JPH09155724A - Wet type polishing method - Google Patents
Wet type polishing methodInfo
- Publication number
- JPH09155724A JPH09155724A JP34637895A JP34637895A JPH09155724A JP H09155724 A JPH09155724 A JP H09155724A JP 34637895 A JP34637895 A JP 34637895A JP 34637895 A JP34637895 A JP 34637895A JP H09155724 A JPH09155724 A JP H09155724A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- final
- work
- wet
- polished
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】この発明は湿式研磨方法に関する。The present invention relates to a wet polishing method.
【0002】[0002]
【従来の技術】従来における湿式研磨方法にあっては、
酸性の研磨剤を用いて研磨能率を向上させる方法とアル
カリ性の研磨剤を用いてワークを滑らかに研磨する方法
とが存在した。2. Description of the Related Art In a conventional wet polishing method,
There has been a method of improving the polishing efficiency by using an acidic polishing agent and a method of smoothly polishing a work by using an alkaline polishing agent.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、かかる
従来の研磨方法において、前者のように、酸性の研磨剤
を用いた場合には研磨能率は向上するがワークを滑らか
に研磨しにくいという不都合を有し、また、後者のよう
に、アルカリ性の研磨剤を用いた場合にはワークを滑ら
かに研磨しやすいがワークの酸化被膜等を除去しにくく
この結果研磨能率を向上させにくいという不都合を有し
た。However, in the conventional polishing method as described above, when the acidic polishing agent is used as in the former method, the polishing efficiency is improved but the work is difficult to be polished smoothly. Further, as in the latter case, when an alkaline abrasive is used, the work is easily polished smoothly, but it is difficult to remove the oxide film and the like of the work, and as a result, it is difficult to improve the polishing efficiency.
【0004】この発明の課題はこれらの不都合を解消す
ることである。An object of the present invention is to eliminate these disadvantages.
【0005】[0005]
【課題を解決するための手段】前記課題を達成するため
に、この発明に係る湿式研磨方法においては、複数の湿
式研磨工程を一連に組み合わせた湿式研磨方法におい
て、 前記複数の研磨工程における最終研磨工程をアルカリ性
の研磨液によって行うとともにこの最終研磨工程以前の
研磨工程を酸性の研磨液によって行うものであるため、
最終製品に影響しない最終研磨工程以前の研磨工程にお
ける研磨能率を向上させ、最終製品に影響を及ぼす最終
研磨工程においてワークを滑らかさに研磨することがで
きるものである。In order to achieve the above object, in a wet polishing method according to the present invention, a wet polishing method in which a plurality of wet polishing steps are combined in series is provided, and final polishing in the plurality of polishing steps is performed. Since the process is performed with an alkaline polishing liquid and the polishing process before the final polishing process is performed with an acidic polishing liquid,
It is possible to improve the polishing efficiency in the polishing step before the final polishing step that does not affect the final product and to smoothly polish the work in the final polishing step that affects the final product.
【0006】[0006]
【発明の実施の説明】図1は本願発明に係る湿式研磨方
法の実施例を示したものであり、一連の複数の湿式研磨
工程から構成されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows an embodiment of a wet polishing method according to the present invention, which comprises a series of a plurality of wet polishing steps.
【0007】Aは粗取り研磨工程、Bは仕上げ研磨工
程、又、Cは最終仕上げ研磨工程である。A is a rough polishing step, B is a final polishing step, and C is a final final polishing step.
【0008】これらの各研磨工程A,B,Cを図2に基
づいて説明すると、図において、1は支持盤、11はこの
支持盤1の軸心に設置された支軸である。この支持盤1
はこの支軸11を中心として適宜手段によって矢印方向に
回転される。Wは盤状のワークであり、前記支持盤1に
載置されている。このワークWは上面を被研磨面として
いる。Each of these polishing steps A, B and C will be described with reference to FIG. 2. In the figure, 1 is a support board and 11 is a spindle installed at the axis of the support board 1. This support board 1
Is rotated about this support shaft 11 in the direction of the arrow by appropriate means. W is a board-shaped work and is placed on the support board 1. The upper surface of this work W is the surface to be polished.
【0009】次に、2は第一回転駆動装置であり、モー
ター等の駆動原を有している。21は回転軸であり、前記
回転駆動装置2に設置されている。この回転軸21は前記
モーター等の動力によって軸心を中心として回転する。
22は第一バフホイールであり、前記回転軸21の先端に固
定されている。このバフホイール22は回転しながらその
底面である研磨面221 によってワークWを研磨する。こ
のとき、回転するバフホイール22の研磨面とワークWの
被研磨面との間に研磨液が供給される。この研磨液が、
最終仕上げ研磨工程Cの場合アルカリ性であり、それ以
外の工程、即ち、粗取り研磨工程Aおよび仕上げ研磨工
程Bの場合には酸性である。Next, reference numeral 2 is a first rotation driving device, which has a driving source such as a motor. Reference numeral 21 denotes a rotary shaft, which is installed in the rotary drive device 2. The rotary shaft 21 is rotated around the shaft center by the power of the motor or the like.
A first buff wheel 22 is fixed to the tip of the rotary shaft 21. While rotating, the buff wheel 22 polishes the work W by the polishing surface 221 which is the bottom surface thereof. At this time, the polishing liquid is supplied between the polishing surface of the rotating buff wheel 22 and the surface to be polished of the work W. This polishing liquid
It is alkaline in the final finishing polishing step C, and acidic in the other steps, that is, in the rough polishing step A and the final polishing step B.
【0010】また、3は第二回転駆動装置であり、前記
第一回転駆動装置2と同様に、モーター等の駆動原を有
している。31は回転軸であり、前記回転駆動装置3に設
置されている。この回転軸31は前記モーター等の動力に
よって軸心を中心として回転する。32は第二バフホイー
ルであり、前記回転軸31の先端に固定されている。この
バフホイール32は回転しながらその底面である研磨面32
1 によってワークWを研磨する。このとき、回転するバ
フホイール22の研磨面とワークWの被研磨面との間に研
磨液が供給されるが、その性質は第一バフホイール22の
場合と同じであるので説明を省略する。Reference numeral 3 denotes a second rotary drive device, which has a drive source such as a motor, like the first rotary drive device 2. Reference numeral 31 is a rotary shaft, which is installed in the rotary drive device 3. The rotating shaft 31 rotates about the shaft center by the power of the motor or the like. A second buff wheel 32 is fixed to the tip of the rotating shaft 31. This buff wheel 32 is a polishing surface 32 that is the bottom surface while rotating.
The work W is polished by 1. At this time, the polishing liquid is supplied between the polishing surface of the rotating buff wheel 22 and the surface to be polished of the work W, but since the property thereof is the same as that of the first buff wheel 22, the description thereof will be omitted.
【0011】なお、第一バフホイール22と第二バフホイ
ール32とは互いに逆方向に回転するため、ワークWの被
研磨面は往復方向に研磨されることになる。Since the first buff wheel 22 and the second buff wheel 32 rotate in mutually opposite directions, the surface to be polished of the work W is polished in the reciprocating direction.
【0012】[0012]
【発明の効果】この発明に係る湿式研磨方法は、複数の
湿式研磨工程を一連に組み合わせた湿式研磨方法におい
て、The wet polishing method according to the present invention is a wet polishing method in which a plurality of wet polishing steps are combined in series.
【0013】前記複数の研磨工程における最終研磨工程
をアルカリ性の研磨液によって行うとともにこの最終研
磨工程以前の研磨工程を酸性の研磨液によって行うもの
であるため、Since the final polishing step in the plurality of polishing steps is performed with an alkaline polishing solution and the polishing steps before this final polishing step are performed with an acidic polishing solution,
【0014】最終製品に影響しない最終研磨工程以前の
研磨工程における研磨能率を向上させ、最終製品に影響
を及ぼす最終研磨工程においてワークを滑らかさに研磨
することができるものである。It is possible to improve the polishing efficiency in the polishing step before the final polishing step that does not affect the final product and to smoothly polish the work in the final polishing step that affects the final product.
【0015】よって、この湿式研磨方法を使用すれば、
一連の研磨工程において研磨能率を向上させることがで
きるとともに最終的にワークを滑らかに研磨することが
できるものである。Therefore, if this wet polishing method is used,
The polishing efficiency can be improved in a series of polishing steps, and finally the work can be smoothly polished.
【図1】この発明に係る湿式研磨方法の一連の工程図で
ある。FIG. 1 is a series of process diagrams of a wet polishing method according to the present invention.
【図1】この発明に係る湿式研磨装置の説明図である。FIG. 1 is an explanatory diagram of a wet polishing apparatus according to the present invention.
A … 粗取り研磨工程(湿式研磨工程) B … 仕上げ研磨工程(湿式研磨工程) C … 最終仕上げ研磨工程(湿式研磨工程) A ... Roughing polishing step (wet polishing step) B ... Finish polishing step (wet polishing step) C ... Final finish polishing step (wet polishing step)
─────────────────────────────────────────────────────
────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成8年3月22日[Submission date] March 22, 1996
【手続補正1】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】図面の簡単な説明[Correction target item name] Brief description of drawings
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【図面の簡単な説明】[Brief description of the drawings]
【図1】この発明に係る湿式研磨方法の一連の工程図で
ある。FIG. 1 is a series of process diagrams of a wet polishing method according to the present invention.
【図2】この発明に係る湿式研磨装置の説明図である。FIG. 2 is an explanatory diagram of a wet polishing apparatus according to the present invention.
【符号の説明】 A … 粗取り研磨工程(湿式研磨工程) B … 仕上げ研磨工程(湿式研磨工程) C … 最終仕上げ研磨工程(湿式研磨工程)[Explanation of Codes] A ... Roughing polishing step (wet polishing step) B ... Final polishing step (wet polishing step) C ... Final finish polishing step (wet polishing step)
Claims (1)
た湿式研磨方法において、 前記複数の研磨工程における最終研磨工程をアルカリ性
の研磨液によって行うとともにこの最終研磨工程以前の
研磨工程を酸性の研磨液によって行うことを特徴とする
湿式研磨方法。1. A wet polishing method in which a plurality of wet polishing steps are combined in series, wherein the final polishing step in the plurality of polishing steps is performed with an alkaline polishing solution, and the polishing steps before the final polishing step are performed with an acidic polishing solution. Wet polishing method characterized by being performed by.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34637895A JPH09155724A (en) | 1995-12-11 | 1995-12-11 | Wet type polishing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34637895A JPH09155724A (en) | 1995-12-11 | 1995-12-11 | Wet type polishing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09155724A true JPH09155724A (en) | 1997-06-17 |
Family
ID=18383022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34637895A Pending JPH09155724A (en) | 1995-12-11 | 1995-12-11 | Wet type polishing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09155724A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0845327A2 (en) * | 1996-11-27 | 1998-06-03 | Shuji Kawasaki | Buffing apparatus and method |
CN103419118A (en) * | 2013-07-16 | 2013-12-04 | 刘高平 | Grinding and polishing method |
-
1995
- 1995-12-11 JP JP34637895A patent/JPH09155724A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0845327A2 (en) * | 1996-11-27 | 1998-06-03 | Shuji Kawasaki | Buffing apparatus and method |
EP0845327A3 (en) * | 1996-11-27 | 1998-09-30 | Shuji Kawasaki | Buffing apparatus and method |
TR199701398A3 (en) * | 1996-11-27 | 1999-10-21 | Shuji Kawasaki | Wet type polishing method, accumulation coating method, soot polishing method, soot polishing equipment, soot surface treatment method, plug polishing equipment work support unit and polishing environment |
CN103419118A (en) * | 2013-07-16 | 2013-12-04 | 刘高平 | Grinding and polishing method |
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