JPH09150103A - Box type cabinet for liquid chemical processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To assure the safety of an operator at the time of maintenance work, such as filter exchange, by executing gas discharge of the entire part at the time of operating a liquid crystal processing section, executing local discharge at the time of the maintenance work and executing sufficient discharge at the time of carrying out a liquid chemical processing operation. SOLUTION: A rotary damper 17 is opened and a sliding damper 18 are closed to suck and discharge the atmosphere of a liquid chemical processing section 1 into a piping 10 for discharge through a discharge port 7 and to such the atmosphere in a box 3 through the entire discharge port 12 into a piping 10, thus discharging the gases over the entire apart while the substrate is subjected to liquid chemical processing in the liquid chemical processing section 1 of this liquid chemical processing device. At the time of carrying out the maintenance work, for example, the work to exchange the filter F, the rotary damper 16 is closed and the sliding damper 18 is opened by a manual operation, to stop the discharge through the discharge port 7 and the discharge port 12 for the discharge over the entire part, by which the ambient liquid chemical atmosphere of the filter F is locally discharged through the discharge port 14 for local discharge.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical liquid processing apparatus, such as a spin coater, a spin developer, and a spin scrubber, which supplies a chemical liquid such as a coating liquid, a developing liquid and a cleaning liquid to the surface of the substrate for processing. Pipes and filters for supplying and draining chemicals, such as pipes such as filters, air valves and flow meters, chemicals tanks and drain collection containers installed inside or separately below the chemicals treatment part where chemicals treatment is performed. Box type cabinet with built-in etc.

[0002]

2. Description of the Related Art In chemical processing equipment such as spin coaters and spin developers, chemicals such as coating liquid and developing liquid are supplied to the chemical processing part where the chemical processing of the substrate is performed, and drains discharged from the chemical processing part are collected. As shown in FIG. 2, the chemical treatment unit 1 is provided for arranging plumbing and piping equipment such as a filter, an air valve, and a flow meter, and for accommodating a chemical fluid tank, a drain recovery tank, and the like. A box-type cabinet 2 is provided below. In FIG. 2, the devices / equipment and cabinet 2 of the chemical treatment unit 1 are shown.
Illustration of internal piping, piping equipment, tanks, etc. is omitted.

The chemical treatment apparatus is provided with an exhaust device for exhausting the atmosphere of the chemical treatment unit 1 and the atmosphere of the box 3 of the cabinet 2. That is, the exhaust pipe 4 which is connected to an exhaust pump (not shown) in a flow path is disposed behind the sealed box 3, and the exhaust port 7 is provided on the bottom surface 5 of the chemical treatment unit 1 and the back surface 6 of the box 3. , 8 have been opened respectively. Then, the atmosphere of the chemical treatment part 1 is sucked into the exhaust pipe 4 through the exhaust port 7, and the atmosphere inside the box 3 of the cabinet 2 is sucked into the exhaust pipe 4 through the exhaust port 8 so that the exhaust pipe 4 is exhausted. Exhaust is performed through.

By the way, the front door 9 of the cabinet 2
Is normally closed, but when replacing the filter F, maintaining piping equipment such as air valves and flow meters, or replacing the chemical liquid tank or drain recovery tank, Open the door and work. Then, especially when the filters and tanks are replaced, the vapor of the chemical liquid leaks into the box 3 and is filled.

[0005]

However, in the conventional cabinet 2, the inside of the box 3 is only exhausted through the exhaust port 8 opened in the back surface 6 of the box 3, so that when the door 9 is opened, the filter is opened. The chemical atmosphere filled with a high concentration around F and the like could not be effectively discharged through the exhaust port 8. For this reason, when performing maintenance work such as replacement of filters and tanks, there is a risk that the worker may suck the chemical liquid atmosphere, which is a problem in terms of work safety.

The present invention has been made in view of the above circumstances, and in the chemical treatment apparatus, the chemical atmosphere in the box is effectively discharged during maintenance work such as replacement of filters and tanks. An object of the present invention is to provide a box-type cabinet that can ensure the safety of workers and that allows the necessary and sufficient exhaust of the inside of the box to be performed when the chemical liquid processing operation is being performed in the chemical liquid processing section. And

[0007]

According to the first aspect of the present invention,
The box type cabinet of the chemical liquid processing device is provided below the chemical liquid processing unit where the chemical liquid processing of the object to be processed is performed, and has a box type, and has a chemical liquid supply system and a drain recovery system inside, that is, a chemical liquid supply pipe or A drain collection pipe, a filter, an air valve, piping equipment such as a flow meter, a chemical solution tank, a drain collection tank, etc. are provided, and an exhaust device having an exhaust port for exhausting the entire inside of the box is provided. There is. Further, the exhaust device is provided with an exhaust port for local exhaust for locally exhausting the atmosphere inside the box, and exhausts all through the exhaust port for general exhaust when the chemical treatment unit is in operation, and exhausts the local exhaust during maintenance work. It is characterized in that exhaust switching means is provided for selectively switching the exhaust passage so that local exhaust is performed through the exhaust port for use.

According to a second aspect of the present invention, in the box type cabinet according to the first aspect, an enclosure is provided at a place where the atmosphere inside the box is to be locally exhausted, and the exhaust port for local exhaust is provided in the enclosure. Is provided.

In the box-type cabinet of the invention according to claim 1 having the above-mentioned structure, when the object to be processed is being processed by the chemical processing part of the chemical processing device, the inside of the box is passed through the exhaust port for exhausting the whole by the exhaust device. The whole atmosphere is exhausted. At this time, exhaust is not performed through the exhaust port for local exhaust. When performing maintenance work such as replacement of filters and tanks, the exhaust passage is switched by the exhaust switching means to stop the exhaust of exhaust air through the exhaust port for general exhaust, and the atmosphere inside the box is exhausted through the exhaust port for local exhaust. Exhausted locally. Therefore, even if the vapor of the chemical liquid leaks out around the filters and tanks during replacement work, the chemical atmosphere filled with high concentration around the filters and tanks is exhausted locally through the exhaust port for local exhaust. This allows it to be effectively removed from the box.

In the box-type cabinet of the invention according to claim 2, since the enclosure is arranged at a location where local exhaust is to be performed, such as around a filter or a tank, the enclosure prevents diffusion of the chemical liquid atmosphere. Therefore, the chemical atmosphere is more effectively exhausted through the local exhaust outlet provided in the enclosure.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The best embodiment of the present invention will be described below with reference to FIG.

FIG. 1 is a diagram showing an example of a schematic structure of a chemical liquid processing apparatus. As with FIG. 2, devices and equipment of the chemical liquid processing unit, pipes and pipe equipment in a cabinet, tanks and the like are shown. Is omitted. Further, the members already described with reference to FIG. 2 are denoted by the same reference numerals as those used in FIG. 2 in FIG.

Also in the chemical liquid processing apparatus shown in FIG. 1, an exhaust pipe 10 which is connected to an exhaust pump (not shown) in a flow path is arranged behind the box 3 of the cabinet 2 so that the chemical liquid processing unit 1 has An exhaust port 7 for exhausting the atmosphere of the chemical treatment unit 1 is provided on the bottom surface 5, and the box 3 is also provided.
An exhaust port 12 for exhausting the entire atmosphere inside the box 3 is provided on the rear surface 11 of the box. In this device, an enclosure 13 is provided at a location where the atmosphere inside the box 3 should be locally exhausted, for example, so as to surround the filter F, and the enclosure 13 is provided with a local exhaust outlet 14. ing. And the exhaust port 1 for local exhaust
4 communicates with the exhaust pipe 10 through the local exhaust pipe 15. Further, the exhaust pipe 10 has a rotary damper 17 in a pipe line between a connection position with the local exhaust pipe 15 and a connection position with the whole exhaust pipe 16 provided with the whole exhaust port 12. In addition to being installed, a slide damper 18 is installed in the conduit of the local exhaust pipe 15. The type of the damper provided in each of the pipelines of the exhaust pipe 10 and the local exhaust pipe 15 may be appropriately selected in relation to the operation space.

In the chemical liquid processing apparatus shown in FIG. 1, when the chemical liquid processing unit 1 is processing the substrate with the chemical liquid, the rotary damper 17 is opened, the slide damper 18 is closed, and the chemical liquid processing unit 1 is exhausted through the exhaust port 7. The atmosphere is sucked into the exhaust pipe 4 to be exhausted, and the atmosphere inside the box 3 is sucked into the exhaust pipe 4 through the exhaust port 12 for total exhaust to exhaust the entire atmosphere. When performing the maintenance work, for example, the replacement work of the filter F, the operator manually closes the rotary damper 17 to close the slide damper 1.
8 is opened to stop the exhaustion through the exhaust port 7 and the exhaust port 12 for general exhaustion, and the chemical atmosphere around the filter F is locally exhausted through the exhaust port 14 for local exhaustion. As a result, the chemical liquid atmosphere around the filter F is intensively sucked into the local exhaust pipe 15, and the exhaust pipe 1
It will pass 0 and be effectively exhausted.

When the enclosure 13 is arranged so as to surround the filter F as in the above-described embodiment, the enclosure 13 is provided.
Since the diffusion of the chemical atmosphere is prevented by this, the chemical atmosphere is exhausted more effectively, but this enclosure is not necessarily provided. Further, actuators may be added to the dampers 17 and 18, and the exhaust passages can be switched by the dampers by a switch operation. Further, in the above-described embodiment, the atmosphere to be locally exhausted is the atmosphere around the filter F, but the location to be locally exhausted is the atmosphere around the chemical liquid tank or the drain recovery tank (neither is shown). Etc., also,
There may be a plurality of places.

[0016]

When the box-type cabinet of the invention according to claim 1 is used, the chemical atmosphere in the box can be effectively discharged at the time of maintenance work such as replacement of filters and tanks. The safety of the operator who performs the operation is ensured, and when the chemical liquid processing operation is being performed in the chemical liquid processing section,
Exhaust in the box is carried out as necessary and sufficient as usual.

In the box type cabinet according to the second aspect of the present invention, the local exhaust of the chemical liquid atmosphere through the local exhaust outlet is made more effective.

[Brief description of the drawings]

FIG. 1 shows an example of a schematic configuration of a chemical liquid processing apparatus equipped with a box-type cabinet according to the present invention, which shows devices and equipment of a chemical liquid processing unit, pipes and piping equipment in a cabinet, tanks, etc. It is a side sectional view shown in the state where illustration was omitted.

FIG. 2 is a side sectional view showing an example of a schematic configuration of a conventional chemical liquid processing apparatus including a box-type cabinet in a state similar to FIG.

[Explanation of symbols]

 1 Chemical Treatment Section 2 Cabinet 3 Box 10 Exhaust Pipe 12 Exhaust Exhaust Port 13 Enclosure 14 Local Exhaust Exhaust Port 15 Local Exhaust Pipe 16 Overall Exhaust Pipe 17 Rotary Damper 18 Slide Damper

Claims (2)

[Claims] 1. A box type is provided below a chemical solution processing unit for processing a chemical solution of an object to be processed, and a chemical solution supply system and a drain recovery system are provided therein, and the inside of the box is exhausted entirely. In a box-type cabinet of a chemical treatment device, which comprises an exhaust device having an exhaust port for exhausting the entire exhaust gas, the exhaust device is provided with an exhaust port for local exhaust for locally exhausting the atmosphere inside the box. An exhaust gas switching means is provided for selectively switching the exhaust path so that the exhaust gas is exhausted through the exhaust port for general exhaust when the chemical liquid processing section is in operation and the local exhaust is exhausted through the exhaust port for local exhaust during maintenance work. A box-type cabinet for chemical processing equipment. 2. A box-type cabinet for a chemical treatment apparatus according to claim 1, wherein an enclosure is provided at a location where the atmosphere inside the box is to be locally exhausted, and an exhaust port for local exhaust is provided in the enclosure.