JPH09157847A - Device for producing both side vapor-deposited film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a device for producing a both side vapor-deposited film capable of improving the quality of the both side vapor-deposited film to be produced and capable of improving the productivity thereof. SOLUTION: A clling roll B contacted with a vapor-deposited film (a) is insulated even against a cooling roll A to insulate the space between the cooling roll A and vapor-deposited film (a), and by electrostatic attraction produced by giving a potential difference to the space therebetween by a voltage applying device 7, a film 3 is adhered to the cooling roll A closely to improve the heat exchanger effectiveness by the cooling roll A. Moreover, the cooling roll B itself is insulated from the other part by an insulating material, by which the insulation between the cooling roll B and vapor-deposited film (a) is made needless to improve the heat exchanger effectiveness, and furthermore, the electric leak between the cooling roll B and vapor-deposited film (a) is prevented even in the case the film 3 runs on the cooling roll B.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum vapor deposition apparatus for producing a vapor deposition film by vapor depositing a metal on the surface of a film.

[0002]

2. Description of the Related Art Conventionally, a double-sided vapor deposition film for vapor-depositing metal on both sides of a film has been used as one of vacuum vapor deposition apparatuses for vapor-depositing metal on the surface of a film to produce a vapor deposition film for film capacitors and packaging. There is manufacturing equipment. In this double-sided vapor deposition film manufacturing apparatus, two cooling rolls are arranged in a vacuum tank, and metal is vapor-deposited on each one of both sides of the film on each cooling roll, so that both sides of the film are coated at one time. The method of depositing a metal is common.

However, when a double-sided vapor deposition film is formed at a high speed by such a double-sided vapor deposition film manufacturing apparatus, the film is subject to thermal deformation such as deformation due to the effect of condensation heat of vaporized metal and radiation heat from an evaporation source. Since it causes damage, it adversely affects the quality of the double-sided vapor deposition film formed. In particular, when backside evaporation is performed on a film that has already been subjected to thermal damage due to frontside evaporation on one cooling roll, the remaining cooling rolls for backside evaporation do not cool sufficiently efficiently, resulting in poor quality. It was the cause. Further, when tension fluctuation or thermal damage occurs during vapor deposition, expansion and contraction of the film adversely affects the winding system, leading to the occurrence of a web tear.

As a method of solving the thermal damage to the film, in the case of single-sided vapor deposition on the film, a potential difference is provided between the vapor deposition metal and the cooling roll, and the potential difference causes the potential difference between the vapor deposition metal and the cooling roll. A method for sticking a film to a cooling roll by using electrostatic attraction is disclosed in Japanese Patent Laid-Open No. 1-2732.
No. 21 discloses this.

Further, in the case of double-sided vapor deposition on a film, an insulating film is formed on the surface of a cooling roll, and a potential difference is provided between the vapor deposition metal and the cooling roll through this insulating film, as disclosed in JP-A-1-273221. A method of bringing a film into close contact with a cooling roll in the same manner as that disclosed is disclosed in JP-A-60-92467.

In FIG. 2, a potential difference is provided between the vapor-deposited metal film and the cooling roll, and the electrostatic attraction generated between the vapor-deposited metal film and the cooling roll due to the potential difference is utilized.
The schematic of the vacuum evaporation system which sticks a film on a cooling roll is shown.

In FIG. 2, a cooling roll A (not shown) and a cooling roll B are provided as two cooling rolls, and the vapor deposition metal film 4 is already formed on the one side of the film 3 by the cooling roll A. It is assumed that In this film 3, while the cooling roll B is rotated in the direction of arrow C, the film 3 is fed in the direction of arrow D, and the metal evaporated from the evaporation source 6 is vapor-deposited on the remaining surface to form the vapor-deposited metal film 5. These vapor-deposited metal films 4 and 5 are electrically shielded via the insulating film 1 formed on the surface of the cooling roll B. Further, since the film 3 is wound in the direction of the arrow D after the vapor-deposited metal films 4 and 5 are formed on both surfaces thereof, the vapor-deposited metal films 4 and 5 on the film 3 come into contact with each other and have the same potential. Become.

Therefore, a potential difference can be provided between the cooling roll B and the vapor-deposited metal film 5 by the voltage application device 7 shown in FIG. 2, and this potential difference causes a difference between the cooling roll B and the vapor-deposited metal film 5. The electrostatic attraction is used to bring the film 3 into close contact with the cooling roll B, and as a result, thermal damage to the film 3 is prevented.

[0009]

However, in the conventional apparatus for producing a double-sided vapor deposition film as described above, a potential difference is provided between the double-sided vapor deposition film and the cooling roll B as a measure for preventing thermal damage to the film 3. Therefore, the characteristics of the insulating film 1 formed on the surface of the cooling roll B have a great influence on the vapor deposition quality.

Therefore, in order to improve the adhesion of the film 3 to the cooling roll B at a low voltage, it is necessary to make the insulating film 1 as thin as possible. In particular, the insulator adopted for the insulation of this type of cooling roll is a ceramic. , Etc. are used, but the hardness is high, but they are easily damaged mechanically, so they cannot be made extremely thin from the management and maintenance aspect, and a dense insulating film is formed on the cooling roll surface with a diameter of 400 mm to 600 mm, resulting in high cost. Had occurred. In addition, this insulating film has also been a factor of lowering thermal conductivity.

Further, in the method of increasing the adhesion between the film 3 and the cooling roll B by increasing the potential difference, electrical leakage is apt to occur due to defects in the insulating film and the defects in the vapor deposition film, which also causes the destruction of the vapor deposition film. Was there.

To solve the above problems, as a method other than the thermal damage prevention by the potential difference, there is a method of preventing the film 3 from slipping on the cooling roll B, which is greatly affected by heat.

In this method, the rotation of the cooling roll is controlled with reference to the cooling roll B to control the running of the film 3, and in order to prevent the film 3 from slipping on the cooling roll B, it is generally used. By slowing the rotation of the cooling roll A with respect to the cooling roll B, an appropriate tension is applied to the film 3 to enhance the adhesion between the cooling roll B and the film 3 and prevent thermal damage to the film 3.

However, in this method, although the thermal damage to the film 3 can be prevented, the cooling roll B
In the above, since the winding control is not stable due to the physical condition that the state of the film is unstable, the quality of the produced double-sided vapor deposition film is deteriorated and at the same time, the film 3 is provided with an appropriate tension to cool the cooling roll B and the film 3. Since the rotations of the cooling rolls A and B as a whole are slowed down for the purpose of enhancing the adhesion to the film, there is a problem that the running speed of the film 3 is suppressed and the productivity of the double-sided vapor deposition film is reduced.

The present invention has been conceived in order to solve the above-mentioned problems, and it is possible to prevent thermal damage to the film during the production of the double-sided vapor deposition film and improve the quality of the double-sided vapor deposition film. Provided is a double-sided vapor deposition film manufacturing apparatus capable of increasing the traveling speed of the film and improving the productivity of the double-sided vapor deposition film.

[0016]

In order to solve the above-mentioned problems, in the apparatus for producing a double-sided vapor-deposited film according to claim 1 of the present invention, two rollers that rotate about a rotation axis are provided in a vacuum chamber. The first roller, which is one side of the film, is brought into contact with the first roller of the rollers, and the second side, which is the other side of the film, is connected to the second roller of the rollers. While the film is traveling on the first roller while being brought into contact with, the metal is vapor-deposited on the second surface of the film while the film is traveling on the second roller. While running on the roller, deposit metal on the first side of the film,
In a double-sided vapor deposition film manufacturing apparatus that manufactures a double-sided vapor deposition film in which metal is vapor-deposited on both sides of the film, radiating heat generated by the vapor deposition through each roller, Face and first
The second roller has a voltage applying means for providing a potential difference between the second roller and the second roller and is insulated from the other portion.

According to this structure, the first roller and the metal are vapor-deposited by insulating the second roller, which is in contact with the second surface of the metal vapor-deposited film, with respect to the first roller. Insulate between the second side of the film,
A potential difference is applied between them, and the electrostatic attraction generated between them causes the film running while contacting the first roller to adhere to the first roller, thereby improving the heat exchange efficiency by the first roller. .

Further, by insulating the second roller itself from other portions, it is not necessary to insulate the second roller from the second surface of the metal-deposited film, and the heat exchange by the second roller is eliminated. It not only improves efficiency, but also prevents electrical leakage between the metallized film on the second side as it travels while having the second side in contact with the second roller.

[0019]

BEST MODE FOR CARRYING OUT THE INVENTION A double-sided vapor deposition film manufacturing apparatus showing an embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is an internal structure diagram of a double-sided vapor deposition film manufacturing apparatus showing the present embodiment. In FIG. 1, the film 3 attached to the unwinding portion 9 and unwound is
The transport roll H continuously transports the cooling roll A as the first roller and the cooling roll B as the second roller. Evaporation sources 6a and 6b of a resistance heating system or a crucible system for evaporating the metal deposited on each surface of the back surface of the film 3 are installed below the cooling rolls A and B, respectively. The film 3 conveyed to the cooling rolls A and B has evaporation targets J1 and J2 made of metal evaporated by the evaporation sources 6a and 6b deposited on the respective surfaces of the cooling rolls A and B at the respective positions. After that, the double-sided vapor deposition film is wound into a roll by the winding unit 10.

At this time, at the position of the cooling roll A, while the metal that has become the substance to be evaporated J1 is being vapor-deposited on the surface as the second surface of the film 3, the surface of the film 3 is caused by the vapor deposition. A potential difference is provided between the vapor-deposited film a formed on the cooling roll A and the cooling roll A by a voltage applying device 7 as a voltage applying means, so that the film 3 is cooled by the electrostatic attraction due to the potential difference.
Stick to the top.

Thereafter, at the position of the cooling roll B, the film 3 is vapor-deposited on the back surface as the first surface of the film, which is the metal to be evaporated J2. Is formed.

At this time, in the film 3, since the bearing of the cooling roll B is electrically insulated from the other parts by the insulator 8, the vapor deposition film a comes into contact with the cooling roll B supported by this bearing. Even though the vehicle runs without causing an electrical leak, and since the conventional insulator is not formed on the surface of the cooling roll B, sufficient heat exchange can be performed between the film 3 and the cooling roll B. Done.

Further, in the conventional vapor deposition as in the past, the film was wound around the cooling roll without adhering to it. Therefore, in this case, the slippage between the film and the cooling roll causes a malfunction in the winding control, which causes expansion and contraction of the film and a change in the winding tension, which leads to the occurrence of thermal damage. Especially in the case of double-sided vapor deposition, thermal damage is further aggravated by backside vapor deposition at the position of the cooling roll B.
It was common to control each roll based on the cooling roll B.

On the other hand, in the apparatus for producing a double-sided vapor-deposited film according to the embodiment of the present invention, the film 3 is brought into close contact with the cooling roll A by the electrostatic attractive force generated by the voltage applying device 7, and the winding control of the film 3 is performed. It was found that by using the cooling roll A as a reference, the running and tension fluctuations of the film 3 are stabilized, and the vapor deposition quality of the film 3 is improved.

In the experiments relating to the present invention, when a polyester film was used as the film 3 and aluminum and zinc were vapor-deposited on both sides of the film and the average vapor-deposited film resistance was 5 Ω / cm ² , the vapor deposition rate was In contrast to the conventional apparatus having a limit of 6 m / sec, the double-sided vapor deposition film manufacturing apparatus according to the embodiment of the present invention is capable of vapor deposition at 10 m / sec.

As described above, during production of the double-sided vapor deposition film, thermal damage to the film can be prevented, the quality of the double-sided vapor deposition film can be improved, and the productivity of the double-sided vapor deposition film can be improved.

[0028]

As described above, according to the present invention, the first roller is also insulated from the second roller that comes into contact with the second surface of the metal-deposited film by the first roller.
Between the first roller and the second surface of the metal-deposited film by applying an electric potential difference between them and the electrostatic attraction generated between them,
The film that runs while making contact with it is closely attached, and
The heat exchange efficiency by the rollers can be improved.

Furthermore, by insulating the second roller itself from the other parts, heat insulation by the second roller can be eliminated by eliminating the need for insulation between the second roller and the second surface of the metal-deposited film. The efficiency can be improved.

Also, by insulating the second roller itself from other parts, when the film having the metal deposited on the second surface runs while the second surface is in contact with the second roller. Can also prevent electrical leakage between them.

Therefore, during the production of the double-sided vapor deposition film, thermal damage to the film is prevented,
The quality of the double-sided vapor deposition film can be improved, the running speed of the film can be increased, and the productivity of the double-sided vapor deposition film can be improved.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram of an apparatus for manufacturing a double-sided vapor deposition film showing an embodiment of the present invention.

FIG. 2 is a schematic configuration diagram of a conventional double-sided vapor deposition film manufacturing apparatus.

[Explanation of symbols]

 7 Voltage application device 8 Insulator

Claims (2)

[Claims] 1. A vacuum chamber is provided with two rollers that rotate about a rotation axis, and the first roller, which is one surface of the film, is brought into contact with the first roller, and then the first roller is contacted with the first roller. While the second surface, which is the other surface of the film, is brought into contact with the second roller of the rollers, the film is transported and run, and while the film is running on the first roller, The metal is vapor-deposited on the second surface of the film, and while the film is traveling on the second roller, the metal is vapor-deposited on the first surface of the film and the heat generated by the vapor deposition. In a double-sided vapor deposition film manufacturing apparatus that manufactures a double-sided vapor deposition film in which metal is vapor-deposited on both sides of the film while radiating heat through each roller, a second surface and a first surface of the film on which the metal is vapor-deposited. With roller An apparatus for producing a double-sided vapor-deposited film, comprising a voltage applying means for providing a potential difference between the second roller and the second roller, which is insulated from other portions. 2. The double-sided vapor deposition film manufacturing apparatus according to claim 1, wherein the rotation of each roller is controlled with reference to the first roller side.