JPH089168Y2 - Infrared intensive heating single crystal manufacturing equipment - Google Patents

Infrared intensive heating single crystal manufacturing equipment

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Publication number
JPH089168Y2
JPH089168Y2 JP11157189U JP11157189U JPH089168Y2 JP H089168 Y2 JPH089168 Y2 JP H089168Y2 JP 11157189 U JP11157189 U JP 11157189U JP 11157189 U JP11157189 U JP 11157189U JP H089168 Y2 JPH089168 Y2 JP H089168Y2
Authority
JP
Japan
Prior art keywords
infrared
single crystal
main shaft
rod
spindle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11157189U
Other languages
Japanese (ja)
Other versions
JPH0350054U (en
Inventor
誠一 高須
博 西村
Original Assignee
ニチデン機械株式会社
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Application filed by ニチデン機械株式会社 filed Critical ニチデン機械株式会社
Priority to JP11157189U priority Critical patent/JPH089168Y2/en
Publication of JPH0350054U publication Critical patent/JPH0350054U/ja
Application granted granted Critical
Publication of JPH089168Y2 publication Critical patent/JPH089168Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【考案の詳細な説明】 産業上の利用分野 本考案は酸化物磁性材料や酸化物誘電材料等の高融点
酸化物等の物質を赤外線集中加熱方式のフローティング
ゾーン法によって単結晶育成する装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Industrial Field of the Invention The present invention relates to an apparatus for growing a single crystal of a substance such as a high melting point oxide such as an oxide magnetic material or an oxide dielectric material by a floating zone method of an infrared concentrated heating system.

従来の技術 例えば、高融点酸化物の単結晶製造には、加熱源とし
てハロゲンランプ等の赤外線ランプを利用した赤外線加
熱によるフローティングゾーン方式の単結晶製造装置が
使用されている。
2. Description of the Related Art For example, in the production of a high melting point oxide single crystal, a floating zone type single crystal production apparatus by infrared heating using an infrared lamp such as a halogen lamp as a heating source is used.

上記赤外線ランプによる赤外線加熱単結晶製造装置の
典型は、日本電気技報1974年No.112号P13〜P18や、応用
物理第47巻1978年P1166〜P1169に紹介されているよう
に、回転楕円面鏡の一方の焦点に熱源としてハロゲンラ
ンプ等の赤外線ランプを配置し、他方の焦点に原料棒や
結晶棒の被加熱物を配置して、上記赤外線ランプから照
射された赤外線を回転楕円面鏡で反射させて被加熱物に
集光させ集中加熱する装置で、この装置には、前記回転
楕円面鏡が1つの単楕円型のもの,或いは夫々半体に略
等しい2つの回転楕円面鏡を、各々ー方の焦点が一致す
るように対向結合配置させた双楕円型のものが一般的で
ある。
A typical example of an infrared heating single crystal manufacturing apparatus using the above infrared lamp is a spheroidal surface, as introduced in Nippon Electric Technical Report 1974 No. 112, P13-P18, and Applied Physics Volume 47, 1978, P1166-P1169. An infrared lamp such as a halogen lamp is arranged as a heat source at one focal point of the mirror, and a heated material such as a raw material rod or a crystal rod is disposed at the other focal point, and infrared rays emitted from the infrared lamp are spheroidal mirrors. A device for reflecting and condensing on a heated object to perform concentrated heating. In this device, the spheroidal mirror has one spheroidal shape, or two spheroidal mirrors each substantially equal to a half body, A bi-elliptical type in which opposing couplings are arranged so that the respective focal points coincide with each other is common.

そこで、双楕円型の赤外線加熱単結晶製造装置の具体
例を、第4図を参照しながら説明する。同図において、
24,25は対称形の2つの回転楕円面鏡で、各々の一方の
焦点F0,F0が一致するように、対向結合させている。26,
27は上記各回転楕円面鏡24,25の他方の各第1,第2の焦
点F1,F2に固定配置した2つの光熱源,例えばハロゲン
ランプ等の赤外線ランプである。33は各回転楕円面鏡2
4,25の一致した焦点F0に配置された被加熱部で、上方か
ら鉛直下方に延びる原料棒23と、下方から鉛直上方に延
びる結晶棒29と突き合わせた部分,即ち単結晶成長が行
なわれる溶融帯域(フローティングゾーン)を形成して
いる。22は、上記原料棒23と結晶棒29とを包囲する透明
な石英管で、該石英管22内は、結晶成長に対して好適な
雰囲気ガスを流している。
Therefore, a specific example of a bi-elliptical infrared heating single crystal manufacturing apparatus will be described with reference to FIG. In the figure,
Reference numerals 24 and 25 are two symmetrical ellipsoidal spheroidal mirrors, which are faced to each other so that the focal points F 0 and F 0 of one of them coincide with each other. 26,
Reference numeral 27 denotes two photothermal sources fixedly arranged at the other first and second focal points F 1 and F 2 of the spheroidal mirrors 24 and 25, for example, infrared lamps such as halogen lamps. 33 is each spheroid mirror 2
In the heated portion arranged at the focal point F 0 of 4,25, which coincides with the raw material rod 23 extending vertically downward from above and the crystal rod 29 extending vertically downward from above, that is, single crystal growth is performed. A melting zone (floating zone) is formed. Reference numeral 22 is a transparent quartz tube that surrounds the raw material rod 23 and the crystal rod 29, and an atmosphere gas suitable for crystal growth is passed through the quartz tube 22.

上記装置を用いた赤外線加熱による単結晶育成では、
各回転楕円面鏡24,25の各第1,第2の焦点F1,F2に配置さ
れた赤外線ランプ26,27から照射される赤外線を、回転
楕円面鏡24,25にて反射させ、焦点F0に配置された被加
熱部33に集光させ集中加熱する。
In single crystal growth by infrared heating using the above device,
The infrared rays emitted from the infrared lamps 26 and 27 arranged at the first and second focal points F 1 and F 2 of the spheroidal mirrors 24 and 25 are reflected by the spheroidal mirrors 24 and 25, Concentrated heating is performed by focusing on the heated portion 33 arranged at the focal point F 0 .

この赤外線照射による輻射エネルギーによって該被加
熱部33を溶融させ、原料棒23及び結晶棒29を回転させ十
分な攪拌を行なわせながら、鉛直方向に下降させること
により、単結晶育成が行なわれる。
The heated portion 33 is melted by the radiant energy due to the infrared irradiation, and the raw material rod 23 and the crystal rod 29 are rotated and lowered in the vertical direction while performing sufficient stirring, so that single crystal growth is performed.

なお、第5図は、石英管22の着脱時の位置関係を示す
ための一部断面視側面図である。
Note that FIG. 5 is a partial cross-sectional side view showing the positional relationship when the quartz tube 22 is attached and detached.

考案が解決しようとする課題 ところで前記赤外線集中加熱単結晶製造装置は、原料
棒23及び結晶棒29が長くなるにつれて送り量が長くな
り、上主軸20及び下主軸30は長くならざるを得ない。ま
た原料棒23及び結晶棒29の長尺化に伴い、主軸軸受21,3
1の位置は、結晶育成雰囲気密閉用石英管の着脱のため
上下主軸20,30をそれぞれ上側,下側へ移動させる際
に、主軸軸受21,31より主軸20,30が抜けない様にするた
め加熱部中心より離れる傾向がある。従って主軸の長尺
化と、軸受部取付位置が加熱部中心より離れる事によ
り、主軸回転の不円滑、主軸送りの不円滑、上下主軸の
位置ずれ等の機械的精度の問題が生じ、更に各部の長尺
化による装置全体の長尺化の問題が発生した。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In the above infrared concentrated heating single crystal manufacturing apparatus, the feed amount becomes longer as the raw material rod 23 and the crystal rod 29 become longer, and the upper spindle 20 and the lower spindle 30 are inevitably long. In addition, with the lengthening of the raw material rod 23 and the crystal rod 29, the main shaft bearings 21,3
Position 1 is to prevent the main shafts 20 and 30 from coming off from the main shaft bearings 21 and 31 when moving the upper and lower main shafts 20 and 30 upward and downward respectively to attach and detach the quartz tube for sealing the crystal growth atmosphere. It tends to move away from the center of the heating part. Therefore, the lengthening of the main shaft and the mounting position of the bearing part away from the center of the heating part cause mechanical precision problems such as non-smooth main shaft rotation, non-smooth main spindle feed, and vertical spindle misalignment. However, there was a problem of lengthening the entire device due to the lengthening of.

課題を解決するための手段 本考案は、上記問題点に鑑みて提案されたものでこの
問題点を解決するための技術的手段は、回転,摺動する
上下主軸それぞれを保持している上下の主軸軸受を、単
結晶育成中は、上下主軸のストロークを保証し、かつ加
熱部中心に近い位置に固定しているが、石英管着脱時な
どの準備動作時には、それぞれ上下の主軸に連動して移
動させる。
Means for Solving the Problems The present invention has been proposed in view of the above problems, and a technical means for solving the problems is to provide an upper and lower rotating main shaft holding a rotating main spindle. The main shaft bearing guarantees the stroke of the upper and lower main shafts during single crystal growth and is fixed at a position close to the center of the heating part.However, during preparatory operations such as when attaching and detaching the quartz tube, the main shaft bearings are linked to the upper and lower main shafts respectively. To move.

作用 上述の手段を用いることにより、結晶育成時に主軸軸
受を加熱部中心すなわち結晶育成点に近づけることがで
き、主軸長さは、以前には育成ストロークプラス準備動
作ストロークプラス主軸軸受長さを満たす必要があった
が、育成ストロークプラス主軸軸受程度ですむようにな
った。この事により主軸軸受と主軸固定端の距離に対す
る主軸軸受と加熱部中心の距離の比を小さくする事が可
能となり、上下主軸それぞれの芯ぶれ、回転,移動の滑
らかさが向上し、同時に上下主軸相互の同芯度も出しや
すくなる。また、主軸軸受位置が移動する事と、必要最
小限の主軸長さにより装置全体の高さも押さえられる。
Action By using the above-mentioned means, the spindle bearing can be brought closer to the center of the heating part, that is, the crystal growth point during crystal growth, and the spindle length must previously satisfy the growth stroke plus the preparatory movement stroke plus the spindle bearing length. However, it only requires a training stroke plus spindle bearings. As a result, it is possible to reduce the ratio of the distance between the main shaft bearing and the fixed end of the main shaft to the distance between the main shaft bearing and the center of the heating section. It is easy to obtain mutual concentricity. Further, the height of the entire apparatus can be suppressed by the movement of the main shaft bearing position and the minimum required main shaft length.

実施例 本考案の一実施例である双楕円型の赤外線加熱単結晶
製造装置を第1図、第2図及び第3図を参照しながら説
明する。結晶育成開始時の状態を示した第1図において
6,7は、対称形の2つの回転楕円面鏡で各々の一方の焦
点F0,F0が一致するように対向結合させて加熱炉を構成
する。尚、上記回転楕円面鏡6,7の内面即ち反射面は、
赤外線を高反射率で反射させるために金メッキ処理が施
されている。8,9は各回転楕円面鏡6,7の他方の第1,第2
の焦点F1,F2近傍に固定配置された赤外線ランプである
ハロゲンランプである。10は各回転楕円面鏡6,7の一致
した焦点F0に位置する被加熱部で、上方から鉛直下方に
延びる上主軸2の下端に固定した原料棒4と下方から鉛
直上方に延びる下主軸12の上端に固定した結晶棒11を突
き合わせたものである。5は原料棒4と結晶棒11とが配
置された空間15とハロゲンランプが配置された空間16と
を区画して試料室15を形成する透明な石英管で、この石
英管による区画で上記試料室15を結晶育成に対して好適
な雰囲気ガスを充満させる。3,13は上下主軸2,12の回転
摺動を支えている主軸軸受であり、1,14は上下主軸2,12
の移動及び回転を伝えている固定端である。主軸軸受3,
13は、石英管5の両端と気密嵌合している嵌着部3a,13a
と、それぞれ固定端1,14に固定され、嵌着部3a,13aへ各
々気密接合・離隔可能な蓋部3b,13bとからなる。
EXAMPLE A bi-elliptical type infrared heating single crystal production apparatus which is an example of the present invention will be described with reference to FIGS. 1, 2 and 3. In Fig. 1 showing the state at the start of crystal growth
Numerals 6 and 7 are two symmetrical elliptical spheroidal mirrors, which are opposed to each other so that the focal points F 0 and F 0 of one of them coincide with each other to form a heating furnace. Incidentally, the inner surface of the spheroidal mirrors 6, 7, that is, the reflecting surface,
Gold-plated to reflect infrared rays with high reflectance. 8 and 9 are the other first and second of the spheroidal mirrors 6 and 7, respectively.
It is a halogen lamp which is an infrared lamp fixedly arranged in the vicinity of the focal points F 1 and F 2 . Reference numeral 10 denotes a heated portion located at the focal point F 0 of each spheroidal mirror 6, 7, which coincides with each other. The raw material rod 4 fixed to the lower end of an upper main spindle 2 extending vertically downward from above and a lower main spindle extending vertically upward from below. A crystal rod 11 fixed to the upper end of 12 is butted. Reference numeral 5 is a transparent quartz tube that forms a sample chamber 15 by partitioning a space 15 in which the raw material rod 4 and the crystal rod 11 are arranged and a space 16 in which a halogen lamp is arranged. The chamber 15 is filled with an atmosphere gas suitable for crystal growth. 3 and 13 are main shaft bearings that support the rotational sliding of the upper and lower main shafts 2 and 12, and 1,14 are the upper and lower main shafts 2 and 12.
It is a fixed end that transmits the movement and rotation of the. Main shaft bearing 3,
Reference numeral 13 denotes fitting portions 3a and 13a that are airtightly fitted to both ends of the quartz tube 5.
And lids 3b and 13b which are respectively fixed to the fixed ends 1 and 14 and can be airtightly joined and separated from the fitting portions 3a and 13a, respectively.

次に第2図は、結晶育成開始時、原料棒4と結晶棒11
が設置された状態での一部断面視側面図である。結晶育
成時は、主軸軸受3,13は、図示する位置に固定されたま
ま、主軸固定端1,14と主軸固定端に取付けられた主軸2,
12のみが上下動する。16,17は、主軸固定端及び主軸軸
受が取付けられ、上下方向の移動を可能にするレールで
ある。
Next, FIG. 2 shows the starting material rod 4 and the crystal rod 11 at the start of crystal growth.
FIG. 3 is a side view, partly in cross section, in a state in which is installed. During crystal growth, the main shaft bearings 3, 13 remain fixed at the positions shown, and the main shaft fixed ends 1, 14 and the main shaft 2, attached to the main shaft fixed ends,
Only 12 moves up and down. Reference numerals 16 and 17 denote rails to which a fixed end of the main shaft and a main shaft bearing are attached and which can move in the vertical direction.

次に第3図は、結晶育成開始前後の石英管着脱時の状
態を示した同様な一部断面視側面図である。石英管着脱
時には、上主軸2側は、原料棒4下端が石英管5上側端
部より上方に上がり下主軸側12は、結晶棒11上端が石英
管5下側端より下方に下がる必要があるが、主軸軸受が
結晶育成時の位置のままでは、主軸軸受けより主軸が抜
けてしまうため主軸軸受は、主軸の石英管着脱動作に連
動し、嵌着部3a,13aは嵌着のままで、蓋部3b,13bが固定
端1,14に追従して離隔・移動する。
Next, FIG. 3 is a similar partial cross-sectional side view showing a state before and after starting crystal growth when the quartz tube is attached and detached. When attaching and detaching the quartz tube, it is necessary that the lower end of the raw material rod 4 rises above the upper end of the quartz tube 5 on the upper spindle 2 side, and the upper end of the crystal rod 11 falls below the lower end of the quartz tube 5 on the lower spindle side 12. However, if the main shaft bearing remains in the position at the time of crystal growth, the main shaft will come off from the main shaft bearing, so the main shaft bearing is interlocked with the quartz tube attachment / detachment operation of the main shaft, and the fitting parts 3a and 13a remain fitted. The lid portions 3b and 13b move apart and move following the fixed ends 1 and 14.

考案の効果 以上述べた様に主軸軸受を結晶育成時には加熱炉中心
近くに固定しておき、準備動作時には、主軸固定端に連
動させる事によって、主軸長さを短かくする事が可能と
なり、主軸軸受との位置関係と相まって、主軸の芯ぶ
れ、回転,移動の滑らかさが向上し、装置の組立調整の
作業性も向上した。また主軸軸受位置が移動する事と、
必要最小限の長さの主軸長さにより、装置高さが押さえ
られ、装置構成各部品の短寸化も実現された。
Effects of the invention As described above, the spindle bearing is fixed near the center of the heating furnace during crystal growth, and it is possible to shorten the spindle length by interlocking with the spindle fixed end during preparatory operation. Combined with the positional relationship with the bearing, the runout of the main shaft, the smoothness of rotation and movement are improved, and the workability of assembly and adjustment of the device is also improved. In addition, as the main shaft bearing position moves,
With the minimum required length of the spindle, the height of the device was suppressed and the size of each component of the device was shortened.

【図面の簡単な説明】[Brief description of drawings]

第1図は、本考案の一実施例において、結晶育成開始時
を示す赤外線集中加熱単結晶製造装置の正面断面図、第
2図は第1図装置の一部断面視側面図、第3図は本考案
の一実施例において、石英管着脱時の位置関係を示した
一部断面視側面図、第4図は従来の赤外線集中加熱単結
晶製造装置において、結晶育成開始時を示す正面断面
図、第5図は従来の単結晶製造装置において、石英管着
脱時の位置関係を示した一部断面視側面図である。 2……上主軸、3,13……主軸軸受、3a,13a……嵌着部、
3b,13b……蓋部、4……原料棒、5……石英管、6,7…
…回転楕円面鏡、8,9……赤外線ランプ、11……結晶
棒、12……下主軸。
FIG. 1 is a front sectional view of an infrared concentrated heating single crystal manufacturing apparatus showing the start of crystal growth in one embodiment of the present invention, FIG. 2 is a partial sectional side view of the apparatus shown in FIG. 1, and FIG. FIG. 4 is a partial cross-sectional side view showing the positional relationship when the quartz tube is attached and detached in one embodiment of the present invention, and FIG. 4 is a front cross-sectional view showing the start of crystal growth in a conventional infrared concentrated heating single crystal production apparatus. FIG. 5 is a partial cross-sectional side view showing the positional relationship when the quartz tube is attached and detached in the conventional single crystal manufacturing apparatus. 2 …… Upper spindle, 3,13 …… Spindle bearing, 3a, 13a …… Fit part,
3b, 13b ... Lid part, 4 ... Raw material rod, 5 ... Quartz tube, 6,7 ...
… Spheroidal mirror, 8,9 …… Infrared lamp, 11 …… Crystal rod, 12 …… Lower main axis.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】原料棒及び結晶棒間の被加熱物を、赤外線
ランプよりの赤外線を反射させる回転楕円面鏡を用いて
加熱する赤外線集中加熱単結晶製造装置において、 原料棒,結晶棒と接続し、回転,摺動する上下主軸のそ
れぞれを保持する軸受が、準備動作時において、主軸の
上下動に連動して移動する構造を持つことを特徴とする
赤外線集中加熱単結晶製造装置。
1. An infrared concentrated heating single crystal manufacturing apparatus for heating an object to be heated between a raw material rod and a crystal rod using a spheroidal mirror for reflecting infrared rays from an infrared lamp, and connecting the raw material rod and the crystal rod. An infrared concentrated heating single crystal manufacturing apparatus characterized in that the bearings that hold the rotating and sliding upper and lower spindles respectively have a structure that moves in synchronization with the vertical movement of the spindle during the preparatory operation.
JP11157189U 1989-09-22 1989-09-22 Infrared intensive heating single crystal manufacturing equipment Expired - Lifetime JPH089168Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11157189U JPH089168Y2 (en) 1989-09-22 1989-09-22 Infrared intensive heating single crystal manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11157189U JPH089168Y2 (en) 1989-09-22 1989-09-22 Infrared intensive heating single crystal manufacturing equipment

Publications (2)

Publication Number Publication Date
JPH0350054U JPH0350054U (en) 1991-05-15
JPH089168Y2 true JPH089168Y2 (en) 1996-03-13

Family

ID=31660041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11157189U Expired - Lifetime JPH089168Y2 (en) 1989-09-22 1989-09-22 Infrared intensive heating single crystal manufacturing equipment

Country Status (1)

Country Link
JP (1) JPH089168Y2 (en)

Also Published As

Publication number Publication date
JPH0350054U (en) 1991-05-15

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