JPH09110761A - Production of tetraphenol compound - Google Patents

Production of tetraphenol compound

Info

Publication number
JPH09110761A
JPH09110761A JP7270304A JP27030495A JPH09110761A JP H09110761 A JPH09110761 A JP H09110761A JP 7270304 A JP7270304 A JP 7270304A JP 27030495 A JP27030495 A JP 27030495A JP H09110761 A JPH09110761 A JP H09110761A
Authority
JP
Japan
Prior art keywords
methylenebis
solvent
dimethylphenol
hydroxymethyl
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7270304A
Other languages
Japanese (ja)
Other versions
JP3787868B2 (en
Inventor
Koji Ichikawa
幸司 市川
Hiroshi Sakamoto
宏 坂本
Atsushi Tomioka
淳 富岡
Haruki Ozaki
晴喜 尾崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP27030495A priority Critical patent/JP3787868B2/en
Publication of JPH09110761A publication Critical patent/JPH09110761A/en
Application granted granted Critical
Publication of JP3787868B2 publication Critical patent/JP3787868B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a tetraphenol compound in high selectivity, purity and yield without causing the inclusion of reaction solvent into the product. SOLUTION: 4,4'-Methylenebis[2-(4-hydroxybenzyl)-3,6-dimethylphenol] of the formula can be produced by reacting (A) 4,4'-methylenebis(2- hydroxymethyl-3,6-dimethylphenol) with (B) phenol at a molar ratio of 1:(5-50) in 0.25-10mol (based on 1mol of the component B) of an alcohol-containing reaction solvent (preferably a solvent essentially composed exclusively of an alcohol) using 0.01-1mol (based on 1mol of the component A) of an acidic catalyst.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、例えば半導体微細
加工用レジストにおける感光剤の原料または添加剤とし
て有用な、4,4′−メチレンビス〔2−(4−ヒドロ
キシベンジル)−3,6−ジメチルフェノール〕の製造
方法に関するものである。本発明の目的物である4,
4′−メチレンビス〔2−(4−ヒドロキシベンジル)
−3,6−ジメチルフェノール〕は、次式(I)の構造
を有し、以下、簡単のため「テトラフェノール(I)」
ということがある。
TECHNICAL FIELD The present invention relates to 4,4′-methylenebis [2- (4-hydroxybenzyl) -3,6-dimethyl useful as a raw material or an additive for a photosensitizer in a resist for semiconductor fine processing, for example. Phenol]. 4, which is the object of the present invention
4'-methylenebis [2- (4-hydroxybenzyl)
-3,6-dimethylphenol] has the structure of the following formula (I), and is hereinafter referred to as "tetraphenol (I)" for simplicity.
There is that.

【0002】 [0002]

【0003】[0003]

【従来の技術】テトラフェノール(I)をキノンジアジ
ドスルホン酸エステル化して、半導体微細加工用レジス
ト組成物の感光剤として用いることは、特開平 6-16780
5 号公報(=EP-A-573,056) に記載されており、そこで
は、4,4′−メチレンビス(2−ヒドロキシメチル−
3,6−ジメチルフェノール)とフェノールとを、水溶
媒中、酸触媒の存在下に反応させて、テトラフェノール
(I)が製造されている。またこの公報には、反応で得
られるテトラフェノール(I)をトルエンと酢酸エチル
の混合液から晶析することが記載されている。
2. Description of the Related Art The use of quinonediazide sulfonic acid ester of tetraphenol (I) as a photosensitizer for a resist composition for semiconductor fine processing is disclosed in JP-A-6-16780.
5 (= EP-A-573,056), in which 4,4'-methylenebis (2-hydroxymethyl-
Tetraphenol (I) is produced by reacting 3,6-dimethylphenol) with phenol in an aqueous solvent in the presence of an acid catalyst. This publication also describes crystallizing tetraphenol (I) obtained by the reaction from a mixed solution of toluene and ethyl acetate.

【0004】[0004]

【発明が解決しようとする課題】本発明者らは、テトラ
フェノール(I)の合成について研究を続けた結果、反
応の選択性や収率等においてさらに改良が必要であると
の認識に至った。また、上記のようにして得られるテト
ラフェノール(I)には、晶析溶媒が15重量%程度取
り込まれており、通常の乾燥を行っても溶媒が十分に除
去できないため、定量純度が低くなることが判明した。
DISCLOSURE OF THE INVENTION As a result of continuing research on the synthesis of tetraphenol (I), the present inventors have come to recognize that further improvement is required in reaction selectivity, yield and the like. . Further, the tetraphenol (I) obtained as described above contains about 15% by weight of a crystallization solvent, and the solvent cannot be sufficiently removed even by usual drying, so that the quantitative purity becomes low. It has been found.

【0005】したがって本発明の目的は、高い選択率
で、しかも高純度、高収率で、テトラフェノール(I)
を製造することにある。本発明の別の目的は、溶媒を取
り込まずにテトラフェノール(I)を製造することにあ
る。
Therefore, an object of the present invention is to provide tetraphenol (I) with high selectivity, high purity and high yield.
Is to manufacture. Another object of the present invention is to produce tetraphenol (I) without incorporating a solvent.

【0006】本発明者らは、かかる目的を達成すべくさ
らに鋭意研究を続けた結果、特定の反応溶媒を用いるこ
とにより、好ましい結果が得られることを見出し、ま
た、こうして得られるテトラフェノール(I)に特定の
処理を施すことにより、溶媒の持ち込みも避けられるこ
とを併せて見出し、本発明を完成するに至った。
As a result of further intensive studies aimed at achieving such an object, the present inventors have found that the use of a specific reaction solvent gives favorable results, and the tetraphenol (I It was also found that the carry-in of a solvent can be avoided by subjecting (1) to a specific treatment, and the present invention has been completed.

【0007】[0007]

【課題を解決するための手段】すなわち本発明は、4,
4′−メチレンビス(2−ヒドロキシメチル−3,6−
ジメチルフェノール)とフェノールとを1:5〜50の
モル比で、アルコールを含有する反応溶媒中、酸触媒の
存在下に反応させることにより、テトラフェノール
(I)を製造する方法を提供するものである。
That is, the present invention is as follows.
4'-methylenebis (2-hydroxymethyl-3,6-
A method for producing tetraphenol (I) by reacting dimethylphenol) and phenol in a molar ratio of 1: 5 to 50 in a reaction solvent containing an alcohol in the presence of an acid catalyst. is there.

【0008】また、こうして得られるテトラフェノール
(I)は、イソプロピルアルコールおよび水とともに加
熱することにより、そこに取り込まれた溶媒が共沸除去
できるので、このような操作を施して最終生成物とする
のが好ましい。
The tetraphenol (I) thus obtained can be azeotropically removed by heating the solvent incorporated therein by heating it together with isopropyl alcohol and water. Is preferred.

【0009】[0009]

【発明の実施の形態】本発明の反応では、4,4′−メ
チレンビス(2−ヒドロキシメチル−3,6−ジメチル
フェノール)に対し、フェノールを5〜50のモル比で
用いるが、このモル比は、10〜30、さらには10〜
20の範囲とするのが一層好ましい。この反応は酸触媒
の存在下に行われ、酸触媒は、無機酸および有機酸のい
ずれでもよいが、好ましいものとしては、塩酸、硫酸お
よびパラトルエンスルホン酸が挙げられ、なかでもパラ
トルエンスルホン酸が好ましく用いられる。酸触媒は、
4,4′−メチレンビス(2−ヒドロキシメチル−3,
6−ジメチルフェノール)に対し、0.01〜1モル倍の
範囲で使用するのが好ましく、さらには、0.05〜0.3
モル倍、とりわけ0.1〜0.2モル倍の範囲で使用するの
がより好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION In the reaction of the present invention, phenol is used in a molar ratio of 5 to 50 with respect to 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol). Is 10 to 30, and further 10
The range of 20 is more preferable. This reaction is carried out in the presence of an acid catalyst, and the acid catalyst may be either an inorganic acid or an organic acid, but preferable examples include hydrochloric acid, sulfuric acid and paratoluenesulfonic acid, and among them, paratoluenesulfonic acid. Is preferably used. The acid catalyst is
4,4'-methylenebis (2-hydroxymethyl-3,
6-dimethylphenol), and is preferably used in a range of 0.01 to 1 mol times, and more preferably 0.05 to 0.3.
It is more preferable to use it in a molar ratio, especially in the range of 0.1 to 0.2.

【0010】この反応をアルコール溶媒中で行うことに
より、フェノールのパラ位への反応が促進され、目的物
の選択性が向上する。反応溶媒として用いるアルコール
は、低級アルコール、例えばメタノール、エタノール、
イソプロピルアルコール、ブチルアルコールなど、また
はそれらの混合物であることができるが、なかでもメタ
ノールが好ましく用いられる。本発明では、反応溶媒と
してアルコールだけを用いるのが好ましいが、場合によ
っては、反応により生成する水以外に水が存在していて
も差し支えない。反応溶媒としてのアルコールは、フェ
ノールに対して0.25〜10モル倍の範囲で用いるのが
好ましく、さらには0.4〜5モル倍、とりわけ0.5〜2
モル倍の範囲で用いるのがより好ましい。
By carrying out this reaction in an alcohol solvent, the reaction of the phenol to the para position is promoted and the selectivity of the target substance is improved. The alcohol used as a reaction solvent is a lower alcohol such as methanol, ethanol,
It may be isopropyl alcohol, butyl alcohol, or the like, or a mixture thereof, but among them, methanol is preferably used. In the present invention, it is preferable to use only alcohol as a reaction solvent, but in some cases, water may be present in addition to water produced by the reaction. The alcohol as a reaction solvent is preferably used in a range of 0.25 to 10 times by mole, more preferably 0.4 to 5 times by mole, and especially 0.5 to 2 times that of phenol.
It is more preferable to use it in a molar range.

【0011】また、このようにアルコール溶媒中で反応
を行うことにより、原料の4,4′−メチレンビス(2
−ヒドロキシメチル−3,6−ジメチルフェノール)
は、純度の低いものでも使用可能となり、一般には55
〜100%の範囲の純度を有する4,4′−メチレンビ
ス(2−ヒドロキシメチル−3,6−ジメチルフェノー
ル)が使用できる。4,4′−メチレンビス(2−ヒド
ロキシメチル−3,6−ジメチルフェノール)は通常、
2,5−キシレノールとホルムアルデヒドとを、塩基触
媒の存在下で縮合させることにより製造され、その純度
を高めるためには高度の精製処理が必要となるが、本発
明によれば、原料の段階で高度の精製処理を施さなくて
も、高い純度でテトラフェノール(I)を製造できるの
で、有利である。
Further, by carrying out the reaction in the alcohol solvent as described above, 4,4'-methylenebis (2
-Hydroxymethyl-3,6-dimethylphenol)
Can be used even if the purity is low.
4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) having a purity in the range of -100% can be used. 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) is usually
It is produced by condensing 2,5-xylenol and formaldehyde in the presence of a base catalyst, and a high degree of purification treatment is required to increase its purity. This is advantageous because tetraphenol (I) can be produced in high purity without performing a high-level purification treatment.

【0012】反応の仕込みは、フェノール、酸触媒およ
び反応溶媒の混合物中に、4,4′−メチレンビス(2
−ヒドロキシメチル−3,6−ジメチルフェノール)を
添加していく方法が好ましい。この際、4,4′−メチ
レンビス(2−ヒドロキシメチル−3,6−ジメチルフ
ェノール)は、0.01〜12時間かけて添加していくの
が好ましく、さらには0.5〜4時間、とりわけ1〜2時
間で4,4′−メチレンビス(2−ヒドロキシメチル−
3,6−ジメチルフェノール)の添加を終了するのが好
ましい。
The reaction was prepared by adding 4,4'-methylenebis (2) to a mixture of phenol, an acid catalyst and a reaction solvent.
-Hydroxymethyl-3,6-dimethylphenol) is preferably added. At this time, 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) is preferably added over 0.01 to 12 hours, more preferably 0.5 to 4 hours, especially 4,4'-methylenebis (2-hydroxymethyl-
It is preferred to finish the addition of 3,6-dimethylphenol).

【0013】この反応は、一般に10℃から沸点までの
範囲、好ましくは12〜60℃、さらに好ましくは15
〜35℃の範囲の温度で行われる。この反応は、通常大
気圧下で進行し、4,4′−メチレンビス(2−ヒドロ
キシメチル−3,6−ジメチルフェノール)の添加時間
を除いて2〜5時間程度行われる。
The reaction is generally in the range from 10 ° C to the boiling point, preferably 12-60 ° C, more preferably 15 ° C.
It is carried out at a temperature in the range of ~ 35 ° C. This reaction usually proceeds under atmospheric pressure and is carried out for about 2 to 5 hours except the addition time of 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol).

【0014】反応終了後は、テトラフェノール(I)が
アルコール溶媒に溶けた状態となっているが、必要によ
りアンモニア水などの塩基で中和したあと、任意の操作
を施すことにより、テトラフェノール(I)を固体とし
て取り出すことができる。例えば、反応溶液またはそれ
を中和した溶液に貧溶媒を加えて晶析する方法が採用で
きる。ここで用いる晶析溶媒としては、芳香族溶媒、そ
れも芳香族炭化水素溶媒、例えばベンゼン、トルエン、
キシレンなどが挙げられ、なかでもトルエンが好ましく
用いられる。また、芳香族溶媒と、エステル類またはケ
トン類、例えば酢酸エチル、メチルイソブチルケトン、
アセトンなどとの混合溶媒も、好ましく用いられる。
After completion of the reaction, tetraphenol (I) is in a state of being dissolved in an alcohol solvent. If necessary, after neutralizing with a base such as aqueous ammonia, tetraphenol (I) may be added. I) can be taken out as a solid. For example, a method in which a poor solvent is added to the reaction solution or a solution obtained by neutralizing the solution and crystallization is performed can be adopted. The crystallization solvent used here is an aromatic solvent, which is also an aromatic hydrocarbon solvent such as benzene, toluene,
Examples thereof include xylene, and among them, toluene is preferably used. In addition, aromatic solvents and esters or ketones such as ethyl acetate, methyl isobutyl ketone,
A mixed solvent with acetone or the like is also preferably used.

【0015】こうして得られるテトラフェノール(I)
は、キノンジアジドスルホン酸エステル化して、半導体
製造用のレジスト組成物における感光剤として用いるこ
とができ、またこのテトラフェノール(I)自体を、同
じく半導体製造用のレジスト組成物におけるアルカリ可
溶性添加剤として用いることもできる。このように、テ
トラフェノール(I)を半導体製造用レジスト組成物の
成分ないしは原料として用いる場合は、水への溶解度が
9g/100g以下である溶媒に、反応で得られた粗生
成物を溶解し、水洗分液することにより、金属分を低減
させておくのが好ましい。ここで、水への溶解度が9g
/100g以下とは、20℃の水100gに溶ける最大
量が9g以下であることを意味する。またここで用いる
溶媒は、20℃において、テトラフェノール(I)の溶
解度が1g/100g以上であるのが好ましい。かかる
溶媒としては、酢酸エチルや酢酸n−ブチル、酢酸イソ
アミルのような酢酸エステル類、メチルイソブチルケト
ンや2−ヘプタノンのようなケトン類などが挙げられ、
なかでも酢酸エチルが好ましく用いられる。
Tetraphenol (I) thus obtained
Can be used as a photosensitizer in a resist composition for semiconductor production after being converted to a quinonediazide sulfonate, and this tetraphenol (I) itself is also used as an alkali-soluble additive in a resist composition for semiconductor production. You can also Thus, when tetraphenol (I) is used as a component or raw material of a resist composition for semiconductor production, the crude product obtained by the reaction is dissolved in a solvent having a solubility in water of 9 g / 100 g or less. It is preferable to reduce the metal content by washing and separating with water. Here, the solubility in water is 9g
"/ 100 g or less" means that the maximum amount soluble in 100 g of water at 20 ° C is 9 g or less. The solvent used here preferably has a solubility of tetraphenol (I) of 1 g / 100 g or more at 20 ° C. Examples of such a solvent include ethyl acetate, n-butyl acetate, acetic acid esters such as isoamyl acetate, ketones such as methyl isobutyl ketone and 2-heptanone, and the like.
Among them, ethyl acetate is preferably used.

【0016】こうして金属の低減化を図ったテトラフェ
ノール(I)を含む溶液は、さらに芳香族溶媒を加え
て、目的物を晶析させることができる。ここで用いる芳
香族溶媒は、先の晶析に用いたものと同じであっても異
なっていてもよいが、好ましくはトルエンが用いられ
る。
In the solution containing tetraphenol (I) whose metal is reduced in this way, an aromatic solvent may be further added to crystallize the desired product. The aromatic solvent used here may be the same as or different from that used in the previous crystallization, but toluene is preferably used.

【0017】得られるテトラフェノール(I)にはま
た、さらに任意の精製手段が施されてもよい。とりわ
け、イソプロピルアルコールおよび水とともに加熱する
ことにより、生成物中に取り込まれている反応溶媒およ
び/または晶析溶媒を共沸除去できるので、かかる操作
が好ましく採用される。この場合、イソプロピルアルコ
ールは、水に対して0.3〜5重量倍の割合で用いるのが
好ましい。
The resulting tetraphenol (I) may also be further subjected to any purification means. In particular, since the reaction solvent and / or the crystallization solvent incorporated in the product can be removed azeotropically by heating with isopropyl alcohol and water, such an operation is preferably adopted. In this case, isopropyl alcohol is preferably used in a proportion of 0.3 to 5 times by weight that of water.

【0018】[0018]

【実施例】次に実施例を挙げて、本発明をさらに具体的
に説明するが、本発明はこれらの実施例によってなんら
限定されるものではない。例中にある%は、特にことわ
らないかぎり重量基準である。
EXAMPLES Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. The percentages given in the examples are by weight unless otherwise stated.

【0019】実施例1 5リットルの四つ口フラスコに、炭酸ナトリウム18
2.9gおよび水808.5gを仕込んで溶解し、次に2,
5−キシレノール808.5gを仕込み、40℃に調温し
た。そこへ37%ホルマリン2148.5gを1時間かけ
て滴下した。滴下終了後、反応マスの物性をみながら、
メチルイソブチルケトン404.6gを仕込み、7時間攪
拌した。反応終了後、90%酢酸水溶液220.8gで中
和し、攪拌しながら冷却した。25℃に達したら攪拌を
止め、上澄み液を取り除いたあと、イオン交換水330
0gを仕込んで1時間攪拌し、再び攪拌を止めて、上澄
み液を取り除いた。イオン交換水による洗浄および上澄
み液除去の操作を2回繰り返したあと、イオン交換水3
300gを仕込んで1時間攪拌して濾過し、次にイオン
交換水4290gでリンスした。得られた濾過物を45
℃で一昼夜減圧乾燥して、4,4′−メチレンビス(2
−ヒドロキシメチル−3,6−ジメチルフェノール)1
013.1g(純度65.6%)を得た。収率63.5%。
Example 1 A 5-liter four-necked flask was charged with sodium carbonate 18
Charge 2.9g and 808.5g of water to dissolve, then 2,
808.5 g of 5-xylenol was charged and the temperature was adjusted to 40 ° C. 2378.5% formalin 2148.5 g was dripped there over 1 hour. After finishing the dropping, while checking the physical properties of the reaction mass,
404.6 g of methyl isobutyl ketone was charged and stirred for 7 hours. After completion of the reaction, it was neutralized with 220.8 g of 90% acetic acid aqueous solution and cooled with stirring. When the temperature reaches 25 ° C, stop stirring, remove the supernatant liquid, and then deionize water 330
0 g was charged and stirred for 1 hour, the stirring was stopped again, and the supernatant was removed. After repeating the washing with ion-exchanged water and the removal of the supernatant twice, the ion-exchanged water 3
300 g was charged, the mixture was stirred for 1 hour, filtered, and then rinsed with 4290 g of ion-exchanged water. The obtained filtrate is 45
After drying under reduced pressure at ℃ for 24 hours, 4,4'-methylenebis (2
-Hydroxymethyl-3,6-dimethylphenol) 1
013.1 g (purity 65.6%) was obtained. Yield 63.5%.

【0020】別途、8リットルの四つ口フラスコに、パ
ラトルエンスルホン酸54.0g、フェノール3244.0
gおよびメタノール1077.4gを仕込んで20℃に調
温した。そこへ、上で得られた純度65.6%の4,4′
−メチレンビス(2−ヒドロキシメチル−3,6−ジメ
チルフェノール)977.7gを10分割して、1時間3
0分かけて投入し、その後さらに2時間反応させた。反
応終了後、25%アンモニア水58.0gで中和してから
濃縮し、その後、メタノール120.0gを仕込んだ。次
に60℃に昇温し、同温度で、トルエン2326.7gお
よび酢酸エチル581.7gを仕込み、40℃まで冷却し
て6時間攪拌した。その後濾過し、トルエン2617.6
gおよび酢酸エチル290.8gの混合溶液でリンスし
て、濾過物960.5gを得た。この濾過物を酢酸エチル
1921.2gに溶解し、さらにトルエン480.3gおよ
びイオン交換水1120.7gを仕込んで攪拌したあと、
分液した。次に、1%シュウ酸水溶液1120.7gを仕
込んで攪拌し、分液することにより、脱金属を行った。
さらにイオン交換水1120.7gでの洗浄を4回繰り返
したあと、オイル層を濃縮した。濃縮マスにトルエン1
398.5gを仕込んで20℃まで冷却し、攪拌を止め
た。
Separately, in an 8-liter four-necked flask, 54.0 g of paratoluenesulfonic acid and 3244.0 of phenol.
and 1077.4 g of methanol were charged and the temperature was adjusted to 20 ° C. There, 4,4 'of 65.6% purity obtained above
-977.7 g of methylenebis (2-hydroxymethyl-3,6-dimethylphenol) was divided into 10 parts, and 3 hours were taken for 1 hour.
It was added over 0 minutes, and then the reaction was continued for 2 hours. After completion of the reaction, the solution was neutralized with 58.0 g of 25% aqueous ammonia and then concentrated, and then 120.0 g of methanol was charged. Next, the temperature was raised to 60 ° C., and at the same temperature, 2326.7 g of toluene and 581.7 g of ethyl acetate were charged, cooled to 40 ° C., and stirred for 6 hours. Then filtered and toluene 2617.6
and a mixed solution of 290.8 g of ethyl acetate and rinsed to obtain 960.5 g of a filtrate. This filtered material was dissolved in 1921.2 g of ethyl acetate, and after further charging 480.3 g of toluene and 1120.7 g of ion-exchanged water and stirring,
Separated. Next, demetalization was carried out by charging 1120.7 g of a 1% aqueous oxalic acid solution, stirring and separating the solution.
Furthermore, after washing with 110.7 g of ion-exchanged water was repeated 4 times, the oil layer was concentrated. Toluene 1 in concentrated mass
398.5 g was charged and cooled to 20 ° C., and stirring was stopped.

【0021】上澄み液を取り除き、そこへトルエン11
69.1gおよび酢酸エチル129.9gの混合溶液を仕込
んで30分攪拌したあと、攪拌を止め、上澄み液を取り
除いた。トルエン/酢酸エチル混合溶液による洗浄およ
び上澄み液除去の操作を4回繰り返したあと、残りのマ
スに、イソプロピルアルコール1587.7gおよびイオ
ン交換水1587.7gを仕込んで濃縮した。濃縮残に、
イソプロピルアルコール714.5gおよびイオン交換水
1667.1gを仕込んで再度濃縮した。濃縮残にイオン
交換水1190.8gを仕込んで40℃まで冷却し、濾過
したあと、イオン交換水1190.8gでリンスした。得
られた濾過物を45℃で一昼夜減圧乾燥して、4,4′
−メチレンビス〔2−(4−ヒドロキシベンジル)−
3,6−ジメチルフェノール〕384.6gを得た。定量
純度は96.8%であり、2,5−キシレノール基準の収
率は24.8%であった。また、4,4′−メチレンビス
(2−ヒドロキシメチル−3,6−ジメチルフェノー
ル)基準の収率は39.1%であった。
The supernatant liquid was removed, and toluene 11 was added thereto.
A mixed solution of 69.1 g and 129.9 g of ethyl acetate was charged and stirred for 30 minutes, then the stirring was stopped and the supernatant was removed. The procedure of washing with a mixed solution of toluene / ethyl acetate and the removal of the supernatant was repeated 4 times, and then 1587.7 g of isopropyl alcohol and 1587.7 g of ion-exchanged water were charged into the remaining mass and the mixture was concentrated. To the concentration residue,
714.5 g of isopropyl alcohol and 1667.1 g of ion-exchanged water were charged and concentrated again. The concentrated residue was charged with 119.8 g of ion-exchanged water, cooled to 40 ° C., filtered, and rinsed with 119.8 g of ion-exchanged water. The obtained filtered product was dried under reduced pressure at 45 ° C. for one day to obtain 4,4 ′.
-Methylenebis [2- (4-hydroxybenzyl)-
3,4.6-Dimethylphenol] 384.6 g was obtained. The quantitative purity was 96.8%, and the yield based on 2,5-xylenol was 24.8%. The yield based on 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) was 39.1%.

【0022】 質量分析: MS 4681 H−NMR(ジメチルスルホキシド) δ(ppm) :1.9
5 (s, 6H); 2.07 (s, 6H); 3.64 (brs, 2H);3.92 (s, 4
H); 6.41 (s, 2H);6.61 (d, J = 8.6 Hz, 4H);6.88 (d,
J = 8.6 Hz, 4H); 7.95 (s, 2H);9.07 (s, 1H).
Mass spectrometry: MS 468 1 H-NMR (dimethyl sulfoxide) δ (ppm): 1.9
5 (s, 6H); 2.07 (s, 6H); 3.64 (brs, 2H); 3.92 (s, 4
H); 6.41 (s, 2H); 6.61 (d, J = 8.6 Hz, 4H); 6.88 (d,
J = 8.6 Hz, 4H); 7.95 (s, 2H); 9.07 (s, 1H).

【0023】実施例2 2,5−キシレノール733.2g、水酸化ナトリウム6
0.0gおよび水540gの混合物に、70〜75℃で、
37%ホルマリン1622gを3時間かけて滴下した。
滴下終了後、同温度で4時間攪拌した。55℃まで冷却
したあと36%塩酸172gを添加して10分攪拌し、
次いでメチルイソブチルケトン1500gを加えて、反
応混合物を完溶させた。次に同温度でイオン交換水15
0gを加えて洗浄し、分液した。得られたオイル層を濃
縮後、トルエン500gを加えて室温で一晩攪拌した。
析出した結晶を濾過し、得られたケーキをトルエン80
0gで洗浄してウェットケーキ425.1gを得た。この
ウェットケーキに、酢酸エチル425gおよびトルエン
300gを加え、75〜80℃で2時間攪拌して洗浄し
た。次に溶媒を濃縮後、トルエン500gを加えて75
〜80℃で1時間攪拌して洗浄した。次いで室温まで冷
却してから濾過した。得られたケーキをトルエン800
gと混合攪拌して洗浄したあと、濾過、乾燥して、4,
4′−メチレンビス(2−ヒドロキシメチル−3,6−
ジメチルフェノール)193.5g(純度95%)を得
た。収率19.4%。
Example 2 733.2 g of 2,5-xylenol, 6 of sodium hydroxide
To a mixture of 0.0 g and 540 g of water at 70-75 ° C,
1622 g of 37% formalin was added dropwise over 3 hours.
After the addition, the mixture was stirred at the same temperature for 4 hours. After cooling to 55 ° C., 172 g of 36% hydrochloric acid was added and stirred for 10 minutes,
Then, 1500 g of methyl isobutyl ketone was added to completely dissolve the reaction mixture. Next, at the same temperature, deionized water 15
0 g was added for washing, and the layers were separated. The obtained oil layer was concentrated, 500 g of toluene was added, and the mixture was stirred overnight at room temperature.
The precipitated crystals were filtered and the resulting cake was washed with toluene 80
It was washed with 0 g to obtain 425.1 g of wet cake. Ethyl acetate (425 g) and toluene (300 g) were added to this wet cake, and the mixture was washed by stirring at 75 to 80 ° C. for 2 hours. Next, after concentrating the solvent, add 500 g of toluene and add 75
It was washed by stirring at -80 ° C for 1 hour. It was then cooled to room temperature and filtered. The cake obtained is toluene 800
After mixing and stirring with g to wash, filter, dry,
4'-methylenebis (2-hydroxymethyl-3,6-
193.5 g (purity 95%) of dimethylphenol was obtained. Yield 19.4%.

【0024】別途、パラトルエンスルホン酸5.40g、
フェノール324.4gおよびメタノール107.7gの混
合物を20℃に調温した。そこへ、上で得られた純度9
5%の4,4′−メチレンビス(2−ヒドロキシメチル
−3,6−ジメチルフェノール)67.5gを10分割し
て、1時間30分かけて投入し、その後さらに2時間反
応させた。反応終了後、25%アンモニア水5.8gで中
和してから濃縮し、その後、メタノール12.0gを仕込
んだ。次に60℃に昇温し、同温度で、トルエン23
2.7gおよび酢酸エチル58.2gを仕込み、40℃まで
冷却して6時間攪拌した。その後濾過し、トルエン26
1.8gおよび酢酸エチル29.1gの混合溶液でリンスし
て、濾過物115.3gを得た。この濾過物を酢酸エチル
230.5gに溶解し、さらにトルエン57.6gおよびイ
オン交換水134.5gを仕込んで攪拌したあと、分液し
た。次に1%シュウ酸水溶液134.5gを仕込んで攪拌
し、分液することにより脱金属を行った。さらにイオン
交換水134.5gでの洗浄を4回繰り返したあと、オイ
ル層を濃縮した。濃縮マスにトルエン167.8gを仕込
んで20℃まで冷却し、攪拌を止めた。
Separately, 5.40 g of paratoluenesulfonic acid,
A mixture of 324.4 g of phenol and 107.7 g of methanol was thermostated at 20 ° C. There, purity 9 obtained above
67.5 g of 5% 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) was divided into 10 parts, charged over 1 hour and 30 minutes, and further reacted for 2 hours. After completion of the reaction, the mixture was neutralized with 5.8 g of 25% aqueous ammonia and then concentrated, and then 12.0 g of methanol was charged. Next, the temperature was raised to 60 ° C., and at the same temperature, toluene 23 was added.
2.7 g and ethyl acetate 58.2 g were charged, and the mixture was cooled to 40 ° C. and stirred for 6 hours. After that, it is filtered and toluene 26
Rinsing with a mixed solution of 1.8 g and ethyl acetate 29.1 g yielded 115.3 g of filtrate. This filtered material was dissolved in 230.5 g of ethyl acetate, 57.6 g of toluene and 134.5 g of ion-exchanged water were charged, and the mixture was stirred and then separated. Next, 134.5 g of a 1% aqueous oxalic acid solution was charged, stirred, and then liquid-separated to remove metal. Furthermore, after washing with 134.5 g of ion-exchanged water was repeated 4 times, the oil layer was concentrated. To the concentrated mass was charged 167.8 g of toluene, cooled to 20 ° C., and stirring was stopped.

【0025】上澄み液を取り除き、そこへトルエン14
0.3gおよび酢酸エチル15.6gの混合溶液を仕込んで
30分攪拌したあと、攪拌を止め、上澄み液を取り除い
た。トルエン/酢酸エチル混合溶液による洗浄および上
澄み液除去の操作を4回繰り返したあと、残りのマス
に、イソプロピルアルコール190.5gおよびイオン交
換水190.5gを仕込んで濃縮した。濃縮残に、イソプ
ロピルアルコール85.7gおよびイオン交換水200g
を仕込んで再度濃縮した。濃縮残にイオン交換水14
2.9gを仕込んで40℃まで冷却し、濾過したあと、イ
オン交換水142.9gでリンスした。得られた濾過物を
45℃で一昼夜減圧乾燥して、4,4′−メチレンビス
〔2−(4−ヒドロキシベンジル)−3,6−ジメチル
フェノール〕46.1gを得た。定量純度は96.9%であ
り、2,5−キシレノール基準の収率は9.1%であっ
た。また4,4′−メチレンビス(2−ヒドロキシメチ
ル−3,6−ジメチルフェノール)基準の収率は47.0
%であった。
The supernatant liquid was removed and toluene 14 was added thereto.
A mixed solution of 0.3 g and ethyl acetate (15.6 g) was charged and stirred for 30 minutes, then the stirring was stopped and the supernatant was removed. The procedure of washing with a mixed solution of toluene / ethyl acetate and the removal of the supernatant was repeated four times, and then 190.5 g of isopropyl alcohol and 190.5 g of ion-exchanged water were charged into the remaining mass and the mixture was concentrated. 85.7 g of isopropyl alcohol and 200 g of deionized water in the concentrated residue
Was charged and concentrated again. Ion-exchanged water 14 in the concentrated residue
2.9 g was charged, the mixture was cooled to 40 ° C., filtered, and then rinsed with 142.9 g of ion-exchanged water. The obtained filtered product was dried under reduced pressure at 45 ° C. for a day and night to obtain 46.1 g of 4,4′-methylenebis [2- (4-hydroxybenzyl) -3,6-dimethylphenol]. The quantitative purity was 96.9%, and the yield based on 2,5-xylenol was 9.1%. The yield based on 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) is 47.0.
%Met.

【0026】比較例 フェノール188g、水46gおよび96%硫酸0.9g
の混合物を30〜35℃に保温しながら、実施例2の前
半で得られた純度95%の4,4′−メチレンビス(2
−ヒドロキシメチル−3,6−ジメチルフェノール)3
1.6gを30分おきに10分割して仕込んだ。仕込み終
了後、同温度で2時間攪拌した。 次いで、トルエン2
00ml、酢酸エチル200mlおよび水300mlの混合物
を加えて洗浄し、分液した。得られたオイル層を濃縮
後、酢酸エチル9.3gおよびトルエン186gを加え
て、室温で一晩攪拌した。析出した結晶を濾過し、得ら
れたケーキをトルエン60mlと混合攪拌し、洗浄した。
次に濾過後、得られたケーキを50〜55℃でアセトン
32.7gに溶解し、トルエン68gを添加し、次いでア
セトンを濃縮したあと濾過した。得られたケーキをアセ
トンに溶解し、そこへトルエンを添加し、次いでアセト
ンを濃縮したあと濾過した。得られたケーキをトルエン
と混合攪拌して洗浄し、濾過後のケーキを乾燥して、
4,4′−メチレンビス〔2−(4−ヒドロキシベンジ
ル)−3,6−ジメチルフェノール〕18.5gを得た。
定量純度は80.5%であり、2,5−キシレノール基準
の収率は6.4%であった。また、4,4′−メチレンビ
ス(2−ヒドロキシメチル−3,6−ジメチルフェノー
ル)基準の収率は33.5%であった。
Comparative Example 188 g phenol, 46 g water and 0.9 g 96% sulfuric acid.
While keeping the mixture of 30 to 35 ° C., 4,4′-methylenebis (2 having a purity of 95% obtained in the first half of Example 2 was obtained.
-Hydroxymethyl-3,6-dimethylphenol) 3
1.6 g was charged in 30 portions every 30 minutes. After the completion of charging, the mixture was stirred at the same temperature for 2 hours. Then toluene 2
A mixture of 00 ml, 200 ml of ethyl acetate and 300 ml of water was added to wash and separate the layers. The obtained oil layer was concentrated, 9.3 g of ethyl acetate and 186 g of toluene were added, and the mixture was stirred overnight at room temperature. The precipitated crystals were filtered, and the obtained cake was mixed with 60 ml of toluene with stirring and washed.
Next, after filtration, the obtained cake was dissolved in 32.7 g of acetone at 50 to 55 ° C., 68 g of toluene was added, and then acetone was concentrated and then filtered. The obtained cake was dissolved in acetone, toluene was added thereto, and then acetone was concentrated and then filtered. The cake obtained is mixed with toluene and stirred to wash, and the cake after filtration is dried,
18.5 g of 4,4'-methylenebis [2- (4-hydroxybenzyl) -3,6-dimethylphenol] was obtained.
The quantitative purity was 80.5%, and the yield based on 2,5-xylenol was 6.4%. The yield based on 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) was 33.5%.

【0027】[0027]

【発明の効果】本発明によれば、高い選択率で、しかも
高純度、高収率で、テトラフェノール(I)を製造する
ことができる。特に、反応後の粗生成物を、イソプロピ
ルアルコールおよび水とともに加熱すれば、溶媒が共沸
除去され、溶媒の取り込みが少ないテトラフェノール
(I)とすることができる。また本発明によれば、原料
の4,4′−メチレンビス(2−ヒドロキシメチル−
3,6−ジメチルフェノール)の純度が低くても、良好
な結果を得ることができる。
INDUSTRIAL APPLICABILITY According to the present invention, tetraphenol (I) can be produced with high selectivity, high purity and high yield. In particular, if the crude product after the reaction is heated with isopropyl alcohol and water, the solvent is azeotropically removed, and tetraphenol (I) can be obtained with a small solvent uptake. According to the present invention, the raw material 4,4'-methylenebis (2-hydroxymethyl-
Even if the purity of 3,6-dimethylphenol) is low, good results can be obtained.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C07C 37/72 C07C 37/72 37/78 37/78 37/84 37/84 // C07B 61/00 300 C07B 61/00 300 (72)発明者 尾崎 晴喜 大阪市此花区春日出中3丁目1番98号 住 友化学工業株式会社内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location C07C 37/72 C07C 37/72 37/78 37/78 37/84 37/84 // C07B 61 / 00 300 C07B 61/00 300 (72) Inventor Haruki Ozaki 3-98 Kasugadeka, Konohana-ku, Osaka Sumitomo Chemical Co., Ltd.

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】4,4′−メチレンビス(2−ヒドロキシ
メチル−3,6−ジメチルフェノール)とフェノールと
を1:5〜50のモル比で、アルコールを含有する反応
溶媒中、酸触媒の存在下に反応させることを特徴とする
4,4′−メチレンビス〔2−(4−ヒドロキシベンジ
ル)−3,6−ジメチルフェノール〕の製造方法。
1. The presence of an acid catalyst in a reaction solvent containing alcohol in a molar ratio of 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) and phenol in a ratio of 1: 5 to 50. A method for producing 4,4'-methylenebis [2- (4-hydroxybenzyl) -3,6-dimethylphenol], which comprises reacting below.
【請求項2】反応溶媒が実質的にアルコールのみからな
る請求項1記載の方法。
2. The method according to claim 1, wherein the reaction solvent consists essentially of alcohol.
【請求項3】フェノールに対して反応溶媒を0.25〜1
0モル倍使用する請求項1または2記載の方法。
3. The reaction solvent for phenol is 0.25-1.
The method according to claim 1 or 2, which is used in an amount of 0 mol times.
【請求項4】4,4′−メチレンビス(2−ヒドロキシ
メチル−3,6−ジメチルフェノール)に対して酸触媒
を0.01〜1モル倍使用する請求項1〜3のいずれかに
記載の方法。
4. The acid catalyst according to claim 1, wherein the acid catalyst is used in an amount of 0.01 to 1 mole times that of 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol). Method.
【請求項5】フェノール、酸触媒および反応溶媒の混合
物中に、 4,4′−メチレンビス(2−ヒドロキシメ
チル−3,6−ジメチルフェノール)を0.01〜12時
間かけて添加する請求項1〜4のいずれかに記載の方
法。
5. A 4,4'-methylenebis (2-hydroxymethyl-3,6-dimethylphenol) is added to a mixture of phenol, an acid catalyst and a reaction solvent over 0.01 to 12 hours. The method according to any one of to 4.
【請求項6】反応生成物を固体として取り出す工程を含
む請求項1〜5のいずれかに記載の方法。
6. The method according to any one of claims 1 to 5, comprising a step of taking out the reaction product as a solid.
【請求項7】芳香族溶媒を含有する晶析溶媒から生成物
を晶析する請求項6記載の方法。
7. The method according to claim 6, wherein the product is crystallized from a crystallization solvent containing an aromatic solvent.
【請求項8】生成物を水への溶解度が9g/100g以
下である溶媒に溶解し、水洗分液を行って、金属含量を
低減させる請求項6または7記載の方法。
8. The method according to claim 6, wherein the product is dissolved in a solvent having a water solubility of 9 g / 100 g or less, and water separation is performed to reduce the metal content.
【請求項9】生成物をイソプロピルアルコールおよび水
とともに加熱して、そこに取り込まれた溶媒を共沸除去
する請求項1〜8のいずれかに記載の方法。
9. The method according to claim 1, wherein the product is heated with isopropyl alcohol and water to azeotropically remove the solvent incorporated therein.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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WO2019230639A1 (en) * 2018-05-28 2019-12-05 三菱瓦斯化学株式会社 Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purification method
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JPWO2019230639A1 (en) * 2018-05-28 2021-07-26 三菱瓦斯化学株式会社 Compounds, resins, compositions, resist pattern forming methods, circuit pattern forming methods and resin purification methods
US11747728B2 (en) 2018-05-28 2023-09-05 Mitsubishi Gas Chemical Company, Inc. Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
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