JPH0841660A - Resin film-coated copper-base material sheet and its production - Google Patents

Resin film-coated copper-base material sheet and its production

Info

Publication number
JPH0841660A
JPH0841660A JP17728494A JP17728494A JPH0841660A JP H0841660 A JPH0841660 A JP H0841660A JP 17728494 A JP17728494 A JP 17728494A JP 17728494 A JP17728494 A JP 17728494A JP H0841660 A JPH0841660 A JP H0841660A
Authority
JP
Japan
Prior art keywords
resin
based metal
copper
coated copper
plate material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17728494A
Other languages
Japanese (ja)
Inventor
Yoshio Tamura
嘉男 田村
Hiroyuki Noguchi
博之 野口
Naotake Wada
尚武 和田
Hisatoshi Ito
久敏 伊藤
Mitsuru Haruyama
満 春山
Kenji Kubozono
健治 久保薗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Melco Metecs Corp
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Mitsubishi Electric Metex Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp, Mitsubishi Electric Metex Co Ltd filed Critical Mitsubishi Electric Corp
Priority to JP17728494A priority Critical patent/JPH0841660A/en
Publication of JPH0841660A publication Critical patent/JPH0841660A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To produce a resin film-coated copper-base metal sheet excellent in adhesion to the resin. CONSTITUTION:At least a part of the surface of a sheet 1 consisting of copper- base metal is roughened to form a roughened surface 2, and the sheet 1 surface is coated with resin to form a resin coating layer 3. The roughening is conducted by the chemical etching using a mixed soln. of hydrochloric acid and ferric chloride at 40-200A/dm<2> anode current density.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、銅系金属板の表面を
樹脂好ましくはポリイミド等の耐熱、絶縁性樹脂により
被覆した樹脂被膜銅系金属板及びその製造方法に関し、
特に、製造工程中に大きなせん断力を加えられる高密度
実装用半導体装置用の狭ピッチコネクタや、高温、高湿
下で熱サイクルにさらされるICテスト用のバーイン用
ICソケット等に用いるのに好適な樹脂被膜銅系金属板
及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin-coated copper-based metal plate in which the surface of a copper-based metal plate is coated with a resin, preferably a heat-resistant and insulating resin such as polyimide, and a method for producing the same.
Particularly, it is suitable for use in narrow pitch connectors for semiconductor devices for high-density mounting that can exert a large shearing force during the manufacturing process, burn-in IC sockets for IC tests that are exposed to thermal cycles under high temperature and high humidity, and the like. TECHNICAL FIELD The present invention relates to a resin-coated copper-based metal plate and a method for manufacturing the same.

【0002】[0002]

【従来の技術】従来の樹脂被膜銅系金属(銅及び銅合
金)板は、耐熱、絶縁性の樹脂フィルムを接着剤を介し
て銅系金属板に張り付けたり、ワニス状の樹脂を直接塗
布したりして製造されているが、いずれにおいても、銅
系金属素材と樹脂との界面に強い結合が得られず、密着
性に問題があった。
2. Description of the Related Art Conventional resin-coated copper-based metal (copper and copper alloy) plates are made by applying a heat-resistant and insulating resin film to a copper-based metal plate via an adhesive or by directly applying a varnish-like resin. However, in any case, strong bonding was not obtained at the interface between the copper-based metal material and the resin, and there was a problem in adhesion.

【0003】[0003]

【発明が解決しようとする課題】すなわち、このように
して作成した樹脂被膜銅系金属板は、曲げ応力や熱負荷
の小さな通常の使用環境では、それ程問題無く使用でき
るが、大きな曲げ応力が加わる状況で使用した場合や、
過酷な熱負荷にさらされる状況で使用した場合には、被
覆樹脂が銅系金属素材の表面から剥離してしまうという
問題点があった。例えば、高密度実装用半導体装置の基
板同士の接続に使用される狭ピッチコネクタ(ピン間隔
が0.3mm程度のコネクタ)の場合には、製造途上の
プレス加工や曲げ加工の際に、衝撃的なせん断力が働
き、これにより被覆樹脂と銅系金属素材との接着界面に
剥離が生じたり、あるいは剥離が生じないまでも、界面
の密着力が著しく低下したり、また、ICのテスト時に
使用するバーイン用ICソケットのように、高温(最高
温度155°C)、高湿(最高湿度95%)下の熱サイ
クルテスト中に過酷な熱負荷にさらされる場合には、銅
系金属素材と被覆樹脂との間の熱膨張係数の差による影
響で、銅系金属素材と被覆樹脂の接着界面にせん断力が
働き、該界面の密着性が失われてしまう。
That is, the resin-coated copper-based metal plate thus prepared can be used without problems in a normal use environment where bending stress and heat load are small, but a large bending stress is applied. When used in a situation,
When used in a situation where it is exposed to a harsh heat load, there is a problem that the coating resin peels off from the surface of the copper-based metal material. For example, in the case of a narrow-pitch connector (connector with a pin interval of about 0.3 mm) used for connecting substrates of a semiconductor device for high-density mounting, it may be shocked during press work or bending work during manufacturing. Shear force acts, which causes peeling at the adhesive interface between the coating resin and the copper-based metal material, or even when peeling does not occur, the adhesive strength at the interface decreases significantly, and it is used during IC testing. When exposed to a harsh heat load during a thermal cycle test under high temperature (maximum temperature 155 ° C) and high humidity (maximum humidity 95%), such as burn-in IC socket Due to the difference in the coefficient of thermal expansion with the resin, a shearing force acts on the adhesive interface between the copper-based metal material and the coating resin, and the adhesiveness of the interface is lost.

【0004】そこで本発明は、上述した従来の問題点を
解決するためになされたもので、樹脂との密着性に優
れ、プレス加工や曲げ加工を行った際にも、また高温、
高湿下で過酷な熱サイクルにさらされた場合でも、十分
な密着力を有して剥離することがない樹脂被膜銅系金属
板及びその製造方法を提供することを目的とする。
Therefore, the present invention has been made to solve the above-mentioned conventional problems, and it has excellent adhesiveness to a resin, and when subjected to press working or bending, high temperature,
An object of the present invention is to provide a resin-coated copper-based metal sheet that has sufficient adhesion and does not peel off even when exposed to a harsh thermal cycle under high humidity, and a method for producing the same.

【0005】[0005]

【課題を解決するための手段】請求項1の発明に係る樹
脂被膜銅系金属板は、表面の少なくとも一部に粗面化処
理を施して形成した粗面化処理面を有する銅系金属から
なる板材と、その板材の表面を被覆する樹脂被膜とを備
える。請求項2の発明に係る樹脂被膜銅系金属板は、前
記粗面化処理面の粗さが、JISBO601で定義され
る中心線平均粗さ(Ra)で1.0μm以上であるよう
に構成される。請求項3の発明に係る樹脂被膜銅系金属
板の製造方法は、銅系金属からなる板材の表面の少なく
とも一部に化学エッチングにより粗面化処理を施して粗
面化処理面を形成する工程と、前記板材の表面を樹脂に
より被覆して樹脂被膜を形成する工程とからなる。請求
項4の発明に係る樹脂被膜銅系金属板の製造方法は、銅
系金属からなる板材の表面の少なくとも一部に電解エッ
チングにより粗面化処理を施して粗面化処理面を形成す
る工程と、前記板材の表面を樹脂により被覆して樹脂被
膜を形成する工程とからなる。請求項5の発明に係る樹
脂被膜銅系金属板の製造方法は、前記粗面化処理面の粗
さが、JISBO601で定義される中心線平均粗さ
(Ra)で1.0μm以上であるように構成される。請
求項6の発明に係る樹脂被膜銅系金属板の製造方法は、
前記化学エッチングにおいて、塩酸と塩化第二鉄の混合
溶液をエッチング液として使用する。請求項7の発明に
係る樹脂被膜銅系金属板の製造方法は、前記電解エッチ
ングにおいて、電圧10V以上50V以下、陽極電流密
度40A/dm2以上200A/dm2以下の処理条件で
電解エッチングを行なう。
A resin-coated copper-based metal plate according to the invention of claim 1 is made of a copper-based metal having a roughened surface formed by subjecting at least a part of the surface to a roughening treatment. And a resin coating film that covers the surface of the plate material. The resin-coated copper-based metal plate according to the invention of claim 2 is configured such that the roughness of the roughened surface is 1.0 μm or more in center line average roughness (Ra) defined in JISBO601. It In the method for producing a resin-coated copper-based metal plate according to the invention of claim 3, a step of forming a roughened surface by subjecting at least a part of a surface of a plate material made of copper-based metal to a roughening treatment by chemical etching. And a step of coating the surface of the plate material with a resin to form a resin film. In the method for producing a resin-coated copper-based metal plate according to the invention of claim 4, a step of subjecting at least a part of the surface of a plate material made of copper-based metal to a surface roughening treatment by electrolytic etching to form a surface roughened treatment surface. And a step of coating the surface of the plate material with a resin to form a resin film. In the method for producing a resin-coated copper-based metal plate according to the invention of claim 5, the roughness of the roughened surface is 1.0 μm or more in center line average roughness (Ra) defined in JISBO601. Is composed of. The method for producing a resin-coated copper-based metal plate according to the invention of claim 6 is:
In the chemical etching, a mixed solution of hydrochloric acid and ferric chloride is used as an etching solution. In the method for producing a resin-coated copper-based metal plate according to the invention of claim 7, in the electrolytic etching, electrolytic etching is performed under processing conditions of a voltage of 10 V or more and 50 V or less and an anode current density of 40 A / dm 2 or more and 200 A / dm 2 or less. .

【0006】[0006]

【作用】請求項1の発明における樹脂被膜銅系金属板で
は、板材の表面に形成された粗面化処理面の凹凸部に樹
脂が充填、保持されて粗面化処理面と樹脂被膜との間の
接着力が強固になり、板材と樹脂被膜との密着性が向上
する。請求項2の発明における樹脂被膜銅系金属板で
は、前記粗面化処理面の粗さを、JISBO601で定
義される中心線平均粗さ(Ra)で1.0μm以上にし
たので、粗面化処理面と樹脂被膜との間の接着力が一層
強固になり、板材と被覆樹脂との密着性が一層向上す
る。請求項3の発明における樹脂被膜銅系金属板の製造
方法では、板材の表面の少なくとも一部に化学エッチン
グにより粗面化処理を施すことにより、樹脂被膜の板材
に対する接着力が増大して板材と樹脂被膜との密着性が
向上する。請求項4の発明における樹脂被膜銅系金属板
の製造方法では、板材の表面の少なくとも一部に電解エ
ッチングにより粗面化処理を施すことにより、樹脂被膜
の板材に対する接着力が増大して板材と樹脂被膜との密
着性が向上する。請求項5の発明における樹脂被膜銅系
金属板の製造方法では、前記粗面化処理面の粗さを、J
ISBO601で定義される中心線平均粗さ(Ra)で
1.0μm以上にしたので、粗面化処理面と樹脂被膜と
の間の接着力が一層強固になり、板材と被覆樹脂との密
着性が一層向上する。請求項6の発明における樹脂被膜
銅系金属板の製造方法では、塩酸と塩化第二鉄の混合溶
液をエッチング液として使用して化学エッチングが行わ
れる。請求項7の発明における樹脂被膜銅系金属板の製
造方法では、電圧10V以上50V以下、陽極電流密度
40A/dm2以上200A/dm2以下の処理条件で電
解エッチングが行われる。
In the resin-coated copper-based metal plate according to the first aspect of the present invention, the resin is filled and held in the uneven portions of the roughened surface formed on the surface of the plate material, so that the roughened surface and the resin coating are formed. The adhesive force between them becomes strong, and the adhesion between the plate material and the resin coating improves. In the resin-coated copper-based metal plate according to the invention of claim 2, the roughness of the roughened surface is set to 1.0 μm or more in the center line average roughness (Ra) defined in JISBO601. The adhesive force between the treated surface and the resin coating is further strengthened, and the adhesion between the plate material and the coating resin is further improved. In the method for producing a resin-coated copper-based metal plate according to the invention of claim 3, the adhesive force of the resin film to the plate material is increased by subjecting at least a part of the surface of the plate material to the surface roughening treatment by chemical etching. Adhesion with the resin coating is improved. In the method for producing a resin-coated copper-based metal plate according to the invention of claim 4, the roughening treatment is performed on at least a part of the surface of the plate material by electrolytic etching, whereby the adhesive force of the resin film to the plate material is increased and Adhesion with the resin coating is improved. In the method for producing a resin-coated copper-based metal plate according to the invention of claim 5, the roughness of the roughened surface is set to J
Since the center line average roughness (Ra) defined by ISBO601 is 1.0 μm or more, the adhesive force between the roughened surface and the resin coating becomes stronger, and the adhesion between the plate material and the coating resin is improved. Is further improved. In the method for producing a resin-coated copper-based metal plate according to the invention of claim 6, chemical etching is performed using a mixed solution of hydrochloric acid and ferric chloride as an etching solution. In the method for producing a resin-coated copper-based metal plate according to the invention of claim 7, electrolytic etching is performed under processing conditions of a voltage of 10 V or more and 50 V or less and an anode current density of 40 A / dm 2 or more and 200 A / dm 2 or less.

【0007】[0007]

【実施例】以下、本発明の実施例につき添付図面を参照
して説明する。図1はこの発明の銅系金属(銅又は銅合
金)からなる板材とその板材を被覆する樹脂との界面を
模式的に示す断面図で、(a)及び(b)は化学エッチ
ング法及び電解エッチング法を用いた場合の界面の中心
線平均粗さをそれぞれ表している。
Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a sectional view schematically showing an interface between a plate material made of a copper-based metal (copper or copper alloy) of the present invention and a resin coating the plate material, and (a) and (b) are a chemical etching method and an electrolytic method. The center line average roughness of the interface is shown when the etching method is used.

【0008】図1において、符号1は銅系金属としての
銅合金からなる板材であり、この板材1の表面の少なく
とも一部には粗面化処理が施されて粗面化処理面2が形
成されている。粗面化処理面2は表面粗さを調整した部
分であり、この部分のJISB0601で定義されてい
る中心線平均粗さは、1.0μm以上となっている。ま
た、板材1の表面は、粗面化処理面2を含めて耐熱、絶
縁性樹脂等の樹脂により被覆されて樹脂被膜3が形成さ
れる。
In FIG. 1, reference numeral 1 is a plate material made of a copper alloy as a copper-based metal, and at least a part of the surface of the plate material 1 is roughened to form a roughened surface 2. Has been done. The roughened surface 2 is a portion whose surface roughness is adjusted, and the center line average roughness defined by JISB0601 of this portion is 1.0 μm or more. Further, the surface of the plate material 1 including the roughened surface 2 is covered with a resin such as heat resistant and insulating resin to form a resin coating film 3.

【0009】上述のように構成された樹脂被膜銅系金属
板としての樹脂被膜銅合金板は、その表面の少なくとも
一部分の表面粗さを調整しているため、樹脂被膜3との
密着性が著しく強化される。このため、高密度実装用半
導体装置の基板同士の接続に使用される狭ピッチコネク
タ(ピン間隔が0.3mm程度のコネクタ)の基板とし
て、本発明の樹脂被膜銅合金板を使用した場合に、製造
途上のプレス加工や曲げ加工の際に、衝撃的なせん断力
が働いても、これにより樹脂被膜3と板材1との接着界
面に剥離が生じることはない。また、ICのテスト時に
使用するバーイン用ICソケットの基板として本発明の
樹脂被膜銅合金板を使用した場合に、高温(最高温度1
55°C)、高湿(最高湿度95%)下の熱サイクルテ
スト中に過酷な熱負荷にさらされて、板材1と樹脂被膜
3との間の熱膨張係数の違いにより板材1と樹脂被膜3
との接着界面にせん断力が働いたとしても、樹脂被膜3
が板材1から剥離することはない。
Since the resin-coated copper alloy plate as the resin-coated copper-based metal plate having the above-mentioned structure adjusts the surface roughness of at least a part of the surface thereof, the adhesiveness with the resin film 3 is remarkable. To be strengthened. Therefore, when the resin-coated copper alloy plate of the present invention is used as a substrate for a narrow-pitch connector (connector with a pin interval of about 0.3 mm) used for connecting substrates of a semiconductor device for high-density mounting, Even if a shocking shearing force is exerted during press working or bending during manufacturing, this does not cause peeling at the adhesive interface between the resin coating 3 and the plate material 1. Further, when the resin-coated copper alloy plate of the present invention is used as the substrate of the burn-in IC socket used for the IC test, high temperature (maximum temperature 1
55 ° C., exposed to a harsh heat load during a heat cycle test under high humidity (maximum humidity 95%), due to the difference in thermal expansion coefficient between the plate material 1 and the resin coating 3, the plate material 1 and the resin coating Three
Even if shear force acts on the adhesive interface with
Does not separate from the plate material 1.

【0010】次に、上記樹脂被膜銅系金属板の製造方法
について説明する。以下の各実施例中、%は重量%を表
す。
Next, a method of manufacturing the resin-coated copper-based metal plate will be described. In the following examples,% represents% by weight.

【0011】実施例1.上記の樹脂密着力に優れた樹脂
被膜銅系金属板を得るための製造方法の一実施例とし
て、ニッケル(Ni);9.0%、スズ(Sn);6.
0%、残部が銅(Cu)からなる銅合金を時効硬化処理
により製造して銅合金の板材1を製造した。この板材1
を用いて、下記の条件で化学エッチング法によって表面
粗さを調整し、中心線平均粗さで1.0μm以上の粗面
化処理面2を形成した。
Embodiment 1. 5. As an example of a manufacturing method for obtaining the resin-coated copper-based metal plate having excellent resin adhesion, nickel (Ni); 9.0%, tin (Sn);
A copper alloy having 0% and the balance being copper (Cu) was manufactured by an age hardening treatment to manufacture a plate material 1 of a copper alloy. This plate material 1
Was used to adjust the surface roughness by a chemical etching method under the following conditions to form a roughened surface 2 having a center line average roughness of 1.0 μm or more.

【0012】処理条件1 エッチング液組成; 10%塩酸 20%酸化第二鉄 温度; 50°C そして、このように粗さ調整した粗面化処理面2に、ア
クリル系接着剤を用いて、厚さ12.5μmのポリイミ
ドテープを接着後、接着剤を熱硬化させて樹脂被膜銅合
金板を得た。
Treatment condition 1 Composition of etching solution: 10% hydrochloric acid, 20% ferric oxide, temperature: 50 ° C. Then, the roughened surface 2 thus adjusted in roughness is thickened by using an acrylic adhesive. After adhering a 12.5 μm thick polyimide tape, the adhesive was heat-cured to obtain a resin-coated copper alloy plate.

【0013】実施例2.母材として、スズ(Sn);8
%、残部が銅(Cu)からなるCDAアロイNo.C5
2100相当品の板材1を用いて、下記の条件による電
解エッチング法によって粗さ調節し、中心線平均粗さで
1.0μm以上の粗面化処理面2を形成した。
Example 2. As a base material, tin (Sn); 8
%, CDA alloy No. with the balance being copper (Cu) C5
Using the plate material 1 equivalent to 2100, the roughness was adjusted by the electrolytic etching method under the following conditions, and the roughened surface 2 having a center line average roughness of 1.0 μm or more was formed.

【0014】 処理条件2 エッチング液; 燐酸 100ml/l 硫酸 10ml/l 重クロム酸カリウム 15ml/l 電圧; 30V 陽極電流密度; 125A/dm2 温度; 40°C そして、上記実施例1と同様に、ポリイミドテープを張
り付けた樹脂被膜銅合金板を得た。このようにして製造
した実施例1及び2の樹脂被膜銅合金板を所定の形状に
切断後、内側半径を板厚の3倍の長さにして90°に折
り曲げ、曲げ部を曲げ方向と平行に研磨を行った。すな
わち、先ず、エミリー紙(紙やすり)を用いて、目の荒
いものから細かいものへと順次変化させて(#80、#
240、#600、#800、#1000)研磨を行っ
た後、粒径2.0μmのアルミナ研磨材を用いてバフ研
磨し、次いで粒径0.05μmのアルミナ研磨材を用い
て仕上げバフ研磨を行った。このようにして生成された
樹脂被膜銅合金板断面を金属顕微鏡で観察した処、板材
1と樹脂3との界面の剥離は見られなかった。
Treatment condition 2 Etching solution: Phosphoric acid 100 ml / l Sulfuric acid 10 ml / l Potassium dichromate 15 ml / l Voltage; 30 V Anode current density; 125 A / dm 2 Temperature; 40 ° C. And, as in Example 1 above. A resin-coated copper alloy plate to which a polyimide tape was attached was obtained. After cutting the resin-coated copper alloy sheets of Examples 1 and 2 produced in this way into a predetermined shape, the inside radius was made 3 times the sheet thickness and bent to 90 °, and the bent portion was parallel to the bending direction. Was polished. That is, first, using Emily paper (sandpaper), change from coarse to fine one in order (# 80, #
240, # 600, # 800, # 1000), followed by buffing with an alumina abrasive having a particle size of 2.0 μm, and then finishing buffing with an alumina abrasive having a particle size of 0.05 μm. went. When the cross section of the resin-coated copper alloy plate thus produced was observed with a metallographic microscope, no peeling of the interface between the plate material 1 and the resin 3 was observed.

【0015】また、このようにして形成された実施例
1、2の板材1の表面構造を操作型顕微鏡で観察して調
べた。図2の(a)は実施例1の化学エッチングによる
板材1の走査型顕微鏡写真(倍率:1600倍)であ
り、数μmから十数μmの粒子により空隙が形成されて
いる構造であることが確かめられる。また、図3はこの
表面粗さチャート及び測定値を表しており、この図から
中心線平均粗さが1.72μmであることが確かめられ
る。図2の(b)は実施例2の電解エッチングによる板
材1の走査型顕微鏡写真(倍率:400倍)であり、こ
の図から、数μmから数十μmの直径の穴を有する構造
であることが確かめられる。また、図4はこの表面粗さ
チャート及び測定値を表しており、この図から中心線平
均粗さが1.25μmであることが確かめられる。
Further, the surface structure of the plate materials 1 of Examples 1 and 2 thus formed was examined by observing with an operating microscope. FIG. 2A is a scanning micrograph (magnification: 1600 times) of the plate material 1 obtained by the chemical etching of Example 1, which has a structure in which voids are formed by particles of several μm to several tens of μm. Can be confirmed. Further, FIG. 3 shows this surface roughness chart and measured values, and it is confirmed from this figure that the center line average roughness is 1.72 μm. FIG. 2B is a scanning micrograph (magnification: 400 times) of the plate material 1 obtained by electrolytic etching of Example 2. From this figure, it is confirmed that the structure has holes having a diameter of several μm to several tens of μm. Can be confirmed. Further, FIG. 4 shows this surface roughness chart and measured values, and it is confirmed from this figure that the center line average roughness is 1.25 μm.

【0016】次に上記実施例1、2の外に、実施例1の
化学エッチングの処理条件のみを変更した実施例(3、
4、5)、及び実施例2の電解エッチングの処理条件の
みを変更した実施例6、7を作成し、さらに比較用とし
て、未処理のものの樹脂被膜に対する密着性を調べるた
めに、市販のエポキシ樹脂(スリーボンド2060シリ
ーズで高耐湿タイプ)を、実施例1と同様の素材からな
り粗面化処理を施していない板材の表面に塗布した後、
硬化させて作成した比較例1、及び実施例2のものを得
る過程で得られた表面粗さ(Ra)が0.5μm、0.
7μmの比較例2、3を作成し、このようにして作成し
た各樹脂被膜銅合金板の両側の対称面にポリイミドワニ
スを接着させ、引っ張り強度の測定を行った。但し、形
状によるせん断力の変化を排除するために、試料の寸法
を長さ70mm、幅15mmの短冊片に揃えて試験を行
った。この引っ張り試験の結果を表1に示す。表1に示
すように、この発明の実施例は、比較例に比べて極めて
大きなせん断力に対抗する密着力を有することが確認で
きた。
Next, in addition to Embodiments 1 and 2 described above, an embodiment (3,
4, 5), and Examples 6 and 7 in which only the electrolytic etching treatment conditions of Example 2 were changed, and for the purpose of comparison, in order to examine the adhesion of the untreated one to the resin coating, a commercially available epoxy was used. After applying a resin (high moisture resistance type in ThreeBond 2060 series) to the surface of a plate material made of the same material as in Example 1 and not subjected to surface roughening treatment,
The surface roughness (Ra) obtained in the process of obtaining the comparative example 1 and the example 2 prepared by curing was 0.5 μm, 0.
Comparative Examples 2 and 3 having a thickness of 7 μm were prepared, and polyimide varnish was adhered to the symmetrical surfaces on both sides of each resin-coated copper alloy plate thus prepared, and the tensile strength was measured. However, in order to eliminate the change in the shearing force due to the shape, the size of the sample was aligned with a strip having a length of 70 mm and a width of 15 mm, and the test was performed. The results of this tensile test are shown in Table 1. As shown in Table 1, it was confirmed that the examples of the present invention have an adhesion force that resists an extremely large shearing force as compared with the comparative examples.

【0017】[0017]

【表1】 [Table 1]

【0018】ところで、上記各実施例で説明した粗面化
処理面を形成するための条件は、必ずしもそれぞれ上記
記載のように行う必要はなく、銅合金のエッチング反応
性、製造コスト等の観点から本発明の範囲内で適宜変更
してもよい。すなわち、電解エッチングの場合には、J
ISBO601で定義される中心線平均粗さ(Ra)が
1.0μm以上の粗面を得るためには、電圧を10V以
上50V以下の範囲で、また陽極電流密度を40A/d
2以上200A/dm2以下の範囲でエッチングを行う
ことが好ましい。また、母材としては、一般にコネクタ
用材料として用いられる銅又は銅合金であれば、上記化
学エッチング方法あるいは電解エッチング方法を適用す
ることにより、中心線平均粗さ(Ra)で1.0μm以
上の粗面化処理面を形成することが可能である。
By the way, the conditions for forming the roughened surface described in each of the above embodiments do not necessarily have to be as described above, but from the viewpoint of etching reactivity of copper alloy, manufacturing cost and the like. It may be appropriately changed within the scope of the present invention. That is, in the case of electrolytic etching, J
In order to obtain a rough surface having a center line average roughness (Ra) defined by ISBO601 of 1.0 μm or more, the voltage is in the range of 10 V to 50 V and the anode current density is 40 A / d.
It is preferable to perform etching in the range of m 2 or more and 200 A / dm 2 or less. If the base material is copper or a copper alloy generally used as a connector material, the center line average roughness (Ra) of 1.0 μm or more can be obtained by applying the above chemical etching method or electrolytic etching method. It is possible to form a roughened surface.

【0019】[0019]

【発明の効果】以上のように、請求項1の樹脂被膜銅系
金属板によれば、表面の少なくとも一部に粗面化処理を
施して形成した粗面化処理面を有する銅系金属からなる
板材と、その板材の表面を被覆する樹脂被膜とを備える
ので、粗面化処理面の凹凸部に樹脂が充填、保持されて
板材と樹脂被膜との間の接着力が強固になり、熱衝撃が
起こっても樹脂被膜が板材から剥離することはなく、ま
た、板材と樹脂被膜との界面に衝撃的なせん断力が働い
ても、充分な対抗力を発揮して板材と樹脂被膜との密着
性を確保することができる効果がある。請求項2の樹脂
被膜銅系金属板によれば、前記粗面化処理面の粗さを、
JISBO601で定義される中心線平均粗さ(Ra)
で1.0μm以上にしたので、粗面化処理面と樹脂被膜
との接着力が一層強化されて樹脂被膜と板材との密着性
が一層向上する。
As described above, according to the resin-coated copper-based metal plate of the first aspect, the copper-based metal having the roughened surface formed by subjecting at least a part of the surface to the roughening treatment is used. Since it is provided with a plate material and a resin film that covers the surface of the plate material, the resin is filled and held in the uneven portions of the roughened surface, and the adhesive force between the plate material and the resin film becomes strong, and Even if an impact occurs, the resin coating does not separate from the plate material, and even if a shocking shearing force acts on the interface between the plate material and the resin coating, it exerts sufficient counter force and exerts sufficient resistance between the plate material and the resin coating. There is an effect that the adhesiveness can be secured. According to the resin-coated copper-based metal plate of claim 2, the roughness of the roughened surface is
Centerline average roughness (Ra) defined in JISBO601
Since the thickness is 1.0 μm or more, the adhesive force between the roughened surface and the resin coating is further enhanced, and the adhesion between the resin coating and the plate material is further improved.

【0020】請求項3の樹脂被膜銅系金属板の製造方法
によれば、銅系金属からなる板材の表面の少なくとも一
部に化学エッチングにより粗面化処理を施して粗面化処
理面を形成し、前記板材の表面を樹脂により被覆して樹
脂被膜を形成したので、粗面化処理面の凹凸部に樹脂が
充填、保持されて板材と樹脂被膜との間の接着力が強固
になり、熱衝撃が起こっても樹脂被膜が板材から剥離す
ることはなく、板材と樹脂被膜との界面に衝撃的なせん
断力が働いても、充分な対抗力を発揮して板材と樹脂被
膜との密着性を確保することができる。
According to the method for producing a resin-coated copper-based metal plate of claim 3, at least a part of the surface of the plate material made of copper-based metal is subjected to a roughening treatment by chemical etching to form a roughened surface. Then, since the resin coating is formed by coating the surface of the plate material with a resin, the resin is filled in the concave and convex portions of the roughening-treated surface, and the adhesive force between the plate material and the resin coating is retained, and the adhesive force becomes strong. Even if a thermal shock occurs, the resin coating does not separate from the plate material, and even if a shocking shearing force acts on the interface between the plate material and the resin coating, it exerts sufficient resistance and adheres between the plate material and the resin coating. It is possible to secure the sex.

【0021】請求項4の樹脂被膜銅系金属板の製造方法
によれば、銅系金属からなる板材の表面の少なくとも一
部に電解エッチングにより粗面化処理を施して粗面化処
理面を形成し、前記板材の表面を樹脂により被覆して樹
脂被膜を形成したので、粗面化処理面の凹凸部に樹脂が
充填、保持されて板材と樹脂被膜との間の接着力が強固
になり、熱衝撃が起こっても樹脂被膜が板材から剥離す
ることはなく、板材と樹脂被膜の界面に衝撃的なせん断
力が働いても、充分な対抗力を発揮して板材と樹脂被膜
との密着性を確保することができる。
According to the method for producing a resin-coated copper-based metal plate of claim 4, at least a part of the surface of the plate material made of copper-based metal is subjected to a roughening treatment by electrolytic etching to form a roughened surface. Then, since the resin coating is formed by coating the surface of the plate material with a resin, the resin is filled in the concave and convex portions of the roughening-treated surface, and the adhesive force between the plate material and the resin coating is retained, and the adhesive force becomes strong. Even if a thermal shock occurs, the resin coating does not separate from the plate material, and even if a shocking shearing force acts on the interface between the plate material and the resin coating, the adhesive force between the plate material and the resin coating will be sufficient by exerting sufficient resistance. Can be secured.

【0022】請求項5の樹脂被膜銅系金属板の製造方法
によれば、前記粗面化処理面の粗さを、JISBO60
1で定義される中心線平均粗さ(Ra)で1.0μm以
上にしたので、樹脂被膜と板材との密着性が一層向上す
る。請求項6の樹脂被膜銅系金属板の製造方法によれ
ば、前記化学エッチングにおいて、塩酸と塩化第二鉄の
混合溶液をエッチング液として使用するので、粗面化処
理の際のエッチング効率が高く、比較的短時間で所望の
表面粗さが得られる。請求項7の樹脂被膜銅系金属板の
製造方法によれば、前記電解エッチングにおいて、電圧
10V以上50V以下、陽極電流密度40A/dm2
上200A/dm2以下の処理条件で電解エッチングを
行ので、効率のよいエッチングが可能となり、比較的短
時間で所望の表面粗さが得られる。
According to the method for producing a resin-coated copper-based metal plate of claim 5, the roughness of the roughened surface is determined according to JISBO60.
Since the center line average roughness (Ra) defined by 1 is 1.0 μm or more, the adhesion between the resin coating and the plate material is further improved. According to the method for producing a resin-coated copper-based metal plate of claim 6, in the chemical etching, a mixed solution of hydrochloric acid and ferric chloride is used as an etching solution, so that the etching efficiency in the roughening treatment is high. The desired surface roughness can be obtained in a relatively short time. According to the method for producing a resin-coated copper-based metal plate of claim 7, in the electrolytic etching, electrolytic etching is performed under the processing conditions of a voltage of 10 V or more and 50 V or less and an anode current density of 40 A / dm 2 or more and 200 A / dm 2 or less. Efficient etching is possible, and the desired surface roughness can be obtained in a relatively short time.

【図面の簡単な説明】[Brief description of drawings]

【図1】 (a)は化学エッチング法を用いた場合の板
材とモールド樹脂の界面を模式的に示す断面図、(b)
は電解エッチングを用いた場合の板材とモールド樹脂の
界面を模式的に示す断面図である。
FIG. 1A is a sectional view schematically showing an interface between a plate material and a mold resin when a chemical etching method is used, and FIG.
FIG. 4 is a sectional view schematically showing an interface between a plate material and a mold resin when electrolytic etching is used.

【図2】 (a)は本発明の板材の製造方法の第1実施
例(実施例1)による銅の化学エッチングにより形成さ
れた粗面化処理面の走査型顕微鏡写真、(b)は本発明
の板材の製造方法の第2実施例(実施例2)による銅の
電解エッチングにより形成された粗面化処理面の走査型
顕微鏡写真である。
FIG. 2A is a scanning micrograph of a roughened surface formed by chemical etching of copper according to the first embodiment (Example 1) of the method for manufacturing a plate material of the present invention, and FIG. It is a scanning micrograph of the roughening process surface formed by the electrolytic etching of copper by the 2nd Example (Example 2) of the manufacturing method of the board | plate material of invention.

【図3】 本発明の板材の製造方法の第1実施例(実施
例1)により得られた粗面化処理面の表面粗さチャート
及び粗さ測定結果を示すグラフである。
FIG. 3 is a graph showing a surface roughness chart and a roughness measurement result of a roughened surface obtained by the first example (Example 1) of the method for manufacturing a plate material according to the present invention.

【図4】 本発明の板材の製造方法の第2実施例(実施
例2)により得られた粗面化処理面の表面粗さチャート
及び粗さ測定結果を示すグラフである。
FIG. 4 is a surface roughness chart of a roughened surface obtained by a second example (Example 2) of the method for manufacturing a plate material of the present invention and a graph showing a result of roughness measurement.

【符号の説明】[Explanation of symbols]

1 板材、2 粗面化処理面、3 樹脂被膜。 1 plate material, 2 roughened surface, 3 resin coating.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 和田 尚武 相模原市宮下一丁目1番57号 三菱電機メ テックス株式会社相模工場内 (72)発明者 伊藤 久敏 相模原市宮下一丁目1番57号 三菱電機メ テックス株式会社相模工場内 (72)発明者 春山 満 相模原市宮下一丁目1番57号 三菱電機メ テックス株式会社相模工場内 (72)発明者 久保薗 健治 相模原市宮下一丁目1番57号 三菱電機メ テックス株式会社相模工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Naotake Wada 1-57 Miyashita, Sagamihara City Mitsubishi Electric Metex Co., Ltd. Sagami Factory (72) Inventor Hisatoshi Ito 1-57 Miyashita, Sagamihara Mitsubishi Electric Metex Co., Ltd. Sagami Plant (72) Inventor Mitsuru Haruyama 1-57 Miyashita, Sagamihara City Mitsubishi Electric Metex Co., Ltd. Sagami Plant (72) Inventor Kenji Kubo 1-57 Miyashita, Sagamihara City Mitsubishi Denki Metex Co., Ltd. Sagami Factory

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 表面の少なくとも一部に粗面化処理を施
して形成したた粗面化処理面を有する銅系金属からなる
板材と、その板材の表面を被覆する樹脂被膜とを備える
ことを特徴とする樹脂被膜銅系金属板。
1. A plate material comprising a copper-based metal having a roughened surface formed by subjecting at least a part of the surface to a roughening treatment, and a resin coating film covering the surface of the plate material. Characteristic resin coated copper metal plate.
【請求項2】 前記粗面化処理面の粗さは、JISBO
601で定義される中心線平均粗さ(Ra)で1.0μ
m以上であることを特徴とする請求項1記載の樹脂被膜
銅系金属板。
2. The roughness of the roughened surface is JISBO
1.0μ in centerline average roughness (Ra) defined by 601
The resin-coated copper-based metal plate according to claim 1, wherein the resin-coated copper-based metal plate is at least m.
【請求項3】 銅系金属からなる板材の表面の少なくと
も一部に化学エッチングにより粗面化処理を施して粗面
化処理面を形成し、前記板材の表面を樹脂により被覆し
て樹脂被膜を形成することを特徴とする樹脂被膜銅系金
属板の製造方法。
3. A plate surface made of copper-based metal is subjected to a surface roughening treatment by chemical etching to form a surface roughened surface, and the surface of the plate material is coated with a resin to form a resin coating. A method for producing a resin-coated copper-based metal sheet, which is characterized by being formed.
【請求項4】 銅系金属からなる板材の表面の少なくと
も一部に電解エッチングにより粗面化処理を施して粗面
化処理面を形成し、前記板材の表面を樹脂により被覆し
て樹脂被膜を形成することを特徴とする樹脂被膜銅系金
属板の製造方法。
4. A plate surface made of copper-based metal is subjected to a surface roughening treatment by electrolytic etching to form a surface roughened surface, and the surface of the plate material is covered with a resin to form a resin film. A method for producing a resin-coated copper-based metal sheet, which is characterized by being formed.
【請求項5】 前記粗面化処理面の粗さは、JISBO
601で定義される中心線平均粗さ(Ra)で1.0μ
m以上であることを特徴とする請求項3又は請求項4記
載の樹脂被膜銅系金属板の製造方法。
5. The roughness of the roughened surface is JISBO.
1.0μ in centerline average roughness (Ra) defined by 601
It is m or more, The manufacturing method of the resin coat copper system metal plate of Claim 3 or Claim 4 characterized by the above-mentioned.
【請求項6】 前記化学エッチングにおいて、塩酸と塩
化第二鉄の混合溶液をエッチング液として使用すること
を特徴とする請求項3記載の樹脂被膜銅系金属板の製造
方法。
6. The method for producing a resin-coated copper-based metal plate according to claim 3, wherein a mixed solution of hydrochloric acid and ferric chloride is used as an etching solution in the chemical etching.
【請求項7】 前記電解エッチングにおいて、電圧10
V以上50V以下、陽極電流密度40A/dm2以上2
00A/dm2以下の処理条件で電解エッチングを行う
ことを特徴とする請求項4記載の樹脂被膜銅系金属板の
製造方法。
7. A voltage of 10 in the electrolytic etching.
V or more and 50 V or less, anode current density 40 A / dm 2 or more 2
The method for producing a resin-coated copper-based metal plate according to claim 4, wherein the electrolytic etching is performed under a treatment condition of 00 A / dm 2 or less.
JP17728494A 1994-07-28 1994-07-28 Resin film-coated copper-base material sheet and its production Pending JPH0841660A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17728494A JPH0841660A (en) 1994-07-28 1994-07-28 Resin film-coated copper-base material sheet and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17728494A JPH0841660A (en) 1994-07-28 1994-07-28 Resin film-coated copper-base material sheet and its production

Publications (1)

Publication Number Publication Date
JPH0841660A true JPH0841660A (en) 1996-02-13

Family

ID=16028347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17728494A Pending JPH0841660A (en) 1994-07-28 1994-07-28 Resin film-coated copper-base material sheet and its production

Country Status (1)

Country Link
JP (1) JPH0841660A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008081816A (en) * 2006-09-28 2008-04-10 Denso Corp Pretreatment method joining for metal stock
EP2894240A4 (en) * 2013-07-18 2016-10-19 Mitsui Chemicals Inc Metal/resin composite structure and metal member
CN114108055A (en) * 2021-12-30 2022-03-01 四会富仕电子科技股份有限公司 Method for electrolytically roughening copper surface

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008081816A (en) * 2006-09-28 2008-04-10 Denso Corp Pretreatment method joining for metal stock
EP2894240A4 (en) * 2013-07-18 2016-10-19 Mitsui Chemicals Inc Metal/resin composite structure and metal member
US9987824B2 (en) 2013-07-18 2018-06-05 Mitsui Chemicals, Inc. Metal-resin composite structure and metal member
TWI648152B (en) * 2013-07-18 2019-01-21 三井化學股份有限公司 Metal/resin composite structure and metal member
CN114108055A (en) * 2021-12-30 2022-03-01 四会富仕电子科技股份有限公司 Method for electrolytically roughening copper surface

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