JPH08304050A - Magnetic film defect inspection device for magnetic disk - Google Patents

Magnetic film defect inspection device for magnetic disk

Info

Publication number
JPH08304050A
JPH08304050A JP13286195A JP13286195A JPH08304050A JP H08304050 A JPH08304050 A JP H08304050A JP 13286195 A JP13286195 A JP 13286195A JP 13286195 A JP13286195 A JP 13286195A JP H08304050 A JPH08304050 A JP H08304050A
Authority
JP
Japan
Prior art keywords
defect
magnetic film
light
magnetic disk
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13286195A
Other languages
Japanese (ja)
Other versions
JP3520356B2 (en
Inventor
Takayuki Ishiguro
隆之 石黒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP13286195A priority Critical patent/JP3520356B2/en
Publication of JPH08304050A publication Critical patent/JPH08304050A/en
Application granted granted Critical
Publication of JP3520356B2 publication Critical patent/JP3520356B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE: To improve the S/N ratio of scattered light and the measurement accuracy of the crest value of a defect pulse by performing scanning by projecting a laser beam band with a proper length in the radius direction of a magnetic disk for the magnetic film of the rotating magnetic disk. CONSTITUTION: Elliptical laser beams LT outputted by a laser diode 611 become a laser beam band LB where only a short axis is reduced by a beam expander 612 to irradiate the magnetic film of a magnetic disk 1 which is rotated by a rotary mechanism 2. Reflection light LR of the magnetic film and reflection light LR' due to the defect of the magnetic film are focused by an objective lens 621 and made incident on a photodiode 622, the reflection light LR is dispersed and received by 2n (for example 24) avalanche photodiodes APD, and then each noise is outputted. Also, the scattered light LR is received by the APD corresponding to the position of a defect and a defect pulse is outputted. The difference of the output signals of two APDs in a set is calculated by a differential operation part 7 and noise due to reflection light is eliminated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、磁気ディスクの磁気
膜の欠陥を検査する検査装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inspection device for inspecting defects in a magnetic film of a magnetic disk.

【0002】[0002]

【従来の技術】コンピュータシステムの記録媒体に使用
されるハード磁気ディスクは、ガラス基板の表面に磁気
膜を塗布して製作される。塗布された磁気膜に凹凸など
の欠陥があると記録性能が劣化するので、その有無が表
面欠陥検査装置により検査されている。この発明におい
ては、この表面欠陥検査装置を先行技術とする。
2. Description of the Related Art A hard magnetic disk used as a recording medium of a computer system is manufactured by applying a magnetic film on the surface of a glass substrate. If the coated magnetic film has defects such as irregularities, the recording performance is deteriorated, and therefore the presence or absence thereof is inspected by a surface defect inspection apparatus. In the present invention, this surface defect inspection apparatus is a prior art.

【0003】図4は、この表面欠陥検査装置の構成を示
し、磁気ディスク1を装着して回転する回転機構2と、
投光系31と受光系32よりなる検査光学系3、信号処理部
4、およびデータ処理部5とにより構成される。投光系
31においては、ヘリウムネオンレーザ発振管311 が発振
する円形のレーザビームLT は、楕円エキスパンダ312
により楕円形に変換され、ミラー313 により反射され、
集束レンズ314 により楕円スポットSP に集束され、回
転機構2に装着されて回転する磁気ディスク1に対し
て、例えば20°の入射角θT の方向に投射されて磁気
膜が走査される。受光系32は、光軸が投光系31の入射角
θTに等しい正反射角θR の方向とされ、スポットSP
の磁気膜による反射光LR と、磁気膜に存在する欠陥に
よる散乱光LR'とが、ともに集光レンズ321 により集光
され、これらはハーフミラー322 により2分割される。
ただし、磁気膜は完全な平滑面でないので、その反射光
R には正反射光のほかに、いくらかの乱反射成分が含
まれている。分割された一方は、空間フィルタ323 に入
射して反射光LR はほぼは遮断され、散乱光LR'は大部
分が透過して光電子増倍管(PMT)324 に受光され
る。分割された他方は、空間フィルタ325 に入射して散
乱光LR'はほぼ遮断され、反射光LR は大部分が透過し
てホトダイオード(PD)326 に受光される。
FIG. 4 shows the construction of this surface defect inspection apparatus, which comprises a rotating mechanism 2 for mounting and rotating a magnetic disk 1.
An inspection optical system 3 including a light projecting system 31 and a light receiving system 32, a signal processing unit 4, and a data processing unit 5. Projection system
At 31, the circular laser beam L T oscillated by the helium neon laser oscillator tube 311 is elliptical expander 312.
Is converted into an elliptical shape by and is reflected by the mirror 313.
The magnetic film is focused on the elliptical spot S P by the focusing lens 314 and projected onto the rotating magnetic disk 1 mounted on the rotating mechanism 2 in the direction of the incident angle θ T of, for example, 20 ° to scan the magnetic film. The light receiving system 32 has an optical axis in the direction of a regular reflection angle θ R equal to the incident angle θ T of the light projecting system 31, and the spot S P
The reflected light L R of the magnetic film and the scattered light L R ′ of the defect existing in the magnetic film are both condensed by the condenser lens 321, and these are divided into two by the half mirror 322.
However, since the magnetic film is not a perfectly smooth surface, its reflected light L R contains some diffuse reflection components in addition to the specular reflection light. One of the split light beams is incident on the spatial filter 323, the reflected light L R is almost blocked, and most of the scattered light L R 'is transmitted and received by the photomultiplier tube (PMT) 324. The other split light is incident on the spatial filter 325, the scattered light L R 'is substantially blocked, and most of the reflected light L R is transmitted and received by the photodiode (PD) 326.

【0004】図5は、PMT324 とPD326 の両出力信
号を例示するもので、PMT324 の出力信号には、空間
フィルタ323 により遮断されずに透過した反射光LR
よるノイズN1 と、これに重畳した散乱光LR'に対する
正側の欠陥パルスP+ とがある。またPD326 の出力信
号には、反射光LR によるノイズN2 と、同一の欠陥に
より反射光LR の強度が低下して生じた負側の欠陥パル
スP- とがあり、両出力信号は、信号処理部4に入力さ
れてそれぞれハイパスフィルタを通り、個別に設定され
た閾値電圧によりデジタル化されて計測される。波高値
hはデジタル化されてこれがデータ処理部5に入力し、
MPU51により欠陥の座標位置と大きさとが算出され、
これらの欠陥データは一旦メモリ(MEM)52に記憶さ
れる。磁気ディスク1の全面の検査が終了すると、記憶
された各欠陥データは適当に編集されてプリンタ(PR
T)53に対して出力され、欠陥の座標位置と大きさとが
プリントされ、またはマップ表示される。なおマップ表
示は従来から各種の表面検査装置において行われてお
り、これによれば、欠陥の存在位置が明瞭に判読できる
ほか、線状の欠陥は連続して表示されるので、その長さ
を容易に判定できるものである。
FIG. 5 exemplifies both output signals of the PMT 324 and the PD 326. The output signal of the PMT 324 has a noise N 1 due to the reflected light L R which is transmitted without being blocked by the spatial filter 323 and superposed on the noise N 1. There is a defect pulse P + on the positive side with respect to the scattered light L R ′. Also the output signal of the PD 326, and the noise N 2 by the reflected light L R, the negative side of the defect pulse P the intensity of the reflected light L R is generated decreased by the same defect - there is a, both output signals, The signal is input to the signal processing unit 4, passes through a high-pass filter, and is digitized and measured by an individually set threshold voltage. The peak value h is digitized and input to the data processing unit 5,
The coordinate position and size of the defect are calculated by the MPU 51,
These defect data are temporarily stored in the memory (MEM) 52. When the inspection of the entire surface of the magnetic disk 1 is completed, each stored defect data is appropriately edited and the printer (PR
T) 53, and the coordinate position and size of the defect are printed or displayed on a map. It should be noted that the map display has been conventionally performed in various surface inspection devices. According to this, the position where the defect exists can be clearly read, and linear defects are continuously displayed. It can be easily determined.

【0005】[0005]

【発明が解決しようとする課題】さて磁気膜の反射率に
は、磁気ディスク1のメーカやロット別、または磁気デ
ィスク1上の位置などによる微妙な相違があるため、上
記の両ノイズN1,N2 のレベルは変動し、従ってグラン
ドレベルLG も上下に変化するので、閾電圧VSを一定
値に設定できない。これに対して、例えば、検査光学系
3にグランドレベルLG を測定する受光系を別に設け、
これにより測定されたLG を利用して、閾電圧VS を自
動設定する方式が考案されているが、このような自動設
定方式によっても、かならずしも適切な閾電圧VS が設
定されないのが実情である。そこでいっそ、磁気膜の反
射光LR によるノイズN自体を、なんらかの手段で減少
すれば、グランドレベルLG は "0" 電圧、またはこれ
に近くなって、閾電圧VS は無用、またはその設定が容
易となり、さらに、散乱光LR'のS/Nと、欠陥パルス
の波高値hの計測精度の両者の向上が期待できて有利で
ある。この発明は、以上に鑑みてなされたもので、磁気
膜の反射光LR によるノイズNを極力減少して、グラン
ドレベルLG を "0" 電圧、またはこれに近くし、かつ
散乱光LR'のS/Nと、欠陥パルスの波高値hの計測精
度の両者を向上した、磁気膜欠陥検査装置を提供するこ
とを目的とする。
Since there are subtle differences in the reflectivity of the magnetic film depending on the manufacturer and lot of the magnetic disk 1 or the position on the magnetic disk 1, the above two noises N 1 , The level of N 2 fluctuates, and therefore the ground level L G also fluctuates up and down, so the threshold voltage V S cannot be set to a constant value. On the other hand, for example, the inspection optical system 3 is separately provided with a light receiving system for measuring the ground level L G ,
Although a method of automatically setting the threshold voltage V S using the measured L G has been devised, the actual situation is that an appropriate threshold voltage V S is not always set even by such an automatic setting method. Is. Therefore, if the noise N itself due to the reflected light L R of the magnetic film is reduced by some means, the ground level L G becomes a voltage of "0" or close to this, and the threshold voltage V S is unnecessary or is set. It is advantageous that both the S / N of the scattered light L R ′ and the measurement accuracy of the crest value h of the defect pulse can be improved. The present invention has been made in view of the above, and reduces the noise N due to the reflected light L R of the magnetic film as much as possible to bring the ground level L G to the “0” voltage or close to this voltage and the scattered light L R. It is an object of the present invention to provide a magnetic film defect inspection apparatus in which both the S / N of 'and the measurement accuracy of the peak value h of the defect pulse are improved.

【0006】[0006]

【課題を解決するための手段】この発明は、上記の目的
を達成した磁気膜欠陥検査装置であって、磁気ディスク
を装着して回転する回転機構と、回転する磁気ディスク
の磁気膜に対して、磁気ディスクの半径方向に適当な長
さを有するレーザ光帯を投射して走査する投光系と、投
光系の入射角に等しい正反射角の方向に設けられ、レー
ザ光帯の磁気膜による反射光と、磁気膜に存在する欠陥
による散乱光とをそれぞれ集光する対物レンズ、およ
び、対物レンズの結像位置に設けられ、レーザ光帯に対
応した複数2n個のアバランシェ・ホトダイオード(A
PD)がリニアに配列され、集光された反射光と散乱光
とを受光するホトダイオードアレイよりなる受光系とを
具備する。2n個のAPDのうちの適当な2個づつを組
合せ、各組合せの2個のAPDの出力信号の差分をそれ
ぞれ算出して、磁気膜の反射光によるノイズを消去し、
欠陥の散乱光に対する欠陥パルスを出力する、n個の差
分回路よりなる差分演算部を設けて構成される。
SUMMARY OF THE INVENTION The present invention is a magnetic film defect inspection apparatus which achieves the above-mentioned object, wherein a rotating mechanism for mounting and rotating a magnetic disk and a magnetic film of a rotating magnetic disk are provided. , A projection system for projecting and scanning a laser light band having an appropriate length in the radial direction of the magnetic disk, and a magnetic film of the laser light band provided in the direction of a regular reflection angle equal to the incident angle of the projection system. 2n avalanche photodiodes (A) provided at the image forming position of the objective lens for collecting the reflected light by the laser light and the scattered light due to the defects existing in the magnetic film and corresponding to the laser light band.
PD) is linearly arranged and has a light receiving system including a photodiode array that receives the reflected light and the scattered light that are collected. Combining suitable two of the 2n APDs, calculating the difference between the output signals of the two APDs of each combination, and eliminating the noise due to the reflected light of the magnetic film,
A difference calculation unit including n difference circuits that outputs a defect pulse for scattered light of a defect is provided.

【0007】[0007]

【作用】上記の磁気膜欠陥検査装置においては、回転機
構に装着されて回転する磁気ディスクの磁気膜に対し
て、投光系により、磁気ディスクの半径方向に適当な長
さを有するレーザ光帯を投射して磁気膜が走査され、投
光系の入射角に等しい正反射角の方向に設けた受光系の
対物レンズにより、レーザ光帯の磁気膜による反射光
と、磁気膜に存在する欠陥による散乱光とがそれぞれ集
光される。これに対して、対物レンズの結像位置に設け
たホトダイオードアレイには、レーザ光帯に対応した複
数2n個のAPDがリニアに配列されており、対物レン
ズにより集光された反射光は各APDに分散して受光さ
れ、散乱光は、欠陥の位置に対応するAPDに結像して
受光される。なおAPDは受光した光を電圧に変換する
とともに、これを増幅して出力する、すなわち良好な感
度を有するものである。2n個のAPDは、適当な2個
づつが組合され、各組合せの2個のAPDの出力信号
は、差分演算部のn個の差分回路により差分がそれぞれ
算出されて、磁気膜の反射光によるノイズが消去され、
散乱光に対する欠陥パルスがそれぞれ出力される。上記
において、磁気膜の反射光は各APDに分散して受光さ
れるに対して、従来の光電子増倍管においては、反射光
の全部を受光するので、光電子増倍管のノイズに比較し
て、APD1個当たりのノイズはAPDの個数2n分の
1に低減され、さらに、各2個のAPDの出力信号のノ
イズは差分により消去されるので、欠陥の散乱光はS/
Nが向上して、欠陥パルスが良好に検出されるととも
に、その波高値hも良好な精度で計測される。
In the above magnetic film defect inspection apparatus, the laser beam band having an appropriate length in the radial direction of the magnetic disk is projected by the light projecting system with respect to the magnetic film of the magnetic disk mounted on the rotating mechanism and rotating. And the magnetic film is scanned and the objective lens of the light receiving system is installed in the direction of the regular reflection angle that is equal to the incident angle of the light projecting system. And the scattered light due to are collected respectively. On the other hand, a plurality of 2n APDs corresponding to the laser light band are linearly arranged in the photodiode array provided at the image forming position of the objective lens, and the reflected light collected by the objective lens is reflected by each APD. The scattered light is imaged and received on the APD corresponding to the position of the defect. The APD converts the received light into a voltage and amplifies and outputs the voltage, that is, has a good sensitivity. The 2n APDs are combined in appropriate two, and the difference between the output signals of the two APDs in each combination is calculated by the n difference circuits of the difference calculation unit, and the difference is calculated by the reflected light of the magnetic film. The noise is erased,
A defect pulse for each scattered light is output. In the above description, the reflected light of the magnetic film is dispersed and received by each APD, whereas the conventional photomultiplier tube receives all the reflected light, so that it is compared with the noise of the photomultiplier tube. , The noise per APD is reduced to 1 / n of the number of APDs, and the noise of the output signal of each two APDs is eliminated by the difference, so the scattered light of the defect is S /
N is improved, and the defect pulse is satisfactorily detected, and the peak value h thereof is also measured with good accuracy.

【0008】[0008]

【実施例】図1,図2および図3は、この発明の一実施
例を示し、図1は磁気膜欠陥検査装置の全体構成図、図
2は磁気膜欠陥検査装置の部分図、図3は図2に対する
動作説明図である。図1において、磁気膜欠陥検査装置
は、図4に示した先行技術の表面欠陥検査装置と同一の
回転機構2、信号処理部4およびデータ処理部5を有
し、これに対して投光系61と受光系62よりなる検査光学
系6と、差分演算部7とを設け、図示のように接続して
構成される。投光系61は、高輝度のレーザダイオード
(LD)611 と、ビームエキスパンダ(EX)612 、シ
リンドリカルレンズ(SYL)613 、およびミラー614
よりなり、LD611 が出力する楕円形のレーザビームL
T は、EX612 により長短軸が拡大され、SYL613 に
より短軸のみが縮小されたレーザ光帯LB となり、これ
をミラー614 により入射角θT の方向に反射して、磁気
ディスク1の磁気膜に対して、その半径方向に長軸を一
致させて投射する。この場合、レーザ光帯LB は強度分
布を極力均一とすることが望ましい。受光系62は、顕微
鏡用の対物レンズ621 と、対物レンズ621 の結像位置に
設けられ、レーザ光帯LB の長軸に対応して、複数2n
個のアバランシェ・ホトダイオード(APD)がリニア
に配列されたホトダイオードアレイ(APD・ARR
Y)622 よりなり、その光軸を入射角θT に等しい正反
射角θR の方向に設定する。ここで各部の寸法の一例を
説明すると、例えば、レーザ光帯LB の長軸の長さを1
mmとし、対物レンズ621 の倍率を20倍とすると、長
軸は20mmに拡大され、これに対してAPD・ARR
Y622 の有効長を20mmとすると長軸に対応する。な
お、APDの個数2nは例えば24個とし、これらをA
PD1 〜APD24で表すこととする。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIGS. 1, 2 and 3 show an embodiment of the present invention, FIG. 1 is an overall configuration diagram of a magnetic film defect inspection apparatus, FIG. 2 is a partial view of the magnetic film defect inspection apparatus, and FIG. FIG. 3 is an operation explanatory diagram for FIG. 2. In FIG. 1, the magnetic film defect inspection apparatus has the same rotation mechanism 2, signal processing section 4 and data processing section 5 as the prior art surface defect inspection apparatus shown in FIG. An inspection optical system 6 including a 61 and a light receiving system 62, and a difference calculation unit 7 are provided and are connected as shown. The projection system 61 includes a high-intensity laser diode (LD) 611, a beam expander (EX) 612, a cylindrical lens (SYL) 613, and a mirror 614.
And the elliptical laser beam L output by LD611
T is long and short axis is expanded by EX612, the laser beam band L B becomes the only minor axis has been reduced by SYL613, which was reflected in the direction of the incident angle theta T by the mirror 614, the magnetic film of the magnetic disk 1 On the other hand, the projection is performed with the major axis aligned in the radial direction. In this case, it is desirable to make the intensity distribution of the laser light band L B as uniform as possible. The light receiving system 62 is provided at a microscope objective lens 621 and an imaging position of the objective lens 621, and a plurality of 2n are provided corresponding to the long axis of the laser light band L B.
Avalanche photodiodes (APDs) arranged linearly in a photodiode array (APD / ARR)
Y) 622, and its optical axis is set in the direction of the regular reflection angle θ R equal to the incident angle θ T. Here, an example of the dimensions of the respective parts will be described. For example, the length of the major axis of the laser light band L B is 1
mm and the magnification of the objective lens 621 is 20 times, the major axis is enlarged to 20 mm.
If the effective length of Y622 is 20 mm, it corresponds to the long axis. Note that the number 2n of APDs is, for example, 24, and these are A
It will be represented by PD 1 to APD 24 .

【0009】図2は、差分演算部7の構成と、APD・
ARRY622 に対する接続系統を示す。差分演算部7
は、n=12個の差分回路DA1 〜DA12よりなり、例
えば、APD・ARRY622 のAPD1 とAPD13は、
DA1 の+と−の入力端子にそれぞれ接続され、以下図
示の順序により、APD12とAPD24が、DA12の+と
−の入力端子にそれぞれ接続され、DA1 〜DA12の出
力側は信号処理部4に接続される。ただし、2個のAP
Dの組合せ方法はこの順序にかぎらず、次に述べるノイ
ズNの消去が良好になされるものであればよい。
FIG. 2 shows the configuration of the difference calculator 7 and the APD.
The connection system for ARRY622 is shown. Difference calculator 7
Is composed of n = 12 difference circuits DA 1 to DA 12 , and for example, APD 1 and APD 13 of APD / ARRY 622 are:
DA 1 is connected to the + and-input terminals of DA 1 , respectively, and APD 12 and APD 24 are connected to the + and-input terminals of DA 12 respectively in the order shown below, and the output sides of DA 1 to DA 12 are It is connected to the signal processing unit 4. However, 2 APs
The combination method of D is not limited to this order, and may be any method that can effectively eliminate the noise N described below.

【0010】以下、図1〜図3により、磁気膜の欠陥検
査方法を説明する。図1において、回転機構2に装着さ
れて回転する磁気ディスク1の磁気膜に対して、投光系
61によりレーザ光帯LB が投射され、磁気膜の反射光L
R と磁気膜の欠陥による散乱光LR'とが、対物レンズ62
1 により集光されてAPD・ARRY622 に入射し、反
射光LR は24個のAPD1 〜APD24に分散して受光
されて、それぞれよりノイズN1 〜N24が出力され、ま
た散乱光LR'は、欠陥の位置に対応するAPDに受光さ
れて欠陥パルスpが出力される。図3(a) は、APD1
とAPD13の出力信号の一例を示し、APD1 の出力信
号にはレーザ光帯LB の走査にともなって時間的にレベ
ル変動するノイズN1 があり、これに欠陥パルスpa
重畳しているとし、APD13の出力信号もノイズN13
時間的にレベル変動し、これに欠陥パルスpb が重畳し
ているとする。両ノイズN1,N13のレベルは、レーザ光
帯Lb の強度にバラツキがあると、僅かな差異がありう
るが概ね近似している。両出力信号はDA1 に入力して
差分が算出され、(b) に示す差分信号が出力される。差
分信号においては、両ノイズN1,N13の差(N1
13)はほぼ "0" レベルであり、これがグランドレベ
ルLG とされ、欠陥パルスpa はそのまま、欠陥パルス
b は極性が反転されている。他の各2個のAPDの組
合わせに対しても、それぞれのDAより同様の差分信号
が出力される。信号処理部4には、 "0" レベルに近い
正負の閾電圧VS+とVS-とが設定され、差分信号は信号
処理部4に入力して、欠陥パルスpa は閾電圧VS+によ
り、また欠陥パルスpb は閾電圧VS-によりそれぞれ検
出され、さらにそれぞれの波高値ha,hb が計測され
る。各DAの出力する差分信号は同様に処理され、従来
と同様に、各波高値hのデータはデジタル化されてデー
タ処理部5に入力し、MPU51により欠陥の座標位置と
大きさとが算出され、これらの欠陥データは一旦MEM
52に記憶され、磁気ディスク1の全面の検査の終了によ
り、各欠陥データはPRT53に出力されて、欠陥の座標
位置と大きさとがプリントされ、またはマップ表示され
る。
A method of inspecting a defect of a magnetic film will be described below with reference to FIGS. In FIG. 1, a light projecting system is attached to the magnetic film of the magnetic disk 1 mounted on the rotating mechanism 2 and rotating.
The laser light band L B is projected by 61, and the reflected light L of the magnetic film
R and the scattered light L R 'due to the defect of the magnetic film are the objective lens 62.
The reflected light L R is condensed by 1 and is incident on the APD / ARRY 622, and the reflected light L R is dispersed and received by 24 APD 1 to APD 24, and noises N 1 to N 24 are respectively output and scattered light L R. R 'is a defect pulse p is output is received by the APD corresponding to the position of the defect. Figure 3 (a) shows APD 1
And an example of the output signal of the APD 13 is shown. The output signal of the APD 1 has noise N 1 whose level fluctuates temporally with the scanning of the laser beam band L B , and the defect pulse p a is superposed on the noise N 1. In the output signal of the APD 13, the noise N 13 fluctuates in level with time, and the defect pulse p b is superposed on it. The levels of the two noises N 1 and N 13 are approximate to each other although there may be a slight difference if the intensity of the laser light band L b varies. Both output signals are input to DA 1 to calculate the difference, and the difference signal shown in (b) is output. In the difference signal, the difference between the two noises N 1 and N 13 (N 1
N 13 ) is almost "0" level, which is the ground level L G, and the polarity of the defect pulse p b is inverted while the defect pulse p a remains unchanged. Similar differential signals are output from the respective DAs for the other two combinations of APDs. Positive and negative threshold voltages V S + and V S− close to “0” level are set in the signal processing unit 4, the differential signal is input to the signal processing unit 4, and the defect pulse p a is changed by the threshold voltage V S +. , And the defective pulse p b is detected by the threshold voltage V S− , and the respective peak values h a and h b are measured. The differential signal output from each DA is processed in the same manner, and similarly to the conventional case, the data of each peak value h is digitized and input to the data processing unit 5, and the MPU 51 calculates the coordinate position and size of the defect, These defect data are temporarily MEM
Upon completion of the inspection of the entire surface of the magnetic disk 1 stored in 52, each defect data is output to the PRT 53, and the coordinate position and size of the defect are printed or displayed as a map.

【0011】[0011]

【発明の効果】以上の説明のとおり、この発明の磁気膜
欠陥検査装置においては、受光系に、高感度のAPDが
複数個配列されたホトダイオードアレイを使用し、対物
レンズにより集光された磁気膜の反射光を各APDに分
散受光して、APD当たりのノイズを減少し、磁気膜に
存在する欠陥の散乱光を、欠陥に対応するAPDにより
受光し、適当なAPDを2個づつを組合せた両APDの
出力信号の差分を算出することにより、両出力信号のノ
イズが消去され、欠陥の散乱光のS/Nが向上して欠陥
パルスが良好に検出され、またノイズの消去により、グ
ランドレベルが "0" レベルに近くなって適切な閾値の
設定が容易となるとともに、欠陥の波高値hが良好な精
度で計測できるなど、磁気膜の欠陥検査技術の向上に寄
与する効果には、大きいものがある。
As described above, in the magnetic film defect inspection apparatus of the present invention, the photodiode array in which a plurality of high-sensitivity APDs are arranged is used in the light receiving system, and the magnetic field condensed by the objective lens is used. The reflected light of the film is dispersed and received by each APD to reduce the noise per APD, and the scattered light of the defect existing in the magnetic film is received by the APD corresponding to the defect, and two suitable APDs are combined. By calculating the difference between the output signals of both APDs, the noise of both output signals is eliminated, the S / N of the scattered light of the defect is improved, and the defect pulse is well detected. As the level becomes close to "0" level, it becomes easy to set an appropriate threshold value, and the crest value h of the defect can be measured with good accuracy. Big There is a gift.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は、この発明の一実施例における磁気膜欠
陥検査装置の構成図である。
FIG. 1 is a configuration diagram of a magnetic film defect inspection apparatus according to an embodiment of the present invention.

【図2】図2は、図1に対する部分構成図である。FIG. 2 is a partial block diagram of FIG.

【図3】図3は、図2に対する動作説明図であって、
(a)は、その出力信号の一例の説明図、(b)は、その差分
信号の説明図である。
FIG. 3 is an operation explanatory diagram for FIG. 2;
(a) is an explanatory view of an example of the output signal, and (b) is an explanatory view of the difference signal.

【図4】図4は、この発明の先行技術とする表面欠陥検
査装置の構成図である。
FIG. 4 is a configuration diagram of a surface defect inspection apparatus as a prior art of the present invention.

【図5】図5は、表面欠陥検査装置における磁気膜の欠
陥検出方法の説明図である。
FIG. 5 is an explanatory diagram of a defect detection method for a magnetic film in a surface defect inspection apparatus.

【符号の説明】[Explanation of symbols]

1…磁気ディスク、2…回転機構、3…表面欠陥検査装
置の検査光学系、4…信号処理部、5…データ処理部、
51…MPU、52…メモリ(MEM)、53…プリンタ(P
RT)、6…この発明における検査光学系、61…投光
系、62…受光系、611 …レーザダイオード(LD)、61
2 …ビームエキスパンダ(EX)、613 …シリンドリカ
ルレンズ(SYL)、614 …ミラー、621 …対物レン
ズ、622 …ホトダイオードアレイ(APD・ARR
Y)、7…差分演算部、LT …レーザビーム、LR …磁
気膜の反射光、LR'…磁気膜の欠陥の散乱光、LG …グ
ランドレベル、APD…アバランシェ・ホトダイオー
ド、DA…差分回路、N…正反射光LR によるノイズ、
p…散乱光LR'に対する欠陥パルス、h…欠陥パルスの
波高値、VS …閾電圧、VS+…正の閾電圧、VS-…負の
閾電圧。
DESCRIPTION OF SYMBOLS 1 ... Magnetic disk, 2 ... Rotation mechanism, 3 ... Inspection optical system of surface defect inspection apparatus, 4 ... Signal processing part, 5 ... Data processing part,
51 ... MPU, 52 ... Memory (MEM), 53 ... Printer (P
RT), 6 ... Inspection optical system according to the present invention, 61 ... Projecting system, 62 ... Light receiving system, 611 ... Laser diode (LD), 61
2 ... Beam expander (EX), 613 ... Cylindrical lens (SYL), 614 ... Mirror, 621 ... Objective lens, 622 ... Photodiode array (APD / ARR)
Y), 7 ... Difference calculation unit, L T ... Laser beam, L R ... Reflected light of magnetic film, L R '... Scattered light of defect of magnetic film, L G ... Ground level, APD ... Avalanche photodiode, DA ... Difference circuit, N ... Noise due to specular reflection light L R ,
p ... Defect pulse for scattered light L R ', h ... Crest value of defect pulse, V S ... Threshold voltage, V S + ... Positive threshold voltage, V S -... Negative threshold voltage.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】磁気ディスクを装着して回転する回転機構
と、該回転する磁気ディスクの磁気膜に対して、該磁気
ディスクの半径方向に適当な長さを有するレーザ光帯を
投射して走査する投光系と、該投光系の入射角に等しい
正反射角の方向に設けられ、該レーザ光帯の該磁気膜に
よる反射光と、該磁気膜に存在する欠陥による散乱光と
をそれぞれ集光する対物レンズ、および、該対物レンズ
の結像位置に設けられ、該レーザ光帯に対応した複数2
n個のアバランシェ・ホトダイオードがリニアに配列さ
れ、該集光された反射光と散乱光とを受光するホトダイ
オードアレイよりなる受光系とを具備し、該2n個のア
バランシェ・ホトダイオードのうちの適当な2個づつを
組合せ、該各組合せの2個のアバランシェ・ホトダイオ
ードの出力信号の差分をそれぞれ算出して、前記磁気膜
の反射光によるノイズを消去し、前記欠陥の散乱光に対
する欠陥パルスを出力する、n個の差分回路よりなる差
分演算部を設けて構成されたことを特徴とする、磁気デ
ィスクの磁気膜欠陥検査装置。
1. A rotating mechanism mounted with a magnetic disk and rotating, and a laser beam band having an appropriate length in the radial direction of the magnetic disk is projected and scanned on a magnetic film of the rotating magnetic disk. A light projecting system, and a light reflected by the magnetic film of the laser light band, which is provided in a direction of a regular reflection angle equal to the incident angle of the light projecting system, and scattered light by a defect existing in the magnetic film. An objective lens for condensing, and a plurality of two provided at the image forming position of the objective lens and corresponding to the laser light band.
n avalanche photodiodes are arranged linearly, and a light receiving system formed of a photodiode array for receiving the collected reflected light and scattered light is provided, and an appropriate two of the 2n avalanche photodiodes are provided. Combining each one, calculating the difference between the output signals of the two avalanche photodiodes of each combination, eliminating the noise due to the reflected light of the magnetic film, and outputting a defect pulse for the scattered light of the defect, A magnetic film defect inspecting apparatus for a magnetic disk, comprising a difference calculation section comprising n difference circuits.
JP13286195A 1995-05-02 1995-05-02 Magnetic film defect inspection system for magnetic disks Expired - Fee Related JP3520356B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13286195A JP3520356B2 (en) 1995-05-02 1995-05-02 Magnetic film defect inspection system for magnetic disks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13286195A JP3520356B2 (en) 1995-05-02 1995-05-02 Magnetic film defect inspection system for magnetic disks

Publications (2)

Publication Number Publication Date
JPH08304050A true JPH08304050A (en) 1996-11-22
JP3520356B2 JP3520356B2 (en) 2004-04-19

Family

ID=15091256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13286195A Expired - Fee Related JP3520356B2 (en) 1995-05-02 1995-05-02 Magnetic film defect inspection system for magnetic disks

Country Status (1)

Country Link
JP (1) JP3520356B2 (en)

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