JPH0837373A - Film bridging multilayered wiring board and its manufacture - Google Patents

Film bridging multilayered wiring board and its manufacture

Info

Publication number
JPH0837373A
JPH0837373A JP16953594A JP16953594A JPH0837373A JP H0837373 A JPH0837373 A JP H0837373A JP 16953594 A JP16953594 A JP 16953594A JP 16953594 A JP16953594 A JP 16953594A JP H0837373 A JPH0837373 A JP H0837373A
Authority
JP
Japan
Prior art keywords
wiring board
resin
film
multilayer wiring
metal foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16953594A
Other languages
Japanese (ja)
Inventor
Koichi Tsuyama
宏一 津山
Akishi Nakaso
昭士 中祖
Kazuyoshi Otsuka
和好 大塚
Haruo Ogino
晴夫 荻野
Akinari Kida
明成 木田
Yoshihiro Tamura
義広 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP16953594A priority Critical patent/JPH0837373A/en
Publication of JPH0837373A publication Critical patent/JPH0837373A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4688Composite multilayer circuits, i.e. comprising insulating layers having different properties
    • H05K3/4691Rigid-flexible multilayer circuits comprising rigid and flexible layers, e.g. having in the bending regions only flexible layers

Abstract

PURPOSE:To obtain a film bridging multilayered wiring board on which wires can be wired at a high density by constituting the wiring board of a plurality of substrates and bridging sections and reinforcing the resin layers of the bridging sections by respectively sticking movable reinforcing layers to one surfaces of the resin layers at least within the extents of the bridging sections. CONSTITUTION:A film bridging multilayered wiring board is provided with a plurality of substrates 1 housing wiring and flexible bridging sections 2 which connect the substrates 1 to each other. Each bridging section 2 is constituted of wiring and a resin layer 4 which is composed mainly of an epoxy resin or phenol resin. In addition, the layer 4 is reinforced by sticking a flexible reinforcing layer to one surface of the layer 4 at least within the extent of the bridging section 2. The substrates 1 housing multilayered wiring have through holes 7, etc., for electrically connecting wiring layers to each other through the substrates 1. Therefore, IVH connection becomes possible and this multilayered wiring board can be applied to such a use that requires high- density wiring.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、高密度なフィルム橋絡
接続多層配線板とその製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-density film bridging connection multilayer wiring board and a manufacturing method thereof.

【0002】[0002]

【従来の技術】電子機器の軽薄短小化、高機能化にとも
ない、配線板の設置空間の狭小化が進み、配線板は、よ
り一層の高密度化、薄型化が必要とされてきている。高
密度化、薄型化した多層配線板は、設置空間の大きさに
あわせて、複数枚設置され、相互に接続されることが増
えてきている。
2. Description of the Related Art As electronic devices become lighter, thinner, shorter, smaller, and more sophisticated, the installation space for wiring boards is becoming narrower, and wiring boards are required to be even higher in density and thinner. A plurality of high-density and thin multilayer wiring boards are installed and connected to each other according to the size of the installation space.

【0003】その方法として、2個のリジッドな多層
配線板をフレキシブル配線板で機械的に接続した複合配
線板を用いる方法、リジッドな多層配線板部分にフレ
キシブル配線板を延設したリジッドフレックス配線板を
用いる方法があった。
As a method therefor, a method using a composite wiring board in which two rigid multilayer wiring boards are mechanically connected by a flexible wiring board is used, and a rigid flex wiring board in which a flexible wiring board is extended to a rigid multilayer wiring board portion. There was a method of using.

【0004】[0004]

【発明が解決しようとする課題】ところで、従来の技術
のうち、の方法の場合、接続のためにだけ用いるフレ
キシブル配線板のコストが高く、また、フレキシブル配
線板の両端をリジッドな配線板と接続する必要があるた
め、加工コストがかかるという課題がある。また、従来
の技術のうち、の場合、従来のリジッドフレックス配
線板に使用される材料は、価格が高く、高コストとなる
という課題がある。
By the way, in the method of the prior art, the cost of the flexible wiring board used only for connection is high, and both ends of the flexible wiring board are connected to the rigid wiring board. Therefore, there is a problem that the processing cost is high. In addition, in the case of the conventional technique, the material used for the conventional rigid flex wiring board has a problem that the price is high and the cost is high.

【0005】本発明は、配線密度に優れたフィルム橋絡
接続多層配線板と、そのような多層配線板を経済的に製
造する方法を提供することを目的とするものである。
An object of the present invention is to provide a film bridge connection multilayer wiring board having an excellent wiring density and a method for economically producing such a multilayer wiring board.

【0006】[0006]

【課題を解決するための手段】本発明のフィルム橋絡接
続多層配線板は、図4に示すように、多層配線が収容さ
れた複数の基板1と、それらを結ぶ可撓性の橋絡接続部
2からなり、橋絡接続部2が、配線3と樹脂層4からな
り、樹脂層4が、少なくとも橋絡接続部の範囲で片面
に、可撓性の強化層が設けられていることを特徴とす
る。
As shown in FIG. 4, a film bridging connection multilayer wiring board of the present invention has a plurality of substrates 1 in which multilayer wirings are accommodated and a flexible bridging connection connecting them. That the bridge connecting portion 2 is composed of the wiring 3 and the resin layer 4, and the resin layer 4 is provided with a flexible reinforcing layer on one surface at least in the range of the bridge connecting portion. Characterize.

【0007】この多層配線が収容された基板1には、図
4にも示すように、基板1を貫通し各配線層を電気的に
接続するためのスルーホール31や、最外層の配線とそ
の内側に形成された配線層のみを接続するバイアホール
32を設けることもできる。
As shown in FIG. 4, a through hole 31 for penetrating the substrate 1 to electrically connect each wiring layer to the substrate 1 in which the multi-layered wiring is accommodated, the wiring of the outermost layer and the wiring are formed. It is also possible to provide a via hole 32 for connecting only the wiring layer formed inside.

【0008】このような多層配線板の製造法としては、
図1(a)に示す内層配線板11を作る工程、金属箔と
接着性の樹脂層とを一体化した接着金属箔12を作る工
程、図1(b)に示すように、該内層配線板11と該接
着金属箔12とを、後に橋絡接続部2となる箇所に離形
用フィルムを介して、積層接着する工程、図1(c)〜
(d)に示すように、積層接着した物に配線形成を行う
工程、図1(e)および(f)に示すように、外形の切
断加工を行う工程、図1(g)に示すように、離形用フ
ィルムを境界として、内層配線板の橋絡接続部2といな
る箇所を切断除去する工程を有することを特徴とする。
As a method of manufacturing such a multilayer wiring board,
1A, a step of making an inner wiring board 11, a step of making an adhesive metal foil 12 in which a metal foil and an adhesive resin layer are integrated, as shown in FIG. 1B, the inner wiring board 1 (c) to a step of laminating and bonding 11 and the adhesive metal foil 12 to a portion which will later become the bridging connection portion 2 via a release film.
As shown in (d), a step of forming wiring on the laminated and bonded product, a step of cutting the outer shape as shown in FIGS. 1 (e) and 1 (f), and a step shown in FIG. 1 (g). The method further comprises a step of cutting and removing a portion of the inner layer wiring board, which becomes the bridging connection portion 2, with the release film as a boundary.

【0009】このときに、離型用フィルムに代えて、離
型用金属箔とすることもできる。
At this time, a release metal foil may be used instead of the release film.

【0010】(内層配線板)この内層配線形板には、ガ
ラス布と熱硬化性樹脂を主体とする基材に内層配線を形
成した内層配線板を用いることができる。
(Inner Layer Wiring Board) As the inner layer wiring shaped board, an inner layer wiring board in which inner layer wiring is formed on a base material mainly made of glass cloth and thermosetting resin can be used.

【0011】(橋絡接続部)本発明の橋絡接続部2に
は、一般のフレキシブル配線板ほどの耐折性は必要とし
ないものの、多少の折り曲げに対しては、クラックが入
らない程度の可撓性が必要である。一般のエポキシ樹脂
やフェノール樹脂の場合、フィルム状にして硬化させる
と、割れ易くなるので、可塑化剤の混合や樹脂の変性が
必要となる。このときに、樹脂の耐熱性や電気特性の確
保が必要であり、また、ポリイミド樹脂ほど高価でない
ことが望ましい。
(Bridge Connection Portion) The bridge connection portion 2 of the present invention does not require the folding endurance of a general flexible wiring board, but does not crack when slightly bent. Flexibility is required. In the case of general epoxy resins and phenol resins, if they are made into a film and cured, they tend to crack, so it is necessary to mix a plasticizer and modify the resin. At this time, it is necessary to secure the heat resistance and electrical characteristics of the resin, and it is desirable that the resin be less expensive than the polyimide resin.

【0012】このような接着金属箔の樹脂に、高分子量
エポキシ重合体を用いる場合、可塑化剤の使用や、樹脂
の変性をしなくとも、硬化後にある程度の可撓性を保
ち、また、積層接着時の加熱時にも樹脂粘度を高く保つ
ことができる。このような高分子量エポキシ重合体フィ
ルムとして、市販ものでは、AS−3000(日立化成
工業株式会社製、商品名)を用いることができる。
When a high molecular weight epoxy polymer is used as the resin of such an adhesive metal foil, it retains a certain degree of flexibility after curing without using a plasticizer or modification of the resin, and is laminated. The resin viscosity can be kept high even during heating during bonding. As such a high molecular weight epoxy polymer film, commercially available AS-3000 (trade name, manufactured by Hitachi Chemical Co., Ltd.) can be used.

【0013】また、橋絡接続部2は、さらに可撓性の樹
脂フィルムや金属箔で強化層5を形成することもでき
る。
Further, the bridging connection portion 2 can be formed with a reinforced layer 5 of a flexible resin film or a metal foil.

【0014】なお、本発明は、接着金属箔の樹脂層を、
複数の樹脂で複層に形成することや、その場合に、最外
層以外の樹脂層に接着力のない(例えば硬化した)樹脂
層を用いることもできる。
In the present invention, the resin layer of the adhesive metal foil is
It is also possible to form a multi-layered structure with a plurality of resins, and in that case, a resin layer having no adhesive force (for example, cured) can be used as the resin layer other than the outermost layer.

【0015】(接着金属箔)接着金属箔には、予め、層
間接続用の穴が穴開けされた穴付接着金属箔を用いるこ
とができる。この接着金属箔への穴開けは、ドリル穴開
けや、パンチングなど公知の方法を用いることができ
る。
(Adhesive Metal Foil) As the adhesive metal foil, an adhesive metal foil with holes in which holes for interlayer connection are preliminarily drilled can be used. For making holes in the adhesive metal foil, known methods such as drilling and punching can be used.

【0016】接着金属箔の樹脂層に用いる樹脂の種類に
は、特に制限するものではないが、エポキシ樹脂、フェ
ノール樹脂、および、これらの変性樹脂が好ましい。こ
れらの中でも、耐熱性、機械特性、電気特性、耐薬品性
などの特性が総合的に優れたエポキシ樹脂が好ましい。
特性的には、やや低下するものの、樹脂が安価であり、
配線板用途に多く用いられているフェノール樹脂は、経
済的である。樹脂層には、有機フィラや無機フィラを含
んでいてもよく、樹脂層を紙や、織布や不織布に含浸さ
せることもできる。
The type of resin used for the resin layer of the adhesive metal foil is not particularly limited, but epoxy resin, phenol resin, and modified resins thereof are preferable. Among these, epoxy resins having excellent properties such as heat resistance, mechanical properties, electrical properties, and chemical resistance are preferred.
In terms of characteristics, resin is cheap,
Phenolic resins, which are often used for wiring board applications, are economical. The resin layer may contain an organic filler or an inorganic filler, and the resin layer may be impregnated in paper, woven cloth or non-woven cloth.

【0017】樹脂層に用いる樹脂は、加熱時に、粘度が
低すぎると、層間絶縁が不十分となったり、また、予
め、穴開けされた穴付接着金属箔を用いる場合には、後
述するバイアホール用の穴内に樹脂がしみだして、導通
をとることができなくなる等の不具合があるので、粘度
を適当に保つために、上記のようなフィラの添加や、紙
や織布、不織布を用いて、樹脂層に含まれる樹脂の割合
を低下させることによって、見かけの粘度を調節する方
法を用いてもよい。
When the resin used for the resin layer has too low a viscosity during heating, the interlayer insulation becomes insufficient, and when a pre-drilled adhesive metal foil with holes is used, the via layer to be described later is used. There is a problem that the resin oozes into the holes for holes and it becomes impossible to conduct electricity.Therefore, in order to maintain an appropriate viscosity, the addition of fillers such as those mentioned above and the use of paper, woven fabric, or non-woven fabric is used. Then, a method of adjusting the apparent viscosity by reducing the proportion of the resin contained in the resin layer may be used.

【0018】また、内層配線板と接着金属箔との積層接
着時には、クッション材を鏡板と積層物の間に介挿させ
て、積層接着することが好ましい。
Further, when laminating and bonding the inner wiring board and the adhesive metal foil, it is preferable to insert a cushion material between the end plate and the laminate to laminate and bond them.

【0019】(離形層)離形用金属箔を用いたときに
は、内層配線板の橋絡接続部2となる箇所の切断除去に
は、後にも述べるように、レーザを用いることもでき
る。
(Release Layer) When a release metal foil is used, a laser can be used for cutting and removing the portion which becomes the bridging connection portion 2 of the inner layer wiring board, as will be described later.

【0020】積層接着時に内層配線形成物と接着金属箔
との接着を防ぐ目的で介挿する離形用金属箔には、銅箔
やアルミニウム箔などを用いることができる。これらの
離形用金属箔の厚さは、厚すぎると、積層接着時に段差
が大きくなり、積層接着が不完全となる。また、薄すぎ
ると取り扱いが難しくなる。これらのことから、厚さは
15〜80ミクロンが望ましく、より望ましくは、15
〜40ミクロンである。
A copper foil, an aluminum foil, or the like can be used as the release metal foil which is inserted for the purpose of preventing the adhesion between the inner layer wiring formed product and the adhesive metal foil at the time of lamination and adhesion. If the thickness of these release metal foils is too thick, a step difference becomes large at the time of laminating and bonding, and the laminating and bonding becomes incomplete. If it is too thin, it will be difficult to handle. From these, the thickness is preferably 15 to 80 microns, more preferably 15 to 80 microns.
~ 40 microns.

【0021】積層接着には、鏡板の間に目的とする積層
物を配設する通常の方法を用いることもできるが、内層
配線の間隙部への接着金属箔の樹脂層の埋まり込みが不
十分となったり、離形用金属箔の段差のため、離形用金
属箔周辺部が接着不良となることが多い。これを防ぐた
め、クッション材を鏡板と積層物の間に挿入することが
望ましい。クッション材には、0.2mm〜1mmの厚
さのシリコーンゴムや、30μm〜100μmの厚さの
ポリエチレンフィルムなどを用いることができる。
A normal method of arranging a desired laminate between the end plates can be used for the lamination adhesion, but if the resin layer of the adhesion metal foil is not sufficiently embedded in the gap portion of the inner layer wiring. In many cases, the peripheral portion of the release metal foil has poor adhesion due to the unevenness of the release metal foil. To prevent this, it is desirable to insert a cushion material between the end plate and the laminate. As the cushion material, a silicone rubber having a thickness of 0.2 mm to 1 mm, a polyethylene film having a thickness of 30 μm to 100 μm, or the like can be used.

【0022】積層接着より後の工程において、離形用金
属箔を境界として内層配線形成物の特定部分を切断除去
する。この切断除去の時期は、特に制限するものではな
いが、外形加工後に行うことが望ましい。切断は、内層
配線形成物の切断部分に予めVカットを行うか、もしく
は、積層後に、Vカットを行い、Vカット部分で特定部
分を折り取ってもよい。また、不要部分側(内層配線形
成物側)から一定の深さにナイフで切込みを入れて切断
してもよい。生産性の点からは、不要部分側からレーザ
光を照射し、離形用金属箔をストッパとして切断する方
法が優れている。
In a step after the lamination adhesion, a specific portion of the inner layer wiring formed product is cut and removed with the release metal foil as a boundary. The timing of this cutting and removal is not particularly limited, but it is desirable to carry out after the outer shape processing. For the cutting, V cutting may be performed in advance on the cut portion of the inner layer wiring formation product, or V cutting may be performed after stacking and a specific portion may be broken off at the V cutting portion. Further, it is also possible to cut by cutting with a knife to a certain depth from the unnecessary portion side (inner layer wiring formation side). From the viewpoint of productivity, a method of irradiating a laser beam from the unnecessary portion side and cutting the release metal foil as a stopper is excellent.

【0023】離形用金属箔は、橋絡接続部の強化のため
に残しておくことが好ましい。配線層間の接続には、従
来のスルーホール接続を用いることができる。また、予
め、穴開けした接着金属箔を用いれば、スルーホール接
続時に同時にIVH(インタステッシャルバイアホー
ル)接続を行うことができる。接続方法としては、めっ
きで接続する方法の他、導電物、例えば、銅ペーストや
銀ペーストを充填し、接続する方法を用いることもでき
る。
The release metal foil is preferably left for strengthening the bridging connection. A conventional through-hole connection can be used for the connection between the wiring layers. Further, if an adhesive metal foil that has been punched in advance is used, IVH (interstitial via hole) connection can be performed at the same time when the through hole is connected. As the connection method, in addition to the method of connecting by plating, a method of filling and connecting a conductive material such as a copper paste or a silver paste can also be used.

【0024】[0024]

【作用】本発明では、離形用金属箔または離形フィルム
を介在させて、一旦、積層接着した後、離形用金属箔ま
たは離形フィルムを境界として内層配線形成物の不要部
分を切断除去しているので、積層接着時には、一般の多
層配線板と同様に扱って、製造することができる。ま
た、本発明の目的によって、粘度の高い樹脂を用いる場
合、通常の鏡板によるプレスでは、内層配線間の間隙
や、離形用金属箔による段差を樹脂が充分に埋め込むこ
とが困難となり、ボイドの発生や、冷熱サイクル時にク
ラックの原因となることがあるが、本発明により、鏡板
と積層を行うものとの間にクッション材を挿入するの
で、この様な不具合はない。
In the present invention, after the release metal foil or release film is interposed and the layers are once laminated and adhered, the unnecessary portions of the inner layer wiring formation are cut and removed with the release metal foil or release film as a boundary. Therefore, when laminated and bonded, it can be handled and manufactured in the same manner as a general multilayer wiring board. Further, according to the object of the present invention, when a resin having a high viscosity is used, it is difficult to sufficiently fill the gap between the inner layer wirings and the step due to the release metal foil with the resin by a press using an ordinary mirror plate, which may cause a void. Occurrence or cracking may occur during the heat cycle, but such a problem does not occur because the cushion material is inserted between the end plate and the one to be laminated according to the present invention.

【0025】[0025]

【実施例】【Example】

(内層配線形成物の準備)ガラス布にエポキシ樹脂を含
浸した基材の両面に銅箔を積層したコア材に、IVH接
続部分の必要箇所にランドを設けた内層配線を、エッチ
ングで形成した。
(Preparation of Inner-Layer Wiring Formed Product) An inner-layer wiring was formed by etching, in which a core was formed by laminating copper foils on both sides of a base material impregnated with epoxy resin on a glass cloth, and lands were provided at necessary portions of the IVH connection portion.

【0026】(穴付接着金属箔の準備)50ミクロン厚
さの高分子量エポキシ重合体フィルムAS3000(日
立化成工業株式会社製、商品名)と銅箔を重ね合わせて
加圧加熱して接着した。なお、この時の接着は、高分子
量エポキシ重合体フィルムのBステージ状態を保つよう
に、短時間(約5分間)で行った。この接着金属箔(銅
箔)に、IVH接続用の穴(0.3ミリ径)をドリルで
開けた穴付接着金属箔を準備した。
(Preparation of Adhesive Metal Foil with Holes) A high-molecular-weight epoxy polymer film AS3000 (trade name, manufactured by Hitachi Chemical Co., Ltd.) having a thickness of 50 μm and copper foil were superposed on each other and heated and adhered. The adhesion at this time was carried out in a short time (about 5 minutes) so that the B-stage state of the high molecular weight epoxy polymer film was maintained. An adhesive metal foil with holes was prepared by drilling a hole (0.3 mm diameter) for IVH connection in this adhesive metal foil (copper foil).

【0027】(実施例)内層配線形成物の配線板の特定
部分となる部分に、離形用の銅箔を配置し、最終的に配
線板とならない部分(切断代)に微量の接着剤を用い
て、仮どめした。このものに、穴付接着金属箔を重ね
て、積層接着した。次に、ドリルで、スルーホール接続
用の穴開けを行った。ホールクリーニング等の処理を行
った後、スルーホール接続部及び、IVH接続部での層
間接続のための厚付け銅めっきを行った。この後、テン
ティング法によって、表面配線を形成した。特定部(橋
絡接続予定部分)の境界部へのVカット処理、外形切断
加工後、Vカット部分から内層配線形成物の不要部分を
切断除去した。
(Example) A copper foil for mold release is arranged on a portion of an inner layer wiring formed product which is a specific portion of a wiring board, and a trace amount of an adhesive is applied to a portion (cutting margin) which is not finally the wiring board. I used it and made a temporary stop. An adhesive metal foil with holes was placed on this product and laminated and adhered. Next, a hole was drilled for connecting the through hole with a drill. After performing processing such as hole cleaning, thick copper plating for interlayer connection at the through hole connection portion and the IVH connection portion was performed. Then, surface wiring was formed by a tenting method. After the V-cut process and the outer shape cutting process were performed on the boundary portion of the specific portion (planned bridge connection portion), unnecessary portions of the inner layer wiring formation were cut and removed from the V-cut portion.

【0028】[0028]

【発明の効果】本発明により、高価な材料を用いること
がなく、少ない工程で、リジッド配線板どうしを橋絡接
続構造としたフィルム橋絡接続配線板を製造できる。ま
た、IVH接続が可能であり、高密度が要求される用途
にも適用でき、この時のコストアップも従来の方法に比
べて小さい。以上の様にして、本発明は、低コストで、
電子機器の高密度化に寄与するものである。
According to the present invention, it is possible to manufacture a film bridge connecting wiring board in which rigid wiring boards have a bridge connecting structure without using an expensive material and in a small number of steps. In addition, IVH connection is possible and it can be applied to applications requiring high density, and the cost increase at this time is smaller than that of the conventional method. As described above, the present invention is low cost,
This contributes to higher density of electronic devices.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)〜(g)は、それぞれ、本発明の一実施
例を説明するための各工程における断面図である。
1A to 1G are cross-sectional views in each step for explaining an embodiment of the present invention.

【図2】本発明の一実施例を説明するための概略上面図
である。
FIG. 2 is a schematic top view for explaining an embodiment of the present invention.

【図3】本発明の一実施例を説明するための上面図であ
る。
FIG. 3 is a top view for explaining an embodiment of the present invention.

【図4】本発明の一実施例による配線板の使用状態を示
す断面図である。
FIG. 4 is a sectional view showing a usage state of a wiring board according to an embodiment of the present invention.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 荻野 晴夫 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 (72)発明者 木田 明成 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館研究所内 (72)発明者 田村 義広 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Haruo Ogino 1500 Ogawa, Shimodate City, Ibaraki Prefecture Shimodate Factory, Hitachi Chemical Co., Ltd. Shimodate Research Center (72) Inventor Yoshihiro Tamura 1500 Ogawa, Shimodate City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Shimodate Factory

Claims (27)

【特許請求の範囲】[Claims] 【請求項1】多層配線が収容された複数の基板と、それ
らを結ぶ可撓性の橋絡接続部からなり、橋絡接続部が、
配線と樹脂層からなり、樹脂層が、少なくとも橋絡接続
部の範囲で片面に、可撓性の強化層が設けられているこ
とを特徴とするフィルム橋絡接続多層配線板。
1. A plurality of substrates accommodating multilayer wiring and a flexible bridging connection portion connecting them, the bridging connection portion comprising:
A film bridging connection multilayer wiring board comprising a wiring and a resin layer, wherein the resin layer is provided with a flexible reinforcing layer on one surface at least in the range of the bridging connection portion.
【請求項2】橋絡接続部とその延長部分を除く基板部分
が、ガラス布等の繊維強化材に熱硬化性樹脂を含浸した
材料を主体とするからなることを特徴とする請求項1に
記載のフィルム橋絡接続多層配線板。
2. The substrate portion excluding the bridging connection portion and its extended portion is mainly made of a material obtained by impregnating a fiber-reinforced material such as glass cloth with a thermosetting resin. The described film bridge connection multilayer wiring board.
【請求項3】フィルム橋絡接続部に形成された配線ある
いはその配線と同一面に形成された配線が、その直下の
層に形成された配線と電気的に接続される、層間接続穴
を有することを特徴とする請求項1または2に記載のフ
ィルム橋絡接続多層配線板。
3. A wiring formed in a film bridging connection portion or a wiring formed on the same surface as the wiring has an interlayer connection hole for electrically connecting with a wiring formed in a layer immediately below the wiring. The film bridge connection multilayer wiring board according to claim 1 or 2, characterized in that.
【請求項4】橋絡接続部の樹脂層が、エポキシ樹脂を主
体とする樹脂層であることを特徴とする請求項1から3
のうちいずれかに記載のフィルム橋絡接続多層配線板。
4. The resin layer of the bridge connection portion is a resin layer mainly composed of an epoxy resin.
The film wiring bridged multilayer wiring board according to any one of 1.
【請求項5】エポキシ樹脂を主体とする樹脂層の樹脂
が、高分子量エポキシ重合体を主体とする樹脂であるこ
とを特徴とする請求項4に記載のフィルム橋絡接続多層
配線板。
5. The film bridging connection multilayer wiring board according to claim 4, wherein the resin of the resin layer containing an epoxy resin as a main component is a resin containing a high molecular weight epoxy polymer as a main component.
【請求項6】エポキシ樹脂を主体とする樹脂層の樹脂
が、アミドエポキシ樹脂を主体とする樹脂であることを
特徴とする請求項4に記載のフィルム橋絡接続多層配線
板。
6. The film bridge connection multilayer wiring board according to claim 4, wherein the resin of the resin layer containing an epoxy resin as a main component is a resin containing an amide epoxy resin as a main component.
【請求項7】橋絡接続部の樹脂層が、フェノール樹脂を
主体とする樹脂層であることを特徴とする請求項1から
3のうちいずれかに記載のフィルム橋絡接続多層配線
板。
7. The film bridging connection multilayer wiring board according to claim 1, wherein the resin layer of the bridging connection portion is a resin layer mainly composed of a phenol resin.
【請求項8】橋絡接続部分が、可撓性の樹脂フィルムで
強化されたものであることを特徴とする請求項1から7
のうちいずれかに記載のフィルム橋絡接続多層配線板。
8. The bridging connection portion is reinforced with a flexible resin film, wherein the bridging connection portion is reinforced with a flexible resin film.
The film wiring bridged multilayer wiring board according to any one of 1.
【請求項9】可撓性の樹脂フィルムが、ポリイミドフィ
ルム、ポリエステルフィルムのいずれかであることを特
徴とする請求項1から8のうちいずれかに記載のフィル
ム橋絡接続多層配線板。
9. The multilayer film wiring board according to claim 1, wherein the flexible resin film is one of a polyimide film and a polyester film.
【請求項10】橋絡接続部分が、金属箔で強化されたこ
とを特徴とする請求項1から7のうちいずれかに記載の
フィルム橋絡接続多層配線板。
10. The multilayer wiring board for film bridge connection according to claim 1, wherein the bridge connection portion is reinforced with a metal foil.
【請求項11】内層配線板を作る工程、金属箔と接着性
の樹脂層とを一体化した接着金属箔を作る工程、該内層
配線形成物と該接着金属箔とを、フィルム橋絡接続部と
なる箇所に少なくとも内層配線板と接着しない離形フィ
ルムを介在させて積層接着する工程、積層接着した物に
配線形成を行う工程、外形の切断加工を行う工程、離形
フィルムを境界として内層配線板を切断除去し、複数の
多層配線板部を結ぶフィルム橋絡接続部を形成する工程
を有することを特徴とするフィルム橋絡接続多層配線板
の製造法。
11. A step of producing an inner wiring board, a step of producing an adhesive metal foil in which a metal foil and an adhesive resin layer are integrated, the inner layer wiring formed product and the adhesive metal foil are connected to each other via a film bridging connection portion. At the location where at least a release film that does not adhere to the inner layer wiring board is laminated and bonded, a process of forming wiring on the laminated and bonded product, a step of cutting the outer shape, an inner layer wiring with the release film as a boundary A method for producing a film-bridge-connected multilayer wiring board, which comprises a step of cutting and removing the board to form a film-bridge connecting section connecting a plurality of multilayer wiring board sections.
【請求項12】内層配線板が、ガラス布と熱硬化性樹脂
を主体とする基材に、内層配線を形成することを特徴と
する請求項11に記載のフィルム橋絡接続多層配線板の
製造法。
12. The production of a film-bridge-connected multilayer wiring board according to claim 11, wherein the inner wiring board is formed by forming the inner wiring on a base material mainly composed of a glass cloth and a thermosetting resin. Law.
【請求項13】接着金属箔が、予め、穴開けされた穴付
接着金属箔であることを特徴とする請求項11または1
2に記載のフィルム橋絡接続多層配線板の製造法。
13. The adhesive metal foil according to claim 11, wherein the adhesive metal foil is an adhesive metal foil with holes which is preliminarily punched.
2. The method for manufacturing a film bridge connection multilayer wiring board according to 2.
【請求項14】内層配線板と接着金属箔との積層接着時
に、クッション材を鏡板と積層物の間に介挿させて、積
層接着することを特徴とする請求項11から13のうち
いずれかに記載のフィルム橋絡接続多層配線板の製造
法。
14. The laminated bonding of the inner layer wiring board and the adhesive metal foil, wherein a cushioning material is inserted between the end plate and the laminated body to carry out the laminated bonding. The method for producing a film-bridge-connected multilayer wiring board according to.
【請求項15】接着性の樹脂層が、エポキシ樹脂を主体
とする樹脂層であることを特徴とする請求項11から1
4のうちいずれかに記載のフィルム橋絡接続多層配線板
の製造法。
15. The adhesive resin layer is a resin layer containing an epoxy resin as a main component, according to claim 11.
5. The method for producing a film bridge connection multilayer wiring board according to any one of 4 above.
【請求項16】エポキシ樹脂を主体とする樹脂層の樹脂
が、高分子量エポキシ重合体を主体とする樹脂であるこ
とを特徴とする請求項15に記載のフィルム橋絡接続多
層配線板の製造法。
16. The method for producing a film bridging connection multilayer wiring board according to claim 15, wherein the resin of the resin layer containing an epoxy resin as a main component is a resin containing a high molecular weight epoxy polymer as a main component. .
【請求項17】エポキシ樹脂を主体とする樹脂層の樹脂
が、アミドエポキシ樹脂を主体とする樹脂であることを
特徴とする請求項15に記載のフィルム橋絡接続多層配
線板の製造法。
17. The method for producing a film bridging connection multilayer wiring board according to claim 15, wherein the resin of the resin layer mainly containing epoxy resin is a resin mainly containing amide epoxy resin.
【請求項18】接着性の樹脂層が、フェノール樹脂を主
体とする樹脂層であることを特徴とする請求項11から
14のうちいずれかに記載のフィルム橋絡接続多層配線
板の製造法。
18. The method for producing a film bridging connection multilayer wiring board according to claim 11, wherein the adhesive resin layer is a resin layer mainly composed of a phenol resin.
【請求項19】内層配線板を作る工程、金属箔と接着性
の樹脂層とを一体化した接着金属箔を作る工程、該内層
配線板と該接着金属箔とを、後に少なくともフィルム橋
絡接続部となる箇所に離形用金属箔を介在させて、積層
接着する工程、積層接着した物に配線形成を行う工程、
外形の切断加工を行う工程、離形用金属箔を境界として
内層配線板を切断除去し、複数の多層配線板部を結ぶ橋
絡接続部を形成する工程を有することを特徴とするフィ
ルム橋絡接続多層配線板の製造法。
19. A step of forming an inner layer wiring board, a step of forming an adhesive metal foil in which a metal foil and an adhesive resin layer are integrated, and the inner layer wiring board and the adhesive metal foil are at least film-bridged later. A step of laminating and adhering a release metal foil to a portion to be a part, a step of forming wiring on the laminated and adhering object,
A film bridge characterized by having a step of cutting the outer shape, a step of cutting and removing the inner layer wiring board with the release metal foil as a boundary, and forming a bridge connection portion connecting a plurality of multilayer wiring board sections. Manufacturing method of connection multilayer wiring board.
【請求項20】内層配線形成物が、ガラス布と熱硬化性
樹脂を主体とする基材に内層配線が形成された内層配線
形成物であることを特徴とする請求項19に記載のフィ
ルム橋絡接続多層配線板の製造法。
20. The film bridge according to claim 19, wherein the inner layer wiring formed product is an inner layer wiring formed product in which the inner layer wiring is formed on a substrate mainly composed of glass cloth and a thermosetting resin. Manufacturing method of multi-layered wiring board.
【請求項21】接着金属箔が、予め、層間接続用の穴が
穴開けされた穴付接着金属箔であることを特徴とする請
求項19または20に記載のフィルム橋絡接続多層配線
板の製造法。
21. The film bridging connection multilayer wiring board according to claim 19 or 20, wherein the adhesive metal foil is an adhesive metal foil with holes in which holes for interlayer connection are preliminarily drilled. Manufacturing method.
【請求項22】内層配線形成物と接着金属箔との積層接
着時に、クッション材を鏡板と積層物の間に介挿させ
て、積層接着することを特徴とする請求項19から21
のうちいずれかに記載のフィルム橋絡接続多層配線板の
製造法。
22. The laminated bonding of the inner layer wiring formed product and the adhesive metal foil is performed by laminating and bonding a cushion material between the end plate and the laminated product.
A method for manufacturing a film bridge-connection multilayer wiring board according to any one of 1.
【請求項23】離形用金属箔を境界として内層配線形成
物の特定部分の切断除去に、レーザを用いて、切断を行
うことを特徴とする請求項19から22のうちいずれか
に記載のフィルム橋絡接続多層配線板の製造法。
23. A laser is used to cut and remove a specific portion of the inner layer wiring formed product with the release metal foil as a boundary, and the cutting is performed. Manufacturing method of film bridge connection multilayer wiring board.
【請求項24】接着性の樹脂層が、エポキシ樹脂を主体
とする樹脂層であることを特徴とする請求項19から2
3のうちいずれかに記載のフィルム橋絡接続多層配線板
の製造法。
24. The adhesive resin layer is a resin layer containing an epoxy resin as a main component.
4. The method for producing a film bridge connection multilayer wiring board according to any one of 3 above.
【請求項25】エポキシ樹脂を主体とする樹脂層の樹脂
が、高分子量エポキシ重合体を主体とする樹脂であるこ
とを特徴とする請求項24に記載のフィルム橋絡接続多
層配線板の製造法。
25. The method for producing a film bridging connection multilayer wiring board according to claim 24, wherein the resin of the resin layer containing an epoxy resin as a main component is a resin containing a high molecular weight epoxy polymer as a main component. .
【請求項26】エポキシ樹脂を主体とする樹脂層の樹脂
が、アミドエポキシ樹脂を主体とする樹脂であることを
特徴とする請求項24に記載のフィルム橋絡接続多層配
線板の製造法。
26. The method for producing a film bridge connection multilayer wiring board according to claim 24, wherein the resin of the resin layer containing an epoxy resin as a main component is a resin containing an amide epoxy resin as a main component.
【請求項27】接着性の樹脂層が、フェノール樹脂を主
体とする樹脂層であることを特徴とする請求項19から
23のうちいずれかに記載のフィルム橋絡接続多層配線
板の製造法。
27. The method for producing a film bridging connection multilayer wiring board according to claim 19, wherein the adhesive resin layer is a resin layer containing a phenol resin as a main component.
JP16953594A 1994-07-21 1994-07-21 Film bridging multilayered wiring board and its manufacture Pending JPH0837373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16953594A JPH0837373A (en) 1994-07-21 1994-07-21 Film bridging multilayered wiring board and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16953594A JPH0837373A (en) 1994-07-21 1994-07-21 Film bridging multilayered wiring board and its manufacture

Publications (1)

Publication Number Publication Date
JPH0837373A true JPH0837373A (en) 1996-02-06

Family

ID=15888298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16953594A Pending JPH0837373A (en) 1994-07-21 1994-07-21 Film bridging multilayered wiring board and its manufacture

Country Status (1)

Country Link
JP (1) JPH0837373A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004098257A1 (en) * 2003-04-28 2004-11-11 Nippon Carbide Kogyo Kabushiki Kaisha Multilayer printed wiring board and method for manufacturing same
JP2012099604A (en) * 2010-11-01 2012-05-24 Murata Mfg Co Ltd Method of manufacturing rigid-flexible multilayer wiring substrate and collective substrate applying the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004098257A1 (en) * 2003-04-28 2004-11-11 Nippon Carbide Kogyo Kabushiki Kaisha Multilayer printed wiring board and method for manufacturing same
JP2012099604A (en) * 2010-11-01 2012-05-24 Murata Mfg Co Ltd Method of manufacturing rigid-flexible multilayer wiring substrate and collective substrate applying the same

Similar Documents

Publication Publication Date Title
KR101116079B1 (en) Method for manufacturing multilayer printed circuit board and multilayer printed circuit board
JP2002094200A (en) Circuit board, electric insulating material therefor and method of manufacturing the same
WO2007114111A1 (en) Multilayer wiring board and its manufacturing method
US8076589B2 (en) Multilayer wiring board and its manufacturing method
JPH0837380A (en) Multilayred wiring board with terminal
JP2002076578A (en) Printed wiring board and manufacturing method therefor
JPH0837378A (en) Manufacture of multilayered wiring board with cavity
JP3944921B2 (en) Manufacturing method of multilayer wiring board
JPH0837381A (en) Manufacture of multilayered wiring board with terminal
JP2004273575A (en) Multilayer printed wiring board and its manufacturing method
JP3705370B2 (en) Manufacturing method of multilayer printed wiring board
JPH0837373A (en) Film bridging multilayered wiring board and its manufacture
JP4797742B2 (en) Multilayer wiring board and manufacturing method thereof
JPH0837379A (en) Manufacture of multilayered wiring board with terminal
JP2007266165A (en) Manufacturing method of multilayer wiring board
JPH08148824A (en) Manufacture of wiring board
JP3549063B2 (en) Manufacturing method of printed wiring board
JPH0837374A (en) Multilayered composite wiring board and its manufacture
JP2014068047A (en) Method for manufacturing multilayer printed wiring board
JP2002344141A (en) Multilayer circuit board and manufacturing method thereof
JP4803918B2 (en) Manufacturing method of multilayer wiring board
JP4803919B2 (en) Manufacturing method of multilayer wiring board
JP2010205809A (en) Multilayer printed wiring board and method of manufacturing the same
JPH0129078B2 (en)
JP2001257470A (en) Build-up multilayer printed wiring board and its manufacturing method