JPH08296099A - Electrolytic etching method and device therefor - Google Patents

Abstract

PURPOSE: To control the etching strength in the transverse direction of a metallic strip by measuring the etching intensity distribution in the transverse direction and changing the concn. of an electrolyte to be ejected in the transverse direction of the metallic strip based on the measured result. CONSTITUTION: The strip 1 in an electrolytic cell 2 comes into contact with a conductor roll 3, by which electricity is fed to the strip. Electrodes 5 disposed parallel with the strips 1 in this electrolytic cell 2 energize the strip 1 via the electrolyte 4. The strip 1 is continuously electrolytically etched. The electrolyte 4 is blown out between the strip 1 and the electrodes 5 from nozzles 6 divided in the transverse direction of the strip 1. The low-concentration electrolyte is supplied via a flow rate control valve 15a and the high-concn. electrolyte via a flow rate control valve 15b to each of the respective chambers of the nozzles 6. The etching intensity distribution of the strip 1 is measured by an etching intensity sensor 19 and the concn. of the electrolyte is adjusted by controlling these flow rate control valves 15a, 15b, by which the etching intensity in the transverse direction of the strip 1 is controlled.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrolytic etching method and apparatus for electrolytically etching a metal strip such as a steel strip (hereinafter simply referred to as "strip") by continuous treatment.

[0002]

2. Description of the Related Art In order to improve the metal characteristics of strips, resist printing is performed on the strip surface and then electrolytic etching is performed to form fine irregularities on the strip surface. That is, the electrode is installed inside the cell filled with the electrolytic solution, the strip is connected to the cathode, the electrode is connected to the anode, and the strip having resist printing on the surface is passed through the cell while being immersed in the electrolytic solution. By passing a current between the strip and the electrode through the electrolytic solution, the portion of the strip surface where the resist is not adhered is electrolyzed and removed.

The degree of etching treatment (hereinafter referred to as etching strength) depends on the current density on the strip surface,
It is known to be affected by the relative velocity with the electrolyte.
Therefore, conventionally, in order to eliminate variations in the etching strength in the width direction and stabilize it, the electrodes are divided in the width direction of the strip as described in JP-B-58-19749, and the current flowing through each electrode is controlled. In order to correct the current concentration on the edge portion, JP-A-60-245799,
Attempts have been made to provide an anode mask or an edge mask as described in JP-A-6-306695.

By the way, in the method of dividing the above electrodes in the width direction of the strip and controlling the current flowing through each electrode, the electrode voltage is controlled as a means for controlling the current. However, a short circuit phenomenon occurs in which a current flows between the electrodes, not between the electrodes and the strip, which makes it difficult to control the current in the width direction. Further, the method of providing the edge mask is easy to implement if the pass lines of the cells and strips are in the horizontal direction,
The radial cell in which the anode is arranged in a cylindrical shape has a problem that the structure is complicated and practical application is difficult.

[0005]

SUMMARY OF THE INVENTION It is an object of the present invention to solve the above problems and to realize an electrolytic etching method and an apparatus therefor which achieves stable etching strength in the width direction.

[0006]

In order to solve the above problems, the inventors of the present invention have to control the current density in the width direction of the strip by changing the electrolyte resistance between the electrode and the strip in the width direction. Focusing on what can be achieved by changing,
The present invention has been completed. That is, according to the first aspect of the present invention, when electrolytic etching is performed on a metal strip by a continuous process, the edge position of the metal strip is detected and the etching strength distribution in the width direction of the metal strip is measured. Based on the result, the electrolytic etching method for a metal strip is characterized in that the concentration of the electrolytic solution ejected between the metal strip and the electrode is changed in the width direction of the metal strip.

According to the second aspect of the present invention, when electrolytic etching is performed on a metal strip by continuous treatment, the edge position of the metal strip is detected and the electrodes are divided in the width direction of the metal strip to flow to each electrode. An electrolytic etching method for a metal strip, which comprises measuring an electric current value and changing the concentration of an electrolytic solution ejected between the metal strip and the electrode in the width direction of the metal strip based on the detection and measurement results. .

The present invention according to claim 3 provides a metal strip according to claim 1 or 2 in which a high-concentration electrolytic solution and a low-concentration electrolytic solution are prepared and the concentration of the electrolytic solution to be ejected is adjusted by mixing these. This is the electrolytic etching method. The invention according to claim 4 is characterized in that the concentration of the electrolytic solution in the edge portion of the metal strip is made lower than the concentration of the electrolytic solution in the other portions. This is an electrolytic etching method.

According to a fifth aspect of the present invention, when electrolytically etching a metal strip by a continuous process, the electrode is divided in the width direction of the metal strip, the edge position of the metal strip is detected, and the width direction of the metal strip is detected. Is a method for electrolytically etching a metal strip, characterized in that the etching strength distribution of the metal strip is measured, and the electrode is moved up and down based on the detection and measurement results to change the distance between the metal strip and the electrode in the width direction of the strip. .

According to a sixth aspect of the present invention, when electrolytic etching is performed on a metal strip by a continuous process, the electrodes are divided in the width direction of the metal strip, and the edge position of the metal strip is detected and each of the divided portions is detected. An electrolytic etching method for a metal strip, characterized in that the current value flowing through the electrode is measured, and the distance between the metal strip and the electrode is changed in the width direction of the strip by raising or lowering the electrode based on these detection and measurement results. is there.

The present invention according to claim 7 is characterized in that the distance between the metal strip at the edge portion of the metal strip and the electrode is made larger than that at the other portions. This is an electrolytic etching method. The present invention according to claim 8 provides, at one end of the electrolytic cell,
In a metal strip electrolytic etching apparatus provided with a nozzle that blows out an electrolytic solution in the middle of a metal strip running horizontally in the electrolytic cell and an electrode installed in parallel with the metal strip on the lower surface of the metal strip, The nozzle is divided in the width direction of the strip, and a low-concentration electrolytic solution pipe and a high-concentration electrolytic solution pipe are connected to each divided unit through a flow rate control valve, respectively, and an electrolytic etching apparatus for a metal strip. Is.

The present invention according to claim 9 is the electrolytic etching apparatus for a metal strip according to claim 8, wherein an electrolytic solution separator for separating a solute and a solvent of the electrolytic solution is provided in a circulation system of the electrolytic solution. Is. The present invention according to claim 10 is characterized in that, at one end of an electrolysis cell, a metal strip running in the electrolysis cell in a horizontal direction and an electrode provided on the lower surface of the metal strip in parallel with the metal strip are electrolyzed in the middle. In an electrolytic etching apparatus for metal strips equipped with a nozzle that blows out liquid,
In the metal strip electrolytic etching apparatus, the electrode is divided in the width direction of the strip and is connected to an elevating mechanism for elevating the electrode for each division unit.

[0013]

[Operation] According to the present invention, the electrolytic solution resistance between the electrode and the strip is changed in the width direction to change the etching strength in the width direction of the strip. There is a method of changing the concentration of the liquid in the width direction of the strip, and a second method of changing the distance between the strip and the electrode in the width direction of the strip. Direction, and provided with an electrolytic solution separator for separating the solute and solvent of the electrolytic solution in the electrolytic solution circulation system, the desired electrolytic solution by mixing the low-concentration electrolytic solution and the high-concentration electrolytic solution at an arbitrary ratio It realizes a resistance value. Further, in the second method, the electrode is divided in the width direction, and the elevating mechanism elevates and lowers each of the division units to realize a desired electrolytic solution resistance value.

[0014]

【Example】

First Embodiment A first embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a conceptual diagram showing a device configuration in this embodiment, and FIG. 2 is a horizontal sectional view of an electrolytic cell portion taken along the line AA.
1 is a strip, 2 is an electrolytic cell, 3 is a conductor roll, 4 is an electrolytic solution, 5 is an electrode, 6 is a nozzle for blowing out an electrolytic solution, 7 is a recovery header of the electrolytic solution, 8 is an electrolytic solution recovery tank,
9 is a liquid sending pump, 10 is an electrolytic solution separator, 11 is an electrolytic solution tank, 11a is a low concentration electrolytic solution tank, 11b is a high concentration electrolytic solution tank, 13 is a liquid sending pump, and 13a is a low concentration electrolytic solution sending pump. ,
13b is a high concentration electrolyte solution sending pump, 15 is a flow rate adjusting valve, 16 is a flow meter, 17 is a FIC (flow rate indicating controller), 18 is a process computer, 19 is an etching intensity sensor, and 20 is a strip edge detector. .

The strip 1 in the electrolysis cell 2 is in contact with the conductor roll 3 and is energized via the electrolytic solution 4 with the electrode 5 provided in the electrolysis cell 2 in parallel with the strip 1. The electrolytic solution 4 is blown out to the middle of the strip 1 and the electrode 5 from nozzles 6 divided in the width direction of the strip. In this embodiment, according to the etching processing conditions,
It is characterized in that the concentration of the electrolytic solution supplied in the width direction of the strip is changed.

As shown in FIG. 2, in each of the chambers divided in the width direction of the nozzle 6, a low concentration electrolytic solution is passed through the flow rate adjusting valve 15a, and a high concentration electrolytic solution is passed through the flow rate adjusting valve 15b. It is mixed and supplied at a concentration. The higher the concentration of the electrolytic solution is, the lower the electric resistance is. Therefore, the high concentration portion has high etching strength, and the low concentration portion has low etching strength. The etching intensity sensor 19 is, for example, a combination of a CCD camera and an image processing device, and is installed on the output side of the electrolytic cell 2. A plurality of the sensors are arranged in the width direction of the strip, or one sensor is scanned in the width direction to measure the etching intensity distribution in the width direction of the strip, and the result is transmitted to the process computer 18. The process computer 18 calculates the difference from the set value based on the measurement result, and F
Change the set value to IC17. This allows the flow rate adjustment valve 15
a, the opening of the flow rate adjusting valve 15b is changed, and the concentration of the electrolytic solution mixed in the nozzle 6 is changed.

For example, in order to correct the current concentration at the edge portion of the strip 1, a strip edge detector 20 is installed on the inlet side of the electrolytic cell 2, and the process computer 18 performs etching on the detected strip edge position. Set a lower strength setting. As a result, the concentration of the electrolytic solution in the edge portion becomes lower than that in other portions, and current concentration is corrected.

The etching intensity sensor 19 can be omitted. In this case, the process computer 18 directly sets the density. By the way, it is usual that the electrolytic solution 4 is circulated and used by a circulation facility. Therefore, the recovery header 7 is provided on the lower surface of the strip on the inlet side of the electrolysis cell 2 at a position facing the nozzle 6. Since the electrolyte solution 4 thus recovered has a mixed concentration, it is necessary to separate it into a high concentration one and a low concentration one again. Therefore, the electrolyte recovery tank 8 is followed by the liquid delivery pump 9
An electrolytic solution separator 10 such as an ion exchange resin is provided via the separator, where the electrolytic solution is separated into a solute and a solvent, the low-concentration electrolytic solution is stored in the low-concentration electrolytic solution tank 11a, and the high-concentration electrolytic solution is concentrated in the high-concentration electrolytic solution. It is taken out to the electrolytic solution tank 11b, and supplied to the nozzle 6 through separate systems via the liquid feed pumps 13a and 13b and the flow rate adjusting valves 15a and 15b.

Second Embodiment A second embodiment of the present invention will be described with reference to FIGS. FIG. 3 is a conceptual diagram showing a device configuration in this embodiment similarly to FIG. 1, and FIG. 4 is a vertical cross-sectional view of an electrolysis cell portion taken along the line BB, and each reference numeral is the same as before, 21 is a power source, 22 is an ammeter, and 23 is an insulator.

In this embodiment, as shown in FIG.
Are divided in the width direction of the strip, and an insulator 23 is inserted in the boundary portion. The etching strength sensor 19 is not used as in the first embodiment, but the etching strength is estimated by measuring the current value flowing through each of the divided electrodes with the ammeter 22 so that an appropriate current value distribution is obtained. The concentration of the electrolytic solution in the width direction is controlled by the same mixing as in Example 1.

Third Embodiment A third embodiment of the present invention will be described with reference to FIGS. FIG. 5 is a conceptual diagram showing a device configuration in this embodiment similarly to FIG. 1, and FIG. 6 is a vertical cross-sectional view of an electrolytic cell portion taken along the CC arrow, and each reference numeral is the same as before, 24 is an electrode height adjusting mechanism, 25 is a servo motor, and 26 is an electrode height controller.

As shown in FIG. 6, the electrode 5 is divided in the width direction of the strip, an insulator 23 is inserted in the boundary portion, and each electrode is height-adjusted by an electrode height adjusting mechanism 24. It is supported so that it can move up and down. Strip 1
When the distance between the electrode and the electrode 5 is short, the electric resistance in the electrolytic solution decreases, so that the etching strength becomes weak when the electrode is lowered, and the etching strength becomes strong when the electrode is raised.

Similar to the first embodiment, the etching intensity sensor 19 and the strip edge detector 20 are used to measure the etching intensity distribution in the strip width direction, and the process computer 18 compares them with predetermined etching treatment conditions. The electrode height controller 26 rotates the servo motor 25 to drive the electrode height adjusting mechanism 24 to raise and lower the electrode to achieve the desired etching intensity distribution. For example, in order to correct the current concentration at the edge portion of the strip 1, the electrode 5 may be lowered based on the measurement result of the etching intensity sensor 19.

In this embodiment, since the concentration distribution of the electrolytic solution 4 is uniform, the contact between the strip and the electrolytic solution is not the jet method but the immersion method, and the electrolytic solution 4 is put in the electrolytic cell 2. , Strip 1 passes through it.
Note that, as described in Example 1, a nozzle for ejecting an electrolytic solution whose concentration can be changed may be added to this Example to change the electrolytic solution concentration based on the etching condition.

Fourth Embodiment A fourth embodiment of the present invention will be described with reference to FIG. FIG. 7 is a vertical cross-sectional view of an electrolytic cell portion similar to that of FIG. 6, and the same reference numerals are used for the respective reference numerals. As in the case of the second embodiment, the current value flowing through each divided electrode is measured by the ammeter 22 to estimate the etching strength, and the electrode height is adjusted in the same manner as in the third embodiment so that an appropriate current value distribution is obtained. The controller 26 rotates the servo motor 25 to drive the electrode height adjusting mechanism 24, and raises and lowers the electrode to realize a desired etching intensity distribution.

[0026]

According to the present invention, the etching strength in the strip width direction can be controlled in the electrolytic etching process, and the excellent effect of stabilizing and improving the quality of the strip can be obtained.

[Brief description of drawings]

FIG. 1 is a conceptual diagram showing a device configuration of a first embodiment of the present invention.

FIG. 2 is a horizontal sectional view taken along the line AA of FIG.

FIG. 3 is a conceptual diagram showing a device configuration of a second embodiment of the present invention.

FIG. 4 is a vertical sectional view taken along the line BB of FIG.

FIG. 5 is a conceptual diagram showing a device configuration of a third embodiment of the present invention.

6 is a vertical sectional view taken along the line CC of FIG.

FIG. 7 is a vertical cross-sectional view of the device configuration of the fourth example of the present invention.

[Explanation of symbols]

 1 Strip 2 Electrolytic Cell 3 Conductor Roll 4 Electrolyte 5 Electrode 6 Nozzle 7 Recovery Header 8 Electrolyte Collection Tank 9, 13 Liquid Delivery Pump 10 Electrolyte Separator 11 Electrolyte Tank 15 Flow Control Valve 16 Flowmeter 17 FIC (Flow Indication) Controller 18 Process computer 19 Etching intensity sensor 20 Strip edge detector 21 Power supply 22 Ammeter 23 Insulator 24 Electrode height adjustment mechanism 25 Servo motor 26 Electrode height controller

Claims (10)

[Claims] 1. When performing electrolytic etching on a metal strip by continuous treatment, the edge position of the metal strip is detected and the etching strength distribution in the width direction of the metal strip is measured, and the metal strip is detected based on these detection results. An electrolytic etching method for a metal strip, characterized in that the concentration of the electrolytic solution ejected between the electrode and the electrode is changed in the width direction of the metal strip. 2. When electrolytic etching is performed on a metal strip by continuous treatment, the edge position of the metal strip is detected, the electrodes are divided in the width direction of the metal strip, and the current value flowing through each electrode is measured. An electrolytic etching method for a metal strip, characterized in that the concentration of the electrolytic solution ejected between the metal strip and the electrode is changed in the width direction of the metal strip based on the detection and measurement results. 3. A high concentration electrolytic solution and a low concentration electrolytic solution are prepared,
The electrolytic etching method for a metal strip according to claim 1, wherein the concentration of the electrolytic solution to be ejected is adjusted by mixing these. 4. The electrolytic etching method for a metal strip according to claim 1, wherein the concentration of the electrolytic solution in the edge portion of the metal strip is set lower than the concentration of the electrolytic solution in the other portions. 5. When electrolytically etching a metal strip by continuous treatment, the electrode is divided in the width direction of the metal strip, the edge position of the metal strip is detected, and the etching strength distribution in the width direction of the metal strip is measured. An electrolytic etching method for a metal strip, characterized in that the electrode is moved up and down based on the detection and measurement results to change the distance between the metal strip and the electrode in the width direction of the strip. 6. When performing electrolytic etching on a metal strip by continuous treatment, the electrode is divided in the width direction of the metal strip, the edge position of the metal strip is detected, and the current value flowing through each divided electrode is measured. An electrolytic etching method for a metal strip, characterized in that the electrode is moved up and down based on these detection and measurement results to change the distance between the metal strip and the electrode in the width direction of the strip. 7. The electrolytic etching method for a metal strip according to claim 5, wherein the distance between the metal strip and the electrode at the edge portion of the metal strip is made larger than that at other portions. 8. A nozzle for blowing out an electrolytic solution is provided at one end of an electrolysis cell between a metal strip horizontally running in the electrolysis cell and an electrode provided on a lower surface of the metal strip in parallel with the metal strip. In the electrolytic etching apparatus for metal strips provided, the nozzle is divided in the width direction of the strip, and the low-concentration electrolytic solution pipe and the high-concentration electrolytic solution pipe are connected to each divided unit via a flow rate control valve. An electrolytic etching apparatus for a metal strip, which is characterized in that: 9. The electrolytic etching device for a metal strip according to claim 8, wherein an electrolytic solution separator for separating a solute and a solvent of the electrolytic solution is provided in a circulating system of the electrolytic solution. 10. A nozzle for blowing out an electrolytic solution is provided at one end of an electrolysis cell between a metal strip horizontally running in the electrolysis cell and an electrode provided on a lower surface of the metal strip in parallel with the metal strip. In the provided electrolytic etching apparatus for metal strip, the electrode is divided in the width direction of the strip, and is connected to an elevating mechanism for elevating and lowering the electrode for each division unit.