JPH08320553A - Polyvinyl alcohol type photosensitive resin and photosensitive resin composition using same - Google Patents

Abstract

PURPOSE: To obtain a water-soluble PVA type photosensitive resin having high sensitivity and satisfactory aging stability and easy to produce and to obtain a photosensitive resin compsn. using the photosensitive resin. CONSTITUTION: This photosensitive resin is a PVA deriv. having constituent units represented by general formulae I, II. In the formula I, X is a cation and (Q) is 0, 1 or 2. In the formula II, R1 is a residue of a quaternary arom. N-contg. hetero ring, R2 is H or lower alkoxyl, (m) is 0 or 1 and (n) is an integer of 1-6.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyvinyl alcohol type photosensitive resin and a photosensitive resin composition using the same.
More specifically, it relates to a water-soluble photosensitive resin having high sensitivity, good stability over time, and easy to manufacture, and a photosensitive composition using the same.

[0002]

2. Description of the Related Art As water-soluble polyvinyl alcohol type photosensitive resins, for example, JP-B-56-5761, JP-B-56-5762, JP-A-56-11906, JP-A-59-17550, and JP-A-59-17550. No. 2-118575, Japanese Patent Publication No. 2-276806, JP-A-6-43645, etc., and a polyvinyl alcohol-based photosensitive resin pendant with a styryl derivative having a quaternized aromatic nitrogen-containing heterocycle. It has been known.

Further, Japanese Patent Laid-Open No. 63-198045 discloses a polyvinyl photosensitive resin in which polyvinyl alcohol (PVA) is pendant with a styryl derivative having a quaternized aromatic nitrogen-containing heterocycle and an azide compound. It is disclosed.

[0004]

The polyvinyl photosensitive resin pendant with the styryl derivative having a quaternized aromatic nitrogen-containing heterocycle is highly sensitive but poor in durability and swells during development. There is a drawback that it is not possible to obtain high resolution.

Further, the polyvinyl alcohol type photosensitive resin disclosed in JP-A-63-198045 is
Since the side chain having an azide group is hydrophobic, there is a problem that the water solubility decreases when the introduction rate is increased, or the photoreactivity of azide is poor and the azide group does not work sufficiently as a photocrosslinkable group. is there.

The present invention is intended to solve the above-mentioned conventional problems, and its purpose is to achieve high sensitivity,
It is an object of the present invention to provide a water-soluble polyvinyl alcohol-based photosensitive resin which has high resolution and is easily manufactured, and a photosensitive resin composition using the same.

[0007]

DISCLOSURE OF THE INVENTION The present inventors have found that a sensitizer having a cation group in a molecule is a photosensitizer of an azide group of a polymer compound having a structural unit represented by the following general formula (I). It was found that it is effective as an agent (Japanese Patent Application No. 6-
No. 25041: filed on February 23, 1994), and as a result of further intensive studies, by using a styryl derivative having a quaternized aromatic nitrogen-containing heterocycle represented by the following general formula (II) as a constitutional unit of a polymer, It was found that the structural unit acts as a photocrosslinkable group and also as a sensitizer for the azido group of the structural unit (I), and it was found that the above-mentioned object can be achieved. Has been completed.

The polyvinyl alcohol type photosensitive resin of the present invention based on the above findings is represented by the following general formulas (I) and (II).
It is a polyvinyl alcohol-based photosensitive resin having a structural unit represented by

[0009]

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[0010]

[Chemical 4]

In the above polyvinyl alcohol-based photosensitive resin, the constitutional unit of the general formula (I) is 1 and the constitutional unit of the general formula (II) is 0.05 to 0.7. .

In the above polyvinyl alcohol type photosensitive resin, the constitutional unit of the general formula (I) is 1 and the constitutional unit of the general formula (II) is 1.5 to 10.

Further, it is characterized in that it is a photosensitive resin composition containing the above-mentioned polyvinyl alcohol type photosensitive resin.

Further, it is more effective if the photosensitive resin composition contains a sensitizer having a cationic group in the molecule.

The contents of the present invention will be described in detail below.

The polyvinyl alcohol-based photosensitive resin of the present invention comprises a water-soluble copolymer of a polyvinyl acetate saponified product or vinyl alcohol and another vinyl compound, and the aldehyde compound represented by the following general formula (III): The acetal represented by the general formula (IV) and the following general formula (V)
It can be easily obtained by reacting an aldehyde represented by or an acetal represented by the following general formula (VI) in the presence of an acid catalyst.

[0017]

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[0018]

[Chemical 6]

[0019]

[Chemical 7]

[0020]

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In the above general formulas (V) and (VI), R ¹ represents a quaternized aromatic nitrogen-containing heterocyclic residue. Examples of R ¹ include those shown below in "Chemical Formula 9".

[0022]

[Chemical 9]

The saponified polyvinyl acetate used in the above reaction has, for example, an average degree of polymerization of 200 to 5,000.
Those having a saponification degree of 0, preferably 300 to 3,000, and a saponification degree of 60 to 100%, preferably 70 to 99% are suitably used.

Here, the average degree of polymerization is 200 to 5,000.
The reason is that when the degree of polymerization is less than 200, sufficient sensitivity cannot be obtained, while when it is more than 5,000, the viscosity of the solution when the photosensitive composition is too high,
This is because both the coating properties are unfavorable and the water developability decreases.

The saponification degree is set to 60 to 100% because sufficient water solubility and water developability cannot be obtained when the saponification degree is lower than 60%.

As the saponified polyvinyl acetate, for example, modified polyvinyl acetate saponified by hydrophilic group modification, lipophilic group modification, anion modification, cation modification, or reactive group modification such as acetoacetyl group can be appropriately used.

Examples of vinyl monomers copolymerizable with vinyl alcohol include N-vinylpyrrolidone and acrylamide.

When such a polyvinyl acetate saponified product is reacted with the compound of the general formula (III) or (IV) and the compound of the general formula (V) or (VI) in the presence of an acid catalyst, for example, Aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, and benzaldehyde, or acetals thereof can be simultaneously reacted.

The introduction rate of the azide compound represented by the general formula (III) or (IV) to the saponified polyvinyl acetate is about 0.1 to 15 mol% per monomer unit, and more preferably 0.5 to 5 mol%. . Here, the introduction rate is set to about 0.1 to 15 mol% per monomer unit because when the amount is less than 0.1 mol%, the water resistance and resolution are insufficient, and when the amount is more than 15 mol%, This is because the amount of nitrogen gas generated by photodecomposition of the azide group increases and the adhesiveness of the photosensitive film to the substrate decreases, both of which are not preferable.

The introduction ratio of the styryl compound having the quaternized aromatic nitrogen-containing heterocycle of the general formula (V) or (VI) to the saponified polyvinyl acetate is 0.1 per monomer unit.
Is about 7 to 7 mol%, and more preferably 0.2 to 4 mol%. Here, the introduction rate is set to about 0.1 to 7 mol% per monomer unit because when it is less than 0.1 mol%, the sensitizing effect on the azide group is small and the photocurability becomes insufficient. If it is more than mol%, the water solubility is markedly lowered, and both are not preferable.

The total introduction ratio of the azide compound and the styryl compound having a quaternized aromatic nitrogen-containing heterocycle to the saponified polyvinyl acetate is preferably about 1 to 20 mol%. Here, the introduction rate is 1 to 10 per monomer unit.
When the amount is less than 1% by mole, the photocurability is not sufficient, and when the amount is more than 20% by mole, the water solubility is lowered and it becomes difficult to develop in water, and both are not preferable.

Further, the molar ratio of the structural unit having the azido group of the general formula (I) to the structural unit having the styryl compound having the quaternized aromatic nitrogen-containing heterocycle of the general formula (II) is
0.05-10, but more preferably 0.1-0.
7 or 1.5-10. Here, the above molar ratio is set to 0.1 to 10 even if it is less than 0.1.
This is because the high density and high resolution that are the objects of the present invention cannot be achieved even if the number is larger.

When the ratio is 0.7 to 1.5, the water solubility is
Water developability decreases. This is in the range of this ratio,
It is considered that the sulfonate anion of the structural unit (I) and the quaternary ammonium cation of the structural unit (II) in the photosensitive resin of the present invention form a salt intramolecularly and / or intermolecularly.

Therefore, the photosensitive resin of the present invention is considered to be in the following equilibrium, for example.

[0035]

[Chemical 10]

However, when the degree of polymerization of the polyvinyl acetate ketone compound used is low, the molar ratio is 0.7-1.
Even when it is 5, water solubility and water developability are obtained.

The photosensitive resin of the present invention becomes anionic when the above molar ratio is more than 1, and becomes cationic when it is less than 1, and can be appropriately used depending on the application.

In the general formulas (III) and (IV), l (el) is 0.1 or 2. These may be used alone or in combination, but the reaction of aldehyde with n = 0 and acetaldehyde The mixture obtained in step 1 may be used as it is.

X in the general formula (I) represents a cation species, and examples thereof include Li, Na, K, ammonium and quaternary alkylammonium.

The photosensitive resin composition of the present invention contains at least one polyvinyl alcohol type photosensitive resin of the present invention. It is effective to add a sensitizer having a cationic group in the molecule to the composition of the present invention.

Such a sensitizer is a sensitizer having one cation group such as an ammonium group, a phosphonium group, a sulfonium group, and an oxonium group in the molecule, but it is easy to produce, and the sensitizer has an ammonium group. Is preferred.

Preferred specific examples of such a sensitizer (S-1
~ S-8) are listed below.

[0043]

[Chemical 11]

[Chemical 12]

Among these examples, S-1 to S-2 and S-6 in which the ultraviolet absorption wavelengths of the structural unit (II) do not overlap are particularly effective.

In the composition of the present invention, the compounding ratio of the sensitizer is preferably about 5 to 90 mol% based on the constitutional unit represented by the general formula (I) of the photosensitive resin of the present invention. This is because if it is less than 5 mol%, the compounding effect is not sufficiently exhibited, and if it exceeds 90 mol%, the adhesiveness to the substrate is deteriorated and further sensitizing effect cannot be obtained.

When the above-mentioned sensitizer is added to the composition of the present invention, it is considered that the sulfonate anion of the component (I) of the photosensitive resin of the present invention and the cation of the sensitizer form a salt. To be

The composition of the present invention contains a polymer compound other than the above-mentioned polyvinyl alcohol-based photosensitive resin, particularly a water-soluble polymer containing a group such as a pyrrolidone or an amide structure which easily reacts with a photodegradation intermediate of an azide group. The sensitivity can be further increased by blending a molecular compound.

As such a water-soluble polymer compound,
For example, polyvinylpyrrolidone, a copolymer of diacetone acrylamide and acrylamide, polyacrylamide, poly (N, N-dimethylacrylamide), a copolymer of diacetone acrylamide and N, N-dimethylacrylamide, acrylamide and N, N dimethylacrylamide. Examples thereof include copolymers.

Further, the composition of the present invention contains
Polymeric emulsions can be mixed to improve properties such as water resistance. Examples of such polymer emulsions include polyvinyl acetate emulsion, vinyl acetate-ethylene copolymer emulsion, vinyl acetate-acrylic acid ester copolymer emulsion, polystyrene emulsion, ethylene-butadiene copolymer emulsion, styrene-acryl. Examples thereof include acid ester copolymer emulsion, acetonitrile-butadiene copolymer emulsion, chloroprene polymer emulsion, polyvinyl chloride emulsion, silicone resin emulsion, polyurethane emulsion and the like.

In the present composition, the blending amount of the polymer emulsion is usually in the range of about 5 to 1,000 parts by weight based on 100 parts by weight of the polyvinyl alcohol type photosensitive resin of the present invention and the above-mentioned polymer compound. However, it is preferably 50 to 700 parts by weight. If it is less than 5 parts by weight, there is no effect of addition, and if it is more than 1,000 parts by weight, it cannot be developed with water.

The characteristics of the composition of the present invention can be improved by further adding at least one photopolymerizable unsaturated compound and a photopolymerization initiator system.

The photopolymerizable unsaturated compound may be either hydrophobic or hydrophilic, for example, a polymerizable unsaturated group such as an acrylic group, a methacrylic group, an allyl group, a vinyl ether group, a vinyl group or an acrylamide group. An unsaturated monomer or unsaturated prepolymer having at least one can be mentioned.

Further, the photopolymerization initiator system may be any system which can generate photopolymerization active radicals upon irradiation with light.
Α-cleavage initiators such as benzoin ether, hydroxyalkyl ketone, dialkoxyacetophenone, benzoylphosphine oxide, benzoin oxime ketone, aromatic ketones such as benzophenone, benzyl, thioxanthone, ketocoumarin and their aromatic ketones and amines. Systems with hydrogen donors, systems of organic peroxides, onium salts, triphenylalkylboric acid and iron-arene complexes with electron donors such as thioxanthene dyes and ketocoumarins, systems of N-arylglycines with electron withdrawers , Polyhalogen compounds, and the like.

Further, it is usually desirable to add a thermal polymerization inhibitor to these photopolymerization systems.

The photopolymerizable unsaturated compound is usually 5 to 400 parts by weight based on 100 parts by weight of the polyvinyl alcohol type photosensitive resin of the present invention and the water-soluble polymer compound.
It is in the range of about 20 parts by weight, preferably 20 to 200 parts by weight. This is because if the amount is less than 5 parts by weight, the effect of adding the photopolymerizable unsaturated compound is not obtained, and if the amount is more than 400 parts by weight, the film becomes sticky, the water developability deteriorates, or the cured film becomes inflexible and the film is not formed. This is because problems such as brittleness occur, which is not preferable. Further, the photopolymerization initiator system is preferably used in the range of about 0.1 to 20 parts with respect to 100 parts by weight of the photopolymerizable unsaturated compound.

The photosensitive resin composition of the present invention contains additives usually contained in addition to the above components, such as emulsion stabilizers, plasticizers, surfactants, adhesion aids, dyes, pigments, titanium oxide and silica. Inorganic fillers such as can be included. Further, various phosphors may be contained for forming the phosphor pattern. Further, in order to give a stronger photocured product, for example, a condensate of a substituted or unsubstituted diazodiphenylamine and an aldehyde, as long as the characteristics of the composition are not impaired, JP-B-54-9521, JP-A No. -3049, Japanese Patent Publication No. 1-57332, JP-A-5
It is also possible to add the diazo compound disclosed in each publication of -125031.

In the composition of the present invention, for example, when a polymer emulsion, a surfactant, a phosphor and the like are blended, when they are anionic, the photosensitive resin of the present invention is composed of the structural unit of general formula (I) and Anionic ones having a molar ratio of the structural unit of the formula (II) of more than 1 may be used, and those having a molar ratio of less than 1 may be used when the above-mentioned compound is cationic. If this is reversed, the composition solution may thicken or gel due to ionic action, which is not preferable.

The composition of the present invention is prepared by dissolving or dispersing a sensitizer having a cationic group in the molecule and various additives as required in the photosensitive resin of the present invention in a solvent mainly containing water. It can be prepared by

As the solvent used at this time, water is generally used, and when it is 50% by weight or less, a water-soluble solvent such as methyl alcohol, ethyl alcohol, isopropyl alcohol, acetone, tetrahydrofuran, A water-soluble agent such as dioxane, dimethylformamide, N-methylpyrrolidinone, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether propylene glycol monomethyl ether, etc. can be added.

The photosensitive resin composition of the present invention obtained as described above is a metal plate such as aluminum or stainless steel, a screen mesh, paper, a glass plate, a semiconductor substrate, or any other base material depending on the application. It is applied and dried to have a dry thickness of 0.5 to 1000 μm, for example, and used as a coating film.

These coating films have ultraviolet rays, for example, a wavelength of 3
After irradiating with actinic rays such as 0 to 500 nm to cure the irradiated part, the non-irradiated part is removed with water or the like to obtain a pattern image, for example, a screen printing plate, a black matrix of a color cathode ray tube, or fluorescence. Body pattern formation,
It can be used as a color filter for CCDs and LCDs, a color proof for printing, and various etching resists.

[0062]

EXAMPLES The present invention will be described below with reference to examples.
The present invention is not limited to these.

Next, the contents of the present invention will be described in more detail with reference to examples.

<Synthesis Example> Comparative Synthesis Example 1 <Polymer compound containing azide group: PA
-1> Polyvinyl alcohol (GH-17: manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) (50 g) was dissolved in water (200 ml). To this, 1% of a 2% aqueous solution of p-azidobenzaldehyde-o-sulfonic acid is added.
70 g was added and reacted at 50 ° C. for 10 hours. After the reaction, the mixture was cooled and 19.5 g of a 5% NaOH aqueous solution was added, followed by neutralization treatment to complete the acetalization to obtain an aqueous solution of the polymer compound PA-1. The aqueous solution was reprecipitated with acetone, and the rate of introduction of sodium p-azidobenzaldehyde-o-sulfonate into polyvinyl alcohol was measured by UV absorption, and it was 1.6 mol%.

Synthesis Example 1 <Polymer compound containing azide group and styrylpyridinium group: PAS-1> 50 g of polyvinyl alcohol (GH-17: manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) was dissolved in 200 ml. To this, 170% of a 2% aqueous solution of p-azidobenzaldehyde-o-sulfonic acid is added.
g, and further 1.37 g of formylstyrylpyridinium methosulfate was added, and the mixture was reacted at 30 ° C. for 20 hours. After the reaction, the mixture was cooled and 5% NaOH aqueous solution 19.5
g was added and neutralization treatment was performed to complete the acetalization to obtain an aqueous solution of the polymer compound PAS-1. The above aqueous solution was reprecipitated with acetone, and p
When the introduction rate of -azidobenzaldehyde-o-sulfonate was measured, it was 1.6 mol%, and the introduction rate of the styrylpyridinium salt was 0.4 mol%. According to Synthesis Example 1, a polymer compound in which the introduction ratio of the azide group [I] and the styrylpyridinium group [II] was changed was synthesized.

[0066]

[Table 1]

Examples 1 to 10 Next, Examples 1-10 and Comparative Examples 1-3 were carried out using the polymer compounds obtained in the above synthesis examples. < Resolution > Polymer compounds PA-1 and P obtained in Synthesis Example
S-2, PAS-1, PAS-2, PAS-3, PAS
-4, PAS-5, PAS-6, PAS-7, PAS-
8, 10 g of each aqueous solution of PAS-9, a sensitizer having a cationic group shown in the table (added without a sensitizer), 4 g of water, 3 g of propylene glycol monomethyl ether
Were mixed, dissolved and filtered to prepare photosensitive compositions. These compositions were applied onto a glass substrate by spin coating and dried at 70 ° C. for 20 minutes to give 1.0 μm.
A photosensitive layer having a thickness of m was formed. The photomask was contact-exposed under the light of an ultra-high pressure mercury lamp having an illuminance of 5.0 mW / cm ² (measured with an UV illuminance system UV-M01 manufactured by Oak Seisakusho using a UV35 sensor). After exposure, the film was washed with water for 1 minute, developed, and dried, and then a 50 μm line & space pattern was observed under a microscope. The results are shown in "Table 2" to "Table 4".

[0068]

[Table 2]

[Table 3]

[Table 4] As shown in "Table 2" to "Table 4", when the polymer compound according to the present invention is used, the exposure time is short, the sensitivity and resolution are good, and the exposure latitude is wide. I was able to get

< Confirmation of sensitizing effect > The above polymer compound PA
-1, and a polymer compound PAS-1 aqueous solution, a photosensitive film having a film thickness of 3 µm was prepared, and the azide decomposition was examined by exposure by the decrease of 2118 cm ^{-1 in} the infrared absorption spectrum. For the exposure, light having a wavelength of 300 nm or more transmitted through glass was used. Whereas the polymer compound PA-1 was decomposed by 2% by exposure for 120 seconds, the polymer compound PAS-1 was
40% of the azide decomposed. From this, it was confirmed that the acetalized styrylpyridinium salt has a sensitizing effect on the azide compound of the present invention.

< Sensitivity > Polymer compound P obtained in Synthesis Example
A-1, PS-1, PAS-1, PAS-2 aqueous solution 1
0 g, a sensitizer having a cationic group shown in "Table 5" below (added if no sensitizer), 4 g of water, and 3 g of propylene glycol monomethyl ether were mixed and dissolved, and then filtered to obtain photosensitivity. A composition was prepared. These compositions were applied onto a glass substrate by spin coating and dried at 70 ° C. for 20 minutes to form a photosensitive layer having a film thickness of 1.2 μm. Fuji Step Guide (manufactured by Fuji Photo Film Co., Ltd.) under the light of an ultra-high pressure mercury lamp with an illuminance of 5.0 mW / cm ^2.
Exposed through. After exposure, the film was washed with water for 1 minute and developed, the cured film was dyed with 1% methylene blue, and the sensitivity was evaluated by the number of curing steps. The results are shown in "Table 5".

[0071]

[Table 5]

From the results of Table 3, Examples A to A of the present invention are shown.
It was proved that the photosensitive resin compositions according to D were all highly sensitive as compared with Comparative Examples AF. In particular, Comparative Example E
In 0.4 mol of the styrylpyridinium group [II], the exposure time was 70 seconds and the step number of STEP was "2". In Comparative Example A, 1.6 mol of the azide group [I] was 100 seconds. The number of steps is "0", both of which have low sensitivity.
In Example A, 1.6 moles of azide group [I]: 0.4 moles of styrylpyridinium group [II], STEP step number "2" in 3 seconds.
It is highly sensitive. Further, in Comparative Examples B, C and D, the sensitivity was improved up to STEP step number "3" in 15 seconds by increasing the addition amount of the sensitizer S-1 with respect to 1.6 mol of azide group [I]. The sensitivity could not be improved as much as A.

[0073]

As described above, the photosensitive resin composition of the present invention has high sensitivity, high resolution, good stability over time, and is easy to produce. For example, a screen printing plate, a black matrix of a color cathode ray tube. It is suitable for use as a phosphor pattern formation, a color filter for CCD or LCD, a color proof for printing, various etching resists, and the like.

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Claims (6)

[Claims] 1. A polyvinyl alcohol-based photosensitive resin, which is a polyvinyl alcohol derivative having a constitutional unit represented by the following general formula (I) and general formula (II). Embedded image Embedded image 2. The content ratio of the constituent units of the general formula (I) and the general formula (II) in the polyvinyl alcohol-based photosensitive resin is such that the general formula (I) is 0.1 to 15 mol%, The polyvinyl alcohol-based photosensitive resin according to claim 1, wherein the general formula (II) is 0.1 to 7 mol%. 3. The polyvinyl alcohol-based photosensitive resin according to claim 2, wherein the structural unit of the general formula (I) is 1
On the other hand, the constitutional unit of the general formula (II) is 0.05 to 0.
7. A polyvinyl alcohol-based photosensitive resin, which is 7. 4. The polyvinyl alcohol-based photosensitive resin according to claim 2, wherein the structural unit of the general formula (I) is 1
On the other hand, a polyvinyl alcohol-based photosensitive resin, wherein the constitutional unit of the general formula (II) is 1.5 to 10. 5. A photosensitive resin composition comprising a polyvinyl alcohol-based photosensitive resin having a constitutional unit represented by the general formula (I) or the general formula (II). 6. A polyvinyl alcohol-based photosensitive resin having a constitutional unit represented by the general formula (I) or (II) and a sensitizer having a cationic group in the molecule. Photosensitive resin composition.