted along the side wall surface 6c. Therefore, the raised portion 16d is formed by the brazing material slightly raised along the side wall surface, and the depressed portion 16c is formed between the raised portions 16b and 16d.

【0023】こうした構造を有する接合体は、図1、図
2の接合構造と同じ材質を使用した場合であっても、熱
サイクル等に対する耐久性が極めて高く、セラミックス
部材1の内部にクラックが発生しないことが判明した。
この理由は、図1(b)、図2に示す構造とは異なり、
間隙部14内に露出する接合層は、こうしたセラミック
ス部材と金属部材との間に強固に拘束された細長い形態
とはならず、接合層の表面が間隙部14内に露出するた
めと考えられる。このため、ろう材とセラミックス部材
との間の熱膨張差が生じても、これはろう材の流動や変
形によって吸収される。
The bonded body having such a structure has extremely high durability against heat cycles and the like even when the same material as the bonded structure of FIGS. 1 and 2 is used, and cracks are generated inside the ceramic member 1. It turned out not to.
The reason for this is that, unlike the structure shown in FIGS.
It is considered that the bonding layer exposed in the gap portion 14 does not have a long and narrow shape tightly constrained between the ceramic member and the metal member, and the surface of the bonding layer is exposed in the gap portion 14. Therefore, even if a difference in thermal expansion occurs between the brazing material and the ceramic member, this is absorbed by the flow and deformation of the brazing material.

【0024】しかも、第一の隆起部分と第二の隆起部分
との間に陥没部分を有するような形態の接合層を採用す
ることによって、金属部材12に図4において水平方向
に向かって応力が加わった場合に、隆起部分16bおよ
び16dによってこの応力が受けられるので、この方向
の応力に対する接合強度が一層向上する。しかも、これ
らの隆起部分16bと16dとの間には陥没部分16c
を設け、この部分における接合層を厚さを小さくするこ
とによって、接合層からセラミックス部材加わる残留応
力も小さくできる。
Moreover, by adopting a bonding layer having a depressed portion between the first raised portion and the second raised portion, stress is applied to the metal member 12 in the horizontal direction in FIG. When applied, this stress is received by the raised portions 16b and 16d, so that the joint strength against the stress in this direction is further improved. Moreover, the depressed portion 16c is provided between the raised portions 16b and 16d.
By making the bonding layer in this portion thinner, the residual stress applied to the ceramic member from the bonding layer can be reduced.

【0025】本発明の作用効果を良好に奏するために
は、金属部材の側壁面と収容孔の側壁面との距離uは
0.2mm以上とする必要があった。本発明の前記作用
効果を一層向上させるためには、これを0.5mm以上
とすることが好ましい。一方、前記距離が大きくなりす
ぎると、接合層が収容孔の側壁面6cまで到達しにくく
なり、この結果、金属部材に対して収容孔の幅方向に向
かって応力が加わったときに金属部材が剥離し易くな
る。このため、前記距離は10mm以下とすることが好
ましい。
In order to obtain the advantageous effects of the present invention, the distance u between the side wall surface of the metal member and the side wall surface of the receiving hole must be 0.2 mm or more. In order to further improve the action and effect of the present invention, it is preferable to set this to 0.5 mm or more. On the other hand, when the distance is too large, the bonding layer is hard to reach the side wall surface 6c of the accommodation hole, and as a result, when the metal member is stressed in the width direction of the accommodation hole, Easy to peel off. Therefore, the distance is preferably 10 mm or less.

【0026】この際、金属部材の側壁面と収容孔の側壁
面との間は、接合部分から収容孔の出口までの全体にわ
たって一定値にすることも可能であり、この接合構造に
よっても前記の作用効果は達成することができる(この
場合には、金属部材の横断面方向の寸法が一定であるの
で、寸法の小さい先端部および間隙部14は生成しな
い)。しかし、この場合には収容孔の側壁面と金属部材
の側壁面との間の隙間が大きいことから、金属部材に対
して収容孔の幅方向に向かって応力が加わったときに金
属部材が剥離し易くなる。
At this time, a constant value can be set between the side wall surface of the metal member and the side wall surface of the accommodating hole over the entire area from the joint portion to the outlet of the accommodating hole. The effect can be achieved (in this case, since the dimension of the metal member in the cross-sectional direction is constant, the tip and the gap portion 14 having a small dimension are not generated). However, in this case, since the gap between the side wall surface of the accommodation hole and the side wall surface of the metal member is large, the metal member peels off when stress is applied to the metal member in the width direction of the accommodation hole. Easier to do.

【0027】このため、前記の間隙部を設ける方が好ま
しい。この際、金属部材12の側壁面12aと収容孔6
の側壁面6cとの距離tを0.1mm以下とすることに
よって、金属部材に対して収容孔の幅方向に向かって応
力が加わったときに、この応力を大きく緩和することが
できる。ただし、tが小さすぎる場合には、収容孔中に
金属部材を挿入する工程の実施が難しくなってくるの
で、tは0.02mm以上とすることが好ましい。
Therefore, it is preferable to provide the above-mentioned gap portion. At this time, the side wall surface 12a of the metal member 12 and the housing hole 6
By setting the distance t from the side wall surface 6c to 0.1 mm or less, when a stress is applied to the metal member in the width direction of the accommodation hole, this stress can be greatly relieved. However, if t is too small, it becomes difficult to perform the step of inserting the metal member into the accommodation hole. Therefore, t is preferably 0.02 mm or more.

【0028】収容孔6の深さ方向に見た間隙部14の寸
法sは、特に制限はないが、0.5〜5mmとすること
が好ましい。
The dimension s of the gap portion 14 viewed in the depth direction of the accommodation hole 6 is not particularly limited, but is preferably 0.5 to 5 mm.

【0029】本発明においては、セラミックス部材の収
容孔の底面に、セラミックス部材の内部の金属部材の一
部分を露出させて金属露出部を部分的に形成し、セラミ
ックス部材とろう材とを接合させるのと共に、セラミッ
クスの間から露出している金属露出部をも、ろう材と接
合させることができる。これによって、セラミックス部
材と金属部材との接合強度を、一層向上させることがで
きる。こうした特異な接合構造を採用すれば、たとえセ
ラミックス部材がろう材によって濡れにくいような場合
でも、強固な接合力を得ることができる。
In the present invention, the metal member inside the ceramic member is partially exposed by exposing a part of the metal member inside the ceramic member to join the ceramic member and the brazing material. At the same time, the metal exposed portion exposed between the ceramics can be joined to the brazing material. Thereby, the joining strength between the ceramic member and the metal member can be further improved. By adopting such a unique joining structure, a strong joining force can be obtained even if the ceramic member is hard to be wetted by the brazing material.

【0030】ここで、図3(b)および図4において
は、収容孔6の底面6bに、セラミックス部材の内部の
金属5の一部分が露出し、金属露出部5Aを部分的に形
成している。セラミックス部材1と接合層16aとを接
合させるのと共に(接合部分9)、金属露出部5Aをも
接合層16aと接合させることができる(接合部分1
0)。
Here, in FIGS. 3B and 4, a part of the metal 5 inside the ceramic member is exposed on the bottom surface 6b of the accommodation hole 6 to partially form the metal exposed portion 5A. . The ceramic member 1 and the bonding layer 16a can be bonded (bonding portion 9), and the metal exposed portion 5A can also be bonded to the bonding layer 16a (bonding portion 1).
0).

【0031】本発明において、セラミックス部材の材質
は限定されないが、窒化アルミニウム、窒化珪素、炭化
珪素、サイアロン等の非酸化物系セラミックス、更には
窒化物系セラミックスに対して特に好適である。また、
金属部材の材質も特に限定されないが、ニッケル、モリ
ブデン、タングステン、白金、ロジウムおよびこれらの
合金のような、高融点金属が特に好適である。
In the present invention, the material of the ceramic member is not limited, but it is particularly suitable for non-oxide ceramics such as aluminum nitride, silicon nitride, silicon carbide and sialon, and further for nitride ceramics. Also,
The material of the metal member is not particularly limited, but refractory metals such as nickel, molybdenum, tungsten, platinum, rhodium and alloys thereof are particularly suitable.

【0032】ろう材の化学組成は特に限定されない。し
かし、セラミックス部材そのものに対して、良好な接合
力ないし濡れ易さを有するろう材が好ましい。特に、ハ
ロゲン系腐食性ガスに対してさらされる用途の接合体に
おいては、セラミックス部材として、緻密質アルミナ部
材または窒化アルミニウム部材を使用することが好まし
いが、この場合には、主成分がCu、Ni、Agおよび
Alからなる群より選ばれた一種以上の金属からなり、
Mg、Ti、Zr、Hfおよびベリリウムからなる群よ
り選ばれた一種以上の活性金属を0.3〜10重量%
(好ましくは5重量%以下)含有しているろう材が好ま
しいが、活性金属は必須ではない。
The chemical composition of the brazing material is not particularly limited. However, it is preferable to use a brazing material that has good bonding strength or wettability with respect to the ceramic member itself. Particularly, in a joined body for use in exposure to a halogen-based corrosive gas, it is preferable to use a dense alumina member or an aluminum nitride member as the ceramic member. In this case, the main components are Cu and Ni. , One or more metals selected from the group consisting of Ag, Al, and
0.3-10 wt% of one or more active metals selected from the group consisting of Mg, Ti, Zr, Hf and beryllium
A brazing material containing (preferably 5% by weight or less) is preferable, but an active metal is not essential.

【0033】主成分の含有割合は、ろう材の全重量を1
00重量%とした場合に、活性成分および活性成分以外
の添加成分の含有割合を100重量%から差し引いた残
部である。しかし、主成分は、50重量%以上含有され
ている必要があり、その上限は99.5重量%である。
特に、主成分がAlからなるろう材を用いると、低温で
接合するため、接合後の熱応力が小さくなる。また、活
性金属からなる箔を用いる場合は、ろう材として純金属
を用いることができる。
The content ratio of the main component is 1 based on the total weight of the brazing material.
When the amount is set to 00% by weight, it is the balance obtained by subtracting the content ratio of the active ingredient and the additive components other than the active ingredient from 100% by weight. However, the main component must be contained in an amount of 50% by weight or more, and the upper limit is 99.5% by weight.
In particular, when a brazing filler metal whose main component is Al is used, since the joining is performed at a low temperature, the thermal stress after joining becomes small. When a foil made of an active metal is used, a pure metal can be used as the brazing material.

【0034】活性金属の配合量が0.3重量%未満であ
ると、濡れ性が悪くなり、接合しない場合がある。50
重量%を超えると、接合界面の反応層が厚くなり、クラ
ックが発生する場合がある。
If the amount of the active metal compounded is less than 0.3% by weight, the wettability may be deteriorated and the bonding may not be achieved. 50
If it exceeds 5% by weight, the reaction layer at the bonding interface becomes thick and cracks may occur.

【0035】活性金属以外の添加成分としては、Si、
Al、CuおよびInのうちの少なくとも1種を用いる
ことが、主成分に影響を与えない点から好ましい。
As additive components other than the active metal, Si,
It is preferable to use at least one of Al, Cu and In because it does not affect the main component.

【0036】また、活性金属以外の添加成分の合計の配
合量は、50wt%を超えると、金属間化合物が多くな
り、接合界面にクラックが発生する場合があるため、5
0wt%以下であると好ましい。この添加成分は含有さ
れていなくとも良い。
Further, if the total compounding amount of the additive components other than the active metal exceeds 50 wt%, intermetallic compounds increase and cracks may occur at the joint interface, so that 5
It is preferably 0 wt% or less. This additive component may not be contained.

【0037】マグネシウムを1〜2重量%含有してお
り、かつ珪素を9〜12重量%含有しているアルミニウ
ム合金ろうが、濡れ性の向上の観点から最も好ましい。
An aluminum alloy braze containing 1 to 2% by weight of magnesium and 9 to 12% by weight of silicon is most preferable from the viewpoint of improving wettability.

【0038】また、接合にあたり、収容孔の底面に、ま
たは収容孔の底面に対向しているろう材の表面に、銅、
アルミニウムおよびニッケルからなる群より選ばれた一
種以上の金属からなる膜を、スパッタ、蒸着、摩擦圧
接、メッキおよび金属箔の挿入等の方法により設けるこ
とが、より好ましい。これらの膜は、ろう材とのぬれ性
を良くする効果がある。また、接合にあたり、収容孔の
底面に、または収容孔の底面に対向しているろう材の表
面に、マグネシウム、チタン、ジルコニウムおよびハフ
ニウムからなる群より選ばれた一種以上の金属からなる
膜を、スパッタ、蒸着、摩擦圧接、メッキおよび金属箔
の挿入等の方法により設けることがより好ましい。これ
らの膜によって、ろう材との反応が良くなる効果があ
る。これらの各金属膜の膜厚は、0.5〜5μmとする
ことが好ましい。
Further, upon joining, copper, on the bottom surface of the receiving hole or on the surface of the brazing material facing the bottom surface of the receiving hole,
It is more preferable to provide a film made of one or more metals selected from the group consisting of aluminum and nickel by a method such as sputtering, vapor deposition, friction welding, plating and insertion of a metal foil. These films have the effect of improving the wettability with the brazing material. Further, in joining, on the bottom surface of the housing hole, or on the surface of the brazing material facing the bottom surface of the housing hole, a film made of one or more metals selected from the group consisting of magnesium, titanium, zirconium and hafnium, It is more preferable to provide it by a method such as sputtering, vapor deposition, friction welding, plating and insertion of a metal foil. These films have the effect of improving the reaction with the brazing material. The thickness of each of these metal films is preferably 0.5 to 5 μm.

【0039】セラミックス部材の内部に電極を埋設する
形態においては、セラミックス部材中に抵抗発熱体を埋
設したセラミックスヒーター、セラミックス部材中に静
電チャック用電極を埋設したセラミックス静電チャッ
ク、セラミックス部材中に抵抗発熱体と静電チャック用
電極とを埋設した静電チャック付きヒーター、セラミッ
クス部材中にプラズマ発生用電極を埋設した高周波発生
用電極装置のような能動型装置を例示することができ
る。
In the embodiment in which the electrodes are embedded inside the ceramic member, a ceramic heater in which a resistance heating element is embedded in the ceramic member, a ceramic electrostatic chuck in which electrodes for electrostatic chuck are embedded in the ceramic member, and a ceramic member are embedded in the ceramic member. An active device such as a heater with an electrostatic chuck in which a resistance heating element and an electrode for electrostatic chuck are embedded, and an electrode device for high frequency generation in which a plasma generating electrode is embedded in a ceramic member can be exemplified.

【0040】更に、ダミーウエハー、シャドーリング、
高周波プラズマを発生させるためのチューブ、高周波プ
ラズマを発生させるためのドーム、高周波透過窓、赤外
線透過窓、半導体ウエハーを支持するためのリフトピ
ン、シャワー板等の装置を例示できる。
Furthermore, a dummy wafer, a shadow ring,
Examples of the device include a tube for generating high frequency plasma, a dome for generating high frequency plasma, a high frequency transmission window, an infrared transmission window, a lift pin for supporting a semiconductor wafer, and a shower plate.

【0041】[0041]

【実施例】図5は、本発明を静電チャックに対して適用
した実施例を示す断面図である。21は、円盤形状のセ
ラミックス部材からなる静電チャック本体である。この
ような、高周波電極を有する静電チャックは、ハロゲン
系腐食性ガス雰囲気下で使用されることが多く、このよ
うな腐食性雰囲気下では、窒化アルミニウムまたは緻密
質のアルミナが耐食性があることがわかっているため、
セラミックス部材は窒化アルミニウムまたは緻密質アル
ミナで形成することが好ましい。
EXAMPLE FIG. 5 is a sectional view showing an example in which the present invention is applied to an electrostatic chuck. Reference numeral 21 is an electrostatic chuck body made of a disk-shaped ceramic member. Such an electrostatic chuck having a high-frequency electrode is often used in a halogen-based corrosive gas atmosphere, and in such a corrosive atmosphere, aluminum nitride or dense alumina may have corrosion resistance. Because I know
The ceramic member is preferably made of aluminum nitride or dense alumina.

【0042】22は、電極接合部である。本体1の内部
の背面21b側の近傍には、網状電極ないしメッシュ3
1が埋設されている。このメッシュ31は、抵抗発熱体
や静電チャック用電極として使用できるものである。静
電チャック本体1には収容孔26が形成されており、収
容孔26が背面21bに開口している。21は半導体ウ
エハー設置面である。
Reference numeral 22 is an electrode joint portion. In the vicinity of the rear surface 21b inside the main body 1, a mesh electrode or mesh 3 is formed.
1 is buried. The mesh 31 can be used as a resistance heating element or an electrostatic chuck electrode. A housing hole 26 is formed in the electrostatic chuck body 1, and the housing hole 26 is open on the back surface 21b. Reference numeral 21 is a semiconductor wafer installation surface.

【0043】収容孔26の底面26aに、メッシュ31
の一部分が露出しており、金属露出部を形成している。
ニッケル等の耐蝕性金属からなる端子24の先端側に、
端子24の他の部分よりも直径が大きな円柱形状の金属
部材25が形成されている。金属部材25の本体25f
は略円形とするが、本体の先端側に、収容孔の幅方向に
見た直径が小さい先端部25dを形成する。先端部25
dの横の方にはリング状の凹部25cを形成する。
A mesh 31 is formed on the bottom surface 26a of the accommodation hole 26.
Is partially exposed to form an exposed metal part.
On the tip side of the terminal 24 made of corrosion resistant metal such as nickel,
A cylindrical metal member 25 having a larger diameter than the other portions of the terminal 24 is formed. Main body 25f of the metal member 25
Has a substantially circular shape, but a front end portion 25d having a small diameter when viewed in the width direction of the accommodation hole is formed on the front end side of the main body. Tip 25
A ring-shaped recess 25c is formed on the side of d.

【0044】収容孔の底面26aを被覆するように金属
箔33を形成する。金属箔33上に円盤形状のろう材1
3を配置する。
The metal foil 33 is formed so as to cover the bottom surface 26a of the accommodation hole. Disc-shaped brazing material 1 on the metal foil 33
Place 3.

【0045】金属部材25を収容孔26内に収容し、先
端部25dの底面25bをろう材13に対して対向させ
る。この状態でろう付けを行う。本体25f、先端部2
5d、収容孔の底面26aおよび収容孔の側壁面26b
によって、間隙部14が生ずる。なお、図面中、25a
は金属部材25の側壁面である。
The metal member 25 is housed in the housing hole 26, and the bottom surface 25b of the tip portion 25d is opposed to the brazing material 13. Brazing is performed in this state. Main body 25f, tip 2
5d, bottom surface 26a of the accommodation hole and side wall surface 26b of the accommodation hole
As a result, the gap portion 14 is generated. In the drawing, 25a
Is a side wall surface of the metal member 25.

【0046】また、23は、熱電対の接合部である。静
電チャック本体1には、収容孔26よりも若干小さい深
さを有する収容孔30が形成されており、収容孔30が
背面21bに開口している。
Reference numeral 23 is a thermocouple junction. A storage hole 30 having a depth slightly smaller than the storage hole 26 is formed in the electrostatic chuck body 1, and the storage hole 30 is open to the back surface 21b.

【0047】熱電対を形成する一対の電極28の先端部
28aの周囲には、熱電対保護用のニッケル製のキャッ
プ29(金属部材の一例)が設けられており、キャップ
29の雌ねじ29eに対して電極28の雄ねじ28aを
はめ込む。キャップ29の外径は、収容孔30の内径よ
り若干小さくなるように設計されている。キャップ29
の先端側に、キャップ29の収容孔の幅方向に見た直径
が小さい先端部29dを形成する。先端部29dの横の
方にはリング状の凹部29cを形成する。
A nickel cap 29 (an example of a metal member) for protecting the thermocouple is provided around the tips 28a of the pair of electrodes 28 forming the thermocouple. The male screw 28a of the electrode 28 is fitted. The outer diameter of the cap 29 is designed to be slightly smaller than the inner diameter of the accommodation hole 30. Cap 29
A tip portion 29d having a small diameter when viewed in the width direction of the accommodation hole of the cap 29 is formed on the tip side of the. A ring-shaped recess 29c is formed on the side of the tip portion 29d.

【0048】収容孔の底面30aを被覆するように金属
箔33を形成する。金属箔33上に円盤形状のろう材1
3を配置する。
A metal foil 33 is formed so as to cover the bottom surface 30a of the accommodation hole. Disc-shaped brazing material 1 on the metal foil 33
Place 3.

【0049】キャップ29を収容孔30内に収容し、先
端部29dの底面29bをろう材13に対して対向させ
る。この状態でろう付けを行う。本体29f、先端部2
9d、収容孔の底面30aおよび収容孔の側壁面30b
によって、間隙部14が生ずる。なお、図面中、29a
はキャップ29の側壁面である。
The cap 29 is housed in the housing hole 30, and the bottom surface 29b of the tip portion 29d is opposed to the brazing material 13. Brazing is performed in this state. Main body 29f, tip 2
9d, bottom surface 30a of accommodation hole and side wall surface 30b of accommodation hole
As a result, the gap portion 14 is generated. In the drawing, 29a
Is a side wall surface of the cap 29.

【0050】特に、22においては、金属露出部として
網状構造を採用しているために、接合層には、平面的に
見て、セラミックスと接触する部分と金属露出部と接触
する部分とが交互に形成されているために、より一層強
固な接合が達成される。
Particularly, in No. 22, since the net-like structure is adopted as the metal exposed portion, the bonding layer has a portion contacting with the ceramics and a portion contacting with the metal exposed portion alternately in plan view. Since it is formed in the above, even stronger joint is achieved.

【0051】以下、更に具体的な実験結果について述べ
る。 (本発明例1)図3および図4を参照しつつ説明した手
順に従って、接合体を製造した。ただし、セラミックス
部材としては、モリブデン製のメッシュが埋設された相
対密度99%以上の窒化アルミニウム基体を使用した。
窒化アルミニウム基体の背面側に直径5mm(図3にお
けるm)、深さ8mmの収容孔6を設け、メッシュ5を
収容孔の底面に露出させた。収容孔のアール6aの曲率
半径Rは0.5mmとした。
Hereinafter, more specific experimental results will be described. (Invention Example 1) A joined body was manufactured according to the procedure described with reference to FIGS. 3 and 4. However, as the ceramic member, an aluminum nitride substrate having a relative density of 99% or more, in which a molybdenum mesh was embedded, was used.
An accommodation hole 6 having a diameter of 5 mm (m in FIG. 3) and a depth of 8 mm was provided on the back side of the aluminum nitride substrate, and the mesh 5 was exposed on the bottom surface of the accommodation hole. The radius of curvature R of the radius 6a of the accommodation hole is 0.5 mm.

【0052】直径5mmのチタン箔(厚さ5μm)33
と、直径(図3におけるr)4.5mm、厚さ200μ
mの銀板13とを使用した。長さ5mmの端子(金属部
材の一例)12を収容孔内に挿入した。端子12の中心
には、接合後にトルク試験を実施できるように、M3の
ネジ穴が深さ2mmに加工されている。ただし、図3に
おいて、uを0.5mmとし、sを2mmとし、tを
0.05mmとし、qを4.0mmとした。端子12の
中心部分には、直径3mm、深さ3mmの雌ねじを設け
た。端子12に50gの荷重を加えつつ、真空中で97
0℃で熱処理を行い、ろう付けを行った。
Titanium foil with a diameter of 5 mm (thickness 5 μm) 33
And diameter (r in FIG. 3) 4.5 mm, thickness 200 μ
m silver plate 13 was used. A terminal (an example of a metal member) 12 having a length of 5 mm was inserted into the accommodation hole. In the center of the terminal 12, a screw hole of M3 is machined to a depth of 2 mm so that a torque test can be performed after joining. However, in FIG. 3, u was 0.5 mm, s was 2 mm, t was 0.05 mm, and q was 4.0 mm. A female screw having a diameter of 3 mm and a depth of 3 mm was provided in the central portion of the terminal 12. While applying a load of 50g to the terminal 12, 97 in vacuum
It heat-processed at 0 degreeC and brazed.

【0053】この結果、図4に示すような接合構造が形
成された。ここで、隆起部分16bおよび16dの底面
6bからの高さは0.5mmであり、窒化アルミニウム
中にクラックは観察されなかった。
As a result, a junction structure as shown in FIG. 4 was formed. Here, the height of the raised portions 16b and 16d from the bottom surface 6b was 0.5 mm, and no crack was observed in the aluminum nitride.

【0054】この接合体を2個使用し、それぞれについ
て真空中で熱サイクル試験を実施した。接合体を室温か
ら600℃まで加熱し、600℃で10分間保持し、室
温に下げるのを1サイクルとし、これを10サイクル実
施した。そして、この接合体に6kg/cmのトルクを
負荷し、次いで接合部分の断面を光学顕微鏡で観察した
が、接合部分に破断やクラックは生じなかった。
Two of these bonded bodies were used, and a thermal cycle test was carried out in vacuum for each of them. The bonded body was heated from room temperature to 600 ° C., held at 600 ° C. for 10 minutes, and lowered to room temperature as one cycle, and this was carried out for 10 cycles. Then, a torque of 6 kg / cm was applied to this bonded body, and the cross section of the bonded portion was then observed with an optical microscope. No fracture or crack occurred in the bonded portion.

【0055】また、この接合体を2個使用し、それぞれ
について真空中で高温保持試験をを実施した。接合体を
室温から600℃まで加熱し、600℃で50時間保持
し、室温に下げた。そして、この接合体に6kg/cm
のトルクを負荷し、次いで接合部分の断面を光学顕微鏡
で観察したが、接合部分に破断やクラックは生じなかっ
た。
Further, two of these bonded bodies were used, and a high temperature holding test was carried out in vacuum for each of them. The bonded body was heated from room temperature to 600 ° C., kept at 600 ° C. for 50 hours, and cooled to room temperature. And 6 kg / cm in this bonded body
Was applied, and then the cross section of the joint was observed with an optical microscope, but no fracture or crack occurred in the joint.

【0056】また、本実施例の接合体の接合部分の断面
の光学顕微鏡写真を図6に示す。図4を参照しつつ説明
した構造を有していることが判る。
FIG. 6 shows an optical micrograph of a cross section of the joined portion of the joined body of this example. It can be seen that it has the structure described with reference to FIG.

【0057】(本発明例2)本発明例1と同様にして接
合体を製造した。ただし、間隙部の幅uは0.2mmと
した。この結果、図4および図6に示したものと同様の
接合構造が形成された。ここで、隆起部分16bおよび
16dの底面6bからの高さは0.5mmであり、窒化
アルミニウム中にクラックは観察されなかった。
(Invention Example 2) A joined body was manufactured in the same manner as in Invention Example 1. However, the width u of the gap was 0.2 mm. As a result, a joint structure similar to that shown in FIGS. 4 and 6 was formed. Here, the height of the raised portions 16b and 16d from the bottom surface 6b was 0.5 mm, and no crack was observed in the aluminum nitride.

【0058】この接合体を2個使用し、それぞれについ
て真空中で前記の熱サイクル試験を実施した。接合部分
の断面を光学顕微鏡で観察したが、接合部分に破断やク
ラックは生じなかった。また、この接合体を2個使用
し、それぞれについて真空中で前記の高温保持試験を実
施した。接合部分の断面を光学顕微鏡で観察したが、接
合部分に破断やクラックは生じなかった。
Two of these joined bodies were used, and each of them was subjected to the above-mentioned thermal cycle test in vacuum. The cross section of the joint was observed with an optical microscope, but no fracture or crack occurred in the joint. Further, two of these joined bodies were used, and the above high temperature holding test was carried out in vacuum for each of them. The cross section of the joint was observed with an optical microscope, but no fracture or crack occurred in the joint.

【0059】(本発明例3)本発明例1と同様にして接
合体を製造した。ただし、間隙部の幅uは0.8mmと
した。この結果、図4および図6に示したものと同様の
接合構造が形成された。ここで、隆起部分16bおよび
16dの底面6bからの高さは0.5mmであり、窒化
アルミニウム中にクラックは観察されなかった。
(Invention Example 3) A joined body was manufactured in the same manner as in Invention Example 1. However, the width u of the gap was 0.8 mm. As a result, a joint structure similar to that shown in FIGS. 4 and 6 was formed. Here, the height of the raised portions 16b and 16d from the bottom surface 6b was 0.5 mm, and no crack was observed in the aluminum nitride.

【0060】この接合体を2個使用し、それぞれについ
て真空中で前記の熱サイクル試験を実施した。接合部分
の断面を光学顕微鏡で観察したが、接合部分に破断やク
ラックは生じなかった。また、この接合体を2個使用
し、それぞれについて真空中で前記の高温保持試験を実
施した。接合部分の断面を光学顕微鏡で観察したが、接
合部分に破断やクラックは生じなかった。
Two of the bonded bodies were used, and each of them was subjected to the above-mentioned thermal cycle test in vacuum. The cross section of the joint was observed with an optical microscope, but no fracture or crack occurred in the joint. Further, two of these joined bodies were used, and the above high temperature holding test was carried out in vacuum for each of them. The cross section of the joint was observed with an optical microscope, but no fracture or crack occurred in the joint.

【0061】(比較例1)図1および図2を参照しつつ
説明した手順に従って、接合体を製造した。ただし、セ
ラミックス部材1、収容孔6は本発明例1と同様とし
た。
Comparative Example 1 A joined body was manufactured according to the procedure described with reference to FIGS. 1 and 2. However, the ceramic member 1 and the housing hole 6 were the same as in the first example of the present invention.

【0062】直径5mmのチタン箔(厚さ5μm)33
と、直径(図1におけるp)4.5mm、厚さ200μ
mの銀板13とを使用した。長さ5mmの金属部材2を
収容孔内に挿入した。図1において、tを0.05mm
とした。部材2の中心部分には、直径3mm、深さ3m
mの雌ねじを設けた。部材2に50gの荷重を加えつ
つ、真空中で970℃で熱処理を行い、ろう付けを行っ
た。
Titanium foil with a diameter of 5 mm (thickness 5 μm) 33
And diameter (p in FIG. 1) 4.5 mm, thickness 200 μ
m silver plate 13 was used. The metal member 2 having a length of 5 mm was inserted into the accommodation hole. 1, t is 0.05 mm
And The central part of the member 2 has a diameter of 3 mm and a depth of 3 m.
m internal thread was provided. While applying a load of 50 g to the member 2, heat treatment was performed in vacuum at 970 ° C. to perform brazing.

【0063】この結果、図2に示すような接合構造が形
成された。ここで、接合層の底面6bからの最大高さn
(図1(b)参照)は2mmであった。比較例1の接合
体の接合部分の断面の光学顕微鏡写真を図7に示す。図
2を参照しつつ説明した構造を有していることが判る。
また、窒化アルミニウムの組織内に、細いクラック30
が観察された。
As a result, a junction structure as shown in FIG. 2 was formed. Here, the maximum height n from the bottom surface 6b of the bonding layer is
(See FIG. 1B) was 2 mm. An optical micrograph of a cross section of the bonded portion of the bonded body of Comparative Example 1 is shown in FIG. 7. It can be seen that it has the structure described with reference to FIG.
Further, fine cracks 30 are formed in the structure of aluminum nitride.
Was observed.

【0064】この接合体を2個使用し、それぞれについ
て前記の熱サイクル試験を実施した。接合部分の断面を
光学顕微鏡で観察したところ、接合部分に破断が見られ
た。また、この接合体を2個使用し、それぞれについて
前記の高温保持試験を実施した。接合部分の断面を光学
顕微鏡で観察したところ、接合部分に破断が見られた。
Two of these joined bodies were used, and the above-mentioned thermal cycle test was carried out for each of them. When the cross section of the joined portion was observed with an optical microscope, fracture was found in the joined portion. Further, two of these joined bodies were used, and the above-mentioned high temperature holding test was carried out for each of them. When the cross section of the joined portion was observed with an optical microscope, fracture was found in the joined portion.

【0065】(比較例2)比較例1と同様の手順に従っ
て、接合体を製造した。ただし、図1(a)に示すよう
に、直径9mmのチタン箔(厚さ5μm)4を使用し
た。この結果、図2および図7に示したものと同様の接
合構造が形成された。ここで、接合層の底面6bからの
最大高さnは4mmであった。また、窒化アルミニウム
の組織内に、細いクラック30が観察された。
Comparative Example 2 A joined body was manufactured in the same procedure as in Comparative Example 1. However, as shown in FIG. 1A, titanium foil 4 (thickness 5 μm) 4 having a diameter of 9 mm was used. As a result, a joint structure similar to that shown in FIGS. 2 and 7 was formed. Here, the maximum height n from the bottom surface 6b of the bonding layer was 4 mm. Further, a thin crack 30 was observed in the structure of aluminum nitride.

【0066】この接合体を2個使用し、それぞれについ
て前記の熱サイクル試験を実施した。接合部分の断面を
光学顕微鏡で観察したところ、接合部分に破断が見られ
た。また、この接合体を2個使用し、それぞれについて
前記の高温保持試験を実施した。接合部分の断面を光学
顕微鏡で観察したところ、接合部分に破断が見られた。
Two of these joined bodies were used, and the above-mentioned thermal cycle test was carried out for each of them. When the cross section of the joined portion was observed with an optical microscope, fracture was found in the joined portion. Further, two of these joined bodies were used, and the above-mentioned high temperature holding test was carried out for each of them. When the cross section of the joined portion was observed with an optical microscope, fracture was found in the joined portion.

【0067】(比較例3)比較例1と同様の手順に従っ
て、接合体を製造した。ただし、直径5mmのチタン箔
(厚さ5μm)33を使用し、かつ端子2の側壁面と収
容孔6の側壁面6cとの隙間の大きさtを0.1mmと
した。この結果、図2および図7に示したものと同様の
接合構造が形成された。ここで、接合層の底面6bから
の最大高さnは3mmであった。また、窒化アルミニウ
ムの組織内に、細いクラック30が観察された。
Comparative Example 3 A joined body was manufactured according to the same procedure as in Comparative Example 1. However, a titanium foil (thickness 5 μm) 33 having a diameter of 5 mm was used, and the size t of the gap between the side wall surface of the terminal 2 and the side wall surface 6 c of the accommodation hole 6 was set to 0.1 mm. As a result, a joint structure similar to that shown in FIGS. 2 and 7 was formed. Here, the maximum height n from the bottom surface 6b of the bonding layer was 3 mm. Further, a thin crack 30 was observed in the structure of aluminum nitride.

【0068】この接合体を2個使用し、それぞれについ
て前記の熱サイクル試験を実施した。接合部分の断面を
光学顕微鏡で観察したところ、接合部分に破断が見られ
た。また、この接合体を2個使用し、それぞれについて
前記の高温保持試験を実施した。接合部分の断面を光学
顕微鏡で観察したところ、接合部分に破断が見られた。
Two of these joined bodies were used, and the above-mentioned thermal cycle test was carried out for each of them. When the cross section of the joined portion was observed with an optical microscope, fracture was found in the joined portion. Further, two of these joined bodies were used, and the above-mentioned high temperature holding test was carried out for each of them. When the cross section of the joined portion was observed with an optical microscope, fracture was found in the joined portion.

【0069】[0069]

【発明の効果】以上から判るように、本発明によれば、
セラミックス部材の収容孔に金属部材の少なくとも一部
を収容し、金属部材とセラミックス部材とを接合する形
態の接合構造において、セラミックス部材に残留する応
力を減少させ、接合体を高温と低温との間の熱サイクル
に供したり、あるいは高温で長期間保持した場合にも、
セラミックス部材の方にクラックや破損が発生するおそ
れをなくすることができる。
As can be seen from the above, according to the present invention,
In a joining structure in which at least a part of a metal member is housed in a housing hole of a ceramic member and the metal member and the ceramic member are joined, the stress remaining in the ceramic member is reduced, and the joined body is heated between a high temperature and a low temperature. When subjected to the heat cycle of
It is possible to eliminate the possibility of cracks and damages occurring in the ceramic member.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)は、参考例に係る接合構造を作製する直
前の段階を示す断面図であり、(b)は、参考例に係る
接合構造を示す断面図である。
FIG. 1A is a cross-sectional view showing a stage immediately before manufacturing a joint structure according to a reference example, and FIG. 1B is a cross-sectional view showing a joint structure according to a reference example.

【図2】図1(b)の接合構造の主要部分を拡大して示
す断面図である。
FIG. 2 is an enlarged cross-sectional view showing a main part of the joint structure of FIG. 1 (b).

【図3】(a)は、本発明例に係る接合構造を作製する
直前の段階を示す断面図であり、(b)は、本発明例に
係る接合構造を示す断面図である。
FIG. 3A is a cross-sectional view showing a stage immediately before manufacturing a bonded structure according to an example of the present invention, and FIG. 3B is a sectional view showing a bonded structure according to an example of the present invention.

【図4】図3(b)の接合構造の主要部分を拡大して示
す断面図である。
FIG. 4 is an enlarged sectional view showing a main part of the joint structure of FIG. 3 (b).

【図5】本発明の接合構造をセラミックス静電チャック
の保持構造に適用した実施例を示す断面図である。
FIG. 5 is a cross-sectional view showing an embodiment in which the bonding structure of the present invention is applied to a holding structure of a ceramic electrostatic chuck.

【図6】図4の接合構造に対応するセラミックス組織お
よび金属組織を示す光学顕微鏡写真である。
6 is an optical micrograph showing a ceramic structure and a metal structure corresponding to the bonded structure of FIG.

【図7】図2の接合構造に対応するセラミックス組織お
よび金属組織を示す光学顕微鏡写真である。
FIG. 7 is an optical micrograph showing a ceramic structure and a metal structure corresponding to the joint structure of FIG.

【符号の説明】 1 セラミックス部材 1c 円形の凹部 4 金
属箔 5、31 網状電極ないしメッシュ 6、26、30
収容孔 6b、26a、30a 収容孔の底面
6c、26b、30b 収容孔の側壁面 9セラミッ
クス部材とろう材との接合部分 10 金属露出部と
ろう材との接合部分 12、25 金属部材 12
c、25c、29c リング状の凹部 12d、25d、29d 金属部材の先端部 12
e、25a、29a 金属部材の側壁面 12f、2
5f 金属部材の本体 33 金属箔 13円盤形
状のろう材 14 間隙部 16、16a 接合層
16b 第一の隆起部分 16c 陥没部分 1
6d 第二の隆起部分 21 円盤形状のセラミック
ス部材からなる静電チャック本体 22 電極接合部
23 熱電対の接合部 29 熱電対保護用の
ニッケル製のキャップ(金属部材の一例) 30 ク
ラック t 金属部材の側壁面と収容孔の側壁面との
距離 s 収容孔の深さ方向に見た間隙部の寸法
[Explanation of reference numerals] 1 ceramic member 1c circular concave portion 4 metal foil 5, 31 mesh electrode or mesh 6, 26, 30
Housing hole 6b, 26a, 30a Bottom of housing hole
6c, 26b, 30b Side wall surface of accommodating hole 9 Joining portion between ceramic member and brazing material 10 Joining portion between exposed metal portion and brazing material 12, 25 Metal member 12
c, 25c, 29c Ring-shaped recess 12d, 25d, 29d Tip of metal member 12
e, 25a, 29a Side wall surface of metal member 12f, 2a
5f Main body of metal member 33 Metal foil 13 Disc-shaped brazing material 14 Gap portion 16, 16a Bonding layer 16b First raised portion 16c Depression portion 1
6d Second raised portion 21 Electrostatic chuck body made of disk-shaped ceramic member 22 Electrode joint 23 Thermocouple joint 29 Nickel cap for protecting thermocouple (an example of metal member) 30 Crack t Metal member The distance between the side wall surface and the side wall surface of the accommodation hole s Dimension of the gap portion viewed in the depth direction of the accommodation hole

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】金属部材と、この金属部材の少なくとも一
部を収容する収容孔を備えているセラミックス部材との
接合構造であって、前記金属部材が前記収容孔内に収容
されており、少なくとも前記金属部材の底面側で前記収
容孔の側壁面と前記金属部材との間に幅0.2mm以上
の間隙部が設けられており、前記金属部材と前記セラミ
ックス部材とを接合する接合層が前記金属部材の底面と
前記収容孔の底面との間に形成されており、かつこの接
合層の一部分が前記収容孔の底面を被覆するように前記
間隙部に露出していることを特徴とする、金属部材とセ
ラミックス部材との接合構造。
1. A joint structure of a metal member and a ceramic member having a housing hole for housing at least a part of the metal member, wherein the metal member is housed in the housing hole. A gap having a width of 0.2 mm or more is provided between the side wall surface of the accommodation hole and the metal member on the bottom surface side of the metal member, and the bonding layer that joins the metal member and the ceramic member is It is formed between the bottom surface of the metal member and the bottom surface of the accommodation hole, and a part of the bonding layer is exposed in the gap portion so as to cover the bottom surface of the accommodation hole, Bonding structure of metal member and ceramic member.
【請求項2】金属部材と、この金属部材の少なくとも一
部を収容する収容孔を備えているセラミックス部材との
接合構造であって、前記金属部材が前記収容孔内に収容
されており、前記金属部材が、本体とこの本体から前記
収容孔の底面側へと突出している先端部とを備えてお
り、前記先端部、前記本体、前記収容孔の側壁面および
前記収容孔の底面によって包囲された間隙部が形成され
ており、前記金属部材と前記セラミックス部材とを接合
する接合層が前記金属部材の底面と前記収容孔の底面と
の間に形成されており、かつこの接合層の一部分が前記
収容孔の底面を被覆するように前記間隙部に露出してい
ることを特徴とする、金属部材とセラミックス部材との
接合構造。
2. A joining structure of a metal member and a ceramic member having a housing hole for housing at least a part of the metal member, wherein the metal member is housed in the housing hole. The metal member includes a main body and a tip portion protruding from the main body to the bottom surface side of the accommodation hole, and is surrounded by the tip end portion, the main body, the side wall surface of the accommodation hole, and the bottom surface of the accommodation hole. A gap portion is formed, a joining layer for joining the metal member and the ceramic member is formed between the bottom surface of the metal member and the bottom surface of the accommodation hole, and a part of the joining layer is formed. A joint structure of a metal member and a ceramic member, which is exposed in the gap so as to cover the bottom surface of the accommodation hole.
【請求項3】前記収容孔の幅方向に見た前記間隙部の寸
法が0.2mm以下であることを特徴とする、請求項2
記載の金属部材とセラミックス部材との接合構造。
3. The size of the gap as viewed in the width direction of the accommodation hole is 0.2 mm or less.
A joint structure between the metal member and the ceramic member as described above.
【請求項4】前記間隙部に露出した前記接合層が、前記
金属部材の前記先端部の側壁面に対して濡れている第一
の隆起部分と、前記セラミックス部材の前記収容孔の側
壁面に対して濡れている第二の隆起部分と、前記第一の
隆起部分および前記第二の隆起部分の間に形成されてい
る陥没部分を備えていることを特徴とする、請求項2ま
たは3記載の金属部材とセラミックス部材との接合構
造。
4. The bonding layer exposed in the gap is formed on a first ridge portion that is wet with respect to a side wall surface of the tip end portion of the metal member and a side wall surface of the accommodation hole of the ceramic member. 4. A second raised portion that is wet with respect to the first raised portion, and a recessed portion formed between the first raised portion and the second raised portion. Structure of the metal member and the ceramic member of the above.
【請求項5】金属部材と、この金属部材の少なくとも一
部を収容する収容孔を備えているセラミックス部材との
接合構造を製造する方法であって、前記金属部材を前記
収容孔内へと収容し、少なくとも前記金属部材の底面側
で前記収容孔の側壁面と前記金属部材との間に幅0.2
mm以上の間隙部を設け、前記金属部材と前記収容孔の
底面との間に接合用材料を介在させ、前記接合用材料を
加熱して前記金属部材の底面と前記収容孔の底面との間
に接合層を形成し、この接合層の一部分を前記収容孔の
底面を被覆するように前記間隙部に露出させることを特
徴とする、金属部材とセラミックス部材との接合構造の
製造方法。
5. A method for manufacturing a joint structure of a metal member and a ceramic member having a housing hole for housing at least a part of the metal member, wherein the metal member is housed in the housing hole. However, at least on the bottom surface side of the metal member, a width of 0.2 is provided between the side wall surface of the accommodation hole and the metal member.
Between the bottom surface of the metal member and the bottom surface of the accommodating hole is provided by providing a bonding material between the metal member and the bottom surface of the accommodating hole and providing a bonding material between the bottom surface of the metal member and the bottom surface of the accommodating hole. A method for manufacturing a joining structure between a metal member and a ceramic member, comprising forming a joining layer on the substrate and exposing a part of the joining layer to the gap so as to cover the bottom surface of the accommodation hole.
【請求項6】金属部材と、この金属部材の少なくとも一
部を収容する収容孔を備えているセラミックス部材との
接合構造を製造する方法であって、前記金属部材が、本
体と、この本体から前記収容孔の底面側へと突出してい
る前記本体よりも横断面方向の寸法が小さい先端部とを
備えており、この金属部材を前記先端部側から前記収容
孔内へと収容し、この際前記先端部と前記収容孔の底面
との間に接合用材料を介在させ、前記先端部、前記本
体、前記収容孔の側壁面および前記収容孔の底面によっ
て間隙部を形成し、少なくとも前記接合用材料を加熱し
て前記金属部材の底面と前記収容孔の底面との間に接合
層を形成し、この接合層の一部分を前記収容孔の底面を
被覆するように前記間隙部に露出させることを特徴とす
る、金属部材とセラミックス部材との接合構造の製造方
法。
6. A method for manufacturing a joint structure of a metal member and a ceramic member having a housing hole for housing at least a part of the metal member, wherein the metal member comprises a body and a body. And a tip portion having a smaller dimension in the cross-sectional direction than the main body protruding toward the bottom surface side of the accommodation hole, and the metal member is accommodated from the tip end side into the accommodation hole. A joining material is interposed between the tip end portion and the bottom surface of the accommodation hole, and a gap portion is formed by the tip end portion, the main body, the side wall surface of the accommodation hole, and the bottom surface of the accommodation hole, and at least the joining material. Heating the material to form a bonding layer between the bottom surface of the metal member and the bottom surface of the accommodation hole, and exposing a part of the bonding layer to the gap so as to cover the bottom surface of the accommodation hole. Characteristic, metal member and ceramic Method for manufacturing a bonding structure of the box member.
【請求項7】前記収容孔の幅方向に見た前記間隙部の寸
法を0.2mm以下とすることを特徴とする、請求項6
記載の金属部材とセラミックス部材との接合構造の製造
方法。
7. The size of the gap as viewed in the width direction of the accommodation hole is 0.2 mm or less.
A method for producing a joint structure between a metal member and a ceramic member according to claim 1.
【請求項8】前記収容孔の底面から見た前記接合層の最
大高さが1.0mm以下であることを特徴とする、請求
項7記載の金属部材とセラミックス部材との接合構造の
製造方法。
8. The method for manufacturing a joint structure between a metal member and a ceramic member according to claim 7, wherein the maximum height of the joint layer when viewed from the bottom of the accommodation hole is 1.0 mm or less. .
JP06744496A 1996-02-29 1996-02-29 Bonding structure between metal member and ceramic member and method for manufacturing the same Expired - Lifetime JP3776499B2 (en)

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