JPH09120414A - Etching correction shape generating device for lead frame - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enable an operator to intuitively carry out an etching correction task by adjusting a correction shape so as to secure a least gap necessary for progress of the etching to an interference part. SOLUTION: An offset segment generation device 12 of this correction shape generating device 10 has the same basic function as an ordinary two-dimensional CAD device and generates such optical offset segments as an offset segment by offsetting a reference line prescribing the outline shape of a lead frame in the pattern expanding direction by a target dimension, a decision offset segment by offsetting the reference line over the target dimension, etc. A logical operation processor 14 performs a graphic logical operation, and an offset adjustment device 16 adjust a correction shape to secure a least gap to an extracted interference part. Then a tip part shape where a reference point is set is superposed on a lead tip part where a reference point is also set by matching both reference points with each other by a composite device 18.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an etching correction shape forming apparatus for a lead frame, and more particularly, in a lead frame designing process by a CAD apparatus, a lead pattern, a tip portion thereof and the like are changed in size to form a mask pattern. The present invention relates to an etching correction shape creation device for a lead frame, which is suitable for use when performing etching correction work.

[0002]

2. Description of the Related Art In a semiconductor device, a lead frame is used for electrically connecting an IC (integrated circuit) chip to be mounted and external wiring.

FIG. 20 shows an example of a lead frame for one chip as viewed from one side. A die pad (island) 10 for mounting a chip (not shown) is located at the center of the lead frame. The die pad 10 is supported by an outer frame 12 via a tab suspension bar 14, and an inner lead 16 is arranged around the die pad 10 with its tip close to the die pad 10, and an outer lead continuous with the inner lead 16 is provided. 18 is the above-mentioned outer frame 1 via the dam bar 20 etc.
Supported by 2. A fixing tape 22 made of plastic is attached to the inner lead 16 to prevent the lead 16 from being deformed. In addition,
The broken line in the figure indicates the mold line.

The lead frame as described above is, for example,
It can be manufactured as follows. First, the lead frame pattern is designed. The pattern design of this lead frame is usually CAD (Computer Aided Des
ign) device. After that, using the processing size CAD data corresponding to the designed pattern, the pattern is directly drawn on a glass dry plate or the like by a laser plotter to create an original pattern. This original pattern is
It is created for both the front and back sides of the lead frame.

Then, using the original plate such as the glass as a mask, the resist coated on the metal material such as the copper plate which is the base material of the lead frame is exposed, developed and cured to form a resist pattern, Then, etching is performed to remove the metal material in the exposed portion, and then the attached resist is peeled off to finally obtain the lead frame.

When the lead frame is manufactured by etching as described above, so-called side etching (over-etching) occurs in which the metal material is shaved beyond the resist pattern. Therefore, in the lead frame designing process performed on the CAD device, first, product dimension CAD data corresponding to the pattern of the target product lead frame is created, and then the product dimension CAD data is additionally etched by the side etching. Etching correction processing is performed to add the dimensions and the like to be corrected as a correction margin.

FIG. 21 schematically shows a state of the above-mentioned etching correction processing which is carried out by a conventional etching correction shape creating apparatus. A user input figure shown by a broken line corresponds to a product pattern. Is a reference line that defines the outline shape, the shaded portion corresponds to the metal material portion, and the figure after the correction processing shown by the solid line means the outline after the correction processing. FIG. 21 shows the correction when offsetting in the direction of increasing the width of the interval d as a whole, and by designating the target outline line segment (reference line) and by designating the interval d, each vertex is broken. This means that a solid correction outline (offset line segment) is automatically created by moving from the position.

Further, FIG. 22 shows an etching correction process for the lead tip portion. In this correction process, it is necessary to secure a sufficient width for wire bonding although the lead tip portion is likely to undergo side etching. Is important because there is. As shown in the figure, this tip end correction is made up of a rectangle having a length c indicated by a solid line by designating an interval a in the tip direction, an interval b in the width direction, and an inflection point by a dimension from the tip. The widened portion (correction outline) is similarly created automatically.

As described above, conventionally, in designing the correction shape, the line segment row to be corrected is designated among the line segments forming the outline of the lead frame, and the spacing and bending point to be widened are designated. As a result, an automatic design for automatically moving each vertex has been performed, and automation of this etching correction has been performed by developing a program.

[0010]

However, in the conventional correction shape creating apparatus, the program developed for automating the etching correction work of a certain one kind of lead frame has another shape if the shapes are common to some extent. It can be used as a lead frame as well, but it is necessary to create a new program for lead frames that differ greatly in shape. Therefore, when the types of lead frame products increase and the shapes of them also vary, the types of programs that must be created also increase, which increases the workload of program development. is there.

Even if a large number of programs can be developed, it is necessary to properly use the programs according to the characteristics of the shape when actually performing the etching correction work. Therefore, it is determined which program to use. However, there is another problem that it is not always easy to automate the etching correction work because the skilled worker has to rely on a skilled worker.

When a resist pattern is actually formed on a plate material such as a copper plate and etching is performed using the resist pattern as a mask, the etching does not proceed unless the etching liquid penetrates between the materials. There is a size of the minimum gap that must be secured in order to proceed, but with the conventional automatic etching correction that uniformly sets the offset amount with the predetermined size specified by the operator,
If there is a narrow gap in the original product design pattern, the two offset outlines may interfere with each other and the gap may disappear.
In such a case, there is another problem that the automation of the etching correction as described above is inappropriate.

The present invention has been made to solve the above-mentioned conventional problems, and there is a narrow gap between patterns without developing a program for automating etching correction according to the type of product. Even in the case, the operator can intuitively and easily perform the etching correction work that can secure the minimum gap required for etching, and the lead frame etching correction shape creation device that can reduce the work load is provided. This is the first task.

According to the present invention, the operator can intuitively perform the etching correction work which can make the lead tip have an appropriate correction shape without developing a program for automating the etching correction according to the type of product. A second object is to provide an etching-corrected shape creating apparatus for a lead frame, which can be easily performed with ease and which can reduce the work load.

[0015]

According to the invention of claim 1, CA
In a lead frame etching correction shape creating apparatus that creates an etching correction shape by correcting an outline shape of a lead frame created by D data, a reference line defining the outline shape of the lead frame is set in a direction in which the pattern is widened. A target offset line segment that is the basis of the correction shape is generated at the position where the target dimension is offset, and a determination offset line segment used for interference determination is generated at the position where the reference line is offset beyond the target dimension. Means for generating, extraction means for extracting an interference portion where the generated determination offset line segment intersects with another determination offset line segment, and necessary for advancing etching to the extracted interference portion By adjusting means for adjusting the correction shape so that a minimum gap is ensured, It is obtained by solving the serial first problem.

According to a fifth aspect of the present invention, in a lead frame etching correction shape forming apparatus for correcting an outline shape of a lead frame created by CAD data to create an etching correction shape, a lead having a reference point set therein. A synthesizing unit that superimposes the tip shape whose reference point is set on the tip by matching the reference points with each other, and the correction shape of the lead tip by giving priority to the tip shape with respect to the superimposed figure. And a means for executing a logical operation of a figure, which is to solve the second problem.

[0017]

According to the first aspect of the present invention, a target offset line segment, which is the basis of the correction shape, is generated at a position where the reference line is offset by a target dimension corresponding to the overetching amount, and the reference line Make a line offset to a position beyond the target dimension to generate a judgment offset line segment used for interference judgment, and make sure that the generated judgment offset line segments interfere with each other. In addition, the correction shape can be adjusted so that the minimum gap can be ensured for the interference part, so that the operator can easily recognize the interference part by looking at the display, and properly check the interference part. Since it is possible to adjust the corrected shape of the gap, it is possible to surely adjust the corrected shape appropriately for all the interference portions. In this way, the interference portion is surely extracted and visually recognized, so that the necessary correction shape can be intuitively and uniformly created.

Therefore, since the etching correction work for forming the mask pattern can be performed in a unified manner, the correction shape of the lead frame can be formed without developing a new program for the product different from the conventional products. It is possible to reduce the time required for the actual trial manufacture of the lead frame.

According to a second aspect of the present invention, in the corrected shape creating apparatus according to the first aspect, the extracting means performs a logical operation between figures whose contours are defined by intersecting offset line segments, When it has a function of extracting the interference portion, the interference portion can be easily and surely extracted. Here, as a logical operation, a vector logical operation to be described later and a general “logical product” of figures whose contours are defined by line segments are executed, and the overlapping portion of the two is obtained to extract it as an interference portion. can do.

According to a third aspect of the present invention, in the corrected shape creating apparatus according to the first aspect, the adjusting means changes the offset dimension so that the minimum gap is secured with respect to the extracted interference portion. When the correction shape is provided, for example, only by the operator designating the interference portion, the correction shape in which the minimum gap is secured including the interference portion and the vicinity thereof can be created.

According to a fourth aspect of the present invention, in the corrected shape creating apparatus according to the first aspect, the adjusting means generates an adjusting figure in which the minimum gap is secured for the extracted interference portion, When the figure has a function of performing a logical operation between the figure and the gap between the target offset line segments to obtain a corrected shape in the vicinity of the interference part, between the adjustment figure and the gap between the target offset line segments. By performing the logical operation of the figure for obtaining the "logical sum" with, it is possible to easily create the corrected shape in which the minimum gap is secured over the entire area including the interference portion. As a method of obtaining the above "logical sum", vector logic operation described later can be used.

Further, in the invention of claim 5, the tip shape can be accurately positioned and overlapped with the lead tip of the lead frame, and the tip shape can be prioritized to newly install the lead tip. Since the outer shape (correction shape) is set to a predetermined shape, the shape of the tip portion is formed in advance in a predetermined shape having a width wider than that of the lead tip portion, thereby uniformly and intuitively correcting the lead tip portion. be able to. Therefore, even for a new shape lead frame,
It can be easily corrected without developing a new program. Further, here, the outline of the tip shape can be made a new outer shape by obtaining the "logical sum" between the lead tip and the tip shape. As a specific method therefor, there can be mentioned a Bekult logical operation described later.

Further, at this time, the cost of the correction work can be reduced and automation can be achieved by preliminarily forming a database of various types of lead tips having different shapes and dimensions and storing them.

Next, the algorithm of the logical operation of the graphic applicable to the present invention will be described.

The feature of the logical operation algorithm applicable to the present invention is that, as will be described later, each line segment forming a figure is vector data having a clear direction, and for example, assuming that the right side is the inside of the shape, The reason is that the logical operation of the figure can be performed only by checking the intersection state of the line segment and the intersection of the line segments.

Now, as shown in FIG.
If the line segment of the book has a clear arrow direction (vector direction), it is possible to set the right-handed region and the left-handed region at the intersections of the line segment and the line segment in the area where they intersect. .

Here, considering two quadrangles shown in FIG. 2 in which each line constituting each side has a direction and partially intersects with each other, for example, the right side of the line segment is the inside of the region. If it is defined as, the area corresponding to the area surrounded by the right-handed line segment with respect to the intersection is the so-called "logical product", and the line segment at the boundary of the left-handed area with respect to the intersection becomes the "logical sum". It can be seen that the line segment is equivalent. In the case of this method, as shown in FIG. 3, the "logical difference" can be calculated by simply changing the direction of the line segment of one figure on the right side.

This algorithm can be applied even if the line segment is not necessarily a closed figure because it is only looking at the intersecting state of the interfering line segments. For example, as shown in FIG. 4, a clockwise region can be taken out from four straight lines, and thereby a closed rectangular figure can be created. Further, as shown in FIG. 5, the same calculation can be performed for a combination of a closed figure and a straight line. Further, as described above, since only the intersecting state of the interfering line segments is seen, the same calculation processing can be easily executed by setting the direction of the line segment even for figures including circles, arcs, free curves, etc. I see what I can do. FIG. 6 exemplifies a case where this processing is executed for an ellipse.

As described above, this algorithm is
Since it is only looking at the intersecting state of the interfering line segments, it can be applied to the twisting of one line drawn with one stroke and the extraction of the interference part. For example, as shown in FIG. 7, the twisted portion of one line can be extracted as a clockwise region, and FIG.
As shown in, the interference part of one line can also be extracted as a clockwise region.

The algorithm detailed above has been described for the case where the right side of the line segment is inside the shape, but conversely, the left side of the line segment may be inside the shape. in this case,
The right-handed and left-handed relationships are opposite to those described above.

Hereinafter, a more specific embodiment of the present invention will be described in detail with reference to the drawings.

FIG. 9 is a block diagram showing the schematic arrangement of an etching correction shape creating apparatus according to an embodiment of the present invention.

The corrected shape creating apparatus 10 of this embodiment has the same basic function as that of a normal two-dimensional CAD apparatus, and a reference line defining the outline shape of the lead frame is extended in the pattern expanding direction. An offset line segment generation device 12 capable of offsetting only a target dimension to generate a target offset line segment that is a basis of a corrected shape, and offsetting beyond the target dimension to generate an arbitrary offset line segment such as a determination offset line segment. And a logical operation processing device 14 that executes a logical operation of a graphic described later, an offset adjusting device 16 that adjusts a correction shape so as to secure a minimum gap for the extracted interference portion, and a reference point is set. And a synthesizing device 18 that superimposes the shape of the tip portion having the reference point set on the leading end portion of the lead, which is aligned with the reference point. To have.

Further, the correction shape creating apparatus 10 can exchange data with the storage device 20, and from the storage device 20, the lead frame created by the stored CAD data is stored. It is possible to read outline data and a correction figure such as a tip shape of a lead used as a correction part, and the storage device 20 stores the shape of the corrected lead frame created by the correction shape creation device 10. It is possible to store certain mask pattern data.

The logical operation processing device 14 executes a logical operation of a graphic as described later in detail, and the determination offset line segment generated by the offset line segment generation device 12 becomes another determination offset line segment. The intersecting interference portion is extracted, the correction shape is adjusted for the extracted interference portion in order to secure the minimum gap necessary for advancing the etching, and the overlapping portion is superposed by the synthesizing device 18. It has a function of creating a new outer shape by giving priority to the shape of the tip of the figure.

In the present embodiment, first, each shape corresponding to the product target design pattern of the lead frame input from the storage device 20 is defined by the offset line segment generating device 12 provided in the correction shape creating device 10. In the same method as shown in FIG. 21, for example, the reference offset is set to the position where the pattern is moved in the direction in which the pattern is widened by a dimension exceeding the target dimension corresponding to the overetching dimension. Generate a line segment.
At this time, in a portion where the offset line segments do not interfere with each other and there is no particular problem, a shape composed of a target offset line segment separately generated at a position where the reference line is offset by a target dimension is set as a correction shape.

FIG. 10A schematically shows a part of the outline data of the lead frame read from the storage device 20, and the hatched portion in this figure corresponds to the material side.

A reference line corresponding to the outline of the pattern shown in FIG.
2B shows a state in which a determination offset line segment is generated at a position offset by exceeding the target dimension by 2. In FIG. 10 (B), the reference line of FIG. 10 (A) is shown by a broken line, and the generated judgment offset line segment is shown by a solid line.

By the way, as shown in FIG. 10 (A), when the gap between the patterns is narrow in a part of the design pattern of the lead frame, when the above-mentioned offset line segment is generated, As shown by hatching in FIG. 6B, offset line segments intersect at the narrow portion, and an interference portion where patterns overlap is generated.

In this embodiment, a judgment offset line segment is generated at a position where the reference line defining the outline shape of the lead frame is offset in the direction of pattern widening beyond the target dimension as described above. At this time, if an interference portion is generated in the offset line segment, a minimum gap can be secured for that portion.

That is, as shown in FIG.
If there is an interference portion in the determination offset line segment, the logical operation processing unit 14 executes a logical operation for both offset line segments to obtain the circular arc-shaped interference portion A shown by the solid line in FIG. Extract and display it on the display, for example in different colors. This interference part extraction can be executed in accordance with the vector logic operation algorithm described with reference to FIG.

When the operator recognizes that the interference portion A is generated on the display and gives an instruction to adjust the correction shape to that portion from a keyboard or the like, the correction shape adjusting device 16 secures a minimum gap in that portion. To be,
The offset dimension is changed to generate a new offset line segment, and the new offset line segment is combined with the target offset line segment of the part that has not been changed to create the final corrected shape. In FIG.
The corrected shape of the interference portion created in this way is shown.

The method of automatically creating a pattern in this way will be described in detail. First, in order to secure the minimum gap, as shown conceptually in FIG. Offset from the dimensions once to generate a judgment offset line segment, perform interference check there, and then offset in the opposite direction to the normal offset dimension position as shown in FIG. A method of generating a target offset line segment is adopted. That is, in the first offset, a large amount of offset is performed in order to cause interference of figures. Then, when performing the second offset, the offset dimension is changed from the target value in the section sandwiched by the interference points (start point, end point), and the minimum gap is secured to generate the final shape. This process,
FIG. 13B and FIG. 13B show the case of FIG.
Therefore, (B) corresponds to FIG.

However, on the program, the first offset, the interference point check, and the second offset are continuously performed, so that the processing shown in the flow charts of FIGS. 10 and 11 can be performed. It This offset repeating work is not limited to two times, and the offset dimension can be changed and repeated a plurality of times.

In the corrected shape creating apparatus 10 of this embodiment,
In addition to the offset adjustment function of the interference portion described above, the logical operation processing device 14 also has a function of executing a logical operation of a graphic to similarly secure a minimum gap. This function will be described with reference to FIG.

As shown in FIG. 10 (C), when the operator instructs the offset adjustment by the logical operation for the interference portion displayed on the display, the shape is processed at the position of the interference portion A. Figure 14 (A) created by
A rectangular logical adjustment figure B shown in FIG. 2 is generated, and a general logical operation for performing a logical OR between the adjustment figure B and the interval figure C of the other part is executed. ), The corrected shape after the logical operation is created. The adjustment figure B used here is created so that a minimum gap is secured in the corrected shape obtained after the logical operation. Specifically, as shown in FIG. 15, for example, the interference portion A having an arc shape shown in FIG. 15A is directly approximated and automatically converted into a simple shape shown in FIGS. Process it. Also, the figure can be processed by offsetting the generated figure.

Further, here, the vector direction is set such that each line segment of the above-mentioned adjustment graphic is on the right side and the vector logic operation for selecting the counterclockwise direction shown in FIG. 2 and FIG. 6 is applied. However, the corrected shape of FIG. 14B can be created by selecting the outer line segment.

The correction shape creating apparatus of this embodiment has a correction function of widening the lead tip in addition to the offset adjustment function of the interference portion described above. This will be described below.

First, as shown on the left side of FIG.
A reference point is set at the tip of each lead. Here, the bonding position set at the time of design is used as a reference point.
On the other hand, on the other hand, the tip shape corresponding to the outer shape of the lead tip after correction shown in the right side of FIG. 16A is prepared as a part, and the bonding position is also set as a reference point for this part. I'll do it.

When the operator gives an instruction for synthesizing the both, the synthesizing device 18 superimposes the tip shapes on the tip portions of the leads so that the bonding positions of the both are the same.
The composite figure shown in FIG. 16B is created. When the formation of the corrected shape is instructed after the two are combined in this manner, the logical operation processing unit 14 gives priority to the shape of the tip portion and executes the logical operation of the figure to be the outer shape of the lead tip portion, as shown in FIG.
A corrected shape shown in (C) is created. At this time, the logical operation processing device 14 executes a logical operation for obtaining a "logical sum" between the two figures. As the logical operation, as in the case of FIG. 14, the normal graphic logical operation or the vector logical operation shown in FIGS. 2 and 6 can be applied.

The above-described lead tip correction can be easily performed by simply preparing the tip shape as a component in advance. Therefore, for example, another tip shape shown in FIG. If it is used, similarly, the corrected shape of FIG. 9C can be created through the figure synthesis of FIG.

Therefore, by compiling a database of various types of tip portions having different sizes and shapes, the lead tip portion can be easily and uniformly corrected for any lead frame. Since the correction work can be automated, the cost can be reduced.

As described in detail above, according to the present embodiment,
When creating a corrected shape by offsetting the reference line,
Since the operator can intuitively perform the work of adjusting the interference part to an appropriate gap and the work of widening and correcting the lead tip, it is possible to adjust the lead frame of a new shape without creating a new program. However, it can respond promptly.

The present invention has been specifically described above, but the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the scope of the invention.

For example, the specific configuration of the corrected shape creating apparatus 10 is not limited to that shown in the above embodiment.

Further, in the above embodiment, the case where the interference portion A is extracted by the vector logical operation shown in FIG. 8 has been described, but the raster image may be thickened and combined. That is, when the raster image is gradually thickened as schematically shown in FIG. 18A, if the corresponding pixel is white, it is changed to black, and if it is black, it is changed to gray.
The interference portion can be displayed in gray as shown in FIG.

Further, in the shape correction of the tip portion, similarly, the shapes may be combined by overwriting the pixels in the state of the raster image as shown in FIG.

The specific shape of the lead frame and the shape after correction are not limited to those shown in the above embodiment.

[0059]

As described above, according to the first aspect of the invention, even if there is a narrow gap between the patterns, the operator can perform the etching correction work for ensuring the minimum gap required for etching. Can be done intuitively and easily, so that the work load can be reduced.

According to the second aspect of the invention, it is possible to reliably extract the interference portion of the pattern caused by the narrow gap between the patterns.

According to the third aspect of the present invention, the operator simply instructs the interference shape to adjust the correction shape, and an appropriate correction shape in which the minimum gap is secured including the interference area and its vicinity is created. can do.

According to the fourth aspect of the present invention, a logical operation of a figure for obtaining a "logical sum" is performed between the adjustment figure and the gap between the offset line segments, so that the minimum gap is obtained over the whole including the interference portion. It is possible to easily create an appropriate corrected shape in which

According to the fifth aspect of the present invention, the operator can intuitively and easily perform the ing correction work for forming the lead tip portion into an appropriate correction shape, so that the work load can be reduced. it can. In addition, the cost of the correction work can be reduced and automation can be achieved by preliminarily storing a database of various types of tip shapes having different shapes and dimensions as correction parts and storing them.

[Brief description of the drawings]

FIG. 1 is a diagram for explaining a logical operation algorithm.

FIG. 2 is another diagram for explaining a logical operation algorithm.

FIG. 3 is still another diagram for explaining the logical operation algorithm.

FIG. 4 is still another diagram for explaining the logical operation algorithm.

FIG. 5 is still another diagram for explaining the logical operation algorithm.

FIG. 6 is still another diagram for explaining the logical operation algorithm.

FIG. 7 is still another diagram for explaining the logical operation algorithm.

FIG. 8 is still another diagram for explaining the logical operation algorithm.

FIG. 9 is a block diagram showing a schematic configuration of a corrected shape creation device according to an embodiment of the present invention.

FIG. 10 is an explanatory diagram showing a method of extracting an interference portion of a line segment in which a reference line is offset.

FIG. 11 is an explanatory diagram showing a method of adjusting an offset dimension of an interference portion.

FIG. 12 is a diagram showing a procedure for generating an offset line segment and a correction shape.

FIG. 13 is another diagram showing an offset line segment generation procedure and a correction shape.

FIG. 14 is an explanatory diagram showing another method of adjusting the offset dimension of the interference portion.

FIG. 15 is an explanatory diagram showing a method of creating an adjustment graphic.

FIG. 16 is an explanatory diagram showing a corrected shape of the lead tip.

FIG. 17 is another explanatory view showing the correction shape of the lead tip.

FIG. 18 is an explanatory diagram showing a modification of the method of extracting an interference portion.

FIG. 19 is an explanatory diagram showing a modified example of the tip end correction method.

FIG. 20 is a plan view showing the entire one chip of an example of a lead frame.

FIG. 21 is an explanatory view schematically showing a conventional etching correction process.

FIG. 22 is another explanatory view schematically showing the conventional etching correction process.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 ... Corrected shape creation device 12 ... Offset line segment generation device 14 ... Logical operation processing device 16 ... Corrected shape adjustment device 18 ... Synthesis device 20 ... Storage device

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akira Takakura 1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo Within Dai Nippon Printing Co., Ltd. (72) Teruaki Iinuma 1-1-chome, Ichigaya-Kagacho, Shinjuku-ku, Tokyo No. 1 Dai Nippon Printing Co., Ltd. (72) Inventor Satoshi Watanabe 1-1, Ichigaya Kaga-cho, Shinjuku-ku, Tokyo Inside 1-1 Dai Nippon Printing Co., Ltd. (72) Yuji Kanai Ichigaya, Ichigaya-cho, Shinjuku-ku, Tokyo 1-1-1, Dai Nippon Printing Co., Ltd. (72) Inventor Hiroshi Suzuki 1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo Dai-ni Printing Co., Ltd.

Claims (5)

[Claims] 1. A lead frame etching correction shape forming apparatus for correcting an outline shape of a lead frame created by CAD data to create an etching correction shape, wherein a reference line defining the outline shape of the lead frame is patterned. The target offset line segment that is the basis of the correction shape is generated at the position where the target dimension is offset in the direction of expanding the width, and the judgment used for interference determination is made at the position where the reference line is offset beyond the target dimension. Means for generating an offset line segment for extraction, an extraction means for extracting an interference portion where the generated offset line segment for determination intersects another offset line segment for determination, and an etching method for the extracted interference portion. Adjusting means for adjusting the correction shape so as to secure the minimum gap necessary for advancing Etching corrected shape creation apparatus of the lead frame, wherein the door. 2. The method according to claim 1, wherein the extracting means has a function of performing a logical operation between figures whose contours are defined by intersecting offset line segments to extract an interference portion. An etching correction shape forming device for a lead frame, characterized by: 3. The adjusting means according to claim 1, wherein the adjusting means has a function of changing an offset dimension to a corrected shape so that the minimum gap is secured with respect to the extracted interference portion. Characteristic etching shape creation device for lead frame. 4. The adjusting means according to claim 1, wherein the adjusting means generates an adjusting figure in which the minimum gap is secured for the extracted interference portion, and the figure is provided between the figure and the gap between the target offset line segments. Logical operation with
An etching correction shape creation device for a lead frame, which has a function of setting a correction shape near an interference portion. 5. A lead frame etching correction shape creating apparatus for creating an etching correction shape by correcting an outline shape of a lead frame created by CAD data, wherein a reference point is set on a lead tip portion where a reference point is set. Synthesizing means for superimposing the tip shape in which the points are set by making the respective reference points coincide with each other, and the logic of the figure in which the tip shape is prioritized and used as the correction shape of the lead tip with respect to the superposed figure. An etching-corrected shape creating apparatus for a lead frame, comprising: a means for performing calculation.