JPH08305033A - Exposure device for printed circuit board - Google Patents

Exposure device for printed circuit board

Info

Publication number
JPH08305033A
JPH08305033A JP7135691A JP13569195A JPH08305033A JP H08305033 A JPH08305033 A JP H08305033A JP 7135691 A JP7135691 A JP 7135691A JP 13569195 A JP13569195 A JP 13569195A JP H08305033 A JPH08305033 A JP H08305033A
Authority
JP
Japan
Prior art keywords
exposure
film
stage
light
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7135691A
Other languages
Japanese (ja)
Inventor
Minoru Tanaka
中 稔 田
Mitsuhiro Fujimoto
本 光 弘 藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
Canon Components Inc
Original Assignee
Adtec Engineering Co Ltd
Canon Components Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Engineering Co Ltd, Canon Components Inc filed Critical Adtec Engineering Co Ltd
Priority to JP7135691A priority Critical patent/JPH08305033A/en
Publication of JPH08305033A publication Critical patent/JPH08305033A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To precisely control exposure by providing an exposure device with a means measuring the quantity of light transmitted through an exposure wavelength transmission body and a means controlling the exposure based on the measured result. CONSTITUTION: A circuit board 2 being an object to be exposed is placed on a stage 1 and an art work film 3 on which a circuit pattern is drawn is placed thereon. Besides, a transparent film 4 is placed thereon and the circumference of a gap between the stage 1 is hermetically sealed by packing 5. By vacuum- sucking air in a gap between the film 4 and the stage 1 through a communicating hole 6, the film 3 is pressed and closely brought into contact with the substrate 2 by the film 4. In such a state, ultraviolet rays are radiated from a light source 7. Then, a light quantity sensor 8 is embedded in the upper surface of the stage 1 so as to detect the light quantity by receiving the ultraviolet rays from the upper part of the stage 1. The signal of the light quantity detected by the sensor 8 is inputted to a controller 15 and the light quantity is controlled by the controller 15 according to the detected light quantity.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明はプリント基板用露光装
置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus for printed boards.

【0002】[0002]

【従来の技術】近年プリント基板の作成に際し、集積回
路製造などに用いられるリソグラフィ法が採用されるよ
うになってきており、このような手法においてプリント
基板用の露光装置が用いられている。プリント基板用露
光装置においては、回路パターンを描き込んだ原版とし
て取扱いが容易なアートワークフィルムを使用してお
り、露光に際してはこのアートワークフィルムを基板に
密着させる必要があり、そのために露光波長を透過でき
る透明フィルムや透明アクリル板などによりアートワー
クフィルムを押さえた状態で露光するのが普通である。
そのため基板の上にアートワークフィルムと透明フィル
ム(又はアクリル板)が重なった状態で、上方の露光光
源から露光が行われることになる。
2. Description of the Related Art In recent years, when a printed circuit board is produced, a lithography method used for manufacturing an integrated circuit has been adopted, and an exposure apparatus for a printed circuit board is used in such a method. In the exposure equipment for printed circuit boards, an artwork film that is easy to handle is used as an original plate on which a circuit pattern has been drawn, and it is necessary to bring this artwork film into close contact with the substrate during exposure. It is usual to expose while holding the artwork film with a transparent film or transparent acrylic plate that can be transmitted.
Therefore, exposure is performed from the upper exposure light source in a state where the artwork film and the transparent film (or acrylic plate) are overlapped on the substrate.

【0003】[0003]

【発明が解決しようとする課題】しかし従来の露光装置
では、露光光量を透明フィルムや透明アクリル板の上方
で測定していたため、実際に透明フィルムやアクリル板
を透過して基板に到達する光量とは異なる光量を測定し
ており、正確な光量測定が出来ず、そのため光量の制御
も正確に行えないという問題があった。本発明は上記し
た従来技術の問題点を解決することを目的とする。
However, in the conventional exposure apparatus, since the exposure light amount is measured above the transparent film or the acrylic plate, the amount of light actually transmitted through the transparent film or acrylic plate and reaching the substrate is Has a problem that it cannot measure the light quantity accurately and therefore cannot control the light quantity accurately. The present invention aims to solve the above-mentioned problems of the prior art.

【0004】[0004]

【課題を解決するための手段及び作用】上記目的を達成
するために本発明はアートワークフィルムを基板に密着
させるための露光波長透過体を備えたプリント基板用露
光装置において、該露光波長透過体を通過後の光量を測
定するための手段と、該測定するための手段による測定
結果に基づいて、露光量を制御するための手段と、を備
えたことを特徴とする。このような構成により露光波長
透過体を透過した光量を測定でき、正確に露光量を制御
することが可能になる。また露光波長透過体に加えてア
ートワークフィルムの透明部分を通過した後の光量を測
定するようにすることも可能であり、このように構成す
ることにより更に正確な光量の測定が可能になる。前記
露光波長透過体はフィルムであっても良いし、或いはア
クリル板等であても良い。
In order to achieve the above object, the present invention provides an exposure apparatus for a printed circuit board, which is provided with an exposure wavelength transmitter for bringing an artwork film into close contact with the substrate. It is characterized in that it is provided with means for measuring the amount of light after passing through and means for controlling the exposure amount based on the measurement result by the means for measuring. With such a configuration, the amount of light transmitted through the exposure wavelength transmitter can be measured, and the exposure amount can be accurately controlled. It is also possible to measure the amount of light after passing through the transparent portion of the artwork film in addition to the exposure wavelength transmitter, and by configuring in this way, it is possible to measure the amount of light more accurately. The exposure wavelength transmitter may be a film, or an acrylic plate or the like.

【0005】[0005]

【実施例】以下本発明の実施例を図面に基づいて説明す
る。図1は真空密着式の露光装置に本発明を適用した実
施例を示すものである。ステージ1上に露光対象である
基板2が載置され、その上に回路パターンが描かれたア
ートワークフィルム3が載せられている。この上に更に
透明フィルム4が装着され、ステージ1との間の周囲を
パッキン5により密閉するようになっている。この透明
フィルム4とステージ1との間の空間の空気を連通孔6
を介して真空吸引することにより、透明フィルム4によ
りアートワークフィルム3を押さえて基板2に密着させ
るようになっている。そして、この状態で光源7から紫
外線を照射するように構成されている。ステージ1の上
面には光量センサ8が埋め込まれており、ステージ1の
上方から紫外線を受光して、光量を検出するように構成
されている。光量センサ8の装着位置は基板2が載置さ
れる載置部分の周囲で且つ透明フィルム4に覆われる部
分とする。また、上方に光源7からの露光を遮閉するよ
うなものがない位置とする。光量センサ8で検出された
光量の信号は制御装置15に入力され、該検出光量に対
応した光量制御が制御装置15により行われる。以上説
明した実施例によれば、光源7からの露光光である紫外
線は透明フィルム4を透過した上で光量センサ8に検出
され、実際にステージ1に照射される光量に近い値が検
出されるから、制御装置15において正確な光量の制御
が可能となる。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows an embodiment in which the present invention is applied to a vacuum contact type exposure apparatus. A substrate 2 to be exposed is placed on a stage 1, and an artwork film 3 having a circuit pattern drawn thereon is placed on the substrate 2. A transparent film 4 is further mounted on this, and the periphery of the stage 1 is sealed by a packing 5. The air in the space between the transparent film 4 and the stage 1 is connected to the communication hole 6
The artwork film 3 is pressed by the transparent film 4 to be brought into close contact with the substrate 2 by vacuum suction via the. Then, in this state, the light source 7 irradiates ultraviolet rays. A light amount sensor 8 is embedded in the upper surface of the stage 1, and is configured to receive ultraviolet light from above the stage 1 and detect the light amount. The mounting position of the light amount sensor 8 is a portion around the mounting portion on which the substrate 2 is mounted and covered by the transparent film 4. In addition, the position above which there is nothing to block the exposure from the light source 7 is set. The light amount signal detected by the light amount sensor 8 is input to the control device 15, and the light amount control corresponding to the detected light amount is performed by the control device 15. According to the embodiment described above, the ultraviolet light, which is the exposure light from the light source 7, is detected by the light amount sensor 8 after passing through the transparent film 4, and a value close to the light amount actually applied to the stage 1 is detected. Therefore, the control device 15 can accurately control the light amount.

【0006】図2に加圧密着式の露光装置に本発明を適
用した実施例を示す。ステージ1’上に露光対象である
基板2’が載置され、その上に回路パターンが描かれた
アートワークフィルム3’が載せられている。この上方
に透明フィルム4’が設置されている。この透明フィル
ム4’は枠10に装着されており、該枠10の中央部に
はガラス9がはめ込まれ、光源7’からの紫外線を透過
するようになっている。枠10には連通孔11が設けら
れており、ここから透明フィルム4’の内側にエアーを
充填することにより透明フィルム4’を膨らませてアー
トワークフィルム3’を基板2’に密着させるようにな
っている。そして、同様に光源7’から紫外線を照射し
て露光を行うようになっている。ステージ1’の上面に
は同様に光量センサ8’が埋め込まれており、ステージ
1’の上方から紫外線を受光して、光量を検出するよう
に構成されている。光量センサ8’の装着位置は同様に
基板2’が載置される載置部分の周囲で且つ透明フィル
ム4’に覆われる部分とする。また、上方に光源7’か
らの露光光を遮閉するようなものがない位置とする。光
量センサ8’で検出された光量の信号は同様に制御装置
15’に入力され、該検出光量に対応した光量制御が制
御装置15’により行われるようになっている。この実
施例によれば、光源7’からの紫外線はガラス9と透明
フィルム4’を透過した上で光量センサ8’に検出され
るから、実際にステージ1’に照射される光量に近い値
が検出され、制御装置15’において正確な光量の制御
が可能となる。
FIG. 2 shows an embodiment in which the present invention is applied to a pressure contact type exposure apparatus. A substrate 2'which is an exposure target is placed on a stage 1 ', and an artwork film 3'on which a circuit pattern is drawn is placed on the substrate 2'. A transparent film 4'is installed above this. The transparent film 4'is attached to the frame 10, and the glass 9 is fitted in the central portion of the frame 10 so that the ultraviolet rays from the light source 7'are transmitted. The frame 10 is provided with a communication hole 11 from which the transparent film 4'is inflated by filling the inside of the transparent film 4'with air so that the artwork film 3'is brought into close contact with the substrate 2 '. ing. Then, similarly, the light source 7 ′ irradiates ultraviolet rays to perform exposure. Similarly, a light amount sensor 8'is embedded in the upper surface of the stage 1 ', and is configured to detect the light amount by receiving ultraviolet rays from above the stage 1'. Similarly, the mounting position of the light amount sensor 8 ′ is a portion around the mounting portion on which the substrate 2 ′ is mounted and covered by the transparent film 4 ′. Further, the position is such that there is no object that blocks the exposure light from the light source 7 ′ above. The signal of the light amount detected by the light amount sensor 8'is similarly input to the control device 15 ', and the light amount control corresponding to the detected light amount is performed by the control device 15'. According to this embodiment, since the ultraviolet ray from the light source 7'is detected by the light amount sensor 8'after passing through the glass 9 and the transparent film 4 ', the value close to the light amount actually radiated to the stage 1'is obtained. The detected light amount can be accurately controlled by the control device 15 ′.

【0007】なお、上記実施例において、アートワーク
フィルム3、3’の周囲を光量センサ8、8’上を覆う
ように伸ばして、アートワークフィルム3、3’を透過
した露光光の光量を検出するように構成することも可能
である。このような構成の場合、更に正確な光量検出が
可能である。
In the above embodiment, the circumference of the artwork film 3, 3'is extended so as to cover the light quantity sensor 8, 8 ', and the light quantity of the exposure light transmitted through the artwork film 3, 3'is detected. It can also be configured to do so. With such a configuration, more accurate light amount detection is possible.

【0008】[0008]

【発明の効果】以上説明したように本発明のプリント基
板用露光装置は、露光波長透過体を通過後の光量を測定
するための手段と、該測定するための手段による測定結
果に基づいて、露光量を制御するための手段と、を備え
ているため、露光波長透過体を透過した光量を測定で
き、正確に露光量を制御することが可能になる効果があ
る。また露光波長透過体に加えてアートワークフィルム
の透明部分を通過した後の光量を測定するように構成し
た場合には更に正確な光量の測定が可能になる効果があ
る。
As described above, the exposure apparatus for a printed circuit board of the present invention, based on the means for measuring the amount of light after passing through the exposure wavelength transmitting body and the measurement result by the means for measuring, Since the means for controlling the exposure amount is provided, the amount of light transmitted through the exposure wavelength transmitting body can be measured, and the exposure amount can be accurately controlled. In addition, when the light amount after passing through the transparent portion of the artwork film is measured in addition to the exposure wavelength transmitting body, there is an effect that a more accurate light amount can be measured.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す概略正面図。FIG. 1 is a schematic front view showing an embodiment of the present invention.

【図2】本発明の他の実施例を示す概略正面図。FIG. 2 is a schematic front view showing another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1:ステージ、2:基板、3:アートワークフィルム、
4:透明フィルム、5:パッキン、6:連通孔、7:光
源、8:光量センサ、9:ガラス、10:枠、11:連
通孔、15:制御装置。
1: stage, 2: substrate, 3: artwork film,
4: transparent film, 5: packing, 6: communication hole, 7: light source, 8: light amount sensor, 9: glass, 10: frame, 11: communication hole, 15: control device.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 アートワークフィルムを基板に密着させ
るための露光波長透過体を備えたプリント基板用露光装
置において、 該露光波長透過体を通過後の光量を測定するための手段
と、 該測定するための手段による測定結果に基づいて、露光
量を制御するための手段と、 を備えたことを特徴とするプリント基板用露光装置。
1. An exposure apparatus for a printed circuit board, comprising an exposure wavelength transmitting body for bringing an artwork film into close contact with a substrate, and means for measuring the amount of light after passing through the exposure wavelength transmitting body, and the measurement. An exposure apparatus for a printed circuit board, comprising: a means for controlling an exposure amount based on a measurement result by the means for.
【請求項2】 前記測定するための手段が、露光波長透
過体に加えてアートワークフィルムの透明部分を通過し
た後の光量を測定する、 請求項1に記載のプリント基板用露光装置。
2. The exposure apparatus for a printed circuit board according to claim 1, wherein the means for measuring measures the amount of light after passing through the transparent portion of the artwork film in addition to the exposure wavelength transmitting body.
【請求項3】 前記露光波長透過体がフィルムである、 請求項1又は2に記載のプリント基板用露光装置。3. The exposure apparatus for a printed circuit board according to claim 1, wherein the exposure wavelength transmitter is a film. 【請求項4】 前記露光波長透過体がアクリル板であ
る、 請求項1又は2に記載のプリント基板用露光装置。
4. The exposure apparatus for a printed circuit board according to claim 1, wherein the exposure wavelength transmitting body is an acrylic plate.
JP7135691A 1995-05-10 1995-05-10 Exposure device for printed circuit board Pending JPH08305033A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7135691A JPH08305033A (en) 1995-05-10 1995-05-10 Exposure device for printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7135691A JPH08305033A (en) 1995-05-10 1995-05-10 Exposure device for printed circuit board

Publications (1)

Publication Number Publication Date
JPH08305033A true JPH08305033A (en) 1996-11-22

Family

ID=15157665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7135691A Pending JPH08305033A (en) 1995-05-10 1995-05-10 Exposure device for printed circuit board

Country Status (1)

Country Link
JP (1) JPH08305033A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100688094B1 (en) * 2006-05-04 2007-03-02 삼성전기주식회사 Exposure method and apparatus
JP6033477B1 (en) * 2016-01-06 2016-11-30 テクノアルファ株式会社 Method for manufacturing curved body having pattern formed with photoresist and exposure apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100688094B1 (en) * 2006-05-04 2007-03-02 삼성전기주식회사 Exposure method and apparatus
JP6033477B1 (en) * 2016-01-06 2016-11-30 テクノアルファ株式会社 Method for manufacturing curved body having pattern formed with photoresist and exposure apparatus

Similar Documents

Publication Publication Date Title
EP0418427A2 (en) Exposure process
EP1571699A4 (en) Exposure apparatus and method for manufacturing device
JPH08305033A (en) Exposure device for printed circuit board
JPH07219212A (en) Deflection correcting device for photomask and its method
JPH08241857A (en) Reticle tip alignment device and method
CN101140859A (en) Etching apparatus and etching method using the same
CN105415572B (en) A kind of carbon fiber plate surface treatment method and the injection moulding apparatus for this method
TW200617583A (en) Reticle thermal detector
JP2003053689A (en) Component feeder and method of detecting component
DE3577622D1 (en) METHOD FOR PRODUCING INTEGRATED CIRCUITS, INCLUDING STEPS FOR DETECTING GETTER SITES.
US20090101792A1 (en) Wireless illumination sensing assembly
KR100205199B1 (en) Mehtod for alignment employing film mask and aligner therefor
JP2004184940A (en) Exposure apparatus
JPH06125159A (en) Method and apparatus for exposure of printed-circuit board
SU884179A1 (en) Device for testing photo masks
JPH026363Y2 (en)
JPH0957950A (en) Registering device for printing machine
KR100325473B1 (en) A Semiconductor Explosure Appratues
JPH07219234A (en) Contact device of exposure machine
JPS5730330A (en) Mask aligner
JP2002213924A (en) Method and instrument for measuring film thickness, method and device for treating thin film, and method of manufacturing semiconductor device
JPH07239552A (en) Offcontact exposure device
JP2000329518A (en) Method for measuring coordinate
JPH09251203A (en) Exposing device
JPH0195440A (en) Exposure device for color cathode-ray tube

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20031215