JPH09139112A - Thick film conductor composition - Google Patents

Thick film conductor composition

Info

Publication number
JPH09139112A
JPH09139112A JP32223995A JP32223995A JPH09139112A JP H09139112 A JPH09139112 A JP H09139112A JP 32223995 A JP32223995 A JP 32223995A JP 32223995 A JP32223995 A JP 32223995A JP H09139112 A JPH09139112 A JP H09139112A
Authority
JP
Japan
Prior art keywords
conductor
glass component
composition
thick film
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32223995A
Other languages
Japanese (ja)
Inventor
Hideaki Baba
秀明 馬場
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP32223995A priority Critical patent/JPH09139112A/en
Publication of JPH09139112A publication Critical patent/JPH09139112A/en
Pending legal-status Critical Current

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  • Parts Printed On Printed Circuit Boards (AREA)
  • Conductive Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a composition in an insulation board including a glass component or an insulation board forming a through hole conductor including the glass component in which dispersion and exudation of a glass component to a conductor film critical face or segregation of the glass component to the conductor film surface is prevented, soldering wettability is better maintained, electrical conductivity with a through hole conductor is good, and any other required characteristic such as strength of adhesive bending or area resistance value is not affected. SOLUTION: In a thick film conductor composition comprising dispersing at least one type of fine powder of silver, palladium, and platinum and minute powder of alloy of these metals and an inorganic bonding material in an organic vehicle, Ni or a Ni compound is contained by 1 to 5wt.% of all amounts of the thick film conductor composition by means of Ni metal conversion.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、ガラス成分を含有
する絶縁基板またはこれにスルーホール導体を形成した
絶縁基板の表面に印刷して電気回路を形成するための厚
膜導体組成物に関するものである。
TECHNICAL FIELD The present invention relates to a thick film conductor composition for forming an electric circuit by printing on the surface of an insulating substrate containing a glass component or an insulating substrate having a through hole conductor formed thereon. is there.

【0002】[0002]

【従来の技術】厚膜導体組成物は、銀、パラジウム、白
金等の貴金属微粉末またはこれら貴金属の合金微粉末の
うちの少なくとも1種と、微細な無機結合材とを有機ビ
ヒクルとともに混練してなるペースト状の組成物であっ
て、絶縁基板もしくはスルーホール導体を形成した絶縁
基板上にスクリーン印刷等の印刷手段で塗布し、750
乃至950℃の温度で焼成して、該基板上に導電性被膜
を形成し、半導体素子を接合するための導体被膜とし
て、あるいは電気回路や抵抗体の電極として使用され
る。
2. Description of the Related Art Thick film conductor compositions are prepared by kneading at least one of fine powders of noble metals such as silver, palladium, platinum or the like, or fine powders of alloys of these noble metals with a fine inorganic binder together with an organic vehicle. 750, which is a paste-like composition comprising: an insulating substrate or an insulating substrate having a through-hole conductor formed thereon, by a printing means such as screen printing.
It is fired at a temperature of from 950 ° C. to 950 ° C. to form a conductive film on the substrate and is used as a conductor film for joining a semiconductor element or as an electrode of an electric circuit or a resistor.

【0003】従来、この種の目的のために使用される絶
縁基板材料としてはアルミナを主体とする基板材料が多
用されていたが、近年、内層導体被膜と表面導体被膜と
を多層に同時焼成することを目的としてアルミナよりも
焼成可能温度が低いガラス成分を含有する基板材料が注
目されておりその開発が行われている。
Conventionally, as an insulating substrate material used for this kind of purpose, a substrate material mainly composed of alumina has been widely used, but in recent years, an inner conductor coating and a surface conductor coating are simultaneously fired in multiple layers. For that purpose, a substrate material containing a glass component whose firing temperature is lower than that of alumina has been attracting attention and is being developed.

【0004】また、このようなガラス成分を含有する絶
縁基板において、上記した内層導体被膜と表面導体被膜
との電気的導通を得るためのスルーホール導体を形成さ
せる場合には、その焼成時の収縮率を基板材料の収縮率
に近づけるために基板材料に含有されるガラス成分組成
と同様またはこれに近いガラス成分組成を含有させたス
ルーホール導体の開発が進められている。
Further, in the case of forming a through-hole conductor for obtaining electrical continuity between the inner layer conductor film and the surface conductor film on an insulating substrate containing such a glass component, shrinkage during firing is required. In order to bring the rate close to the shrinkage rate of the substrate material, the development of a through-hole conductor containing a glass component composition similar to or close to the glass component composition contained in the substrate material is underway.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記し
たガラス成分を含有する絶縁基板またはこれと同様なガ
ラス成分を含有するスルーホール導体を形成した絶縁基
板上に従来から用いられている厚膜導体組成物を印刷、
焼成することにより導体被膜を形成させようとすると、
焼成過程において基板中もしくはスルーホール導体中の
ガラス成分が形成中の導体被膜内に拡散してその表面ま
で到達し、形成された導体被膜はその重要な要求特性の
1つであるはんだ濡れ性を著しく悪化させたり、既に形
成されている表面導体被膜との界面にガラス成分が偏析
してスルーホール導体との電気的導通を阻害するといっ
た問題を生ずるのでその改善策が求められている。
However, the thick film conductor composition conventionally used on an insulating substrate containing the above-mentioned glass component or an insulating substrate on which a through-hole conductor containing the same glass component is formed. Print things,
If you try to form a conductor coating by firing,
During the firing process, the glass component in the substrate or in the through-hole conductor diffuses into the conductor coating being formed and reaches its surface, and the formed conductor coating has one of the important required properties, solder wettability. Since there is a problem that the glass component is remarkably deteriorated or the glass component is segregated at the interface with the already formed surface conductor coating film to hinder the electrical conduction with the through-hole conductor, an improvement measure is required.

【0006】本発明は、上記した問題点を解決するため
になされたものであって、ガラス成分の導体被膜表面へ
の拡散浸出、または導体被膜界面へのガラス成分の偏析
を抑止し、ガラス成分が導体被膜表面に到達することな
く、したがってはんだ濡れ性が良好に保たれ、かつスル
ーホール導体との電気的導通性が良好で、接着強度や面
積抵抗値ならびに耐はんだ性などの他の特性に悪影響を
与えることのない厚膜導体組成物を提供することを目的
とするものである。
The present invention has been made to solve the above-mentioned problems, and suppresses the diffusion and leaching of the glass component to the surface of the conductor coating, or the segregation of the glass component at the interface of the conductor coating, and the glass component Does not reach the surface of the conductor coating, so that the solder wettability is kept good, the electrical conductivity with the through-hole conductor is good, and the adhesive strength, area resistance value, and other characteristics such as solder resistance are improved. It is an object of the present invention to provide a thick film conductor composition which does not have a bad influence.

【0007】[0007]

【課題を解決するための手段】上記した目的を達成する
ため本発明は、銀、パラジウム、白金の微粉末またはこ
れらの金属の合金の微粉末のうちの少なくとも1種と、
無機結合材とを有機ビヒクル中に分散してなる厚膜導体
組成物において、無機結合剤中にさらにニッケルもしく
はニッケル化合物をNi金属換算で厚膜導体組成物全量
の1〜5重量%含有させてなることを特徴とする厚膜導
体組成物である。
To achieve the above object, the present invention provides at least one of fine powder of silver, palladium, platinum or fine powder of alloy of these metals,
In a thick film conductor composition obtained by dispersing an inorganic binder in an organic vehicle, nickel or a nickel compound is further contained in the inorganic binder in an amount of 1 to 5% by weight based on the total amount of the thick film conductor composition in terms of Ni metal. And a thick film conductor composition.

【0008】[0008]

【発明の実施の形態】上記したように、本発明は、銀、
パラジウム、白金等の貴金属またはこれら貴金属の合金
と無機結合剤および有機ビヒクルとからなる厚膜導体組
成物中における無機結合材中に、さらにニッケルもしく
はニッケル化合物を含有させるものである。本発明にお
いて、無機結合材中に含有させるニッケル分としてニッ
ケル化合物を使用する場合には、ニッケル酸化物の他、
有機ニッケル化合物を使用することもできる。
BEST MODE FOR CARRYING OUT THE INVENTION As described above, the present invention provides silver,
The inorganic binder in the thick film conductor composition comprising a precious metal such as palladium or platinum or an alloy of these precious metals, an inorganic binder and an organic vehicle further contains nickel or a nickel compound. In the present invention, when using a nickel compound as the nickel component to be contained in the inorganic binder, in addition to nickel oxide,
It is also possible to use organonickel compounds.

【0009】また本発明の厚膜導体組成物において、無
機結合材中のニッケルまたはニッケル化合物の含有量
を、Ni金属換算で厚膜導体組成物全量の1乃至5重量
%と限定したのは、1重量%未満では基板もしくはスル
ーホール導体からの導体被膜中へのガラス成分の拡散を
抑止する効果が十分でなく、また5重量%を超えるとす
ると導体被膜における面積抵抗値が増加してしまう上
に、導体表面に析出してはんだ濡れ性の悪化を招くよう
になるからである。
In the thick film conductor composition of the present invention, the content of nickel or nickel compound in the inorganic binder is limited to 1 to 5% by weight of the total amount of the thick film conductor composition in terms of Ni metal. If it is less than 1% by weight, the effect of suppressing the diffusion of the glass component from the substrate or through-hole conductor into the conductor coating is not sufficient, and if it exceeds 5% by weight, the sheet resistance value in the conductor coating increases. In addition, it is deposited on the surface of the conductor and causes deterioration of solder wettability.

【0010】さらに、一般に厚膜導体組成物中には、接
着強度の向上やはんだ濡れ性の改善の目的で、銅化合
物、ビスマス化合物、またはモリブデン化合物等を含有
させることが行われているが、本発明の組成物において
用いられるニッケル、またはニッケル化合物は、このよ
うな強度向上およびはんだ濡れ性の改善に用いられる化
合物と同時に用いても何ら差支えない。
Further, in general, a thick film conductor composition is made to contain a copper compound, a bismuth compound, a molybdenum compound or the like for the purpose of improving adhesive strength and solder wettability. The nickel or nickel compound used in the composition of the present invention may be used at the same time as the compound used for improving the strength and the solder wettability.

【0011】このようなニッケルまたはニッケル化合物
を含有する本発明による厚膜導体組成物を、ガラス成分
を含有する絶縁基板、またはこれにガラス成分を含有す
るスルーホール導体を形成した絶縁基板上に印刷塗布
し、乾燥後常法にしたがって750乃至950℃の温度
範囲で焼成すると、導体被膜中に分散しているニッケル
またはニッケル合金の持つ抑制作用によって導体被膜中
の貴金属成分の焼結が抑制され、その結果生成した微細
な結晶粒界に基板およびスルーホール導体中のガラス成
分が捕捉されるために、拡散したガラス成分の導体被膜
表面への浸出が防止され、加えて導体被膜のスルーホー
ル導体との界面におけるガラス成分の偏析も抑止される
ので、導体表面におけるはんだ濡れ性が低下することな
く、スルーホール導体による電気的な導通を支障なく行
うことができる。そして、上記したように本発明におい
てニッケルまたはニッケル合金の添加によって導体被膜
の基板への接着強度や面積抵抗値に対する悪影響を与え
ることがない。
The thick film conductor composition according to the present invention containing such a nickel or nickel compound is printed on an insulating substrate containing a glass component or an insulating substrate on which a through-hole conductor containing a glass component is formed. When applied and dried and then baked in a temperature range of 750 to 950 ° C. according to a conventional method, the suppressing action of nickel or nickel alloy dispersed in the conductor coating suppresses sintering of the noble metal component in the conductor coating, Since the glass components in the substrate and through-hole conductor are captured by the resulting fine grain boundaries, leaching of the diffused glass component to the surface of the conductor coating is prevented, and in addition to the through-hole conductor of the conductor coating, Since segregation of glass components at the interface of the conductor is also suppressed, the solder wettability on the conductor surface does not deteriorate and Electrical conduction can be carried out without hindrance by. As described above, in the present invention, the addition of nickel or nickel alloy does not adversely affect the adhesive strength of the conductor coating to the substrate and the sheet resistance value.

【0012】[0012]

【実施例】次に本発明の実施例について説明する。本発
明はこの実施例に限定されるものでないことはいうまで
もない。
Next, an embodiment of the present invention will be described. It goes without saying that the present invention is not limited to this embodiment.

【0013】AgとPdの比率を81:19とした貴金
属粉末に、結合材としてアルミナ粉末を0.5重量%
と、これにニッケル酸化物粉末をNi金属換算で組成物
の全量の1重量%から5重量%の範囲に当たる量で添加
量を変えて加えた混合粉末と、有機ビヒルルからなる本
発明の厚膜導体組成物試料1、2および3を作製した。
また比較試料として、上記厚導体膜組成物においてそれ
ぞれニッケル酸化物含有量を零とした組成物比較試料1
とニッケル含有量を6重量%とした組成物比較試料2と
を作製した。
0.5% by weight of alumina powder as a binder is added to noble metal powder having a ratio of Ag and Pd of 81:19.
A thick film of the present invention comprising an organic bihilur and a mixed powder in which nickel oxide powder is added to the composition in an amount corresponding to a range of 1 wt% to 5 wt% of the total amount of the composition in terms of Ni metal Conductor composition samples 1, 2 and 3 were prepared.
As a comparative sample, a composition comparative sample 1 in which the nickel oxide content in each of the above thick conductor film compositions was zero
And a composition comparative sample 2 having a nickel content of 6% by weight were prepared.

【0014】これらの厚膜導体組成物を、アルミナ:ガ
ラス成分=50:50重量比よりなるガラス−セラミッ
ク基板に上記と同一のガラス成分を10重量%含有する
スルーホール導体を100μm径で形成した絶縁基板上
に、スクリーン印刷によって2mm×2mm塗布し、線
幅600μm×60mmのパターンで塗布し、乾燥した
後、850℃の温度で10分間大気中での焼成を2回繰
り返して行い、導体被膜を形成した。焼成を2回行った
理由は、通常の回路設計プロセスにおいては、導体を焼
成した後、抵抗体の印刷および焼成が行われるために導
体被膜は合計2回の加熱焼成を受けることになるからで
ある。これによって形成された導体被膜の膜厚は10μ
mであった。
These thick film conductor compositions were formed on a glass-ceramic substrate having an alumina: glass component = 50: 50 weight ratio to form a through-hole conductor containing 100% by weight of the same glass component as described above with a diameter of 100 μm. 2 mm x 2 mm is applied by screen printing on an insulating substrate, a pattern with a line width of 600 µm x 60 mm is applied, dried, and then baked in the atmosphere at a temperature of 850 ° C for 10 minutes twice, and a conductor film is formed. Was formed. The reason why the firing is performed twice is that, in a normal circuit design process, after the conductor is fired, the conductor coating is subjected to the heating and firing twice in total because the resistors are printed and fired. is there. The thickness of the conductor coating formed by this is 10μ
m.

【0015】試料の表面観察を実体顕微鏡を用いて行
い、基板中のガラス成分が導体被膜表面に到達したこと
を示す粒状ガラスの有無について調べた。また、はんだ
濡れ性の評価を導体被膜を形成した基板を235℃の溶
融はんだ中に浸漬して5秒間保持した後、目視により観
察して行った。
The surface of the sample was observed by using a stereoscopic microscope, and the presence or absence of granular glass showing that the glass component in the substrate reached the surface of the conductor film was examined. Further, the solder wettability was evaluated by visually observing the substrate on which the conductor coating was formed, after immersing the substrate in molten solder at 235 ° C. for 5 seconds.

【0016】また、接着強度の評価を2mm×2mmの
導体被膜上に0.65mmの直径を有する錫めっき銅線
をはんだ付けし、基板垂直方向の引張り強度を測定する
ことにより行った。さらにまた、面積抵抗値の評価を6
00μm×60mmのパターン抵抗値を測定することに
より行った。
The adhesion strength was evaluated by soldering a tin-plated copper wire having a diameter of 0.65 mm on a conductor coating of 2 mm × 2 mm and measuring the tensile strength in the direction perpendicular to the substrate. Furthermore, the evaluation of the sheet resistance value is 6
It was performed by measuring a pattern resistance value of 00 μm × 60 mm.

【0017】また、スルーホール導体と表面導体被膜と
の電気的導通の評価は、走査電子顕微鏡を用いた断面観
察によりスルーホール導体と表面導体被膜との界面にお
けるガラス層の有無について観察することによって行っ
た。以上の評価方法により、各導体被膜の特性評価を行
った結果を表1に示す。
The electrical continuity between the through-hole conductor and the surface conductor coating is evaluated by observing the presence or absence of a glass layer at the interface between the through-hole conductor and the surface conductor coating by observing a cross section using a scanning electron microscope. went. Table 1 shows the results of the characteristic evaluation of each conductor film by the above evaluation method.

【0018】[0018]

【表1】 試 料 Ni酸化物量 表面粒状 はんだ濡れ 界面ガラ 接着強度 面積抵抗 (金属換算)ガラス有 性観察* ス層の有 値 値 (重量%) 無の観察 (目視) 無の観察 (kg) (mΩ/sq) 本発明1 1.0 なし ○ なし 4.5 22.4 本発明2 3.0 なし ○ なし 4.6 23.2 本発明3 5.0 なし ○ なし 4.3 24.5 比較例1 0.0 あり × あり 4.6 21.9 比較例2 6.0 なし × なし 4.4 36.8 *○は良好、×は不良を示す。[Table 1] Sample Ni oxide amount Surface grain Solder wetting Interface rattle Adhesive strength Area resistance (metal conversion) Glass property observation * Value of glass layer (% by weight) No observation (Visual) No observation (kg) (mΩ / sq) Invention 1 1.0 None ○ None 4.5 22.4 Invention 2 3.0 None ○ None 4.6 23.2 Invention 3 5.0 None ○ None 4.3 24.5 Comparative Example 1 0.0 Yes x Yes 4.6 21.9 Comparative Example 2 6.0 No x No None 4.4 36.8 * ○ means good, and × means bad.

【0019】表1に示す結果から、本発明1、2および
3の導体組成物は、比較例1、すなわちニッケル酸化物
を含有させない導体組成物に比べ、明らかにはんだ濡れ
性が向上しており、かつスルーホール導体の界面にガラ
ス層が観察されないことから、基板もしくはスルーホー
ル導体からのガラス拡散成分の導体表面への拡散および
スルーホール導体からのガラス成分の導体被膜界面への
偏析が同時に抑制され、したがって電気的導通を阻害さ
れることがなく、しかも接着強度や面積抵抗値などの他
の特性値についても何等悪影響を及ぼすことがないこ
と、また比較例2のようにニッケル酸化物の含有量が本
発明の量を超えた場合には、ガラス成分の拡散抑止効果
はあるものの、はんだ濡れ性が低下し、また面積抵抗値
も増大することが分かる。
From the results shown in Table 1, the conductor compositions of the present inventions 1, 2 and 3 are clearly improved in solder wettability as compared with Comparative Example 1, that is, the conductor composition containing no nickel oxide. Moreover, since no glass layer is observed at the interface of the through-hole conductor, the diffusion of the glass diffusion component from the substrate or the through-hole conductor to the conductor surface and the segregation of the glass component from the through-hole conductor to the conductor coating interface are suppressed simultaneously. Therefore, electrical conduction is not hindered, and other characteristic values such as adhesive strength and sheet resistance are not adversely affected, and nickel oxide is contained as in Comparative Example 2. When the amount exceeds the amount of the present invention, it has the effect of suppressing the diffusion of the glass component, but the solder wettability decreases and the sheet resistance value also increases. That.

【0020】[0020]

【発明の効果】以上説明したように、本発明による厚膜
導体組成物は、導体被膜中にガラス成分を用いた基板も
しくはスルーホール導体から拡散されるガラス成分を捕
捉することによって、導体被膜表面へのガラス成分の到
達を防止し、同時にスルーホール導体界面へのガラス成
分の偏析を抑止することができるので、得られた導体被
膜とスルーホール導体との間の電気的な導通を良好に保
つことができ、かつはんだ濡れ性も良好で、また接着強
度や面積抵抗値などの他の特性に悪影響を与えることが
ない等の優れた利点を有するために、ガラス成分を用い
た基板またはこれに同様のガラス成分を用いたスルーホ
ール導体を形成した基板における半導体素子連結用の導
体被膜形成用組成物または回路電極形成用の導体組成物
として用いて極めて有用で工業的効果の大きい発明であ
るといえる。
As described above, the thick film conductor composition according to the present invention captures the glass component diffused from the substrate or the through-hole conductor in which the glass component is used in the conductor film, and thus the conductor film surface is obtained. Since it is possible to prevent the glass component from reaching the through hole conductor and at the same time to suppress the segregation of the glass component at the interface of the through-hole conductor, it is possible to maintain good electrical continuity between the obtained conductor film and the through-hole conductor. In addition, it has good solder wettability and does not adversely affect other properties such as adhesive strength and sheet resistance. Use as a conductor film forming composition for connecting semiconductor elements or a conductor composition for forming circuit electrodes on a substrate on which a through-hole conductor using the same glass component is formed. It can be said that is a great invention of useful and industrial effect.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 銀、パラジウム、白金の微粉末またはこ
れらの金属の合金の微粉末のうちの少なくとも1種と、
無機結合材とを有機ビヒクル中に分散してなる厚膜導体
組成物において、該無機結合剤中さらにニッケルもしく
はニッケル化合物をNi金属換算で厚膜導体組成物全量
の1〜5重量%含有させてなることを特徴とする厚膜導
体組成物。
1. At least one of fine powder of silver, palladium, platinum or fine powder of an alloy of these metals,
In a thick film conductor composition in which an inorganic binder is dispersed in an organic vehicle, nickel or a nickel compound is further contained in the inorganic binder in an amount of 1 to 5% by weight based on the total amount of the thick film conductor composition in terms of Ni metal. A thick film conductor composition comprising:
JP32223995A 1995-11-16 1995-11-16 Thick film conductor composition Pending JPH09139112A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32223995A JPH09139112A (en) 1995-11-16 1995-11-16 Thick film conductor composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32223995A JPH09139112A (en) 1995-11-16 1995-11-16 Thick film conductor composition

Publications (1)

Publication Number Publication Date
JPH09139112A true JPH09139112A (en) 1997-05-27

Family

ID=18141477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32223995A Pending JPH09139112A (en) 1995-11-16 1995-11-16 Thick film conductor composition

Country Status (1)

Country Link
JP (1) JPH09139112A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7157023B2 (en) 2001-04-09 2007-01-02 E. I. Du Pont De Nemours And Company Conductor compositions and the use thereof
US7470380B2 (en) 2003-04-01 2008-12-30 E.I. Du Pont De Nemours And Company Conductor compositions for use in electronic circuits

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7157023B2 (en) 2001-04-09 2007-01-02 E. I. Du Pont De Nemours And Company Conductor compositions and the use thereof
US7914709B2 (en) 2001-04-09 2011-03-29 E.I. Du Pont De Nemours And Company Conductor compositions and the use thereof
US7470380B2 (en) 2003-04-01 2008-12-30 E.I. Du Pont De Nemours And Company Conductor compositions for use in electronic circuits
US8257618B2 (en) 2003-04-01 2012-09-04 E I Du Pont De Nemours And Company Conductor composition V

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